Furnace tube

Abstract

Provided is a furnace tube, wherein a reaction chamber (10) in which a carrier (20) is placed is provided inside the furnace tube; a plurality of gas inlets (30) in communication with the reaction chamber (10) are provided at the top or bottom of the furnace tube; a gas inlet device (40) is connected to the end of the gas inlets (30) away from the reaction chamber (10); and a flow equalizing device (50) is connected to the end of the gas inlets (30) located in the reaction chamber (10), the flow equalizing device (50) comprises an annular spray gas inlet pipe (501) and / or a spray gas inlet pipe (503), the side of the annular spray gas inlet pipe (501) and / or the spray gas inlet pipe (503) facing the carrier (20) being provided with spray ports. A process gas is delivered to the gas inlets (30) via the gas inlet device (40), and then sprayed to the carrier (20) through the spray ports of the annular spray gas inlet pipe (501) and / or the spray gas inlet pipe (503), so as to uniformly diffuse into the entire reaction chamber (10), thereby improving the contact efficiency between solar cells and the process gas to enable a more thorough reaction between the two, ensuring the uniformity of coating on the solar cells placed in the reaction chamber (10).

Description

A furnace tube TECHNICAL FIELD

[0001] The present application relates to the technical field of metallurgy, in particular to a furnace tube. BACKGROUND

[0002] In the field of photovoltaic manufacturing technology, the main process equipment is mainly horizontal structure, such as diffusion, annealing, PECVD (Plasma Enhanced Chemical Vapor Deposition) and LPCVD (Low Pressure Chemical Vapor Deposition) and the like; the cross intersection phenomenon of the temperature field and the gas field of the conventional horizontal coating equipment is more obvious, and there is a significant difference between the temperature field at the top and the bottom of the reaction cavity in the furnace tube.

[0003] To solve the above problems, existing manufacturers set up vertical coating equipment, and the process gas expands after being heated in the reaction cavity in the vertical furnace tube, and is gathered at the top of the reaction cavity, and the gas is discharged after the process reaction is completed, and the reaction cavity needs to be uniformly supplied with gas during the process reaction to ensure the uniformity of the coating of the battery piece in the reaction cavity.

[0004] Therefore, in order to ensure that the vertical coating equipment can uniformly supply gas, thereby ensuring the uniformity of the coating of the battery piece, different manufacturers have proposed different design schemes, and the design concepts of different design schemes are different, and the effects are also different. SUMMARY

[0005] Therefore, the present application provides a furnace tube to solve the problem that the furnace tube in the prior art cannot ensure that the reaction cavity can uniformly supply gas and cannot ensure the uniformity of the coating of the battery piece in the reaction cavity.

[0006] The technical scheme of the present application is a furnace tube, which has a reaction cavity for placing a carrier inside, a plurality of gas inlets are provided at the top or the bottom of the furnace tube and communicate with the reaction cavity, and a gas inlet device is connected to one end of the gas inlet away from the reaction cavity;

[0007] A flow uniformizing device is connected to the other end of the gas inlet in the reaction cavity, the flow uniformizing device comprises a ring-shaped spray gas inlet pipe and / or a spray gas inlet pipe, and a spray opening is provided on the side of the ring-shaped spray gas inlet pipe and / or the spray gas inlet pipe facing the carrier;

[0008] The ring-shaped spray gas inlet pipe and / or the spray gas inlet pipe are used to uniformly diffuse the process gas to the reaction cavity.

[0009] Further, the top or bottom of the furnace tube is provided with an outer ring area and an inner ring area, and the outer ring area and / or the inner ring area are uniformly provided with a plurality of gas inlets in the circumferential direction.

[0010] Further, the uniform flow device comprises a ring-shaped spray gas inlet pipe, a uniform flow layer and a spray gas inlet pipe.

[0011] The gas inlets in the outer ring area or the inner ring area are communicated with the ring-shaped spray gas inlet pipe, and the ring-shaped spray gas inlet pipe is located between the gas inlets and the carrier, and at least one uniform flow layer is matched between the ring-shaped spray gas inlet pipe and the carrier, and the uniform flow layer is provided with a plurality of through holes penetrating the uniform flow layer; the side of the ring-shaped spray gas inlet pipe facing the uniform flow layer is provided with a plurality of first spray openings.

[0012] The gas inlets in the outer ring area or the inner ring area are respectively communicated with a spray gas inlet pipe, and the spray gas inlet pipe is vertically arranged in the reaction cavity, and the side of the spray gas inlet pipe facing the carrier is provided with a plurality of second spray openings.

[0013] Further, the uniform flow device comprises a ring-shaped spray gas inlet pipe, and the ring-shaped spray gas inlet pipe is located on the side of the carrier facing the gas inlets.

[0014] The gas inlets in the outer ring area and / or the inner ring area are communicated with the ring-shaped spray gas inlet pipe, and the side of the ring-shaped spray gas inlet pipe facing the carrier is provided with a plurality of first spray openings.

