Device and method for a localized application of molecules onto a carrier
The method forms a two-dimensional monolayer gas layer under vacuum to localize molecules on a support using low electrical voltages, addressing inefficiencies and damage in existing methods, enabling precise molecular monolayer pattern writing.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- TECH UNIV BERLIN
- Filing Date
- 2025-11-06
- Publication Date
- 2026-05-21
AI Technical Summary
Existing methods for producing structured molecular monolayers are inefficient and often cause damage to the surface due to high electrical voltages and wear.
A method involving the formation of a two-dimensional monolayer gas layer under vacuum conditions, where molecules are selectively localized on a support using low electrical voltages, allowing for pattern writing with minimal surface interaction and damage.
Enables the creation of molecular monolayer patterns with minimal surface wear and damage, achieving high accuracy and precision with low electrical voltages, suitable for applications like scanning tunneling microscopy.
Smart Images
Figure EP2025082140_21052026_PF_FP_ABST
Abstract
Description
[0001] TUB126EP
[0002] 1
[0003] Description
[0004] Arrangement and method for the localized application of molecules onto a support
[0005] The invention relates to arrangements and methods for the localized application of molecules to a support.
[0006] Several methods are already known that utilize scanning probe microscopy techniques to selectively fabricate nanostructures on surfaces. These can be summarized under the term scanning probe lithography (SPL). Different physical and chemical effects are used to locally modify the structure of the sample surface beneath a spatially positionable tip. Examples include thermal or thermochemical SPL, where a heated tip is used to structure the surface, and oxidation SPL, where the formation of a water bridge between the tip and the sample leads to local oxidation of the surface. The various methods are described, for example, in the articles [1] and
[0002] listed in the reference list below.
[0007] The invention is based on the objective of providing a method by which a structured molecular monolayer layer can be produced with minimal effort.
[0008] This problem is solved according to the invention by a method with the features of claim 1. Advantageous embodiments of the method according to the invention are specified in the dependent claims. TUB126EP
[0009] 2
[0010] According to the invention, a method for the localized application of molecules to a support is provided, in which a two-dimensional monolayer gas layer containing the molecules is formed on the support under vacuum conditions, in which the molecules belonging to the two-dimensional monolayer gas layer can move parallel to the surface of the support, and by applying an electrical voltage between the support and a needle tip located directly above the support and interacting with the two-dimensional monolayer gas layer, the molecules of the two-dimensional monolayer gas layer located near the needle tip are selectively and permanently localized on the support.
[0011] A significant advantage of the method according to the invention is that by selectively localizing molecules of the monolayer gas layer, patterns can be written in which the areas written with the molecules each consist of only one molecular monolayer.
[0012] Another significant advantage of the method according to the invention is that it can be carried out with relatively low electrical voltages and thus, compared to other coating methods, without wear or damage, or at least with comparatively low wear or damage.
[0013] It is advantageous to perform a pattern writing process in which a pattern or molecular monolayer pattern with localized molecules is written onto the substrate, whereby the polarity of the voltage between the substrate and the tip is inverted during the pattern writing process. Such a voltage inversion allows, for example, the TUB126EP to be used while the molecules are not being written or localized.
[0014] 3
[0015] The needle tip is used to scan the substrate for measurement purposes using the inverted voltage, for example, when the method is performed with the needle tip of a scanning tunneling microscope. In the latter case, the tunneling current can be evaluated during the non-writing or non-localization of the molecules for scanning; during the writing process, the tunneling current is generally too noisy for measurement due to the temporally parallel molecular localization.
[0016] Alternatively, it can also be provided that outside of writing sections, i.e., in separation sections without desired localization of molecules, the needle tip is guided across the substrate with a voltage of zero or another voltage unsuitable for localization. However, the described scanning of the substrate surface in phases where no localization of molecules occurs is generally not possible with a voltage of zero, at least when using a scanning tunneling microscope.
[0017] In an advantageous embodiment, a pattern writing process is carried out in which a pattern or molecular monolayer pattern with at least one writing section containing localized molecules is written by guiding the needle tip over the support with a first voltage polarity in the writing section and guiding the needle tip over the support outside the writing section with a second voltage polarity that is opposite to the first voltage polarity.
