Workpiece transport apparatus with end effector environmental conditioning and method therefor

Abstract

A substrate transport robot including: a base; an articulated robot arm connected to the base, the articulated robot arm having an end effector thereon and being articulated so as to move with at least one degree of freedom, the end effector has a substrate holding station configured to hold a substrate, and transport the substrate held thereon from a first location to a second location via movement of the end effector; and the end effector has impinging on the substrate holding station a predetermined continuous steady state differential pressure plenum region that defines a continuously steady state fluidic isolation barrier disposed on the substrate holding station throughout movement of the end effector between the first location and the second location, and isolates the substrate held on the substrate holding station from an environment exterior the predetermined continuous steady state differential pressure plenum.

Description

Aty. Docket No. 390P017059-WO (PCT) / Br. 2237WORKPIECE TRANSPORT APPARATUS WITH END EFFECTOR ENVIRONMENTAL CONDITIONING AND METHOD THEREFORCROSS-REFERENCE TO RELATED APPLICATION(S)

[0001] This application is a non-provisional of and claims the benefit of United States provisional patent application number 63 / 693,593 filed on September 11, 2024, the disclosure of which is incorporated herein by reference in its entirety.BACKGROUND1. Field

[0002] The present disclosure generally relates to workpiece handling, and more particularly, to environmental conditioning within workpiece handling environments.2. Brief Description of Related Developments

[0003] Robot assemblies are an important component in automation, especially in manufacturing facilities and manufacturing equipment. For example, in the industry, robot arms are used to handle semiconductor wafers, flat panel displays, reticles, masks, or other planar workpieces. Referring to, for example, semiconductor fabrication robots can be used to transport workpieces, typically stored in transport containers. The robots are typically used to remove the workpieces from the transport containers for manipulation or transfer to other locations within a processing system. Handling of these workpieces generally demands a high, level of cleanliness, and thus impurities such as contaminants or particles must be prevented as much as possible from entering the clean environment of the processing system. Relative humidity and or oxygen concentrationsAty. Docket No. 390P017059-WO (PCT) / Br. 2237 within the process system can also affect processes performed on the workpieces and subsequent process yields of the workpieces.

[0004] Conventionally, the process systems include clean environments having a fan-filter unit that circulates air through the clean environment and filters the air entering the clean environment. However, the circulated air may have humidity and / or oxygen concentrations that may affect the process yields of the workpieces. To increase process yields of the workpieces it is desirable to minimize the number of particles, humidity, and / or oxygen interacting with the workpieces within the processing system.

[0005] Accordingly, the present disclosure addresses a number of those issues.BRIEF DESCRIPTION OF THE DRAWINGS

[0006] The foregoing aspects and other features of the present disclosure are explained in the following description, taken in connection with the accompanying drawings, wherein:

[0007] Fig. 1 A is an exemplary schematic illustration of a processing apparatus incorporating features of the present disclosure;

[0008] Fig. Fig. IB is a schematic block diagram of a portion of the processing apparatus of Fig. 1A in accordance with the present disclosure;

[0009] Fig. 2A is a schematic perspective view illustration of a portion of the processing apparatus of Fig. 1A in accordance with the present disclosure;

[0010] Figs. 2B-2G are schematic illustrations of different articulated robot arms of the processing apparatus of Fig. 1 A to which the present disclosure is applied;Aty. Docket No. 390P017059-WO (PCT) / Br. 2237

[0011] Fig. 3A is a schematic perspective view illustration of an articulated robot arm of the processing apparatus of Fig. 1A in accordance with the present disclosure;

[0012] Fig. 3B is a schematic side view illustration of the articulated robot arm of Fig. 3A in accordance with the present disclosure;

[0013] Fig. 3C is a schematic side view illustration of the articulated robot arm of Fig. 3A in accordance with the present disclosure;

[0014] Fig. 4A is a schematic perspective view illustration of a portion of the articulated robot arm of Figs. 2A-2G and 3 A in accordance with the present disclosure;

[0015] Fig. 4B is a schematic perspective view illustration of a portion of the articulated robot arm of Figs. 2A-2G and 3 A in accordance with the present disclosure;

[0016] Fig. 4C is a schematic illustration of fluid flow patterns of the portions of the articulated robot arm of Figs. 4A and 4B in accordance with the present disclosure;

[0017] Fig. 5 A is a schematic perspective view illustration of a portion of the articulated robot arm of Figs. 2A-2G and 3A in accordance with the present disclosure;

[0018] Fig. 5B is a schematic side view illustration of a portion of the articulated robot arm of Figs. 2A-2G and 3A in accordance with the present disclosure; and

[0019] Fig. 6 is an exemplary flow diagram of a method in accordance with the present disclosure.DETAILED DESCRIPTIONAty. Docket No. 390P017059-WO (PCT) / Br. 2237

[0020] The following detailed description is meant to assist the understanding of one skilled in the art, and is not intended in any way to unduly limit claims connected or related to the present disclosure.

[0021] The following detailed description references various figures, where like reference numbers refer to like components and features across various figures, whether specific figures are referenced, or not.

[0022] The word “each” as used herein refers to a single object (i.e., the object) in the case of a single object or each object in the case of multiple objects. The words “a,” “an,” and “the” as used herein are inclusive of “at least one” and “one or more” so as not to limit the noun being referred to as being in its “singular” form.

[0023] Spatial terms such as “left,” “right,” “top,” “bottom,” “upper,” “lower,” “front,” “back,” “vertical,” and “horizontal” as may be used herein are by way of example and illustration only are not meant to limit the description and may be exchanged in position and orientation.

[0024] The terms “substantially” and “about” as may be used herein refer to a feature that may be varied within an acceptable manufacturing tolerance for a given application.

[0025] Fig. 1A illustrates an exemplary processing apparatus or tool 100 in accordance with the present disclosure. Although the present disclosure will be described with reference to the drawings, it should be understood that the present disclosure could be embodied in many forms. In addition, any suitable size, shape or type of elements or materials could be used.

