Display panel and manufacturing method therefor, and display device

Abstract

The present disclosure provides a display panel and a manufacturing method therefor, and a display device. Each sub-pixel in the display panel comprises a light-emitting functional layer and a cathode; at least part of the light-emitting functional layer is located between the cathode and a base substrate; the orthographic projection of the light-emitting functional layer on the base substrate at least partially overlaps with the orthographic projection of a pixel opening region on the base substrate, and the light-emitting functional layer is segmented by isolation pillars; the orthographic projection of the pixel opening region on the base substrate is located within the orthographic projection of the cathode on the base substrate, and the cathode is segmented by the isolation pillars; the isolation pillars include a first isolation pillar and a second isolation pillar, the first isolation pillar and the second isolation pillar are located at the periphery of the pixel opening region, the cathode is in contact with side surfaces of a bottom isolation layer and a middle isolation layer of the first isolation pillar, and a first spacing is provided between the cathode and the second isolation pillar.

Description

Display panel, manufacturing method thereof and display device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese Patent Application No. 202410870768.8, filed on July 01, 2024, the contents of which are incorporated herein by reference in its entirety. TECHNICAL FIELD

[0003] The present disclosure relates to the technical field of display, and in particular, to a display panel, a manufacturing method thereof, and a display device. BACKGROUND

[0004] With the continuous development of display technology, the application field of display products is becoming more and more extensive, and the types and structures of display products are also becoming more and more diverse. The performance of display products can be improved by designing and adjusting the structure of display devices. SUMMARY

[0005] A first aspect of the present disclosure provides a display panel, comprising: a substrate and a plurality of sub-pixels disposed on the substrate, the sub-pixels having a pixel opening area; further comprising a plurality of isolation columns, the isolation columns being located between the pixel opening areas, the isolation columns comprising a bottom isolation layer, a middle isolation layer and a top isolation layer arranged in sequence in a direction away from the substrate, the middle isolation layer of the isolation column comprising a side surface;

[0006] The sub-pixel comprises: a light-emitting functional layer and a cathode, at least part of the light-emitting functional layer being located between the cathode and the substrate; a projection of the light-emitting functional layer on the substrate at least partially overlaps with a projection of the pixel opening area on the substrate, the light-emitting functional layer being interrupted by the isolation column; the projection of the pixel opening area on the substrate is located within the projection of the cathode on the substrate, and the cathode is interrupted by the isolation column;

[0007] The isolation column comprises a first isolation column and a second isolation column, the first isolation column and the second isolation column being located at the periphery of the pixel opening area, the cathode being in contact with the side surface of the bottom isolation layer and the middle isolation layer of the first isolation column, and the cathode having a first spacing with the second isolation column.

[0008] Optionally, the light-emitting functional layer is not in contact with the side surface of the first isolation column.

[0009] Optionally, the light-emitting functional layer is in contact with the bottom isolation layer of the second isolation column, the number of the second isolation column is at least one, and the second isolation column is located at the periphery of the pixel opening area of the sub-pixel to which the light-emitting functional layer belongs.

[0010] Optionally, the first isolation column and the second isolation column corresponding to the same pixel opening area are located at different sides of the pixel opening area.

[0011] Optionally, the light-emitting functional layer comprises a light-emitting functional normal part and a first light-emitting functional sacrificial part, the first light-emitting functional sacrificial part is disconnected from the light-emitting functional normal part, and the first light-emitting functional sacrificial part is in contact with the side surface of the second isolation column.

[0012] The cathode comprises a cathode normal part and a first cathode sacrificial part, the first light-emitting functional sacrificial part is located between the first cathode sacrificial part and the substrate, and the first cathode sacrificial part is disconnected from the cathode normal part.

[0013] Optionally, the plurality of sub-pixels comprises a first color sub-pixel and a second color sub-pixel.

[0014] The display panel further comprises at least two signal transmission layers, the signal transmission layers are located on the side of the anode layer facing the substrate, the signal transmission layers comprise a first sub-transmission layer and a second sub-transmission layer, the first sub-transmission layer comprises a first sub-signal line and a second sub-signal line, the second sub-transmission layer comprises a third sub-signal line and a fourth sub-signal line, the cathode in the first color sub-pixel is coupled with the first sub-signal line, the cathode in the second color sub-pixel is coupled with the second sub-signal line, and the signal voltages transmitted by the first sub-signal line and the second sub-signal line are different.

[0015] Optionally, the extension direction of the first sub-signal line is parallel to the extension direction of the second sub-signal line, the extension direction of the third sub-signal line is parallel to the extension direction of the fourth sub-signal line, the extension directions of the first sub-signal line and the second sub-signal line intersect with the extension directions of the third sub-signal line and the fourth sub-signal line, the first sub-signal line is coupled with the third sub-signal line, and the second sub-signal line is coupled with the fourth sub-signal line.

[0016] Optionally, the bottom isolation layer of the first isolation column has a first connecting part, and the bottom isolation layer is coupled with the first sub-signal line and the second sub-signal line of the first sub-transmission layer through the first connecting part.

[0017] Optionally, it further comprises a second light-emitting functional sacrificial part and a second cathode sacrificial part arranged in sequence in the direction away from the substrate, and the second light-emitting functional sacrificial part and the second cathode sacrificial part are located on the side of the first isolation column away from the substrate.

[0018] Optionally, a third light-emitting functional sacrificial portion and a third cathode sacrificial portion are sequentially arranged in a direction away from the substrate substrate, and the third light-emitting functional sacrificial portion and the third cathode sacrificial portion are located on a side of the second isolation column away from the substrate substrate; a projection area of the third light-emitting functional sacrificial portion in the substrate substrate direction is different from a projection area of the second light-emitting functional sacrificial portion in the substrate substrate direction, and a projection area of the third cathode sacrificial portion in the substrate substrate direction is different from a projection area of the second cathode sacrificial portion in the substrate substrate direction.

[0019] Optionally, a portion of the cathode in contact with the side surface has a second size d2, the side surface has a third size d3, and d2 / d3≥1 / 4.

[0020] Optionally, a portion of the cathode in contact with the bottom isolation layer of the first isolation column has a first size d1; a portion of the cathode in contact with the side surface of the first isolation column has a second size d2, and 0.5 μm≤d1+d2≤4 μm.

[0021] Optionally, at least part of the isolation columns are located on two sides adjacent to a same pixel opening area; and / or, at least part of the isolation columns are located on only one side of a same pixel opening area.

[0022] Optionally, at least part of the isolation columns are coupled.

[0023] Based on the technical solutions of the above display panel, a second aspect of the present disclosure provides a display device comprising the above display panel.

[0024] Based on the technical solutions of the above display panel, a third aspect of the present disclosure provides a manufacturing method of a display panel, for manufacturing the above display panel; the manufacturing method comprises:

[0025] forming a plurality of sub-pixels having pixel opening areas;

[0026] manufacturing a plurality of isolation columns, the isolation columns being located between the pixel opening areas, the isolation columns comprising a bottom isolation layer, an intermediate isolation layer and a top isolation layer sequentially arranged in a direction away from the substrate substrate, the intermediate isolation layer of the isolation column comprising a side surface; the isolation columns comprise first isolation columns and second isolation columns, and the first isolation columns and the second isolation columns are located at a periphery of the pixel opening area.

