Display substrate and display apparatus
By setting a protruding or recessed structure of a transparent shielding layer in the display substrate, the electrodes of adjacent light-emitting elements are isolated, which solves the problem of low transmittance of metal cathodes, improves light transmittance and voltage uniformity, and enhances the effect of under-display camera and face recognition.
Patent Information
- Application Number
- PCT/CN2025/108040
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-08-30
- Filing Date
- 2025-07-11
- Publication Date
- 2026-03-05
AI Technical Summary
In existing technologies, the transmittance of metal cathodes is relatively low, which affects the effectiveness of under-display camera and under-display facial recognition technologies.
Design a display substrate including a substrate, a plurality of first light-emitting elements, a pixel definition layer, a first transparent conductive layer and a first transparent shielding layer. By providing a protrusion or a recess in the first transparent shielding layer, the second electrode of the adjacent light-emitting element is isolated and made to contact the transparent conductive layer, thereby improving the light transmittance.
It improves the light transmittance of the display area and ensures the voltage uniformity of the light-emitting elements, thereby enhancing the effect of under-display camera and face recognition.
Smart Images

Figure CN2025108040_05032026_PF_FP_ABST
Abstract
Description
Display substrate and display device
[0001] This application claims priority to Chinese Patent Application No. 202411217907.3, filed on August 30, 2024, entitled “Display Substrate and Display Device”, the contents of which are to be understood as incorporated herein by reference. Technical Field
[0002] This article relates to, but is not limited to, the field of display technology, and in particular to a display substrate and a display device. Background Technology
[0003] Organic light-emitting diodes (OLEDs) and quantum dot light-emitting diodes (QLEDs) are active-matrix display devices with advantages such as self-illumination, wide viewing angle, high contrast, low power consumption, extremely fast response speed, thinness, flexibility, and low cost. Under-display cameras and under-display facial recognition technology are novel technologies proposed to increase the screen-to-body ratio of display devices. However, the low transmittance of currently used metal cathodes affects the effectiveness of under-display camera and facial recognition technologies. Summary of the Invention
[0004] The following is an overview of the subject matter described in detail herein. This overview is not intended to limit the scope of the claims.
[0005] This application provides a display substrate and a display device.
[0006] This embodiment provides a display substrate comprising: a substrate, a plurality of first light-emitting elements, a pixel definition layer, a first transparent conductive layer, and a first transparent shielding layer. The substrate includes a first display area. The plurality of first light-emitting elements are located in the first display area. Each first light-emitting element includes: a first electrode, a light-emitting functional layer, and a second electrode stacked together, with the first electrode located on the side of the second electrode closer to the substrate. The pixel definition layer is located on the side of the plurality of first light-emitting elements away from the substrate from the first electrodes. The pixel definition layer has a plurality of first pixel openings in the first display area. The light-emitting functional layer and the second electrode of each first light-emitting element are disposed within the first pixel openings, and the light-emitting functional layer contacts the first electrode through the first pixel openings. The first transparent conductive layer is located on the side of the pixel definition layer away from the substrate. The first transparent shielding layer is located on the side of the first transparent conductive layer away from the substrate; the orthographic projection of the first transparent conductive layer on the substrate at least partially overlaps with the orthographic projection of the first transparent shielding layer on the substrate. In this configuration, the first transparent conductive layer has a first conductive side surface near the first pixel opening, and a second electrode disposed at the first pixel opening contacts the first conductive side surface of the first transparent conductive layer; the first transparent shielding layer has a first protrusion extending beyond the first conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, and the first protrusion does not contact the first transparent conductive layer. Alternatively, the first transparent conductive layer has at least one first recess, the orthographic projection of the first recess onto the substrate is within the orthographic projection range of the pixel defining layer onto the substrate, the first transparent conductive layer has a second conductive side surface surrounding the first recess, and the second conductive side surface contacts the second electrode of the first light-emitting element; the first transparent shielding layer has at least one shielding opening communicating with the first recess, the orthographic projection of the shielding opening onto the substrate being within the orthographic projection range of the first recess onto the substrate, the first transparent shielding layer has a second protrusion extending beyond the second conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, and the second protrusion does not contact the first transparent conductive layer.
[0007] In some exemplary embodiments, the display substrate further includes: a non-emitting functional layer, a non-emitting electrode layer, a first inorganic encapsulation layer, and a second inorganic encapsulation layer. The non-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate. The non-emitting electrode layer is located on the side of the non-emitting functional layer away from the substrate. The first inorganic encapsulation layer is located on the side of the second electrode and the non-emitting electrode layer away from the substrate, and the first inorganic encapsulation layer has at least one first encapsulation opening in the first display area, the orthographic projection of the first encapsulation opening onto the substrate being within the orthographic projection range of the pixel definition layer onto the substrate. The second inorganic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate, and the second inorganic encapsulation layer contacts the non-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening.
[0008] In some exemplary embodiments, the display substrate further includes: a non-emitting functional layer, a non-emitting electrode layer, a first inorganic encapsulation layer, and an organic encapsulation layer. The non-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate. The non-emitting electrode layer is located on the side of the non-emitting functional layer away from the substrate. The first inorganic encapsulation layer is located on the side of the second electrode and the non-emitting electrode layer away from the substrate, and the first inorganic encapsulation layer has at least one first encapsulation opening in the first display area, the orthographic projection of the first encapsulation opening onto the substrate being within the orthographic projection range of the pixel definition layer onto the substrate. The organic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate, and the organic encapsulation layer contacts the non-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening.
[0009] In some exemplary embodiments, the display substrate further includes: at least one second transparent conductive layer, the second transparent conductive layer being located between the first transparent conductive layer and the first transparent shielding layer; the orthographic projection of the first transparent conductive layer on the substrate at least partially overlaps with the orthographic projection of the second transparent conductive layer on the substrate.
[0010] In some exemplary embodiments, the second transparent conductive layer has a third conductive side surface near the opening of the first pixel; a first protrusion of the first transparent shielding layer protrudes from the third conductive side surface of the second transparent conductive layer in a direction parallel to the substrate, and the first protrusion does not contact the second transparent conductive layer.
[0011] In some exemplary embodiments, the display substrate further includes: at least one second transparent shielding layer, the second transparent shielding layer being located on the side of the first transparent shielding layer near the substrate, and the orthographic projection of the second transparent shielding layer on the substrate at least partially overlapping the orthographic projection of the first transparent shielding layer on the substrate.
[0012] In some exemplary embodiments, the orthographic projection of the second transparent shielding layer onto the substrate is within the orthographic projection range of the first transparent conductive layer onto the substrate, and the orthographic projection of the first transparent conductive layer onto the substrate is within the orthographic projection range of the first transparent shielding layer onto the substrate.
[0013] In some exemplary embodiments, the display substrate further includes: a third transparent conductive layer located between the first transparent shielding layer and the second transparent shielding layer; the third transparent conductive layer covers the surface and side of the second transparent shielding layer away from the substrate, and the third transparent conductive layer is in contact with a portion of the surface of the first transparent conductive layer away from the substrate.
[0014] In some exemplary embodiments, the display substrate further includes: a pixel definition protection layer, the pixel definition protection layer being located between the pixel definition layer and the first transparent conductive layer; the pixel definition protection layer covering the surface and side of the pixel definition layer away from the substrate.
[0015] In some exemplary embodiments, the orthographic projection of the pixel definition layer onto the substrate is located within the orthographic projection range of the first transparent conductive layer onto the substrate.
[0016] In some exemplary embodiments, the thickness of the first transparent conductive layer ranges from 0.2 micrometers to 5 micrometers, and the thickness of the first transparent shielding layer ranges from 0.03 micrometers to 3 micrometers.
[0017] In some exemplary embodiments, the minimum distance between the boundary of the first transparent conductive layer near the first pixel opening and the boundary of the first transparent blocking layer near the first pixel opening is 0.3 micrometers to 5 micrometers. The minimum distance between the boundary of the first transparent conductive layer near the first pixel opening and the boundary of the pixel defining layer is 0.2 micrometers to 10 micrometers.
[0018] In some exemplary embodiments, the substrate further includes: a second display area; the second display area is located on at least one side of the first display area, and the light transmittance of the second display area is less than that of the first display area.
[0019] In some exemplary embodiments, the display substrate further includes: a plurality of first spacer pillars and a plurality of second light-emitting elements located in the second display area. The plurality of first spacer pillars are disposed in the plurality of second light-emitting elements, and one of the plurality of first spacer pillars includes: a first pillar layer and a second pillar layer, wherein the first pillar layer and the first transparent conductive layer are of the same layer structure, and the second pillar layer and the first transparent shielding layer are of the same layer structure.
[0020] In some exemplary embodiments, the display substrate further includes: a first inorganic encapsulation layer located on the side of the second electrode away from the substrate. The first inorganic encapsulation layer covers the orthographic projection of the plurality of first spacer pillars on the substrate in the second display area; or, the first inorganic encapsulation layer has at least one second encapsulation opening in the second display area, the orthographic projection of the second encapsulation opening on the substrate being located within the orthographic projection range of the pixel definition layer on the substrate.
[0021] In some exemplary embodiments, the display substrate further includes a second inorganic encapsulation layer located on the side of the first inorganic encapsulation layer away from the substrate. The second inorganic encapsulation layer contacts the first spacer pillar through the second encapsulation opening.
[0022] In some exemplary embodiments, the display substrate further includes a plurality of second spacer pillars located in the first display area and the second display area. The plurality of second spacer pillars in the first display area are located on the side of the first transparent shielding layer away from the substrate, and the plurality of second spacer pillars in the second display area are in contact with the pixel definition layer.
[0023] On the other hand, this embodiment provides a display device, including a display substrate as described above, and a sensor located on the non-display side of the display substrate, wherein the orthographic projection of the sensor on the display substrate at least partially overlaps with a first display area of the display substrate.
[0024] On the other hand, this embodiment provides a method for fabricating a display substrate, comprising: sequentially forming a first electrode of a plurality of first light-emitting elements, a pixel definition layer, a first transparent conductive layer, and a first transparent shielding layer on a substrate; sequentially depositing a light-emitting functional film and a conductive film, forming a light-emitting functional layer and a second electrode of the first light-emitting element within a first pixel opening; depositing a first inorganic encapsulation film, and patterning the first inorganic encapsulation film and the conductive film located on the first transparent shielding layer using the same patterning process to form a first inorganic encapsulation layer and an inactive conductive layer. Wherein, the first electrodes of the plurality of first light-emitting elements are located in a first display area, the pixel definition layer is located on the side of the first electrodes of the plurality of first light-emitting elements away from the substrate, and the pixel definition layer has a plurality of first pixel openings in the first display area exposing the first electrodes of the plurality of first light-emitting elements; the first transparent conductive layer is located on the side of the pixel definition layer away from the substrate, the first transparent shielding layer is located on the side of the first transparent conductive layer away from the substrate, and the orthographic projection of the first transparent conductive layer on the substrate is within the orthographic projection range of the first transparent shielding layer on the substrate. The light-emitting functional layer of the adjacent first light-emitting element is separated by the first transparent shielding layer; the second electrode of the adjacent first light-emitting element is separated by the first transparent shielding layer and is in contact with the first transparent conductive layer.
[0025] In some exemplary embodiments, the fabrication method may further include at least one of the following: retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the light-emitting functional film located on the first transparent shielding layer; retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the first transparent shielding layer; retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the first transparent conductive layer. This example utilizes the photoresist layer from the fabrication process of the first inorganic encapsulation layer to further etch at least one of the light-emitting functional film, the first transparent shielding layer, and the first transparent conductive layer, which can further improve the light transmittance of the first display area.
[0026] The display substrate provided in this embodiment, by providing a first transparent shielding layer with a first protrusion or a second protrusion protruding from the first transparent conductive layer, can ensure that the second electrodes of adjacent first light-emitting elements are isolated during the manufacturing process, and that the second electrodes of multiple first light-emitting elements are in contact with the first transparent conductive layer, thereby improving the light transmittance of the first display area and ensuring the voltage uniformity of the second electrodes of multiple first light-emitting elements in the first display area.
[0027] Other features and advantages of this application will be set forth in the following description, and will be apparent in part from the description, or may be learned by practicing the application. Other advantages of this application can be realized and obtained by means of the solutions described in the description and the accompanying drawings.
[0028] Overview of the attached figures
[0029] The accompanying drawings are used to provide an understanding of the technical solutions of this application and constitute a part of the specification. They are used together with the embodiments of this application to explain the technical solutions of this application and do not constitute a limitation on the technical solutions of this application.
