The present invention provides an
organic film-forming composition, a pattern-forming method, and an
organic film-forming compound and
polymer. The solution provided by the present invention is an
organic film-forming composition characterized by containing an organic film-forming material represented by the following general formula and an
organic solvent. In the general formula, R1 is a
hydrogen atom, an allyl group, or a
propargyl group; R2 is a nitro group, a
halogen atom, a hydroxyl group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic
alkyl group having 1 to 6 carbon atoms, a
trifluoromethyl group, or a trifluoromethyloxy group; m = 0, 1, n = 1, 2, l = 0, 1, k is an integer from 0 to 2, W is a
divalent organic group having 1 to 40 carbon atoms; and V each independently represents a
hydrogen atom or a linking
moiety.