[0026] The processing apparatus 100 may be configured for processing any suitable workpieces W in any suitable processing environment. For example, the workpieces W may be any desired type of planar workpiece such as semiconductor workpieces, flat panels for flat panel displays, imaging plates (e.g., masks or reticles), semiconductor packaging substrates (e.g., high density interconnects), semiconductor wafers (e.g., 200mm, 300mm, or larger), or any other planarAty. Docket No. 390P017059-WO (PCT) / Br. 2237 workpiece. The processing environment in one or more portions of the processing apparatus 100 may be a vacuum environment or an atmospheric pressure environment (e.g., where the atmospheric pressure environment includes at least a portion of the processing apparatus 100 filled with an inert gas or clean dry air). For example, a portion of the processing tool 100 has a vacuum environment and another portion of the processing apparatus 100 has an atmospheric pressure environment or all portions of the processing tool 100 have an atmospheric pressure environment.

[0027] For exemplary purposes only, the processing apparatus 100 includes a workpiece processing section 150 and a load port module 120 coupled to the workpiece processing section 150. The load port module 120 is configured to interface with transport containers 110 so as to open the transport containers 110 to the processing environment within the workpiece processing section 150. The workpiece processing section 150 includes, for example, an environmental frontend module or EFEM 130 and a workpiece process module 140.

[0028] The EFEM 130 includes a workpiece transport or substrate transport robot 180 configured to transport workpieces W between the transport containers 110 and the workpiece process module 140. The EFEM 130 has a controlled environment therein where clean-dry fluid FL is input into a top portion of the EFEM 130 by, for example, a fan-filter unit 135. That clean-dry fluid is output from a bottom portion of the EFEM 130 by a fluid outlet 136. The flow of fluid FL from the top portion to the bottom portion of the EFEM 130 causes particles and / or contaminants to flow downwards away from any workpieces being transported by the workpiece transport 180. The fluid FL is any suitable inert gas (including but not limited to nitrogen) or clear-dry air.

[0029] While the EFEM 130 may provide a substantially continuous flow of fluid within the EFEM 130, the fluid FL may acquire or otherwise mix with moisture generated within the processing apparatus from, for example, condensation or processes performed on the workpieces. Oxygen concentrations of the fluid FL may be increased within the EFEM 130 where the oxygen mixing with the fluid FL originates from, for example, processes performed on the workpieces. To reduce or substantially mitigate the effects of any increase in humidity and / or oxygenAty. Docket No. 390P017059-WO (PCT) / Br. 2237 concentration of the fluid FL, the present disclosure may provide for the introduction of fluid FL (e g., referred to herein as substantially unadulterated fluid UFL that is substantially unadulterated from travel through the EFEM 130) substantially at and around a workpiece holding area or station WHS of the workpiece transport 180. Introduction of the fluid FL at and around the workpiece may provide, as will be described in greater detail herein and with brief reference to Fig. 5B, a blanket or curtain 599 of substantially unadulterated fluid UFL flowing over at least a top surface WT of the workpiece W held on the workpiece transport 180. This blanket or curtain 599 of substantially unadulterated fluid forms a boundary flow or layer of fluid 580 that may substantially protects the workpiece W from any moisture added to and or increase in oxygen concentration of the fluid FL as the fluid FL passes from the top portion of the EFEM 130 to the bottom portion of the EFEM 130 after exiting the fan-filter unit 135. Generally, the humidity of a clean room in which workpieces are handled is about 30%Rh (percent relative humidity) to about 65%Rh and is considered to be a high humidity if above about 20%Rh. The present disclosure may provide for humidity levels in an area or zone around the workpiece W held by the workpiece transport 180, the area being defined by the blanket or curtain 599, where the humidity levels are within about 30%Rh to about 65%Rh, within about 30%Rh and about 50%Rh, at about 30% or less, or at or about 20%Rh or less. The present disclosure may provide for the reduction or substantial removal of oxygen within the area around the workpiece W with the workpiece W held by the workpiece transport 180.

[0030] The workpiece process module 140 may be configured to perform any suitable process on the workpieces W. For example, the workpiece process module 140 may be configured as a workpiece sorter, stacker, metrology module, or be configured to perform a manufacturing process on the workpiece. The workpiece process module 140 may have any suitable controlled environment therein (e.g., an atmospheric pressure environment, an inert gas environment, a clean dry air environment, a vacuum environment, etc.), and generally comprises a processing system for processing workpieces. Where the workpiece process module 140 includes a vacuum environment the vacuum therein may be a high vacuum such as, for example, about IxlO’5TorrAty. Docket No. 390P017059-WO (PCT) / Br. 2237(e.g., about .001 Pa) or below. Exemplary processes that may be performed in the processing modules include, but are not limited to cleaning, baking, inspecting, thin film processes that use a vacuum such as plasma etch or other etching processes, chemical vapor deposition (CVD), plasma vapor deposition (PVD), implantation such as ion implantation, metrology, rapid thermal processing (RTP), dry strip atomic layer deposition (ALD), oxidation / diffusion, forming of nitrides, vacuum lithography, epitaxy (EPI), wire bonder and evaporation, other thin film processes that use vacuum pressures, etc.