[0027] The manufacturing of the sub-pixel includes a light-emitting functional layer and a cathode; at least part of the light-emitting functional layer is located between the cathode and the substrate; the orthographic projection of the light-emitting functional layer on the substrate at least partially overlaps with the orthographic projection of the pixel opening area of the sub-pixel on the substrate, and the light-emitting functional layer is separated by the isolation column; the orthographic projection of the pixel opening area of the sub-pixel on the substrate is located in the orthographic projection of the cathode on the substrate, and the cathode is separated by the isolation column; the cathode is in contact with the bottom isolation layer of the first isolation column and the side surface of the intermediate isolation layer, and the cathode has a first interval with the second isolation column.

[0028] Optionally, the manufacturing of the light-emitting functional layer and the cathode specifically includes:

[0029] The light-emitting functional material layer, the cathode material layer and the first inorganic encapsulation material layer are sequentially stacked in the direction away from the substrate;

[0030] A patterning process is performed to etch the light-emitting functional material layer, the cathode material layer and the first inorganic encapsulation material layer to form the light-emitting functional layer, the cathode and the first inorganic encapsulation layer.

[0031] Optionally, the manufacturing of the cathode material layer specifically includes:

[0032] The cathode material layer is formed by evaporation using a first evaporation device, and in the evaporation process, a first evaporation source nozzle of the first evaporation device is directed towards the side surface of the first isolation column, and the direction of the first evaporation source nozzle forms a first included angle with the direction perpendicular to the substrate, and the first included angle a1 satisfies: 25°<a1<75°.

[0033] Optionally, the manufacturing of the light-emitting functional material layer specifically includes:

[0034] The light-emitting functional material layer is formed by evaporation using a second evaporation device, and in the evaporation process, at least part of the second evaporation source nozzles of the second evaporation device are directed towards the pixel opening area, and the direction of the second evaporation source nozzles is perpendicular to the substrate; and / or, at least part of the second evaporation source nozzles are directed towards the side surface of the second isolation column, the direction of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles, and the direction of the second evaporation source nozzles forms a second included angle a2 with the direction perpendicular to the substrate, and the second included angle a2 satisfies: 0°<a1<90°. BRIEF DESCRIPTION OF DRAWINGS

[0035] The accompanying drawings, which are included to provide a further understanding of the present disclosure and constitute a part of the present disclosure, illustrate embodiments of the present disclosure and serve to explain the present disclosure together with the specification: in the drawings:

[0036] FIG. 1 is a first cross-sectional schematic view of a display panel according to an embodiment of the present disclosure;

[0037] FIG. 2 is a second cross-sectional schematic view of a display panel according to an embodiment of the present disclosure;

[0038] FIG. 3 is a third cross-sectional schematic view of a display panel according to an embodiment of the present disclosure;

[0039] FIG. 4 is a fourth cross-sectional schematic view of a display panel according to an embodiment of the present disclosure;

[0040] FIG. 5 is a first plan view of a sub-pixel in a display panel according to an embodiment of the present disclosure;

[0041] FIG. 6 is a second plan view of a sub-pixel in a display panel according to an embodiment of the present disclosure;

[0042] FIG. 7 is a third plan view of a sub-pixel in a display panel according to an embodiment of the present disclosure;

[0043] FIG. 8 is a fourth plan view of a sub-pixel in a display panel according to an embodiment of the present disclosure;

[0044] FIG. 9 is a first layout schematic view of a signal transmission layer according to an embodiment of the present disclosure;

[0045] FIG. 10 is a second layout schematic view of a signal transmission layer according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0046] To further illustrate the display panel and the manufacturing method thereof and the display device according to the embodiments of the present disclosure, the following will be described in detail with reference to the accompanying drawings.

[0047] Referring to FIGS. 1, 2, 5 to 8, the display panel according to an embodiment of the present disclosure includes a substrate and a plurality of sub-pixels disposed on the substrate, the sub-pixels having a pixel opening region K; and a plurality of isolation columns 20, the isolation columns 20 being located between the pixel opening regions, the isolation columns 20 including, in sequence from the substrate, a bottom isolation layer 201, a middle isolation layer 202, and a top isolation layer 203, the middle isolation layer 202 of the isolation columns 20 including a side surface;

[0048] The sub-pixel comprises a light-emitting functional layer (such as a red light-emitting functional layer ELR, a green light-emitting functional layer ELG, and a blue light-emitting functional layer ELB) and a cathode 30, at least part of the light-emitting functional layer is located between the cathode 30 and the substrate substrate; the orthographic projection of the light-emitting functional layer on the substrate substrate at least partially overlaps with the orthographic projection of the pixel opening area K of the sub-pixel on the substrate substrate, and the light-emitting functional layer is blocked by the isolation column 20; the orthographic projection of the pixel opening area K of the sub-pixel on the substrate substrate is located in the orthographic projection of the cathode 30 on the substrate substrate, and the cathode 30 is blocked by the isolation column 20;

[0049] The isolation column 20 comprises a first isolation column and a second isolation column, the first isolation column and the second isolation column are located at the periphery of the pixel opening area K, the cathode 30 is in contact with the side surface of the bottom isolation layer 201 and the intermediate isolation layer 202 of the first isolation column, and the cathode 30 has a first spacing d6 with the second isolation column.

[0050] For example, at least part of the cathode 30 towards the bottom surface of the substrate substrate is in contact with the side surface of the bottom isolation layer 201 and the intermediate isolation layer 202 of the first isolation column, and at least one isolation column 20 located at the periphery of the pixel opening area K of the sub-pixel to which the cathode 30 belongs is the first isolation column.

[0051] It should be noted that the mark 10 in the drawing represents the substrate substrate and the driving circuit layer located on the substrate substrate.

[0052] For example, the plurality of sub-pixels in the display panel are arranged in an array, but are not limited thereto.

[0053] For example, the display panel comprises a pixel definition layer PDL, and the pixel definition layer PDL defines a pixel opening area K corresponding to each sub-pixel.

[0054] For example, the display panel further comprises a plurality of isolation columns 20, the plurality of isolation columns 20 are distributed at the periphery of the pixel opening area K of each sub-pixel, and at least part of the isolation column 20 is located on the side of the pixel definition layer PDL away from the substrate substrate. The isolation column 20 comprises a bottom isolation layer 201, an intermediate isolation layer 202, and a top isolation layer 203 which are sequentially stacked away from the substrate substrate, an edge portion of the bottom isolation layer 201 protrudes from the intermediate isolation layer 202, an edge portion of the top isolation layer 203 protrudes from the intermediate isolation layer 202, and the side surface of the isolation column 20 has a notch. For example, the bottom isolation layer 201 is made of metal Ti, the intermediate isolation layer 202 is made of metal Al, and the top isolation layer 203 is made of metal Ti, but is not limited thereto.

