Water treatment apparatus and water treatment monitoring method
The water treatment device with serially connected UV and ion exchange resin units addresses the challenge of managing persistent TOC components, ensuring rapid and effective ultrapure water production by efficiently removing organic compounds.
Patent Information
- Application Number
- PCT/JP2025/024375
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-08-08
- Filing Date
- 2025-07-07
- Publication Date
- 2026-02-12
AI Technical Summary
Existing water treatment systems struggle to quickly and easily manage water quality, particularly when dealing with persistent TOC components and volatile organic compounds, leading to inconsistent and incomplete treatment of raw water in ultrapure water production systems.
A water treatment device comprising multiple device sets, each with an ultraviolet irradiation device and ion exchange resin filling device, connected in series with a residence time of 15 minutes or less, and a monitoring method that measures and controls water quality at specific points to ensure rapid and effective treatment.
The solution enables rapid and effective management of water quality, achieving ultrapure water with low TOC concentrations and stable treatment outcomes by removing persistent organic compounds efficiently.
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Figure JP2025024375_12022026_PF_FP_ABST
Abstract
Description
Water treatment device and water treatment monitoring method
[0001] The present invention relates to a water treatment device and a water treatment monitoring method.
[0002] In water treatment systems, such as ultrapure water production systems that produce ultrapure water from raw water, attention must be paid to the quality of the raw water supplied to the water treatment system. In such water treatment systems, reverse osmosis (RO) treatment and ultraviolet (UV) oxidation treatment are performed to remove organic matter (TOC: total organic carbon) contained in the raw water. However, some organic components are easily removed by these treatments, while others are not. Until now, tap water and industrial water have been used as the raw water supplied to ultrapure water production systems. In recent years, in order to efficiently utilize water resources, reclaimed water and recycled water, such as factory wastewater, have been used as raw water. The presence of organic matter that is difficult to remove (including TOC (total organic carbon) components excluding TOC components that are difficult to remove) in the raw water may affect the quality of the ultrapure water supplied from the outlet of the ultrapure water production system. TOC components that are difficult to remove using reverse osmosis membrane treatment in RO or ultraviolet oxidation treatment in UV, particularly those that are difficult to decompose and remove using general ultraviolet oxidation treatment, are called "persistent TOC components." For example, urea is known to be difficult to remove using reverse osmosis membrane treatment or general ultraviolet oxidation treatment, and is classified as a "persistent TOC component." Other organic substances besides urea are known to behave as "persistent TOC components." If persistent TOC components are mixed into raw water, they may affect the quality of treated water at the outlet of a water treatment system, such as an ultrapure water production system. In addition to persistent TOC components, there are other organic substances whose presence in raw water significantly affects the quality of treated water. For example, when raw water contains high concentrations of organic substances such as volatile organic compounds (VOCs) such as toluene and xylene, trihalomethanes such as chloroform and bromoform, tetramethylammonium hydroxide (TMAH), and low-molecular-weight alcohols, it is known that these organic substances cannot be completely treated by reverse osmosis membrane treatment or ultraviolet oxidation treatment, and this may affect the quality of the treated water in the water treatment system.Therefore, it is becoming increasingly important to monitor the quality of raw water in ultrapure water production systems and to appropriately manage the operation of the ultrapure water production systems in accordance with the water quality.
[0003] Patent Document 1 discloses an ultrapure water production system for monitoring the quality of raw water, which includes a main ultrapure water production system that produces ultrapure water to be supplied to a point of use and a sub ultrapure water production system that monitors and controls the quality of the raw water. The sub ultrapure water production system has a configuration equivalent to that of the main ultrapure water production system. The sub ultrapure water production system produces ultrapure water of equivalent quality to that produced by the main ultrapure water production system. The TOC concentration of the ultrapure water produced by the sub ultrapure water production system is measured, the quality of the raw water is evaluated based on the measured TOC concentration, and the amount of raw water supplied to the main ultrapure water production system is controlled. In the system described in Patent Document 1, for example, if the TOC concentration of the ultrapure water produced by the sub ultrapure water production system is high, control is performed such as stopping the supply of raw water to the main ultrapure water production system, supplying raw water treated using a urea removal device to the main ultrapure water production system, or increasing the amount of ultraviolet light irradiated on the raw water by an ultraviolet light irradiation device.
