PVD equipment conveying system based on double conveying platforms

Abstract

The invention relates to the technical field of wafer processing, in particular to a PVD (Physical Vapor Deposition) equipment conveying system based on double conveying platforms, which comprises a first conveying platform, a second conveying platform, a feeding structure and a conveying structure, a first mechanical gripper is arranged in the first working cavity; the second conveying platform is connected to one side of the first conveying platform, and a second mechanical gripper is arranged in the second working cavity; the conveying structure comprises a rail and a storage part. According to the PVD equipment conveying system based on the double conveying platforms, the storage piece moves in the first working cavity and the second working cavity, so that a first mechanical gripper and a second mechanical gripper can conveniently grab wafers and place the wafers on different workbenches; and the wafers on the storage piece can be processed and manufactured according to different process routes through the movement of the storage piece, so that the wafers can be processed according to the different process routes, the adaptability is high, the production efficiency is improved, and the productivity is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of wafer processing, and in particular to a PVD equipment conveying system based on a double conveying platform. Background Art

[0002] The Chinese patent document with authorization announcement number CN115020308B discloses a wafer transfer device, an equipment platform system and a wafer transfer method thereof, wherein the wafer transfer device, the equipment platform system and the wafer transfer method thereof disclose a conveying robot, a placement rack, an alignment device and an alignment robot; the conveying robot is located between the wafer loading box, the placement rack and the wafer processing equipment, and the conveying robot is used to transport the wafers in the wafer loading box to the placement rack, and to transport the aligned wafers on the placement rack to the wafer processing equipment; the alignment robot is located between the placement rack and the alignment device, and is used to transport the wafers between the placement rack and the alignment device; when the wafer transfer device, the equipment platform system and the wafer transfer method thereof are in use, the wafer transfer device includes an alignment device for positioning the wafer, and the corresponding wafer processing equipment does not need to include an alignment device, thereby simplifying the design of the mechanical transmission system of the wafer processing equipment, improving the wafer transmission efficiency in the wafer processing equipment, and thereby achieving higher overall equipment efficiency.

[0003] At present, the PVD metallization system for semiconductor wafer processing generally adopts the Cluster system (clustered wafer manufacturing equipment system). Each clustered wafer manufacturing equipment system integrates multiple process modules (PM, Process Module) in a vacuum-enclosed environment to process each wafer one by one, and the wafer does not need to break the vacuum to leave the clustered wafer manufacturing equipment system. In the operation of the clustered wafer manufacturing equipment, the wafer processing time and the robot's movement rhythm are quite certain and can be regarded as constant under normal circumstances.

[0004] In current PVD equipment, the transfer platform mainly adopts a single-platform structure. This design is easily affected by transfer delays in large-scale production, resulting in a decrease in the overall working efficiency of the equipment. In addition, when handling multiple tasks, the single-platform transfer system cannot effectively divert and manage the substrates to be processed, further limiting the increase in production capacity. The mainstream dual-platform design is limited to specific process routes and chamber combinations. When product requirements change, the efficiency of the transfer platform will still decrease, thus becoming a production capacity bottleneck. Summary of the invention

[0005] The present invention provides a PVD equipment conveying system based on a double conveying platform, so as to solve the technical problems of low efficiency and reduced production capacity of wafers produced by a single platform mechanism in the prior art.

[0006] In order to solve the above problems, the present invention provides a PVD equipment transmission system based on a dual transmission platform, which adopts the following technical solutions: A PVD equipment conveying system based on a double conveying platform comprises a first conveying platform, a second conveying platform, a loading structure and a conveying structure; the first conveying platform is connected to the loading structure and a plurality of workbenches are arranged in a circumferential direction of the first conveying platform, the first conveying platform comprises a first working chamber, a first mechanical gripper is arranged in the first working chamber for grabbing wafers in the loading structure to a workbench set around the first conveying platform; the second conveying platform is connected to a side of the first conveying platform away from the loading structure and a plurality of workbenches are also arranged in a circumferential direction of the second conveying platform, the second conveying platform comprises a second working chamber, a second mechanical gripper is arranged in the second working chamber for grabbing wafers in the first conveying platform to a workbench set around the second conveying platform; the conveying structure comprises a track arranged between the first conveying platform and the second conveying platform and a storage member slidably assembled on the track, and a plurality of wafers can be placed on the storage member.