[0018] A pattern writing process may also be provided, in which a pattern or molecular monolayer pattern with at least two TUB126EP separated from each other by a separating section is used.
[0019] 4
[0020] Writing sections with localized molecules are created by passing the needle tip with the first voltage polarity over the support in the writing sections and passing the needle tip with the second voltage polarity over the support in the separation area between the writing sections.
[0021] It is particularly advantageous if two or more pattern writing processes are carried out, wherein in a first pattern writing process a first molecular monolayer pattern with at least one writing section is written with a first type of molecule, and in a second pattern writing process a second molecular monolayer pattern with at least one writing section is written with a second type of molecule.
[0022] The writing section(s) of the first molecular monolayer pattern are preferably free from overlap or collision with the writing section(s) of the second molecular monolayer pattern.
[0023] The second pattern writing process is preferably carried out only after the first pattern writing process has been completed and the two-dimensional monolayer gas layer containing the first type of molecule has left the support, for example by evaporation of the molecules of this first type. The first and second types of molecules can, for example, each be different types of N-heterocyclic sheaf (NHC) molecules.
[0024] The voltage between the carrier and the tip is preferably a positive voltage for the first voltage polarity, where the electrical potential at the carrier is higher than the TUB126EP
[0025] 5
[0026] The electric potential at the tip is, and in the second voltage polarity, accordingly, a negative voltage, where the electric potential at the carrier is smaller than the electric potential at the tip.
[0027] The voltage between the carrier and the tip is preferably between 2 and 5 volts when writing the writing sections.
[0028] It is advantageous if the molecules are provided by heating a base material containing the molecules.
[0029] In a particularly preferred embodiment of the method, it is provided that the molecules couple with the support to form the two-dimensional monolayer gas layer and that the two-dimensional monolayer gas layer is held on the support surface by a holding force caused by the coupled molecules, wherein each of the molecules belonging to the two-dimensional monolayer gas layer is at any given time forcefully coupled to at least one support atom on the surface of the support.
[0030] With regard to the localization of the molecules, it is considered advantageous if the molecules have a ring structure, all mobile molecules belonging to the two-dimensional monolayer gas layer are oriented such that the ring surface of their ring structure lies parallel to the support surface and the plane of motion of the monolayer gas layer, and by applying the electrical voltage between the support and the needle tip, the ring structure of the molecules located in the region of the needle tip is rotated out of the plane of the monolayer gas layer and thereby onto the support TUB126EP
[0031] 6
[0032] It is immobilized and fixed. It is preferably unscrewed at an angle of 90°.
[0033] In an embodiment considered advantageous, the molecules are provided by heating a base material containing the molecules, wherein the heating of the base material takes place in an effusion chamber during a first temporal process phase and is terminated upon completion of the first process phase, and wherein during this first process phase a three-dimensional gas atmosphere containing the vaporized molecules is generated in the effusion chamber, from which all or at least some of the molecules of the gas atmosphere are deposited onto the support, forming the monolayer gas layer.After completion of the first process phase, the support, preferably together with the monolayer gas layer located on it, is transferred from the effusion chamber to an adjacent process chamber, also under vacuum conditions, in a subsequent second process phase. The needle tip is located in this adjacent process chamber, and the local fixation of the molecules of the monolayer gas layer is preferably carried out in this adjacent process chamber. In the second process phase, the molecules of the two-dimensional monolayer gas layer located near the needle tip are permanently localized on the support by applying an electrical voltage between the support and the needle tip, preferably in the adjacent process chamber.
[0034] In another embodiment considered advantageous, the local fixation of the molecules of the monolayer gas layer is carried out in the same process chamber in which the molecules are deposited onto the support in the form of the monolayer gas layer. During a TUB126EP
[0035] 7
[0036] During heating of the base material, a three-dimensional gas atmosphere containing the vaporized molecules is preferably generated in the process chamber, from which all or at least some of the molecules of the gas atmosphere are deposited onto the support, forming the monolayer gas layer, wherein, already during or after heating, the molecules of the two-dimensional monolayer gas layer located near the needle tip are permanently localized on the support by applying an electrical voltage between the support and the needle tip.
[0037] The needle tip interacting with the two-dimensional monolayer gas layer preferably forms a component of a scanning tunneling microscope or atomic force microscope.