[0004] Patent Document 2 discloses providing a pure water production unit for evaluation, separate from a water treatment system, that includes a TOC removal device that performs a unit operation to remove TOC components. Here, the water to be supplied to the water treatment system is treated as the target water, and the TOC concentration is measured at multiple measurement points, including the inlet and outlet of the pure water production unit for evaluation. The TOC concentration values measured at the multiple measurement points are analyzed to evaluate the target water. The supply of the target water to the water treatment system is then controlled based on the evaluation results. For example, if the target water, which is raw water, is determined to contain persistent TOC components, control is performed, such as not supplying the raw water to the water treatment system.
[0005] Patent Document 3 discloses a water treatment management system and a water quality monitoring method, specifically a technology for accurately measuring the TOC concentration of water supplied to a water treatment system without being affected by IC (inorganic carbon) components. This system removes TOC components through a test pure water production unit that includes RO, UV, and an ion exchanger packing device filled with ion exchangers. The system also includes a measuring unit that removes inorganic carbon from the water to be measured using an inorganic carbon removal unit (EDI) and measures the TOC concentration.
[0006] JP 2016-107249 A JP 2019-155275 A JP 2023-150986 A
[0007] The above-mentioned techniques have the problem that water for proper water quality management cannot be obtained quickly and easily.
[0008] An object of the present invention is to provide a water treatment apparatus and a water treatment monitoring method that can quickly and easily obtain water for appropriate water quality management.
[0009] The water treatment device of the present invention has a plurality of device sets, each of which comprises an ultraviolet irradiation device and an ion exchange resin filling device that perform a predetermined treatment on the supplied water to be treated, and which are connected in series in the order of the ultraviolet irradiation device, the ion exchange resin filling device, and the plurality of device sets are connected in series to each other only via piping or only via devices and piping with a residence time of 15 minutes or less.
[0010] Furthermore, the water treatment monitoring method of the present invention includes a water treatment device in which a plurality of device sets, each of which comprises an ultraviolet irradiation device and an ion exchange resin filling device that perform a predetermined treatment on supplied water to be treated, are connected in series in the order of the ultraviolet irradiation device, the ion exchange resin filling device, and the device sets are connected in series only via piping or devices and piping with a residence time of 15 minutes or less, and the method comprises the steps of supplying the water to be treated to the device set located in the front stage, and measuring the water quality of the outlet water of at least one of the device sets.
[0011] In the present invention, water for proper water quality management can be obtained quickly and easily.
[0012] Fig. 1 is a diagram showing one embodiment of a water treatment system to which the water treatment device of the present invention is applied. Fig. 2 is a diagram showing a first embodiment of the water treatment device of the present invention. Fig. 3 is a flowchart for explaining an example of a water treatment monitoring method in the water treatment device shown in Fig. 2. Fig. 4 is a diagram showing the configuration of a first device example. Fig. 5 is a diagram showing the configuration of a second device example. Fig. 6 is a diagram showing a second embodiment of the water treatment device of the present invention. Fig. 7 is a diagram showing one embodiment of a water treatment device in which an inter-set device is arranged between two device sets.
[0013] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0014] Fig. 1 is a diagram showing one embodiment of a water treatment system to which the water treatment device of the present invention is applied. As shown in Fig. 1, water to be treated is supplied to a water production system 3. The water to be treated is stored in a water tank 2 via a valve 1, and is supplied from the water tank 2 to the water production system 3 using a pump or the like.
[0015] The water production system 3 includes a sand filtration device 301, an activated carbon device AC302, a heat exchanger HEX303, a reverse osmosis membrane device RO304, an ultraviolet irradiation device UV305, an ion exchange device IER306, a degassing device DG307, a tank 308, HEX309, UV310, an ion exchange resin filling device CP311, a degassing membrane device MD312, and an ultrafiltration membrane device UF313. These components of the water production system 3 are connected in series in the order described above. Treated water from UF313 is supplied to a point of use as ultrapure water. A portion of the treated water from UF313 is returned to the tank 308. The sand filter 301, AC 302, HEX 303, RO 304, UV 305, IER 306, and DG 307 constitute a so-called pretreatment device and primary pure water production device. The tank 308, HEX 309, UV 310, CP 311, MD 312, and UF 313 constitute a so-called subsystem of the secondary pure water production device.