[0007] The beneficial effect is: when a PVD equipment conveying system based on a dual conveying platform of the present invention is used, the material storage piece is first stopped on the track near the loading structure, and then the wafers of the loading structure are sequentially grabbed onto the material storage piece by the first mechanical gripper, and then the wafers are placed at different workbenches according to different process routes by the first mechanical gripper, and then the material storage piece is moved to the second working chamber and the wafers are placed at different workbenches according to different process routes by the second mechanical gripper, until all wafers are processed, and then the material storage piece is stopped on the track near the loading structure, and then the wafers of the material storage piece are sequentially grabbed into the loading structure by the first mechanical gripper, and new wafers to be processed are grabbed onto the material storage piece at the same time. A PVD equipment conveying system based on a dual conveying platform of the present invention moves a material storage piece in a first working chamber and a second working chamber, making it convenient for a first mechanical gripper and a second mechanical gripper to grab wafers and place them on different workbenches, and through the movement of the material storage piece, the wafers on the material storage piece can be processed and manufactured according to different process routes, so that the present invention can process wafers of different process routes at the same time, has strong adaptability, improves production efficiency, and increases production capacity; at the same time, the first mechanical gripper can store multiple wafers on the material storage piece, thereby reducing the air exchange between the loading structure and the first working chamber, and maintaining the vacuum state in the first working chamber.

[0008] Furthermore, connecting channels are provided between the first conveying platform and the second conveying platform, and between the first conveying platform and the loading structure. The connecting channels are used to connect the first working chamber and the second working chamber, and to connect the first working chamber and the loading structure.

[0009] Beneficial effect: It is convenient to separate the first working chamber from the second working chamber, avoid mutual influence between the first working chamber and the second working chamber, and ensure processing accuracy.

[0010] Furthermore, the track is an "8"-shaped structure and the track cross-section is an I-shaped structure. The material storage piece includes a material storage part and a sliding part. The sliding part has a T-shaped slide groove and the slide groove is adapted to the upper end of the I-shaped track. A plurality of sliding rods that can move in a direction perpendicular to the extension direction of the slide groove are provided in the slide groove. The sliding rod is rotated toward one end of the track and is equipped with a running wheel whose axis extends in a vertical direction. The running wheel is always in contact with the track to enable the material storage piece to move along the track.

[0011] Beneficial effect: It is convenient to move the material storage piece. At the same time, by moving the sliding rod assembled in the slide groove, when each running wheel runs on the arc part of the track, all the running wheels can also rest on the track at the same time, so that the material storage piece can stably run and stop on the track.

[0012] Furthermore, a plurality of blind holes are provided on the inner wall of the slide groove, the sliding rod is slidably assembled in the blind hole, a spring is connected between the sliding rod and the bottom of the blind hole, and the spring is always in a compressed state.

[0013] Beneficial effects: The structure is simple, and the spring force is used to ensure that the traveling wheel is always pressed tightly on the track.

[0014] Furthermore, each end of the sliding rod is connected to a concave-shaped connecting frame, and a rotating motor is provided at the upper end of the connecting frame. The output shaft of the rotating motor extends vertically downward and is coaxially fixed to the walking wheel.

[0015] Beneficial effects: The structure is simple, and it is convenient to drive the running wheels to rotate. At the same time, they are separately controlled to ensure that the storage parts can move stably when the running wheels are on tracks with different curvatures.

[0016] Furthermore, a convex-shaped support seat is provided on the connecting frame, and the protruding part of the support seat is coaxially arranged in the running wheel to support the running wheel.

[0017] Beneficial effect: Improve the stability of the running wheels when they rotate.

[0018] Furthermore, the material storage portion includes a plurality of material storage layers arranged at intervals along the vertical direction, and each material storage layer is used to place a wafer.