[0030] Figure 1 is a schematic diagram of various structures of a display substrate according to at least one embodiment of the present disclosure;
[0031] Figure 2 is a schematic diagram of the planar structure of the display area of a display substrate according to at least one embodiment of the present disclosure;
[0032] Figures 3A and 3B are partial top views of the first display area of at least one embodiment of the present disclosure;
[0033] Figures 4 and 5 are schematic diagrams of partial cross-sections along the QQ' direction in Figure 3A;
[0034] Figure 6 is a partial cross-sectional schematic diagram of the display substrate after the pixel definition layer is formed in at least one embodiment of the present disclosure;
[0035] Figure 7 is a partial cross-sectional schematic diagram of the display substrate after the formation of the first transparent shielding layer in at least one embodiment of the present disclosure;
[0036] Figure 8 is a partial cross-sectional schematic diagram of a display substrate after the formation of the first transparent conductive layer in at least one embodiment of the present disclosure;
[0037] Figure 9 is a partial cross-sectional schematic diagram of a display substrate after the formation of a light-emitting functional layer and a cathode layer in at least one embodiment of the present disclosure;
[0038] Figure 10 is a partial cross-sectional schematic diagram of the display substrate after the formation of the first inorganic encapsulation layer in at least one embodiment of the present disclosure;
[0039] Figure 11 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0040] Figure 12 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0041] Figure 13 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0042] Figure 14 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0043] Figure 15 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0044] Figure 16 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0045] Figure 17 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0046] Figure 18 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0047] Figure 19 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0048] Figure 20 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0049] Figure 21 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0050] Figure 22 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0051] Figure 23 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0052] Figure 24 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0053] Figure 25 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0054] Figure 26 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0055] Figure 27 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure;
[0056] Figure 28 is another partial top view of the first display area according to at least one embodiment of the present disclosure;
[0057] Figure 29 is another partial top view of the second display area according to at least one embodiment of the present disclosure;
[0058] Figure 30 is a partial cross-sectional view along the PP' direction in Figure 29;
[0059] Figure 31 is another partial cross-sectional view along the PP' direction in Figure 29;
[0060] Figure 32 is another partial top view of the second display area according to at least one embodiment of the present disclosure;
[0061] Figure 33 is a partial cross-sectional view along the SS' direction in Figure 32;
[0062] Figure 34 is a partial cross-sectional schematic diagram of a first display area according to at least one embodiment of the present disclosure;
[0063] Figure 35 is a schematic diagram of a display device according to at least one embodiment of the present disclosure.
[0064] Detailed Explanation
[0065] The embodiments of this disclosure will now be described in detail with reference to the accompanying drawings. The implementation can be carried out in many different forms. Those skilled in the art will readily understand that the methods and content can be transformed into other forms without departing from the spirit and scope of this disclosure. Therefore, this disclosure should not be construed as limited to the content described in the following embodiments. Unless otherwise specified, the embodiments and features in the embodiments of this disclosure can be arbitrarily combined with each other.
[0066] In the accompanying drawings, the size of one or more constituent elements, the thickness of layers, or areas are sometimes exaggerated for clarity. Therefore, this disclosure is not necessarily limited to these dimensions, and the shape and size of one or more parts in the drawings do not reflect true proportions. Furthermore, the drawings schematically illustrate ideal examples, and this disclosure is not limited to the shapes or values shown in the drawings.
[0067] The ordinal numbers such as "first," "second," and "third" used in this specification are used to avoid confusion among the constituent elements, not to limit the quantity. The term "multiple" in this disclosure refers to two or more quantities.
[0068] In this specification, for convenience, terms such as "middle," "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer" are used to indicate orientation or positional relationships in conjunction with the accompanying drawings. This is solely for the purpose of facilitating the description and simplification, and does not imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this disclosure. The positional relationships of the constituent elements may be appropriately varied depending on the orientation of the constituent elements being described. Therefore, the use of terms not limited to those described in the specification may be appropriately replaced as needed.
[0069] In this specification, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they may refer to a fixed connection, a detachable connection, or an integral connection; a mechanical connection or joint; a direct connection, an indirect connection via an intermediate component, or a connection within two components. Those skilled in the art will understand the meaning of these terms in this disclosure as appropriate.
[0070] In this specification, "electrical connection" includes the situation where components are connected together by elements that have a certain electrical function. There are no particular limitations on what constitutes an "electrical function," as long as it allows for the transmission of electrical signals between the connected components. Examples of "electrical functions" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other multifunctional elements.
[0071] In this specification, a transistor refers to a device that includes at least three terminals: a gate, a drain, and a source. A transistor has a channel region between its drain (drain electrode terminal, drain region, or drain electrode) and its source (source electrode terminal, source region, or source electrode), and current can flow through the drain, the channel region, and the source. In this specification, the channel region refers to the region through which current primarily flows. In this specification, the first terminal can be the drain and the second terminal can be the source, or vice versa. In cases where transistors with opposite polarities are used or where the current direction changes during circuit operation, the functions of the "source" and "drain" are sometimes interchanged. Therefore, in this specification, the "source" and "drain" can be interchanged. Additionally, the gate can also be called the control electrode.
[0072] In this specification, "parallel" refers to the state where the angle formed by two straight lines is greater than or equal to -10° and less than 10°, and therefore also includes the state where the angle is greater than or equal to -5° and less than 5°. Similarly, "perpendicular" refers to the state where the angle formed by two straight lines is greater than or equal to 80° and less than 100°, and therefore also includes the state where the angle is greater than or equal to 85° and less than 95°.
[0073] In this disclosure, "light transmittance" refers to the ability of light to pass through a medium, and is the percentage of light flux passing through a transparent or translucent body relative to the incident light flux.
[0074] The terms "A and B are in the same layer" and "A and B are in the same layer structure" in this disclosure mean that A and B are formed simultaneously through the same patterning process, or that the surfaces of A and B closest to the substrate are at approximately the same distance from the substrate, or that the surfaces of A and B closest to the substrate are in direct contact with the same film layer. The "thickness" of the film layer refers to the dimension of the film layer in the direction perpendicular to the display substrate.
[0075] In this disclosure, "the orthographic projection of B lies within the range of the orthographic projection of A" means that the boundary of the orthographic projection of B falls within the boundary range of the orthographic projection of A. "The orthographic projection of A includes the orthographic projection of B" includes: the boundary of the orthographic projection of B falls within the boundary range of the orthographic projection of A, or the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B. The "shape of A" in this disclosure refers to the shape of the orthographic projection of A onto the substrate.
[0076] In this disclosure, the dimension of A refers to the dimension of A's orthographic projection onto the substrate. When the orthographic projection of A onto the substrate is rectangular, the dimension of A may include at least one of the following: the length of A's orthographic projection onto the substrate along a first direction, the length of A's orthographic projection onto the substrate along a second direction, and the area of A's orthographic projection onto the substrate; wherein the first direction may be perpendicular to the second direction. When the orthographic projection of A onto the substrate is circular or elliptical, the dimension of A may include at least one of the following: the radius of A's orthographic projection onto the substrate, the diameter of A's orthographic projection onto the substrate, and the area of A's orthographic projection onto the substrate.
[0077] In this disclosure, "stacked arrangement" means that multiple film layers are disposed on a substrate and at least partially overlap in their orthographic projection onto the substrate.
[0078] In this disclosure, "approximately" and "roughly" refer to situations where there are no strict limits and the process and measurement errors are allowed. In this disclosure, "roughly the same" means that the values differ by no more than 10%.
[0079] In some implementations, OLED devices have become the mainstream display structure due to their high color gamut, thinness, and flexibility. For display devices that incorporate sensors (such as front-facing cameras, ambient light sensors, proximity sensors, infrared emitters for facial recognition, and other sensors), designs like notch screens, teardrop screens, waterdrop screens, and punch-hole screens are currently used to reduce the space occupied by the sensors in the display area, thereby increasing the screen-to-body ratio of the display substrate. To improve the light transmittance of the sensors in corresponding areas of the display substrate (e.g., high-transmittance areas), some film layers (e.g., cathode layers) in these high-transmittance areas can be patterned. Taking the patterning of the cathode layer as an example, a fine metal mask (FMM) is required. However, due to the large margin of FMMs, precise patterning is not possible, thus preventing a significant increase in the light transmittance of the display substrate.
[0080] This embodiment provides a display substrate, including: a substrate, a plurality of first light-emitting elements, a pixel defining layer, a first transparent conductive layer, and a first transparent blocking layer. The substrate includes a first display area. The plurality of first light-emitting elements are located in the first display area. Each first light-emitting element includes: a first electrode, a light-emitting functional layer, and a second electrode stacked together, with the first electrode located on the side of the second electrode closer to the substrate. The pixel defining layer is located on the side of the plurality of first light-emitting elements away from the substrate from the first electrodes. The pixel defining layer has a plurality of first pixel openings in the first display area. The light-emitting functional layer and the second electrode of each first light-emitting element are disposed within the first pixel openings, and the light-emitting functional layer contacts the first electrode through the first pixel openings. The first transparent conductive layer is located on the side of the pixel defining layer away from the substrate. The first transparent blocking layer is located on the side of the first transparent conductive layer away from the substrate; the orthographic projection of the first transparent conductive layer onto the substrate at least partially overlaps with the orthographic projection of the first transparent blocking layer onto the substrate. In this configuration, the first transparent conductive layer has a first conductive side surface near the opening of the first pixel, and the second electrode disposed at the opening of the first pixel is in contact with the first conductive side surface of the first transparent conductive layer; the first transparent shielding layer has a first protrusion extending beyond the first conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, and the first protrusion is not in contact with the first transparent conductive layer. Alternatively, the first transparent conductive layer has at least one first recess, the orthographic projection of the first recess onto the substrate is within the orthographic projection range of the pixel definition layer onto the substrate, the first transparent conductive layer has a second conductive side surface surrounding the first recess, and the second conductive side surface is in contact with the second electrode of the first light-emitting element; the first transparent shielding layer has at least one shielding opening, the shielding opening communicating with the first recess, the orthographic projection of the shielding opening onto the substrate being within the orthographic projection range of the first recess onto the substrate, the first transparent shielding layer has a second protrusion extending beyond the second conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, and the second protrusion is not in contact with the first transparent conductive layer.
[0081] The display substrate provided in this embodiment, by providing a first transparent shielding layer with a first protrusion or a second protrusion protruding from the first transparent conductive layer, can ensure that the second electrodes of adjacent first light-emitting elements are isolated during the manufacturing process, and that the second electrodes of multiple first light-emitting elements are in contact with the first transparent conductive layer, thereby improving the light transmittance of the first display area and ensuring the voltage uniformity of the second electrodes of multiple first light-emitting elements in the first display area.
[0082] In some exemplary embodiments, the display substrate may further include: a non-emitting functional layer, a non-emitting electrode layer, a first inorganic encapsulation layer, and a second inorganic encapsulation layer. The non-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate. The non-emitting electrode layer is located on the side of the non-emitting functional layer away from the substrate. The first inorganic encapsulation layer is located on the side of the second electrode and the non-emitting electrode layer away from the substrate, and the first inorganic encapsulation layer has at least one first encapsulation opening in the first display area. The orthographic projection of the first encapsulation opening onto the substrate is located within the orthographic projection range of the pixel definition layer onto the substrate. The second inorganic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate. The second inorganic encapsulation layer contacts the non-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening. This example can further improve the light transmittance of the first display area by further removing the non-emitting electrode layer, the non-emitting functional layer, the first transparent shielding layer, or the first transparent conductive layer in the spacing region between adjacent first light-emitting elements.
[0083] In some exemplary embodiments, the display substrate may further include: a non-emitting functional layer, a non-emitting electrode layer, a first inorganic encapsulation layer, and an organic encapsulation layer. The non-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate. The non-emitting electrode layer is located on the side of the non-emitting functional layer away from the substrate. The first inorganic encapsulation layer is located on the side of the second electrode and the non-emitting electrode layer away from the substrate. The first inorganic encapsulation layer has at least one first encapsulation opening in the first display area, and the orthographic projection of the first encapsulation opening onto the substrate is within the orthographic projection range of the pixel definition layer onto the substrate. The organic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate. The organic encapsulation layer contacts the non-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening. This example omits the second inorganic encapsulation layer and removes the non-emitting electrode layer, the non-emitting functional layer, the first transparent shielding layer, or the first transparent conductive layer in the spacing region between adjacent first light-emitting elements, which can further improve the light transmittance of the first display area.
[0084] In some exemplary embodiments, the display substrate may further include: at least one second transparent conductive layer, which may be located between the first transparent conductive layer and the first transparent shielding layer; the orthographic projection of the first transparent conductive layer onto the substrate and the orthographic projection of the second transparent conductive layer onto the substrate may at least partially overlap. This example, by providing at least one second transparent conductive layer in contact with the first transparent conductive layer, can facilitate increased contact between the second electrode of the first light-emitting element and the first transparent conductive layer.
