Anti-reflection member, polarizing plate, panel, image display device, and Anti-reflection article using same, and method for selecting Anti-reflection member

Abstract

The present disclosure provides an anti-reflection member capable of providing good wiping properties of dirt. An anti-reflection member having a low refractive index layer on a substrate, the low refractive index layer containing a binder component and hollow particles, the hollow particles having an average particle diameter of more than 75.0 nm and 140.0 nm or less, when the average value of the distances between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distances between the centers of gravity of the hollow particles in the low refractive index layer is defined as L [sigma], La is 105.0 nm or more and 142.0 nm or less, and L [sigma] / La is 0.100 or more and 0.300 or less.

Description

Technical Field

[0001] The present disclosure relates to an antireflection member, a polarizing plate, a panel, an image display device, an antireflection article using the antireflection member, and a method for selecting the antireflection member. Background Art

[0002] In display devices such as liquid crystal display devices, organic EL display devices, and micro LED display devices, and showcases, an antireflection member may be provided on the surface to improve visibility.

[0003] As an antireflection member, an antireflection member having a low-refractive index layer on a substrate has been proposed. The low-refractive index layer, for example, comprises hollow particles for lowering the refractive index and a binder component for retaining the hollow particles. Patent documents 1 and 2, for example, have proposed antireflection members containing hollow particles in the low-refractive index layer.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: International Publication No. WO2019 / 208483

[0007] Patent Document 2: Japanese Patent Application Laid-Open No. 2022-150906 Summary of the Invention

[0008] Problems to be solved by the invention

[0009] Anti-reflection components are placed on the surface of components, so dirt such as sebum easily adheres to the surface. Furthermore, the reflectivity difference between areas of the anti-reflection component where sebum adheres and areas where sebum does not adhere tends to increase, making the areas where sebum adheres more noticeable. Therefore, anti-reflection components are required to have good wiping properties against dirt such as sebum.

[0010] The antireflection member of Patent Document 1 does not investigate the wiping properties of dirt such as sebum.

[0011] The anti-reflection component of Patent Document 2 achieves excellent fingerprint wiping properties by arranging the hollow particles in a single layer, setting the thickness of the low refractive index layer within a predetermined range, and setting the diameter of the hollow silica particles relative to the thickness of the low refractive index layer within a predetermined range. However, even the anti-reflection component of Patent Document 2 frequently exhibits insufficient wiping properties against dirt such as sebum.

[0012] The present disclosure provides an anti-reflection component that can effectively wipe away dirt such as sebum, as well as a polarizer, panel, image display device, and anti-reflection article using the same. Furthermore, the present disclosure provides a method for efficiently selecting an anti-reflection component that effectively wipes away dirt such as sebum.

[0013] Means for solving problems

[0014] The present disclosure provides the following <1> ~ <6> .

[0015] <1> An anti-reflection component comprising a low-refractive-index layer on a substrate, wherein:

[0016] The low refractive index layer comprises a binder component and hollow particles,

[0017] The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm.

[0018] When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is 105.0 nm to 142.0 nm, and Lσ / La is 0.100 to 0.300.

[0019] <2> A polarizing plate comprising a polarizing element, a first transparent protective plate disposed on one side of the polarizing element, and a second transparent protective plate disposed on the other side of the polarizing element, wherein either the first transparent protective plate or the second transparent protective plate is <1> The anti-reflection member is arranged so that the surface of the anti-reflection member on the side of the low refractive index layer faces the side opposite to the polarizing element.

[0020] <3> A panel comprising a display element and an optical film disposed on the light emitting surface side of the display element, wherein the optical film comprises <1> The anti-reflection member is arranged so that the surface of the anti-reflection member on the side of the low refractive index layer faces the side opposite to the display element, and the anti-reflection member is arranged on the outermost surface.

[0021] <4> An image display device comprising <3> The panel is provided, and the anti-reflection component is arranged on the outermost surface.

[0022] <5> An anti-reflective article, wherein, on a component, <1> The anti-reflection member is disposed so that the surface on the low-refractive-index layer side faces the opposite side of the member, and the anti-reflection member is disposed on the outermost surface.

[0023] <6> A method for selecting an anti-reflection component, wherein it is determined whether the following (1) to (4) are satisfied, and an anti-reflection component satisfying the following (1) to (4) is selected.

[0024] (1) An anti-reflection component having a low refractive index layer on a substrate;

[0025] (2) The low refractive index layer comprises a binder component and hollow particles;

[0026] (3) The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm;

[0027] (4) When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is greater than or equal to 105.0 nm and less than or equal to 142.0 nm, and Lσ / La is greater than or equal to 0.100 and less than or equal to 0.300.

[0028] Effects of the Invention

[0029] The antireflection member disclosed herein, as well as the polarizing plate, image display device, and antireflection article using the same, can effectively wipe away dirt such as sebum. The method for selecting an antireflection member disclosed herein can efficiently select an antireflection member that effectively wipes away dirt such as sebum. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 This is a schematic cross-sectional view showing one embodiment of the anti-reflection member of the present disclosure.

[0031] Figure 2 This is a cross-sectional view showing one embodiment of the panel of the present disclosure. DETAILED DESCRIPTION

[0032] Hereinafter, embodiments of the present disclosure will be described.

[0033] [Anti-reflective components]

[0034] The anti-reflection member disclosed herein is an anti-reflection member having a low refractive index layer on a substrate.

[0035] The low refractive index layer comprises a binder component and hollow particles,

[0036] The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm.

[0037] When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La, and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ,

[0038] La is greater than or equal to 105.0 nm and less than or equal to 142.0 nm, and Lσ / La is greater than or equal to 0.100 and less than or equal to 0.300.

[0039] Figure 1 2 is a schematic cross-sectional view of the cross-sectional shape of the anti-reflection member 100 of the present disclosure.

[0040] Figure 1 The anti-reflection member 100 includes a low refractive index layer 30 on a substrate 10 . Figure 1 The anti-reflection member 100 includes a hard coating layer 20 between a substrate 10 and a low-refractive-index layer 30 .

[0041] Figure 1 That is, the scale of each layer and the scale of each material constituting the antireflection member 100 are schematically shown for ease of illustration and are different from the actual scale. Figure 2 Same here.

[0042] The anti-reflection component of the present disclosure is not limited to Figure 1 For example, the anti-reflection component of the present disclosure may have a low refractive index layer directly on the substrate. In addition, the anti-reflection component of the present disclosure may also have Figure 1 Other layers not described in.