[0016] The water treatment device 100 is a monitoring device that performs a predetermined treatment on the water to be treated that is supplied to the water production system 3, and monitors the quality of the treated water (ultrapure water) obtained by treating the water to be treated by the water production system 3. The water treatment device 100 may also perform a predetermined treatment on the outlet water of the AC 302 or RO 304 provided in the water production system 3, and monitor the quality of the treated water obtained by treating the water to be treated by the water production system 3. (First embodiment)
[0017] FIG. 2 is a diagram showing a first embodiment of a water treatment device of the present invention. The water treatment device 100 shown in FIG. 2 is disposed in the position of the water treatment device 100 shown in FIG. 1. As shown in FIG. 2, the water treatment device 100 of this embodiment includes an RO 10, an EDI 11, an MD 12, a UV 13-1, a CP 14-1, a UV 13-2, and a CP 14-2, which are connected in series to each other in this order. The UV 13-1 and the CP 14-1 constitute an apparatus set 110-1. The UV 13-2 and the CP 14-2 constitute an apparatus set 110-2. The CP 14-1 of the apparatus set 110-1 and the UV 13-2 of the apparatus set 110-2 are connected only via piping. While FIG. 2 shows an example in which there are two apparatus sets, there may be three or more apparatus sets. Even when the number of apparatus sets is three or more, they are connected to each other only via piping. The RO 10, UVs 13-1 and 13-2, and CPs 14-1 and 14-2 are all TOC removal devices that perform a unit operation to remove TOC components.
[0018] The RO 10 is a reverse osmosis membrane device that concentrates the supplied water to be treated and discharges concentrated water and permeated water. The RO 10 may be a multi-stage device in which permeated water from a previous reverse osmosis membrane is supplied to a subsequent reverse osmosis membrane. The type of reverse osmosis membrane used in the RO 10 is not particularly limited. For example, from the viewpoint of energy saving in the pump, it is preferable to use an ultra-low pressure membrane or an extremely low pressure membrane as the reverse osmosis membrane used in the RO 10. It is also possible to use an RO membrane with higher permeability than an extremely low pressure membrane. The RO 10 is preferably operated at a recovery rate of 15 to 50%. The permeated water from the RO 10 (RO permeate) is supplied to the EDI 11.
[0019] The EDI 11 is an electrodeionized water production device that removes inorganic carbon. The EDI 11 can be placed between the RO 10 and the UV 13-1 to improve the TOC removal efficiency in the UV 13-1. It is preferable to place the MD 12 downstream of the EDI 11, as shown in FIG. 2.
[0020] The MD 12 is a degassing membrane device that removes gas from the treated water from the EDI 11. The type of MD 12 is not particularly limited. Any device that can remove dissolved oxygen can be used as the MD 12. For example, the MD 12 can be any of a vacuum degassing device, a membrane degassing device, and a nitrogen degassing device.
[0021] UV13-1 is an ultraviolet irradiation device that performs ultraviolet oxidation treatment on treated water from MD12. UV13-2 is an ultraviolet irradiation device that performs ultraviolet oxidation treatment on treated water from CP14-1. The ultraviolet irradiation dose of UV13-1 and 13-2 is not particularly limited. UV13-1 and 13-2 may be, for example, 0.05 to 3 kWh / m 3 The amount of ultraviolet light irradiation by UV13-1 and 13-2 may be adjusted by adjusting the output of UV13-1 and 13-2. The amount of ultraviolet light irradiation by UV13-1 and 13-2 may also be adjusted by adjusting the flow rate to UV13-1 and 13-2. The amount of ultraviolet light irradiation by UV13-1 and 13-2 may also be adjusted by adjusting both the output of UV13-1 and 13-2 and the flow rate to UV13-1 and 13-2.
[0022] CP14-1 and CP14-2 are ion exchange resin filling devices that perform ion exchange treatment by supplying treated water from UV13-1 and UV13-2, respectively. CP14-1 and CP14-2 may be cartridge polishers (CPs) (also called non-regenerative ion exchange devices) filled with a mixed bed of anion exchange resin and cation exchange resin. At least one of CP14-1 and CP14-2 may be an SBP (multi-bed countercurrent regenerative ion exchange device).
