Semiconductor centrifugal cleaning machine
By introducing centrifugal control system and ultrasonic technology into semiconductor workpiece cleaning equipment, combining cleaning nozzles and drying air knifes, the problems of insufficient compactness of existing equipment and poor cleaning effect are solved, achieving a more efficient and stable cleaning effect.
Patent Information
- Application Number
- CN202011021850.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-09-25
- Publication Date
- 2025-02-25
- Estimated Expiration
- 2040-09-25
AI Technical Summary
The existing semiconductor workpiece cleaning equipment has insufficient structural compactness, large space, and poor cleaning effect. Especially, the attachments in the blind holes cannot be completely cleaned, which reduces the cleaning performance.
A semiconductor centrifugal rotary cleaning machine is designed, and a centrifugal control system is used to combine cleaning nozzles, drying air knifes and ultrasonic transducers to realize ultrasonic centrifugal cleaning, ultrasonic centrifugal rinsing and air-cut drying, improving the cleaning effect and structural compactness.
Through the forward and reverse rotation driving of the centrifugal control system, combined with the synergistic effect of ultrasonic waves and drying air knife, a more efficient cleaning effect is achieved, avoiding the accumulation of substances in the blind holes, improving cleaning quality and stability, and reducing land occupation space.
Smart Images

Figure CN112103217B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of semiconductor workpiece cleaning, in particular to a semiconductor centrifugal rotating cleaning machine. Background Art
[0002] The cleaning operation of parts in semiconductor production usually consists of multiple processes arranged in sequence, so as to ensure the cleaning effect and processing quality, and provide guarantee for the subsequent device configuration effect. Therefore, the cleaning device used for the workpiece is usually a multi-station set up in parallel to ensure the orderly progress of the cleaning operation. Usually, the station is surrounded by a metal shell, and one side of the shell along the station setting direction is used as the operating position for the staff to stand and work, so as to ensure the staff to check the stability of the cleaning process and assist in the operation, while the other side is used as the installation side of the external device, so that the external devices of the device and the two sides of the staff are separated. However, the assembly method of the equipment increases the application space requirements of the device, and the entire assembly line requires multiple staff to check at the same time to ensure the stable real-time monitoring of each process, which increases the application cost. During the application process, the workpiece to be cleaned passes through the cleaning station in sequence under the transportation of the conveyor, and its relative position with the conveyor is unchanged. Only the impact of the structural components in the cleaning device on the workpiece is used to clean, dry and other operations, resulting in poor cleaning effect, and the attachments in the blind hole cannot be thoroughly cleaned, which reduces its cleaning performance. Summary of the invention
[0003] The technical problem solved by the present invention is to provide a semiconductor centrifugal rotating cleaning machine with improved structural compactness and cleaning application effect.
[0004] The technical solution adopted by the present invention to solve the technical problem is:
[0005] A semiconductor centrifugal rotary cleaning machine comprises a main machine, a loading and unloading system and a tooling basket for placing workpieces, wherein the main machine comprises a comprehensive working chamber, a cleaning water tank and a rinsing water tank, wherein the comprehensive working chamber is provided with a cleaning chamber and a centrifugal control system for realizing workpiece cleaning operations, and the loading and unloading system is used to realize the conveying operation of the workpieces;
[0006] The tooling basket is provided with a limited position hole along the axis, and a plurality of workpiece placement positions are arranged circumferentially, and the workpiece placement positions are used to load and lock the workpiece;
[0007] The cleaning chamber is provided with a working entrance for a tooling basket to enter, an openable transverse sealing door is provided at the working entrance, a bearing position for placing the tooling basket is provided in the middle of the cleaning chamber, and a plurality of cleaning nozzles and drying air knives are provided on the inner wall facing the bearing position, a drainage outlet is provided at the bottom of the cleaning chamber, a plurality of ultrasonic transducers are installed in the cleaning chamber, and the ultrasonic transducers are connected to an ultrasonic generator, the bearing position is a supporting truncated table connected to a centrifugal control system, the supporting truncated table is provided with a transmission shaft with one end matching the limiting hole along the axis, the other end of the transmission shaft is connected to the centrifugal control system, and the centrifugal control system is used to realize the rotational drive of the tooling basket placed on the supporting truncated table.
