The invention discloses an 
acne-removing scar-lightening 
mask solution which is prepared from the following components in percentage by weight: 0.01-1% of high-molecular 
humectant, 0.01-0.2% of 
disodium edetate, 0.01-0.5% of thickener, 5-25% of 
witch hazel extract, 0.01-2.0% of conditioner, 0.01-5% of desensitizer, 1-10% of low-molecular 
humectant, 1-8% of 
plant acne-removing agent, 0.1-0.5% of 
preservative, 0.01-0.5% of 
mung bean extract, 0.01-5% of 
epidermal growth factor and the balance of deionized water. The manufacturing method of the 
acne-removing scar-lightening 
mask solution is simple. Under the synergistic actions of the 
plant acne-removing agent and 
mung bean extract in combination with the 
epidermal growth factor and 
witch hazel extract, the 
mask solution has the quick effects of acne removal, 
itching relief and sterilization, and can restore the damaged 
skin and lighten the acne marks and 
scars while removing the acnes, thereby improving the 
skin from inside to outside and restoring the smooth, delicate and healthy 
skin.