[0055] Exemplarily, the light-emitting functional layer includes a portion located in the corresponding pixel opening region K and a portion located outside the pixel opening region K, which can be located on the surface of the bottom isolation layer 201 of the isolation column 20 away from the substrate substrate, can be located on the surface of the top isolation layer 203 of the isolation column 20 away from the substrate substrate, and can be located on the surface of the pixel definition layer PDL away from the substrate substrate, but not limited thereto.

[0056] Exemplarily, the cathode 30 includes a portion located in the corresponding pixel opening region K and a portion located outside the pixel opening region K, which can be located on the surface of the bottom isolation layer 201 of the isolation column 20 away from the substrate substrate, can be located on the surface of the top isolation layer 203 of the isolation column 20 away from the substrate substrate, and can be located on the surface of the side surface, but not limited thereto.

[0057] Exemplarily, the isolation column 20 corresponding to the sub-pixel is located at the periphery of the pixel opening region K of the sub-pixel, and the number of the isolation column 20 corresponding to the sub-pixel can be one, two or more. Among the isolation columns 20 corresponding to the sub-pixel, at least one isolation column 20 is a first isolation column. All of the isolation columns 20 corresponding to the sub-pixel can be first isolation columns, or a part of them can be first isolation columns and the other part can be second isolation columns. It should be noted that the isolation column 20 corresponding to the sub-pixel refers to the isolation column located at the periphery of the pixel opening region K of the sub-pixel, which is located above the pixel definition layer defining the pixel opening region.

[0058] It is worth noting that each isolation column 20 can correspond to one sub-pixel or at least two adjacent sub-pixels. The isolation column 20 can be a first isolation column in all the sub-pixels corresponding thereto, or can be a second isolation column, or the isolation column 20 can be a first isolation column in a part of the sub-pixels corresponding thereto and a second isolation column in another part of the sub-pixels corresponding thereto.

[0059] More specifically, the first sub-pixel and the second sub-pixel are adjacent, the first sub-pixel includes a first pixel opening region K and the second sub-pixel includes a second pixel opening region K, and the first pixel opening region K and the second pixel opening region K are adjacent, and a separation column 20 is arranged between the first pixel opening region K and the second pixel opening region K, the separation column 20 corresponds to the first sub-pixel and the second sub-pixel at the same time, and the separation column 20 can simultaneously serve as a first separation column of the first sub-pixel and a first separation column of the second sub-pixel, or can simultaneously serve as a second separation column of the first sub-pixel and a second separation column of the second sub-pixel, or can serve as a first separation column of the first sub-pixel and a second separation column of the second sub-pixel at the same time, or can serve as a second separation column of the first sub-pixel and a first separation column of the second sub-pixel at the same time.

[0060] More specifically, as shown in FIG. 1, the red sub-pixel, the green sub-pixel and the blue sub-pixel are illustrated, and the left side and the right side of the pixel opening region of the red sub-pixel are the corresponding first separation columns. The left side and the right side of the pixel opening region of the green sub-pixel are the corresponding first separation columns. The left side and the right side of the pixel opening region of the blue sub-pixel are the corresponding first separation columns. Such a layout structure can be configured to make all the separation columns included in the display panel receive the same electrical signal.

[0061] As shown in FIG. 2, the left side of the pixel opening region of the red sub-pixel is the corresponding first separation column, and the right side of the pixel opening region of the red sub-pixel is the corresponding second separation column. The left side of the pixel opening region of the green sub-pixel is the corresponding first separation column, and the right side of the pixel opening region of the red sub-pixel is the corresponding second separation column. The left side of the pixel opening region of the blue sub-pixel is the corresponding first separation column, and the right side of the pixel opening region of the blue sub-pixel is the corresponding second separation column.

[0062] In the process of manufacturing the display panel, the step of manufacturing the cathode 30 specifically includes: forming the cathode 30 by using a first evaporation device, and in the process of evaporation, at least part of the first evaporation source nozzles of the first evaporation device are directed towards the side surface of the first separation column in contact with the cathode 30, and the direction of the at least part of the first evaporation source nozzles forms a first included angle with the direction perpendicular to the substrate, and the first included angle a1 satisfies: 0° < a1 < 90°. In this way, the cathode 30 is manufactured, so that the cathode 30 can be attached to a larger area of the side surface of the first separation column, and the lap joint performance between the cathode 30 and the side surface is ensured. It should be noted that the solid one-way arrow in the drawing represents the direction of the at least part of the first evaporation source nozzles.

[0063] For example, the first included angle a1 can be 5°, 8°, 10°, 15°, 20°, 30°, 45°, 60°, etc., but is not limited thereto.

[0064] According to the specific structure of the display panel, in the display panel provided by the embodiment of the present disclosure, the cathode 30 is in contact with the side surface of the bottom isolation layer 201 and the intermediate isolation layer 202 of the first isolation column, so that at least part of the cathode 30 can be directly formed on the surface of the bottom isolation layer 201 and the side surface of the intermediate isolation layer, thereby ensuring the overlap area of the cathode 30 and the side surface of the first isolation column. Even if the bottom isolation layer 201 in the isolation column 20 is partially covered by the light-emitting functional layer, the contact area between the bottom isolation layer 201 and the cathode 30 is reduced, and the good overlap effect of the cathode 30 and the side surface can be ensured, thereby ensuring the stability of the overlap and avoiding the display dark spot or pixel point burn.

[0065] Therefore, in the display panel provided by the embodiment of the present disclosure, the overlap area of the cathode 30 and the first isolation column as a whole can be effectively improved, the uniformity of the overlap is improved, and thus the brightness uniformity of the display panel is better improved, and the screen temperature rise risk is reduced.

[0066] As shown in FIGS. 1 and 3, in some embodiments, the light-emitting functional layer is not in contact with the side surface of the first isolation column.

[0067] For example, the light-emitting functional layer does not cover the bottom isolation layer 201 or covers part of the bottom isolation layer 201.

[0068] For example, the step of manufacturing the light-emitting functional layer specifically includes: forming the light-emitting functional layer by using a second evaporation device, and in the evaporation process, at least part of the second evaporation source nozzles of the second evaporation device is directed toward the pixel opening area K, and the direction of the second evaporation source nozzles is perpendicular to the substrate. It should be noted that the dashed one-way arrow in the drawing represents the direction of the at least part of the second evaporation source nozzles.

[0069] The above manufacturing method makes the formed light-emitting functional layer not in contact with the side surface, that is, the light-emitting functional layer and the side surface can have a certain distance, which effectively reduces the coverage area of the light-emitting functional layer on the bottom isolation layer 201 in the isolation column 20, so that the subsequently formed cathode 30 can be in contact with the bottom isolation layer 201 in a larger area, thereby effectively improving the overlap area of the cathode 30 and the first isolation column as a whole, improving the uniformity of the overlap, and thus better improving the brightness uniformity of the display panel and reducing the screen temperature rise risk.

[0070] As shown in FIG. 2, in some embodiments, the light-emitting functional layer is in contact with the bottom isolation layer 201 of the second isolation column, the number of the second isolation columns is at least one, and the second isolation column is located at the periphery of the pixel opening area of the sub-pixel to which the light-emitting functional layer belongs.