[0019] Furthermore, vacuum isolation pieces are provided at both ends of the connecting channel, and the vacuum isolation pieces are used to seal the connecting channel while maintaining a vacuum state. The vacuum isolation pieces include a frame and a vacuum extractor. The frame is provided with a through hole that penetrates the frame in a horizontal direction, and the lower side wall of the through hole is provided with a sliding groove. An isolation plate that can completely seal and block the through hole is slidably installed in the sliding groove. The vacuum extractor is used to maintain a vacuum state in the connecting channel, and a notch is provided on the track extending into the connecting channel, and the notch is arranged corresponding to the isolation plate.

[0020] Beneficial effects: The structure is simple and easy to operate, and the first working chamber and the second working chamber are ensured to be vacuum chambers, thereby ensuring the processing quality of the wafer.

[0021] Furthermore, the first conveying platform is a tetrahedral structure with two working positions for installing the workbench on each side, and the second conveying platform is an octahedral structure with eight evenly distributed working positions for installing the workbench in the circumferential direction; the first conveying platform and the second conveying platform share two working positions and these two working positions are used to form a connecting channel connecting the first working chamber and the second working chamber; the first conveying platform and the loading structure also share two working positions and these two working positions are used to form a connecting channel connecting the first working chamber and the loading structure.

[0022] Furthermore, the vacuum extractor includes a vacuum pump and an extraction pipe connected to the vacuum pump, and the extraction pipe is communicated with the inner cavity of the connecting channel.

[0023] Beneficial effects: simple structure, easy to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] By reading the following detailed description with reference to the accompanying drawings, the above and other objects, features and advantages of the exemplary embodiments of the present invention will become readily understood. In the accompanying drawings, several embodiments of the present invention are shown in an exemplary and non-limiting manner, and the same or corresponding reference numerals represent the same or corresponding parts, wherein: Figure 1 It is a structural schematic diagram of a PVD equipment conveying system based on a dual conveying platform of the present invention; Figure 2 It is a structural schematic diagram of a vacuum isolation member of a PVD equipment conveying system based on a dual conveying platform of the present invention; Figure 3 A schematic diagram of a conveying structure of a PVD equipment conveying system based on a dual conveying platform of the present invention; Figure 4 It is a structural schematic diagram of a material storage part of a PVD equipment conveying system based on a double conveying platform of the present invention; Figure 5 A vertical cross-sectional view of a material storage component of a PVD equipment conveying system based on a double conveying platform of the present invention; Figure 6 for Figure 5 The enlarged schematic diagram at A in the middle; Figure 7 for Figure 6 The enlarged schematic diagram of point B in the middle; Figure 8 It is a horizontal cross-sectional view of a material storage component of a PVD equipment conveying system based on a dual conveying platform of the present invention.

[0025] Description of reference numerals: 1. First conveying platform; 2. Second conveying platform; 3. Loading structure; 4. Workbench; 5. First mechanical gripper; 6. Second mechanical gripper; 7. Track; 8. Storage piece; 9. Connecting channel; 10. Storage part; 11. Sliding part; 12. Slide groove; 13. Sliding rod; 14. Traveling wheel; 15. Blind hole; 16. Spring; 17. Connecting frame; 18. Rotating motor; 19. Support seat; 20. Storage layer; 21. Frame; 22. Perforation; 23. Slide groove; 24. Isolation plate; 25. Notch. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Those skilled in the art should know that the embodiments described below are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present invention.

[0027] Any number of elements in the drawings is for illustration and not limitation, and any naming is for distinction only and does not have any limiting meaning.

[0028] The principle and spirit of the present invention are explained in detail below with reference to several representative embodiments of the present invention.

[0029] Embodiment 1 of a PVD equipment conveying system based on a dual conveying platform provided by the present invention: like Figures 1 to 8 As shown, a PVD equipment conveying system based on a double conveying platform of the present invention comprises a first conveying platform 1, a second conveying platform 2, a loading structure 3, a conveying structure, a connecting channel 9 and a control system. The length direction of the first conveying platform 1 is defined as the left-right direction.