[0043] Preferred embodiments of the laminated structure of the anti-reflection component disclosed herein include “a laminated structure having a hard coat layer and a low refractive index layer in this order on a substrate” and “a laminated structure having a hard coat layer, a high refractive index layer and a low refractive index layer in this order on a substrate”.

[0044] <Base Material>

[0045] The substrate preferably has light transmittance, smoothness, heat resistance, and excellent mechanical strength. Examples of such substrates include plastic films such as polyester, triacetyl cellulose (TAC), cellulose diacetate, cellulose acetate butyrate, polyamide, polyimide, polyethersulfone, polysulfone, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyetherketone, polymethyl methacrylate, polycarbonate, polyurethane, and amorphous olefin (COP). The substrate may be formed by laminating two or more plastic films.

[0046] Among the above, polyester films such as polyethylene terephthalate and polyethylene naphthalate are preferred for their excellent mechanical strength and dimensional stability. Among polyester films, stretched films are preferred, and biaxially stretched films are more preferred. TAC and acrylic are preferred from the perspectives of light transmittance and optical isotropy. COP and polyester are preferred for their excellent weather resistance.

[0047] Examples of raw materials for plastic films include one or more selected from "newly synthesized raw materials," "recycled raw materials," and "biomass-derived raw materials." To reduce environmental burdens, the raw materials for plastic films preferably include biomass-derived raw materials. Biomass-derived raw materials refer to plant-derived raw materials.

[0048] Whether the raw material is derived from biomass can be determined by radiocarbon ( 14 It is known that carbon dioxide in the atmosphere contains a certain proportion (105.5 pMC) of 14 C, so the plants that absorb carbon dioxide from the atmosphere grow 14 The C content is also about 105.5 pMC. In addition, it is known that fossil fuels contain almost no 14 C. Therefore, by measuring the total carbon atoms in the raw material 14 The ratio of C can determine whether the raw material is derived from biomass.

[0049] In order to achieve good mechanical strength and dimensional stability and reduce environmental burden, the substrate is preferably a polyester film comprising polyester derived from a biomass raw material.

[0050] The thickness of the substrate is preferably 5 μm or more and 300 μm or less, more preferably 20 μm or more and 200 μm or less, and even more preferably 30 μm or more and 120 μm or less.

[0051] When the antireflection member is to be thinned, the upper limit of the thickness of the substrate is preferably 80 μm or less, and more preferably 70 μm or less.

[0052] The thickness of the substrate can be measured using a common film thickness gauge. An example of a film thickness gauge is a digital standard external micrometer (Mitutoyo, model "MDC-25SX"). The thickness of the substrate can be determined by measuring the average value of any 10 points.

[0053] Examples of preferred ranges of thickness of the substrate include 5 μm or more and 300 μm or less, 5 μm or more and 200 μm or less, 5 μm or more and 120 μm or less, 5 μm or more and 80 μm or less, 5 μm or more and 70 μm or less, 5 μm or more and 20 μm or less, 20 μm or more and 300 μm or less, 20 μm or more and 200 μm or less, 20 μm or more and 120 μm or less, 20 μm or more and 80 μm or less, 20 μm or more and 70 μm or less, 30 μm or more and 300 μm or less, 30 μm or more and 200 μm or less, 30 μm or more and 120 μm or less, 30 μm or more and 80 μm or less, and 30 μm or more and 70 μm or less.

[0054] In order to improve the adhesiveness, the surface of the substrate may be subjected to a physical treatment such as a corona discharge treatment or a chemical treatment, or an easy-adhesion layer may be formed.

[0055] The total light transmittance of the substrate in accordance with JIS K7361-1:1997 is preferably 70% or higher, more preferably 80% or higher, and even more preferably 85% or higher.

[0056] <Low Refractive Index Layer>

[0057] The low refractive index layer is preferably located on the surface of the antireflection member.

[0058] The low refractive index layer needs to contain a binder component and hollow particles. The low refractive index layer preferably further contains solid particles and / or a leveling agent.

[0059] La, Lσ / La

[0060] In the anti-reflection component of the present disclosure, when the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La needs to be greater than 105.0 nm and less than 142.0 nm, and Lσ / La needs to be greater than 0.100 and less than 0.300.

[0061] Hereinafter, the measurement method of La and Lσ will be described, and the technical significance of La and Lσ / La will be described.

[0062] -Determination method of La and Lσ-

[0063] La and Lσ are measured according to the following procedures (1) to (5).

[0064] (1) The surface of the low refractive index layer side of the antireflection member was photographed using a scanning electron microscope. The photographed area was adjusted to a size of 4.0 μm wide by 3.0 μm high, excluding the scale bar. Furthermore, the pixel size was adjusted to 3.31 nm.

[0065] The image captured in (1) above is a planar image of the low-refractive index layer. In the planar image of the low-refractive index layer, the presence of hollow particles having a circular shape in plan view can be confirmed.

[0066] In the above (1), the acceleration voltage of the scanning electron microscope (SEM) is set to be within the range of 100 V to 30 kV.

[0067] (2) The 30,000-fold image obtained in (1) above is cut to remove unnecessary portions of the image information not derived from the sample, such as the scale bar. The image with the unnecessary portions removed is processed to binarize the image so that the bright areas are white and the dark areas are black.

[0068] (3) By binarization, an image is obtained in which a plurality of white independent islands are arranged in a black sea. The white areas can be regarded as areas corresponding to hollow particles.

[0069] (4) Obtain the centroid coordinates of islands with an area of ​​100 px or more from the binarized image. Next, determine the average value and standard deviation of the distances between the centroids of adjacent particles.

[0070] In (4) above, "adjacent particles" refers to a combination of particles whose distance between centers of gravity is greater than 50 nm and less than 150 nm. In addition, "the average value of the distance between centers of gravity of adjacent particles" refers to the average value of the distance between centers of gravity of all adjacent particles. The reason for limiting the definition of adjacent particles to "a combination of particles whose distance between centers of gravity is greater than 50 nm and less than 150 nm" is that if the distance between centers of gravity is less than 50 nm, it is possible to be affected by noise that is not completely removed by the binarization in (2) above, and if the distance between centers of gravity exceeds 150 nm, it is possible that particles adjacent to adjacent particles are counted.