[0031] Suitable examples of processing apparatus to which the present disclosure may be employed may be found in, for example, United States patent application number 15 / 215,143 filed on July 20, 2016 and titled “Substrate Processing Apparatus”; United States patent numbers 10,777,438 titled “Processing Apparatus,” and issued on September 15, 2020, 8,960,099 titled “Substrate Processing Apparatus,” and issued on February 24, 2015, 8,371,792 titled “Substrate Processing Apparatus,” and issued on February 12, 2013, 7,988,398 titled “Linear Substrate Transport Apparatus,” and issued on August 2, 2011, 9,105,673 titled “Side Opening Unified Pod,” and issued on August 11, 2015, 9,401,294 titled “Compact Substrate Transport System,” and issued on July 26, 2016, 6,520,727 titled “Modular Sorter,” and issued on February 18, 2003, 8,292,563 titled “Nonproductive Wafer Buffer Module For Substrate Processing Apparatus,” and issued on October 23, 2012, 11,295,975 titled “Method and Apparatus for Substrate Alignment,” and issued on April 5, 2022, 7,100,340 titled “Unified Frame for Semiconductor Material Handling System,” and issued on September 5, 2006, 7,217,076 titled “Semiconductor Material Handling System,” and issued on May 15, 2007, 7,648,327 titled “Wafer Engine,” and issued on January 19, 2010, 7,066,707 titled “Wafer Engine,” and issued on June 27, 2006, 9,943,969 titled “Clean Transfer Robot,” and issued on April 17, 2018; and International patent application number PCT / US13 / 25513 entitled “Substrate Processing Apparatus” and filed on February 11, 2013, the disclosures of which are incorporated herein by reference in their entireties.

[0032] Referring to Figs. 1A and IB, EFEM 130, may have a shell or casing (also referred to as the EFEM frame) defining a protected environment, or mini-environment where workpieces WAty. Docket No. 390P017059-WO (PCT) / Br. 2237 may be accessed and handled with minimized potential for contamination between the transport containers 110 and the workpiece process module 140. The transport containers 110 being used to transport the workpieces W to and from the processing apparatus 100. The present disclosure may provide for substantial environment isolation of the workpiece W held on the workpiece transport 180 so that the workpiece is substantially isolated from a higher relative humidity environment within the EFEM 130. This environmental isolation may be employed at the end effector or workpiece / substrate holder 200 (see Fig. 2A) of the workpiece transport 180 where the workpiece W would be exposed to an ambient atmosphere within the EFEM 130 during picking, placing, and transfer of the workpiece W between the transport container 110 and the workpiece process module 140 (or any other suitable pick / place locations accessible to the workpiece transport 180 within the EFEM 130).

[0033] As described above, the substantial environmental isolation of the workpiece W held on the end effector 200 (see Fig. 2A) may be effected by blanketing or otherwise covering at least the top surface WT of the workpiece W (See Fig. 5B) with the fluid FL, in a substantially unadulterated state, ejected from an exhaust nozzle 193 formed in (integral with) or coupled to the end effector 200, as will be described in greater detail herein. This substantial environmental isolation of the workpiece W held on the end effector 200 may create, in effect, a sub-environment (e.g., the area or zone defined by the blanket or curtain 599, see Fig. 5) within the EFEM 130 that provides an atmospheric environment, around and / or over at least a portion of the workpiece W, that is separate from the ambient atmosphere within the EFEM 130 (e.g., separate apart from the edges of the area opposite the workpiece W, where the edges interface with and prevent entry of the ambient atmosphere to an interior region or fluidic envelope FE of the blanket or curtain 599 adjacent the workpiece W).

[0034] The EFEM 130 includes a fluid flow system 190 (see Fig. IB) that includes, for example, a fluid supply 191, a fluid dryer / purifier 192, the fan-filter unit 135, an end effector exhaust nozzle 193, and a fluid outlet 194. As described herein, the fluid FL is any suitable inert gas (including but not limited to nitrogen) or clear-dry air. Where the fluid FL is clear dry air, the fluid flowAty. Docket No. 390P017059-WO (PCT) / Br. 2237 system 190 may be either an open system or a closed loop system. In the open system, air may be drawn or otherwise extracted by the fluid supply 191 in any suitable manner (e.g., such as by pumps, blowers, etc.) from the clean room in which the processing apparatus 100 is located or any other suitable location, introduced into the EFEM 130, and output from the fluid outlet 194 back into to the clean room or other suitable location. In the closed loop system, the fluid outlet 194 is communi cably coupled to the fluid supply 191 so that the fluid FL recirculates within a closed loop of the fluid flow system. For example, the fluid FL provided by the fluid supply 191 is introduced into the EFEM 130 and output from the EFEM 130 by the fluid outlet 194. The fluid FL passes from the fluid outlet 194 back to the fluid supply 191 to be dried and / or purified by the fluid dryer / purifier 192 for recirculation through the EFEM 130 in a substantially continuous loop. Where the fluid FL is the inert gas, the fluid flow system 190 may be the closed loop system.

[0035] Referring to Figs. 2A-2G, the workpiece transport 180 is movably mounted to a frame or base 130F. The frame 130F may be common (e.g., shared) between the workpiece transport 180 and the EFEM 130 (or any suitable transport chamber of any suitable processing apparatus in which the workpiece transport is mounted) or coupled to the EFEM 130 (or chamber) in any suitable manner. The workpiece transport 180 may include any suitable number of drive axes to move a workpiece along one or more of the X, Y, Z, 0, and R (end effector or workpiece holder 200 extension) axes, each of the drive axes being embodied by or otherwise defined by a respective drive motor and drive shaft of a drive section of the workpiece transport 180. For example, the workpiece transport 180 includes at least one transport arm 180TA that may be is mounted to a carriage or base 241 so that the at least one transport arm 180TA is movably mounted to the frame 130F. The carriage 241 may be mounted to a slide 241 S so as to be movable in the X direction; however, the carriage 241 may be mounted to the frame 130F so as to be fixed in the X (and / or Y direction). Any suitable drive 242 is mounted to the frame 130F and drivingly connected to the carriage 241 by any suitable transmission 242T for moving the base 240 in the X direction. The transmission 242T may be a belt and pulley transmission and the drive 242 is a rotary drive; however, the drive 242 may be a linear actuator that is drivingly connected to the carriage 241Aty. Docket No. 390P017059-WO (PCT) / Br. 2237 with any suitable transmission or without a transmission (e.g., such as where the carriage includes a drive portion of the linear actuator).

