Method and system for predicting service life of MOS (Metal Oxide Semiconductor) device and electronic equipment
By constructing a continuous time dynamic model and multi-time scale decomposition technology, combining adaptive numerical solution and physical constraint regularization, the multi-scale characteristic processing and synergistic effect problems in MOS device life prediction are solved, and high-precision device life prediction is achieved.
Patent Information
- Application Number
- CN202510724652.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-03
- Publication Date
- 2025-07-04
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
In the prior art, the MOS device lifetime prediction method has problems such as insufficient discrete time modeling, neglecting synergies between devices, difficulty in processing multi-time scale characteristics, and insufficient physical interpretability, resulting in insufficient prediction accuracy and reliability.
The device relationship diagram is constructed using a continuous time dynamic model, combining multi-time scale decomposition and adaptive numerical solution algorithm, and precise modeling and prediction of the MOS device degradation process through graph attention mechanism and physical constraint regularization.
It improves the accuracy and reliability of MOS device life prediction, can handle irregular sampled data, enhances the physical rationality and generalization capabilities of the model, and is suitable for integrated circuit systems with high integration and high reliability requirements.
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Abstract
Citation Information
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