[0071] (5) Through the above (1) to (4), the "average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer" and the "standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer" are calculated in any measurement area of ​​the anti-reflection component. Furthermore, the above (1) to (4) steps are carried out at another 9 locations of the anti-reflection component to calculate the "average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer" and the "standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer" at a total of 10 locations. And, the average of the "average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer" at the 10 locations is taken as "La" of the present disclosure. Similarly, the average value of the "standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer" at the 10 locations is taken as "Lσ" of the present disclosure. The 10 measurement locations are randomly selected from locations where there are no abnormal points such as dust and damage by visual inspection.

[0072] -Technical significance of La and Lσ-

[0073] The average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer, i.e., La, represents the density of the hollow particles having an average particle size of more than 75.0 nm and less than 140.0 nm in the planar direction. Specifically, when La is small, the density of the hollow particles is high, and when La is large, the density of the hollow particles is low.

[0074] The standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer, that is, Lσ represents the deviation of the distribution in the planar direction of the hollow particles with an average particle size of more than 75.0nm and less than 140.0nm. Similarly, Lσ / La represents the deviation of the distribution in the planar direction of the hollow particles with an average particle size of more than 75.0nm and less than 140.0nm. It is believed that: Lσ / La can reduce the influence of the absolute value of the average particle size of the hollow particles, and is therefore more suitable for representing the deviation of the distribution of hollow particles than Lσ. It can be said that the smaller Lσ / La is, the more uniform the distribution of the hollow particles is, and the larger Lσ / La is, the more uneven the distribution of the hollow particles is.

[0075] In the past, it was thought that hollow particles were preferably arranged densely in the low-refractive-index layer (for example, in Fig. 3 of above-mentioned patent document 2, hollow particles were arranged densely). As the first reason, when hollow particles were arranged densely, reflectivity could be reduced. As the second reason, it was thought that the position without hollow particles formed a recess with a low elevation, and due to this recess, the wiping property of dirt deteriorated. That is, in order to reduce reflectivity and make the wiping property of dirt good, it was thought that it was preferred to arrange hollow particles densely in the past.

[0076] In addition, it has been considered that it is preferred to make the distribution of hollow particles uniform in the low refractive index layer (for example, in FIG. 3 of the above-mentioned patent document 2, the distribution of hollow particles is uniform). The reason is that if the distribution of hollow particles is uneven, the uniformity of performances such as reflectivity and wiping properties will be impaired.

[0077] The present inventors have found that even if the density of the hollow particles is increased, it is sometimes impossible to achieve good wiping properties. The present inventors speculate that when the hollow particles are too dense in the planar direction, it is difficult for the adhesive component and leveling agent, etc., which can make components with good wiping properties difficult to pass between the hollow particles. Therefore, these components are difficult to accumulate on the surface of the low refractive index layer, making it difficult to wipe the dirt. In addition, the present inventors have focused on La as a parameter related to the density of the hollow particles and found that by setting La to a specified range, there is a tendency to improve the wiping properties of the dirt.

[0078] Furthermore, the present inventors have found that even if the distribution of hollow particles is uniform, it is sometimes impossible to achieve good wiping properties. The present inventors speculate that when the hollow particles are evenly and seamlessly distributed in the planar direction, the adhesive component and leveling agent, etc., can make it difficult for components with good wiping properties to pass between the hollow particles. Therefore, these components are difficult to accumulate on the surface of the low refractive index layer, making it difficult to wipe the dirt. In addition, the present inventors have focused on Lσ / La as a parameter related to the deviation of the distribution of hollow particles and found that by setting Lσ / La to a specified range, there is a tendency to achieve good wiping properties of dirt.

[0079] Furthermore, the present inventors have found that the problem of wiping properties against dirt can be solved by setting La within a predetermined range and setting Lσ / La within a predetermined range.

[0080] When La is less than 105.0 nm, it is difficult for components with good wiping properties to accumulate on the surface of the low refractive index layer, so good wiping properties cannot be achieved. When La exceeds 142.0 nm, low-elevation concave portions are easily formed in areas where hollow particles are not present, and dirt easily accumulates in these concave portions, so good wiping properties cannot be achieved.

[0081] When Lσ / La is less than 0.100, it is difficult for components with good wiping properties to accumulate on the surface of the low refractive index layer, and thus good wiping properties cannot be achieved. When Lσ / La exceeds 0.300, low-elevation concave portions are easily formed in areas where hollow particles are not present, and dirt easily accumulates in these concave portions, thus failing to achieve good wiping properties.

[0082] Furthermore, the present inventors have discovered that, when the average particle size exceeds 75.0 nm and is below 140.0 nm, by setting La and Lσ / La within specified ranges, there is a tendency to improve scratch resistance. Furthermore, the present inventors have discovered that, when the average particle size falls within the above ranges, there is a tendency for scratch resistance to improve as Lσ / La or Lσ increases. The reason for this improvement in scratch resistance is speculated to be as follows. When La is within the specified range, the larger Lσ is, the larger Lσ / La is. The larger Lσ is, the more likely the planar gaps between the hollow particles become, making it easier for components such as the binder component and leveling agent, described later, to pass between the hollow particles and accumulate on the surface side of the low refractive index layer. As a result, the surface slippage of the low refractive index layer is improved. Furthermore, the improved surface slippage reduces friction, thereby improving the scratch resistance of the coating film. Therefore, by setting La, Lσ / La, and Lσ within the above ranges, it is easier to achieve both good wiping properties from dirt and scratch resistance.

[0083] In the antireflection member of the present disclosure, when the average particle size of the hollow particles exceeds 75.0 nm and is 140.0 nm or less, La and Lσ / La need to be within the above ranges.

[0084] When the average particle size of the hollow particles is below 75.0nm, the refractive index of the hollow particles themselves cannot be reduced, so it is difficult to reduce the reflectivity of the anti-reflection component. Even if the average particle size of the hollow particles is below 75.0nm, if the content of the hollow particles is increased, the reflectivity of the anti-reflection component can also be reduced, but if a large number of hollow particles with a small average particle size are used, then La is easily reduced. In addition, hollow particles with a small average particle size are easily condensed. Therefore, if a large number of hollow particles with a small average particle size are used, then Lσ / La is easily enlarged.