[0015] Further, the uniform flow device further comprises a uniform flow layer matched with the ring-shaped spray gas inlet pipe.

[0016] At least one uniform flow layer is arranged between the ring-shaped spray gas inlet pipe and the carrier, and the uniform flow layer is provided with a plurality of through holes penetrating the uniform flow layer; the uniform flow layer is used for uniformly distributing the process gas on the cross section of the reaction cavity.

[0017] Further, the uniform flow device comprises a spray gas inlet pipe; the spray gas inlet pipe is vertically arranged in the reaction cavity.

[0018] Each of the gas inlets is communicated with a spray gas inlet pipe, and the side of the spray gas inlet pipe facing the carrier is provided with a plurality of second spray openings.

[0019] Further, the gas inlet device comprises a gas inlet pipe, an adjusting needle valve, a pneumatic valve, a flow meter and a stop valve.

[0020] Each of the gas inlets is connected with a gas inlet pipe, and each of the gas inlet pipes is sequentially provided with an adjusting needle valve, a pneumatic valve, a flow meter and a stop valve along the extension direction thereof.

[0021] Further, the air inlet device comprises air inlet pipes, regulating needle valves, pneumatic valves, flow meters and stop valves.

[0022] Each of the air inlets is connected with an air inlet pipe, and each of the air inlet pipes is provided with a regulating needle valve.

[0023] At least two of the air inlet pipes are communicated with the pneumatic valves, and the pneumatic valves are further communicated with the flow meters and the stop valves in sequence through the air inlet pipes.

[0024] Further, the bottom of the furnace tube is circumferentially provided with a plurality of exhaust outlets communicated with the reaction cavities, and one end of each of the exhaust outlets extending out of the bottom of the furnace tube is connected with an exhaust device; the exhaust device comprises exhaust pipes, flow rate detection devices, cooling devices, regulating valves, filtering devices, control valves and vacuum pumps.

[0025] Each of the exhaust outlets is communicated with an exhaust pipe, and each of the exhaust pipes is provided with a flow rate detection device, a cooling device, a regulating valve and a filtering device in sequence along the extending direction of the exhaust pipe.

[0026] At least one of the filtering devices is communicated with the control valve through the exhaust pipe, and the control valve is further communicated with the vacuum pump through the exhaust pipe.

[0027] Further, the bottom of the furnace tube is circumferentially provided with a plurality of exhaust outlets communicated with the reaction cavities, and one end of each of the exhaust outlets extending out of the bottom of the furnace tube is connected with an exhaust device; the exhaust device comprises exhaust pipes, flow rate detection devices, cooling devices, regulating valves, filtering devices, control valves and vacuum pumps.

[0028] Each of the exhaust outlets is communicated with an exhaust pipe, and each of the exhaust pipes is provided with a flow rate detection device, a cooling device, a regulating valve and a filtering device in sequence along the extending direction of the exhaust pipe.

[0029] At least one of the filtering devices is communicated with the control valve through the exhaust pipe, and the control valve is further communicated with the vacuum pump through the exhaust pipe.

[0030] Compared with the prior art, the present application has at least the following beneficial effects:

[0031] The present application delivers the process gas to the air inlets through the air inlet device, and then sprays the process gas to the carrier through the annular spraying air inlet pipe and / or the spraying openings of the spraying air inlet pipe, so as to uniformly diffuse the process gas into the whole reaction cavity, improve the contact efficiency between the battery piece and the process gas, make the reaction between the battery piece and the process gas more sufficient, and ensure the uniformity of the film plating of the battery piece placed in the reaction cavity. BRIEF DESCRIPTION OF DRAWINGS

[0032] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs; the terminology used in the description herein is for describing particular embodiments only and is not intended to be limiting of the application; the use herein of terms such as "comprise" and "comprising", "have" and "having", "include" and "including" and "contain" and "containing" are to be construed in a non-exclusive and non-limiting sense; the use herein of terms such as "first", "second" and "other" are used for distinguishing between similar objects having a different reference and are not necessarily used in a sequence.

[0033] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained from these drawings without any creative labor.

[0034] Fig. 1 is a first sectional view of the furnace tube of the present application;

[0035] Fig. 2 is an enlarged schematic view of reference sign A in Fig. 1;

[0036] Fig. 3 is an enlarged schematic view of reference sign B in Fig. 1;

[0037] Fig. 4 is a first structural schematic view of the gas inlet device of the present application;

[0038] Fig. 5 is a second structural schematic view of the gas inlet device of the present application;

[0039] Fig. 6 is a second sectional view of the furnace tube of the present application;

[0040] Fig. 7 is a third sectional view of the furnace tube of the present application;

[0041] Fig. 8 is a first structural schematic view of the gas outlet device of the present application;

[0042] Fig. 9 is a second structural schematic view of the gas outlet device of the present application;

[0043] Fig. 10 is a partial structural schematic view of the furnace tube of the present application.

