Scrubbing apparatus

Abstract

A scrubbing apparatus of the present invention comprises: a scrubbing chamber defining a scrubbing space for scrubbing impurities; a gas injection pipe through which gas is injected into the scrubbing chamber; a gas discharge pipe through which gas is discharged to the outside of the scrubbing chamber; a first scrubbing plate disposed in the scrubbing chamber; a plurality of first scrubbing holes formed through the first scrubbing plate; a solution supply nozzle for supplying a scrubbing solution; a first pressure gauge for measuring a first pressure of the gas; and a first pressure adjustment portion which adjusts the intensity of the first pressure, wherein the gas passes through the plurality of first scrubbing holes and rises so as to form bubbles on the upper surface of the first scrubbing plate, and impurities are dissolved in the scrubbing solution at portions where the bubbles and the scrubbing solution come into contact with each other.

Description

scrubbing device

[0001] The present invention relates to a scrubbing device. Specifically, it relates to a scrubbing device that improves scrubbing efficiency by increasing the contact area between the scrubbing solution and the gas, and improves stability and reliability by controlling the pressure of the gas injected into the scrubbing chamber and the pressure of the gas discharged outside the scrubbing chamber.

[0002]

[0003] Modern industry generates many types of air pollutants. Many of these have very low permissible concentrations for human use. Therefore, removing air pollutants from gases emitted by various industrial sectors is a critical issue.

[0004] Currently used air pollution control facilities include dust collectors and scrubbers, which are installed based on their efficiency depending on the type of pollutant. Among these, scrubbers are widely used because they can simultaneously process dust, exhaust gases, and high-temperature gases.

[0005] Specifically, scrubbers are classified into dry, wet, and plasma types depending on the method of treating the exhaust gas, and among these, wet scrubbers consist of a process in which the exhaust gas is brought into contact with a liquid to dissolve water-soluble components in the gas into the liquid phase.

[0006] In wet scrubbers, a scrubbing solution is generally used to effectively remove harmful components from the exhaust gas. Since the scrubbing solution removes harmful components through chemical reactions such as neutralization upon contact, it must be selected to react most effectively with the harmful components of the exhaust gas. The performance of a wet scrubber is determined by whether the scrubbing solution can efficiently come into contact with the exhaust gas. Therefore, conventionally, a method has been adopted in which packing is installed to allow sufficient contact between the scrubbing solution and the exhaust gas, and spray nozzles are installed to supply scrubbing solution with small particles.

[0007] Recently, other technologies capable of improving the contact area between the cleaning solution and the exhaust gas are being researched.

[0008]

[0009] The technical problem that the present invention aims to solve is to provide a scrubbing device that improves scrubbing efficiency by increasing the contact area between the scrubbing solution and the gas, and improves stability and reliability by controlling the pressure of the gas injected into the scrubbing chamber and the pressure of the gas discharged outside the scrubbing chamber.

[0010] The problems that the present invention aims to solve are not limited to those mentioned above, and other unmentioned problems will be clearly understood by a person skilled in the art from the description below.

[0011]

[0012] A scrubbing device according to some embodiments of the present invention for achieving the above technical problem comprises: a scrubbing chamber defining a scrubbing space for scrubbing impurities contained in gas discharged from a process chamber; a gas injection pipe having one end connected to the scrubbing chamber and the other end connected to the process chamber, through which the gas is injected into the scrubbing chamber; a gas discharge pipe connected to the scrubbing chamber and through which the gas is discharged outside the scrubbing chamber; a first scrubbing plate disposed within the scrubbing chamber; a plurality of first scrubbing holes penetrating the first scrubbing plate; a solution supply nozzle supplying a scrubbing solution to the upper surface of the first scrubbing plate; a first pressure gauge measuring a first pressure of the gas passing through the gas injection pipe; and a first pressure regulating unit installed at the boundary between the gas injection pipe and the scrubbing chamber or inside the gas injection pipe to regulate the intensity of the first pressure, wherein the gas rises and passes through the plurality of first scrubbing holes to form bubbles on the upper surface of the first scrubbing plate, and the bubbles and The impurities are dissolved in the scrubbing solution at the part contacted by the scrubbing solution.

[0013] In some embodiments, if the magnitude of the absolute value of the first pressure measured by the first pressure gauge is greater than the first set value, the RPM (rotations per minute) of the first pressure control unit decreases, and if the magnitude of the absolute value of the first pressure measured by the first pressure gauge is smaller than the first set value, the RPM of the first pressure control unit increases.

[0014] A scrubbing device with improved stability and reliability can be provided because the magnitude of the absolute value of the first pressure is maintained constant at the first set value.

[0015] In some embodiments, the first setting value is greater than 500pa and less than 2000pa.

[0016] In some embodiments, the RPM of the first pressure regulating unit is determined by the following Equation 1 and Equation 2.

[0017] [Mathematical Formula 1]

[0018]

[0019] [Mathematical Formula 2]

[0020]

[0021] R1 is the amount of rotation of the first pressure regulating unit, and A1, B1, C1, A2, B2, C2, and n are each rational numbers between 0 and 10, P1 is the first pressure, Pset1 is the first set value, and C1 and C2 are each the initial amount of rotation of the first pressure regulating unit.

[0022] A scrubbing device according to some embodiments includes a second pressure gauge for measuring a second pressure of the gas passing through the gas discharge pipe, and a second pressure regulator installed at the boundary between the gas discharge pipe and the scrubbing chamber or inside the gas discharge pipe for controlling the intensity of the second pressure, wherein if the magnitude of the absolute value of the second pressure measured by the second pressure gauge is greater than a second set value, the RPM of the second pressure regulator decreases, and if the magnitude of the absolute value of the second pressure measured by the second pressure gauge is smaller than the second set value, the RPM of the second pressure regulator increases.

[0023] Since the second pressure is maintained constant at the second set value, a scrubbing device with improved stability and reliability can be provided.

[0024] In some embodiments, the sum of the first set value and the second set value is 1000pa or more and 4000pa or less.

[0025] A scrubbing device according to some embodiments comprises, wherein the scrubbing space includes a first subspace and a second subspace separated by a separating wall, the gas injection pipe is connected to the first subspace, and the gas discharge pipe is connected to the second subspace.

[0026] In some embodiments, the first scrubbing plate and the solution supply nozzle are installed in the second subspace.

[0027] In some embodiments, the first subspace and the second subspace are connected to each other at the bottom of the scrubbing chamber.

[0028] A scrubbing device according to some embodiments further comprises a connecting valve that is openable and closable and installed on the upper part of the separating wall, and a third pressure gauge that measures a third pressure inside the first sub-space, and when the magnitude of the absolute value of the first pressure and the magnitude of the absolute value of the third pressure are the same, the connecting valve is opened so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged to the outside of the scrubbing chamber through the gas discharge pipe.

[0029] A scrubbing device according to some embodiments further comprises a second pressure gauge for measuring a second pressure of the gas passing through the gas discharge pipe, a second pressure regulating unit installed at the boundary between the gas discharge pipe and the scrubbing chamber or inside the gas discharge pipe for regulating the intensity of the second pressure, a connecting valve installed on the upper part of the separating wall and capable of opening and closing, and a fourth pressure gauge for measuring a third pressure inside the second sub-space, wherein when the magnitude of the absolute value of the second pressure and the magnitude of the absolute value of the third pressure are the same, the connecting valve is opened so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged to the outside of the scrubbing chamber through the gas discharge pipe.

[0030] A scrubbing device according to some embodiments further comprises a connecting valve that is openable and closable and installed on the upper part of the separating wall, and a third pressure gauge that measures a third pressure inside the scrubbing space, and when the magnitude of the absolute value of the third pressure exceeds a third set value, the connecting valve is opened so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged through the gas discharge pipe.

[0031] In some embodiments, the number of process chambers connected to the scrubbing chamber may vary, and if the number of process chambers connected to the scrubbing chamber increases, the RPM of the first pressure regulator increases, and if the number of process chambers connected to the scrubbing chamber decreases, the RPM of the first pressure regulator decreases.

[0032] In some embodiments, the RPM of the first pressure regulating unit is determined by the following mathematical formulas 5 and 6.

[0033] [Mathematical Formula 5]

[0034]

[0035] [Mathematical Formula 6]

[0036]

[0037] R1 is the rotation amount of the first pressure regulating unit, and A5, B5, C5, A6, B6, C6, and k are each rational numbers between 0 and 10, N1 is the number of process chambers currently connected to the scrubbing chamber, N2 is the number of process chambers previously connected to the scrubbing chamber, and C5 and C6 are each the initial rotation amounts of the first pressure regulating unit.

[0038] Specific details of other embodiments are included in the description of the invention and the drawings.

[0039]

[0040] The scrubbing device of the present invention includes at least one scrubbing plate. A scrubbing hole is formed inside the scrubbing plate that penetrates the scrubbing plate. As gas rises and passes through the scrubbing hole, bubbles may be formed in the scrubbing solution flowing on the upper surface of the scrubbing plate.

[0041] As the bubbles are formed, the contact area between the scrubbing solution and the gas is improved. Because the contact area is improved, hydrophilic impurities in the gas can be dissolved more in the scrubbing solution. Consequently, the gas from which contaminants (impurities) have been removed can be discharged to the outside of the scrubbing device.

[0042] In addition, the scrubbing device of the present invention further includes a first pressure regulating unit for controlling the pressure of gas passing through a gas injection pipe and a second pressure regulating unit for controlling the pressure of gas passing through a gas discharge pipe. Stability and reliability can be improved by controlling the pressure of the gas injected into the scrubbing chamber and the pressure of the gas discharged outside the scrubbing chamber.

[0043]

[0044] FIG. 1 is a drawing for briefly illustrating a scrubbing system including a scrubbing device according to some embodiments of the present invention.

[0045] FIG. 2 is an exemplary perspective view for illustrating a scrubbing device according to some embodiments of the present invention.

[0046] FIG. 3 is an exemplary cross-sectional view for illustrating a scrubbing device according to some embodiments of the present invention.

[0047] FIG. 4 is an exemplary drawing for explaining the first pressure regulating unit of FIG. 3.

[0048] Figure 5 is an enlarged view of the P region of Figure 3.

[0049] FIGS. 6 to 11 are exemplary drawings for illustrating a scrubbing device according to several other embodiments of the present invention.

[0050] FIGS. 12 to 15 are drawings for explaining the operation method of a scrubbing device according to some embodiments of the present invention.

[0051]

[0052] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The advantages and features of the present invention, and the methods for achieving them, will become clear by referring to the embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments described below but can be implemented in various different forms. These embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and the present invention is defined only by the scope of the claims. Throughout the specification, the same reference numerals refer to the same components.

[0053] Furthermore, the terms used in this specification are for describing embodiments and are not intended to limit or / or restrict the disclosed invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and do not preclude the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0054] Additionally, terms including ordinal numbers, such as "first," "second," etc., used herein may be used to describe various components, but said components are not limited by said terms, and said terms are used solely for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be named the second component, and similarly, the second component may be named the first component. The term "and / or" includes a combination of a plurality of related described items or any one of a plurality of related described items.

[0055] Meanwhile, terms such as "upper," "lower," "side wall," "upper surface," and "lower surface" used in the following description are defined based on the drawings, and the shape and location of each component are not limited by these terms.