[0085] When the average particle diameter of hollow particles exceeds 140.0nm, it is impossible to make the optical thickness of low-refractive index layer into appropriate range, so it is difficult to reduce reflectivity.Optical thickness is the value obtained by multiplying thickness by refractive index.In addition, when the average particle diameter of hollow particles exceeds 140.0nm, it is difficult to make the scratch resistance of anti-reflection component good.And then, when the average particle diameter of hollow particles exceeds 140.0nm, Lσ / La easily diminishes.

[0086] The lower limit of La is preferably 107.0 nm or more, more preferably 108.0 nm or more, more preferably 109.0 nm or more, more preferably 110.0 nm or more, more preferably 112.0 nm or more, more preferably 114.0 nm or more, and more preferably 119.0 nm or more.

[0087] The upper limit of La is preferably 139.0 nm or less, more preferably 137.0 nm or less, further preferably 132.0 nm or less, and particularly preferably 122.0 nm or less.

[0088] Examples of preferred ranges of La include 105.0 nm to 140.0 nm, 105.0 nm to 139.0 nm, 105.0 nm to 137.0 nm, 105.0 nm to 132.0 nm, 105.0 nm to 122.0 nm, 107.0 nm to 140.0 nm, 107.0 nm to 139.0 nm, 107.0 nm to 137.0 nm, 107.0 nm to 132.0 nm, 107.0 nm to 122.0 nm, 108.0 nm to 140.0 nm, 108.0 nm to 139.0 nm, 108.0 nm to 137.0 nm, 108.0 nm to 132.0 nm, 108.0 nm to 122.0 nm. 2.0nm or less, 109.0nm or more and 140.0nm or less, 109.0nm or more and 139.0nm or less, 109.0nm or more and 137.0nm or less, 109.0nm or more and 132.0nm or less, 109.0nm or more and 122.0nm or less, 110.0nm or more and 140.0nm or less, 110.0nm or more and 139.0nm or less, 110.0nm or more and 110.0nm or less m and 137.0 nm or less, 110.0 nm and 132.0 nm or less, 110.0 nm and 122.0 nm or less, 112.0 nm and 140.0 nm or less, 112.0 nm and 139.0 nm or less, 112.0 nm and 137.0 nm or less, 112.0 nm and 132.0 nm or less, 112.0 nm and 122.0 nm or less.

[0089] The lower limit of Lσ / La is preferably 0.101 or more, more preferably 0.103 or more, and further preferably 0.105 or more.

[0090] The upper limit of Lσ / La is preferably 0.295 or less, more preferably 0.290 or less, more preferably 0.285 or less, more preferably 0.280 or less, more preferably 0.240 or less, more preferably 0.200 or less, more preferably 0.195 or less, more preferably 0.190 or less, more preferably 0.180 or less.

[0091] Examples of preferred ranges of Lσ / La include 0.100 to 0.300, 0.100 to 0.295, 0.100 to 0.290, 0.100 to 0.285, 0.100 to 0.280, 0.100 to 0.240, 0.100 to 0.200, 0.100 to 0.195, 0.100 to 0.190, 0.100 to 0.180, 0.101 to 0.300, 0.101 to 0.295, 0.101 to 0.290, 0.101 to 0.285, 0.101 to 0.280, 0.101 to 0.240, 0.101 to 0.200, 0.101 to 0.195, 0.101 to 0.190, 0.101 Above 0.180 and below, Above 0.103 and below 0.300, Above 0.103 and below 0.295 and below, Above 0.103 and below 0.290, Above 0.103 and below 0.285 and below, Above 0.103 and below 0.280, Above 0.103 and below 0.240, Above 0.103 and below 0.200, Above 0.103 and below 0.195 and below, Above 0.103 and below 0.190, Above 0.103 and below 80 or less, 0.105 or more and less than 0.300, 0.105 or more and less than 0.295, 0.105 or more and less than 0.290, 0.105 or more and less than 0.285, 0.105 or more and less than 0.280, 0.105 or more and less than 0.240, 0.105 or more and less than 0.200, 0.105 or more and less than 0.195, 0.105 or more and less than 0.190, 0.105 or more and less than 0.180.

[0092] Lσ is preferably 7 nm to 35 nm, more preferably 9 nm to 33 nm, and even more preferably 11 nm to 30 nm.

[0093] Implementation examples of the preferred range of Lσ include 7 nm to 35 nm, 7 nm to 33 nm, 7 nm to 30 nm, 9 nm to 35 nm, 9 nm to 33 nm, 9 nm to 30 nm, 11 nm to 35 nm, 11 nm to 33 nm, and 11 nm to 30 nm.

[0094] Furthermore, 3Lσ is preferably 21 nm to 105 nm, more preferably 27 nm to 99 nm, and even more preferably 33 nm to 90 nm. Preferred embodiments of 3Lσ include 21 nm to 105 nm, 21 nm to 99 nm, 21 nm to 90 nm, 27 nm to 105 nm, 27 nm to 99 nm, 27 nm to 90 nm, 33 nm to 105 nm, 33 nm to 99 nm, and 33 nm to 90 nm.

[0095] In this specification, measurements of La and Lσ, as well as other measurements such as surface roughness, element ratios, slip angle, and haze, are performed at a temperature of 23±5°C and a relative humidity of 40% to 65%, unless otherwise specified. Prior to each measurement, the sample was exposed to the aforementioned atmosphere for 30 minutes to 60 minutes before measurement.

[0096] Hollow Particles

[0097] The low refractive index layer of the present disclosure needs to contain hollow particles. Furthermore, the hollow particles of the present disclosure need to have an average particle size of more than 75.0 nm and 140.0 nm or less.

[0098] The lower limit of the average particle size of the hollow particles is preferably 76.0 nm or more, more preferably 80.0 nm or more, more preferably 81.0 nm or more, more preferably 82.0 nm or more, and the upper limit is preferably 120.0 nm or less, more preferably 110.0 nm or less.

[0099] Examples of preferred ranges of the average particle size of the hollow particles include greater than 75.0 nm and 140.0 nm, greater than 75.0 nm and 120.0 nm, greater than 75.0 nm and 110.0 nm, 76.0 nm and 140.0 nm, 76.0 nm and 120.0 nm, 76.0 nm and 110.0 nm, 80.0 nm and 140.0 nm, 80.0 nm and 120.0 nm, 80.0 nm and 110.0 nm, 81.0 nm and 140.0 nm, 81.0 nm and 120.0 nm, 81.0 nm and 110.0 nm, 82.0 nm and 140.0 nm, 82.0 nm and 120.0 nm, and 82.0 nm and 110.0 nm.