[0044] Reference signs:

[0045] 10, reaction cavity; 101, limiting sleeve ring;

[0046] 20, carrier;

[0047] 30, gas inlet;

[0048] 40, air inlet device; 401, air inlet pipe; 402, needle valve; 403, pneumatic valve; 404, flow meter; 405, stop valve;

[0049] 50, flow uniformizing device; 501, annular spray air inlet pipe; 5011, first spray opening; 502, flow uniformizing layer; 5021, through hole; 503, spray air inlet pipe; 5031, second spray opening;

[0050] 60, outer ring area;

[0051] 70, inner ring area;

[0052] 80, air outlet;

[0053] 90, air outlet device; 901, air outlet pipe; 902, flow rate detecting device; 903, cooling device; 904, regulating valve; 905, filtering device; 906, control valve; 907, vacuum pump; 9071, air outlet;

[0054] 100, inner thermocouple;

[0055] 110, sealing plug. DETAILED DESCRIPTION

[0056] In order to make the technical problems, technical solutions and beneficial effects of the present application more clear, the present application is further described in detail below in combination with the accompanying drawings and examples. It should be understood that the specific examples described herein are only used to explain the present application and do not limit the present application. Thus, the features described in the present specification are used to explain one of the embodiments of the present application, and are not meant to imply that every embodiment of the present application must have the features described. In addition, it should be noted that the present specification describes many features. Although some features can be combined together to show possible system designs, these features can also be used in other combinations that are not explicitly described. Thus, unless otherwise specified, the described combinations are not intended to be limiting.

[0057] The principles and structures of the present application are described in detail below in combination with the accompanying drawings and examples.

[0058] In one embodiment, in order to ensure that the reaction cavity 10 can uniformly intake air, and thus ensure the uniformity of the battery sheet coated in the reaction cavity 10, referring to FIG. 1 and FIG. 4-5, the present application proposes a furnace pipe, which has a reaction cavity 10 for placing a carrier 20 inside, and a plurality of air inlets 30 are arranged on the top or bottom of the furnace pipe and communicated with the reaction cavity 10, and the air inlets 30 are connected with air inlet devices 40 at the end away from the reaction cavity 10;

[0059] The gas inlet 30 is connected with a uniform flow device 50 at the other end of the reaction cavity 10, the uniform flow device 50 includes a ring-shaped spraying gas inlet pipe 501 and / or a spraying gas inlet pipe 503, and the ring-shaped spraying gas inlet pipe 501 and / or the spraying gas inlet pipe 503 is provided with a spraying port towards one side of the carrier 20.

[0060] The ring-shaped spraying gas inlet pipe 501 and / or the spraying gas inlet pipe 503 are used to uniformly diffuse the process gas flowing into the gas inlet 30 to the reaction cavity 10.

[0061] The furnace tube in the embodiment is one of the components of the vertical coating equipment, and the carrier 20 is used to place the battery piece (also called silicon wafer). The embodiment is exemplified by the top of the furnace tube being provided with a plurality of gas inlets 30 communicating with the reaction cavity 10.

[0062] It should be noted that the furnace tube further includes a control unit (not shown, the same throughout the text), and the control unit is electrically connected with the gas inlet device 40. The furnace tube is one of the components of the vertical coating equipment, so the furnace tube in the embodiment is exemplified by a vertical structure.

[0063] In this way, the process gas enters the gas inlet 30 through the gas inlet device 40, and then is sprayed towards the carrier 20 through the spraying port of the ring-shaped spraying gas inlet pipe 501 and / or the spraying gas inlet pipe 503, and then is uniformly diffused to the entire reaction cavity 10, so as to improve the contact efficiency between the battery piece and the process gas, and make the reaction between the two more sufficient, so as to ensure the uniformity of the coating of the battery piece placed in the reaction cavity 10.

[0064] Referring to FIG. 4, the top or bottom of the furnace tube is provided with an outer ring area 60 and an inner ring area 70, and the outer ring area 60 and / or the inner ring area 70 are circumferentially and uniformly provided with a plurality of gas inlets 30, so as to improve the total amount of process gas entering the reaction cavity 10 through the gas inlets 30 at the same time.

[0065] Therefore, the top or bottom of the furnace tube has the following arrangement modes:

[0066] First, the top or bottom of the furnace tube is circumferentially and uniformly provided with a plurality of gas inlets 30 only in the outer ring area 60.

[0067] Second, the top or bottom of the furnace tube is circumferentially and uniformly provided with a plurality of gas inlets 30 only in the inner ring area 70.

[0068] Third, the top or bottom of the furnace tube is circumferentially and uniformly provided with a plurality of gas inlets 30 in the outer ring area 60 and the inner ring area 70.

[0069] And the top of the furnace tube is provided with an outer ring area 60 and an inner ring area 70, and the outer ring area 60 and the inner ring area 70 are both circumferentially and uniformly provided with four gas inlets 30.

[0070] Specifically, referring to FIG. 4, the gas inlet device 40 includes a gas inlet pipe 401, an adjusting needle valve 402, a pneumatic valve 403, a flow meter 404 and a stop valve 405; and a control unit is electrically connected with the adjusting needle valve 402, the pneumatic valve 403, the flow meter 404 and the stop valve 405 respectively.

