Dual comb radiation source and heterodyne detection for alignment metrology

The dual comb radiation source and heterodyne detection system addresses the challenge of bulky demultiplexers in metrology systems by using computational demultiplexing for precise alignment measurements, enhancing semiconductor manufacturing efficiency.

WO2026008250A1 Publication Date: 2026-01-08ASML NETHERLANDS BV +1
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Patent Information

Application Number
PCT/EP2025/065955
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-07-01
Filing Date
2025-06-06
Publication Date
2026-01-08

AI Technical Summary

Technical Problem

Existing metrology systems for semiconductor manufacturing require bulky and costly radiation beam demultiplexers to separate diffracted radiation into multiple channels, which occupy significant space and increase system complexity, and are inadequate for future alignment measurement accuracy needs.

Method used

A dual comb radiation source and heterodyne detection system that uses two combs with different repetition rates to analyze heterodyne beating between radiation portions, eliminating the need for bulky demultiplexers by employing computational demultiplexing to distinguish relevant wavelength ranges in the optical spectrum of diffracted radiation.

Benefits of technology

Enables accurate and compact alignment metrology without mechanical movement, providing fast and precise alignment measurements with reduced system size and cost, suitable for advanced semiconductor manufacturing processes.

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Abstract

Dual comb radiation sources and heterodyne detection for alignment metrology are described. A dual comb radiation source is configured to irradiate a metrology target with first radiation and second radiation. The first radiation and the second radiation have different repetition rates so one comb samples the repetitive pulse train from the other comb. A detector receives diffracted radiation and generates a detection signal by analyzing heterodyne beating between different corresponding portions of the first radiation and the second radiation to distinguish relevant wavelength ranges in an optical spectrum of diffracted radiation.
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