[0100] The ratio of La to the average particle size of the hollow particles (La / average particle size of the hollow particles) is preferably 1.20 or more and 1.55 or less, and more preferably 1.25 or more and 1.50 or less.

[0101] Hollow particles are particles that have an outer shell, the interior of the particles surrounded by the outer shell is a hollow space, and air is contained within the hollow space. Hollow particles are particles whose refractive index decreases in proportion to the porosity.

[0102] The material of the outer shell of the hollow particles can be any inorganic compound or organic compound such as silica and magnesium fluoride, but silica is preferred from the viewpoint of low refractive index and strength. That is, the low refractive index layer preferably contains hollow silica particles as the hollow particles.

[0103] The average particle diameters of the hollow particles, the solid particles described below, and the high-refractive particles described below are calculated by the following procedures A1 to A3.

[0104] A1: A cross section of the anti-reflection member was imaged using a STEM. The STEM acceleration voltage was set to 10 kV to 30 kV, and the magnification was set to 50,000 to 100,000.

[0105] A2: Extract all hollow particles in the low refractive index layer from the observed image. The minimum number of hollow particles to be extracted is 20. When the number of hollow particles extracted in one observed image is less than 20, use STEM to photograph other parts of the cross section of the anti-reflection component and use two or more observation images. Then, calculate the particle size of each hollow particle. The particle size of each hollow particle refers to the distance between the straight lines in the combination of the two straight lines with the largest distance between the two straight lines when the cross section of the hollow particle is sandwiched between any two parallel straight lines. The outer shell of the hollow particle appears as a thick line. The particle size is measured from the outside of the line.

[0106] A3: Remove the bottom 10% of hollow particles from all the hollow particles whose particle sizes were measured in A2. "%" is a number-based value and is rounded off. The average particle size of the remaining 90% of hollow particles is taken as the average particle size "D" of the hollow particles.

[0107] In the above-mentioned A3, the reasons for removing the hollow particles of the bottom 10% of the particle size are the following (1) and (2).

[0108] (1) Hollow particles whose particle diameters are measured to be small may be cut at a portion deviated from the center of the hollow particle.

[0109] (2) In the case of hollow particles having a measured small particle size, there is a possibility that a portion of the hollow particles is buried in a layer adjacent to the low refractive index layer, such as the high refractive index layer and the hard coat layer.

[0110] In the above steps A1 to A3, if the particles to be extracted are changed to all solid particles in the low refractive index layer, the average particle size of the solid particles can be calculated. Alternatively, in the above steps A1 to A3, if the particles to be extracted are changed to all high refractive index particles in the high refractive index layer, the average particle size of the high refractive index particles can be calculated.

[0111] From the viewpoint of reducing the refractive index, the lower limit of the porosity of the hollow particles is preferably 5% or more, more preferably 10% or more, and further preferably 20% or more. From the viewpoint of strength, the upper limit is preferably 80% or less, more preferably 70% or less, and further preferably 60% or less.

[0112] The porosity of the hollow particles was calculated according to the following B1 to B3.

[0113] B1: The cross section of the hollow particles is observed by STEM, and the thickness of the outer shell excluding the diameter and the void portion is measured.

[0114] B2: Assuming the hollow particles to be spherical, the volume of the voids in the hollow particles and the volume of the hollow particles when there are no voids are calculated.

[0115] B3: The porosity is calculated from {(the volume of the void portion of the hollow particle) / (the volume of the hollow particle when there is no void portion)}×100.

[0116] Examples of preferred ranges of the porosity of the hollow particles include 5% to 80%, 5% to 70%, 5% to 60%, 10% to 80%, 10% to 70%, 10% to 60%, 20% to 80%, 20% to 70%, and 20% to 60%.

[0117] The higher the content of hollow particles, the lower the refractive index of the low refractive index layer. On the other hand, when the content of hollow particles relative to the binder component is too much, Lσ tends to become smaller. The smaller the average particle size of the hollow particles, the stronger the tendency of La to become smaller. In the case where the average particle size of the hollow particles is small, if the content of the hollow particles relative to the binder component is too much, Lσ / La tends to become larger due to the aggregation of the hollow particles. In addition, when the content of the hollow particles relative to the binder component is too little, Lσ and Lσ / La tend to become larger.

[0118] Therefore, the content of the hollow particles is preferably 15 parts by mass or more and 140 parts by mass or less, more preferably 15 parts by mass or more and 95 parts by mass or less, more preferably 17 parts by mass or more and 90 parts by mass or less, and more preferably 20 parts by mass or more and 85 parts by mass or less, relative to 100 parts by mass of the binder component.

[0119] Embodiments of the preferred range of the content of the hollow particles relative to 100 parts by mass of the binder component include 15 parts by mass or more and 140 parts by mass or less, 15 parts by mass or more and 95 parts by mass or less, 15 parts by mass or more and 90 parts by mass or less, 15 parts by mass or more and 85 parts by mass or less, 17 parts by mass or more and 140 parts by mass or less, 17 parts by mass or more and 95 parts by mass or less, 17 parts by mass or more and 90 parts by mass or less, 17 parts by mass or more and 85 parts by mass or less, 20 parts by mass or more and 140 parts by mass or less, 20 parts by mass or more and 95 parts by mass or less, 20 parts by mass or more and 90 parts by mass or less, and 20 parts by mass or more and 85 parts by mass or less.

[0120] The hollow particles are preferably surface-coated with a silane coupling agent. The silane coupling agent preferably has a (meth)acryloyl group or an epoxy group, and more preferably has a methacryloyl group.

[0121] By surface treating the hollow particles with a silane coupling agent, the affinity between the hollow particles and the binder component is improved, and excessive aggregation of the hollow particles can be easily suppressed. Therefore, by surface treating the hollow particles with a silane coupling agent, Lσ and Lσ / La can be easily adjusted to the above ranges.

[0122] In order to suppress excessive aggregation, the surface of the solid particles described below is also preferably coated with a silane coupling agent.

[0123] The hollow particles may include two or more types of hollow particles as long as the average particle diameter is within the above-mentioned range. For example, hollow particles having different outer shell layer materials or hollow particles having different particle diameters may be included.