[0071] Exemplarily, the first isolation column and the second isolation column corresponding to the same pixel opening area K are located at different sides of the pixel opening area K. It should be noted that the different sides refer to that the first isolation column and the second isolation column are not on the same side of the pixel opening area K in any direction.

[0072] Exemplarily, the light-emitting functional layer overlaps the side surface of the bottom isolation layer 201 and the intermediate isolation layer 202 in the second isolation column, and a portion of the light-emitting functional layer in contact with the bottom isolation layer 201 has a third width d4; along a direction from a bottom boundary to a top boundary of the side surface, a portion of the light-emitting functional layer in contact with the side surface has a fourth width d5, 0.5 μm≤d4+d5≤4 μm.

[0073] Exemplarily, d4+d5 can be 0.6 μm, 1 μm, 1.5 μm, 3 μm, etc., but is not limited thereto.

[0074] The step of manufacturing the light-emitting functional layer specifically comprises:

[0075] The second evaporation device is used to form the light-emitting functional layer, and at least part of the second evaporation source nozzles of the second evaporation device is directed towards the side surface of the second isolation column in contact with the light-emitting functional layer, the direction of the at least part of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles, and the direction of the at least part of the second evaporation source nozzles forms a second included angle with the direction perpendicular to the substrate, the second included angle a2 satisfies: 0°<a1<90°. Exemplarily, the second included angle a2 can be 5°, 8°, 10°, 15°, 20°, 30°, 45°, 60°, etc., but is not limited thereto.

[0076] The above setting that the light-emitting functional layer is in contact with the second isolation column, and the first isolation column and the second isolation column corresponding to the same pixel opening area K are located at different sides of the pixel opening area K; makes the light-emitting functional layer more exposed to the bottom isolation layer 201 in the isolation column 20 on the side where the first isolation column is located, so that the cathode 30 can have a larger contact area with the bottom isolation layer 201 of the first isolation column on the side where the first isolation column is located, thereby effectively improving the overall overlap area of the cathode 30 and the first isolation column, improving the uniformity of the overlap, and thus better improving the brightness uniformity of the display panel and reducing the risk of screen temperature rise.

[0077] As shown in FIG. 4, in some embodiments, the light-emitting functional layer includes a light-emitting functional normal part X31 and a first light-emitting functional sacrificial part X11, the first light-emitting functional sacrificial part X11 is disconnected from the light-emitting functional normal part X31, and the first light-emitting functional sacrificial part X11 is in contact with the side surface of the second isolation column;

[0078] The cathode 30 includes a cathode normal part X30 and a first cathode sacrificial part X10, the first light-emitting functional sacrificial part X11 is located between the first cathode sacrificial part X10 and the substrate substrate, and the first cathode sacrificial part X10 is disconnected from the cathode normal part X30.

[0079] For example, the first light-emitting functional sacrificial part X11 is located outside the pixel opening area K. The first light-emitting functional sacrificial part X11 is disconnected from the light-emitting functional normal part X31 by an etching process. The distance d5 between the light-emitting functional normal part X31 and the second isolation column is between 0.3 μm and 0.6 μm, which can include an end point value.

[0080] For example, the first cathode sacrificial part X10 is located outside the pixel opening area K. The first cathode sacrificial part X10 is disconnected from the cathode normal part X30 by an etching process. The first cathode sacrificial part X10 is in contact with or not in contact with the side surface of the second isolation column.

[0081] The above-mentioned disconnection of the first light-emitting functional sacrificial part X11 from the light-emitting functional normal part X31 and the disconnection of the first cathode sacrificial part X10 from the cathode normal part X30 make the potential of the second isolation column in contact with the first light-emitting functional sacrificial part X11 and the first cathode sacrificial part X10 not affect the potential of the cathode normal part X30. In this way, the potential of the cathode normal part X30 is only the same as the potential of the first isolation column it is connected to, which is conducive to the independent control of the potential of the cathode 30 in different color sub-pixels to match the different transverse pressures required by the light-emitting functional layer in different color sub-pixels.

[0082] As shown in FIGS. 3 and 4, FIGS. 9 and 10, in some embodiments, the plurality of sub-pixels includes a first color sub-pixel and a second color sub-pixel;

[0083] The display panel further comprises at least two signal transmission layers, which are located on the side of the anode layer Ano facing the substrate; the signal transmission layers comprise a first sub-transmission layer and a second sub-transmission layer, the first sub-transmission layer comprises a first sub-signal line 41 and a second sub-signal line 42, and the second sub-transmission layer comprises a third sub-signal line 43 and a fourth sub-signal line 44; the cathode 30 in the first color sub-pixel is coupled with the first sub-signal line 41; the cathode 30 in the second color sub-pixel is coupled with the second sub-signal line 42, and the signal voltages transmitted by the first sub-signal line 41 and the second sub-signal line 42 are different.

[0084] For example, the extension direction of the first sub-signal line 41 is parallel to the extension direction of the second sub-signal line 42, the extension direction of the third sub-signal line 43 is parallel to the extension direction of the fourth sub-signal line 44, the extension directions of the first sub-signal line 41 and the second sub-signal line 42 intersect with the extension directions of the third sub-signal line 43 and the fourth sub-signal line 44, the first sub-signal line 41 is coupled with the third sub-signal line 43, and the second sub-signal line 42 is coupled with the fourth sub-signal line 44.

[0085] For example, the bottom isolation layer 201 of the first isolation column has a first connecting portion 90, and the bottom isolation layer 201 is coupled with the first sub-signal line 41 and the second sub-signal line 42 of the first sub-transmission layer through the first connecting portion 90.

[0086] It should be noted that the black origin in FIGS. 9 and 10 represents the coupling of the first sub-signal line 41 and the second sub-signal line 40.

[0087] For example, the display panel comprises a first source-drain metal layer and a second source-drain metal layer, the second source-drain metal layer comprises the first sub-transmission layer, and the first source-drain metal layer comprises the second sub-transmission layer, but is not limited thereto.

[0088] For example, the first connecting portion 90 can be coupled with the corresponding sub-signal line through a via hole penetrating through the pixel definition layer PDL and other insulating layers.

[0089] The above arrangement makes the potential of the cathode 30 located in the pixel opening area K the same as the potential of the first isolation column to which the cathode 30 is connected, and the potential of the first isolation column is the same as the potential of the sub-signal line to which the first isolation column is coupled. The above arrangement is conducive to realizing independent control of the potential of the cathode 30 in different color sub-pixels.

[0090] More specifically, when it is necessary to realize independent control of the potential of the cathode 30 in different color sub-pixels, the following method can be used to manufacture the cathode 30 and the light-emitting functional layer, but is not limited thereto.

[0091] The first evaporation device is used to form the cathode 30, and at least part of the first evaporation source nozzles of the first evaporation device are directed towards the side surface of the first isolation column in contact with the cathode 30 during the evaporation process. The second evaporation device is used to form the light-emitting functional layer, and at least part of the second evaporation source nozzles of the second evaporation device are directed towards the pixel opening area K during the evaporation process, and the direction of the second evaporation source nozzles is perpendicular to the substrate. In this way, the distance d5 between the light-emitting functional layer and the second isolation column is between 0.3 μm and 0.6 μm, which can include the end point values.

