The invention relates to a high power microwave plasma diamond film deposition device, which belongs to the technical field of chemical gas-phase deposition of the diamond film, and comprises an upper cylindrical body of a microwave cavity, a lower cylindrical body of the microwave cavity, a diamond film deposition platform, a microwave reflection body, a quartz window, a plasma, an adjusting mechanism A and an adjusting mechanism B. The diamond film deposition platform and the microwave reflection body are arranged inside the upper and the lower cylindrical bodies, and the quartz window is arranged below the diamond film deposition platform; and the height of the microwave reflection body is adjusted through the adjusting mechanism A, the height of the upper cylindrical body is adjusted by the adjusting mechanism B, and the microwave reflection body reflects and strengthens the microwave electric field. The upper cylindrical body, the lower cylindrical body, the diamond film deposition platform, the microwave reflection body, the adjusting mechanism A and the adjusting mechanism B can realize the direct water cooling. Under the high power, the diamond film of high quality is deposited at a high speed, and the device has the advantages of reliability, convenient adjustment and the like.