[0124] As hollow particle, when comprising two or more hollow particles different in particle diameter, little hollow particle easily enters between the big hollow particle, therefore can easily control the thickness of low-refractive index layer.Therefore, by comprising two or more hollow particles different in particle diameter, can easily adjust reflectivity, reflection hue.In the part in the low-refractive index layer, also can on big hollow particle, overlap little hollow particle.

[0125] When using two or more hollow particles with different particle sizes, it is preferred that the particles include large particles with a particle size of 90.0 nm or more and small particles with a particle size of less than 90.0 nm. The particle size of the large particles is preferably 90.0 nm or more and 140.0 nm or less, more preferably 93.0 nm or more and 110.0 nm or less, and even more preferably 95.0 nm or more and 105.0 nm or less. The particle size of the small particles is preferably 65.0 nm or more and less than 90.0 nm, more preferably 70.0 nm or more and 82.0 nm or less, and even more preferably 72.0 nm or more and 80.0 nm or less.

[0126] When the average particle size of the hollow particles is defined as D and the standard deviation of the particle size of the hollow particles is defined as Dσ, Dσ / D is preferably 0.09 or more.

[0127] The standard deviation Dσ of the particle diameters of the hollow particles is a value calculated from the particle diameters of 90% of the hollow particles obtained in the above-mentioned operation A3.

[0128] It is speculated that when the average particle size of the hollow particles is greater than 75nm and less than 140nm, the larger the Dσ, the more likely gaps are formed in the planar direction between the hollow particles. This allows components such as the binder component and leveling agent, described later, to easily accumulate on the surface of the low refractive index layer through these gaps. By setting Dσ / D to be greater than 0.09, the low refractive index layer can be cleaned from dirt better, and the anti-reflective agent can also have better scratch resistance.

[0129] Even when using one kind of hollow particles, Dσ / D can be made to be more than 0.09, but if two or more hollow particles with different particle sizes are used, Dσ / D is easily further increased. As a result, even if a larger load is applied, it is not easy to damage and scratch resistance can be further improved. As its reason, it is speculated that if Dσ / D becomes larger, the gap between the hollow particles becomes larger, so the components such as the adhesive component and the leveling agent described later are more gathered on the surface of the low refractive index layer.

[0130] In consideration of scratch resistance, Dσ / D is more preferably 0.10 or greater, and even more preferably 0.15 or greater. Furthermore, to facilitate control of La and Lσ / La within the above ranges, the upper limit of Dσ / D is preferably 0.50 or less, more preferably 0.40 or less, and even more preferably 0.30 or less.

[0131] Examples of preferred ranges of Dσ / D include 0.09 to 0.50, 0.09 to 0.40, 0.09 to 0.30, 0.10 to 0.50, 0.10 to 0.40, 0.10 to 0.30, 0.15 to 0.50, 0.15 to 0.40, and 0.15 to 0.30.

[0132] Adhesive ingredients

[0133] The binder component is a component for forming the low refractive index layer as a layer and functions as a binding agent for holding the hollow particles. Examples of the binder component include general-purpose natural resins and synthetic resins.

[0134] The low refractive index layer preferably contains a cured product of a curable resin composition as a binder component. The curable resin composition is a composition containing a curable compound such as a thermosetting resin or an ionizing radiation curable compound.

[0135] The ratio of the cured product of the curable resin composition to the total binder component of the low refractive index layer is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 90% by mass or more, and most preferably 100% by mass.

[0136] Examples of the curable resin composition of the low refractive index layer include thermosetting resin compositions and ionizing radiation curable resin compositions, preferably ionizing radiation curable resin compositions. That is, the low refractive index layer preferably contains a cured product of the ionizing radiation curable resin composition as a binder component.

[0137] The thermosetting resin composition is a composition containing at least a thermosetting resin, and is a resin composition that is cured by heating.

[0138] Examples of the thermosetting resin include acrylic resins, polyurethane resins, phenolic resins, urea-melamine resins, epoxy resins, unsaturated polyester resins, and silicone resins. A curing agent is added to these curable resins as needed in the thermosetting resin composition.

[0139] Ionizing radiation curable resin composition is a composition comprising a compound (hereinafter, also referred to as "ionizing radiation curable compound") with an ionizing radiation curable functional group. Ionizing radiation refers to radiation with an energy quantum that can polymerize or crosslink molecules in electromagnetic waves or charged particle beams, and ultraviolet rays (UV) or electron beams (EB) are generally used. In addition, charged particle beams such as electromagnetic waves, α rays, ionizing rays, etc., such as X-rays and gamma rays, can also be used. As the ionizing radiation curable functional group, ethylenically unsaturated bond groups such as (meth) acryloyl, vinyl, allyl, and epoxy, oxetane, etc. can be enumerated. The ionizing radiation curable compound preferably has two or more ionizing radiation curable functional groups.

[0140] As the ionizing radiation curable compound, a compound having an ethylenically unsaturated bond group is preferred. Among them, a (meth)acrylate compound having a (meth)acryloyl group is more preferred. As the (meth)acrylate compound, any of a monomer and an oligomer can be used. The (meth)acrylate compound is preferably a multifunctional (meth)acrylate compound. In this specification, a multifunctional (meth)acrylate compound refers to a compound having two or more (meth)acryloyl groups.

[0141] In this specification, the "polysilsesquioxane having one or more substituted reactive groups" described below is distinguished from the "(meth)acrylate compound." That is, in this specification, the term "(meth)acrylate compound" is a concept that does not include the "polysilsesquioxane having one or more substituted reactive groups."

[0142] The ionizing radiation curable compound preferably contains a polyfunctional (meth)acrylate compound. In other words, the low refractive index layer preferably contains a cured product of a polyfunctional (meth)acrylate compound as a binder component.

[0143] In order to improve the wiping properties of dirt, the multifunctional (meth)acrylate compound is more preferably a fluorine-containing multifunctional (meth)acrylate compound. In other words, the low refractive index layer more preferably contains a cured product of a fluorine-containing multifunctional (meth)acrylate compound as the binder component. The proportion of fluorine atoms in the fluorine-containing multifunctional (meth)acrylate compound is preferably 5% by mass or more and 80% by mass or less, and more preferably 10% by mass or more and 70% by mass or less.

[0144] The multifunctional (meth)acrylate compound preferably includes an oligomer. Monomers are more likely to uniformly arrange hollow particles than oligomers. Therefore, if only monomers are used as the multifunctional (meth)acrylate compound, Lσ / La may become too small. On the other hand, by including an oligomer as the multifunctional (meth)acrylate compound, Lσ / La can be easily adjusted to the above range.