[0008] Furthermore, the loading and unloading system includes a conveying system and a transverse movement assembly, the conveying system is used to convey the tooling basket to the corresponding position of the integrated working chamber, and form a loading platform, an operating platform and an unloading platform along the conveying direction, the transverse movement assembly is used to realize the reciprocating picking operation of the tooling basket on the operating platform and the carrying position, the working entrance is opened above the cleaning chamber, the transverse movement assembly includes a transverse drive assembly, a lifting drive assembly and a picking clamp, the transverse drive assembly is erected above the cleaning chamber and the operating platform, the lifting drive assembly is installed on the transverse drive assembly and realizes reciprocating transverse movement along its axis, and the picking clamp is arranged at the driving end of the lifting drive assembly.
[0009] Furthermore, induction stoppers are respectively arranged on both sides of the operating table.
[0010] Furthermore, the transversely movable sealing door is parallel to the transverse driving assembly, and an electromagnetic safety lock is arranged between the transversely movable sealing door and the cleaning chamber.
[0011] Furthermore, the integrated working chamber is equipped with a plurality of waterproof lighting lamps.
[0012] Furthermore, the rinsing water tank and / or the cleaning water tank is provided with an online data monitoring system.
[0013] Furthermore, a steam condenser is arranged on the top of the main unit of the equipment, and the steam condenser includes a collection inlet and a collection outlet connected to the cleaning chamber, and the collection outlet is connected to the cleaning water storage tank or the rinsing water storage tank.
[0014] Furthermore, the drain port is arranged at one side of the bottom of the cleaning chamber, and the bottom of the cleaning chamber is inclined toward the drain port.
[0015] Furthermore, the drain outlet is connected to a wastewater circulation system, which includes a wastewater temporary storage and pretreatment tank, a hydrogen peroxide tank, an electrocatalytic reaction tank, an electroflocculation reaction tank and an ultrafiltration reverse osmosis device. The drain outlet is connected to the water inlet of the wastewater temporary storage and pretreatment tank, and the water outlets of the wastewater temporary storage and pretreatment tank and the hydrogen peroxide tank are connected to the water inlet of the electrocatalytic reaction tank. The electrocatalytic reaction tank, the electroflocculation reaction tank and the ultrafiltration reverse osmosis device are connected in sequence and are connected to a cleaning water storage tank / or a rinsing water storage tank.
[0016] The beneficial effects of the present invention are:
[0017] The device realizes forward and reverse rotation drive of the workpiece placed on the rotating round table through a centrifugal control system, and cooperates with a cleaning nozzle, a drying air knife and an ultrasonic transducer to realize ultrasonic centrifugal cleaning, ultrasonic centrifugal rinsing and wind cutting drying in one, thereby realizing compact assembly of the structure, reducing the occupied space and improving the scope of application; the centrifugal cleaning operation prevents the accumulation of materials in the blind hole, reduces and avoids the appearance of cleaning dead corners, ensures the cleaning quality and cleaning stability of the workpiece, and makes it more suitable for cleaning of attachments such as automotive parts, hydraulic parts, mechanical hardware parts, aviation, national defense weapons, clocks, bearings, precision parts, compressor accessories, rubber parts, etc. with blind holes; the device can be fully automatically connected and assembled with the system, and the technicians can adjust the cleaning process flow according to the needs, ensuring the use environment of the cleaning operation, realizing one-button start, and ensuring the ease of operation and flexibility of regulation; the structure and functional layout of the equipment have achieved greater structural innovation and improvement of cleaning quality in the semiconductor cleaning field, so that the semiconductor lead frame can also meet the high-quality cleaning needs, greatly promoting the cleaning quality and processing stability of semiconductor workpieces. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a connection diagram of the semiconductor centrifugal spinning cleaning machine of the present invention;
[0019] Figure 2 A top view of the connection structure between the device host and the transmission system in the present invention;
[0020] Figure 3 It is a top view of the structure of the tooling basket in the present invention;
[0021] Figure 4 It is a left view of the connection structure between the main device and the transmission system of the present invention;
[0022] Figure 5 It is a structural schematic diagram of the transverse movement assembly in the present invention;
[0023] Figure 6 It is a schematic diagram of the working positions of the cleaning chamber, the centrifugal rotating motor and the tooling basket in the present invention;
[0024] Figure 7 It is a front view of the integrated working chamber and the electric control cabinet of the present invention;
[0025] The markings in the figure are: 1. Conveying system; 11. Inductive stopper; 2. Tool basket; 21. Workpiece; 22. Circular bottom plate; 23. Limiting hole; 3. Integrated working chamber; 31. Cleaning chamber; 311. Transverse sealing door; 312. Installation storage position; 32. Transmission shaft; 321. Centrifugal rotating motor; 322. Supporting round table; 33. Cleaning nozzle; 34. Ultrasonic transducer; 35. Steam condenser; 36. Drain outlet; 4. Transverse movement assembly; 41. Transverse drive assembly; 42. Lifting drive assembly; 43. Three-touch manipulator; 5. Electric control cabinet; 51. Touch screen panel; 52. Control button; 6. Cleaning water tank; 7. Rinse water tank; 8. Electrolyzer; 9. Three-color light. DETAILED DESCRIPTION
[0026] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments.