[0085] The following examples illustrate the solution of this embodiment.
[0086] Figure 1 is a schematic diagram of various structures of a display substrate according to at least one embodiment of the present disclosure. In some examples, the display substrate may include a display area and a peripheral area (not shown) surrounding the display area. The display area may include at least one first display area and a second display area A2 located on at least one side of the first display area. For example, the second display area A2 may surround at least one first display area. In other examples, the display area may include only the first display area.
[0087] In some examples, as shown in Figure 1(a), the display area may include: a first display area (e.g., a first type first display area A11) and a second display area A2, which may surround the first type first display area A11. The first type first display area A11 may be approximately circular. The first type first display area A11 may be located at the top center of the display area.
[0088] In some examples, as shown in Figure 1(b), the display area may include: two first display areas (e.g., two first-class first display areas A11a and A11b) and a second display area A2. The second display area A2 may surround the two first-class first display areas A11a and A11b. The two first-class first display areas A11a and A11b may be aligned along a first direction X. Both first-class first display areas A11a and A11b may be circular.
[0089] In some examples, as shown in Figure 1(c), the display area may include: three first display areas (e.g., three first-class first display areas A11a, A11b, and A11c) and a second display area A2. The second display area A2 may surround the three first-class first display areas A11a, A11b, and A11c. The three first-class first display areas A11a, A11b, and A11c may be aligned along a first direction X. All three first-class first display areas A11a, A11b, and A11c may be circular.
[0090] In some examples, as shown in Figure 1(d), the display area may include two first display areas (e.g., a first type first display area A11 and a second type first display area A12) and a second display area A2. The second display area A2 may surround the first type first display area A11 and the second type first display area A12, and the second type first display area A12 and the first type first display area A11 may be aligned along a first direction X. For example, the first type first display area A11 may be located in the middle of the display area, and the second type first display area A12 may be located to the left of the first type first display area A11. The first type first display area A11 may be approximately circular, and the second type first display area A12 may be approximately racetrack-shaped. The length of the second type first display area A12 along the first direction X may be greater than its length along the second direction Y. The first direction X intersects the second direction Y; for example, the first direction X may be perpendicular to the second direction Y. However, this embodiment does not limit this.
[0091] In some examples, as shown in Figures 1(e) and 1(f), the display area may include: a first display area (e.g., including a second type of first display area A12) and a second display area A2. As shown in Figure 1(e), the second type of first display area A12 may be located in the center of the display area. As shown in Figure 1(f), the second type of first display area A12 may be located in the upper left corner of the display area. The second type of first display area A12 may be approximately racetrack-shaped.
[0092] In other examples, the first display area can be located at other positions such as the upper left, lower left, lower right, or upper right corner of the display area. The first type of first display area or the second type of first display area can be a rectangle, a rounded rectangle, a semicircle, an ellipse, or other polygons.
[0093] In some examples, the first display area can also be called a light-transmitting display area, and the second display area A2 can also be called a normal display area. The second display area A2 can be configured for image display, and the first display area can be configured for image display, while also supporting the function of under-display devices. The light transmittance of the first display area can be greater than the light transmittance of the second display area A2. For example, the light transmittance of a first-type first display area A11 can be greater than the light transmittance of a second-type first display area A12, and also greater than the light transmittance of the second display area A2.
[0094] In some examples, the functions corresponding to multiple first display areas may be different or partially the same. For example, the first type of first display area A11 can be configured to support visible light transmission, allowing an under-display camera to receive visible light and perform photo or video recording functions. Similarly, the second type of first display area A12 can be configured to support infrared light transmission, allowing an under-display infrared sensor to transmit infrared light for functions such as facial recognition. Taking a circular first type of first display area A11 as an example, the size of the orthographic projection of a single sensor on the display substrate can be smaller than or equal to the size of the first type of first display area A11. In other examples, the first display area can also be configured to support distance sensing or ambient light sensing. This embodiment is not limited in this regard.
[0095] Figure 2 is a schematic planar structure diagram of the display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 2, the display area may include a plurality of pixel units P, and at least one pixel unit P may include: a first sub-pixel P1 emitting a first color light, a second sub-pixel P2 emitting a second color light, and two third sub-pixels P31 and P32 emitting a third color light. The plurality of pixel units P may be arranged in an array along a first direction X and a second direction Y within the display area.
[0096] In some examples, the first color light can be red, the second color light can be blue, and the third color light can be green. The first sub-pixel P1 can be a red sub-pixel (R), the second sub-pixel P2 can be a blue sub-pixel (B), and the third sub-pixels P31 and P32 can be green sub-pixels (G). For example, the third sub-pixel P31 can be the first green sub-pixel (G1), and the third sub-pixel P32 can be the second green sub-pixel (G2).
[0097] In some examples, each sub-pixel may include a circuit unit and a light-emitting element. The circuit unit may include at least a pixel circuit, which is connected to a scan line, a data line, and a light-emitting control line, respectively. The pixel circuit may be configured to receive the data voltage transmitted by the data line and output a corresponding current to the light-emitting element under the control of the scan line and the light-emitting control line. The light-emitting element in at least one sub-pixel is connected to the pixel circuit of the sub-pixel, and the light-emitting element is configured to emit light of a corresponding brightness in response to the current output by the pixel circuit of the sub-pixel.
[0098] In some examples, a pixel circuit may include multiple transistors and at least one capacitor. For example, a pixel circuit may be a 3T1C, 4T1C, 5T1C, 5T2C, 6T1C, 7T1C, or 8T1C structure. In these circuit structures, T refers to a thin-film transistor, C refers to a capacitor, the number before T represents the number of thin-film transistors in the circuit, and the number before C represents the number of capacitors in the circuit.
[0099] In some examples, the multiple transistors in the pixel circuit can be either P-type or N-type transistors. Using the same type of transistors in the pixel circuit simplifies the manufacturing process, reduces the complexity of the display substrate manufacturing, and improves product yield. In other examples, the multiple transistors in the pixel circuit can include both P-type and N-type transistors.
[0100] In some examples, the multiple transistors in the pixel circuit can be low-temperature polysilicon (LTPS) thin-film transistors (TFTs), oxide thin-film transistors (OPTs), or a combination of both. The active layer of the LTPS TFT is made of low-temperature polysilicon (LTPS), while the active layer of the OPT TFT is made of oxide. LTPS TFTs offer advantages such as high mobility and fast charging, while OPTs offer advantages such as low leakage current. Integrating LTPS and OPTs onto a single display substrate—an LTPS+Oxide (LTPO) display substrate—leverages the advantages of both, enabling low-frequency driving, reducing power consumption, and improving display quality.
[0101] In some examples, the light-emitting element can be any of the following: a light-emitting diode (LED), an organic light-emitting diode (OLED), a quantum dot light-emitting diode (QLED), or a micro-LED (including mini-LED or micro-LED). For example, the light-emitting element can be an OLED, which can emit red, green, blue, or white light under the drive of its corresponding pixel circuit. The color of the light emitted by the light-emitting element can be determined as needed. In some examples, the light-emitting element may include an anode, a cathode, and an organic light-emitting layer located between the anode and the cathode. The anode of the light-emitting element can be electrically connected to the corresponding pixel circuit. However, this embodiment is not limited in this respect.
[0102] In some examples, the shape of the light-emitting element can be rectangular, rhomboid, pentagonal, or hexagonal. The light-emitting elements of the four sub-pixels of a pixel unit can be arranged horizontally side-by-side, vertically side-by-side, or in a square arrangement. However, this embodiment is not limited to this. In other examples, a pixel unit may include three sub-pixels, and the light-emitting elements of the three sub-pixels can be arranged horizontally side-by-side, vertically side-by-side, or in a triangular arrangement.
[0103] Figures 3A and 3B are partial top views of a first display area according to at least one embodiment of the present disclosure. Figures 3A and 3B illustrate four first light-emitting elements in the first display area as an example. This example uses an external pixel circuit scheme for illustration. Each sub-pixel of the first display area includes a first light-emitting element, and at least one first pixel circuit located in the second display area is connected to at least one first light-emitting element located in the first display area via conductive connecting lines; each sub-pixel of the second display area may include a second light-emitting element and a second pixel circuit located in the second display area and interconnected with each other.
[0104] In some examples, as shown in Figures 3A and 3B, the plurality of first light-emitting elements in the first display area may include: a first light-emitting element 31 emitting a first color light, a first light-emitting element 32 emitting a second color light, and first light-emitting elements 33 and 34 emitting a third color light. The first light-emitting elements 33 and 34 may be arranged along a first direction X, and the first light-emitting elements 31 and 32 may be arranged along a second direction Y. The first color light may be red, the second color light may be blue, and the third color light may be green.
[0105] In some examples, as shown in Figure 3A, the orthographic projections of the first light-emitting element 31, the first light-emitting element 32, and the first light-emitting elements 33 and 34 onto the substrate can be approximately circular. Specifically, the size of the orthographic projection of the first light-emitting element 31 onto the substrate can be larger than the size of the orthographic projections of the first light-emitting elements 33 and 34 onto the substrate, and the size of the orthographic projection of the first light-emitting element 32 onto the substrate can be larger than the size of the orthographic projection of the first light-emitting element 31 onto the substrate.
[0106] In some examples, as shown in Figure 3B, the orthographic projection of the first light-emitting element 31 onto the substrate can be approximately rectangular, and the orthographic projections of the first light-emitting elements 33 and 34 onto the substrate can be approximately rounded rectangles. The size of the orthographic projection of the first light-emitting element 31 onto the substrate can be larger than the size of the orthographic projections of the first light-emitting elements 33 and 34 onto the substrate. The orthographic projection of the first light-emitting element 32 onto the substrate can be approximately circular. In other examples, the orthographic projection of the first light-emitting element onto the substrate can include other shapes, such as ellipses, racetrack shapes, or polygons.
[0107] Figures 4 and 5 are partial cross-sectional schematic diagrams along the QQ' direction in Figure 3A. Figure 4 shows a partial cross-sectional structure of the first light-emitting element 31 and the first light-emitting element 33 as an example, and Figure 5 mainly shows a partial cross-sectional structure of the interval region between the first light-emitting element 31 and the first light-emitting element 33.
[0108] In some examples, as shown in Figures 4 and 5, the display substrate of the first display area may include: a substrate 10, a driving structure layer 11 disposed on the substrate 10, a first transparent conductive layer 51, a first transparent shielding layer 61, a light-emitting structure layer 13, and an encapsulation structure layer 14.
[0109] In some examples, the first pixel circuit connected to the first light-emitting element can be located in the second display area. This example uses an external pixel circuit scheme. The first light-emitting element located in the first display area and the first pixel circuit located in the second display area can be electrically connected via conductive connecting lines. By placing the first pixel circuit in the second display area, the first display area does not have a pixel circuit, which can improve the light transmittance of the first display area. In this example, the driving structure layer 11 of the first display area can include multiple insulating layers stacked together. For example, the driving structure layer of the second display area can include: a semiconductor layer, a first gate insulating layer, a first gate metal layer, a second gate insulating layer, a second gate metal layer, an interlayer insulating layer, a first source / drain metal layer, a first planarization layer, a second source / drain metal layer, a second planarization layer, a conductive connection layer, and a third planarization layer sequentially disposed on the substrate 10; wherein the conductive connecting lines can be located in the conductive connection layer. The driving structure layer 11 of the first display area can include: a first gate insulating layer, a second gate insulating layer, an interlayer insulating layer, a first planarization layer, a second planarization layer, and a third planarization layer stacked together.
[0110] In some examples, the first pixel circuit connected to the first light-emitting element can be located in the first display area. This example uses a built-in pixel circuit scheme, where adjacent first pixel circuits within the first display area can be connected via transparent connecting lines. The orthographic projection of the first light-emitting element in the first display area onto the substrate at least partially overlaps with the orthographic projection of the pixel circuit in the first display area onto the substrate. The film structure of the driving structure layer of the first display area and the driving structure layer of the second display area can be substantially the same. For example, the driving structure layer 11 of the first display area may include: a semiconductor layer, a first gate insulating layer, a first gate metal layer, a second gate insulating layer, a second gate metal layer, an interlayer insulating layer, a first source / drain metal layer, a first planarization layer, a connection layer, a second planarization layer, a second source / drain metal layer, and a third planarization layer sequentially disposed on the substrate; wherein the transparent connecting lines can be located in the connection layer. This embodiment does not limit the film structure of the driving structure layer of the first display area.