[0145] The fluorine-containing polyfunctional (meth)acrylate compound may be a monomer or an oligomer, but is preferably an oligomer. The weight average molecular weight of the oligomer of the fluorine-containing polyfunctional (meth)acrylate compound is preferably 5,000 to 100,000, more preferably 5,000 to 50,000.

[0146] When the weight average molecular weight of the fluorine-containing compound is 5,000 or more, excellent antifouling properties can be obtained, and when it is 100,000 or less, good solubility in organic solvents can be obtained, making it easy to obtain a uniform and uniform surface.

[0147] In this specification, the weight average molecular weight refers to an average molecular weight measured by GPC analysis and converted into standard polystyrene.

[0148] The number of (meth)acryloyl groups in the oligomer of the fluorine-containing polyfunctional (meth)acrylate compound is preferably 2 or more and 8 or less, and more preferably 3 or more and 7 or less.

[0149] The ratio of the cured product of the fluorine-containing polyfunctional (meth)acrylate compound to the total amount of the binder component is preferably 50% by mass or more, more preferably 55% by mass or more, and even more preferably 65% ​​by mass or more.

[0150] The fluorine-containing polyfunctional (meth)acrylate compound preferably has a perfluoropolyether group. That is, the fluorine-containing polyfunctional (meth)acrylate compound preferably has a perfluoropolyether group.

[0151] Examples of the polyfunctional (meth)acrylate compound having a perfluoropolyether group include compounds described in JP-A-2010-285501.

[0152] The ionizing radiation curable compound can be used alone or in combination of two or more.

[0153] When the ionizing radiation-curable compound is an ultraviolet-curable compound, the low-refractive index layer coating liquid preferably contains additives such as a photopolymerization initiator and a photopolymerization accelerator.

[0154] Examples of the photopolymerization initiator include one or more selected from acetophenone, benzophenone, α-hydroxyalkylphenone, Michler's ketone, benzoin, benzoin dimethyl ether, benzoylbenzoate, α-acyl oxime ester, α-aminoalkylphenone, and thioxanthones.

[0155] The photopolymerization accelerator is a substance that can reduce polymerization hindrance caused by air during curing and accelerate the curing rate, and examples thereof include one or more selected from isoamyl p-dimethylaminobenzoate, ethyl p-dimethylaminobenzoate, and the like.

[0156] Another preferred curable compound is polysilsesquioxane. That is, the low refractive index layer preferably contains a cured product of polysilsesquioxane as a binder component.

[0157] By including a cured polysilsesquioxane as a binder component, the low refractive index layer can easily improve its scratch resistance. It is believed that the cured polysilsesquioxane not only improves the toughness of the layer surface, but also the toughness of the layer as a whole, thus easily improving the scratch resistance of the low refractive index layer. Furthermore, it is believed that the cured polysilsesquioxane has good adhesion to silica, thus easily improving the scratch resistance of the low refractive index layer.

[0158] Polysilsesquioxane is preferably used in combination with a fluorine-containing polyfunctional (meth)acrylate compound. That is, the adhesive component preferably contains a cured product of a fluorine-containing polyfunctional (meth)acrylate compound and a cured product of polysilsesquioxane.

[0159] The mass ratio of the fluorine-containing polyfunctional (meth)acrylate compound to the polysilsesquioxane is preferably 50:50 to 90:10, more preferably 60:40 to 80:20, and even more preferably 65:35 to 75:25. By setting the ratio within the above range, the wiping properties of dirt can be maintained and the scratch resistance can be improved.

[0160] As the adhesive component, it is also preferable to contain only a cured product of polysilsesquioxane. By containing only a cured product of polysilsesquioxane as the adhesive component, it is easy to make the scratch resistance extremely good.

[0161] Polysilsesquioxane is a polymer having a structural unit represented by the following general formula (1). In formula (1), R represents an organic group. Examples of the organic group include organic groups having reactive groups described below. The number of the structural units is preferably 4 or more and 30 or less.

[0162] [RSiO 1.5 ](1)

[0163] Examples of the structure of polysilsesquioxane include a random structure, a ladder structure, and a cage structure, among which the cage structure is preferred.

[0164] The polysilsesquioxane preferably has a reactive group substituted on at least one silicon atom in its structural unit. Polysilsesquioxanes substituted with one or more reactive groups readily react with the leveling agent described later, thereby easily securing the leveling agent within the low refractive index layer. Therefore, polysilsesquioxanes substituted with one or more reactive groups can easily improve long-term wipeability and scratch resistance. Furthermore, polysilsesquioxanes substituted with one or more reactive groups can easily reduce the proportion of siloxane bonds exposed on the surface side of the low refractive index layer, thereby easily improving chemical resistance.

[0165] Examples of the reactive group include a (meth)acryloyl group, a vinyl group, and an epoxy group, among which a (meth)acryloyl group is preferred.

[0166] More specific examples of the reactive functional group include (meth)acrylates, alkyl (meth)acrylates having 1 to 20 carbon atoms, cycloalkyl epoxides having 3 to 20 carbon atoms, and alkylcycloalkane epoxides having 1 to 10 carbon atoms.

[0167] The functional group equivalent weight (g / eq) of the reactive group of the polysilsesquioxane is preferably 50 to 1000, more preferably 100 to 500. By setting the functional group equivalent weight within the above range, polymerization shrinkage of the low refractive index layer can be suppressed, and the leveling agent can be easily fixed in the low refractive index layer.

[0168] Polysilsesquioxanes may have reactive groups substituted on at least one silicon atom in a structural unit, and further have non-reactive groups substituted on at least one silicon atom in a structural unit. Such polysilsesquioxanes can easily reduce the proportion of siloxane bonds exposed on the surface side of the low refractive index layer, thereby easily improving chemical resistance. Furthermore, polysilsesquioxanes substituted with non-reactive groups can easily suppress polymerization shrinkage of the low refractive index layer.

[0169] Examples of the non-reactive group include a linear or branched alkyl group having 1 to 20 carbon atoms, a cyclohexyl group having 6 to 20 carbon atoms, and an aryl group having 6 to 20 carbon atoms.

[0170] To improve the dispersibility of the low refractive index particles, the weight average molecular weight of the polysilsesquioxane is preferably 5000 or less, more preferably 4000 or less, and even more preferably 3000 or less. To increase the binding strength and storage modulus, the weight average molecular weight of the polysilsesquioxane is preferably 800 or more, more preferably 900 or more, and even more preferably 1000 or more.

