The invention discloses an
acne-removing scar-lightening
mask solution which is prepared from the following components in percentage by weight: 0.01-1% of high-molecular
humectant, 0.01-0.2% of
disodium edetate, 0.01-0.5% of thickener, 5-25% of
witch hazel extract, 0.01-2.0% of conditioner, 0.01-5% of desensitizer, 1-10% of low-molecular
humectant, 1-8% of
plant acne-removing agent, 0.1-0.5% of
preservative, 0.01-0.5% of
mung bean extract, 0.01-5% of
epidermal growth factor and the balance of deionized water. The manufacturing method of the
acne-removing scar-lightening
mask solution is simple. Under the synergistic actions of the
plant acne-removing agent and
mung bean extract in combination with the
epidermal growth factor and
witch hazel extract, the
mask solution has the quick effects of acne removal,
itching relief and sterilization, and can restore the damaged
skin and lighten the acne marks and
scars while removing the acnes, thereby improving the
skin from inside to outside and restoring the smooth, delicate and healthy
skin.