[0056] The terms used herein are for describing the embodiments and are not intended to limit the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise in the text. As used herein, "comprises" and / or "comprising" do not exclude the presence or addition of one or more other components, steps, actions, and / or elements to the mentioned components, steps, actions, and / or elements.

[0057] Unless otherwise defined, all terms used in this specification (including technical and scientific terms) may be used in a meaning that is commonly understood by those skilled in the art to which the present invention pertains. Additionally, terms defined in commonly used dictionaries are not to be interpreted ideally or excessively unless explicitly and specifically defined otherwise.

[0058] Hereinafter, embodiments of the present invention will be described in detail with reference to the attached drawings. In describing with reference to the attached drawings, identical or corresponding components are given the same reference number regardless of the drawing symbols, and redundant descriptions thereof will be omitted.

[0059]

[0060] Hereinafter, a scrubbing system (1000) including a scrubbing device (20) according to some embodiment of the present invention will be described first with reference to FIG. 1. FIG. 1 is a drawing for briefly describing a scrubbing system including a scrubbing device according to some embodiment of the present invention.

[0061] Referring to FIG. 1, a scrubbing system (1000) according to some embodiments of the present invention may include a process chamber (10), a scrubbing device (20), an exhaust gas discharge chamber (30), and a scrubbing solution discharge chamber (40).

[0062] The process chamber (10) may be a chamber used in various industrial fields. The various industrial fields may be plant fields, battery fields, thermal power plant fields, steel fields, semiconductor fields, chemical fields, and / or oil and gas plant industries.

[0063] If the scrubbing system (1000) is utilized in the semiconductor field, the process chamber (10) may be a chamber where semiconductor processes are performed. In order to manufacture a semiconductor device, various semiconductor processes must be performed on a wafer. For example, a film must be deposited on the wafer (deposition process), and the film must be etched (etching process) to form a pattern included in the semiconductor device. In addition, after the deposition process and / or etching process are performed, a cleaning process must be performed to clean the wafer and / or the process chamber (10).

[0064] The deposition process may include, for example, Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), and / or Atomic Layer Deposition (ALD). The etching process may include a dry etching process, a wet etching process, and / or an ashing process. The cleaning process may include a wet cleaning process, a dry cleaning process, and / or a vapor cleaning process.

[0065] If the scrubbing system (1000) is utilized in the oil and gas plant industry, the process chamber (10) may be a chamber where the plant process is performed.

[0066] When various processes are performed within the process chamber (10), by-products may be generated. These by-products may contain substances harmful to the human body, and if they contain substances harmful to the human body, they must be removed and discharged. A scrubbing device (20) can be used to remove substances harmful to the human body from the by-products generated in the process chamber (10).

[0067] A gas injection pipe (11) may be disposed between the process chamber (10) and the scrubbing device (20). One end of the gas injection pipe (11) may be connected to the process chamber (10), and the other end of the gas injection pipe (11) may be connected to the scrubbing device (20). Gas (G) discharged from the process chamber (10) may be supplied to the scrubbing device (20) through the gas injection pipe (11) (see reference numeral 50). The gas (G) may contain impurities. The impurities may be substances harmful to the human body. The impurities may include hydrophilic substances.

[0068] In some embodiments, a first valve (12) may be connected to the gas injection pipe (11). The first valve (12) can regulate the pressure and flow rate of the gas (G) supplied to the scrubbing device (20) through the gas injection pipe (11).

[0069] The scrubbing device (20) can scrub the gas (G) provided from the process chamber (10). Impurities contained in the gas (G) can be dissolved in the scrubbing solution and stored in the scrubbing solution discharge chamber (40). The gas (G') from which impurities have been removed can be stored in the exhaust gas discharge chamber (30). A detailed description of the scrubbing device (20) will be provided later with reference to FIGS. 2 through 11.

[0070] The scrubbing solution discharge chamber (40) can be connected to the scrubbing device (20). The scrubbing solution discharge chamber (40) and the scrubbing device (20) can be connected to each other through a first pipe (21). One end of the first pipe (21) is connected to the scrubbing device (20), and the other end of the first pipe (21) can be connected to the scrubbing solution discharge chamber (40). Through the first pipe (21), the scrubbing solution (S) in which impurities are dissolved can move from the scrubbing device (20) to the scrubbing solution discharge chamber (40) (see reference numeral 60).

[0071] In some embodiments, a second valve (22) may be connected to the first pipe (21). The second valve (22) can control the pressure and flow rate of the scrubbing solution (S) in which impurities are dissolved and supplied to the scrubbing solution discharge chamber (40) through the first pipe (21).

[0072] The exhaust gas discharge chamber (30) can be connected to the scrubbing device (20). The exhaust gas discharge chamber (30) and the scrubbing device (20) can be connected to each other through a gas discharge pipe (23). One end of the gas discharge pipe (23) can be connected to the scrubbing device (20), and the other end of the gas discharge pipe (23) can be connected to the exhaust gas discharge chamber (30). Gas (G') from which impurities have been removed can be moved from the scrubbing device (20) to the exhaust gas discharge chamber (30) through the gas discharge pipe (23) (see reference numeral 70).

[0073] In some embodiments, a third valve (24) may be connected to the gas discharge pipe (23). The third valve (24) can control the pressure and flow rate of the impurity-removed gas (G') supplied to the exhaust gas discharge chamber (30) through the gas discharge pipe (23).

[0074] In some embodiments, the scrubbing device (20) may further include a gas inlet (25) and a gas outlet (26). Gas (G) may be introduced into the scrubbing device (20) through the gas inlet (25). Gas (G') from which impurities have been removed may be discharged outside the scrubbing device (20) through the gas outlet (26).

[0075] When a scrubbing device (20) according to some embodiments of the present invention is utilized in the industrial field, pollutants generated after the process can be effectively separated and removed. Therefore, environmental pollution problems can be reduced.

[0076]

[0077] Hereinafter, a scrubbing device according to several embodiments of the present invention will be described in detail with reference to FIGS. 2 to 5.

[0078] FIG. 2 is an exemplary perspective view for illustrating a scrubbing device according to some embodiment of the present invention. FIG. 3 is an exemplary cross-sectional view for illustrating a scrubbing device according to some embodiment of the present invention. FIG. 4 is an exemplary drawing for illustrating the first pressure regulating unit of FIG. 3. FIG. 5 is an enlarged view of region P of FIG. 3.

[0079] Referring to FIGS. 2 to 5, a scrubbing device (20) according to some embodiments of the present invention may include a scrubbing chamber (210), a separating wall (220), a first scrubbing plate (230), a second scrubbing plate (240), a third scrubbing plate (250), a spray nozzle (221), a solution supply nozzle (223), a gas injection pipe (11), a gas discharge pipe (23), a first pressure regulating unit (291), a second pressure regulating unit (293), a first pressure gauge (281), a second pressure gauge (283), a third pressure gauge (285), a connecting valve (295), and a demister (260).

[0080] First, a scrubbing chamber (210) may be provided. The scrubbing chamber (210) may be an external housing of the scrubbing device (20). Gas (G in FIG. 1) may be supplied into the interior of the scrubbing chamber (210). The gas may contain impurities.

[0081] For example, gas (G in FIG. 1) can be supplied into the interior of the scrubbing chamber (210) through a gas injection pipe (11). The gas injection pipe (11) may be formed on the upper wall of the scrubbing chamber (210) or on the side wall of the scrubbing chamber (210). Additionally, the gas injection pipe (11) may be formed on the upper side wall of the scrubbing chamber (210) or on the lower side wall.

[0082] Impurities contained in the gas (G in FIG. 1) can be dissolved in the scrubbing solution inside the scrubbing chamber (210). The scrubbing chamber (210) may define a scrubbing space (215). The scrubbing space (215) may be a space where a scrubbing process is performed in which impurities contained in the gas (G in FIG. 1) are dissolved in the scrubbing solution.

[0083] In some embodiments, the scrubbing space (215) may include a first subspace (215a) and a second subspace (215b). The first subspace (215a) and the second subspace (215b) may be separated by a separating wall (220). The first subspace (215a) and the second subspace (215b) may be defined by the separating wall (220).

[0084] The separating wall (220) may be placed inside the scrubbing chamber (210). In some embodiments, the separating wall (220) may be attached to the upper wall of the scrubbing chamber (210). The separating wall (220) may extend from the upper wall of the scrubbing chamber (210) in a second direction (D2). The second direction (D2) may be a direction perpendicular to the ground.

[0085] In some embodiments, the separating wall (220) may have a bar shape in a planar view. The separating wall (220) may extend in a third direction (D3) in a planar view. One end of the separating wall (220) may be connected to the third inner wall of the scrubbing chamber (210), and the other end of the separating wall (220) may be connected to the fourth inner wall of the scrubbing chamber (210). The separating wall (220) may include a long side extending in the third direction (D3) and a short side extending in the first direction (D1), but the technical concept of the present invention is not limited thereto.

[0086] In some embodiments, the scrubbing chamber (210) may include a first inner wall (210SW1), a second inner wall (210SW2), the third inner wall, and the fourth inner wall.

[0087] The first inner wall (210SW1) of the scrubbing chamber (210) may face the separation wall (220). The second inner wall (210SW2) of the scrubbing chamber (210) may face the first inner wall (210SW1) of the scrubbing chamber (210) in a first direction (D1). The third inner wall and the fourth inner wall may face each other in a third direction (D3) and may intersect the first inner wall (210SW1) and the second inner wall (210SW2), respectively.

[0088] The partition wall (220) can define a first sub-space (215a) and a second sub-space (215b). The partition wall (220) can separate the scrubbing space (215) into a first sub-space (215a) and a second sub-space (215b).

[0089] A first scrubbing process may be performed in a first subspace (215a). A second scrubbing process may be performed in a second subspace (215b). The first scrubbing process may be a process in which some of the impurities are dissolved in a first scrubbing solution (225). The second scrubbing process may be a process in which other parts of the impurities are dissolved in a second scrubbing solution (227).

[0090] In this specification, the first direction (D1) and the third direction (D3) may intersect each other. The first direction (D1) and the second direction (D2) may intersect each other. The second direction (D2) and the third direction (D3) may intersect each other. That is, in this specification, the first direction (D1), the second direction (D2), and the third direction (D3) may be substantially perpendicular to each other.

[0091] A first scrubbing plate (230), a second scrubbing plate (240), and a third scrubbing plate (250) may be disposed within the scrubbing space (215). Specifically, the first scrubbing plate (230), the second scrubbing plate (240), and the third scrubbing plate (250) may be disposed within the second sub-space (215b).

[0092] In FIGS. 2 to 5, the scrubbing device (20) of the present invention is illustrated as including three scrubbing plates, but the technical concept of the present invention is not limited thereto. A scrubbing device (20) according to some embodiments of the present invention may include one or more scrubbing plates. That is, one scrubbing plate may be placed inside the second sub-space (215b), two may be placed, or four or more may be placed.

[0093] The first scrubbing plate (230) may be placed at the lowest of the scrubbing plates disposed within the second sub-space (215b). One end of the first scrubbing plate (230) may be connected to and fixed to the partition wall (220). Specifically, one end of the first scrubbing plate (230) may be connected to and fixed to the side wall of the partition wall (220) facing the second sub-space (215b). The first scrubbing plate (230) may be connected to the partition wall (220) and extend in a first direction (D1) that intersects the partition wall (220). More specifically, the first scrubbing plate (230) may be placed on a plane extending in the first direction (D1) and the third direction (D3).

