Glass and method for producing glass

Abstract

The present invention appropriately uses glass as a substrate. The glass has a root mean square gradient Sdq of at least one surface is less than 0.076, and the plate thickness deviation (TTV) thereof is no more than 10 μm.

Claims

1. Glass in which the root mean square gradient Sdq of at least one surface is less than 0.076 and the plate thickness deviation (TTV) is 10 μm or less.

2. The glass according to claim 1, wherein the developed interface area ratio Sdr of at least one of the surfaces is 0.352 or less.

3. The glass according to claim 1, wherein the five-point average depth S5v of at least one of the surfaces is 1.424 or less.

4. SiO ２ The glass according to claim 1, comprising 45 mol% or more and 75 mol% or less of the above.

5. A method for manufacturing glass, comprising the steps of polishing at least one surface of glass and etching the at least one surface with an etching solution, wherein the etching solution comprises hydrofluoric acid and an inorganic acid, and the water content of the etching solution is less than 68% by mass.

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