[0023] Also provided is a valve 30 that controls the discharge of treated water treated by CP14-2. Also provided is a TOC meter 40 that measures the TOC (Total Organic Carbon) concentration, which indicates the water quality value of the treated water. TOC meter 40 is a measuring instrument that measures the water quality values of the inlet water of RO10, the outlet water of MD12, the outlet water of CP14-1, and the outlet water of CP14-2 supplied to the water treatment device 100. Valves 20-1 to 20-4 are respectively disposed between the inlet of RO10, the outlet of MD12, the outlet of CP14-1, and the outlet of CP14-2 and the TOC meter 40. The target of water quality measurement by TOC meter 40 is selected based on the opening and closing of each of valves 20-1 to 20-4. The TOC meter 40 may also measure the water quality values of the outlet water of the RO 10 and the outlet water of the EDI 11. Furthermore, the measuring device may be a measuring device that measures water quality other than TOC, such as urea concentration or hydrogen peroxide (hydrogen peroxide), or a measuring device that can measure a combination of multiple components.
[0024] The control unit 50 is also provided. The TOC meter 40 and the control unit 50 are connected to each other so as to be able to communicate with each other via wire or wirelessly. The TOC meter 40 transmits the measured values to the control unit 50. The control unit 50 acquires the measured values transmitted from the TOC meter 40. The control unit 50 controls the supply of the water to be treated to the water producing system 3 based on the acquired measured values. Specifically, for example, if the acquired measured values exceed a predetermined threshold, the control unit 50 closes valve 1 to stop the supply of the water to be treated to the water producing system 3. Furthermore, if the acquired measured values fall below the predetermined threshold, the control unit 50 opens valve 1 to start the supply of the water to be treated to the water producing system 3. In addition to controlling the supply of the water to the water producing system 3, the control unit 50 may also control the operation of the water producing system 3 based on the acquired measured values. For example, if the acquired measured values exceed a predetermined threshold, the control unit 50 may increase the amount of treated water circulated from the UF 313 to the tank 308. Furthermore, for example, the control unit 50 may decompose and remove (persistent) TOC components by combining the addition of persulfuric acid (peroxodisulfuric acid) or its salt to the water to be treated with ultraviolet oxidation treatment based on the acquired measurement value. Furthermore, in a configuration in which other water to be treated is supplied to the water tank 2 via other valves, the control unit 50 may control the water tank 2 to close valve 1 and open the other valves so that the other water to be treated is supplied to the water production system 3 via the other valves if the acquired measurement value exceeds a predetermined threshold. Furthermore, the control unit 50 may adjust the openings of valve 1 and the other valves to reduce the amount of water to be treated supplied to the water production system 3 via valve 1 and increase the amount of water to be treated supplied to the water production system 3 via the other valves if the acquired measurement value exceeds a predetermined threshold.
[0025] As pretreatment for the raw water supplied to the water treatment device 100, water may be passed through a cartridge filter or activated carbon, or chemicals such as acid or alkali may be added. Pretreatment is particularly useful when treating water with a high TOC concentration, such as tap water or recycled water. To prevent clogging of the RO 10, a dispersant or slime control agent may be added to the water to be treated during pretreatment. A heat exchanger may also be added during pretreatment to adjust the temperature of the water to be treated.
[0026] A method for monitoring water treatment in the water treatment device 100 shown in Fig. 2 will be described below. Fig. 3 is a flowchart for explaining an example of a method for monitoring water treatment in the water treatment device 100 shown in Fig. 2.
[0027] First, after the flow of water to be treated through the water treatment device 100 is started (step S1), the control unit 50 determines whether a predetermined time has elapsed (step S2). This predetermined time is the time from when the flow of water to be treated through the water treatment device 100 is started until the water is treated through the RO 11 and CP 14-2 and discharged. If the predetermined time has elapsed since the flow of water to be treated began, the TOC meter 40 measures the water quality of the treated water (step S3). Based on the water quality value of the outlet water from CP 14-2 measured by the TOC meter 40, the control unit 50 controls the operation of the water production system 3 as described above.