[0071] Each of the gas inlets 30 is connected with a gas inlet pipe 401, and each of the gas inlet pipes 401 is sequentially provided with the adjusting needle valve 402, the pneumatic valve 403, the flow meter 404 and the stop valve 405 along the extending direction thereof.

[0072] In this way, each of the gas inlets 30 is matched with one gas inlet device 40, so that when one of the gas inlet devices 40 fails, another gas inlet device 40 can still deliver process gas to the gas inlet 30, thereby ensuring the uniformity of the film plating of the battery piece placed in the reaction cavity 10.

[0073] Of course, in other embodiments, in order to save costs, referring to FIG. 5, the gas inlet device 40 includes a gas inlet pipe 401, an adjusting needle valve 402, a pneumatic valve 403, a flow meter 404 and a stop valve 405; and a control unit is electrically connected with the adjusting needle valve 402, the pneumatic valve 403, the flow meter 404 and the stop valve 405 respectively.

[0074] Each of the gas inlets 30 is connected with a gas inlet pipe 401, and each of the gas inlet pipes 401 is provided with an adjusting needle valve 402.

[0075] All of the gas inlet pipes 401 are in communication with the pneumatic valve 403, and the pneumatic valve 403 is in communication with the flow meter 404 and the stop valve 405 through the gas inlet pipes 401.

[0076] Of course, two gas inlet pipes 401 can also be in communication with the pneumatic valve 403, or three gas inlet pipes 401 can also be in communication with the pneumatic valve 403, which is not limited herein.

[0077] It should be noted that the adjusting needle valve 402 is used to receive the control signal of the control unit to finely adjust the process gas flow into the air inlet 30, which can realize continuous adjustment from a small flow to a full open state; the pneumatic valve 403 is a device for controlling the opening and closing of the valve by using compressed air as a power source, which is used to receive the control signal of the control unit to realize rapid cutting or opening of the process gas; the flow meter 404 is used to measure the gas flow through the air inlet pipe 401 and upload the measurement data to the control unit; the stop valve 405 is used to receive the control signal of the control unit to completely close or open the gas flow of the air inlet pipe 401, and is usually not used to adjust the gas flow.

[0078] The uniform flow device 50 comprises an annular spray air inlet pipe 501, a uniform flow layer 502 and a spray air inlet pipe 503.

[0079] The air inlets 30 located in the inner ring area 70 or the outer ring area 60 are communicated with the annular spray air inlet pipe 501, the annular spray air inlet pipe 501 is located between the air inlets 30 and the carrier 20, and at least one uniform flow layer 502 is matched between the annular spray air inlet pipe 501 and the carrier 20, the uniform flow layer 502 is provided with a plurality of through holes 5021 penetrating the uniform flow layer 502; the annular spray air inlet pipe 501 is provided with a plurality of first spray openings 5011 on the side facing the uniform flow layer 502.

[0080] The air inlets 30 located in the outer ring area 60 or the inner ring area 70 are respectively communicated with a spray air inlet pipe 503, the spray air inlet pipe 503 is vertically arranged in the reaction cavity 10, and the spray air inlet pipe 503 is provided with a plurality of second spray openings 5031 on the side facing the carrier 20.

[0081] It should be noted that the embodiment takes the air inlets 30 located in the inner ring area 70 as an example to communicate with the annular spray air inlet pipe 501, and the air inlets 30 located in the outer ring area 60 are respectively communicated with a spray air inlet pipe 503. Of course, according to the actual situation, the air inlets 30 located in the inner ring area 70 can be respectively communicated with a spray air inlet pipe 503, and the air inlets 30 located in the outer ring area 60 can be communicated with the annular spray air inlet pipe 501, which is not limited herein.

[0082] The annular spray inlet pipe 501 is arranged around the central axis of the reaction cavity 10, and the process gas can be sprayed to the carrier 20 through the first spray port 5011 of the annular spray inlet pipe 501, and cover the surface of the entire carrier 20, thereby ensuring the uniformity of the contact between the process gas and the battery piece, and further ensuring the uniformity of the film plating of the battery piece. The flow uniforming layer 502 is also arranged around the central axis of the reaction cavity 10, and is arranged opposite to the annular spray inlet pipe 501, and the process gas sprayed by the first spray port 5011 of the annular spray inlet pipe 501 will first pass through the flow uniforming layer 502, and then pass through the through hole 5021 to further cover the surface of the entire carrier 20, thereby further ensuring the uniformity of the film plating of the battery piece. The vertically arranged spray inlet pipe 503 can realize the uniform distribution of the process gas along the longitudinal direction of the reaction cavity 10 through the second spray port 5031, so as to ensure that all the battery pieces on the carrier 20 can contact the process gas under the same condition, thereby ensuring the uniformity of the film plating of the battery piece.