[0027] The structure of the semiconductor centrifugal cleaning machine is as follows Figure 1 As shown, it includes a main machine, a loading and unloading system, a tool basket 2 and a wastewater circulation system. The workpiece 21 to be cleaned is placed on the tool basket 2 for easy transportation and cleaning positioning. Figure 3As shown, the bottom of the tool basket 2 is a circular bottom plate 22 with a limiting hole 23 along the axis, and the workpiece placement position for installing the workpiece 21 is circumferentially arranged around the limiting hole 23 to ensure the symmetry of the center of gravity and the stability of operation. When the workpiece 21 is placed in the workpiece placement position, the locking member is further used to lock the limit, and the specific clamping and locking method can be determined according to the shape of the customer's parts. The structural configuration of the tool basket 2 can meet the needs of workpieces of different structures, and at the same time avoid damage to the quality of semiconductor workpieces during the cleaning process, ensure the production quality of the workpiece, and make its semiconductor lead frame also clean, expanding the scope of application. The main machine of the above-mentioned equipment includes a comprehensive working chamber 3, a cleaning water storage tank 6 and a rinsing water storage tank 7. In order to ensure the water quality in the tank, the rinsing water storage tank 7 and / or the cleaning water storage tank 6 are provided with a number of electrolyzers, and an online data monitoring system is formed through the electrical component architecture, which can intuitively display the current water quality and remind customers to replace water and consumables in time, thereby ensuring the water quality and the cleaning effect. The online data monitoring system can be constructed according to the on-site application environment and the required parameter monitoring. And the integrated working chamber 3 is built with a cleaning chamber and a centrifugal control system for realizing the cleaning operation of the workpiece 21. The cleaning chamber 31 is provided with a working entrance for the tooling basket 2 to enter, and a transverse sealing door 311 is provided at the working entrance to prevent the splashing of liquid or stains during the cleaning operation and ensure the application quality. A bearing position for carrying the tooling basket 2 is correspondingly provided in the cleaning chamber 31, and the loading and unloading system moves the tooling basket 2 in and out of the working entrance. The bearing position is arranged in the middle of the cleaning chamber 31, and a plurality of cleaning nozzles 33 and drying air knives are arranged on the inner wall of the cleaning chamber 31 toward the bearing position. The cleaning nozzles 33 are connected to the cleaning water storage tank 6 and the rinsing water storage tank 7 through pipes, and their pipeline passages can be regulated according to the cleaning requirements to ensure the steady progress of the cleaning and rinsing operations. The bearing position is a support truncated table 322 connected to the centrifugal control system. During the application process, the tool basket 2 carrying the workpiece 21 is placed on the support truncated table 322 through the working entrance, and the support truncated table 322 is provided with a transmission shaft 32 along the axis, and one end of the transmission shaft 32 is sleeved and installed in the limiting hole 23, so as to realize the installation and fixation of the tool basket 2. The shaft end of the centrifugal rotating motor 321 in the centrifugal control system is connected to the end of the transmission shaft 32 through a coupling, and then the centrifugal control system is used to realize the synchronous rotation drive of the tool basket 2. A steam condenser 35 is provided on the top of the main machine of the equipment. The steam condenser 35 adopts patented air-cooled condensation technology. Its collection inlet is connected to the collection inlet of the cleaning chamber 31, and the water vapor generated by the equipment can be collected and condensed, and then returned to the cleaning tank by the collection outlet. The steam condenser 35 can select the connection groove of the collection outlet according to actual needs. The cleaning chamber 31 can be surrounded and formed by seamless welding, and a drain outlet 36 is provided.In order to ensure the drainage quality, the bottom of the cleaning chamber 31 is tilted toward one side, and