[0092] The first evaporation device is used to form the cathode 30, and at least part of the first evaporation source nozzles of the first evaporation device are directed towards the side surface of the first isolation column in contact with the cathode 30 during the evaporation process. The second evaporation device is used to form the light-emitting functional layer, and at least part of the second evaporation source nozzles of the second evaporation device are directed towards the side surface of the second isolation column in contact with the light-emitting functional layer during the evaporation process, and the direction of the at least part of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles.

[0093] It is worth noting that in the manufacturing process of the display panel, the sub-pixels of each color are completed in one patterning process. For example, when manufacturing the red sub-pixel, the red light-emitting material layer, the cathode material layer and the first inorganic encapsulating material layer are sequentially formed. Then, the patterning process is performed, and the red light-emitting functional layer ELR, the cathode 30 and the first inorganic encapsulating layer CVD1 included in the red sub-pixel are formed by etching the red light-emitting material layer, the cathode material layer and the first inorganic encapsulating layer CVD1. When manufacturing the green sub-pixel, the green light-emitting material layer, the cathode material layer and the first inorganic encapsulating material layer are sequentially formed. Then, the patterning process is performed, and the green light-emitting functional layer ELG, the cathode 30 and the first inorganic encapsulating layer CVD1 included in the green sub-pixel are formed by etching the green light-emitting material layer, the cathode material layer and the first inorganic encapsulating layer CVD1. When manufacturing the blue sub-pixel, the blue light-emitting material layer, the cathode material layer and the first inorganic encapsulating material layer are sequentially formed. Then, the patterning process is performed, and the blue light-emitting functional layer ELB, the cathode 30 and the first inorganic encapsulating layer CVD1 included in the blue sub-pixel are formed by etching the blue light-emitting material layer, the cathode material layer and the first inorganic encapsulating layer CVD1.

[0094] After the light-emitting functional layer, the cathode 30 and the first inorganic encapsulating layer CVD1 included in each sub-pixel are manufactured, the organic encapsulating layer IJP and the second inorganic encapsulating layer CVD2 are manufactured.

[0095] As shown in FIG. 4, in some embodiments, the display panel further comprises a second light-emitting functional sacrificial portion X21 and a second cathode sacrificial portion X20 which are sequentially stacked in a direction away from the substrate base plate, and the second light-emitting functional sacrificial portion X21 and the second cathode sacrificial portion X20 are located on a side of the first isolation column away from the substrate base plate.

[0096] In the process of etching to form the light-emitting functional layer, the cathode 30 and the first inorganic encapsulation layer CVD1, the portions of the light-emitting functional material layer, the cathode material layer and the first inorganic material layer located on a side of the second isolation column away from the substrate base plate, i.e. the light-emitting functional material layer, the cathode material layer and the first inorganic material layer in the area circled by the dashed line in FIG. 4, can be etched and removed at the same time.

[0097] As shown in FIG. 2, in some embodiments, the display panel further comprises a third light-emitting functional sacrificial portion X41 and a third cathode sacrificial portion X40 which are sequentially arranged in a direction away from the substrate base plate, and the third light-emitting functional sacrificial portion X41 and the third cathode sacrificial portion X40 are located on a side of the second isolation column away from the substrate base plate; the area of the orthographic projection of the third light-emitting functional sacrificial portion X41 on the substrate base plate is different from the area of the orthographic projection of the second light-emitting functional sacrificial portion X21 on the substrate base plate, and the area of the orthographic projection of the third cathode sacrificial portion X40 on the substrate base plate is different from the area of the orthographic projection of the second cathode sacrificial portion X20 on the substrate base plate.

[0098] As shown in FIG. 1, in some embodiments, all the isolation columns 20 located on the periphery of the pixel opening region K of the sub-pixel to which the cathode 30 belongs are the first isolation columns.

[0099] In the above case, the step of manufacturing the cathode 30 specifically comprises:

[0100] The cathode 30 is formed by evaporation using a first evaporation device, and in the evaporation process, at least part of the first evaporation source nozzles of the first evaporation device rotates, so that the at least part of the first evaporation source nozzles contact the side surface of the different isolation columns 20 at different time periods, and the direction of the at least part of the first evaporation source nozzles forms a first included angle with the direction perpendicular to the substrate base plate, and the first included angle a1 satisfies: 0° < a1 < 90°. Exemplarily, the first included angle a1 can take values of 5°, 8°, 10°, 15°, 20°, 30°, 45°, 60°, etc., but is not limited thereto.

[0101] The rotation of the first evaporation nozzle during the evaporation process enables the oblique rotation evaporation to form the cathode 30, so that the cathode 30 can be connected with all the first isolation columns around the pixel opening area K of the sub-pixel to which the cathode 30 belongs, and the cathode 30 can be attached to the side surface of each first isolation column with a larger area, thereby ensuring the connection between the cathode 30 and the side surface of each first isolation column.

[0102] As shown in FIG. 2, in some embodiments, the part of the cathode 30 in contact with the side surface has a second size d2, and the side surface has a third size d3, and d2 / d3≥1 / 4.

[0103] For example, d2 / d3≥1 / 3, or d2 / d3≥1 / 2, but not limited thereto.

[0104] It should be noted that the second size and the third size are both the sizes in the direction from the first edge of the side surface to the second edge of the side surface, the first edge being the edge of the side surface in contact with the bottom isolation layer, and the second edge being the edge of the side surface in contact with the top isolation layer.

[0105] The above arrangement ensures the connection area of the cathode 30 and the side surface of the first isolation column, so that even if the bottom isolation layer 201 in the isolation column 20 is covered by the light-emitting functional layer, the contact area between the bottom isolation layer 201 and the cathode 30 is reduced, the good connection effect of the cathode 30 and the side surface is ensured, the stability of the connection is ensured, and the display dark spot or pixel point burn is avoided.

[0106] As shown in FIGS. 1 to 4, in some embodiments, the isolation column 20 further comprises a bottom isolation layer 201 and a top isolation layer 203, the bottom isolation layer 201, the middle isolation layer 202 and the top isolation layer 203 are arranged in sequence in the direction away from the substrate, the edge part of the bottom isolation layer 201 protrudes from the middle isolation layer 202, and the edge part of the top isolation layer 203 protrudes from the middle isolation layer 202; the cathode 30 is also in contact with the bottom isolation layer 201.

[0107] The above arrangement ensures the connection area of the cathode 30 and the whole first isolation column, ensures the good connection effect of the cathode 30 and the first isolation column, ensures the stability of the connection, and avoids the display dark spot or pixel point burn.

[0108] As shown in FIG. 2, in some embodiments, the portion of the cathode 30 in contact with the bottom isolation layer 201 of the first isolation column has a first size d1; the portion of the cathode 30 in contact with the side surface of the first isolation column has a second size d2, 0.5 pm ≤ d1+d2 ≤ 4 pm.

[0109] For example, d1+d2 can be 0.6 pm, 1 pm, 1.5 pm, 3 pm, etc., but is not limited thereto.