[0030] The loading structure 3 is used to store wafers to be processed, and wafers to be processed can be added manually or processed wafers can be taken away.

[0031] The first conveying platform 1 is connected to the left end of the loading structure 3 and a plurality of workbenches 4 are arranged in the circumferential direction of the first conveying platform 1. The first conveying platform 1 has a first working chamber, and the first working chamber is respectively connected with each workbench 4 on the circumference of the first conveying platform 1 and the loading structure 3. A first mechanical gripper 5 is arranged in the first working chamber to grab the wafers in the loading structure 3 to the workbench 4 set around the first conveying platform 1. In this embodiment, the first conveying platform 1 is a tetrahedral structure, and two workstations for installing the workbench 4 are arranged around the first conveying platform 1, among which the four workstations on the left and right sides are not provided with the workbench 4, and the workbench 4 on the circumference of the first conveying platform 1 is a cavity with operations such as degassing and pre-cleaning.

[0032] The second conveying platform 2 is connected to the side of the first conveying platform 1 away from the loading structure 3, and a plurality of workbenches 4 are also arranged in the circumferential direction of the second conveying platform 2. The second conveying platform 2 has a second working chamber, and the second working chamber is respectively connected with each workbench 4 on the circumference of the second conveying platform 2 and the first working chamber. A second mechanical gripper 6 is arranged in the second working chamber for grabbing the wafer to the workbench 4 set around the second conveying platform 2. In this embodiment, the second conveying platform 2 is an octahedral structure, and eight evenly distributed workstations for installing workbenches are arranged in the circumferential direction of the second conveying platform 2, and the two workstations on the right side of the second conveying platform 2 are not provided with workbenches 4, and the above-mentioned connecting channel 9 connecting the first working chamber and the second working chamber is formed between the two workstations on the left side of the first conveying platform 1, and the workbenches 4 on the circumference of the second conveying platform 2 are chambers for degassing, pre-cleaning and other operations.

[0033] There are two connecting channels 9, which are respectively arranged between the first conveying platform 1 and the second conveying platform 2, and between the first conveying platform 1 and the loading structure 3. The connecting channels 9 are used to connect the first working chamber and the second working chamber, and connect the first working chamber and the loading structure 3.

[0034] Vacuum isolators are provided at both ends of the connecting channel 9, and the vacuum isolators are used to seal the connecting channel 9 while maintaining a vacuum state. Figure 2 As shown, the vacuum isolator includes two frames 21 spaced apart in the left-right direction and a vacuum extractor disposed between the two frames 21. The frame 21 is provided with a through hole 22 penetrating the frame 21 in the horizontal direction. The lower side wall of the through hole 22 is provided with a sliding groove 23. The bottom of the sliding groove 23 is provided with an isolation cylinder. The telescopic end of the isolation cylinder extends vertically upward and is connected to an isolation plate 24. The isolation plate 24 is used to completely seal and block the through hole 22. The vacuum extractor includes a vacuum pump and an extraction pipe connected to the vacuum pump. The extraction pipe is connected to the inner cavity of the connecting channel 9 so that the connecting channel 9 maintains a vacuum state.

[0035] like Figure 3As shown, the conveying structure includes a track 7 provided between the first working chamber and the second working chamber and a material storage member 8 slidably mounted on the track 7. The track 7 is an "8"-shaped structure and the cross section of the track 7 is an I-shaped structure. Two notches 25 are provided on the portion of the track 7 extending into the connecting passage 9 between the first conveying platform 1 and the second conveying platform 2. The two notches 25 are respectively arranged in one-to-one correspondence with two isolation plates 24 on two frames 21 in the connecting passage 9 between the first conveying platform 1 and the second conveying platform 2, so as to ensure that the isolation plates 24 can seal the connecting passage 9.

[0036] like Figure 4 and Figure 6 As shown, the material storage member 8 includes a material storage portion 10 and a sliding portion 11. The material storage portion 10 includes a plurality of material storage layers 20 arranged at intervals along the vertical direction. Each material storage layer 20 is used to place a wafer, and each material storage layer 20 can allow the corresponding first robotic gripper 5 or second robotic gripper 6 to pass through.