[0094] In some embodiments, another part of the first scrubbing plate (230) may be connected and fixed to the inner walls of the scrubbing chamber (210). Specifically, the first scrubbing plate (230) may be connected to the partition wall (220) in the second subspace (215b), to the third inner wall of the scrubbing chamber (210), and to the fourth inner wall of the scrubbing chamber (210).

[0095] However, the first scrubbing plate (230) may not be connected to and fixed to the second inner wall (210SW2) of the scrubbing chamber (210). The first scrubbing plate (230) may be spaced apart from the second inner wall (210SW2) of the scrubbing chamber (210) in the first direction (D1). The space from the other end of the first scrubbing plate (230) to the second inner wall (210SW2) of the scrubbing chamber (210) may be a space where the second scrubbing solution (227), which will be described later, flows downward (e.g., in the second direction (D2)).

[0096] A scrubbing device (20) according to some embodiments may further include a first scrubbing hole (230H) and a first scrubbing wall (235).

[0097] The first scrubbing hole (230H) may be formed inside the first scrubbing plate (230). The first scrubbing hole (230H) may extend from the lower surface of the first scrubbing plate (230) to the upper surface of the first scrubbing plate (230). That is, the first scrubbing hole (230H) may penetrate the first scrubbing plate (230) in the second direction (D2). Gas (G in FIG. 1) may rise in the second direction (D2) by passing through the first scrubbing hole (230H) (see reference numeral 230u).

[0098] The upper surface of the first scrubbing plate (230) may face the demister (260) to be described later, and the lower surface of the first scrubbing plate (230) may face the scrubbing solution storage tank (270) to be described later.

[0099] The first scrubbing wall (235) may be attached to the other end of the first scrubbing plate (230). The first scrubbing wall (235) may be interposed between the first scrubbing plate (230) and the second inner wall (210SW2) of the scrubbing chamber (210). The first scrubbing wall (235) may extend in a second direction (D2). In some embodiments, a portion of the first scrubbing wall (235) may protrude in the second direction (D2) from the upper surface of the first scrubbing plate (230). Another portion of the first scrubbing wall (235) may protrude in the second direction (D2) from the lower surface of the first scrubbing plate (230).

[0100] The length in the second direction (D2) of the portion protruding in the second direction (D2) from the upper surface of the first scrubbing plate (230) of the first scrubbing wall (235) may be smaller than the length in the second direction (D2) of the portion protruding in the second direction (D2) from the lower surface of the first scrubbing plate (230), but the technical concept of the present invention is not limited thereto.

[0101] In some embodiments, at least a portion of the part protruding in the second direction (D2) from the lower surface of the first scrubbing plate (230) of the first scrubbing wall (235) may be placed in the scrubbing solution (275) in which impurities are dissolved, which will be described later, but the technical concept of the present invention is not limited thereto.

[0102] The second scrubbing plate (240) may be placed on the first scrubbing plate (230). Specifically, the second scrubbing plate (240) may be placed on the upper surface of the first scrubbing plate (230). One end of the second scrubbing plate (240) may be connected and fixed to the second inner wall (210SW2) of the scrubbing chamber (210). The second scrubbing plate (240) may be connected to the second inner wall (210SW2) of the scrubbing chamber (210) and extend in a first direction (D1) that intersects the second inner wall (210SW2) of the scrubbing chamber (210). More specifically, the second scrubbing plate (240) may be placed on a plane in which the first direction (D1) and the third direction (D3) extend.

[0103] Likewise, the second scrubbing plate (240) may be connected and fixed to the third inner wall of the scrubbing chamber (210) and the fourth inner wall of the scrubbing chamber (210). However, the other end of the second scrubbing plate (240) may not be connected and fixed to the separating wall (220). The other end of the second scrubbing plate (240) may be spaced apart from the separating wall (220) in the first direction (D1). The space from the other end of the second scrubbing plate (240) to the separating wall (220) may be a space where the second scrubbing solution (227), which will be described later, flows downward (e.g., in the second direction (D2)).

[0104] A scrubbing device (20) according to some embodiments may further include a second scrubbing hole (240H) and a second scrubbing wall (245).

[0105] The second scrubbing hole (240H) may be formed inside the second scrubbing plate (240). The second scrubbing hole (240H) may extend from the lower surface of the second scrubbing plate (240) to the upper surface of the second scrubbing plate (240). The second scrubbing hole (240H) may penetrate the second scrubbing plate (240) in the second direction (D2). Gas (G in FIG. 1) may rise in the second direction (D2) by passing through the second scrubbing hole (240H).

[0106] The upper surface of the second scrubbing plate (240) may face the demister (260) to be described later, and the lower surface of the second scrubbing plate (240) may face the upper surface of the first scrubbing plate (230).

[0107] The second scrubbing wall (245) may be attached to the other end of the second scrubbing plate (240). The second scrubbing wall (245) may be interposed between the second scrubbing plate (240) and the separation wall (220). The second scrubbing wall (245) may extend in a second direction (D2). In some embodiments, a portion of the second scrubbing wall (245) may protrude in the second direction (D2) from the upper surface of the second scrubbing plate (240). Another portion of the second scrubbing wall (245) may protrude in the second direction (D2) from the lower surface of the second scrubbing plate (240).

[0108] The length in the second direction (D2) of the portion protruding in the second direction (D2) from the upper surface of the second scrubbing plate (240) of the second scrubbing wall (245) may be smaller than the length in the second direction (D2) of the portion protruding in the second direction (D2) from the lower surface of the second scrubbing plate (240), but the technical concept of the present invention is not limited thereto.

[0109] In some embodiments, the first scrubbing plate (230) and the second scrubbing plate (240) do not completely overlap in the second direction (D2). The first scrubbing plate (230) and the second scrubbing plate (240) may be arranged in a zigzag pattern. Accordingly, the second scrubbing solution (227) that flows down past the second scrubbing wall (245) may be discharged onto the upper surface of the first scrubbing plate (230). In other words, the center of the first scrubbing plate (230) and the center of the second scrubbing plate (240) may be offset from each other.

[0110] The third scrubbing plate (250) may be placed on the second scrubbing plate (240). Specifically, the third scrubbing plate (250) may be placed on the upper surface of the second scrubbing plate (240). One end of the third scrubbing plate (250) may be connected to and fixed to the separation wall (220).

[0111] Specifically, one end of the third scrubbing plate (250) may be connected and fixed to the side wall of the separation wall (220) facing the second sub-space (215b). The third scrubbing plate (250) may be connected to the separation wall (220) and extend in a first direction (D1) that intersects the separation wall (220). More specifically, the third scrubbing plate (250) may be placed on a plane in which the first direction (D1) and the third direction (D3) extend. Likewise, the third scrubbing plate (250) may be connected and fixed to the third inner wall of the scrubbing chamber (210) and the fourth inner wall of the scrubbing chamber (210).

[0112] However, the other end of the third scrubbing plate (250) may not be connected to and fixed to the second inner wall (210SW2) of the scrubbing chamber (210). The other end of the third scrubbing plate (250) may be spaced apart from the second inner wall (210SW2) of the scrubbing chamber (210) in the first direction (D1). The space from the other end of the third scrubbing plate (250) to the second inner wall (210SW2) of the scrubbing chamber (210) may be a space where the second scrubbing solution (227), which will be described later, flows downward (e.g., in the second direction (D2)).

[0113] A scrubbing device (20) according to some embodiments may further include a third scrubbing hole (250H) and a third scrubbing wall (255).

[0114] A third scrubbing hole (250H) may be formed inside the third scrubbing plate (250). The third scrubbing hole (250H) may extend from the lower surface of the third scrubbing plate (250) to the upper surface of the third scrubbing plate (250). The third scrubbing hole (250H) may penetrate the third scrubbing plate (250) in a second direction (D2). Gas (G in FIG. 1) may rise in the second direction (D2) by passing through the third scrubbing hole (250H).

[0115] The upper surface of the third scrubbing plate (250) may face the demister (260) to be described later, and the lower surface of the third scrubbing plate (250) may face the upper surface of the second scrubbing plate (240).

[0116] The third scrubbing wall (255) may be attached to the other end of the third scrubbing plate (250). The third scrubbing wall (255) may be interposed between the third scrubbing plate (250) and the second inner wall (210SW2) of the scrubbing chamber (210). The third scrubbing wall (255) may extend in the second direction (D2).

[0117] In some embodiments, a portion of the third scrubbing wall (255) may protrude in a second direction (D2) from the upper surface of the third scrubbing plate (250). Another portion of the third scrubbing wall (255) may protrude in a second direction (D2) from the lower surface of the third scrubbing plate (250).

[0118] The length in the second direction (D2) of the portion protruding in the second direction (D2) from the upper surface of the third scrubbing plate (250) of the third scrubbing wall (255) may be smaller than the length in the second direction (D2) of the portion protruding in the second direction (D2) from the lower surface of the third scrubbing plate (250), but the technical concept of the present invention is not limited thereto.

[0119] In some embodiments, the third scrubbing plate (250) and the second scrubbing plate (240) do not completely overlap in the second direction (D2). The third scrubbing plate (250) and the second scrubbing plate (240) may be arranged in a zigzag pattern. The second scrubbing solution (227) that flows down past the third scrubbing wall (255) may be discharged onto the upper surface of the second scrubbing plate (240). In other words, the center of the third scrubbing plate (250) and the center of the second scrubbing plate (240) may be offset from each other.

[0120] However, the third scrubbing plate (250) and the first scrubbing plate (230) can be completely overlapped in the second direction (D2). That is, the center of the third scrubbing plate (250) and the center of the first scrubbing plate (230) can be overlapped in the second direction (D2).

[0121] In some embodiments, the first to third scrubbing holes (230H, 240H, 250H) may completely overlap in the second direction (D2). However, the technical concept of the present invention is not limited thereto. It goes without saying that the first to third scrubbing holes (230H, 240H, 250H) may not completely overlap in the second direction (D2) and may only partially overlap.

[0122] In some embodiments, the second scrubbing solution (227) may be water. However, the technical concept of the present invention is not limited thereto.

[0123] After the second scrubbing solution (227) is discharged onto the upper surface of the third scrubbing plate (250), it may flow toward the third scrubbing wall (255) from the upper surface of the third scrubbing plate (250) while the second scrubbing process is being performed. At this time, the second scrubbing solution (227) does not flow downward through the third scrubbing hole (250H). The second scrubbing solution (227) may flow over the third scrubbing wall (255) to the lower part of the scrubbing chamber (210).

[0124] The second scrubbing solution (227) that has passed the third scrubbing wall (255) is discharged again onto the upper surface of the second scrubbing plate (240). The second scrubbing solution (227) may flow toward the second scrubbing wall (245) from the upper surface of the second scrubbing plate (240) while the second scrubbing process is being performed.

[0125] The second scrubbing solution (227) placed on the upper surface of the second scrubbing plate (240) does not flow downward through the second scrubbing hole (240H). The second scrubbing solution (227) can flow over the second scrubbing wall (245) to the lower part of the scrubbing chamber (210).

[0126] Likewise, the second scrubbing solution (227) that has passed over the second scrubbing wall (245) is discharged again onto the upper surface of the first scrubbing plate (230). The second scrubbing solution (227) may flow from the upper surface of the first scrubbing plate (230) toward the first scrubbing wall (235) while the second scrubbing process is being performed.

