Chemical vapor deposition apparatus
The feedthrough protection member with a heat-blocking outer housing and purge gas supply unit addresses the issue of heat-induced damage in chemical vapor deposition apparatuses, maintaining reliability and integrity of components during high-temperature SiC film deposition.
WO2026146920A1PCT designated stage Publication Date: 2026-07-09TES CO LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- TES CO LTD
- Filing Date
- 2025-12-04
- Publication Date
- 2026-07-09
Smart Images
Figure KR2025020689_09072026_PF_FP_ABST
Abstract
The present invention relates to a chemical vapor deposition apparatus and, more specifically, to a chemical vapor deposition apparatus capable of preventing damage to a feedthrough connected to a heater.
Need to check novelty before this filing date? Find Prior Art