The invention discloses a chlorella silk mask for eliminating the turbid, beautifying skin and repairing radiation damage. The mask is manufactured by soaking non-woven fabric in mask essence. The mask essence comprises, by weight, 50-80 parts of water, 2-10 parts of 1,3-butanediol, 5-10 parts of chlorella extracts, 5-10 parts of rose extracts, 1-5 parts of betaine, 1-5 parts of 1,2-propylene glycol, 0.5-2 parts of acetyl hexapeptide-1, 0.25-0.5 part of xanthan gum, 0.2-1 part of acetyl tetrapeptide-2, 0.3-0.5 part of sodium hyaluronate, 0.8-1.5 parts of serine, 0.8-1.5 parts of citrulline, 0.5-1 part of nicotinamide, 0.5-1 part of methylisothiazolinone, 0.1-0.5 part of PEG-40 hydrogenated castor oil and 0.005-0.01 part of essence. The mask can deeply purify pores, clean away abundant grease, and promote water and grease balance of the skin, enables the skin cool, comfortable and vigorous and meanwhile has an anti-radiation function.