[0127] At this time, the second scrubbing solution (227) does not flow downward through the first scrubbing hole (230H). The second scrubbing solution (227) can flow over the first scrubbing wall (235) to the bottom of the scrubbing chamber (210).

[0128] Finally, the second scrubbing solution (227) that has passed through the first scrubbing wall (235) can be stored in a scrubbing solution storage tank (270) provided at the bottom of the scrubbing chamber (210). The scrubbing solution storage tank (270) can store a scrubbing solution (275) in which impurities are dissolved. For example, the scrubbing solution (275) in which impurities are dissolved may be a solution in which a hydrophilic gas is dissolved in the second scrubbing solution (227).

[0129] In some embodiments, the hydrophilic gas may be IPA (isopropyl alcohol) and / or ammonia, but the technical concept of the present invention is not limited thereto.

[0130] A demister (260) may be placed at the top of the scrubbing chamber (210). The demister (260) may be used to remove moisture from the gas after the first scrubbing process and the second scrubbing process have been performed. After the first scrubbing process and the second scrubbing process have been performed, a gas from which impurities have been removed (G' in FIG. 1) may be provided. That is, moisture may be removed from the gas from which impurities have been removed (G' in FIG. 1) after the first scrubbing process and the second scrubbing process have been performed by using the demister (260). The gas filtered by passing through the demister (260) may be discharged to the outside of the scrubbing chamber (210) through the gas outlet (26) and the gas discharge pipe (23).

[0131] When using a scrubbing device (20) according to some embodiments, gases harmful to the human body (e.g., impurities) can be dissolved in the scrubbing solution. Therefore, gases harmful to the human body can be removed from by-products generated after various processes are performed in various industrial fields and discharged outside the scrubbing chamber (210).

[0132] In some embodiments, the first subspace (215a) may be defined by the first inner wall (210SW1) of the scrubbing chamber (210) and the separating wall (220). For example, the first subspace (215a) may be defined by the first inner wall (210SW1) of the scrubbing chamber (210), the third inner wall of the scrubbing chamber (210), the fourth inner wall of the scrubbing chamber (210), and the separating wall (220).

[0133] The first scrubbing process can be performed in the first subspace (215a).

[0134] Specifically, the first scrubbing solution (225) can be supplied into the interior of the scrubbing chamber (210) through the spray nozzle (221). The first scrubbing solution (225) can be supplied into the first subspace (215a) through the spray nozzle (221).

[0135] The first scrubbing solution (225) is provided from the top to the bottom of the first subspace (215a), and while the gas (G in FIG. 1) flows from the top to the bottom of the first subspace (215a), at least some of the impurities contained in the gas may be dissolved in the first scrubbing solution (225). In some embodiments, the first scrubbing solution (225) may contain water. However, the technical concept of the present invention is not limited thereto.

[0136] In some embodiments, the spray nozzle (221) may be a spray nozzle. The spray nozzle (221) may supply a first scrubbing solution (225) with small particles into a first subspace (215a). Thus, the contact area between the first scrubbing solution (225) and the gas can be improved. Accordingly, a scrubbing device (20) with improved scrubbing efficiency can be provided.

[0137] A spray nozzle (221) may be installed on the upper part of the scrubbing chamber (210). Although not illustrated, the spray nozzle (221) may be connected to a pipe installed outside the scrubbing chamber (210).

[0138] In some embodiments, a gas inlet (25) may be installed on one side of the first subspace (215a). The gas inlet (25) and the gas injection pipe (11) may be connected to each other.

[0139] Gas (G in FIG. 1) introduced into the interior of the scrubbing chamber (210) can be introduced into the interior of the scrubbing chamber (210) through a gas injection pipe (11) and a gas inlet (25). The gas inlet (25) can be connected to the gas injection pipe (11), and since the other end of the gas injection pipe (11) is connected to a process chamber (10 in FIG. 1), the gas (G in FIG. 1) introduced into the gas inlet (25) can be provided from the process chamber.

[0140] In some embodiments, negative pressure may be provided to the scrubbing space (215) through the gas inlet (25) and the gas outlet (26). For example, the pressure of the gas at the gas inlet (25) and the pressure of the gas at the gas outlet (26) may be different from each other. Thus, the gas (G in FIG. 1) may flow from the gas inlet (25) toward the gas outlet (26). The first scrubbing process and the second scrubbing process may be performed by utilizing the difference between the pressure of the gas at the gas inlet (25) and the pressure of the gas at the gas outlet (26).

[0141] In some embodiments, the first pressure gauge (281) can measure a first pressure of gas passing through the gas injection pipe (11). The second pressure gauge (283) can measure a second pressure of gas passing through the gas discharge pipe (23). The third pressure gauge (285) and the fourth pressure gauge (287) can measure a third pressure of gas within the scrubbing space (215). For example, the third pressure gauge (285) can measure the pressure of gas within the first sub-space (215a), and the fourth pressure gauge (287) can measure the pressure of gas within the second sub-space (215b).

[0142] The first pressure gauge (281) may be positioned upstream of the first pressure regulating unit (291). The upstream end of the first pressure regulating unit (291) may be between the first pressure regulating unit (291) and the process chamber (10 in FIG. 1). The downstream end of the first pressure regulating unit (291) may be between the first pressure regulating unit (291) and the scrubbing chamber (210).

[0143] In some embodiments, the rear end of the first pressure regulating unit (291) may be positive pressure, and the front end of the first pressure regulating unit (291) may be negative pressure. However, the absolute value of the pressure measured at the rear end of the first pressure regulating unit (291) and the absolute value of the pressure measured at the front end of the first pressure regulating unit (291) may be substantially the same.

[0144] In some embodiments, the first pressure regulating unit (291) may be installed within the gas injection pipe (11). The first pressure regulating unit (291) may be connected and fixed inside the gas injection pipe (11). In FIG. 4, the first pressure regulating unit (291) may be a fan, but the technical concept of the present invention is not limited thereto.

[0145] In some embodiments, the first pressure regulating unit (291) may have a form in which the fan is placed inside a separate housing. In this case, the housing may be connected and fixed to the inner wall of the gas injection pipe (11). In other embodiments, the first pressure regulating unit (291) may not include a separate housing. In this case, the outer part of the fan may be connected and fixed to the inner wall of the gas injection pipe (11). However, the technical concept of the present invention is not limited thereto.

[0146] The first pressure regulating unit (291) can regulate the intensity of the first pressure of the gas passing through the gas injection pipe (11). Specifically, the first pressure regulating unit (291) can rotate clockwise or counterclockwise (see reference numeral 291R). The intensity of the first pressure of the gas passing through the gas injection pipe (11) can be regulated by controlling the amount of rotation of the first pressure regulating unit (291).

[0147] In some embodiments, the width (291d) of the first pressure regulator (291) may be equal to or smaller than the width (11d) of the gas injection pipe (11). This may be because the first pressure regulator (291) is positioned inside the gas injection pipe (11).

[0148] In some embodiments, the width (291d) of the first pressure regulating part (291) may be the diameter of the first pressure regulating part (291), and the width (11d) of the gas injection pipe (11) may be the diameter of the gas injection pipe (11), but the technical concept of the present invention is not limited thereto.

[0149] In some embodiments, since the width (291d) of the first pressure regulating unit (291) is equal to or smaller than the width (11d) of the gas injection pipe (11), the first pressure of the gas passing through the gas injection pipe (11) can be precisely controlled according to the amount of rotation of the first pressure regulating unit (291). This may be because there is less energy loss due to the rotation of the first pressure regulating unit (291) inside the gas injection pipe (11). However, the technical concept of the present invention is not limited thereto.

[0150] In some embodiments, if the intensity of the first pressure measured by the first pressure gauge (281) is greater than the first set value, the amount of rotation of the first pressure regulating unit (291) may be reduced. Specifically, if the magnitude of the absolute value of the first pressure is greater than the first set value, the amount of rotation of the first pressure regulating unit (291) may be reduced. The intensity of the first pressure may be the magnitude of the absolute value of the first pressure.

[0151] That is, if the magnitude of the absolute value of the first pressure measured by the first pressure gauge (281) is greater than the first set value, the RPM (rotations per minute; rotations per minute) of the first pressure control unit (291) can be reduced. The first set value may be 500 Pa or more and 2000 Pa or less, but the technical concept of the present invention is not limited thereto. Preferably, the first set value may be 500 Pa or more and 1000 Pa or less.

[0152] This may be because when the rotation amount of the first pressure regulator (291) decreases, the intensity of the first pressure of the gas passing through the gas injection pipe (11) decreases. A decrease in the intensity of the first pressure of the gas passing through the gas injection pipe (11) may mean that the magnitude of the absolute value of the first pressure measured at the front of the first pressure regulator (291) decreases.

[0153] This relationship can be expressed by the following mathematical formula 1.

[0154]

[0155] Here, R1 may be the rotation amount of the first pressure regulating unit (291) and / or the RPM of the first pressure regulating unit (291). A1, B1, C1, and n may each be constants. Specifically, C1 may be the initial rotation amount of the first pressure regulating unit (291). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. P1 may be the first pressure measured by the first pressure gauge (281). P set1 ... may be the first setting value above. The above n, A1, and B1 may each be rational numbers between 0 and 10.

[0156] According to the above mathematical formula 1, the RPM of the first pressure control unit (291) can decrease rapidly as the magnitude of the absolute value of the first pressure is greater than the first set value. This may be intended to adjust the magnitude of the absolute value of the first pressure to be equal to the first set value more quickly as the difference between the magnitude of the absolute value of the first pressure and the first set value becomes larger. Accordingly, a scrubbing device with improved reliability can be provided.

[0157] Conversely, if the magnitude of the absolute value of the first pressure measured by the first pressure gauge (281) is smaller than the first set value, the amount of rotation of the first pressure control unit (291) can be increased. That is, if the magnitude of the absolute value of the first pressure measured by the first pressure gauge (281) is smaller than the first set value, the RPM (rotations per minute) of the first pressure control unit (291) can be increased.

[0158] This may be because when the rotation amount of the first pressure regulating unit (291) increases, the intensity of the first pressure of the gas passing through the gas injection pipe (11) increases. An increase in the intensity of the first pressure of the gas passing through the gas injection pipe (11) may mean that the magnitude of the absolute value of the first pressure measured at the front of the first pressure regulating unit (291) increases.

[0159] This relationship can be expressed by the following mathematical formula 2.

[0160]

[0161] Here, R1 may be the rotation amount of the first pressure regulating unit (291) and / or the RPM of the first pressure regulating unit (291). A2, B2, C2, and n may each be constants. Specifically, C2 may be the initial rotation amount of the first pressure regulating unit (291). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. P1 may be the first pressure measured by the first pressure gauge (281). P set1 ... may be the first setting value above. The above n, A2, and B2 may each be rational numbers between 0 and 10.

[0162] According to the above mathematical formula 2, the RPM of the first pressure control unit (291) can increase rapidly as the magnitude of the absolute value of the first pressure is smaller than the first set value. This may be intended to make the magnitude of the absolute value of the first pressure equal to the first set value more quickly as the difference between the magnitude of the absolute value of the first pressure and the first set value becomes larger. Accordingly, a scrubbing device with improved reliability can be provided.