[0110] It should be noted that the first size refers to the width of the portion of the cathode 30 in contact with the bottom isolation layer 201 of the first isolation column in the direction of the pixel opening area K pointing to the first isolation column.

[0111] The above arrangement ensures the overlap area of the cathode 30 and the first isolation column as a whole, ensures good overlap effect of the cathode 30 and the first isolation column, ensures the stability of the overlap, and avoids causing display dark spots or pixel point burn.

[0112] In some embodiments, the thickness of the pixel definition layer PDL is set to be between 0.2 pm and 2 pm; for example, the thickness of the pixel definition layer PDL can be 0.2 pm, 0.3 pm, 0.5 pm, 0.6 pm, 1 pm, 1.5 pm, 2 pm, etc., but is not limited thereto.

[0113] In some embodiments, the slope angle of the side surface of the intermediate isolation layer 202 is between 20° and 85°; for example, the slope angle of the side surface of the intermediate isolation layer 202 can be 20°, 30°, 40°, 50°, 60°, 70°, 80°, 85°, etc., but is not limited thereto.

[0114] In some embodiments, the total height of the isolation column 20 is between 0.4 pm and 1.6 pm; for example, the total height of the isolation column 20 can be 0.5 pm, 0.7 pm, 0.9 pm, 1.1 pm, 1.5 pm, etc., but is not limited thereto.

[0115] According to the above parameter setting corresponding structure, it is beneficial to improve the overlap area of the cathode 30 and the first isolation column as a whole, ensure the good overlap effect of the cathode 30 and the first isolation column, ensure the stability of the overlap, and avoid causing display dark spots or pixel point burn.

[0116] As shown in FIGS. 5-8, in some embodiments, as shown in FIGS. 5 and 6, at least part of the isolation column 20 is located on both sides of the same pixel opening area; and / or, as shown in FIGS. 7 and 8, at least part of the isolation column is located on the same side of the same pixel opening area.

[0117] As shown in FIG. 6, in some embodiments, at least part of the isolation columns are coupled.

[0118] As shown in FIGS. 5-8, in some embodiments, at least part of the isolation columns 20 are located on both sides adjacent to the same pixel opening area K; and / or, at least part of the isolation columns 20 are located on the same side of the same pixel opening area K; and / or, at least part of the isolation columns 20 are coupled.

[0119] The layout of the isolation columns 20 in the above manner is conducive to increasing the height of the isolation columns 20 themselves and relative to the substrate, and is also conducive to increasing the area of the side surface of the isolation columns 20, thereby more conducive to increasing the overlap area of the cathode 30 and the first isolation column as a whole, ensuring good overlap effect of the cathode 30 and the first isolation column, ensuring the stability of the overlap, and avoiding causing display dark spots or pixel point burn.

[0120] The display device provided by the embodiments of the present disclosure also includes the display panel provided by the above embodiments.

[0121] It should be noted that the display device can be any product or component with display function, such as a television, a display, a digital photo frame, a mobile phone, a tablet computer, etc., wherein the display device further includes a flexible circuit board, a printed circuit board, a back plate, etc.

[0122] In the display panel provided by the above embodiments, by setting the side surface of the bottom isolation layer 201 and the intermediate isolation layer 202 of the first isolation column to be in contact with the cathode 30, at least part of the cathode 30 can be directly formed on the surface of the bottom isolation layer 201 and the side surface of the intermediate isolation layer, ensuring the overlap area of the cathode 30 and the side surface of the first isolation column; even if the bottom isolation layer 201 in the isolation column 20 is partially covered by the light-emitting functional layer, reducing the contact area between the bottom isolation layer 201 and the cathode 30, the good overlap effect of the cathode 30 and the side surface can still be ensured, the stability of the overlap is ensured, and display dark spots or pixel point burn is avoided.

[0123] Therefore, in the display panel provided by the above embodiments, the overlap area of the cathode 30 and the first isolation column as a whole can be effectively increased, the uniformity of the overlap is improved, and thus the brightness uniformity of the display panel is better improved, and the risk of screen temperature rise is reduced.

[0124] The display device provided by the embodiments of the present disclosure also includes the display panel provided by the above embodiments, and thus has the above beneficial effects, which will not be repeated here.

[0125] The display panel manufacturing method provided in the embodiments of the present disclosure is used to manufacture the display panel provided in the above embodiments.

[0126] forming a plurality of sub-pixels having a pixel opening region K;

[0127] manufacturing a plurality of isolation columns 20 located between the pixel opening regions K, the isolation columns 20 including a bottom isolation layer 201, a middle isolation layer 202, and a top isolation layer 203 arranged in sequence in a direction away from the substrate substrate, the middle isolation layer 202 of the isolation column 20 including a side surface; the isolation columns 20 include first isolation columns and second isolation columns, the first isolation columns and the second isolation columns being located at the periphery of the pixel opening region K;

[0128] manufacturing an emitting functional layer and a cathode 30 included in the sub-pixel; at least part of the emitting functional layer is located between the cathode 30 and the substrate substrate; a normal projection of the emitting functional layer on the substrate substrate at least partially overlaps with a normal projection of the pixel opening region K of the sub-pixel on the substrate substrate, and the emitting functional layer is interrupted by the isolation column 20; the normal projection of the pixel opening region K of the sub-pixel on the substrate substrate is located in the normal projection of the cathode 30 on the substrate substrate, and the cathode 30 is interrupted by the isolation column 20; the cathode 30 is in contact with the side surface of the bottom isolation layer 201 and the middle isolation layer 202 of the first isolation column, and the cathode 30 has a first spacing with the second isolation column.

[0129] In the display panel manufactured by the display panel manufacturing method provided in the embodiments of the present disclosure, the cathode 30 is in contact with the side surface of the bottom isolation layer 201 and the middle isolation layer 202 of the first isolation column, so that at least part of the cathode 30 can be directly formed on the side surface of the target isolation layer, ensuring the overlap area of the cathode 30 and the side surface of the first isolation column; even if the bottom isolation layer 201 in the isolation column 20 is covered by the emitting functional layer, the contact area between the bottom isolation layer 201 and the cathode 30 is reduced, and the good overlap effect of the cathode 30 and the side surface is ensured, the stability of the overlap is ensured, and the display dark spot or pixel point burn is avoided.

[0130] Therefore, in the display panel manufactured by the display panel manufacturing method provided in the embodiments of the present disclosure, the overlap area of the cathode 30 and the first isolation column as a whole can be effectively improved, the uniformity of the overlap is improved, and thus the brightness uniformity of the display panel is better improved, and the screen temperature rise risk is reduced.

[0131] In some embodiments, the step of manufacturing the emitting functional layer and the cathode 30 specifically includes:

[0132] forming a light-emitting functional material layer, a cathode material layer and a first inorganic encapsulating material layer in sequence along a direction away from the substrate base plate;

[0133] performing a patterning process to etch the light-emitting functional material layer, the cathode material layer and the first inorganic encapsulating material layer to form the light-emitting functional layer, the cathode and the first inorganic encapsulating layer.