[0038] The molecules are preferably N-heterocyclic carbene (NHC) molecules. Preferably, a structured monolayer layer of NHC material is written.
[0039] It is advantageous if the support consists at least on the surface containing the two-dimensional monolayer gas layer of doped (preferably boron-doped) silicon or GaAs.
[0040] The invention further relates to an arrangement suitable for applying molecules to a support, comprising an effusion cell for heating a base material containing the molecules under vacuum conditions and forming a two-dimensional monolayer gas layer containing the molecules, in which the molecules belonging to the two-dimensional monolayer gas layer can move parallel to the surface of the support, and a structure located directly above the support and connected to the two-dimensional monolayer gas layer TUB126EP
[0041] 8
[0042] interacting needle tip, a voltage source for applying an electrical voltage between the support and the needle tip, a needle adjustment device and a control device designed to control a pattern writing process by controlling the needle adjustment device and the voltage source and locally generating a writing voltage that leads to the targeted permanent localization of the molecules of the two-dimensional monolayer gas layer located near the needle tip on the support.
[0043] In a preferred embodiment, the effusion cell and the needle tip are arranged within the same process chamber of a scanning tunneling or atomic force microscope.
[0044] In another preferred embodiment, the effusion cell is arranged in an effusion chamber next to a process chamber of a scanning tunneling or atomic force microscope, and the support coated with the two-dimensional monolayer gas layer can be transferred from the effusion chamber to the process chamber containing the needle tip under vacuum conditions.
[0045] The invention is explained in more detail below with reference to exemplary embodiments; the following are shown as examples:
[0046] Fig. 1 shows a first embodiment of an arrangement according to the invention, which is suitable for carrying out methods according to the invention.
[0047] Fig. 2 shows a second embodiment of an arrangement according to the invention, which is suitable for carrying out methods according to the invention, TUB126EP
[0048] 9
[0049] Fig. 3 shows a sample written using the described method.
[0050] Fig. 4 shows an NHC molecule on a boron-doped silicon surface, and
[0051] Fig. 5 shows a test write operation to verify the functionality of the writing process.
[0052] For the sake of clarity, the same reference symbols are always used in the figures for identical or comparable components.
[0053] Figure 1 shows a first embodiment of an arrangement 10 according to the invention, which is suitable for carrying out methods according to the invention.
[0054] The arrangement 10 comprises an effusion cell 11 for heating a base material BM containing molecules M under vacuum conditions. Heating releases molecules M of the base material BM, some of which couple to the surface 21 of a support 20 in the form of a two-dimensional monolayer gas layer MGS. Within this two-dimensional monolayer gas layer MGS, the molecules M on the support 20 can move freely parallel to the surface 21 of the support 20, while remaining individually coupled to the surface 21.
[0055] The arrangement 10 also includes a needle located directly above the support 20 with a needle tip 12, which, due to its small distance to the surface 21, interacts with the two-dimensional monolayer gas layer MGS TUB126EP
[0056] 10
[0057] can permanently locate or attach molecules M in the area of the needle tip 12 on the support 20, provided that a suitable electrical voltage U is applied between the support 20 and the needle tip 12.
[0058] In order to enable such localization of the molecules M at selected locations on the surface 21 of the support 20, a needle positioning device 13, with which the position of the needle tip 12 relative to the support 20 can be adjusted, and a voltage source 14 for applying an electrical voltage U between the support 20 and the needle tip 12 are provided.
[0059] The needle movement device 13 and the voltage source 14 are controlled by a control unit 15, which is designed to control a pattern writing process using control signals ST1 and ST2. This involves moving the needle tip 12 with the needle movement device 13 to those areas above the carrier 20 where localization is to occur, and applying the voltage U suitable for writing in these areas using the voltage source 14. In areas where no localization of the molecules M is to occur, a different voltage U that does not cause localization, or a voltage U of zero volts, is applied.
[0060] Particularly suitable molecules M for carrying out the pattern writing process are, for example, those exhibiting a ring structure. In such a case, all mobile molecules M belonging to the two-dimensional monolayer gas layer MGS can align themselves such that the ring surface of their ring structure is parallel to the support surface 21 and the plane of motion of the monolayer gas layer MGS TUB126EP.