the drain port 36 is set at the lowest position of the bottom, so as to ensure that the water is guided to the drain port 36 along the bottom surface to avoid liquid accumulation. The drain port 36 is connected to the wastewater circulation system, which includes a wastewater temporary storage and pretreatment tank, a hydrogen peroxide tank, an electrocatalytic reaction tank, an electroflocculation reaction tank and an ultrafiltration reverse osmosis device. The drain port 36 is connected to the water inlet of the wastewater temporary storage and pretreatment tank, and the water outlets of the wastewater temporary storage and pretreatment tank and the hydrogen peroxide tank are connected to the water inlet of the electrocatalytic reaction tank, so that an electrocatalytic reaction is carried out in the tank. The electrocatalytic reaction tank, the electroflocculation reaction tank and the ultrafiltration reverse osmosis device are connected in sequence, so as to realize the purification and filtration reaction in sequence, and are connected to the cleaning water storage tank 6 / or the rinsing water storage tank 7, so as to realize the recycling of deionized water. The circulating water can select the connected water storage tank according to the actual application situation. The cleaning chamber 31 is provided with a plurality of waterproof lighting lamps, and a tempered glass observation window is arranged on one side. The integrated working chamber 3 is provided with a corresponding window, so that the working state inside the cleaning chamber 31 can be seen at a glance, thereby ensuring working visibility.
[0028] like Figure 2 and Figure 4As shown, the cleaning water tank 6 and the rinsing water tank 7 are arranged on one side of the cleaning chamber 31, and the conveying system of the loading and unloading system is arranged on the other side of the cleaning chamber 31, and the working entrance is opened above the cleaning chamber 31. The conveying system is composed of a material stand, a chain, a speed regulating motor and an induction switch. The speed regulating motor transmits the tool basket 2 to the corresponding position of the integrated working chamber 3 through the chain, and forms a loading platform, an operating platform and an unloading platform along the conveying direction. The induction switch can sense the tool basket 2 on the conveying device to realize automatic loading and unloading operations. When the induction switch is started, if the induction switch does not respond after the set time, a fault is prompted, and a protection program can also be set to prevent the tool basket 2 from colliding. The two sides of the above-mentioned operating table can be respectively installed with induction blocks 11, so as to limit the tool basket 2. On the one hand, it can prevent the feeding from affecting the discharging direction, and on the other hand, it also ensures the steady progress of the cleaning operation and avoids the occurrence of missed washing or repeated cleaning. The lateral movement component 4 in the loading and unloading system is used to realize the reciprocating picking operation of the tooling basket between the operating table and the load-bearing position, and includes a lateral drive component 41, a lifting drive component 42 and a picking clamp. The lateral drive component 41 is mounted above the cleaning chamber 31 and the operating table, and is used to drive the lifting drive component 42 to realize reciprocating displacement. The lifting drive component 42 is fixedly mounted on the driving member of the lateral drive component 41 and realizes reciprocating lateral movement along its axis, and the picking clamp is arranged at the driving end of the lifting drive component 42, thereby realizing synchronous displacement, and when performing clamping and placing operations, vertical displacement can be realized by the lifting drive component 42. The picking clamp in this embodiment is a three-touch manipulator 43. During the clamping process, the three-touch manipulator 43 can be used to clamp the rod forming the limit hole 23 in the tooling basket 2, or it can be clamped as a whole. The staff can select the model of the picking clamp according to needs. The transverse sealing door 311 is parallel to the transverse driving assembly 41, and realizes the reciprocating transverse movement operation above the cleaning chamber 31 and the water storage tank. When in the working state, the transverse sealing door 311 and the cleaning chamber 31 are structurally locked by an electromagnetic safety lock.