[0163] By using the first pressure control unit (291) and the second pressure control unit (293), the magnitude of the absolute value of the first pressure and the magnitude of the absolute value of the second pressure can be controlled to be constant. The magnitude of the absolute value of the first pressure can be maintained constant within a range of 500 Pa or more and 2000 Pa or less. If the magnitude of the absolute value of the first pressure is less than 500 Pa, the efficiency of the process chamber connected to the scrubbing device may be reduced. If the magnitude of the absolute value of the first pressure is greater than 2000 Pa, the process chamber connected to the scrubbing device may malfunction. Therefore, a scrubbing device (20) with improved reliability can be provided.

[0164] In some embodiments, the second pressure gauge (283) can measure the second pressure of the gas passing through the gas discharge pipe (23).

[0165] The second pressure gauge (283) may be positioned at the rear end of the second pressure regulating unit (293). The rear end of the second pressure regulating unit (293) may be between the second pressure regulating unit (293) and the exhaust gas discharge chamber (30 in FIG. 1). The front end of the second pressure regulating unit (293) may be between the second pressure regulating unit (293) and the scrubbing chamber (210).

[0166] In some embodiments, the rear end of the second pressure regulating unit (293) may be positive pressure, and the front end of the second pressure regulating unit (293) may be negative pressure. However, the absolute value of the pressure measured at the rear end of the second pressure regulating unit (293) and the absolute value of the pressure measured at the front end of the second pressure regulating unit (293) may be substantially the same.

[0167] In some embodiments, the second pressure regulator (293) may be installed within the gas discharge pipe (23). The second pressure regulator (293) may be connected and fixed inside the gas discharge pipe (23). For example, the second pressure regulator (293) may be a fan, but the technical concept of the present invention is not limited thereto. The first pressure regulator (291) and the second pressure regulator (293) may be substantially the same.

[0168] In some embodiments, the second pressure regulating unit (293) may have a form in which the fan is placed inside a separate housing. In this case, the housing may be connected and fixed to the inner wall of the gas exhaust pipe (23). In other examples, the second pressure regulating unit (293) may not include a separate housing. In this case, the outer part of the fan may be connected and fixed to the inner wall of the gas exhaust pipe (23). However, the technical concept of the present invention is not limited thereto.

[0169] The second pressure regulating unit (293) can regulate the intensity of the second pressure of the gas passing through the gas discharge pipe (23). Specifically, the intensity of the second pressure can be regulated by controlling the amount of rotation of the second pressure regulating unit (293).

[0170] In some embodiments, the width (293d) of the second pressure regulator (293) may be equal to or smaller than the width (23d) of the gas discharge pipe (23). This may be because the second pressure regulator (293) is positioned inside the gas discharge pipe (23).

[0171] In some embodiments, the width (293d) of the second pressure regulating part (293) may be the diameter of the second pressure regulating part (293), and the width (23d) of the gas discharge pipe (23) may be the diameter of the gas discharge pipe (23), but the technical concept of the present invention is not limited thereto.

[0172] In some embodiments, since the width (293d) of the second pressure regulating unit (293) is equal to or smaller than the width (23d) of the gas discharge pipe (23), the second pressure of the gas passing through the gas discharge pipe (23) can be precisely controlled according to the amount of rotation of the second pressure regulating unit (293). This may be because there is less energy loss due to the rotation of the second pressure regulating unit (293) inside the gas discharge pipe (23). However, the technical concept of the present invention is not limited thereto.

[0173] In some embodiments, if the magnitude of the absolute value of the second pressure measured by the second pressure gauge (283) is greater than the second set value, the amount of rotation of the second pressure control unit (293) can be reduced. That is, if the magnitude of the absolute value of the second pressure measured by the second pressure gauge (283) is greater than the second set value, the RPM (rotations per minute) of the second pressure control unit (293) can be reduced. The second set value may be 500 Pa or more and 2000 Pa or less, but the technical concept of the present invention is not limited thereto. Preferably, the second set value may be 500 Pa or more and 1000 Pa or less.

[0174] For example, the sum of the first set value and the second set value may be 1000 Pa or more and 4000 Pa or less, but the technical concept of the present invention is not limited thereto. Preferably, the sum of the first set value and the second set value may be 1000 Pa or more and 2000 Pa or less.

[0175] This may be because when the rotation amount of the second pressure regulating unit (293) decreases, the intensity of the second pressure of the gas passing through the gas discharge pipe (23) decreases. A decrease in the intensity of the second pressure of the gas passing through the gas discharge pipe (23) may mean that the magnitude of the absolute value of the second pressure measured at the downstream end of the second pressure regulating unit (293) decreases.

[0176] This relationship can be expressed by the following mathematical formula 3.

[0177]

[0178] Here, R2 may be the rotation amount of the second pressure regulating unit (293) and / or the RPM of the second pressure regulating unit (293). A3, B3, C3, and n may each be constants. Specifically, C3 may be the initial rotation amount of the second pressure regulating unit (293). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. P2 may be the second pressure measured by the second pressure gauge (283). P set2 ... may be the second setting value above. The above n, A3, and B3 may each be rational numbers between 0 and 10.

[0179] According to the above mathematical formula 3, the RPM of the second pressure control unit (293) can decrease rapidly as the magnitude of the absolute value of the second pressure is greater than the second set value. This may be intended to adjust the magnitude of the absolute value of the second pressure to be equal to the second set value more quickly as the difference between the magnitude of the absolute value of the second pressure and the second set value becomes larger. Accordingly, a scrubbing device with improved reliability can be provided.

[0180] Conversely, if the magnitude of the absolute value of the second pressure measured by the second pressure gauge (283) is smaller than the second set value, the amount of rotation of the second pressure control unit (293) can be increased. That is, if the magnitude of the absolute value of the second pressure measured by the second pressure gauge (283) is smaller than the second set value, the RPM (rotations per minute) of the second pressure control unit (293) can be increased.

[0181] This may be because when the rotation amount of the second pressure regulating unit (293) increases, the intensity of the second pressure of the gas passing through the gas discharge pipe (23) increases. An increase in the intensity of the second pressure of the gas passing through the gas discharge pipe (23) may mean that the magnitude of the absolute value of the second pressure measured at the downstream end of the second pressure regulating unit (293) increases.

[0182] This relationship can be expressed by the following mathematical formula 4.

[0183]

[0184] Here, R2 may be the rotation amount of the second pressure regulating unit (293) and / or the RPM of the second pressure regulating unit (293). A4, B4, C4, and n may each be constants. Specifically, C4 may be the initial rotation amount of the second pressure regulating unit (293). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. P2 may be the second pressure measured by the second pressure gauge (283). P set2 ... may be the second setting value above. The above n, A4, and B4 may each be rational numbers between 0 and 10.

[0185] According to the above mathematical formula 4, the RPM of the second pressure control unit (293) can increase rapidly as the magnitude of the absolute value of the second pressure is smaller than the second set value. This may be intended to make the magnitude of the absolute value of the second pressure equal to the second set value more quickly as the difference between the magnitude of the absolute value of the second pressure and the second set value increases. Accordingly, a scrubbing device with improved reliability can be provided.

[0186] The first pressure and the second pressure can be controlled to a constant level using the first pressure control unit (291) and the second pressure control unit (293). Accordingly, a scrubbing device (20) with improved reliability can be provided.

[0187] In some embodiments, the connecting valve (295) may be installed on the upper part of the separating wall (220). The connecting valve (295) may be openable and closable. When the connecting valve (295) is open, the gas injected into the gas injection pipe (11) may be discharged directly to the gas discharge pipe (23) through the connecting valve (295). When the connecting valve (295) is closed, the gas injected into the gas injection pipe (11) may be scrubbed by passing through the first sub-space (215a) and the second sub-space (215b).

[0188] In some embodiments, the connecting valve (295) may be opened or closed depending on the pressure of the gas in the scrubbing space (215). That is, whether the connecting valve (295) is opened or closed may be determined depending on the pressure of the gas in the scrubbing space (215).

[0189] For example, the third pressure gauge (285) and the fourth pressure gauge (287) can measure the third pressure of the gas in the scrubbing space (215). The third pressure may be the pressure of the gas in the first sub-space (215a) or the pressure of the gas in the second sub-space (215b). The third pressure gauge (285) can measure the pressure of the gas in the first sub-space (215a), and the fourth pressure gauge (287) can measure the pressure of the gas in the second sub-space (215b).

[0190] If the absolute value of the third pressure exceeds the third set value, the connecting valve (295) may be opened. The third set value may be similar to the absolute value of the first pressure or the absolute value of the second pressure. For example, the third set value may be 500 Pa or more and 2000 Pa or less, but the technical concept of the present invention is not limited thereto. Preferably, the third set value may be 500 Pa or more and 1000 Pa or less. Of course, the third set value may be different from the first set value and the second set value, respectively.

[0191] For example, if the absolute value of the third pressure is measured by the third pressure gauge (285), the third set value may be substantially the same as the absolute value of the first pressure. As another example, if the absolute value of the third pressure is measured by the fourth pressure gauge (287), the third set value may be substantially the same as the absolute value of the second pressure.

[0192] If the difference between the absolute value of the first pressure and the absolute value of the third pressure decreases, the force of the gas attempting to pass through the scrubbing holes (230H, 240H, 250H) may weaken. In this case, the gas may not be scrubbed efficiently. Therefore, when the third pressure exceeds the third set value, the connecting valve (295) opens so that the gas injected through the gas injection pipe (11) can be immediately discharged through the gas discharge pipe (23). Accordingly, a scrubbing device with improved efficiency can be provided.

[0193] Additionally, if the difference between the absolute value of the second pressure and the absolute value of the third pressure decreases, the force of the gas attempting to pass through the scrubbing holes (230H, 240H, 250H) may weaken. In this case, the gas may not be scrubbed efficiently. Therefore, when the third pressure exceeds the third set value, the connecting valve (295) opens so that the gas injected through the gas injection pipe (11) can be immediately discharged through the gas discharge pipe (23). Accordingly, a scrubbing device capable of responding to abnormal operating conditions can be provided. That is, the connecting valve (295) may be a protective device capable of responding to abnormal operating conditions.

[0194] In some embodiments, the first subspace (215a) and the second subspace (215b) may be connected to each other at the bottom of the scrubbing chamber (210). The first subspace (215a) and the second subspace (215b) may be connected to each other on the scrubbing solution storage tank (270).

[0195] That is, the gas introduced into the first sub-space (215a) flows from the upper part of the first sub-space (215a) to the lower part of the first sub-space (215a) and can be introduced into the second sub-space (215b) from the lower part of the scrubbing chamber (210). In the second sub-space (215b), the gas (G in FIG. 1) can rise in the second direction (D2).

[0196] When using a scrubbing device (20) according to some embodiments, the contact area of ​​the gas in contact with the scrubbing solution can be improved. Specifically, the contact area of ​​the scrubbing solution and the gas can be improved by forming bubbles in the scrubbing solution.

[0197] For example, in FIG. 5, gas (G in FIG. 1) can pass through the first scrubbing hole (230H) and rise in the second direction (D2) (see reference numeral 230u).

[0198] After the gas (G in FIG. 1) passes through the first scrubbing hole (230H) upward, a bubble (BBL) may be formed on the upper surface of the first scrubbing plate (230). The bubble (BBL) may be formed inside the second scrubbing solution (227). The bubble (BBL) may be a bubble generated due to the pressure of the gas attempting to rise in the second direction (D2) inside the second scrubbing solution (227).