[0061] 11
[0062] By applying a suitable electrical voltage U between the support 20 and the needle tip 12, the ring structure of the molecules M located in the region of the needle tip 12 can be rotated out of the plane of the monolayer gas layer MGS, for example by 90° into a position perpendicular to the surface 21, thereby immobilizing and fixing the molecules M on the support 20.
[0063] The pattern writing procedure can be carried out, for example, with N-hetero-cyclic carbene (NHC) molecules M localized on a surface 21 of doped (preferably boron-doped) silicon or GaAs.
[0064] A suitable electrical voltage U between the carrier 20 and the needle tip 12 for localizing the molecules M, i.e. for writing sections SA (see Figure 3), is a positive voltage U in the range between +2 and +5 volts.
[0065] A particularly suitable electrical voltage U, at which no localization of the molecules M should occur, is a voltage U of zero or a negative voltage U. The control device 15 can therefore easily decide, by reversing the polarity of the electrical voltage U, whether a writing section SA (see Figure 3) with localized molecules should be formed or a molecule-free separation section TA (see Figure 3) should be maintained.
[0066] In the arrangement 10 according to Figure 1, the effusion cell 11 and the needle tip 12 are arranged within a process chamber 16 of a scanning tunneling or atomic force microscope. TUB126EP
[0067] 12
[0068] Figure 2 shows a further embodiment of an arrangement 10 suitable for the described pattern writing method. In the arrangement 10 according to Figure 2, the effusion cell 11 is arranged in an effusion chamber 17 directly next to a process chamber 16 of a scanning tunneling or atomic force microscope.
[0069] In the arrangement 10 according to Figure 2, the base material BM is heated in the effusion chamber 17 during a first process phase and is terminated upon completion of this first process phase. During this first process phase, a three-dimensional gas atmosphere containing the vaporized molecules M is generated in the effusion chamber 17, from which all or at least some of the molecules M of the gas atmosphere are deposited onto the support 20, forming the monolayer gas layer MGS.
[0070] After completion of the first process phase, the carrier 20, together with the monolayer gas layer MGS located on it, is transferred in a subsequent second process phase from the effusion chamber 17 to the adjacent process chamber 16, which is also under vacuum conditions and contains the needle tip 12, and the local fixation of the molecules M of the monolayer gas layer MGS in the adjacent process chamber 16 is carried out, for example as has been explained above in connection with Figure 1.
[0071] The effusion chamber 17 can be separated from the process chamber 16 by a separation path 18 or the like, in order to be able to carry out the coating of the carrier 20 with the monolayer gas layer MGS separately from the subsequent localization and to protect the process chamber 16 from unwanted deposits of base material BM; in such a case, the TUB126EP remains
[0072] 13
[0073] Separation path 18 is closed in the first process phase and is only opened for the transport of the carrier 20 coated with the monolayer gas layer MGS into the process chamber 16.
[0074] In both methods described above in connection with Figures 1 to 2, the small voltages used (around 2-5 V) result in only a small interaction with the surface 21 of the support 20, making the method non-destructive or at least very low-destructive.
[0075] Initial tests achieved writing speeds of up to 5 µm / s. With minimum line widths of approximately 2 nm, the accuracy is within the range of the lateral dimensions of the molecules M.
[0076] As mentioned previously, the organic molecules used in the process described above preferably belong to the class of N-heterocyclic carbenes (NHCs), which have attracted considerable attention in recent years. They consist of a heterocyclic ring of C and N atoms, one of which, the so-called carbene C atom, has two unsaturated electrons. NHCs are characterized by high modifiability, e.g., by different side groups on the N atoms or in the backbone. With the process described above, it is now possible to produce highly ordered NHC monolayers on surfaces with a desired pattern, i.e., with writing sections SA (see Figure 3) in which the molecules M are localized, and separation sections TA (see Figure 3) between such writing sections SA.
[0077] For example, it is possible to selectively write molecular monolayers using a scanning tunneling microscope, whereby the molecules M are previously plotted as a monolayer gas layer MGS on the TUB126EP.