[0036] The at least one transport arm 180TA is an articulated robot arm that is connected to the frame 130F as described herein. The at least one transport arm 180TA has the end effector 200 thereon and being articulated so as to move with at least one degree of freedom (e.g., under impetus of one or more drives 225, 242, 262). The end effector 200 has a substrate or workpiece holding station WHS configured to hold a substrate or workpiece W, and transport the workpiece W held thereon from a first location (such as one of the cassette 110 and workpiece process module 140 or between any two suitable substrate holding locations) to a second location (such as the other one of the cassette 110 and workpiece process module 140 or between any two suitable substrate holding locations) via movement of the end effector 200. The at least one transport arm 180TA is any suitable transport arm, such as for example, a linear slide transport arm 214 as shown in Fig. 2C or any other suitable transport arm having any suitable arm linkage mechanisms (such as those illustrated in Figs. 2B-2G). Suitable examples of arm linkage mechanisms can be found in, for example, U.S. Pat. No. 7,578,649 issued Aug. 25, 2009; U.S. Pat. No. 5,794,487 issued Aug. 18, 1998; U.S. Pat. No. 7,946,800 issued May 24, 201 1 ; U.S. Pat. No. 6,485,250 issued Nov. 26, 2002; U.S. Pat. No. 7,891,935 issued Feb. 22, 2011; U.S. Pat. No. 8,419,341 issued Apr. 16, 2013; and U.S. patent application Ser. No. 13 / 293,717 entitled “Dual Arm Robot” and filed on Nov. 10, 2011; U.S. patent application Ser. No. 13 / 861,693 entitled “Linear Vacuum Robot with Z Motion and Articulated Arm” and filed on Sep. 5, 2013; U.S. Pat. No. 7,648,327 issued on January 19, 2010 (entitled “Wafer Engine”); U.S. patent application No. 16 / 257,595 filed on January 25, 2019 (entitled “Automatic Wafer Centering Method and Apparatus”); and U.S. patent application No. 14 / 928,352 filed on October 30, 2015 (entitled “Wafer Aligner”), the disclosures of which are all incorporated by reference herein in their entireties.

[0037] The at least one transfer arm 180TA may be or be derived from a conventional SC ARA (selective compliant articulated robot arm) type design (see SCARA arm 219 in Fig. 2F), which includes an upper arm, a forearm, and an end-effector, or from a telescoping arm or any otherAty. Docket No. 390P017059-WO (PCT) / Br. 2237 suitable arm design, such as a Cartesian linearly sliding arm (see, e.g., Figs. 2A and 3A), wherein any such design configuration also includes a slide body 220 and workpiece holder(s) 200A, 200B as described further herein. For example, the slide body 220 may be mounted to an arm link of any suitable articulated transport arm. Suitable examples of transport arms can be found in, for example, U.S. patent application Ser. No. 12 / 117,415 entitled “Substrate Transport Apparatus with Multiple Movable Arms Utilizing a Mechanical Switch Mechanism” filed on May 8, 2008 and U.S. Pat. No. 7,648,327 issued on Jan. 19, 2010, the disclosures of which are incorporated by reference herein in their entireties. Where there is more than one transfer arm 180TA, the operation of the transfer arms 180TA may be independent from each other (e.g. the extension / retraction of each arm is independent from each of the other arms), the transfer arms 180TA may be operated through a lost motion switch, or the transfer arms 180TA may be operably linked in any suitable way such that the arms share at least one common (i.e., a same) drive axis (i.e., the arms share at least one common drive motor and the respective drive shaft driven by the common motor). The transport arms may have any other desired arrangement such as a frog-leg arm 216 (Fig. 2B) configuration, a leap frog arm 217 (Fig. 2E) configuration, a bi-symmetric arm 218 (Fig. 2D) configuration, multiple SCARA arm configuration (Fig. 2G), etc. Suitable examples of transport arms can be found in U.S. Pat. No. 6,231,297 issued May 15, 2001; U.S. Pat. No. 5,180,276 issued Jan. 19, 1993; U.S. Pat. No. 6,464,448 issued Oct. 15, 2002; U.S. Pat. No. 6,224,319 issued May 1, 2001; U.S. Pat. No. 5,447,409 issued Sep. 5, 1995; U.S. Pat. No. 7,578,649 issued Aug. 25, 2009; U.S. Pat. No. 5,794,487 issued Aug. 18, 1998; U.S. Pat. No. 7,946,800 issued May 24, 2011; U.S. Pat. No. 6,485,250 issued Nov. 26, 2002; U.S. Pat. No. 7,891,935 issued Feb. 22, 2011; U.S. patent application No. 16 / 257,595 filed on January 25, 2019 (entitled “Automatic Wafer Centering Method and Apparatus”); U.S. patent application No. 13 / 293,717 filed on Nov. 10, 2011 (entitled “Dual Arm Robot”); and U.S. patent application No. 13 / 270,844 filed on Oct. 11, 2011 (entitled “Coaxial Drive Vacuum Robot”), the disclosures of which are all incorporated by reference herein in their entireties.Aty. Docket No. 390P017059-WO (PCT) / Br. 2237

[0038] Referring to Figs. 2A and 3A, for exemplary purposes, the workpiece transport 180 may include a rotational drive 262, a Z-drive column 280, a slide body 220 and one or more (e.g., at least one) end effectors 200, 200A, 200B. The rotational drive 262 is any suitable rotational drive mounted to a frame 13 OF of the transport chamber 130 or a sliding carriage 241 of the transport chamber 130, where the sliding carriage 241 is configured to linearly move the workpiece transport 180 along a length of the transport chamber 130. The workpiece transport 180 may include a Z drive column 280 that is mounted to an output of the rotational drive 262 so as to rotate in the direction of arrow T about the 9 axis (e.g. the 9 direction). The slide body 220 is movably mounted to the Z drive column 280, where the Z-drive column 280 includes any suitable drive motor and / or transmission for moving the slide body 220 in the Z direction.