[0037] The track 7 is provided with a plurality of stop points, each of which is provided with a detector for detecting the position of the storage member 8 .

[0038] like Figure 4 , Figure 5 , Figure 6 , Figure 7 and Figure 8 As shown, the sliding part 11 is connected to the bottom of the material storage part 10, and the sliding part 11 has a T-shaped slide groove 12 and the slide groove 12 is adapted to the upper end of the I-shaped track 7. The two inner side walls of the slide groove 12 are provided with a plurality of blind holes 15 arranged at intervals along the extension direction of the slide groove 12. A sliding rod 13 is slidably mounted in each blind hole 15, and a spring 16 is connected between the sliding rod 13 and the bottom of the blind hole 15, and the spring 16 is always in a compressed state. The end of the sliding rod 13 away from the bottom of the blind hole 15 is connected to a concave-shaped connecting frame 17, and a rotating motor 18 is provided at the upper end of the connecting frame 17. The output shaft of the rotating motor 18 extends vertically downward, and the output shaft of the rotating motor 18 is coaxially connected to the walking wheel 14. In this embodiment, the elastic force provided by the spring 16 ensures that the running wheel 14 is always pressed against the side wall of the track 7, thereby ensuring the stability of the material storage piece 8 when it moves. At the same time, since each running wheel 14 is arranged separately, even if the material storage piece 8 moves to the arc section of the track 7, each running wheel 14 can adaptively adjust the compression amount of the spring 16 according to the different curvatures, thereby ensuring that the running wheel 14 is always pressed against the track 7, ultimately ensuring the stability of the material storage piece 8 when it moves.

[0039] In this embodiment, if Figure 7 As shown, in order to ensure the stability of the rotation of the running wheel 14 , a convex-shaped support seat 19 is further provided on the connecting frame 17 , and the protruding portion of the support seat 19 is coaxially arranged in the running wheel 14 to support the running wheel 14 .

[0040] The first mechanical gripper 5 and the second mechanical gripper 6 are both single-pickup and single-release mechanical grippers in the prior art, and their specific structures are not described in detail here.

[0041] The control system is used to control the movement of the material storage member 8 on the track 7 and control the material storage member 8 to stop at various stop points on the track 7 according to the set program and the signal transmitted to the control system by the detector, and when the material storage member 8 stops at the set stop point, the corresponding first mechanical gripper 5 or the second mechanical gripper 6 is controlled to grab the wafer onto the material storage member 8 or grab it from the material storage member 8 to the chamber at the corresponding workbench 4.

[0042] When a PVD equipment conveying system based on a dual conveying platform of the present invention is used, the control system first stops the material storage piece 8 on the track 7 near the loading structure 3, and then first opens the isolation plates 24 on both sides of the connecting channel 9 between the first conveying platform 1 and the loading structure 3. At this time, the wafers of the loading structure 3 are sequentially grabbed onto the material storage piece 8 by the first mechanical gripper 5 and placed on different material storage layers 20. Then, the isolation plates 24 on both sides of the connecting channel 9 between the first conveying platform 1 and the loading structure 3 are closed, and then the wafers are placed on different workbenches 4 on the circumference of the first conveying platform 1 according to different process routes by the first mechanical gripper 5. When the workbenches 4 on the circumference of the first conveying platform 1 are all in working condition, the first conveying platform 1 is opened. The two isolation plates 24 in the connecting channel 9 between the first conveying platform 1 and the second conveying platform 2, at this time, the material storage piece 8 enters the second working chamber along the track 7, and then by closing the two isolation plates 24 in the connecting channel 9 between the first conveying platform 1 and the second conveying platform 2, the second mechanical gripper 6 can grab the wafer to the corresponding workbench 4 on the circumference of the second conveying platform 2, until all wafers are processed, and then stop the material storage piece 8 on the track 7 near the loading structure 3, and then open the isolation plates 24 on both sides of the connecting channel 9 between the first conveying platform 1 and the loading structure 3, and then use the first mechanical gripper 5 to grab the wafers of the material storage piece 8 into the loading structure 3 in turn, and at the same time grab the new wafer to be processed to the material storage piece 8 to repeat the wafer processing.