[0028] Below, we will explain the results of a comparison of TOC concentrations when water to be treated was passed through the water treatment device 100 shown in FIG. 2 and two other device examples. FIG. 4 is a diagram showing the configuration of a first device example. FIG. 5 is a diagram showing the configuration of a second device example. As shown in FIG. 4, the configuration of the first device example is a configuration in which the UV and CP device set in the water treatment device 100 shown in FIG. 2 is one (UV13 and CP14). As shown in FIG. 5, the configuration of the second device example is a configuration in which two UVs shown in FIG. 4 are connected in parallel (UV13-3 and UV13-4). Table 1 shows the TOC values of the water to be treated (raw water) supplied to each device, the TOC values of the treated water (outlet water) from EDI11, the TOC values of the treated water (outlet water) from CP14-2 or CP14, and the TOC removal rate from EDI11 to the treated water discharged from CP14-2 or CP14. Here, Example 1 shows the results for the water treatment device 100 shown in FIG. 2. Comparative Example 1 shows the results for the first device example shown in FIG. 4. Comparative Example 2 shows the results for the second device example shown in FIG. 5. In addition, the flow rate of the water to be treated (water treated by EDI11) in Example 1 and Comparative Example 2 was set to 36 L / h. In Comparative Example 1, the flow rate of the water to be treated (water treated by EDI11) was set to 18 L / h, and the ultraviolet irradiation dose of each of UV13-1 to 13-4 was 2.06 ÷ 2 = 1.03 kWh / m. 3 The UV irradiation dose of UV13 is 2.06 kWh / m 3 It was decided.
[0029] The specifications of the apparatus used here are as follows: <RO11> ESPA2-4021 (Nitto Denko Corporation) Recovery rate: 50%, Flux: 0.6 m / d, Membrane area: 3.5 m 2 <UV13, 13-1 to 13-4> Low-pressure ultraviolet oxidation device (Photoscience Co., Ltd.) Irradiation dose: 0.5 to 3 kWh / m 3 <CP14, 14-1 to 14-2> ESP-2 Organo Corporation Liquid flow rate: 18 to 180 (L / L-R) / h <TOC meter 40> Online TOC concentration meter m9e (Sievers) Online TOC concentration meter 500RLe (Sievers)
[0030] The results shown in Table 1 indicate that the water treatment device 100 shown in Example 1 can treat water with a TOC concentration of less than 0.2 ppb, thereby enabling the production of highly pure water. Incidentally, when the same water to be treated was passed through the water production system 3 shown in Figure 1 and the TOC concentration of the water at the outlet of UF313 was measured, the TOC concentration of the water at the outlet of UF313 was 0.2 ppb or less. On the other hand, the TOC concentration at the outlet of the first example device shown in Comparative Example 1 was 0.4 to 0.8 ppb, which is more unstable and has a lower removal rate than Example 1 under the same irradiation dose conditions. It can be seen that when the TOC concentration of the water to be treated (raw water) increases in the second example device shown in Comparative Example 2, the organic components cannot be completely treated. Regarding the TOC removal rate from EDI11 to the treated water discharged from CP14-2 or CP14, Comparative Examples 1 and 2 were 50% or less, while Example 1 achieved a result of 80% or more.
[0031] In the system described in Patent Document 1, the main ultrapure water production system and the sub ultrapure water production system are equivalent, and the sub ultrapure water production system is configured to produce ultrapure water of the same quality as the ultrapure water produced by the main ultrapure water production system. This results in a large system size. Furthermore, because of this equivalent configuration, the residence time in the sub ultrapure water production system cannot be significantly shorter than the residence time in the main ultrapure water production system. As a result, the system is unable to respond to sudden changes in the quality of the raw water, making operational management of the ultrapure water production system difficult.