[0039] The one or more end effectors 200, 200 A, 200B are movably mounted to the slide body 220 in any suitable manner so as to extend and retract in the R direction. While two end effectors 200A, 200B are illustrated in Fig. 3A for exemplary purposes, any suitable number of workpiece holders may be mounted to the slide body 220 (i.e., coupled to the slide body 220 so as to depend from, or otherwise be supported from, and move / slide along the slide body 220). For example, Fig. 2A illustrates a single end effector 200 mounted to the slide body 220 for effecting the transport and alignment of a workpiece(s) in the manner described herein; However, there may be more two or more end effectors mounted to the slide body 220 for effecting the transport of workpiece(s) W in the manner described herein.

[0040] As described herein, the end effector 200, 200A, 200B has impinging on the workpiece WHS holding station a predetermined continuous steady state differential pressure plenum region DPR (see Figs. 5A and 5B) that defines a continuously steady state fluidic isolation barrier or boundary layer 580 disposed on the substrate holding station throughout movement of the end effector between the first location and the second location, and isolates the substrate held on the holding station from an environment ENV exterior the predetermined continuous steady state differential pressure plenum DPR.Aty. Docket No. 390P017059-WO (PCT) / Br. 2237

[0041] As illustrated in Fig. 2A, the workpiece transport 180 may include a sleeve or cover 220S that includes an interior 220SH that houses the one or more end effectors 200, 200 A, 200B with the end effectors in a retracted position relative to the slide body 220 (see Fig. 3A illustrating the one or more end effectors 200, 200A, 200B in the retracted position). The sleeve 220S is disposed on the slide body 220 so as to extend over the one or more end effectors 200, 200A, 200B (and any workpiece W held on a respective end effector 200, 200A, 200B) with the one or more end effectors 200, 200A, 200B in the retracted position. Also referring to Fig. 3C, which illustrates a cross section of the sleeve 220S disposed on the slide body 220, the one or more end effectors 200A, 200A, 200B are illustrated as being retracted within and housed by the sleeve 220S. The sleeve 200S includes a passage or opening 220SP through which the one or more end effectors 200, 200A, 200B (and any workpieces W held thereon) pass when extended and retracted in the extension / retraction direction R. The sleeve 200S may isolate the workpiece W, and top surface WT thereof, from clean-dry fluid FL (and any excess moisture and / or oxygen contained in the fluid FL) input into a top portion of the EFEM 130 by, for example, the fan-filter unit 135.

[0042] The sleeve may include exhaust nozzles 193 (similar / the same as those described herein with respect to the one or more end effectors 200, 200A, 200B, as described herein. The nozzles 193 are coupled to a fluid supply 191 in any suitable manner (e.g., with any suitable fluid conduit, valves, etc.) so that the fluid supply 191 provides an unadulterated fluid UFL (as described herein) to the nozzles 193. The exhaust nozzles 193 eject or otherwise exhaust the unadulterated fluid UFL in the manner described herein with respect to the one or more end effectors 200, 200 A, 200B (see, e.g., at least Figs. 4A-5B), so that a blanket or curtain 599 of an unadulterated fluid UFL flows from the exhaust nozzles 193, over at least a top surface WT of the workpiece W held on the one or more end effector 200, 200 A, 200B (with the workpiece W disposed within the sleeve 200S), and out of the passage 220SP. The flow of unadulterated fluid UFL through the sleeve 200S and out of the passage 220SP may substantially prevent entry of the fluid FL into the interior 220SH of the sleeve 200SH that houses the one or more end effectors 200, 200A, 200B (and any workpieces W thereon) with the end effectors 200, 200A, 200B in the retracted position.Aty. Docket No. 390P017059-WO (PCT) / Br. 2237

[0043] The one or more end effectors 200, 200A, 200B traverse, with the transport arm 180TA as a unit, in a first direction (e.g. one or more of the X, Y and Z directions) relative to the frame 130F and traverses linearly, relative to the slide body 220, in a second direction (e.g. the R direction) that is different from the first direction. The slide body 220 includes one or more linear drives 225 configured to independently move each workpiece holder 200A, 200B in the R direction. The one or more linear drives 225 are any suitable drive(s) having any suitable transmissions which may be substantially similar to those described in, for example, United States patent No. 10,134,621 titled “Substrate Transport Apparatus,” and issued on November 20, 2018, the disclosure of which is incorporated by reference herein in its entirety and United States patent numbers 7,100,340, 7,066,707, 7,648,327, and 7,217,076 the disclosures of which were previously incorporated herein by reference in their entireties. The end effectors 200A, 200B may be arranged on the slide body 220 so that they are stacked one over the other so as to have a common axis of extension and retraction R.

[0044] As noted herein, with reference to Figs. IB and 3A, each end effector 200, 200A, 200B may be configured to environmentally isolate the workpiece W, held thereon, from the environment of the EFEM 130 (or other chamber in which the end effector 200 A, 200B is located (noting that while the workpiece transport 180 may be disposed in the EFEM 130, the end effector may be extended into the workpiece process module 140 or any other suitable location where workpieces W are to be picked or placed). As will be described in greater detail herein, each end effector 200A, 200B includes an end effector exhaust nozzle 193 that receives fluid FL from a fluid supply 191 in any suitable manner and ejects or otherwise exhausts the fluid FL (e.g., as the substantially unadulterated fluid UFL) along the end effector 200, 200A, 200B. The exhaust nozzle 193 is integral to the end effector 200, 200A, 200B and is disposed adjacent the workpiece holding station WHS, where the exhaust nozzle 193 is configured to effect the predetermined continuous steady state differential pressure plenum region DPR.