[0199] Impurities contained in the gas at the point where the bubble (BBL) and the second scrubbing solution (227) come into contact can be dissolved in the second scrubbing solution (227).

[0200] Next, the gas (G in FIG. 1) can rise in the second direction (D2) after passing through the first scrubbing hole (230H) and passing through the second scrubbing hole (240H).

[0201] After the gas (G in FIG. 1) passes through the second scrubbing hole (240H) upward, another bubble may be formed on the upper surface of the second scrubbing plate (240). The other bubble may be formed inside the second scrubbing solution (227). The other bubble may be a bubble generated due to the pressure of the gas attempting to rise in the second direction (D2) inside the second scrubbing solution (227).

[0202] In the part where the other bubble and the second scrubbing solution (227) come into contact, impurities contained in the gas can be dissolved in the second scrubbing solution (227).

[0203] Likewise, after the gas (G in FIG. 1) rises and passes through the second scrubbing hole (240H), it can rise and pass through the third scrubbing hole (250H) and rise in the second direction (D2). After the gas (G in FIG. 1) rises and passes through the third scrubbing hole (250H), another bubble may be formed on the upper surface of the third scrubbing plate (250).

[0204] After the gas (G in FIG. 1) passes through the third scrubbing hole (250H) in an upward direction, the other bubble may be formed on the upper surface of the third scrubbing plate (250). The other bubble may be formed inside the second scrubbing solution (227). The other bubble may be a bubble generated due to the pressure of the gas attempting to rise in the second direction (D2) inside the second scrubbing solution (227).

[0205] In the part where the other bubble and the second scrubbing solution (227) come into contact, impurities contained in the gas can be dissolved in the second scrubbing solution (227).

[0206] When the bubble is formed in the second scrubbing solution (227), the contact area between the gas and the scrubbing solution can be improved. Accordingly, a scrubbing device (20) with improved scrubbing efficiency can be provided.

[0207]

[0208] Hereinafter, scrubbing devices according to several other embodiments of the present invention will be described with reference to FIGS. 6 to 11. For convenience of explanation, content that overlaps with the content described using FIGS. 2 to 5 will be briefly explained or omitted.

[0209] FIGS. 6 to 11 are exemplary drawings for illustrating a scrubbing device according to several other embodiments of the present invention.

[0210] For reference, FIGS. 6, FIGS. 7, FIGS. 9, FIGS. 10, and FIGS. 11 may each be cross-sectional views of a scrubbing device according to some other embodiments of the present invention, and FIG. 8 may be a drawing of a scrubbing system including a scrubbing device according to some other embodiments of the present invention.

[0211] First, referring to FIG. 6, the first pressure regulating unit (291) may be positioned at the boundary between the gas injection pipe (11) and the scrubbing chamber (210). The first pressure regulating unit (291) may be positioned below the gas inlet (25). That is, the first pressure regulating unit (291) may be positioned outside the gas injection pipe (11).

[0212] In this case as well, the width (291d) of the first pressure regulating section (291) may be equal to or smaller than the width (11d) of the gas injection pipe (11). However, the technical concept of the present invention is not limited thereto. Of course, in some embodiments, the width (291d) of the first pressure regulating section (291) may be larger than the width (11d) of the gas injection pipe (11).

[0213] The second pressure regulating unit (293) may be positioned at the boundary between the gas discharge pipe (23) and the scrubbing chamber (210). The second pressure regulating unit (293) may be positioned below the gas discharge port (26). That is, the second pressure regulating unit (293) may be positioned outside the gas discharge pipe (23).

[0214] In this case as well, the width (293d) of the second pressure regulating section (293) may be equal to or smaller than the width (23d) of the gas discharge pipe (23). However, the technical concept of the present invention is not limited thereto. Of course, in some embodiments, the width (293d) of the second pressure regulating section (293) may be larger than the width (23d) of the gas injection pipe (23).

[0215] Referring to FIG. 7, a scrubbing device (20) according to some embodiments may further include a first connecting pipe (291c) and a second connecting pipe (293c).

[0216] The first connecting pipe (291c) may be positioned at the boundary between the gas injection pipe (11) and the scrubbing chamber (210). The first pressure regulating unit (291) may be positioned below the first connecting pipe (291c).

[0217] The first connecting pipe (291c) may have a structure in which its width gradually increases as it moves away from the gas injection pipe (11). Accordingly, the width (291d) of the first pressure regulating section (291) may be greater than the width (11d) of the gas injection pipe (11). The width (291d) of the first pressure regulating section (291) may be the same as the width of the first connecting pipe (291c) at the boundary between the first connecting pipe (291c) and the first pressure regulating section (291). Therefore, the amount of energy loss due to the rotation of the first pressure regulating section (291) can be minimized.

[0218] The second connecting pipe (293c) may be positioned at the boundary between the gas discharge pipe (23) and the scrubbing chamber (210). The second pressure regulating unit (293) may be positioned below the second connecting pipe (293c).

[0219] The second connecting pipe (293c) may have a structure in which its width gradually increases as it moves away from the gas discharge pipe (23). Accordingly, the width (293d) of the second pressure regulating section (293) may be greater than the width (23d) of the gas discharge pipe (23). The width (293d) of the second pressure regulating section (293) may be the same as the width of the second connecting pipe (293c) at the boundary between the second connecting pipe (293c) and the second pressure regulating section (293). Therefore, the amount of energy loss due to the rotation of the second pressure regulating section (293) can be minimized.

[0220] Referring to FIG. 8, there may be at least two process chambers connected to the scrubbing chamber (210). For example, a scrubbing system (1000) according to some other embodiment of the present invention may include first to fourth process chambers (10a, 10b, 10c, 10d). Gas injection piping may include first to fourth gas injection piping (11a, 11b, 11c, 11d). The first valve may include a first_1 valve (12a), a first_2 valve (12b), a first_3 valve (12c), and a first_4 valve (12d).

[0221] In FIG. 8, the scrubbing system (1000) is depicted as including four process chambers, but the technical concept of the present invention is not limited thereto. It goes without saying that the scrubbing system (1000) may include more than four process chambers or fewer than four process chambers.

[0222] The first to fourth process chambers (10a, 10b, 10c, 10d) can all be connected to a scrubbing chamber (210 in FIG. 3). Specifically, the first process chamber (10a) can be connected to the scrubbing chamber through a first gas injection pipe (11a). Accordingly, gas (Ga) discharged from the first process chamber (10a) can be injected into the scrubbing chamber through the first gas injection pipe (11a).

[0223] The second process chamber (10b) can be connected to the scrubbing chamber through the second gas injection pipe (11b). Accordingly, the gas (Gb) discharged from the second process chamber (10b) can be injected into the scrubbing chamber through the second gas injection pipe (11b).

[0224] The third process chamber (10c) can be connected to the scrubbing chamber through the third gas injection pipe (11c). Accordingly, the gas (Gc) discharged from the third process chamber (10c) can be injected into the scrubbing chamber through the third gas injection pipe (11c).

[0225] The fourth process chamber (10d) can be connected to the scrubbing chamber through the fourth gas injection pipe (11e). Accordingly, the gas (Gd) discharged from the fourth process chamber (10d) can be injected into the scrubbing chamber through the fourth gas injection pipe (11e).

[0226] In some embodiments, the number of process chambers connected to the scrubbing chamber may be varied. Specifically, the number of process chambers connected to the scrubbing chamber may be varied using the first to fourth valves (12a, 12b, 12c, 12d). In this specification, the meaning that the scrubbing chamber and the process chamber are connected may mean that gas discharged from the process chamber can be injected into the scrubbing chamber.

[0227] If the number of process chambers connected to the scrubbing chamber increases, the magnitude of the absolute value of the first pressure of the gas passing through the gas inlet (25) can be reduced. That is, if the number of process chambers connected to the scrubbing chamber increases, the magnitude of the absolute value of the first pressure of the gas passing through the gas injection pipe (11 in FIG. 3) can be reduced.

[0228] In this case, the RPM of the first pressure regulating unit may increase. This may be because when the amount of rotation of the first pressure regulating unit increases, the magnitude of the absolute value of the first pressure of the gas passing through the gas injection pipe (11 in FIG. 3) increases.

[0229] This relationship can be expressed by the following mathematical formula 5.

[0230]

[0231] Here, R1 may be the rotation amount of the first pressure regulating unit (291) and / or the RPM of the first pressure regulating unit (291). A5, B5, C5, and k may each be constants. Specifically, C5 may be the initial rotation amount of the first pressure regulating unit (291). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. N1 may be the number of process chambers currently connected to the scrubbing chamber (210). N2 may be the number of process chambers previously connected to the scrubbing chamber (210). N1 may be greater than N2. The above k, A5, and B5 may each be rational numbers between 0 and 10.

[0232] According to the above mathematical formula 5, as the number of process chambers connected to the scrubbing chamber (210) increases, the RPM of the first pressure control unit (291) can increase rapidly. This may be to rapidly increase the magnitude of the absolute value of the first pressure as the number of process chambers connected to the scrubbing chamber (210) increases, thereby maintaining the first pressure at a constant level. Accordingly, a scrubbing device with improved reliability can be provided.

[0233] Conversely, if the number of process chambers connected to the scrubbing chamber (210) is reduced, the magnitude of the absolute value of the first pressure of the gas passing through the gas inlet (25) can be increased. That is, if the number of process chambers connected to the scrubbing chamber (210) is reduced, the magnitude of the absolute value of the first pressure of the gas passing through the gas injection pipe can be increased. In this case, the RPM (rotations per minute) of the first pressure control unit (291) can be reduced.

[0234] This may be because when the amount of rotation of the first pressure regulating unit (291) decreases, the magnitude of the absolute value of the first pressure of the gas passing through the gas injection pipe (11) decreases.

[0235] This relationship can be expressed by the following mathematical formula 6.

[0236]

[0237] Here, R1 may be the rotation amount of the first pressure regulating unit (291) and / or the RPM of the first pressure regulating unit (291). A6, B6, C6, and k may each be constants. Specifically, C6 may be the initial rotation amount of the first pressure regulating unit (291). The initial rotation amount may be 0, but the technical concept of the present invention is not limited thereto. N1 may be the number of process chambers currently connected to the scrubbing chamber (210). N2 may be the number of process chambers previously connected to the scrubbing chamber (210). N2 may be greater than N1. The above k, A5, and B5 may each be rational numbers between 0 and 10.

[0238] According to the above mathematical formula 6, as the number of process chambers connected to the scrubbing chamber (210) decreases, the RPM of the first pressure control unit (291) may decrease rapidly. This may be intended to rapidly reduce the first pressure as the number of process chambers connected to the scrubbing chamber (210) decreases, thereby maintaining the magnitude of the absolute value of the first pressure constant. Accordingly, a scrubbing device with improved reliability can be provided.

[0239] Referring to FIG. 9, a scrubbing device (20) according to some embodiments may include two scrubbing plates (230, 240). That is, the scrubbing device (20) may include a first scrubbing plate (230) and a second scrubbing plate (240).