[0032] Furthermore, in the evaluation systems described in Patent Documents 2 and 3, the ultraviolet oxidation device and the ion exchange device are connected in a single stage. Therefore, even if the raw water contains organic matter that can be removed by the main pure water production system, the organic matter may remain in the treated water in the evaluation system. The ultraviolet oxidation device irradiates the water to be treated with ultraviolet light to oxidize the organic matter into organic acids, which are then removed by the downstream ion exchange device. During this process, the organic acids produced in the ultraviolet oxidation device block (absorb) the ultraviolet light. In other words, the organic acids create areas that are not exposed to UV light. Therefore, even if the UV irradiation dose in the ultraviolet oxidation device is increased, the organic acids produced increase, and the ultraviolet oxidation device is unable to sufficiently remove the organic matter from the water to be treated. As a result, the organic matter (TOC) concentration increases in the evaluation system, making it difficult to accurately detect the inflow of persistent substances into the main pure water production system.
[0033] On the other hand, in this embodiment, multiple equipment sets, each with a UV and a CP, are arranged in series. The CP removes organic acids generated by UV irradiation of the water to be treated with UV light from the first equipment set, and the UV of the second equipment set then irradiates the water to be treated with UV light from which organic acids that interfere with UV irradiation have been removed. This allows the UV of the second equipment set to remove organic components that were not completely removed in the first stage. This allows water to be obtained for appropriate water quality management. Furthermore, no other water treatment devices (e.g., tank 308 shown in FIG. 1 ) are placed between the equipment sets; instead, the equipment sets are connected only by piping. This shortens the retention time from the supply of water to the discharge of ultrapure water. In reality, it takes more than 10 hours from the supply of water to the discharge of ultrapure water in the water production system 3, but in the water treatment device 100, this retention time can be reduced to approximately one hour. Therefore, if the water treatment device 100 is used as a device for monitoring the quality of raw water or ultrapure water, the water quality value of the ultrapure water produced by the water production system 3 using raw water can be obtained quickly. (Second embodiment)
[0034] FIG. 6 is a diagram showing a second embodiment of a water treatment device of the present invention. The water treatment device 101 shown in FIG. 6 is disposed in the position of the water treatment device 100 shown in FIG. 1. In the water treatment device 101 of this embodiment, as shown in FIG. 6, the MD 12 provided in the water treatment device 100 shown in FIG. 2 is disposed between the CP 14-1 of the device set 110-1 and the UV 13-2 of the device set 110-2. In other words, the device sets 110-1 and 110-2 are connected only via the MD 12 and piping. The MD 12 may be disposed both in the position shown in FIG. 6 and in the position shown in FIG. 6. Furthermore, if another device set is connected downstream of the device set 110-2, a degassing membrane device may also be disposed between the device set and the device set 110-2. In other words, in this embodiment, the device set and the device set downstream of the device set are connected only via piping or via piping and the MD 12.
[0035] The device disposed between an equipment set and an equipment set disposed downstream of the equipment set (hereinafter referred to as the inter-set device) is not limited to the degassing membrane device as in the second embodiment. The inter-set device may be any device in which the residence time of the inflowing treated water from the time of treatment to the time of discharge is within a specified time. The specified time is a time in which the time from when the treated water is supplied to the water treatment device of the present invention to when the ultrapure water is discharged is sufficiently short compared to the time from when the treated water is supplied to the water production system 3 shown in FIG. 1 to when the ultrapure water is discharged. For example, the specified time is 15 minutes, preferably 6 minutes, and more preferably 3 minutes. Examples of inter-set devices include, in addition to degassing membrane devices, filtration membrane devices, filters, pumps, valves, etc. As long as the specified time is met, the inter-set device may be a combination of multiple devices. On the other hand, tanks (water tanks) for storing the treated water or treated water are not preferable as inter-set devices. In this way, by providing an inter-set device that processes in a sufficiently short time compared to the water production system 3 shown in Figure 1, the water quality value of the ultrapure water produced by the water production system 3 can be obtained quickly.