[0111] In some examples, as shown in Figures 4 and 5, the light-emitting structure layer of the first display area may include: an anode layer, a pixel definition layer 35, a light-emitting functional layer, and a cathode layer sequentially disposed on the driving structure layer 11. This example uses the first electrode of the first light-emitting element as the anode and the second electrode as the cathode. The anode layer of the first display area may include: the anode of the first light-emitting element electrically connected to the first pixel circuit of the driving structure layer (e.g., including the anode 311 of the first light-emitting element 31 and the anode 331 of the first light-emitting element 33). The pixel definition layer 35 has multiple first pixel openings in the first display area, each first pixel opening exposing a portion of the surface of the corresponding anode. The light-emitting functional layer of the first light-emitting element can contact the corresponding anode through the first pixel opening. For example, the light-emitting functional layer 3001 of the first light-emitting element 31 can contact the anode 311, and the light-emitting functional layer 3003 of the first light-emitting element 33 can contact the anode 331. The cathode layer may include: the cathodes of multiple first light-emitting elements, each first light-emitting element's cathode being connected to the corresponding light-emitting functional layer, which can emit light of the corresponding color under the drive of the corresponding anode and cathode. For example, the cathode layer may include a first cathode layer 303 and a second cathode layer 304 stacked together, with the second cathode layer 304 located on the side of the first cathode layer 303 away from the substrate 10. The first cathode layer 303 and the second cathode layer 304, located within the first pixel opening and in contact with the light-emitting functional layer 3001, can serve as the cathode of the first light-emitting element 31. The first cathode layer 303 and the second cathode layer 304, located within another first pixel opening and in contact with the light-emitting functional layer 3003, can serve as the cathode of the first light-emitting element 33. The anode 311, the light-emitting functional layer 3001, and the cathode of the first light-emitting element 31 are stacked within the first pixel opening, while the anode 331, the light-emitting functional layer 3003, and the cathode 303 of the first light-emitting element 33 are stacked within another first pixel opening. In some examples, the light-emitting structure layer may further include a light extraction layer located on the side of the cathode layer away from the substrate 10.
[0112] In some examples, the light-emitting functional layers of adjacent first light-emitting elements are separated by a first transparent shielding layer 61, and the cathodes of adjacent first light-emitting elements are separated by a first transparent shielding layer 61. The cathodes of the first light-emitting elements can contact the adjacent first transparent conductive layer 51, realizing electrical connection between the cathodes of multiple first light-emitting elements in the first display area, thereby ensuring the uniformity of the cathode transmission voltage signal.
[0113] In some examples, the light-emitting functional layer of the first light-emitting element may include a first functional layer, an emitting layer (EML), and a second functional layer stacked sequentially. For example, the light-emitting functional layer 3001 of the first light-emitting element 31 emitting a first color light may include a first functional layer 301, an emitting layer 312, and a second functional layer 302 stacked sequentially; the light-emitting functional layer 3003 of the first light-emitting element 33 emitting a third color light may include a first functional layer 301, an emitting layer 332, and a second functional layer 302 stacked sequentially. The emitting layers of the first light-emitting elements emitting different colors of light may be different. For example, the emitting layer of the first light-emitting element emitting red light may include a red emitting layer; the emitting layer of the first light-emitting element emitting green light may include a green emitting layer; and the emitting layer of the first light-emitting element emitting blue light may include a blue emitting layer. In this example, the emitting layer 312 may be a red emitting layer, and the emitting layer 332 may be a green emitting layer.
[0114] In some examples, the first functional layer 301 may include at least one of the following: a hole injection layer (HIL), a hole transport layer (HTL), and an electron block layer (EBL); the second functional layer 302 may include at least one of the following: a hole block layer (HBL), an electron injection layer (EIL), and an electron transport layer (ETL). In some examples, any one or more of the hole injection layer, hole transport layer, electron block layer, and electron transport layer can be fabricated in a single process (a single vapor deposition process or a single inkjet printing process), and isolation is achieved by the thickness difference between the formed first transparent conductive layer 51 and the first transparent shielding layer 61, so that the first functional layer 301 of adjacent first light-emitting elements is isolated, and the second functional layer 302 of adjacent first light-emitting elements is isolated.
[0115] In some examples, as shown in Figures 3A to 5, the first transparent conductive layer 51 is located on the side of the pixel defining layer 35 away from the substrate 10, and the first transparent shielding layer 61 is located on the side of the first transparent conductive layer 51 away from the substrate 10. In other words, the first transparent conductive layer 51 is located between the pixel defining layer 35 and the first transparent shielding layer 61. The orthographic projection of the first transparent conductive layer 51 onto the substrate 10 can fall within the orthographic projection range of the first transparent shielding layer 61 onto the substrate 10. The orthographic projection of the first transparent shielding layer 61 onto the substrate 10 falls within the orthographic projection range of the pixel defining layer 35 onto the substrate, and the orthographic projection of the first transparent conductive layer 51 onto the substrate 10 can also fall within the orthographic projection range of the pixel defining layer 35 onto the substrate. In the cross-sectional views shown in Figures 4 and 5, the stacked structure of the first transparent conductive layer 51 and the first transparent shielding layer 61 can be approximately T-shaped.
[0116] In some examples, as shown in FIG5, the first transparent conductive layer 51 may include: a first conductive side surface near the first pixel opening (e.g., a first conductive side surface 511 facing the first light-emitting element 31 and a first conductive side surface 512 facing the first light-emitting element 33), a first conductive bottom surface 513 near the substrate 10, and a first conductive top surface 514 away from the substrate 10. The first conductive side surface 511 may surround the first pixel opening where the light-emitting functional layer 3001 of the first light-emitting element 31 and the cathode are located, and the first conductive side surface 512 may surround the first pixel opening where the light-emitting functional layer 3003 of the first light-emitting element 33 and the cathode are located. The first conductive side surface 511 may be connected to the first conductive bottom surface 513 and the first conductive top surface 514 respectively, and the first conductive side surface 512 may be connected to the first conductive bottom surface 513 and the first conductive top surface 514 respectively.
[0117] In some examples, as shown in FIG5, the first transparent shielding layer 61 may include: a first shielding side near the first pixel opening (e.g., a first shielding side 611 facing the first light-emitting element 31 and a first shielding side 612 facing the first light-emitting element 33), a first shielding bottom surface 613 near the substrate 10, and a first shielding top surface 614 away from the substrate 10. The first shielding side 611 may surround the first pixel opening where the light-emitting functional layer 3001 of the first light-emitting element 31 and the cathode are located, and the first shielding side 612 may surround the first pixel opening where the light-emitting functional layer 3003 of the first light-emitting element 33 and the cathode are located. The first shielding side 611 is connected to the first shielding bottom surface 613 and the first shielding top surface 614, respectively. The first shielding side 612 is connected to the first shielding bottom surface 613 and the first shielding top surface 614, respectively. The first shielding bottom surface 613 may include: a first portion in contact with the first conductive top surface 514, and a second portion that is not in contact with the first transparent conductive layer 51 but is connected to the first shielding side 611 or 612. In other words, the first transparent shielding layer 61 may have a first protrusion (as shown in FIG8) protruding from the first conductive side surface 511 (or 512) of the first transparent conductive layer 51 along a direction parallel to the substrate 10, and the first protrusion is not in contact with the first transparent conductive layer 51. The first protrusion may be formed by connecting the first shielding side surface 611 (or 612) of the first transparent shielding layer 61 and a second portion of the first shielding bottom surface 613.
[0118] In some examples, the first transparent shielding layer 61 can be an inorganic transparent insulating layer or an organic transparent insulating layer. The material of the first transparent conductive layer 51 can include a transparent conductive material. In this example, both the first transparent shielding layer 61 and the first transparent conductive layer 51 are made of transparent materials, which can ensure the light transmittance of the first display area.
[0119] In some examples, the thickness of the first transparent conductive layer 51 can be the vertical distance between the first conductive bottom surface 513 and the first conductive top surface 514 of the first transparent conductive layer 51. For example, the thickness H1 of the first transparent conductive layer 51 can be from 0.2 micrometers to 5 micrometers, such as approximately 0.5 micrometers, 1 micrometer, or 2 micrometers.
[0120] In some examples, the thickness of the first transparent shielding layer 61 can be the vertical distance between the first shielding bottom surface 613 and the first shielding top surface 614 of the first transparent shielding layer 61. For example, the thickness H2 of the first transparent shielding layer 61 can be from 0.03 micrometers to 3 micrometers, such as approximately 0.05 micrometers, 0.5 micrometers, 1 micrometer or 1.5 micrometers.
[0121] In some examples, as shown in Figures 3A to 5, the boundary 510 of the first transparent conductive layer 51 near the first pixel opening can be the edge of the first conductive side 511 (or 512). The boundary 610 of the first transparent blocking layer 61 near the first pixel opening can be the edge of the first blocking side 611 (or 612). The minimum distance L2 between the boundary 510 of the first transparent conductive layer 51 near the first pixel opening and the boundary 350 of the pixel definition layer can be from 0.2 micrometers to 10 micrometers, for example, approximately 0.2 micrometers, 0.5 micrometers, 1 micrometer, or 5 micrometers. The minimum distance L1 between the boundary 510 of the first transparent conductive layer 51 near the first pixel opening and the boundary 610 of the first transparent blocking layer 61 near the first pixel opening can be from 0.3 micrometers to 5 micrometers, for example, approximately 0.3 micrometers, 0.5 micrometers, 1 micrometer, or 1.5 micrometers.
[0122] In some examples, by carefully controlling the thickness H1 of the first transparent conductive layer 51, the thickness H2 of the first transparent shielding layer 61, and the minimum distance L1 between the boundary of the first transparent conductive layer 51 near the first pixel opening and the boundary of the first transparent shielding layer 61 near the first pixel opening, it can be ensured that the first conductive side 511 and the first conductive side 512 are not completely covered by the light-emitting functional layer 3001 of the first light-emitting element 31 and the light-emitting functional layer 3003 of the first light-emitting element 33, thereby ensuring that the first conductive side 511 can contact the cathode of the first light-emitting element 31 and the first conductive side 512 can contact the cathode of the first light-emitting element 33.
[0123] In some examples, the encapsulation structure layer 14 may include a first inorganic encapsulation layer 41, a second inorganic encapsulation layer 42, an organic encapsulation layer 44, and a third inorganic encapsulation layer 43 stacked together. The first inorganic encapsulation layer 41, the second inorganic encapsulation layer 42, and the third inorganic encapsulation layer 43 may be made of inorganic materials, and the organic encapsulation layer 44 may be made of organic materials. The organic encapsulation layer 44 may be disposed between the second inorganic encapsulation layer 42 and the third inorganic encapsulation layer 43, forming an inorganic / organic / inorganic material stacked structure, which can ensure that external moisture cannot enter the light-emitting structure layer 13.
[0124] In some examples, the side of the first transparent shielding layer 61 away from the substrate 10 is provided with a non-light-emitting functional layer (e.g., including a first non-light-emitting layer 201, a second non-light-emitting layer 202, and non-light-emitting layers 212 and 232) and a non-electrode layer (e.g., including a first non-electrode layer 203 and a second non-electrode layer 204). The first non-light-emitting layer 201 and the first functional layer 301 can be disposed in the same layer, the second non-light-emitting layer 202 and the second functional layer 302 can be disposed in the same layer, the non-light-emitting layer 212 and the light-emitting layer 312 can be disposed in the same layer, the non-light-emitting layer 232 and the light-emitting layer 332 can be disposed in the same layer, the first non-electrode layer 203 and the first cathode layer 303 can be disposed in the same layer, and the second non-electrode layer 204 and the second cathode layer 304 can be disposed in the same layer.
[0125] In some examples, there is a size difference between the first transparent shielding layer 61 and the first transparent conductive layer 51 along a direction parallel to the substrate. By carefully controlling the thickness H1 of the first transparent conductive layer 51, the thickness H2 of the first transparent shielding layer 61, and the size difference of the projection of the first transparent shielding layer 61 and the first transparent conductive layer 51 (e.g., including the minimum distance L1 between the boundary of the first transparent conductive layer 51 near the first pixel opening and the boundary of the first transparent shielding layer 61 near the first pixel opening), the first invalid functional layer 201 and the first functional layer 301 can be isolated, the second invalid functional layer 202 and the second functional layer 302 can be isolated, the invalid light-emitting layer 212 and the light-emitting layer 312 can be isolated, the invalid light-emitting layer 232 and the light-emitting layer 332 can be isolated, the first invalid electrode layer 203 and the first cathode layer 303 can be isolated, and the second invalid electrode layer 204 and the second cathode layer 304 can be isolated.