[0083] In this way, when the process gas is delivered to the gas inlet 30 by the gas inlet device 40, part of the process gas is sprayed to the flow uniforming layer 502 through the first spray port 5011 of the annular spray inlet pipe 501, and then the flow uniforming layer 502 uniformly distributes the process gas on the entire cross section of the reaction cavity 10 through the through hole 5021; another part of the process gas is longitudinally and uniformly sprayed to the carrier 20 through the second spray port 5031 of the vertically arranged spray inlet pipe 503, so that the uniform distribution of the process gas can avoid local over-concentration or over-dilution, thereby ensuring the consistency of the reaction or heating process; and it is helpful to maintain the uniformity of the temperature in the reaction cavity 10, prevent local overheating or overcooling phenomenon, and improve the contact efficiency between the reactants, so that the reaction is more sufficient, thereby improving the yield and selectivity.

[0084] In other embodiments, referring to FIG. 6, the flow uniforming device 50 only includes the annular spray inlet pipe 501 arranged around the central axis of the reaction cavity 10, and the annular spray inlet pipe 501 is located on the side of the carrier 20 facing the gas inlet 30;

[0085] The gas inlets 30 located in the outer ring region 60 and / or the inner ring region 70 are communicated with the annular spray inlet pipe 501, and the side of the annular spray inlet pipe 501 facing the carrier 20 is provided with a plurality of first spray ports 5011.

[0086] In this way, when the process gas is delivered to the gas inlet 30 by the gas inlet device 40, part of the process gas is sprayed to the flow uniforming layer 502 through the first spray port 5011 of the annular spray inlet pipe 501, and then the flow uniforming layer 502 uniformly distributes the process gas on the entire cross section of the reaction cavity 10 through the through hole 5021; another part of the process gas is longitudinally and uniformly sprayed to the carrier 20 through the second spray port 5031 of the vertically arranged spray inlet pipe 503, so that the uniform distribution of the process gas can avoid local over-concentration or over-dilution, thereby ensuring the consistency of the reaction or heating process; and it is helpful to maintain the uniformity of the temperature in the reaction cavity 10, prevent local overheating or overcooling phenomenon, and improve the contact efficiency between the reactants, so that the reaction is more sufficient, thereby improving the yield and selectivity.

[0087] At this time, there are several arrangements as follows:

[0088] One, the gas inlet 30 located in the outer ring area 60 and the gas inlet 30 located in the inner ring area 70 are connected with a ring-shaped spraying gas inlet pipe 501 respectively. At this time, the control unit can control the air inlet device 40 to cut off or close, and only deliver process gas to the gas inlet 30 located in the outer ring area 60, that is, at this time, only the ring-shaped spraying gas inlet pipe 501 communicated with the gas inlet 30 located in the outer ring area 60 sprays process gas. Of course, the control unit can also control the air inlet device 40 to only deliver process gas to the gas inlet 30 located in the inner ring area 70, that is, at this time, only the ring-shaped spraying gas inlet pipe 501 communicated with the gas inlet 30 located in the inner ring area 70 sprays process gas.

[0089] Second, the gas inlet 30 located in the outer ring area 60 and the gas inlet 30 located in the inner ring area 70 are connected with the same ring-shaped spraying gas inlet pipe 501.

[0090] Third, only the gas inlet 30 located in the inner ring area 70 is connected with the same ring-shaped spraying gas inlet pipe 501, and the gas inlet 30 located in the outer ring area 60 is not connected with the ring-shaped spraying gas inlet pipe 501.

[0091] Fourth, only the gas inlet 30 located in the outer ring area 60 is connected with the same ring-shaped spraying gas inlet pipe 501, and the gas inlet 30 located in the inner ring area 70 is not connected with the ring-shaped spraying gas inlet pipe 501.

[0092] To further ensure the uniformity of the contact between the process gas and the battery piece, and further ensure the uniformity of the film plating of the battery piece, referring to FIG. 6, the flow uniformizing device 50 further comprises a flow uniformizing layer 502 matched with the ring-shaped spraying gas inlet pipe 501, that is, the flow uniformizing layer 502 is arranged opposite to the ring-shaped spraying gas inlet pipe 501, and the process gas sprayed by the first spraying port 5011 is first passed through the flow uniformizing layer 502.

[0093] The ring-shaped spraying gas inlet pipe 501 and the carrier 20 are connected with at least one flow uniformizing layer 502, and the flow uniformizing layer 502 is provided with a plurality of through holes 5021 penetrating the flow uniformizing layer 502; the flow uniformizing layer 502 is used for uniformly distributing the process gas on the cross section of the reaction cavity 10.

[0094] It should be noted that the flow uniformizing layer 502 in the embodiment is illustrated by setting two layers of distance.

[0095] In this way, the flow uniformizing layer 502 can further uniformly distribute the process gas on the reaction cavity 10 through the through holes 5021, that is, cover the surface of the entire carrier 20, and further ensure the uniformity of the film plating of the battery piece.