[0045] Referring to Figs. 3 A, 3B, 4A, 4B, 5 A, and 5B, the exhaust nozzle 193 of each end effector 200, 200 A, 200B may be communicably coupled to the fluid supply 191 (i.e., inert gas sourceAty. Docket No. 390P017059-WO (PCT) / Br. 2237191 S or clean dry air source 19 ID) and is configured to generate the blanket or curtain 599 of fluid. The exhaust nozzle 193 may be communicably coupled to the fluid supply 191 in any suitable manner, such as by a flexible conduit or hose 388 that bends and flexes with movement of one or more of the end effector 200, 200A, 200B along the slide body 220 and movement of the slide body 220 along the Z-drive column 280. For exemplary purposes only, the flexible conduit 388 extends from the fluid inlet 310 and through an interior of the base 240, the Z-drive column 280, and the slide body 220 for coupling with a respective one of the end effectors 200, 200A, 200B. The fluid inlet 310 may be a rotary union that allows rotation of the base 240 relative to the carriage 241 while providing for transfer of fluid from the carriage 241 to the base 240, where the fluid is supplied to the fluid inlet 310 by a flexible conduit or hose that extends from the fluid supply 191 through for example, a drag chain cable carrier 299, and into the carriage 241 for coupling with the fluid inlet 310 (noting similar drag chain cable carriers may be provided within the Z-drive column 280 and slide body 220 for guiding flexing / bending of the flexible conduit 388 within the workpiece transport 180).

[0046] Each end effector 200, 200 A, 200B is supported from slide body 220 by a respective slide 221 , 222 that reciprocates along the slide body 220 in direction R (e.g., such as along suitable rails in a manner similar to that described in United States patent numbers 7,100,340, 7,066,707, 7,648,327, and 7,217,076 the disclosures of which were previously incorporated herein by reference in their entireties). Each slide 221, 222 includes an end effector coupling section 225 configured to couple with an end effector base or bracket 400. As best seen in Fig. 3A, each slide 221, 222 includes an integral fluid passage 222 that extends therein. The fluid passage 222 may be formed within the respective slide 221, 222 in any suitable manner such as by machining, additive manufacturing, etc. One end of the fluid passage 223 couples to the flexible conduit 388 within the slide body 220, while the other end of the fluid passage 223 couples to an end effector fluid inlet 410 of the end effector base 400. The coupling between the fluid passage 223 and each of the flexible conduit 388 and the end effector fluid inlet 410 may be any suitable type of fluid coupling including, but not limited to, ball and sleeve fittings, barbed fittings, cam-lock fittings,Aty. Docket No. 390P017059-WO (PCT) / Br. 2237 crimp fittings, compression fittings, or any other suitable releasable or non-releasable coupling or union.

[0047] Each end effector 200, 200A, 200B includes the end effector base 400 and the workpiece holding station WHS that is coupled to or integrally formed (e.g., monolithically as a single unit) with the end effector base 400 in any suitable manner. For example, the end effector 200, 200A, 200B may be formed by additive manufacturing, machining, and / or any other suitable manufacturing methods. The workpiece holding station WHS is illustrated in the figures as having three workpiece supports / grippers 460A-460C, one or more of which may be movable for actively gripping and releasing the workpiece; however, the workpiece supports 460A-460C may be fixed so as to passively grip the workpiece W. Workpiece holding station WHS may have any suitable configuration, such as a vacuum grip configuration, a spatula configuration, etc.

[0048] The exhaust nozzle 193 is integral to the end effector base 400. The end effector base 400 includes one or more fluid passages 450 formed therein, such as by machining or additive manufacturing. The one or more fluid passages 450 extend from the end effector fluid inlet 410 to the end effector exhaust nozzle 193 so that fluid passing through the one or more fluid passages 450 exits from the end effector base 400 through the end effector exhaust nozzle 193, as the unadulterated fluid UFL, so as to form a predetermined continuous steady state differential pressure plenum region DPR. The end effector exhaust nozzle 193 may be formed in the end effector base 400 in any suitable manner, such as by machining and / or additive manufacturing so as to be in fluid communication with the one or more fluid passages 450. With particular reference to Figs. 4A-5B, the exhaust nozzle 193 may be configured as a one or more (i.e., an array of) exhaust apertures 193A-193n (see Figs. 4A and 4B, where n is whole number indicating an upper limit on the number of apertures), in the form of a slot(s), a hole(s), and a combination of slot(s) and hole(s). Each of the one or more exhaust apertures 193A-193n is configured so as to output any suitable fluid flow pattern including, but not limited to, spot, straight, point, round / diffused, and fan patterns (see Fig. 4C) so that the unadulterated fluid UFL output by the exhaust nozzle 193 may envelop or blanket at least an entire upper / top surface WT of a workpiece held on the endAty. Docket No. 390P017059-WO (PCT) / Br. 2237 effector 200, 200A, 200B at the workpiece holding station WHS (see Figs. 5A and 5B). The exhaust nozzle 193 is positioned relative to the workpiece holding station WHS so that a flow of the unadulterated fluid UFL emitted from the exhaust nozzle 193 flows along at least a portion of a support surface 466 of the wafer holding station WHS on which the workpiece supports / grippers 460A-460C are disposed. The flow of unadulterated fluid UFL may have a height FH (relative to the support surface 466) that is greater than a height HW of the upper / top surface WT of the workpiece W (e.g., from the support surface 466) held on the workpiece supports / grippers 460A- 460C. The flow of unadulterated fluid UFL may have a width FW that is greater than a width or diameter of the workpiece W. The workpiece W held on the workpiece supports / grippers 460A- 460C is spaced apart from the support surface 466 such that fluid flow emitted from the exhaust nozzle 193 may pass between a bottom surface of the workpiece W and the support surface 466. Substantially the entirety of the workpiece (e.g., top, bottom, and peripheral side(s)) may be enveloped or blanketed by the flow of unadulterated fluid UFL emitted from the exhaust nozzle 193.