[0126] In some examples, the first inorganic encapsulation layer 41 has multiple first encapsulation openings in the first display area. The orthographic projection of the first encapsulation openings onto the substrate can be located within the orthographic projection range of the pixel definition layer 35 onto the substrate. The first encapsulation openings can expose a portion of the surface of the second invalid functional layer 202, a portion of the side surface of the first invalid electrode layer 203, and a portion of the side surface of the second invalid electrode layer 204. The second inorganic encapsulation layer 42 can contact the second invalid functional layer 202, the first invalid electrode layer 203, and the second invalid electrode layer 204 through the first encapsulation openings. By removing a portion of the invalid electrode layer in the spacing region between adjacent first light-emitting elements, it is beneficial to improve the light transmittance of the first display area.
[0127] The structure of the display substrate in this example is illustrated below through an example of the fabrication process of the display substrate. The "patterning process" described in this disclosure includes, for metallic, inorganic, or transparent conductive materials, processes such as photoresist coating, mask exposure, development, etching, and photoresist stripping; for organic materials, it includes processes such as organic material coating, mask exposure, and development. Deposition can be performed using any one or more of sputtering, evaporation, and chemical vapor deposition; coating can be performed using any one or more of spraying, spin coating, and inkjet printing; etching can be performed using any one or more of dry etching and wet etching. This disclosure does not limit the methods used. "Thin film" refers to a thin film made of a certain material on a substrate using deposition, coating, or other processes.
[0128] In some examples, the fabrication process of the display substrate may include the following steps.
[0129] (1) A driving structure layer, an anode layer and a pixel definition layer are sequentially formed on the substrate of the first display area.
[0130] Figure 6 is a partial cross-sectional schematic diagram of a display substrate after forming a pixel definition layer in at least one embodiment of this disclosure. In some examples, as shown in Figure 6, a driving structure layer 11 is formed on the substrate 10 of the first display area; subsequently, an anode thin film is deposited, and the anode thin film is patterned by a patterning process to form an anode layer. The anode layer of the first display area may include: anodes of multiple first light-emitting elements (e.g., including anode 311 of the first light-emitting element 31 and anode 331 of the first light-emitting element 33); subsequently, a pixel definition film is coated, and the pixel definition film is patterned by a patterning process to form a pixel definition layer 35. The pixel definition layer 35 is provided with multiple first pixel openings (e.g., including first pixel openings K11 and K12) in the first display area. The first pixel opening K11 can expose a portion of the surface of the anode 311 of the first light-emitting element 31, and the first pixel opening K12 can expose a portion of the surface of the anode 331 of the first light-emitting element 33.
[0131] In some examples, substrate 10 can be a rigid substrate or a flexible substrate. For example, a rigid substrate can be, but is not limited to, one or more of glass and quartz; a flexible substrate can be, but is not limited to, one or more of polyethylene terephthalate, polyethylene terephthalate, polyetheretherketone, polystyrene, polycarbonate, polyarylate, polyarylate, polyimide, polyvinyl chloride, polyethylene, and textile fibers. Pixel defining layer 35 can be made of organic materials such as polyimide, acrylic, or polyethylene terephthalate. Anode layer can be made of reflective materials such as metal.
[0132] (2) On the substrate with the aforementioned structure, a first transparent conductive film and a first transparent shielding film are deposited sequentially, and the first transparent shielding film is patterned by a patterning process to form a first transparent shielding layer.
[0133] Figure 7 is a partial cross-sectional view of the display substrate after the formation of the first transparent shielding layer in at least one embodiment of this disclosure. In some examples, as shown in Figure 7, the first transparent shielding layer 61 is located on the side of the first transparent conductive film 500 away from the substrate 10. The first transparent shielding layer 61 and the first pixel opening may not overlap in their orthogonal projections onto the substrate. The first transparent shielding layer 61 may have first shielding sides 611 and 612 close to the first pixel opening. For example, the first shielding side 611 may surround the first pixel opening corresponding to the first light-emitting element 31, and the first shielding side 612 may surround the first pixel opening corresponding to the first light-emitting element 33.
[0134] In some examples, the material of the first transparent shielding film may include inorganic materials, such as any one or more of silicon oxide (SiOx, x>0), silicon nitride (SiNy, y>0), and silicon oxynitride (SiOxNy, x>0, y>0), and may be a single layer, multiple layers, or composite layer; or, the material of the first transparent shielding film may include organic materials, such as acrylic resin, acrylic resin, or epoxy resin. The material of the first transparent conductive film may include transparent conductive materials, such as indium tin oxide (ITO), indium zirconium oxide (IZO), and indium gallium zinc oxide (IGZO).
[0135] (3) On the substrate with the aforementioned structure, the first transparent conductive film 500 is etched using the first transparent shielding layer 61 as a mask to form the first transparent conductive layer 51.
[0136] Figure 8 is a partial cross-sectional schematic diagram of a display substrate after the formation of the first transparent conductive layer in at least one embodiment of this disclosure. In some examples, as shown in Figure 8, the orthographic projection of the first transparent conductive layer 51 onto the substrate 10 may be located within the orthographic projection range of the first transparent shielding layer 61 onto the substrate 10. The orthographic projection of the first transparent conductive layer 51 onto the substrate 10 may not overlap with the orthographic projection of the first pixel opening (e.g., including first pixel openings K11 and K12) onto the substrate 10. The first transparent conductive layer 51 may have first conductive side surfaces 511 and 512 close to the first pixel openings. For example, the first conductive side surface 511 may surround the first pixel opening K11 corresponding to the first light-emitting element 31, and the first conductive side surface 512 may surround the first pixel opening K12 corresponding to the first light-emitting element 33. The orthographic projection of the first conductive top surface of the first transparent conductive layer 51 onto the substrate may be located within the orthographic projection range of the first conductive bottom surface onto the substrate. The slope angle of the first conductive side surfaces 511 and 512 may be acute. In this example, the slope angle refers to the angle between the side surface and the plane where the substrate is located.
[0137] In some examples, the first transparent shielding layer 61 may have a first protrusion 810a protruding beyond the first transparent conductive layer 51. The first protrusion 810a may be formed by connecting a first shielding side surface that does not contact the first transparent conductive layer 51 and a portion of the first shielding bottom surface. The first shielding side surface 611 of the first transparent shielding layer 61 may protrude beyond the first conductive side surface 511 in a direction parallel to the substrate, and the first shielding side surface 612 of the first transparent shielding layer 61 may protrude beyond the first conductive side surface 512 in a direction parallel to the substrate. The portion of the first shielding bottom surface connected to the first shielding side surface 611 protrudes beyond the first transparent conductive layer 51, and the portion of the first shielding bottom surface connected to the first shielding side surface 612 protrudes beyond the first transparent conductive layer 51.
[0138] (4) On the substrate on which the aforementioned structure is formed, a first functional thin film 101, a first light-emitting thin film 112, a second light-emitting thin film, a third light-emitting thin film 132, a second functional thin film 102, a first conductive thin film 103, and a second conductive thin film 104 are formed in sequence.
[0139] Figure 9 is a partial cross-sectional schematic diagram of a display substrate after the formation of a light-emitting functional layer and a cathode layer in at least one embodiment of this disclosure. In some examples, as shown in Figure 9, a first functional thin film 101 located within the first pixel opening forms a first functional layer 301; a second functional thin film 102 located within the first pixel opening forms a second functional layer 302; a first light-emitting thin film 112 located within the first pixel opening forms a light-emitting layer 312 of a first light-emitting element 31 emitting a first color light; a third light-emitting thin film 132 located within the first pixel opening forms a light-emitting layer 332 of a first light-emitting element 33 emitting a third color light; and a second light-emitting thin film located within the first pixel opening forms a light-emitting layer (not shown) of a first light-emitting element emitting a second color light. A first conductive thin film 103 located within the first pixel opening forms a first cathode layer 303; and a second conductive thin film 104 located within the first pixel opening forms a second cathode layer 304.
[0140] In some examples, due to the shielding effect of the first transparent shielding layer 61, the first functional film 101, the first light-emitting film 112, the third light-emitting film 132, the second functional film 102, the first conductive film 103, and the second conductive film 104 on the first transparent shielding layer 61 can be separated from the corresponding films in the first pixel opening. The first functional film 101, the first light-emitting film 112, the third light-emitting film 132, and the second functional film 102 will not completely cover the first conductive side surface (e.g., the first conductive side surface 511 and 512) of the first transparent conductive layer 51 during evaporation. During the evaporation of the first conductive film, it can be ensured that the first cathode layer 303 is in contact with the first conductive side surface 511 (or 512) of the first transparent conductive layer 51.
[0141] In some examples, the first functional thin film 101, the first light-emitting thin film 112, the second light-emitting thin film, the third light-emitting thin film 132, and the second functional thin film 102 can be formed sequentially by a vapor deposition process. The first light-emitting thin film 112, the second light-emitting thin film, and the third light-emitting thin film 132 can be formed using a fine metal mask (FMM) or an open mask vapor deposition process, or by an inkjet process. The first conductive thin film 103 can be formed by a vapor deposition process, and the second conductive thin film 104 can be formed by a sputtering process. In some examples, the material of the first conductive thin film 103 can include metallic materials, such as magnesium (Mg), silver (Ag), aluminum (Al), or mixtures thereof. The material of the second conductive thin film 104 can include transparent conductive materials, such as IZO. This example uses different processes to prepare the first cathode layer and the second cathode layer, which can increase the contact capability between the cathode layer and the first transparent conductive layer 51. In other examples, only the first conductive thin film can be vapor-deposited to form the first cathode layer.
[0142] (5) On the substrate forming the aforementioned structure, a first inorganic encapsulation film is deposited, and the first inorganic encapsulation film, the first conductive film 103 covering the first transparent shielding layer 61 and the second conductive film 104 are patterned by a patterning process to form a first inorganic encapsulation layer 41, a first ineffective conductive layer 203 and a second ineffective conductive layer 204.
[0143] Figure 10 is a partial cross-sectional schematic diagram of a display substrate after the formation of a first inorganic encapsulation layer in at least one embodiment of this disclosure. In some examples, after depositing the first inorganic encapsulation film, the first inorganic encapsulation film is patterned by a patterning process. During the patterning process, a patterned photoresist layer 700 is formed on the side of the first inorganic encapsulation film away from the substrate 10. The first inorganic encapsulation film, the first conductive film, and the second conductive film exposed by the patterned photoresist layer 700 are etched to form a first inorganic encapsulation layer 41, a first inactive conductive layer 203, and a second inactive conductive layer 204. The orthogonal projection of the photoresist layer 700 onto the substrate can cover the orthogonal projection of the first pixel opening onto the substrate. For example, the first inorganic encapsulation film exposed by the photoresist layer 700 is etched to form a first encapsulation opening F1 located in the gap region between adjacent first light-emitting elements; the photoresist layer 700 is retained, and the first conductive film and the second conductive film exposed by the first encapsulation opening F1 are etched; after the etching of the first conductive film and the second conductive film is completed, the photoresist layer 700 can be removed.
[0144] In some examples, the first functional thin film 101, which is not etched on the first transparent shielding layer 61, forms a first inactive functional layer 201; the first light-emitting thin film 112, which is not etched on the first transparent shielding layer 61, forms an inactive light-emitting layer 212; the third light-emitting thin film 132, which is not etched on the first transparent shielding layer 61, forms an inactive light-emitting layer 232; and the second light-emitting thin film 102, which is not etched on the first transparent shielding layer 61, forms a second inactive functional layer 202. The encapsulation opening of the first inorganic encapsulation layer 51 can expose a portion of the surface of the second inactive functional layer 202 away from the substrate.
[0145] This example can utilize the photoresist layer 700 in the patterning process of the first inorganic encapsulation layer to etch the conductive film (e.g., including the first conductive film and the second conductive film) in the spacer region between adjacent first light-emitting elements. This simplifies the process and reduces the process allowance compared to the FMM process, which is beneficial for improving the light transmittance of the first display area.
[0146] (6) On the substrate with the aforementioned structure, the photoresist layer 700 is removed, and a second inorganic encapsulation layer 42, an organic encapsulation layer 44, and a third inorganic encapsulation layer 43 are formed sequentially. In some examples, the second inorganic encapsulation layer 42 and the third inorganic encapsulation layer 43 can be made of the same material, and the organic encapsulation layer 44 can be made of an organic material to achieve planarization. The third inorganic encapsulation layer 43 can act as a barrier against water and oxygen.
[0147] In the display substrate provided in this embodiment, during the patterning of the first inorganic encapsulation film, the first conductive film and the second conductive film are etched. This eliminates the need for a fine-matrix metallographic model (FMM), enabling precise patterning and improving the light transmittance of the first display area. The presence of the first transparent conductive layer not only enhances the light transmittance of the first display area but also ensures the voltage uniformity of the cathode layer in the first display area.