[0043] A PVD equipment conveying system based on a dual conveying platform of the present invention moves a material storage piece 8 in a first working chamber and a second working chamber, making it convenient for a first mechanical gripper 5 and a second mechanical gripper 6 to grab wafers and place them on different workbenches 4, and through the movement of the material storage piece 8, the wafers on the material storage piece 8 can be processed and manufactured according to different process routes, so that the present invention can process wafers of different process routes at the same time, has strong adaptability, improves production efficiency, and increases production capacity.

[0044] Embodiment 2 of a PVD equipment conveying system based on a dual conveying platform provided by the present invention: The main difference between it and Example 1 is that in Example 1, a connecting channel is provided between the first conveying platform and the second conveying platform, and the connecting channel is used to connect the first working chamber and the second working chamber.

[0045] In this embodiment, no connecting channel is provided between the first conveying platform and the second conveying platform, and the first working chamber and the second working chamber are directly connected.

[0046] Embodiment 3 of a PVD equipment conveying system based on a dual conveying platform provided by the present invention: The main difference between it and Example 1 is that in Example 1, each end of the sliding rod is connected to a concave-shaped connecting frame, and a rotating motor is provided at the upper end of the connecting frame. The output shaft of the rotating motor extends vertically downward and is coaxially fixed to the walking wheel.

[0047] In this embodiment, the rotating motor is arranged at the lower end of the connecting frame, and the output shaft of the rotating motor extends vertically upward and is coaxially fixed with the traveling wheel.

[0048] Embodiment 4 of a PVD equipment conveying system based on a dual conveying platform provided by the present invention: The main difference between it and Example 1 is that in Example 1, a convex-shaped support seat is also provided on the connecting frame, and the protruding part of the support seat is coaxially arranged in the running wheel to support the running wheel.

[0049] In this embodiment, no support base is provided.

[0050] Embodiment 5 of a PVD equipment conveying system based on a dual conveying platform provided by the present invention: The main difference between it and Example 1 is that in Example 1, the first mechanical gripper and the second mechanical gripper are both single-pickup and single-release mechanical grippers.

[0051] In this embodiment, the first mechanical gripper is a double-pickup and double-placement mechanical gripper in the prior art.

[0052] According to the above description of this specification, those skilled in the art may also understand that the terms used below, such as "up", "down", "front", "back", "left", "right", "width", "horizontal", "top", "bottom", "inside", "outside" and the like, which indicate orientation or positional relationships, are based on the orientation or positional relationships shown in the drawings of this specification, and are only for the purpose of facilitating the explanation of the scheme of the present invention and simplifying the description, rather than explicitly or implicitly indicating that the devices or elements involved must have the specific orientation, be constructed and operated in a specific orientation. Therefore, the above-mentioned orientation or positional relationship terms cannot be understood or interpreted as limitations on the scheme of the present invention.

[0053] The above description is only a preferred embodiment of the present invention and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment as above, it is not used to limit the present invention. Any technician familiar with this profession can make some changes or modifications to equivalent embodiments of equivalent changes by using the methods and technical contents disclosed above without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still falls within the scope of the technical solution of the present invention.

[0054] In addition, in the description of this specification, “plurality” means at least two, for example, two, three or more, etc., unless otherwise clearly and specifically defined.