[0049] The exhaust nozzle 193 is configured to emit a laminar flow of unadulterated fluid UFL and the support surface 466 may have a sufficiently low surface roughness to maintain the laminar flow of the unadulterated fluid FL across the support surface 466. The workpiece support / gripper 460A is positioned relative to the exhaust nozzle 193 so that the laminar fluid flow is substantially unaffected by the presence of the workpiece / gripper 460A. The workpiece W may have a sufficiently low surface roughness so as to substantially maintain the laminar flow of unadulterated fluid UFL across the upper and / or lower surface(s) of the workpiece W. A boundary layer or continuously steady state fluidic isolation barrier 580, defined by the predetermined continuous steady state differential pressure plenum region DPR, may be formed around the workpiece W by the flow of unadulterated fluid UFL. The boundary layer 580 bounds a fluidic envelope FE within the predetermined continuous steady state differential pressure plenum DPR, where the fluidic envelope FE covers at least part of the workpiece W. There may be substantially little to no mixing of the unadulterated fluid UFL with the fluid FL within the EFEM 130 such that the blanket orAty. Docket No. 390P017059-WO (PCT) / Br. 2237 curtain 599 of unadulterated fluid UFL at least on flowing along the upper / top surface WT of the workpiece forms a sub-environment within the EFEM 130 that substantially isolates at least the top surface WT from the fluid FL (and any excess moisture and / or oxygen contained in the fluid FL). Any turbulence in the boundary layer 580 effected by the workpiece supports / grippers 460B, 460C may not cause sufficient mixing of the unadulterated fluid UFL and the fluid FL where the fluid FL comes into contact with at least the top surface WT of the workpiece W due to the proximity of the workpiece supports / grippers 460B, 460C to a trailing edge TE of the workpiece W relative to the flow of unadulterated fluid UFL flowing from and away from the end effector base 400 towards and over the workpiece holding station WHS.

[0050] Referring to Figs. 1 A-5B and 6, an exemplary method, such as for workpiece W transport, will be described. In the method, the workpiece transport (also referred to herein as the substrate transport robot) 180, as described herein, is provided (Fig. 6, Block 600). The workpiece transport 180 includes, as described herein, the base 130F and the articulated robot arm (also referred to as the transport arm) 180TA connected to the base 130F. The articulated robot arm 180TA has the end effector 200, 200A, 200B thereon and being articulated so as to move with at least one degree of freedom. The end effector 200, 200A, 200B has a substrate or workpiece holding station WHS configured to hold a substrate or workpiece W, and transport the substrate W held thereon from a first location to a second location via movement of the end effector 200, 200 A, 200B. The substrate held on the substrate holding station WHS is isolated (Fig. 6, Block 610), with the continuously steady state fluidic isolation barrier or boundary layer 580, from the environment ENV exterior the predetermined continuous steady state differential pressure plenum DPR.

[0051] The method may include one or more of the following individually, in any combination with each other, and / or in combination with any of the features described herein: the continuously steady state fluidic isolation barrier 580 bounds a fluidic envelope FE within the predetermined continuous steady state differential pressure plenum DPR, the fluidic envelope FE covers at least part of the substrate W; the end effector 200, 200A, 200B comprises an exhaust nozzle 193 integral to the end effector 200, 200A, 200B and disposed adjacent the substrate holding station WHS, theAty. Docket No. 390P017059-WO (PCT) / Br. 2237 exhaust nozzle 193 being configured to effect the predetermined continuous steady state differential pressure plenum region DPR; the exhaust nozzle 193 is coupled to an inert gas source 19 IS and generates an inert gas curtain or blanket 599 that forms the continuously steady state fluidic isolation barrier 580; the inert gas is nitrogen; the inert gas exhaust nozzle 193 is coupled to a clean dry air source 19 ID and generates a nitrogen curtain or blanket 599 that forms the continuously steady state fluidic isolation barrier FE; the exhaust nozzle 193 is integral to an end effector bracket 400 configured to couple the end effector 200, 200A, 200B to the articulated robot arm 180TA; the exhaust nozzle 193 comprises one or more exhaust apertures 193A-193n; the one or more 193A-193n exhaust apertures comprises a slot; and the one or more exhaust apertures 193A-193n comprises a hole.

[0052] The following features of the present disclosure are provided and may be employed individually, in any combination with each other, and / or in any combination with the features described above.

[0053] A substrate transport robot includes: a base; an articulated robot arm connected to the base, the articulated robot arm having an end effector thereon and being articulated so as to move with at least one degree of freedom, the end effector has a substrate holding station configured to hold a substrate, and transport the substrate held thereon from a first location to a second location via movement of the end effector; and the end effector has impinging on the substrate holding station a predetermined continuous steady state differential pressure plenum region that defines a continuously steady state fluidic isolation barrier disposed on the substrate holding station throughout movement of the end effector between the first location and the second location, and isolates the substrate held on the substrate holding station from an environment exterior the predetermined continuous steady state differential pressure plenum.

[0054] The substrate transport robot includes one or more of individually, in any combination with each other, and / or in combination with any of the features described herein: the continuously steady state fluidic isolation barrier bounds a fluidic envelope within the predetermined continuousAty. Docket No. 390P017059-WO (PCT) / Br. 2237 steady state differential pressure plenum, the fluidic envelope covers at least part of the substrate; the end effector comprises an exhaust nozzle integral to the end effector and disposed adjacent the substrate holding station, the exhaust nozzle being configured to effect the predetermined continuous steady state differential pressure plenum region; the exhaust nozzle is coupled to an inert gas source and is configured to generate an inert gas curtain or blanket that forms the continuously steady state fluidic isolation barrier; the inert gas is nitrogen; the inert gas exhaust nozzle is coupled to a clean dry air source and is configured to generate a nitrogen curtain or blanket that forms the continuously steady state fluidic isolation barrier; the exhaust nozzle is integral to an end effector bracket configured to couple the end effector to the articulated robot arm; the exhaust nozzle comprises one or more exhaust apertures; the one or more exhaust apertures comprises a slot; and the one or more exhaust apertures comprises a hole.

[0055] A method includes: providing a substrate transport robot including: a base, and an articulated robot arm connected to the base, the articulated robot arm having an end effector thereon and being articulated so as to move with at least one degree of freedom, the end effector has a substrate holding station configured to hold a substrate, and transport the substrate held thereon from a first location to a second location via movement of the end effector, wherein, the end effector has impinging on the substrate holding station a predetermined continuous steady state differential pressure plenum region that defines a continuously steady state fluidic isolation barrier disposed on the substrate holding station throughout movement of the end effector between the first location and the second location; and isolating, with the continuously steady state fluidic isolation barrier, the substrate held on the substrate holding station from an environment exterior the predetermined continuous steady state differential pressure plenum.