[0134] As shown in FIGS. 2-4, in some embodiments, the step of forming the cathode 30 specifically comprises:

[0135] forming the cathode material layer by evaporation using a first evaporation device, wherein at least part of the first evaporation source nozzles of the first evaporation device are oriented towards the side surface of the first isolation column during evaporation, and the orientation of the first evaporation source nozzles forms a first included angle with a direction perpendicular to the substrate base plate, the first included angle a1 satisfies: 0° < a1 < 90°. Further, the first included angle a1 satisfies: 25° < a1 < 75°.

[0136] The above method for forming the cathode 30 enables the cathode 30 to adhere to a larger area of the side surface of the first isolation column, and ensures the lap performance between the cathode 30 and the side surface.

[0137] As shown in FIG. 1, in some embodiments, the step of forming the cathode material layer specifically comprises:

[0138] forming the cathode material layer by evaporation using a first evaporation device, wherein at least part of the first evaporation source nozzles of the first evaporation device are rotated during evaporation, and the orientation of the first evaporation source nozzles forms a first included angle with a direction perpendicular to the substrate base plate, the first included angle a1 satisfies: 0° < a1 < 90°. Further, the first included angle a1 satisfies: 25° < a1 < 75°.

[0139] The above method for forming the cathode 30 by controlling at least part of the first evaporation source nozzles to rotate during evaporation realizes oblique rotation evaporation, thereby enabling the cathode 30 to lap with all the first isolation columns around the pixel opening region K of the sub-pixel to which the cathode 30 belongs, and enabling the cathode 30 to adhere to a larger area of the side surface of each of the first isolation columns, and ensuring the lap performance between the cathode 30 and the side surface of each of the first isolation columns.

[0140] As shown in FIG. 1 and FIG. 3, in some embodiments, the step of manufacturing the light-emitting functional material layer specifically comprises: forming the light-emitting functional material layer by using a second evaporation device, wherein, during the evaporation process, at least part of the second evaporation source nozzles of the second evaporation device are directed towards the side surface of the second isolation column in contact with the light-emitting functional material layer, and the direction of the at least part of the second evaporation source nozzles is perpendicular to the substrate; and / or, the direction of the at least part of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles, and the direction of the at least part of the second evaporation source nozzles forms a second included angle a2 with the direction perpendicular to the substrate, and the second included angle a2 satisfies: 0° < a1 < 90°.

[0141] The above manufacturing method makes the formed light-emitting functional layer not in contact with the side surface, i.e., the light-emitting functional layer and the side surface can have a certain distance, which effectively reduces the coverage area of the light-emitting functional layer on the bottom isolation layer 201 in the isolation column 20, so that the subsequently formed cathode 30 can be in contact with the bottom isolation layer 201 in a larger area, thereby effectively improving the overlap area of the cathode 30 and the first isolation column as a whole, improving the uniformity of the overlap, and thus better improving the brightness uniformity of the display panel and reducing the risk of screen temperature rise.

[0142] As shown in FIG. 2 and FIG. 4, in some embodiments, the step of manufacturing the light-emitting functional material layer specifically comprises:

[0143] forming the light-emitting functional material layer by using a second evaporation device, wherein, during the evaporation process, at least part of the second evaporation source nozzles of the second evaporation device are directed towards the side surface of the second isolation column in contact with the light-emitting functional material layer, and the direction of the at least part of the second evaporation source nozzles is perpendicular to the substrate; and / or, the direction of the at least part of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles, and the direction of the at least part of the second evaporation source nozzles forms a second included angle a2 with the direction perpendicular to the substrate, and the second included angle a2 satisfies: 0° < a1 < 90°.

[0144] When the light-emitting functional layer and the cathode 30 are manufactured by using the above manufacturing method, on the side of the first isolation column, the light-emitting functional layer can expose the bottom isolation layer 201 in the isolation column 20 more, so that the cathode 30 can have a larger contact area with the bottom isolation layer 201 of the first isolation column on the side of the first isolation column, thereby effectively improving the overlap area of the cathode 30 and the first isolation column as a whole, improving the uniformity of the overlap, and thus better improving the brightness uniformity of the display panel and reducing the risk of screen temperature rise.

[0145] It should be noted that the signal line extending in a certain direction refers to that the signal line includes a main part and a secondary part connected to the main part, the main part is a line, a line segment or a strip-shaped body, the main part extends in a certain direction, and the length of the main part extending in a certain direction is greater than the length of the secondary part extending in other directions.

[0146] It should be noted that the "same layer" of the embodiments of the present disclosure can refer to the film layer on the same structure layer. Or for example, the film layer on the same layer can be a layer structure formed by using the same film forming process to form a film layer for forming a specific pattern, and then using the same mask plate to pattern the film layer by a one-time patterning process. According to the difference of the specific pattern, the one-time patterning process can include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure can be continuous or discontinuous. These specific patterns can also be at different heights or have different thicknesses.

[0147] In the method embodiments of the present disclosure, the serial numbers of the steps cannot be used to limit the sequence of the steps, and for those skilled in the art, the changes of the sequence of the steps without creative labor are within the protection scope of the present disclosure.

[0148] It should be noted that each embodiment in the present specification is described in a progressive manner, and the same or similar parts between each embodiment can be referred to each other, and each embodiment mainly describes the difference from other embodiments. In particular, for the method embodiments, since they are basically similar to the product embodiments, the description is relatively simple, and the relevant parts can be referred to the part of the description of the product embodiments.

[0149] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood as the usual meaning understood by those skilled in the art to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not represent any order, number or importance, but are only used to distinguish different components. "Include" or "contain" and similar words mean that the elements or objects before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect", "couple" or "connected" and similar words are not limited to physical or mechanical connection, but can include electrical connection, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to represent relative positional relationship, when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0150] It can be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly" on or under the other element, or an intervening element can also be present.

[0151] In the description of the above-mentioned embodiments, the specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0152] The above description is merely illustrative of the disclosure and does not place restrictions on the protection scope of the disclosure. Any variations or replacements easily conceived by those skilled in the art within the technical scope disclosed by the disclosure should be covered by the protection scope of the disclosure. Therefore, the protection scope of the disclosure should be subject to the protection scope of the claims.

Claims

1. A display panel, comprising: A substrate and a plurality of sub-pixels disposed on the substrate, the sub-pixels having a pixel opening region; further comprising a plurality of isolation columns, the isolation columns being located between the pixel opening regions, the isolation columns comprising a bottom isolation layer, a middle isolation layer and a top isolation layer arranged in sequence in a direction away from the substrate, the middle isolation layer of the isolation column comprising a side surface; The sub-pixel comprises a light-emitting functional layer and a cathode, at least part of the light-emitting functional layer being located between the cathode and the substrate; The normal projection of the light-emitting functional layer on the substrate at least partially overlaps with the normal projection of the pixel opening region on the substrate, and the light-emitting functional layer is interrupted by the isolation column; the normal projection of the pixel opening region on the substrate is located within the normal projection of the cathode on the substrate, and the cathode is interrupted by the isolation column; The isolation column comprises a first isolation column and a second isolation column, the first isolation column and the second isolation column being located at the periphery of the pixel opening region, the cathode being in contact with the side surface of the bottom isolation layer and the middle isolation layer of the first isolation column, and the cathode having a first spacing with the second isolation column.