[0029] The electric control cabinet 5 is installed on the side or back of the single-chamber cleaning machine, and the touch screen panel 51 and the control button 52 are usually set on the right side of the front of the equipment, which is convenient for daily operation or placed according to customer needs. The staff can debug the equipment and set the "process program" of the work through the touch screen panel 51, so as to realize the single-step start and stop operation of each main working system and the setting of the time and the upper and lower limit values of some sensors. The process program interface displayed in the touch screen panel 51 can display the working time setting value of each key step of the current program and some real-time collected parameters during the operation, such as the temperature of the liquid storage tank, the centrifugal rotation time, the ultrasonic cleaning time, the rinsing time, the wind cutting drying time, etc. The process program can be set at two levels of operation level through different password settings, that is, it is divided into "operator" and "administrator", and the administrator can modify the program setting parameters, and the operator can start and stop with one key according to the program set by the administrator to ensure the quality of work. In addition, the touch screen panel 51 can also manually control the start and stop of different motion and heating components, and set some system internal parameters. The control mode of the system can also be divided into automatic mode and manual mode. The implementation methods of the two modes can be set according to customer needs to meet different usage environments. The above-mentioned control button 52 may include a control state selection button, a reset button and an emergency stop button. In order to improve the alarm quality of the device, a three-color warning light 9 is installed on the top of the main unit of the device, which includes yellow, red and green. The three-color warning light 9 is installed close to the front of the side where the staff stands to operate, so as to facilitate viewing. The meaning of its color marking can be set by the customer, such as operation, alarm, shutdown and other states. In order to improve the structural quality of the three-color warning light 9, it is made of heat-resistant polycarbonate PC raw material, thereby improving the heat resistance, high temperature, waterproof, dustproof and other properties, making it not easy to deform and bright in color, further ensuring the warning performance.
[0030] During the application process, the working process of the equipment can be divided into five stages: centrifugal cleaning, ultrasonic cleaning, centrifugal rinsing, ultrasonic rinsing, and centrifugal drying. When the tool basket 2 containing the workpiece 21 is placed on the loading platform, it is moved to the operating table under the action of the conveying system 1. At this time, the transverse movement component 4 clamps the tool basket 2 at this place to the bearing position, the transverse movement sealing door 311 is closed, and the above-mentioned cleaning procedure is started. During the centrifugal cleaning and centrifugal rinsing process, the centrifugal rotating motor 321 drives the tool basket 2 to perform 360° forward and reverse movement, and the cleaning nozzle 33 performs centrifugal cleaning or rinsing operations on the workpiece 21 thereon. The specific number of nozzles and nozzle models can be set according to actual needs, and the waste liquid is used to flow into the waste liquid circulation system from the drain port 36. The liquid in the cleaning water storage tank 6 and the rinsing water storage tank 7 is transferred to the cleaning nozzle 33 by a centrifugal pump, and a liquid level sensor is provided in the water storage tank. When liquid needs to be replenished, it can be automatically replenished, and when it is lower than the specified position, the system can send an alarm signal. To ensure the quality of cleaning, a filter assembly can be installed at the connecting pipe of the centrifugal pump. The centrifugal pump will filter the cleaning liquid before delivering it to the cleaning chamber 31 each time, and the filter element needs to be cleaned and replaced regularly. The filter element can use a 5μm multi-stage filter element. During ultrasonic cleaning and ultrasonic rinsing, the drain port 36 can be closed, so that the tooling basket 2 in the cleaning chamber 31 can be soaked with a cleaning agent or deionized water, and then ultrasonic cleaning operations are performed on it using an ultrasonic transducer 34. When centrifugal drying is performed, the tooling basket 2 performs forward and reverse motions, and the drying air knife performs hot air drying operations on it to thoroughly dry the workpiece 21, and its upper temperature limit can be set according to actual conditions. The compressed air is ejected through an independent nozzle to facilitate cooling and air circulation. In addition to the above-mentioned setting method, the process procedure may include ultrasonic immersion cleaning, centrifugal rotation cleaning, ultrasonic immersion rinsing, centrifugal rotation rinsing, and air knife centrifugal drying. The liquid in the above-mentioned cleaning water storage tank 6 is a specific cleaning agent, and the liquid in the rinsing water storage tank 7 is deionized water. The wastewater circulation system can realize the circulation of deionized water, and its outlet is connected to the rinsing water storage tank 7. After the above-mentioned process procedure is completed, the transverse movement component 4 clamps it back to the bearing position, so that it moves to the unloading platform under the action of the conveying system 1, and then flows into the next process. The flow-through parts in the above-mentioned equipment can all be made of stainless steel 304, the internal materials are all mirror panels, the pipelines are all sanitary-grade pipelines, the welding process adopts seamless welding, single-sided welding and double-sided molding, to ensure that the tank body and the inside of the pipeline are clean, without discoloration and residue, which further ensures the cleaning effect of the equipment.