[0056] The method includes one or more of individually, in any combination with each other, and / or in combination with any of the features described herein: the continuously steady state fluidic isolation barrier bounds a fluidic envelope within the predetermined continuous steady state differential pressure plenum, the fluidic envelope covers at least part of the substrate; the end effector comprises an exhaust nozzle integral to the end effector and disposed adjacent theAty. Docket No. 390P017059-WO (PCT) / Br. 2237 substrate holding station, the exhaust nozzle being configured to effect the predetermined continuous steady state differential pressure plenum region; the exhaust nozzle is coupled to an inert gas source and generates an inert gas curtain or blanket that forms the continuously steady state fluidic isolation barrier; the inert gas is nitrogen; the inert gas exhaust nozzle is coupled to a clean dry air source and generates a nitrogen curtain or blanket that forms the continuously steady state fluidic isolation barrier; the exhaust nozzle is integral to an end effector bracket configured to couple the end effector to the articulated robot arm; the exhaust nozzle comprises one or more exhaust apertures; the one or more exhaust apertures comprises a slot; and the one or more exhaust apertures comprises a hole.

[0057] It should be understood that the foregoing description is only illustrative of the present disclosure. Various alternatives and modifications can be devised by those skilled in the art without departing from the present disclosure. Accordingly, the present disclosure is intended to embrace all such alternatives, modifications and variances that fall within the scope of any claims appended hereto. Further, the mere fact that different features are recited in mutually different dependent or independent claims does not indicate that a combination of these features cannot be advantageously used, such a combination remaining within the scope of the present disclosure.

[0058] What is claimed is:

Claims

Aty. Docket No. 390P017059-WO (PCT) / Br. 2237CLAIMS1. A substrate transport robot comprising: a base; an articulated robot arm connected to the base, the articulated robot arm having an end effector thereon and being articulated so as to move with at least one degree of freedom, the end effector has a substrate holding station configured to hold a substrate, and transport the substrate held thereon from a first location to a second location via movement of the end effector; and the end effector has impinging on the substrate holding station a predetermined continuous steady state differential pressure plenum region that defines a continuously steady state fluidic isolation barrier disposed on the substrate holding station throughout movement of the end effector between the first location and the second location, and isolates the substrate held on the substrate holding station from an environment exterior the predetermined continuous steady state differential pressure plenum.

2. The substrate transport robot of claim 1, wherein the continuously steady state fluidic isolation barrier bounds a fluidic envelope within the predetermined continuous steady state differential pressure plenum, the fluidic envelope covers at least part of the substrate.

3. The substrate transport robot of claim 1, wherein the end effector comprises an exhaust nozzle integral to the end effector and disposed adjacent the substrate holding station, the exhaust nozzle being configured to effect the predetermined continuous steady state differential pressure plenum region.

4. The substrate transport robot of claim 3, wherein the exhaust nozzle is coupled to an inert gas source and is configured to generate an inert gas curtain or blanket that forms the continuously steady state fluidic isolation barrier.Aty. Docket No. 390P017059-WO (PCT) / Br. 22375. The substrate transport robot of claim 4, wherein the inert gas is nitrogen.

6. The substrate transport robot of claim 3, wherein the inert gas exhaust nozzle is coupled to a clean dry air source and is configured to generate a nitrogen curtain or blanket that forms the continuously steady state fluidic isolation barrier.

7. The substrate transport robot of claim 3, wherein the exhaust nozzle is integral to an end effector bracket configured to couple the end effector to the articulated robot arm.

8. The substrate transport robot of claim 3, wherein the exhaust nozzle comprises one or more exhaust apertures.

9. The substrate transport robot of claim 8, wherein the one or more exhaust apertures comprises a slot.

10. The substrate transport robot of claim 9, wherein the one or more exhaust apertures comprises a hole.

11. A method comprising: providing a substrate transport robot including: a base, and an articulated robot arm connected to the base, the articulated robot arm having an end effector thereon and being articulated so as to move with at least one degree of freedom, the end effector has a substrate holding station configured to hold a substrate, and transport the substrate held thereon from a first location to a second location via movement of the end effector, wherein, the end effector has impinging on the substrate holding station a predetermined continuous steady state differential pressure plenum region that defines a continuouslyAty. Docket No. 390P017059-WO (PCT) / Br. 2237 steady state fluidic isolation barrier disposed on the substrate holding station throughout movement of the end effector between the first location and the second location; and isolating, with the continuously steady state fluidic isolation barrier, the substrate held on the substrate holding station from an environment exterior the predetermined continuous steady state differential pressure plenum.

12. The method of claim 11, wherein the continuously steady state fluidic isolation barrier bounds a fluidic envelope within the predetermined continuous steady state differential pressure plenum, the fluidic envelope covers at least part of the substrate.

13. The method of claim 11, wherein the end effector comprises an exhaust nozzle integral to the end effector and disposed adjacent the substrate holding station, the exhaust nozzle being configured to effect the predetermined continuous steady state differential pressure plenum region.

14. The method of claim 13, wherein the exhaust nozzle is coupled to an inert gas source and generates an inert gas curtain or blanket that forms the continuously steady state fluidic isolation barrier.

15. The method of claim 14, wherein the inert gas is nitrogen.

16. The method of claim 13, wherein the inert gas exhaust nozzle is coupled to a clean dry air source and generates a nitrogen curtain or blanket that forms the continuously steady state fluidic isolation barrier.

17. The method of claim 13, wherein the exhaust nozzle is integral to an end effector bracket configured to couple the end effector to the articulated robot arm.

18. The method of claim 13, wherein the exhaust nozzle comprises one or more exhaust apertures.Aty. Docket No. 390P017059-WO (PCT) / Br. 223719. The method of claim 18, wherein the one or more exhaust apertures comprises a slot.

20. The method of claim 19, wherein the one or more exhaust apertures comprises a hole.

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