[0148] Figure 11 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 11, a first transparent conductive layer 51 and a first transparent shielding layer 61 are sequentially disposed on the side of the pixel definition layer 35 of the first display area away from the substrate 10. The orthographic projection of the first transparent conductive layer 51 onto the substrate 10 may lie within the orthographic projection of the first transparent shielding layer 61 onto the substrate 10, and the orthographic projection of the first transparent shielding layer 61 onto the substrate 10 may lie within the orthographic projection of the pixel definition layer 35 onto the substrate 10. The slope angle of the first conductive side surface of the first transparent conductive layer 51 may be a right angle. In other words, the extending direction of the first conductive side surface may be perpendicular to the plane of the substrate. The orthographic projection of the first conductive top surface of the first transparent conductive layer 51 onto the substrate and the orthographic projection of the first conductive bottom surface onto the substrate may coincide.
[0149] This example utilizes the dimensional difference between the first transparent shielding layer and the first transparent conductive layer along the direction parallel to the substrate to achieve contact between the cathode layer and the first conductive side of the first transparent conductive layer, ensuring the contact capability between the cathode layer and the first transparent conductive layer. Further descriptions of the display substrate in this embodiment can be found in the descriptions of the foregoing embodiments, and therefore will not be repeated here.
[0150] Figure 12 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 12, a first transparent conductive layer 51 and a first transparent shielding layer 61 are sequentially disposed on the side of the pixel definition layer 35 of the first display area away from the substrate 10. The orthographic projection of the first transparent conductive layer 51 onto the substrate 10 may lie within the orthographic projection of the first transparent shielding layer 61 onto the substrate 10, and the orthographic projection of the first transparent shielding layer 61 onto the substrate 10 may lie within the orthographic projection of the pixel definition layer 35 onto the substrate 10. The slope angle of the first conductive side surface of the first transparent conductive layer 51 may be an obtuse angle. The orthographic projection of the first conductive bottom surface of the first transparent conductive layer 51 onto the substrate may lie within the orthographic projection range of the first conductive top surface onto the substrate.
[0151] This example utilizes the dimensional difference between the first transparent shielding layer and the first transparent conductive layer along the direction parallel to the substrate to achieve contact between the cathode layer and the first conductive side of the first transparent conductive layer, ensuring the contact capability between the cathode layer and the first transparent conductive layer. Further descriptions of the display substrate in this embodiment can be found in the descriptions of the foregoing embodiments, and therefore will not be repeated here.
[0152] Figure 13 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 13, the second inorganic encapsulation layer 42 contacts the portion of the surface of the first transparent shielding layer 61 away from the substrate 10 through the first encapsulation opening of the first inorganic encapsulation layer 41. In the fabrication process of the display substrate in this example, after the patterning process of the first inorganic encapsulation layer 41, the photoresist layer is retained, and etching continues on the first conductive film, the second conductive film, the second functional film, the light-emitting film (e.g., including the first light-emitting film, the second light-emitting film, and the third light-emitting film), and the first functional film exposed by the first inorganic encapsulation layer 41, so as to expose the portion of the surface of the first transparent shielding layer 61 away from the substrate 10.
[0153] This example demonstrates how etching the conductive film, the first functional film, the light-emitting film, and the second functional film within the spacing region between the first light-emitting elements can further improve the light transmittance of the first display area. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0154] Figure 14 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 14, the second inorganic encapsulation layer 42 can contact the portion of the first transparent conductive layer 51 away from the substrate and the side of the first transparent shielding layer 61 away from the first pixel opening through the first encapsulation opening of the first inorganic encapsulation layer 41. In the fabrication process of the display substrate in this example, after the patterning process of the first inorganic encapsulation layer 41, the photoresist layer is retained, and etching continues on the first conductive film, second conductive film, second functional film, light-emitting film, first functional film, and first transparent shielding layer exposed by the first inorganic encapsulation layer 41 to expose the portion of the first transparent conductive layer 51 away from the substrate 10. The first transparent shielding layer 61 may have multiple shielding openings in the first display area, and the orthographic projection of the shielding openings onto the substrate may be located within the orthographic projection range of the first transparent conductive layer 51 onto the substrate, and also within the orthographic projection range of the pixel definition layer 35 onto the substrate.
[0155] In some examples, the first shielding bottom surface of the first transparent shielding layer 61 includes a first portion that contacts the first transparent conductive layer 51 and a second portion that does not contact the first transparent conductive layer 51. The area of the second portion may be less than or equal to the area of the first portion to ensure the stability of the first transparent shielding layer 61 and prevent the first protrusion of the first transparent shielding layer 61 from collapsing.
[0156] This example demonstrates how etching the conductive film, first functional film, light-emitting film, second functional film, and first transparent shielding layer within the spacing region between adjacent first light-emitting elements can further improve the light transmittance of the first display area. The remaining structure of the display substrate in this example can be referred to the description in the foregoing embodiments, and therefore will not be repeated here.
[0157] Figure 15 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 15, the second inorganic encapsulation layer 42 can contact the portion of the pixel definition layer 35 away from the substrate 10, the side of the first transparent shielding layer 61 away from the first pixel opening, and the side of the first transparent conductive layer 51 away from the first pixel opening through the first encapsulation opening of the first inorganic encapsulation layer 41. In the fabrication process of the display substrate in this example, after the patterning process of the first inorganic encapsulation layer 41, the photoresist layer is retained, and etching continues on the first conductive film, second conductive film, second functional film, light-emitting film, first functional film, first transparent shielding layer, and first transparent conductive layer exposed by the first inorganic encapsulation layer to expose the portion of the pixel definition layer 35 away from the substrate 10.
[0158] In some examples, the first transparent shielding layer 61 may have multiple shielding openings in the first display area. The orthographic projection of the shielding openings onto the substrate may be located within the orthographic projection range of the first transparent conductive layer 51 onto the substrate, and also within the orthographic projection range of the pixel defining layer 35 onto the substrate. The first transparent conductive layer 51 may have multiple conductive openings in the first display area. The orthographic projection of the conductive openings onto the substrate may be located within the orthographic projection range of the pixel defining layer 35 onto the substrate. The orthographic projection of the shielding openings onto the substrate may include the orthographic projection of the conductive openings onto the substrate.
[0159] This example demonstrates how etching the conductive film, first functional film, light-emitting film, second functional film, first transparent shielding layer, and first transparent conductive layer within the spacing region between adjacent first light-emitting elements can further improve the light transmittance of the first display area. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0160] Figure 16 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 16, the organic encapsulation layer 44 can contact the portion of the second inactive functional layer 202 away from the substrate through the first encapsulation opening of the first inorganic encapsulation layer 41. In this example, the second inorganic encapsulation layer can be omitted, which can save process steps and further improve the light transmittance of the first display area. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0161] Figure 17 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 17, the organic encapsulation layer 44 can contact the portion of the surface of the first transparent shielding layer 61 away from the substrate 10 through the first encapsulation opening of the first inorganic encapsulation layer 41. In this example, the second inorganic encapsulation layer can be omitted, which can save process steps and further improve the light transmittance of the first display area. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0162] Figure 18 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 18, the organic encapsulation layer 44 can contact the portion of the first transparent conductive layer 51 away from the substrate and the side of the first transparent shielding layer 61 away from the first pixel opening through the first encapsulation opening of the first inorganic encapsulation layer 41. In this example, the second inorganic encapsulation layer can be omitted, which can save process steps and further improve the light transmittance of the first display area. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and will not be repeated here.
[0163] Figure 19 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 19, the organic encapsulation layer 44 can contact the portion of the pixel definition layer 35 away from the substrate 10, the side of the first transparent shielding layer 61 away from the first pixel opening, and the side of the first transparent conductive layer 51 away from the first pixel opening through the first encapsulation opening of the first inorganic encapsulation layer 41. In this example, the second inorganic encapsulation layer can be omitted, which can save process steps and further improve the light transmittance of the first display area. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and will not be repeated here.
[0164] Figure 20 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 20, a first transparent conductive layer 51, a second transparent conductive layer 52, and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The second transparent conductive layer 52 may be located between the first transparent conductive layer 51 and the first transparent shielding layer 61. The orthographic projection of the first transparent conductive layer 51 onto the substrate and the orthographic projection of the second transparent conductive layer 52 onto the substrate may at least partially overlap. For example, the orthographic projection of the first transparent conductive layer 51 onto the substrate may include the orthographic projection of the second transparent conductive layer 52 onto the substrate. The orthographic projection of the first transparent conductive layer 51 onto the substrate may be located within the orthographic projection range of the first transparent shielding layer 61 onto the substrate. In other examples, there may be multiple second transparent conductive layers 52. By providing the first transparent conductive layer 51 and the second transparent conductive layer 52, this example can enhance the overlap effect between the second electrode and the transparent conductive layer.
[0165] In some examples, the second electrode of the first light-emitting element may be connected to the first transparent conductive layer 51 or the second transparent conductive layer 52 to increase the contact capability between the second electrode and the transparent conductive layer. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0166] Figure 21 is another partial cross-sectional view of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 21, a first transparent conductive layer 51, a second transparent conductive layer 52, and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The second transparent conductive layer 52 may have a third conductive side surface (e.g., third conductive side surfaces 521 and 522) near the opening of the first pixel. A first protrusion of the first transparent shielding layer 61 may protrude from the third conductive side surfaces 521 and 522 of the second transparent conductive layer 52 in a direction parallel to the substrate, and the first protrusion does not contact the second transparent conductive layer 52. The orthographic projection of the second transparent conductive layer 52 onto the substrate may be located within the orthographic projection range of the first transparent conductive layer 51 onto the substrate. In the cross-sectional view shown in Figure 21, the cross-sections of the first transparent conductive layer 51, the second transparent conductive layer 52, and the first transparent shielding layer 61 are approximately "I"-shaped.
[0167] The arrangement of the two transparent conductive layers and the first transparent shielding layer in this example effectively isolates the light-emitting functional layer and the second electrode between adjacent first light-emitting elements, while ensuring contact between the second electrode and the transparent conductive layer. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0168] Figure 22 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 22, a first transparent conductive layer 51, a second transparent shielding layer 62, and the first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The second transparent shielding layer 62 may be located between the first transparent shielding layer 61 and the first transparent conductive layer 51. The orthographic projection of the second transparent shielding layer 62 onto the substrate and the orthographic projection of the first transparent shielding layer 61 onto the substrate may at least partially overlap. For example, the orthographic projection of the second transparent shielding layer 62 onto the substrate may include the orthographic projection range of the first transparent shielding layer 61 onto the substrate. The orthographic projection of the first transparent conductive layer 51 onto the substrate may be located within the orthographic projection range of the second transparent shielding layer 62 onto the substrate. In other examples, there may be multiple second transparent shielding layers 62.
[0169] This example, by providing a second transparent shielding layer, can effectively increase the dimensional difference between the transparent shielding layer and the first transparent conductive layer along the direction parallel to the substrate, thereby effectively isolating the light-emitting functional layers between adjacent first light-emitting elements and ensuring the contact capability between the second electrode and the first transparent conductive layer. Furthermore, since a portion of the first inorganic encapsulation layer 41 is etched away (i.e., the first inorganic encapsulation layer 41 has a first encapsulation opening), water and oxygen can easily seep in from the etched locations of the first inorganic encapsulation layer 41. By adding the second transparent shielding layer, the corrosion of the light-emitting elements by water and oxygen can be effectively delayed. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0170] Figure 23 is another partial cross-sectional view of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 23, a first transparent conductive layer 51, a second transparent shielding layer 62, and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The second transparent shielding layer 62 may be located between the first transparent shielding layer 61 and the first transparent conductive layer 51. The orthographic projection of the second transparent shielding layer 62 onto the substrate may be within the orthographic projection range of the first transparent conductive layer 51 onto the substrate, and the orthographic projection of the first transparent conductive layer 51 onto the substrate may be within the orthographic projection range of the first transparent shielding layer 61 onto the substrate. In the cross-sectional view shown in Figure 23, the cross-sections of the first transparent conductive layer 51, the second transparent shielding layer 62, and the first transparent shielding layer 61 are approximately "I"-shaped.
[0171] The arrangement of the two transparent shielding layers and the first transparent conductive layer in this example effectively isolates the light-emitting functional layer and the second electrode between adjacent first light-emitting elements, while ensuring contact between the second electrode and the transparent conductive layer. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0172] Figure 24 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 24, a pixel definition layer 35 away from the substrate 10 may be sequentially provided with a pixel definition protective layer 36, a first transparent conductive layer 51, a second transparent shielding layer 62, and the first transparent shielding layer 61. The pixel definition protective layer 36 may be located between the pixel definition layer 35 and the first transparent conductive layer 51. The pixel definition protective layer 36 may cover the surface and side of the pixel definition layer 35 away from the substrate. The orthographic projection of the pixel definition protective layer 36 onto the substrate may include the orthographic projection of the pixel definition layer 35 onto the substrate. In some examples, the material of the pixel definition protective layer 36 may include inorganic materials. By providing a pixel definition protective layer, this example can prevent damage to the pixel definition layer during the etching process of the first transparent conductive layer and the first transparent shielding layer. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and will not be repeated here.