[0096] In other embodiments, referring to FIG. 7, the flow uniformizing device 50 only comprises a spraying gas inlet pipe 503; the spraying gas inlet pipe 503 is vertically arranged in the reaction cavity 10;

[0097] Each of the gas inlets 30 is connected with a spray gas inlet pipe 503, and the spray gas inlet pipe 503 is provided with a plurality of second spray openings 5031 on one side of the carrier 20.

[0098] The spray gas inlet pipe 503 can realize the uniform distribution of the process gas along the longitudinal direction of the reaction cavity 10 through the second spray openings 5031, so as to ensure that all the battery pieces on the carrier 20 can contact the process gas under the same condition, and further ensure the uniformity of the film plating of the battery pieces.

[0099] It should be noted that the reaction cavity 10 is provided with a limiting sleeve ring 101 corresponding to the bottom of each spray gas inlet pipe 503, and the bottom of the spray gas inlet pipe 503 can be matched and arranged in the limiting sleeve ring 101, so as to prevent the spray gas inlet pipe 503 from swinging, and further affecting the uniform spraying of the spray gas inlet pipe 503, and further affecting the uniformity of the film plating of the battery pieces; and the limiting sleeve ring 101 is made of a high-temperature resistant material.

[0100] The spray gas inlet pipe 503 connected with the gas inlet 30 of the carrier 20 located in the outer ring area 60 and the spray gas inlet pipe 503 connected with the gas inlet 30 of the carrier 20 located in the inner ring area 70 are connected.

[0101] Referring to FIGS. 4-7, an inner thermocouple 100 is vertically arranged in the reaction cavity 10 corresponding to each gas inlet 30, or an inner thermocouple 100 is vertically arranged between two adjacent gas inlets 30. The inner thermocouple 100 is a temperature measuring device, which is formed by welding two different metal wires together to form a thermocouple junction. When the junction is heated, due to the different thermoelectric properties of the two metals, a small voltage difference, i.e. thermoelectric electromotive force, will be generated at both ends. The voltage difference is proportional to the temperature, so it can be used to measure the temperature, and the measured temperature data is uploaded to the control unit, so that the control unit can control the flow rate of the process gas delivered by the gas inlet device 40 in real time according to the temperature.

[0102] It should be noted that the spray gas inlet pipe 503 and the inner thermocouple 100 are vertically arranged in the reaction cavity 10, so their arrangement modes need to avoid the carrier 20, and they can all extend to the bottom of the reaction cavity 10.

[0103] In order to ensure the smooth progress of the film plating, maintain appropriate reaction conditions and ensure safety, not only uniform and continuous gas supply is needed, but also exhaust is needed to maintain a suitable pressure environment in the reaction cavity 10; the exhaust can also prevent gas accumulation, ensure heat transfer efficiency and reaction uniformity; the exhaust can also remove harmful gases, avoid damage to the equipment, reduce safety hazards, and protect the health of the operators. Therefore, referring to FIG. 8, the bottom of the furnace tube is circumferentially provided with a plurality of exhaust openings 80 communicating with the reaction cavity 10, and one end of the exhaust opening 80 extending out of the bottom of the furnace tube is connected with an exhaust device 90.

[0104] The exhaust device 90 includes an exhaust pipe 901, a flow rate detection device 902, a cooling device 903, a regulating valve 904, a filtering device 905, a control valve 906 and a vacuum pump 907 to jointly ensure the efficiency, safety and environmental protection of the exhaust process. The flow rate detection device 902, the cooling device 903, the regulating valve 904, the filtering device 905, the control valve 906 and the vacuum pump 907 are electrically connected with the control unit.

[0105] Each of the exhaust ports 80 is communicated with an exhaust pipe 901, and each of the exhaust pipes 901 is sequentially provided with a flow rate detection device 902, a cooling device 903, a regulating valve 904 and a filtering device 905 along the extending direction thereof; and the flow rate detection device 902 can be mounted on the cooling device 903 for detecting the flow rate of the gas cooled by the cooling device 903.

[0106] All the filtering devices 905 are communicated with the control valve 906 through the exhaust pipes 901, the control valve 906 is further communicated with the vacuum pump 907 through the exhaust pipes 901, and the vacuum pump 907 is further provided with an air outlet 9071, and the vacuum pump 907 discharges the extracted gas to the outside or to a collection tank through the air outlet 9071.

[0107] It should be noted that four exhaust ports 80 are taken as an example in the embodiment.

[0108] In other embodiments, since the furnace tube is one of the components of the vertical coating equipment, the furnace tube is also correspondingly vertical, and in order to save the vertical space of the furnace tube, i.e. not to occupy the vertical space of the furnace tube, referring to FIG. 9, the bottom of the side wall of the furnace tube is circumferentially provided with an exhaust port 80 communicated with the reaction cavity 10, and one end of the exhaust port 80 extending out of the bottom of the furnace tube is connected with an exhaust device 90. The exhaust device 90 includes an exhaust pipe 901, a flow rate detection device 902, a cooling device 903, a regulating valve 904, a filtering device 905, a control valve 906 and a vacuum pump 907.