[0031] The specific embodiments described above further illustrate the objectives, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above description is only a specific embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. Semiconductor centrifugal cleaning machine, characterized in that: The invention comprises an equipment main body, a loading and unloading system and a tooling basket (2) for placing a workpiece (21), wherein the equipment main body comprises an integrated working chamber (3), a cleaning water storage tank (6) and a rinsing water storage tank (7), wherein the integrated working chamber (3) is provided with a cleaning chamber for implementing a cleaning operation of the workpiece (21) and a centrifugal control system, and the loading and unloading system is used to implement a conveying operation of the workpiece (21); The tooling basket (2) is provided with a limiting hole (23) along the axis, and is circumferentially provided with a plurality of workpiece placement positions, wherein the workpiece placement positions are used for bearing and locking the workpiece (21); The cleaning chamber (31) is provided with a working entrance for the tool basket (2) to enter, and an openable transverse sealing door (311) is provided at the working entrance. A bearing position for placing the tool basket (2) is provided in the middle of the cleaning chamber (31), and a plurality of cleaning nozzles (33) and a drying air knife are provided on the inner wall facing the bearing position. A drainage port (36) is provided at the bottom of the cleaning chamber (31). The cleaning chamber (31) is equipped with a plurality of ultrasonic transducers (34), and the ultrasonic transducers (34) are connected to an ultrasonic generator. The bearing position is a supporting truncated table (322) connected to a centrifugal control system, and the supporting truncated table (322) is provided with a transmission shaft (32) along the axis, one end of which matches the limiting hole (23), and the other end of the transmission shaft (32) is connected to the centrifugal control system. The centrifugal control system is used to realize the rotation drive of the tool basket placed on the supporting truncated table (322).
2. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: The loading and unloading system comprises a conveying system (1) and a transverse shifting assembly (4); the conveying system (1) is used to convey the tooling basket (2) to a corresponding position of the integrated working chamber (3), and to form a loading platform, an operating platform and an unloading platform along the conveying direction; the transverse shifting assembly (4) is used to realize the reciprocating picking operation of the tooling basket (2) on the operating platform and the bearing position; the working entrance is opened above the cleaning chamber (31); the transverse shifting assembly (4) comprises a transverse driving assembly (41), a lifting driving assembly (42) and a picking clamp; the transverse driving assembly (41) is mounted above the cleaning chamber (31) and the operating platform; the lifting driving assembly (42) is installed on the transverse driving assembly (41) and realizes reciprocating transverse movement along its axis; and the picking clamp is arranged at the driving end of the lifting driving assembly (42).
3. The semiconductor centrifugal cleaning machine according to claim 2, characterized in that: Inductive stoppers (11) are respectively arranged on both sides of the operating table.
4. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: The transversely movable sealing door (311) is parallel to the transverse driving assembly (41), and an electromagnetic safety lock is provided between the transversely movable sealing door (311) and the cleaning chamber (31).
5. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: The integrated working chamber (3) is provided with a plurality of waterproof lighting lamps.
6. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: The rinsing water storage tank (7) and / or the cleaning water storage tank (6) are provided with an online data monitoring system.
7. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: A steam condenser (35) is arranged on the top of the main unit of the equipment. The steam condenser (35) comprises a collection inlet and a collection outlet connected to the cleaning chamber (31). The collection outlet is connected to a cleaning water storage tank (6) or a rinsing water storage tank (7).
8. The semiconductor centrifugal spin cleaning machine according to claim 1, characterized in that: The drainage port (36) is arranged at one side of the bottom of the cleaning chamber (31), and the bottom of the cleaning chamber (31) is arranged to be inclined toward the drainage port (36).
9. The semiconductor centrifugal spin cleaning machine according to claim 8, characterized in that: The drain outlet (36) is connected to a wastewater circulation system, which includes a wastewater temporary storage and pretreatment tank, a hydrogen peroxide tank, an electrocatalytic reaction tank, an electroflocculation reaction tank, and an ultrafiltration reverse osmosis device. The drain outlet (36) is connected to the water inlet of the wastewater temporary storage and pretreatment tank, and the water outlets of the wastewater temporary storage and pretreatment tank and the hydrogen peroxide tank are connected to the water inlet of the electrocatalytic reaction tank. The electrocatalytic reaction tank, the electroflocculation reaction tank, and the ultrafiltration reverse osmosis device are connected in sequence and are connected to a cleaning water storage tank (6) and / or a rinsing water storage tank (7).
Citation Information
Patent Citations
Semiconductor centrifugal rotary cleaning machine
CN213546270U