[0036] FIG. 7 is a diagram showing one embodiment of a water treatment device 102 in which an inter-set device is disposed between two device sets. The components of the water treatment device 102 shown in FIG. 7 , except for the inter-set device 15, are the same as those of the water treatment device 101 in the second embodiment. The inter-set device 15 is disposed between the device sets 110-1 and 110-2. In a configuration in which the inter-set device 15 is not disposed, i.e., in a configuration in which the device sets 110-1 and 110-2 are connected only via piping, the time from when the water to be treated is supplied to the water treatment device 102 to when it is discharged is 45 minutes. Therefore, as described above, in order to keep the residence time from when the water to be treated is supplied to the water treatment device 102 to when it is discharged within one hour, it is necessary to dispose an inter-set device 15 in which the residence time from when the water to be treated flows into the inter-set device 15 and when it is treated and discharged from the inter-set device 15 is 15 minutes or less. For example, if an inter-set device 15 with a residence time of 10 minutes is installed, the residence time from when the water to be treated is supplied to the water treatment device 102 until it is discharged will be less than one hour (45 minutes + 10 minutes = 55 minutes). On the other hand, if an inter-set device 15 is installed such that the residence time from when the water to be treated flows into the inter-set device 15 until it is treated and discharged from the inter-set device 15 exceeds 15 minutes, the residence time from when the water to be treated is supplied to the water treatment device 102 until it is discharged will exceed one hour, and the above-mentioned condition (within one hour) will not be met. For example, if an inter-set device 15 with a residence time of 30 minutes is installed, the residence time will be (45 minutes + 30 minutes = 75 minutes), and the residence time from when the water to be treated is supplied to the water treatment device 102 until it is discharged will exceed one hour. In addition, the condition (target value) for the residence time of the water treatment device 102, such as the above-mentioned one hour, may be set based on the actual measured value of the time from when the treated water is supplied to the water treatment device 102 to when it is discharged in a configuration in which the inter-set device 15 is not installed, or the actual measured value of the time from when the treated water is supplied to the water production system 3 to when the ultrapure water is discharged.
[0037] As described above, the water treatment device 100 shown in Fig. 2 and the water treatment device 101 shown in Fig. 6 are devices that can predict (manage) the quality of treated water passed through the water production system 3 arranged in parallel. Therefore, the configuration of the water treatment device 100 shown in Fig. 2 or the configuration of the water treatment device 101 shown in Fig. 6 can also be used as a so-called primary pure water production device or secondary pure water production device.
[0038] This application claims priority based on Japanese Patent Application No. 2024-132046, filed on August 8, 2024, the disclosure of which is incorporated herein in its entirety by reference.
[0039] 1, 20, 20-1 to 20-4, 30 Valve 2 Water tank 3 Water production system 10, 304 RO 11 EDI 12, 312 MD 13, 13-1 to 13-4, 305, 310 UV 14, 14-1, 14-2, 311 CP 15 Inter-set device 40 TOC meter 50 Control unit 100 to 102 Water treatment device 110-1, 110-2 Device set 301 Sand filter 302 AC 303, 309 HEX 306 IER 307 DG 308 Tank 313 UF
Claims
1. A water treatment device having a plurality of equipment sets, each of which comprises an ultraviolet irradiation device and an ion exchange resin filling device that perform a predetermined treatment on the supplied water to be treated, connected in series in the order of the ultraviolet irradiation device, the ion exchange resin filling device, and the plurality of equipment sets connected in series to each other only via piping or devices and piping with a residence time of 15 minutes or less.
2. The water treatment device according to claim 1, wherein the device having a retention time of 15 minutes or less is a degassing membrane device, a filtration membrane device, a filter, a pump, or a valve.
3. A water treatment device according to claim 1 or 2, wherein a degassing membrane device is disposed in front of the device set disposed in the forefront stage of the plurality of device sets.
4. The water treatment device according to claim 1 or 2, further comprising a measuring device for measuring the quality of the outlet water of at least one of the plurality of device sets.
5. A water treatment device according to claim 4, further comprising a control unit that controls the operation of a water production system to which the water to be treated is supplied based on the measurement value measured by the measuring device.
6. The water treatment device according to claim 1 or 2, wherein the number of the plurality of device sets is two.
7. A water treatment monitoring method in which a plurality of equipment sets, each of which comprises an ultraviolet irradiation device and an ion exchange resin filling device that perform a predetermined treatment on supplied water to be treated, are connected in series in the order of the ultraviolet irradiation device, the ion exchange resin filling device, and the sets are connected in series only via piping or devices and piping with a residence time of 15 minutes or less, the method comprising: supplying the water to be treated to the equipment set located in the front stage; and measuring the water quality of the outlet water of at least one of the plurality of equipment sets.
Citation Information
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