[0078] 14
[0079] Surface 21 has been applied. Using a scanning tunneling microscope, a metallic tip is brought very close to a conductive or semiconducting sample surface. At sufficiently small distances, electrons can exchange between the tip and the sample due to the quantum mechanical tunneling effect, and when a voltage U is applied, a measurable tunneling current in the pA to nA range flows. This current is used to obtain an image of surface 21 by scanning it. The direction of tunneling depends on the polarity of the voltage U: With a positive sample voltage, the electrons tunnel from the tip into unoccupied electronic states of the sample; with a negative sample voltage, the opposite occurs.
[0080] In a scanning tunneling microscopy-based pattern writing method, it is therefore possible to acquire stable scanning tunneling microscopy images at a negative sample voltage without any significant manipulation of the molecules M on the surface 21. The molecules M, which are mobile on the surface 21, move too quickly to be visible with the comparatively slow scanning tunneling microscopy method. However, if a positive sample voltage in the range of 2–5 V is applied, the mobile molecules M below the tip are immobilized, and an image of the scanned structure is produced. For example, the "TU Berlin" lettering shown in Figure 3 was generated in this way.
[0081] The described pattern writing process is preferably carried out under ultra-high vacuum conditions and at room temperature.
[0082] For example, BIMe (1,3-dimethylbenzimidazole-2-ylidene) can be used as NHC molecules. Due to the high TUB126EP
[0083] 15
[0084] Due to their reactivity, such NHC molecules are generally difficult to handle, and the carbene carbon atom is therefore preferably saturated. For the vacuum evaporation of NHC, so-called CO₂ and H₂CO₃ adducts have proven to be good starting materials. It is advantageous to use BIMe-H₂CO₃, which is available in powder form and is placed in an evaporator. When the BIMe-H₂CO₃ adduct is heated in the evaporator, free NHC is formed with the elimination of CO₂ and H₂O, which can then be deposited on the surface 21. A boron-doped silicon surface is preferably used as the substrate.
[0085] During test experiments, the inventor applied a small amount of BIMe to the surface 21 to write the molecules M. Individual molecules M may already be immobile on the support 20 before the writing process—a kind of undesirable contamination effect, as shown by the bright, randomly distributed dots 100 in Figure 3. Based on measurements of their height and lateral size and determination of the adsorption site, it can be assumed that the immobile molecules M are covalently bound to the support 20. Figure 4 shows an example of the structure and arrangement 10 of an immobile NHC molecule located on a boron-doped silicon surface.
[0086] However, the significant part of the molecules M is mobile on the support 20, invisible to the scanning tunneling microscope, as a highly mobile two-dimensional molecular gas (2D gas), which provides the molecules M for writing.
[0087] To demonstrate this fact, the inventor conducted the experiment shown in Figure 5. First, a TUB126EP, marked with a white dashed line in Figure 5, was used.
[0088] 16
[0089] Frame 200 was written onto surface 21 using molecules. Assuming that this frame represents a barrier for the molecules M moving on surface 21, it should no longer be possible to write further patterns within frame 200. This is precisely the case, as can be seen from squares 201 to 204, marked with solid white lines, where attempts were made to write patterns on surface 21. Within frame 200 (see squares 201 and 203), this is not possible, while outside frame 200 (see squares 202 and 204) it was possible to write patterns. This experiment clearly shows that the molecules M are supplied by the surrounding regions of surface 21 and are not, for example, deposited from the vacuum or from the tunnel tip.
[0090] The molecules M "written" using the described pattern-writing method exhibit the same appearance (height, lateral dimensions, adsorption site) as the stable BIMe molecules 100 already present (undesirably) after evaporation discussed above (see Figure 3). From this, it can be concluded that they have the same upright adsorption geometry with binding to the Si substrate atoms. Thus, targeted localization of NHC monolayers can be applied to the surface 21. As with the direct growth of NHC monolayers on boron-doped silicon, no multiple layers are formed. The directly grown NHC monolayers are characterized by high thermal stability and lead to significant changes in the work function [3]. It can therefore be assumed that the monolayers with patterns produced by the method described here exhibit the same properties as monolayers without patterns. TUB126EP
[0091] 17
[0092] Furthermore, it was observed that the monolayer gas layer (MGS) disappears after some time (approx. 2-3 days), and writing is then no longer possible. Repeated application of a small amount of BIMe restores the writing capability. Thus, over time, a (presumably thermally induced) immobilization or desorption of the molecules M of the monolayer gas layer (MGS) also occurs.