[0173] Figure 25 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 25, a first transparent conductive layer 51, a second transparent shielding layer 62, a third transparent conductive layer 53, and the first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The third transparent conductive layer 53 is located between the first transparent shielding layer 61 and the second transparent shielding layer 62. The third transparent conductive layer 53 may cover the surface and side of the second transparent shielding layer 62 away from the substrate 10, and the third transparent conductive layer 53 is in contact with the portion of the first transparent conductive layer 51 away from the substrate. The orthographic projection of the second transparent shielding layer 62 onto the substrate is within the orthographic projection range of the third transparent conductive layer 53 onto the substrate, the orthographic projection of the third transparent conductive layer 53 onto the substrate is within the orthographic projection range of the first transparent conductive layer 51 onto the substrate, and the orthographic projection of the first transparent conductive layer 51 onto the substrate is within the orthographic projection range of the first transparent shielding layer 61 onto the substrate.
[0174] This example, by placing a third transparent conductive layer between two transparent shielding layers, and ensuring that the third transparent conductive layer is in contact with the first transparent conductive layer, enhances the contact capability between the second electrode of the first light-emitting element and the first transparent conductive layer, and also helps to reduce the voltage drop of the first transparent conductive layer. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0175] Figure 26 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 26, a first transparent conductive layer 51, a second transparent shielding layer 62, and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel defining layer 35 away from the substrate 10. The orthographic projection of the pixel defining layer 35 onto the substrate 10 is within the orthographic projection range of the first transparent conductive layer 51 onto the substrate 10. The first conductive side of the first transparent conductive layer 51 near the first pixel opening may protrude from the pixel defining layer 35 in a direction parallel to the substrate. The structure of this example can reduce the adhesion effect when evaporating the material of the light-emitting functional layer of the light-emitting element, and can make it easier for the cathode to overlap with the first transparent conductive layer 51 from above. The remaining structure of the display substrate of this example can be referred to the description of the foregoing embodiments, and will not be repeated here.
[0176] Figure 27 is another partial cross-sectional schematic diagram of the first display area of a display substrate according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 27, a first transparent conductive layer 51 and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel definition layer 35 away from the substrate 10. The orthographic projections of the first transparent conductive layer 51 and the first transparent shielding layer 61 onto the substrate 10 may partially overlap.
[0177] In some examples, the first transparent conductive layer 51 is provided with a plurality of first recesses K21, the orthographic projection of the first recesses K21 onto the substrate 10 may be located within the orthographic projection range of the pixel definition layer 35 onto the substrate 10. The first transparent conductive layer 51 has a second conductive side surface 515 surrounding the first recesses K21, the second conductive side surface 515 being in contact with the second electrode (e.g., the first cathode layer 303) of the first light-emitting element. The first transparent shielding layer 61 may be provided with a plurality of shielding openings communicating with the first recesses K21, the orthographic projection of the shielding openings onto the substrate 10 may be located within the orthographic projection range of the first recesses K21 onto the substrate 10. The first transparent shielding layer 61 has a second protrusion 810b protruding from the second conductive side surface 515 of the first transparent conductive layer 61 in a direction parallel to the substrate 10, the second protrusion 810b not being in contact with the first transparent conductive layer 51.
[0178] In some examples, the first transparent shielding layer 61 may cover the first conductive side of the first transparent conductive layer 51 near the first pixel opening and the side of the pixel definition layer 35. The first cathode layer 303 may cover the surface of the first transparent shielding layer 61 away from the substrate, and may also cover the side of the first transparent shielding layer 61 facing the shielding opening, and extend into the first recess K21 of the first transparent conductive layer 51, contacting the second conductive side 515 of the first transparent conductive layer 51.
[0179] This example, by providing a first transparent shielding layer with a second protrusion, can isolate the light-emitting functional layers of adjacent first light-emitting elements and ensure that the second electrode of the first light-emitting element is in contact with the first transparent conductive layer. This ensures the electrical connection of the second electrodes of multiple first light-emitting elements within the first display area and also helps to improve the light transmittance of the first display area. The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0180] Figure 28 is another partial top view of the first display area according to at least one embodiment of the present disclosure. In some examples, as shown in Figure 28, a first transparent conductive layer 51 and a first transparent shielding layer 61 may be sequentially disposed on the side of the pixel definition layer 35 away from the substrate in the first display area. The orthographic projection of the first transparent conductive layer 51 onto the substrate may be located within the orthographic projection range of the first transparent shielding layer 61 onto the substrate. The first transparent conductive layer 51 may include an annular structure surrounding the light-emitting region of the first light-emitting element, and the first transparent shielding layer 61 may include an annular structure surrounding the light-emitting region of the first light-emitting element. The side structures of the first transparent conductive layer 51 and the first transparent shielding layer 61 near the light-emitting region of the first light-emitting element can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0181] Figure 29 is another partial top view of the second display area according to at least one embodiment of the present disclosure. Figure 30 is a partial cross-sectional view along the PP' direction in Figure 29. In some examples, as shown in Figure 29, the second display area may be provided with a plurality of second light-emitting elements and a plurality of second pixel circuits. At least one second pixel circuit may be connected to at least one second light-emitting element. The plurality of second light-emitting elements in the second display area may include: a second light-emitting element 71 emitting a first color light, a second light-emitting element 72 emitting a second color light, and second light-emitting elements 73 and 74 emitting a third color light. For example, the first color light may be red light, the second color light may be blue light, and the third color light may be green light. The arrangement of the plurality of second light-emitting elements in the second display area is similar to the arrangement of the plurality of first light-emitting elements in the first display area, and therefore will not be described again here.
[0182] In some examples, as shown in Figures 29 and 30, the second light-emitting element 71 may include: a stacked anode 711, a light-emitting functional layer 7001 (e.g., including a stacked first functional layer 301, a light-emitting layer 712, and a second functional layer 302), and a cathode layer (e.g., including a first cathode layer 303 and a second cathode layer 304); the second light-emitting element 72 may include: a stacked anode 721, a light-emitting functional layer 7002 (e.g., including a stacked first functional layer 301, a light-emitting layer 722, and a second functional layer 302), and a cathode layer (e.g., including a first cathode layer 303 and a second cathode layer 304). The light-emitting layer 712 may be a red light-emitting layer, and the light-emitting layer 722 may be a blue light-emitting layer.
[0183] In some examples, as shown in Figures 29 and 30, the display substrate of the second display area may include: a substrate 10, a driving structure layer 11 disposed on the substrate 10, a light-emitting structure layer, and an encapsulation structure layer in the direction perpendicular to the display substrate. The light-emitting structure layer of the second display area may include: an anode layer, a pixel definition layer 35, a light-emitting functional layer, and a cathode layer disposed sequentially on the driving structure layer 11.
[0184] In some examples, the second display area also includes a plurality of first spacer pillars 75 disposed on the side of the pixel definition layer 35 away from the substrate 10. The plurality of first spacer pillars 75 are disposed within a plurality of second light-emitting elements. For example, the plurality of first spacer pillars 75 may be disposed in proportion or density to a plurality of pixel units in the second display area. A single pixel unit in the second display area may include: a second light-emitting element emitting a first color light, a second light-emitting element emitting a second color light, and two second light-emitting elements emitting a third color light; or, a single pixel unit in the second display area may include: a second light-emitting element emitting a first color light, a second light-emitting element emitting a second color light, and a second light-emitting element emitting a third color light. In some examples, one pixel unit in the second display area may correspond to one first spacer pillar, or four pixel units may correspond to one first spacer pillar. For example, a first spacer pillar 75 may be located within the area surrounded by a second light-emitting element 71 emitting a first color light, a second light-emitting element 72 emitting a second color light, and two adjacent second light-emitting elements 73 and 74 emitting a third color light. For example, a portion of the second display area may be provided with first spacer pillars 75. In other examples, multiple first spacer pillars 75 and multiple second light-emitting elements may be arranged alternately.
[0185] In some examples, the first spacer pillar 75 may include a first pillar layer 751 and a second pillar layer 752. The second pillar layer 752 is located on the side of the first pillar layer 751 away from the pixel definition layer 35. The orthographic projections of the first pillar layer 751 and the second pillar layer 752 onto the substrate 10 may be approximately circular, elliptical, or may be square, rectangular, or other polygonal shapes. For example, the orthographic projection of the second pillar layer 752 onto the substrate may cover the orthographic projection of the first pillar layer 751 onto the substrate. The first pillar layer 751 may be co-layered with the first transparent conductive layer of the first display area, and the second pillar layer 752 may be co-layered with the first transparent shielding layer of the first display area.
[0186] In some examples, the encapsulation structure layers may include a first inorganic encapsulation layer 41, a second inorganic encapsulation layer 42, an organic encapsulation layer 44, and a third inorganic encapsulation layer 43, which are stacked sequentially. The orthographic projection of the first inorganic encapsulation layer 41 onto the substrate may cover the orthographic projection of the first spacer pillar 75 onto the substrate. For example, the first inorganic encapsulation layer 41 of the second display area may not be patterned, and the first inorganic encapsulation layer may cover the entire second display area.
[0187] The remaining structure of the second display area can be described with reference to the structural description of the first display area in the foregoing embodiments, and will not be repeated here.
[0188] Figure 31 is another partial cross-sectional view along the PP' direction in Figure 29. In some examples, as shown in Figure 31, the first inorganic encapsulation layer 41 within the second display area is patterned. The first inorganic encapsulation layer 41 has at least one second encapsulation opening F2 in the second display area. The second encapsulation opening F2 can expose the surface of the first spacer pillar 75 away from the substrate 10. The orthographic projection of the second encapsulation opening F2 onto the substrate 10 can be located within the orthographic projection range of the pixel definition layer 35 onto the substrate 10. For example, the orthographic projection of the second encapsulation opening F2 onto the substrate 10 can be located within the orthographic projection range of the first spacer pillar 75 onto the substrate 10. The second inorganic encapsulation layer 42 can contact the portion of the second pillar layer 752 of the first spacer pillar 75 away from the substrate 10 through the second encapsulation opening F2. The remaining structure of the second display area in this example can be referred to the description of the foregoing embodiments, and will not be repeated here.
[0189] Figure 32 is another partial top view of the second display area according to at least one embodiment of the present disclosure. Figure 33 is a partial cross-sectional view along the SS' direction in Figure 32. Figure 34 is a partial cross-sectional view of the first display area according to at least one embodiment of the present disclosure.
[0190] In some examples, as shown in Figures 32 to 34, a plurality of second spacer pillars 76 may be disposed on the side of the pixel definition layer 35 of the display substrate away from the substrate 10. In the second display area, the plurality of second spacer pillars 76 may be arranged between a plurality of second light-emitting elements and located on the pixel definition layer 35; in the first display area, the plurality of second spacer pillars 76 may be arranged between a plurality of first light-emitting elements and located on the side of the first transparent shielding layer 61 away from the substrate 10.
[0191] In some examples, the orthographic projection of the second spacer pillar 76 in the second display area onto the substrate 10 may lie within the orthographic projection range of the pixel definition layer 35 onto the substrate 10. The film layer containing the second spacer pillar 76 may be different from the first transparent conductive layer 51 and the first transparent shielding layer 61. For example, the second spacer pillar 76 may be fabricated after the formation of the first transparent conductive layer 51 and the first transparent shielding layer 61, which may be located only in the first display area.
[0192] In some examples, the pixel definition layer 35 of the first display area, away from the substrate 10, may be sequentially provided with a first transparent conductive layer 51, a first transparent shielding layer 61, and a second spacer pillar 76. The orthographic projection of the second spacer pillar 76 onto the substrate 10 may be located within the orthographic projection range of the first transparent shielding layer 61 onto the substrate 10. For example, the material of the plurality of second spacer pillars 76 may be an organic insulating material.
[0193] The remaining structure of the display substrate in this example can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0194] In other examples, apart from the driving structure layer, the film layer structures of the first display area and the second display area can be substantially the same. For example, the second display area can be provided with a first transparent conductive layer and a first transparent shielding layer, and the shapes of the first transparent conductive layer and the first transparent shielding layer in the second display area can be similar to the shapes of the first transparent conductive layer and the first transparent shielding layer in the first display area.
[0195] The film structures of the first display area and the second display area in the foregoing embodiments can be combined with each other. This embodiment does not limit the combination method of the above embodiments.