[0240] The second scrubbing plate (240) may be placed on the first scrubbing plate (230). The second scrubbing plate (240) may be placed on the upper surface of the first scrubbing plate (230). The first scrubbing plate (230) may be placed on the lower surface of the second scrubbing plate (240). No other scrubbing plate may be placed on the upper surface of the second scrubbing plate (240).

[0241] In some embodiments, the second scrubbing solution (227) may be supplied from the solution supply nozzle (223) and discharged onto the upper surface of the second scrubbing plate (240). Specifically, the second scrubbing solution (227) may be discharged onto an area of ​​the upper surface of the second scrubbing plate (240) adjacent to the second inner wall (210SW2) of the scrubbing chamber (210). The second scrubbing solution (227) may be discharged onto an area of ​​the upper surface of the second scrubbing plate (240) furthest from the second scrubbing wall (245).

[0242] The discharged second scrubbing solution (227) may flow toward the second scrubbing wall (245) from the upper surface of the second scrubbing plate (240) while the second scrubbing process is being performed. The second scrubbing solution (227) may flow downward over the second scrubbing wall (245). At this time, the second scrubbing solution (227) does not flow downward through the second scrubbing hole (240H). The second scrubbing solution (227) that flows downward over the second scrubbing wall (245) may be discharged onto the upper surface of the first scrubbing plate (230).

[0243] Likewise, the second scrubbing solution (227) may flow toward the first scrubbing wall (235) from the upper surface of the first scrubbing plate (230) while the second scrubbing process is being performed. At this time, the second scrubbing solution (227) does not flow downward through the first scrubbing hole (230H). The second scrubbing solution (227) may flow over the first scrubbing wall (235) to the lower part of the scrubbing chamber (210).

[0244] The scrubbing device (20) illustrated in FIG. 9 includes only two scrubbing plates (230, 240). Therefore, the height of the scrubbing device (20) in the second direction (D2) can be reduced. That is, space efficiency can be improved when using the scrubbing device (20) according to some embodiments of the present invention.

[0245] Referring to FIG. 10, in a scrubbing device (20) according to some embodiments, the shape of the first scrubbing plate (230) and the shape of the second scrubbing plate (240) may be different from each other.

[0246] For example, both ends of the first scrubbing plate (230) may be spaced apart from the separation wall (220) and the second inner wall (210SW2), respectively. Specifically, the first scrubbing plate (230) may not be connected in contact with both the separation wall (220) and the second inner wall (210SW2). Although not illustrated, the first scrubbing plate (230) may be connected in contact with the third inner wall and the fourth inner wall.

[0247] A pair of first scrubbing walls (235) may be placed at one end and the other end of the first scrubbing plate (230). Some of the pair of first scrubbing walls (235) may be interposed between the first scrubbing plate (230) and the separating wall (220). Other parts of the pair of first scrubbing walls (235) may be interposed between the first scrubbing plate (230) and the second inner wall (210SW2).

[0248] The space between the first scrubbing wall (235) and the separation wall (220) and the space between the first scrubbing wall (235) and the second inner wall (210SW2) may each be a space where the second scrubbing solution (227) flows downward (e.g., in the second direction (D2)).

[0249] Both ends of the second scrubbing plate (240) may be connected by contacting the separation wall (220) and the second inner wall (210SW2), respectively. The second scrubbing plate (240) may have a structure with a central portion open. That is, the second scrubbing plate (240) may include an opening, said opening formed in the central portion of the second scrubbing plate (240) and may extend in a third direction (D3). That is, said opening may expose at least a portion of the upper surface of the first scrubbing plate (230). That is, said opening may overlap with at least a portion of the upper surface of the first scrubbing plate (230) in a second direction (D2).

[0250] A pair of second scrubbing walls (245) may each be placed in the central portion of the second scrubbing plate (240). A pair of second scrubbing walls (245) may each be placed in the opening.

[0251] A pair of second scrubbing walls (245) may each be spaced apart from each other in a first direction (D1). The space between the pair of second scrubbing walls (245) may be a space where the second scrubbing solution (227) flows downward (e.g., in a second direction (D2)).

[0252] In some embodiments, the second scrubbing solution (227) may be discharged at both ends of the second scrubbing plate (240). For example, the second scrubbing solution (227) may be discharged to the area adjacent to the separation wall (220) of the second scrubbing plate (240) and to the area adjacent to the second inner wall (210SW2) of the second scrubbing plate (240), respectively.

[0253] The second scrubbing solution (227) discharged onto the upper surface of the second scrubbing plate (240) can flow into the central part of the second scrubbing plate (240). While the second scrubbing solution (227) flows into the central part of the second scrubbing plate (240), impurities can be dissolved in the second scrubbing solution (227). The second scrubbing solution (227) can be discharged onto the upper surface of the first scrubbing plate (230) beyond the second scrubbing wall (245). The second scrubbing solution (227) discharged onto the upper surface of the first scrubbing plate (230) can flow to both ends of the first scrubbing plate (230).

[0254] In FIG. 10, the scrubbing device (20) is illustrated as including two scrubbing plates, but the technical concept of the present invention is not limited thereto. If the scrubbing device (20) includes three scrubbing plates, the shape of the third scrubbing plate may be the same as the shape of the first scrubbing plate (230). The third scrubbing plate may be placed on the second scrubbing plate (240).

[0255] If the scrubbing device (20) includes four scrubbing plates, the shape of the third scrubbing plate may be the same as the shape of the first scrubbing plate (230), and the shape of the fourth scrubbing plate may be the same as the shape of the second scrubbing plate (240). The third scrubbing plate may be placed on the second scrubbing plate (240), and the fourth scrubbing plate may be placed on the third scrubbing plate.

[0256] Referring to FIG. 11, a scrubbing device (20) according to some embodiments may include one scrubbing plate (230). That is, the scrubbing device (20) may include a first scrubbing plate (230).

[0257] In some embodiments, the second scrubbing solution (227) may be supplied from the solution supply nozzle (223) and discharged onto the upper surface of the first scrubbing plate (230). Specifically, the second scrubbing solution (227) may be discharged onto an area of ​​the upper surface of the first scrubbing plate (230) adjacent to the separation wall (220). The second scrubbing solution (227) may be discharged onto an area of ​​the upper surface of the first scrubbing plate (230) furthest from the first scrubbing wall (235).

[0258] The second scrubbing solution (227) may flow toward the first scrubbing wall (235) from the upper surface of the first scrubbing plate (230) while the second scrubbing process is being performed. At this time, the second scrubbing solution (227) does not flow downward through the first scrubbing hole (230H). The second scrubbing solution (227) may flow over the first scrubbing wall (235) to the lower part of the scrubbing chamber (210).

[0259] The scrubbing device (20) illustrated in FIG. 11 includes only one scrubbing plate (230). Therefore, the height of the scrubbing device (20) in the second direction (D2) can be reduced. That is, space efficiency can be further improved when using the scrubbing device (20) according to some other embodiments of the present invention.

[0260]

[0261] Hereinafter, a method of operation of a scrubbing device according to some embodiments of the present invention will be described with reference to FIGS. 12 to 15. For reference, FIGS. 12 to 15 may each be an exemplary flowchart for explaining a method of operation of a scrubbing device according to some embodiments of the present invention.

[0262] FIGS. 12 to 15 are drawings for explaining the operation method of a scrubbing device according to some embodiments of the present invention.

[0263] First, referring to FIG. 12, a method of operating a scrubbing device according to some embodiments of the present invention may include providing a gas containing impurities into a scrubbing chamber through a gas injection pipe (S110), allowing the gas to rise and pass through a scrubbing hole to dissolve the impurities contained in the gas into a scrubbing solution (S120), and measuring a first pressure of the gas passing through the gas injection pipe (S130). Subsequently, it may be determined whether the intensity of the first pressure exceeds a first set value (S140). The intensity of the first pressure may be the magnitude of the absolute value of the first pressure.

[0264] If the magnitude of the absolute value of the first pressure exceeds the first set value, the RPM of the first pressure control unit can be reduced (S150). If the RPM of the first pressure control unit is reduced, the magnitude of the absolute value of the first pressure can be reduced. If the magnitude of the absolute value of the first pressure does not exceed the first set value, the RPM of the first pressure control unit can be increased (S155). If the RPM of the first pressure control unit is increased, the intensity of the first pressure can be increased. Accordingly, the first pressure can be maintained at a constant level at the first set value.

[0265] Next, the gas from which impurities have been removed can be discharged outside the scrubbing chamber through the gas discharge pipe (S160).

[0266] Referring to FIG. 13, a method of operation of a scrubbing device according to some embodiments of the present invention may include providing a gas containing impurities into a scrubbing chamber through a gas injection pipe (S210), allowing the gas to rise and pass through a scrubbing hole to dissolve the impurities contained in the gas into a scrubbing solution (S220), discharging the gas from which impurities have been removed to the outside of the scrubbing chamber through a gas discharge pipe (S230), and measuring a second pressure of the gas passing through the gas discharge pipe (S240). Subsequently, it may be determined whether the intensity of the second pressure exceeds a second set value (S250). The intensity of the second pressure may be the magnitude of the absolute value of the second pressure.

[0267] If the magnitude of the absolute value of the second pressure exceeds the second set value, the RPM of the second pressure control unit can be reduced (S260). If the RPM of the second pressure control unit is reduced, the magnitude of the absolute value of the second pressure can be reduced. If the magnitude of the absolute value of the second pressure does not exceed the second set value, the RPM of the second pressure control unit can be increased (S265). If the RPM of the second pressure control unit is increased, the magnitude of the absolute value of the second pressure can be increased. Accordingly, the second pressure can be maintained at a constant level at the second set value.

[0268] By using the above-described operating method, the intensity of the first pressure and the intensity of the second pressure can be controlled to a constant level. Accordingly, a scrubbing device with improved reliability can be provided.

[0269] Referring to FIG. 14, a method of operating a scrubbing device according to some embodiments of the present invention may include providing a gas containing impurities into a scrubbing chamber through a gas injection pipe (S310) and measuring a third pressure of the gas inside the scrubbing space (S320). Subsequently, it may be determined whether the intensity of the third pressure exceeds a third set value (S330). The intensity of the third pressure may be the magnitude of the absolute value of the third pressure.

[0270] If the intensity of the third pressure exceeds the third set value, the connecting valve can be opened to discharge the gas directly into the gas discharge pipe (S340). This may be to prevent malfunction of the scrubbing device and the process chamber. If the intensity of the third pressure does not exceed the third set value, the gas can be scrubbed (S345).

[0271] Specifically, referring to FIGS. 1 and FIGS. 15, a gas (G) containing impurities can be supplied from a process chamber (10) to a scrubbing device (20). The gas (G) containing impurities can pass through a gas injection pipe (11) and be introduced into the interior of the scrubbing device (20) through a gas inlet (25) (see reference numeral 310).

[0272] At this time, the first pressure gauge (281) can measure the first pressure of the gas passing through the gas injection pipe (11).

[0273] Gas (G) containing impurities can be introduced into the first subspace (215a). For example, gas (G) containing impurities can move to the lower part of the first subspace (215a) (see reference numeral 310).

[0274] In some embodiments, the first scrubbing process may be performed in the first subspace (215a).

[0275] Specifically, a first scrubbing solution (225) can be supplied to a first subspace (215a) through a spray nozzle (221) (see reference numeral 410). The first scrubbing solution (225) may be water, but the technical concept of the present invention is not limited thereto.