[0093] The high modifiability and functionalizability of NHC molecules makes the described method very interesting, as the molecules' self-immobilization over time makes it possible to create patterns from different NHC molecules, which, for example, exhibit different functionalizations or etch resistances. First, an initial molecule type would be deposited and the surface 21 modified accordingly. Once the monolayer gas layer (MGS) has stabilized, another molecule type can be applied, and further patterns can be created with this additional molecule type.
[0094] Finally, it should be mentioned that the features of all the embodiments described above can be combined with each other in any way to form further embodiments of the invention.
[0095] Furthermore, all features of dependent claims can be combined individually with each of the dependent claims, either alone or in any combination with one or more other dependent claims, to obtain further embodiments. TUB126EP
[0096] 18
[0097] Bibliography
[0098]
[0001] Garcia, R. et al., Advanced scanning probe lithography, Nat. Nanotechnol. 9, 577 (2014).
[0099]
[0002] Fan, P. et al., Scanning Probe Li thography: State-of-the-Art and Future Perspectives, Micromachines 13, 228 (2022).
[0100]
[0003] Franz, M. et al., Controlled growth of ordered monolayers of N-he terocyclic carbenes on silicon, Nat. Chem. 13, 828 (2021).
Claims
TUB126EP 19 Patent claims 1. Method for the localized application of molecules (M) onto a support (20), wherein Under vacuum conditions, a two-dimensional monolayer gas layer (MGS) containing the molecules (M) is formed on the support (20), in which the molecules (M) belonging to the two-dimensional monolayer gas layer (MGS) can move parallel to the surface (21) of the support (20), and by applying an electrical voltage (U) between the support (20) and a needle tip (12) directly above the support (20) and interacting with the two-dimensional monolayer gas layer (MGS) those near the needle tip (12) The molecules (M) located in the two-dimensional monolayer gas layer (MGS) on the support (20) can be specifically and permanently localized.
2. Method according to claim 1, characterized by the fact that A pattern writing process is carried out in which a pattern with localized molecules (M) is written on the support (20), where the polarity of the voltage (U) between support (20) and needle tip (12) is inverted during the pattern writing process.
3. Method according to one of the preceding claims, characterized in that a pattern writing process is carried out in which a pattern with at least two writing sections separated from each other by a separating section containing localized molecules is written by placing the needle tip (12) in the writing sections with a first voltage polarity across the carrier and in the separation zone between the TUB126EP 20 Writing sections the needlepoint (12) a second voltage polarity is applied across the carrier.
4. Method according to one of the preceding claims, characterized in that two or more pattern writing processes are carried out, wherein in a first pattern writing process a first molecular monolayer pattern with at least one writing section is written with a first molecule type, and in a second or subsequent pattern writing process a second or subsequent molecular monolayer pattern with at least one writing section is written with a second molecule type or further molecule types, wherein the writing section(s) of the first molecular monolayer pattern are non-overlapping with the writing section(s) of the further molecular monolayer patterns.
5. Method according to one of the preceding claims, characterized in that the voltage (U) between carrier (20) and needle tip (12) In the first voltage polarity, a positive voltage (U) is applied, at which the electrical potential at the carrier (20) is higher than the electrical potential at the needle tip (12) is, and in the case of the second voltage polarity a negative voltage (U) at which the electric potential at the carrier (20) is smaller than the electric potential at the needle tip (12) is.
6. Method according to one of the preceding claims, characterized in that the voltage (U) between carrier (20) and needle tip (12) The voltage during the writing of the writing sections is between 2 and 5 volts. TUB126EP 7. Method according to one of the preceding claims, characterized in that the molecules (M) couple with the support (20) to form the two-dimensional monolayer gas layer (MGS) and the two-dimensional monolayer gas layer (MGS) is held on the surface (21) of the support (20) by a holding force caused by the coupled molecules (M), wherein each of the molecules (M) belonging to the two-dimensional monolayer gas layer (MGS) is at any given time forcefully coupled to at least one support atom on the surface (21) of the support (20).
