Electrochromic device coating process and method

Through the comprehensive processes of substrate pretreatment, conductive layer deposition, electrochromic layer deposition and staged annealing, NiO/W ratio and doping are controlled, the problem of yellow background color of electrochromic devices is solved, and the optimization of photoelectric performance and industrial mass production compatibility is achieved.

CN120425307APending Publication Date: 2025-08-05SUZHOU BEARSUNNY TECHNOLOGIES INC
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Patent Information

Application Number
CN202510427480.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-04-07
Publication Date
2025-08-05

AI Technical Summary

Technical Problem

Existing electrochromic devices have yellow background problems, which leads to increased production complexity and cost and limited effects when neutralized by adjusting the ITO layer thickness or doping transition metal oxides.

Method used

The comprehensive process of substrate pretreatment, conductive layer deposition, electrochromic layer deposition and staged annealing is adopted to control the NiO/W ratio to 0.25~0.357, combined with magnetron sputtering pure metal nickel target and tungsten target, staged annealing and zirconia doping, and optimize the film layer ratio and structure.

Benefits of technology

Significantly reduce yellow background color, maintain photoelectric performance, avoid increasing square resistance, improve transmittance, simplify process flow, reduce costs, and improve device reliability and transmittance.

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Abstract

The invention relates to the technical field of electrochromism coating, in particular to an electrochromism device coating process and method, and the electrochromism device coating process comprises the following steps: step 1, substrate pretreatment: cleaning attachments on the surface of a flexible substrate through ultrasonic cleaning and plasma treatment; step 2, conducting layer deposition treatment: depositing an indium tin oxide (ITO) conducting layer on the substrate at the deposition temperature of 100-380 DEG C, the thickness of 200-350 nm and the vacuum degree of less than or equal to 10 <-5 > Pa; step 3, electrochromic layer deposition treatment: sequentially depositing a tungsten oxide (WO3) layer and a nickel oxide (NiO) layer through a magnetron sputtering process, and controlling the film thickness ratio of NiO to WO3 to enable the ratio of NiO / W to be 0.25-0.357; 4, annealing treatment is conducted, specifically, annealing is conducted for the first time at the temperature of 200-500 DEG C, and the annealing time is 200-300 seconds; and secondary annealing is conducted, specifically, annealing is conducted at the temperature of 400 DEG C, and the annealing time ranges from 200 seconds to 800 seconds. The effect of improving the yellow ground color of the electrochromic device is achieved.
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