2. The display panel of claim 1, wherein, The light-emitting functional layer is not in contact with the side surface of the first isolation column.

3. The display panel of claim 1 or 2, wherein, The light-emitting functional layer is in contact with the bottom isolation layer of the second isolation column, the number of the second isolation column is at least one, and the second isolation column is located at the periphery of the pixel opening region of the sub-pixel to which the light-emitting functional layer belongs.

4. The display panel of claim 1, wherein, The first isolation column and the second isolation column corresponding to the same pixel opening region are located on different sides of the pixel opening region.

5. The display panel of claim 4, wherein, The light-emitting functional layer comprises a normal light-emitting functional part and a first light-emitting functional sacrificial part, the first light-emitting functional sacrificial part being disconnected from the normal light-emitting functional part, and the first light-emitting functional sacrificial part being in contact with the side surface of the second isolation column; The cathode comprises a normal cathode part and a first cathode sacrificial part, the first light-emitting functional sacrificial part being located between the first cathode sacrificial part and the substrate, and the first cathode sacrificial part being disconnected from the normal cathode part.

6. The display panel of claim 2 or 5, wherein, The plurality of sub-pixels comprises a first color sub-pixel and a second color sub-pixel; The display panel further comprises at least two signal transmission layers, the signal transmission layers being located on the side of the anode layer facing the substrate; the signal transmission layers comprise a first sub-transmission layer and a second sub-transmission layer, the first sub-transmission layer comprising a first sub-signal line and a second sub-signal line, and the second sub-transmission layer comprising a third sub-signal line and a fourth sub-signal line; the cathode in the first color sub-pixel is coupled with the first sub-signal line; the cathode in the second color sub-pixel is coupled with the second sub-signal line, and the signal voltages transmitted by the first sub-signal line and the second sub-signal line are different.

7. The display panel of claim 6, wherein, The extending direction of the first sub-signal line is parallel to the extending direction of the second sub-signal line, the extending direction of the third sub-signal line is parallel to the extending direction of the fourth sub-signal line, the extending direction of the first sub-signal line and the second sub-signal line is crossed with the extending direction of the third sub-signal line and the fourth sub-signal line, the first sub-signal line is coupled with the third sub-signal line, and the second sub-signal line is coupled with the fourth sub-signal line.

8. The display panel of claim 7, wherein, The bottom isolation layer of the first isolation column has a first connecting portion, and the bottom isolation layer is coupled with the first sub-signal line and the second sub-signal line of the first sub-transmission layer through the first connecting portion.

9. The display panel of claim 6, wherein, Further comprising a second light-emitting functional sacrificial portion and a second cathode sacrificial portion arranged in sequence in a direction away from the substrate substrate, the second light-emitting functional sacrificial portion and the second cathode sacrificial portion are located on the side of the first isolation column away from the substrate substrate.

10. The display panel of claim 9, wherein, Further comprising a third light-emitting functional sacrificial portion and a third cathode sacrificial portion arranged in sequence in a direction away from the substrate substrate, the third light-emitting functional sacrificial portion and the third cathode sacrificial portion are located on the side of the second isolation column away from the substrate substrate; the area of the third light-emitting functional sacrificial portion in the substrate substrate direction is different from the area of the second light-emitting functional sacrificial portion in the substrate substrate direction, and the area of the third cathode sacrificial portion in the substrate substrate direction is different from the area of the second cathode sacrificial portion in the substrate substrate direction.

11. The display panel of any one of claims 1-2, 4-5, wherein The portion of the cathode in contact with the side surface has a second size d2, the side surface has a third size d3, and d2 / d3≥1 / 4.

12. The display panel of any one of claims 1-2, 4-5, wherein The portion of the cathode in contact with the bottom isolation layer of the first isolation column has a first size d1; the portion of the cathode in contact with the side surface of the first isolation column has a second size d2, and 0.5 μm≤d1+d2≤4 μm.

13. The display panel of any one of claims 1-2, 4-5, wherein, At least part of the isolation columns are located on both sides of the same pixel opening area; and / or, at least part of the isolation columns are located on the same side of the same pixel opening area.

14. The display panel of claim 13, wherein, At least part of the isolation columns are coupled.

15. A display device comprising the display panel of any one of claims 1-14.

16. A manufacturing method of a display panel, for manufacturing the display panel of any one of claims 1-15; the manufacturing method comprising: forming a plurality of sub-pixels having a pixel opening area; manufacturing a plurality of isolation columns, the isolation columns being located between the pixel opening areas, the isolation columns comprising a bottom isolation layer, an intermediate isolation layer and a top isolation layer arranged in sequence in a direction away from the substrate substrate, the intermediate isolation layer of the isolation column comprising a side surface; the isolation columns comprising a first isolation column and a second isolation column, the first isolation column and the second isolation column being located at the periphery of the pixel opening area; The sub-pixel comprises a light-emitting functional layer and a cathode; at least part of the light-emitting functional layer is located between the cathode and the substrate; a projection of the light-emitting functional layer on the substrate at least partially overlaps with a projection of the pixel opening area of the sub-pixel on the substrate, and the light-emitting functional layer is blocked by the isolation column; A projection of the pixel opening area of the sub-pixel on the substrate is located in a projection of the cathode on the substrate, and the cathode is blocked by the isolation column; the cathode is in contact with the side surface of the bottom separation layer and the intermediate separation layer of the first isolation column, and the cathode has a first spacing with the second isolation column.

17. The method of manufacturing a display panel according to claim 16, wherein, The step of manufacturing the light-emitting functional layer and the cathode specifically comprises: A light-emitting functional material layer, a cathode material layer and a first inorganic encapsulating material layer are sequentially stacked in a direction away from the substrate; A patterning process is performed to etch the light-emitting functional material layer, the cathode material layer and the first inorganic encapsulating material layer, thereby forming the light-emitting functional layer, the cathode and the first inorganic encapsulating layer.

18. The method of manufacturing a display panel according to claim 17, wherein, The step of manufacturing the cathode material layer specifically comprises: The cathode material layer is formed by evaporation using a first evaporation device, and in the evaporation process, a first evaporation source nozzle of the first evaporation device is directed towards the side surface of the first isolation column, and the direction of the first evaporation source nozzle forms a first included angle with a direction perpendicular to the substrate, and the first included angle a1 satisfies: 25°<a1<75°.

19. The method of manufacturing a display panel according to claim 17 or 18, wherein, The step of manufacturing the light-emitting functional material layer specifically comprises: The light-emitting functional material layer is formed by evaporation using a second evaporation device, and in the evaporation process, at least part of the second evaporation source nozzles of the second evaporation device are directed towards the pixel opening area, and the direction of the second evaporation source nozzles is perpendicular to the substrate; and / or, at least part of the second evaporation source nozzles are directed towards the side surface of the second isolation column, the direction of the second evaporation source nozzles is different from the direction of the first evaporation source nozzles, and the direction of the second evaporation source nozzles forms a second included angle a2 with a direction perpendicular to the substrate, and the second included angle a2 satisfies: 0°<a1<90°.

Images