[0196] This embodiment also provides a method for fabricating a display substrate, comprising: sequentially forming a first electrode of a plurality of first light-emitting elements, a pixel definition layer, a first transparent conductive layer, and a first transparent shielding layer on a substrate; sequentially depositing a light-emitting functional film and a conductive film, forming a light-emitting functional layer and a second electrode of the first light-emitting element within a first pixel opening; depositing a first inorganic encapsulation film, and patterning the first inorganic encapsulation film and the conductive film located on the first transparent shielding layer using the same patterning process to form a first inorganic encapsulation layer and an inactive conductive layer. Wherein, the first electrodes of the plurality of first light-emitting elements are located in a first display area; the pixel definition layer is located on the side of the first electrodes of the plurality of first light-emitting elements away from the substrate; the pixel definition layer has a plurality of first pixel openings in the first display area exposing the first electrodes of the plurality of first light-emitting elements; the first transparent conductive layer is located on the side of the pixel definition layer away from the substrate; the first transparent shielding layer is located on the side of the first transparent conductive layer away from the substrate; and the orthographic projection of the first transparent conductive layer on the substrate is within the orthographic projection range of the first transparent shielding layer on the substrate. The light-emitting functional layer of the adjacent first light-emitting element is separated by the first transparent shielding layer; the second electrode of the adjacent first light-emitting element is separated by the first transparent shielding layer and is in contact with the first transparent conductive layer.
[0197] The preparation method provided in this embodiment forms the first inorganic encapsulation layer and the ineffective conductive layer through the same patterning process, which simplifies the preparation process. It eliminates the need to use FMM to etch the conductive film and enables precise patterning, which is beneficial to improving the light transmittance of the first display area.
[0198] In some exemplary embodiments, the fabrication method may further include at least one of the following: retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the light-emitting functional film located on the first transparent shielding layer; retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the first transparent shielding layer; retaining the photoresist layer used in the patterning process of the first inorganic encapsulation film and etching the first transparent conductive layer. This example utilizes the photoresist layer from the fabrication process of the first inorganic encapsulation layer to further etch at least one of the light-emitting functional film, the first transparent shielding layer, and the first transparent conductive layer, which can further improve the light transmittance of the first display area.
[0199] The preparation method of this embodiment can be referred to the description of the foregoing embodiments, and therefore will not be repeated here.
[0200] Figure 35 is a schematic diagram of a display device according to at least one embodiment of the present disclosure. As shown in Figure 35, this embodiment provides a display device including: a display substrate 91 and a sensor 92 located on the light-emitting side of the light-emitting structure layer away from the display substrate 91. The sensor 92 may be located on the non-display surface side of the display substrate 91. The orthographic projection of the sensor 92 on the display substrate 91 may at least partially overlap with a first display area A1. For example, the orthographic projection of the sensor 92 on the display substrate 91 may be located within the range of the first display area A1. In some examples, the sensor 92 may include a camera or an infrared sensor.
[0201] In some examples, the display substrate 91 can be a flexible OLED display substrate, a QLED display substrate, a Micro-LED display substrate, or a Mini-LED display substrate. The display device can be a product with image (including still images or moving images, where the moving images can be video) display capabilities. For example, the display device can be any of the following: monitor, television set, billboard, digital photo frame, laser printer with display function, telephone, mobile phone, drawing screen, personal digital assistant (PDA), digital camera, portable camcorder, viewfinder, navigator, vehicle, large-area wall, information query equipment (such as business query equipment for e-government, banks, hospitals, power companies, etc.), monitor, etc. Furthermore, the display device can also be any of the following: microdisplay, VR device or AR device containing a microdisplay, etc.
[0202] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.
[0203] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.
Claims
1. A display substrate, comprising: Substrate, including the first display area; Multiple first light-emitting elements are located in the first display area. Each first light-emitting element includes: a first electrode, a light-emitting functional layer, and a second electrode stacked together. The first electrode is located on the side of the second electrode closer to the substrate. A pixel definition layer is located on the side of the first electrode of the plurality of first light-emitting elements away from the substrate. The pixel definition layer has a plurality of first pixel openings in the first display area. The light-emitting functional layer and the second electrode of the first light-emitting element are disposed in the first pixel openings. The light-emitting functional layer contacts the first electrode through the first pixel opening. A first transparent conductive layer is located on the side of the pixel definition layer away from the substrate; A first transparent shielding layer is located on the side of the first transparent conductive layer away from the substrate; the orthographic projection of the first transparent conductive layer on the substrate and the orthographic projection of the first transparent shielding layer on the substrate at least partially overlap. The first transparent conductive layer has a first conductive side surface near the first pixel opening, and the second electrode disposed at the first pixel opening is in contact with the first conductive side surface of the first transparent conductive layer; the first transparent shielding layer has a first protrusion protruding from the first conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, and the first protrusion is not in contact with the first transparent conductive layer. Alternatively, the first transparent conductive layer has at least one first recess, the orthographic projection of the first recess onto the substrate is within the orthographic projection range of the pixel definition layer onto the substrate, the first transparent conductive layer has a second conductive side surface surrounding the first recess, the second conductive side surface being in contact with the second electrode of the first light-emitting element; the first transparent shielding layer has at least one shielding opening, the shielding opening communicating with the first recess, the orthographic projection of the shielding opening onto the substrate being within the orthographic projection range of the first recess onto the substrate, the first transparent shielding layer has a second protrusion protruding from the second conductive side surface of the first transparent conductive layer in a direction parallel to the substrate, the second protrusion not being in contact with the first transparent conductive layer.
2. The display substrate according to claim 1, further comprising: An ineffective light-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate; An invalid electrode layer is located on the side of the invalid light-emitting functional layer away from the substrate; A first inorganic encapsulation layer is located on the side of the second electrode and the invalid electrode layer away from the substrate. The first inorganic encapsulation layer has at least one first encapsulation opening in the first display area. The orthographic projection of the first encapsulation opening on the substrate is located within the orthographic projection range of the pixel definition layer on the substrate. The second inorganic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate. The second inorganic encapsulation layer contacts the ineffective light-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening.
3. The display substrate according to claim 1, further comprising: An ineffective light-emitting functional layer is located on the side of the first transparent shielding layer away from the substrate; An invalid electrode layer is located on the side of the invalid light-emitting functional layer away from the substrate; A first inorganic encapsulation layer is located on the side of the second electrode and the invalid electrode layer away from the substrate. The first inorganic encapsulation layer has at least one first encapsulation opening in the first display area. The orthographic projection of the first encapsulation opening on the substrate is located within the orthographic projection range of the pixel definition layer on the substrate. An organic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate. The organic encapsulation layer contacts the ineffective light-emitting functional layer through the first encapsulation opening, or contacts the first transparent shielding layer through the first encapsulation opening, or contacts the first transparent conductive layer through the first encapsulation opening, or contacts the pixel definition layer through the first encapsulation opening.
4. The display substrate according to claim 1, further comprising: At least one second transparent conductive layer is located between the first transparent conductive layer and the first transparent shielding layer; The orthographic projection of the first transparent conductive layer onto the substrate and the orthographic projection of the second transparent conductive layer onto the substrate at least partially overlap.
5. The display substrate according to claim 4, wherein, The second transparent conductive layer has a third conductive side surface near the opening of the first pixel; the first protrusion of the first transparent shielding layer protrudes from the third conductive side surface of the second transparent conductive layer in a direction parallel to the substrate, and the first protrusion does not contact the second transparent conductive layer.
6. The display substrate according to claim 1, further comprising: At least one second transparent shielding layer is located on the side of the first transparent shielding layer near the substrate, and the orthographic projection of the second transparent shielding layer on the substrate at least partially overlaps with the orthographic projection of the first transparent shielding layer on the substrate.
7. The display substrate according to claim 6, wherein, The orthographic projection of the second transparent shielding layer onto the substrate is within the orthographic projection range of the first transparent conductive layer onto the substrate, and the orthographic projection of the first transparent conductive layer onto the substrate is within the orthographic projection range of the first transparent shielding layer onto the substrate.
8. The display substrate according to claim 6, further comprising: A third transparent conductive layer is located between the first transparent shielding layer and the second transparent shielding layer; The third transparent conductive layer covers the surface and side of the second transparent shielding layer away from the substrate, and the third transparent conductive layer is in contact with the portion of the first transparent conductive layer away from the substrate.
9. The display substrate according to claim 1, further comprising: A pixel definition protective layer is located between the pixel definition layer and the first transparent conductive layer; the pixel definition protective layer covers the surface and side of the pixel definition layer away from the substrate.
10. The display substrate according to claim 1, characterized in that, The orthographic projection of the pixel definition layer onto the substrate is located within the orthographic projection range of the first transparent conductive layer onto the substrate.
11. The display substrate according to claim 1, wherein, The thickness of the first transparent conductive layer ranges from 0.2 micrometers to 5 micrometers, and the thickness of the first transparent shielding layer ranges from 0.03 micrometers to 3 micrometers.
12. The display substrate according to claim 1, wherein, The minimum distance between the boundary of the first transparent conductive layer near the first pixel opening and the boundary of the first transparent shielding layer near the first pixel opening is 0.3 micrometers to 5 micrometers; The minimum distance between the boundary of the first transparent conductive layer near the first pixel opening and the boundary of the pixel definition layer is 0.2 micrometers to 10 micrometers.
13. The display substrate according to any one of claims 1 to 12, wherein, The substrate further includes: a second display area; the second display area is located on at least one side of the first display area, and the light transmittance of the second display area is less than the light transmittance of the first display area.
14. The display substrate according to claim 13, further comprising: Multiple first septum columns are located in the second display area; Multiple second light-emitting elements are located in the second display area; The plurality of first septum pillars are disposed in the plurality of second light-emitting elements. One of the plurality of first septum pillars includes: a first pillar layer and a second pillar layer. The first pillar layer and the first transparent conductive layer are of the same structure, and the second pillar layer and the first transparent shielding layer are of the same structure.
15. The display substrate according to claim 14, further comprising: The first inorganic encapsulation layer is located on the side of the second electrode away from the substrate; The first inorganic encapsulation layer covers the orthographic projection of the plurality of first spacer pillars onto the substrate in the second display area; or, the first inorganic encapsulation layer has at least one second encapsulation opening in the second display area, and the orthographic projection of the second encapsulation opening onto the substrate is located within the orthographic projection range of the pixel definition layer onto the substrate.
16. The display substrate according to claim 15, further comprising: The second inorganic encapsulation layer is located on the side of the first inorganic encapsulation layer away from the substrate; The second inorganic encapsulation layer contacts the first spacer pillar through the second encapsulation opening.
17. The display substrate according to claim 14, further comprising: Multiple second spacer columns are located in the first display area and the second display area; The plurality of second spacer pillars in the first display area are located on the side of the first transparent shielding layer away from the substrate, and the plurality of second spacer pillars in the second display area are in contact with the pixel definition layer.
18. A display device comprising a display substrate as claimed in any one of claims 1 to 17, and a sensor located on a non-display side of the display substrate, wherein the orthographic projection of the sensor onto the display substrate at least partially overlaps with a first display area of the display substrate.
19. A method for preparing a display substrate, comprising: A first electrode, a pixel definition layer, a first transparent conductive layer, and a first transparent shielding layer of multiple first light-emitting elements are sequentially formed on a substrate. The first electrodes of the plurality of first light-emitting elements are located in the first display area, and the pixel definition layer is located on the side of the first electrodes of the plurality of first light-emitting elements away from the substrate. The pixel definition layer is provided with a plurality of first pixel openings in the first display area that expose the first electrodes of the plurality of first light-emitting elements. The first transparent conductive layer is located on the side of the pixel definition layer away from the substrate, the first transparent shielding layer is located on the side of the first transparent conductive layer away from the substrate, and the orthographic projection of the first transparent conductive layer on the substrate is within the orthographic projection range of the first transparent shielding layer on the substrate. A light-emitting functional film and a conductive film are deposited sequentially to form a light-emitting functional layer and a second electrode of the first light-emitting element within the first pixel opening; wherein, the light-emitting functional layers of adjacent first light-emitting elements are separated by the first transparent shielding layer; the second electrodes of adjacent first light-emitting elements are separated by the first transparent shielding layer and are in contact with the first transparent conductive layer. A first inorganic encapsulation film is deposited, and the first inorganic encapsulation film and the conductive film located on the first transparent shielding layer are patterned using the same patterning process to form a first inorganic encapsulation layer and an ineffective conductive layer.
20. The preparation method according to claim 19, further comprising at least one of the following: The photoresist layer used in the patterning process of the first inorganic encapsulation film is retained, and the light-emitting functional film located on the first transparent shielding layer is etched. The photoresist layer used in the patterning process of the first inorganic encapsulation film is retained, and the first transparent shielding layer is etched. The photoresist layer used in the patterning process of the first inorganic encapsulation film is retained, and the first transparent conductive layer is etched.
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