[0276] In FIG. 15, the first scrubbing solution (225) is shown as being sprayed vertically in the second direction (D2), but the technical concept of the present invention is not limited thereto.

[0277] A spray nozzle (221) can supply a first scrubbing solution (225) with small particles. As the gas (G) containing impurities moves to the lower part of the first subspace (215a), the impurities contained in the gas (G) can be dissolved in the first scrubbing solution (225). The first scrubbing process may be a process in which impurities contained in the gas (G) are dissolved in the first scrubbing solution (225).

[0278] Gas (G) from which some of the impurities have been removed can be supplied to a second subspace (215b) (see reference numeral 310). A second scrubbing process can be performed in the second subspace (215b). The second scrubbing process may be a process in which impurities contained in the gas (G) are dissolved in a second scrubbing solution (227).

[0279] While the second scrubbing process is being performed, the solution supply nozzle (223) can supply the second scrubbing solution (227) to the upper surface of the third scrubbing plate (250) (see reference numeral 420). The second scrubbing solution (227) supplied initially can flow downward through the third scrubbing hole (250H), the second scrubbing hole (240H), and the first scrubbing hole (230H). That is, in the initial state, the second scrubbing solution (227) can flow downward through the scrubbing holes (250H, 240H, 230H).

[0280] While the above second scrubbing process is being performed, the gas (G) can rise in the second direction (D2). The gas (G) can rise in the second direction (D2) by passing through the first scrubbing hole (230H).

[0281] Specifically, referring to FIG. 5, the gas (G) can rise and pass through the first scrubbing hole (230H). The gas (G) can rise in the second direction (D2) to form a bubble (BBL) in the second scrubbing solution (227). Impurities contained in the gas (G) can be dissolved into the second scrubbing solution (227) at the contact surface where the bubble (BBL) and the second scrubbing solution (227) come into contact.

[0282] While the second scrubbing process is being performed, the second scrubbing solution (227) does not flow downward through the scrubbing holes (250H, 240H, 230H). This may be due to the pressure of the gas (G) rising through the scrubbing holes (250H, 240H, 230H).

[0283] While the above second scrubbing process is being performed, the second scrubbing solution (227) may flow from the upper surface of the third scrubbing plate (250) toward the third scrubbing wall (255), and may flow over the third scrubbing wall (255) toward the upper surface of the second scrubbing plate (240) (see reference numeral 430). Additionally, the second scrubbing solution (227) may flow from the upper surface of the second scrubbing plate (240) toward the second scrubbing wall (245), and may flow over the second scrubbing wall (245) toward the upper surface of the first scrubbing plate (230) (see reference numeral 440). Additionally, the second scrubbing solution (227) may flow from the upper surface of the first scrubbing plate (230) toward the first scrubbing wall (235) and flow beyond the first scrubbing wall (235) toward the lower part of the scrubbing chamber (210) (see reference numeral 450).

[0284] The first scrubbing solution (225) provided in the first subspace (215a) may be stored in the scrubbing solution storage tank (270) after the first scrubbing process is performed. The second scrubbing solution (227) that has passed through the first scrubbing wall (235) may be stored in the scrubbing solution storage tank (270) after the second scrubbing process is performed. The scrubbing solution storage tank (270) may store a scrubbing solution (275) in which impurities are dissolved. The scrubbing solution (275) in which impurities are dissolved may include the first scrubbing solution in which impurities are dissolved and the second scrubbing solution in which impurities are dissolved.

[0285] While the second scrubbing solution (227) flows in the above direction, the gas (G) can pass through the scrubbing holes (250H, 240H, 230H) and rise in the second direction (D2). As the gas (G) passes through the scrubbing holes (250H, 240H, 230H), bubbles may form in the second scrubbing solution (227).

[0286] Specifically, the gas (G) can ascend and pass through the first scrubbing hole (230H) (see reference numeral 320). Subsequently, the gas (G) can ascend and pass through the second scrubbing hole (240H) (see reference numeral 330). Subsequently, the gas (G) can ascend and pass through the third scrubbing hole (250H) (see reference numeral 340).

[0287] As the gas (G) rises and passes through the scrubbing holes (250H, 240H, 230H), impurities can be dissolved in the second scrubbing solution (227).

[0288] Next, the gas (G') from which impurities have been removed can pass through the demister (260) and be discharged outside the scrubbing chamber (210) (see reference numeral 350). At this time, the second pressure gauge (283) can measure the second pressure of the gas passing through the gas discharge pipe (23).

[0289] There may be almost no impurities remaining in the gas (G') discharged through the gas outlet (26).

[0290] As previously explained, the first pressure gauge (281) measures the first pressure of the gas passing through the gas injection pipe (11). If the magnitude of the absolute value of the first pressure differs from the first set value, the RPM of the first pressure control unit (291) can be controlled to maintain the magnitude of the absolute value of the first pressure equal to the first set value.

[0291] Likewise, the second pressure gauge (283) measures the second pressure of the gas passing through the gas discharge pipe (23). If the magnitude of the absolute value of the second pressure is different from the second set value, the RPM of the second pressure control unit (293) can be controlled to maintain the magnitude of the absolute value of the second pressure equal to the second set value.

[0292] The third pressure gauge (285) measures the third pressure of the gas inside the scrubbing space (215). If the magnitude of the absolute value of the third pressure exceeds the third set value, or if the magnitude of the absolute value of the third pressure is equal to the magnitude of the absolute value of the first pressure, or if the magnitude of the absolute value of the third pressure is equal to the magnitude of the absolute value of the second pressure, the connecting valve (295) may be opened. In this case, the gas injected through the gas injection pipe (11) may pass through the connecting valve (295) and be discharged directly to the gas discharge pipe (23) (see reference numeral 360).

[0293] Although embodiments of the present invention have been described above with reference to the attached drawings, the present invention is not limited to the above embodiments and can be manufactured in various different forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical concept or essential features of the present invention. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive.

Claims

1. A scrubbing chamber defining a scrubbing space for scrubbing impurities contained in gas discharged from a process chamber; A gas injection pipe having one end connected to the scrubbing chamber and the other end connected to the process chamber, through which the gas is injected into the scrubbing chamber; A gas discharge pipe connected to the scrubbing chamber and through which the gas is discharged to the outside of the scrubbing chamber; A first scrubbing plate disposed within the scrubbing chamber above; A plurality of first scrubbing holes penetrating the first scrubbing plate; A solution supply nozzle for supplying a scrubbing solution to the upper surface of the first scrubbing plate; A first pressure gauge for measuring the first pressure of the gas passing through the gas injection pipe; and It includes a first pressure regulating unit installed at the boundary between the gas injection pipe and the scrubbing chamber or inside the gas injection pipe to regulate the intensity of the first pressure, and The above gas rises and passes through the plurality of first scrubbing holes, and bubbles are formed on the upper surface of the first scrubbing plate, and A scrubbing device in which the impurities are dissolved in the scrubbing solution at the portion where the bubble and the scrubbing solution come into contact.

2. In Paragraph 1, If the magnitude of the absolute value of the first pressure measured by the first pressure gauge is greater than the first set value, the RPM (rotations per minute) of the first pressure control unit decreases, and A scrubbing device in which the RPM of the first pressure control unit increases when the magnitude of the absolute value of the first pressure measured by the first pressure gauge is smaller than the first set value.

3. In Paragraph 2, A scrubbing device in which the first setting value is greater than 500 Pa and less than 2000 Pa.

4. In Paragraph 2, A scrubbing device in which the RPM of the first pressure regulating unit is determined by the following mathematical formula 1 and the following mathematical formula 2. [Mathematical Formula 1] [Mathematical Formula 2] R1 is the amount of rotation of the first pressure regulating unit, and A1, B1, C1, A2, B2, C2, and n are each rational numbers between 0 and 10, P1 is the first pressure, Pset1 is the first set value, and C1 and C2 are each the initial amount of rotation of the first pressure regulating unit.

5. In Paragraph 2, A second pressure gauge for measuring the second pressure of the gas passing through the gas discharge pipe, and It further includes a second pressure regulating unit installed at the boundary between the gas discharge pipe and the scrubbing chamber or inside the gas discharge pipe to regulate the intensity of the second pressure. If the magnitude of the absolute value of the second pressure measured by the second pressure gauge is greater than the second set value, the RPM of the second pressure control unit decreases, and A scrubbing device in which the RPM of the second pressure control unit increases when the magnitude of the absolute value of the second pressure measured by the second pressure gauge is smaller than the second set value.

6. In Paragraph 5, A scrubbing device in which the sum of the first setting value and the second setting value is 1000pa or more and 4000pa or less.

7. In Paragraph 1, The scrubbing space above includes a first sub-space and a second sub-space separated by a dividing wall, and The above gas injection pipe is connected to the above first subspace, and The above gas discharge pipe is a scrubbing device connected to the above second subspace.

8. In Paragraph 7, A scrubbing device in which the first scrubbing plate and the solution supply nozzle are installed in the second subspace.

9. In Paragraph 7, A scrubbing device in which the first subspace and the second subspace are connected to each other at the bottom of the scrubbing chamber.

10. In Paragraph 7, A connecting valve that is openable and closable and installed on the upper part of the above-mentioned partition wall, and It further includes a third pressure gauge for measuring the third pressure inside the first subspace, and A scrubbing device in which, when the magnitude of the absolute value of the first pressure and the magnitude of the absolute value of the third pressure are the same, the connecting valve is opened so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged outside the scrubbing chamber through the gas discharge pipe.

11. In Paragraph 7, A second pressure gauge for measuring the second pressure of the gas passing through the gas discharge pipe, A second pressure regulating unit installed at the boundary between the gas discharge pipe and the scrubbing chamber or inside the gas discharge pipe to regulate the intensity of the second pressure, A connecting valve that is openable and closable and installed on the upper part of the above-mentioned partition wall, and It further includes a fourth pressure gauge for measuring the third pressure inside the second subspace, and A scrubbing device in which, when the magnitude of the absolute value of the second pressure and the magnitude of the absolute value of the third pressure are the same, the connecting valve is opened so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged outside the scrubbing chamber through the gas discharge pipe.

12. In Paragraph 7, A connecting valve that is openable and closable and installed on the upper part of the above-mentioned partition wall, and It further includes a third pressure gauge for measuring a third pressure inside the scrubbing space, and A scrubbing device in which, when the magnitude of the absolute value of the third pressure exceeds the third set value, the connecting valve opens so that the gas injected through the gas injection pipe passes through the connecting valve and is immediately discharged through the gas discharge pipe.

13. In Paragraph 1, The number of process chambers connected to the scrubbing chamber can be varied, If the number of process chambers connected to the scrubbing chamber increases, the RPM of the first pressure regulator increases, and A scrubbing device in which the RPM of the first pressure regulating unit decreases as the number of process chambers connected to the scrubbing chamber decreases.

14. In Paragraph 13, A scrubbing device in which the RPM of the first pressure regulating unit is determined by the following mathematical formulas 5 and 6. [Mathematical Formula 5] [Mathematical Formula 6] R1 is the rotation amount of the first pressure regulating unit, and A5, B5, C5, A6, B6, C6, and k are each rational numbers between 0 and 10, N1 is the number of process chambers currently connected to the scrubbing chamber, N2 is the number of process chambers previously connected to the scrubbing chamber, and C5 and C6 are each the initial rotation amounts of the first pressure regulating unit.

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