[0109] Each of the exhaust ports 80 is communicated with an exhaust pipe 901, and each of the exhaust pipes 901 is sequentially provided with a flow rate detection device 902, a cooling device 903, a regulating valve 904 and a filtering device 905 along the extending direction thereof; and the flow rate detection device 902 can be mounted on the cooling device 903 for detecting the flow rate of the gas cooled by the cooling device 903.

[0110] At least one filter device 905 is communicated with the control valve 906 through the exhaust pipe 901, and the control valve 906 is also communicated with the vacuum pump 907 through the exhaust pipe 901; and the vacuum pump 907 is further provided with an air outlet 9071, and the vacuum pump 907 discharges the extracted gas to the outside or to a collection tank through the air outlet 9071.

[0111] In other embodiments (not shown in the figure), each filter device 905 is communicated with a vacuum pump 907 through the exhaust pipe 901, and the exhaust pipe 901 between each vacuum pump 907 and the filter device 905 is provided with a control valve 906. In this way, when one vacuum pump 907 stops running due to failure, other vacuum pumps 907 continue to run to ensure that the gas in the reaction chamber 10 can be discharged, so that the reaction chamber 10 can maintain a suitable pressure environment; it can also prevent gas accumulation, ensure heat transfer efficiency and reaction uniformity. Exhaustion can also remove harmful gases, avoid damage to equipment, reduce safety hazards, and protect the health of operators.

[0112] It should be noted that the flow rate detection device 902 is used to monitor the flow rate of the gas in the exhaust pipe 901, so as to timely discover abnormal conditions such as blockage or leakage and make necessary adjustments; the cooling device 903 is used to reduce the temperature of the gas in the exhaust pipe 901; the regulating valve 904 is used to control the flow rate and pressure of the gas in the exhaust pipe 901, to ensure stable exhaust process; the filter device 905 is used to filter dust, particulate matter or harmful gas contained in the gas in the exhaust pipe 901, to prevent emission to the atmosphere, thereby protecting the environment and the health of employees; the vacuum pump 907 is used to extract gas to generate negative pressure, to accelerate the discharge of gas or maintain the vacuum degree in the furnace tube reaction chamber 10; and the control valve 906 is used to control the start or stop of the vacuum pump 907.

[0113] In other embodiments, referring to FIG. 10, the gas inlet 30 and the gas outlet 80 communicated with the reaction chamber 10 can also be arranged at the bottom of the furnace tube, and the internal thermocouple 100 corresponding to the gas inlet 30 is vertically arranged in the reaction chamber 10. At this time, the gas inlet device 40 and the exhaust device 90 can only start one of them at the same time, to prevent simultaneous gas inlet and exhaust from affecting the uniformity of the coating. At this time, if it is necessary to reduce the number of gas inlets 30 and / or internal thermocouples 100, the gas inlets 30 and / or internal thermocouples 100 to be reduced are removed from the reaction chamber 10, and then a hole (not shown, same throughout the text) is left at the bottom of the furnace tube after the gas inlets 30 and / or internal thermocouples 100 are removed. Then, the hole is plugged with a sealing plug 110 to prevent gas leakage. When it is necessary to increase the number of gas inlets 30 and / or internal thermocouples 100, the sealing plug 110 is removed, and the gas inlets 30 and / or internal thermocouples 100 are reinstalled.

[0114] Obviously, the above-described embodiments are only some embodiments but not all the embodiments of the present application, the preferred embodiments of the present application are shown in the drawings, but do not limit the patent scope of the present application. The present application can be implemented in many different forms, and conversely, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing specific embodiments, or make equivalent replacements to some technical features therein. Any equivalent structure made by using the content of the present application specification and drawings, directly or indirectly applied to other related technical fields, is also within the patent protection scope of the present application.

Claims

1. A furnace tube having a reaction chamber (10) inside in which a carrier (20) is placed, characterized in that, The top or bottom of the furnace tube is provided with a plurality of gas inlets (30) communicated with the reaction cavity (10), and the gas inlets (30) are connected with gas inlet devices (40) at one end away from the reaction cavity (10); The gas inlets (30) are connected with uniform flow devices (50) at the other end of the reaction cavity (10), the uniform flow devices (50) comprise annular spray gas inlet pipes (501) and / or spray gas inlet pipes (503), and the annular spray gas inlet pipes (501) and / or the spray gas inlet pipes (503) are provided with spray openings on one side facing the carrier (20); The annular spray gas inlet pipes (501) and / or the spray gas inlet pipes (503) are used for uniformly diffusing process gas to the reaction cavity (10).

2. The furnace tube of claim 1, wherein The top or bottom of the furnace tube is provided with an outer ring area (60) and an inner ring area (70), and the outer ring area (60) and / or the inner ring area (70) are circumferentially and uniformly provided with a plurality of gas inlets (30).