Claims

1. A PVD equipment conveying system based on a dual conveying platform, characterized in that: It includes a first conveying platform, a second conveying platform, a loading structure and a conveying structure; The first conveying platform is connected to the feeding structure and a plurality of workbenches are arranged in the circumferential direction of the first conveying platform. The first conveying platform includes a first working chamber, and a first mechanical gripper is arranged in the first working chamber. The second conveying platform is connected to a side of the first conveying platform away from the loading structure and a plurality of workbenches are also arranged in the circumferential direction of the second conveying platform, the second conveying platform comprises a second working chamber, and a second mechanical gripper is arranged in the second working chamber; The conveying structure includes a track arranged between the first conveying platform and the second conveying platform and a material storage member slidably assembled on the track, and a plurality of wafers can be placed on the material storage member; The first mechanical gripper is used to grab the wafers on the material storage piece and put them into the workbench set around the first conveying platform; the second mechanical gripper is used to grab the wafers on the material storage piece and put them into the workbench set around the second conveying platform.

2. A PVD equipment conveying system based on a dual conveying platform according to claim 1, characterized in that: A connecting channel is provided between the first conveying platform and the second conveying platform, and between the first conveying platform and the loading structure. The connecting channel is used to connect the first working chamber and the second working chamber, and connect the first working chamber and the loading structure.

3. A PVD equipment conveying system based on a dual conveying platform according to claim 2, characterized in that: The track is an "8"-shaped structure and the track cross-section is an I-shaped structure. The material storage piece includes a material storage part and a sliding part. The sliding part has a T-shaped slide groove and the slide groove is adapted to the upper end of the I-shaped track. A plurality of sliding rods that can move in a direction perpendicular to the extension direction of the slide groove are arranged in the slide groove. The sliding rod is rotated toward one end of the track and is equipped with a walking wheel whose axis extends in a vertical direction. The walking wheel is always in contact with the track to enable the material storage piece to move along the track.

4. A PVD equipment conveying system based on a dual conveying platform according to claim 3, characterized in that: A plurality of blind holes are provided on the inner wall of the slide groove, the sliding rod is slidably assembled in the blind hole, a spring is connected between the sliding rod and the bottom of the blind hole, and the spring is always in a compressed state.

5. A PVD equipment conveying system based on a dual conveying platform according to claim 4, characterized in that: The end of each sliding rod is connected with a concave-shaped connecting frame, and a rotating motor is arranged on the upper end of the connecting frame. The output shaft of the rotating motor extends vertically downward and is coaxially fixed with the walking wheel.

6. A PVD equipment conveying system based on a dual conveying platform according to claim 5, characterized in that: A convex-shaped support seat is also provided on the connecting frame, and a protruding part of the support seat is coaxially arranged in the running wheel to support the running wheel.

7. A PVD equipment conveying system based on a dual conveying platform according to claim 6, characterized in that: The material storage part comprises a plurality of material storage layers which are arranged at intervals along the vertical direction, and each material storage layer is used for placing a wafer.

8. A PVD equipment conveying system based on a dual conveying platform according to any one of claims 2 to 7, characterized in that: Vacuum isolation pieces are provided at both ends of the connecting channel. The vacuum isolation pieces are used to seal the connecting channel while maintaining a vacuum state. The vacuum isolation pieces include a frame and a vacuum extractor. The frame is provided with a through hole that penetrates the frame in a horizontal direction. The lower side wall of the through hole is provided with a sliding groove. An isolation plate that can completely seal and block the through hole is slidably installed in the sliding groove. The vacuum extractor is used to maintain a vacuum state in the connecting channel. A notch is provided on the track extending into the connecting channel, and the notch is arranged corresponding to the isolation plate.

9. A PVD equipment conveying system based on a dual conveying platform according to any one of claims 2 to 7, characterized in that: The first conveying platform is a tetrahedral structure with two working positions for installing the workbench on each side; the second conveying platform is an octahedral structure with eight evenly distributed working positions for installing the workbench in the circumferential direction; the first conveying platform and the second conveying platform share two working positions and these two working positions are used to form a connecting channel connecting the first working chamber and the second working chamber; the first conveying platform and the loading structure also share two working positions and these two working positions are used to form a connecting channel connecting the first working chamber and the loading structure.

10. The PVD equipment conveying system based on a dual conveying platform according to claim 8, characterized in that: The vacuum extractor comprises a vacuum pump and an extraction pipe connected to the vacuum pump, and the extraction pipe is communicated with the inner cavity of the connecting channel.

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