8. Method according to one of the preceding claims, characterized in that the molecules (M) have a ring structure, all mobile molecules (M) belonging to the two-dimensional monolayer gas layer (MGS) are oriented such that the ring surface of their ring structure lies parallel to the surface (21) of the support (20) and the plane of motion of the monolayer gas layer (MGS), and by applying the electrical voltage (U) between the carrier (20) and the needle tip (12) the ring structure in the area of the needle tip (12) the molecules (M) located in the plane of the monolayer gas layer (MGS) are rotated out and thereby immobilized and fixed on the support (20).
9. Method according to one of the preceding claims, characterized in that the molecules (M) are provided by heating a base material (BM) containing the molecules (M), wherein the heating of the base material (BM) takes place in an effusion chamber TUB126EP 22 (17) during a first temporal process phase and is terminated upon completion of the first process phase, wherein during this first process phase a three-dimensional gas atmosphere containing the vaporized molecules (M) is generated in the effusion space (17), from which all or at least some of the molecules (M) of the gas atmosphere are deposited on the support (20) forming the monolayer gas layer (MGS), After completion of the first process phase, the carrier (20) together with the monolayer gas layer (MGS) located on it is transferred in a subsequent second process phase from the effusion chamber (17) into an adjacent process chamber (16) also under vacuum conditions, in which the needle tip (12) is located, is transferred and the local fixation of the molecules (M) of the monolayer gas layer (MGS) is carried out in the adjacent process chamber (16), and in the second process phase by applying the electrical voltage (U) between the carrier (20) and the needle tip (12) in the adjacent process room (16) near the needle tip (12) The molecules (M) located in the two-dimensional monolayer gas layer (MGS) on the support (20) are permanently localized.
10. Method according to any one of the preceding claims 1 to 8, characterized by the fact that the local fixation of the molecules (M) of the monolayer gas layer (MGS) is carried out in the same process chamber (16) in which the molecules (M) in the form of the monolayer gas layer (MGS) were deposited on the support (20), wherein a three-dimensional gas atmosphere containing the vaporized molecules (M) is generated in the process chamber (16) during the heating of the base material (BM), from which TUB126EP 23 all or at least some of the molecules (M) of the gas atmosphere are deposited on the support (20) to form the monolayer gas layer (MGS), and wherein already during heating or after heating by applying the electrical voltage (U) between the carrier (20) and the needle tip (12) those near the needle tip (12) The molecules (M) located in the two-dimensional monolayer gas layer (MGS) on the support (20) are permanently localized.
11. Method according to one of the preceding claims, characterized in that the needle tip (12) interacting with the two-dimensional monolayer gas layer (MGS) is a component of a scanning tunneling microscope.
12. Method according to one of the preceding claims, characterized in that the molecules (M) are N-heterocyclic carbene molecules.
13. Arrangement for depositing molecules (M) onto a support (20), with an effusion cell (11) for heating a base material (BM) containing the molecules (M) under vacuum conditions and forming a two-dimensional monolayer gas layer (MGS) containing the molecules (M) on the support (20), in which the molecules (M) belonging to the two-dimensional monolayer gas layer (MGS) can move parallel to the surface (21) of the support (20), a needle tip (12) located directly above the support (20) and interacting with the two-dimensional monolayer gas layer (MGS) , TUB126EP 24 a voltage source (14) for applying an electrical voltage (U) between the carrier (20) and the needle tip (12), a needle adjustment device (13) and a control device (15) designed to control a pattern writing process by controlling the needle adjustment device (13) and the voltage source (14) and by locally generating a writing voltage that is used to selectively and permanently locate the pattern near the needle tip (12) molecules (M) located in the two-dimensional monolayer gas layer (MGS) on the support (20).
14. Arrangement according to claim 13, characterized by the fact that the effusion cell (11) and the needle tip (12) are arranged within the same process chamber (16) of a scanning tunneling microscope or atomic force microscope or the effusion cell (11) is arranged in an effusion chamber (17) next to a process chamber (16) of a scanning tunneling or atomic force microscope, wherein the support (20) coated with the two-dimensional monolayer gas layer (MGS) is transferred under vacuum conditions from the effusion chamber (17) into the needle tip (12) can be transferred to the trial chamber containing (16).