3. The furnace tube of claim 2, wherein, The uniform flow devices (50) comprise annular spray gas inlet pipes (501), uniform flow layers (502) and spray gas inlet pipes (503); The gas inlets (30) located in the inner ring area (70) or the outer ring area (60) are communicated with the annular spray gas inlet pipes (501), the annular spray gas inlet pipes (501) are located between the gas inlets (30) and the carrier (20), and at least one uniform flow layer (502) is matched between the annular spray gas inlet pipes (501) and the carrier (20), the uniform flow layer (502) is provided with a plurality of through holes (5021) penetrating the uniform flow layer (502), and the annular spray gas inlet pipes (501) are provided with a plurality of first spray openings (5011) on one side facing the uniform flow layer (502); The gas inlets (30) located in the outer ring area (60) or the inner ring area (70) are respectively communicated with spray gas inlet pipes (503), the spray gas inlet pipes (503) are vertically arranged in the reaction cavity (10), and the spray gas inlet pipes (503) are provided with a plurality of second spray openings (5031) on one side facing the carrier (20).

4. The furnace tube of claim 2, wherein The uniform flow devices (50) comprise annular spray gas inlet pipes (501), and the annular spray gas inlet pipes (501) are located on one side of the carrier (20) facing the gas inlets (30); The gas inlets (30) located in the outer ring area (60) and / or the inner ring area (70) are communicated with the annular spray gas inlet pipes (501), and the annular spray gas inlet pipes (501) are provided with a plurality of first spray openings (5011) on one side facing the carrier (20).

5. The furnace tube of claim 4, wherein The uniform flow devices (50) further comprise uniform flow layers (502) matched with the annular spray gas inlet pipes (501); The uniform flow devices (50) further comprise uniform flow layers (502) matched with the annular spray gas inlet pipes (501); At least one uniform flow layer (502) is arranged between the annular spray inlet pipe (501) and the carrier (20), and the uniform flow layer (502) is provided with a plurality of through holes (5021) penetrating the uniform flow layer (502); the uniform flow layer (502) is used for uniformly distributing the process gas on the cross section of the reaction cavity (10).

6. The furnace tube of claim 1 or 2, wherein The uniform flow device (50) comprises a spray inlet pipe (503); the spray inlet pipe (503) is vertically arranged in the reaction cavity (10); Each of the gas inlets (30) is communicated with a spray inlet pipe (503), and the side of the spray inlet pipe (503) facing the carrier (20) is provided with a plurality of second spray openings (5031).

7. The furnace tube of claim 1 or 2, wherein The gas inlet device (40) comprises a gas inlet pipe (401), an adjusting needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405); Each of the gas inlets (30) is connected with a gas inlet pipe (401), and each of the gas inlet pipes (401) is sequentially provided with an adjusting needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405) along the extension direction thereof.

8. The furnace tube of claim 1 or 2, wherein The gas inlet device (40) comprises a gas inlet pipe (401), an adjusting needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405); Each of the gas inlets (30) is connected with a gas inlet pipe (401), and each of the gas inlet pipes (401) is provided with an adjusting needle valve (402); At least two of the gas inlet pipes (401) are communicated with the pneumatic valve (403), and the pneumatic valve (403) is further communicated with the flow meter (404) and the stop valve (405) through the gas inlet pipes (401) in sequence.

9. The furnace tube of claim 1 or 2, wherein The bottom of the furnace tube is circumferentially provided with a plurality of exhaust openings (80) communicated with the reaction cavity (10), and one end of the exhaust opening (80) extending out of the bottom of the furnace tube is connected with an exhaust device (90); the exhaust device (90) comprises an exhaust pipe (901), a flow rate detection device (902), a cooling device (903), an adjusting valve (904), a filtering device (905), a control valve (906) and a vacuum pump (907); Each of the exhaust openings (80) is communicated with an exhaust pipe (901), and each of the exhaust pipes (901) is sequentially provided with a flow rate detection device (902), a cooling device (903), an adjusting valve (904) and a filtering device (905) along the extension direction thereof; At least one of the filtering devices (905) is communicated with the control valve (906) through the exhaust pipe (901), and the control valve (906) is further communicated with the vacuum pump (907) through the exhaust pipe (901).

10. The furnace tube of claim 1 or 2, wherein The bottom of the side wall of the furnace tube is circumferentially provided with a plurality of exhaust ports (80) communicated with the reaction cavity (10), one end of the exhaust port (80) extending out of the bottom of the furnace tube is connected with an exhaust device (90); the exhaust device (90) comprises an exhaust pipe (901), a flow rate detection device (902), a cooling device (903), a regulating valve (904), a filtering device (905), a control valve (906) and a vacuum pump (907); Each of the exhaust ports (80) is communicated with an exhaust pipe (901), and each of the exhaust pipes (901) is sequentially provided with the flow rate detection device (902), the cooling device (903), the regulating valve (904) and the filtering device (905) along the extending direction thereof; At least one of the filtering devices (905) is communicated with the control valve (906) through the exhaust pipe (901), and the control valve (906) is also communicated with the vacuum pump (907) through the exhaust pipe (901).

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