[0171] Solid Particles

[0172] The low refractive index layer preferably also includes solid particles in addition to the hollow particles. By also including solid particles in addition to the hollow particles, it is possible to easily make the scratch resistance of the low refractive index layer good. In addition, by also including solid particles in addition to the hollow particles, the hollow particles are difficult for sedimentation in a wet state, and therefore it is easy to control the configuration of the hollow particles. Therefore, it is possible to easily make La and Lσ / La within the above range.

[0173] The material of the solid particles is preferably an inorganic compound such as silicon dioxide and magnesium fluoride, and more preferably silicon dioxide.

[0174] The average particle size of the solid particles is preferably smaller than that of the hollow particles. The lower limit of the average particle size of the solid particles is preferably 5 nm or more, more preferably 10 nm or more, and the upper limit is preferably 20 nm or less, more preferably 15 nm or less.

[0175] Examples of preferred ranges of the average particle size of the solid particles include 5 nm to 20 nm, 5 nm to 15 nm, 10 nm to 20 nm, and 10 nm to 15 nm.

[0176] From the viewpoint of further improving the scratch resistance, the content of the solid particles is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, relative to 100 parts by mass of the binder component.

[0177] On the other hand, if the content of solid particles is too high, the solid particles are easily aggregated, and the amount of the binder component covering the hollow particles is reduced, which may reduce the wiping property. Therefore, the content of solid particles is preferably 75 parts by mass or less, and more preferably 50 parts by mass or less, relative to 100 parts by mass of the binder component.

[0178] Preferred embodiments of the content of the solid particles relative to 100 parts by mass of the binder component include 10 parts by mass or more and 75 parts by mass or less, 10 parts by mass or more and 50 parts by mass or less, 20 parts by mass or more and 100 parts by mass or less, and 20 parts by mass or more and 50 parts by mass or less.

[0179] The lower limit of the refractive index of the low refractive index layer is preferably 1.10 or more, more preferably 1.20 or more, more preferably 1.26 or more, more preferably 1.28 or more, more preferably 1.30 or more, and the upper limit is preferably 1.48 or less, more preferably 1.45 or less, more preferably 1.40 or less, more preferably 1.38 or less, more preferably 1.35 or less.

[0180] In this specification, the refractive index of a layer constituting an antireflection layer such as a low refractive index layer and a high refractive index layer refers to a value at a wavelength of 589.3 nm.

[0181] Examples of preferred ranges of the refractive index of the low refractive index layer include 1.10 to 1.48, 1.10 to 1.45 to 1.40, 1.10 to 1.38 to 1.10 to 1.35, 1.20 to 1.48 to 1.20, 1.45 to 1.20, 1.20 to 1.40, 1.20 to 1.38 to 1.20 to 1.35, 1.26 to 1.48, and 1.26 to 1.48. 45 or less, 1.26 or more and less than 1.40, 1.26 or more and less than 1.38, 1.26 or more and less than 1.35, 1.28 or more and less than 1.48, 1.28 or more and less than 1.45, 1.28 or more and less than 1.40, 1.28 or more and less than 1.38, 1.28 or more and less than 1.35, 1.30 or more and less than 1.48, 1.30 or more and less than 1.45, 1.30 or more and less than 1.40, 1.30 or more and less than 1.38, 1.30 or more and less than 1.35.

[0182] Leveling Agent

[0183] The low refractive index layer preferably includes a leveling agent. By making the low refractive index layer include a leveling agent, it is possible to easily make the wiping property of dirt better. In order to easily play the above-mentioned role, the leveling agent is preferably a leveling agent with a reactive group. As the reactive group, (meth) acryloyl, vinyl and epoxy groups can be mentioned. Among them, (meth) acryloyl is preferred.

[0184] As leveling agents, silicone leveling agents and fluorine leveling agents can be mentioned. Silicone leveling agents can contain a small amount of fluorine atoms. Fluorine leveling agents can contain a small amount of silicon atoms.

[0185] To reduce environmental impact, silicone-based leveling agents that do not contain fluorine atoms are preferred. Using silicone-based leveling agents that do not contain fluorine atoms can easily suppress the emission of organic fluorine compounds (PFAS) during the manufacture, use, and disposal of anti-reflective components, thereby reducing environmental impact.

[0186] Fluorine-based leveling agents have relatively low hardness, so when further scratch resistance is required, silicone-based leveling agents may be used as the leveling agent.

[0187] The lower limit of the content of the leveling agent is preferably 0.1 parts by mass or more, more preferably 3 parts by mass or more, and further preferably 4 parts by mass or more, relative to 100 parts by mass of the adhesive component, and the upper limit is preferably 15 parts by mass or less, more preferably 10 parts by mass or less, and further preferably 6 parts by mass or less.

[0188] By setting the content of the leveling agent to be within the above range, it is possible to improve the wiping property of dirt and to easily suppress a decrease in the scratch resistance of the low refractive index layer.

[0189] The low refractive index layer may further contain additives such as an antistatic agent, an antioxidant, a surfactant, a dispersant, a light stabilizer, and an ultraviolet absorber.

[0190] The lower limit of the thickness T of the low refractive index layer is preferably 80 nm or more, more preferably 85 nm or more, more preferably 90 nm or more, and the upper limit is preferably 150 nm or less, more preferably 110 nm or less, more preferably 105 nm or less.

[0191] Embodiments of the preferred range of the thickness T of the low refractive index layer include 80 nm or more and 150 nm or less, 80 nm or more and 110 nm or less, 80 nm or more and 105 nm or less, 85 nm or more and 150 nm or less, 85 nm or more and 110 nm or less, 85 nm or more and 105 nm or less, 90 nm or more and 150 nm or less, 90 nm or more and 110 nm or less, and 90 nm or more and 105 nm or less.

[0192] In this specification, the thickness of each layer is calculated by selecting 20 arbitrary locations in a cross-sectional photograph of the antireflection member obtained using a scanning transmission electron microscope and taking the average value of the thickness at the 20 locations.

[0193] When the thickness of the low-refractive index layer is defined as T and the average particle size of the hollow particles is defined as D, T / D is preferably 0.80 or more and 1.30 or less. By setting T / D to 0.80 or more, it is possible to easily make the wiping property of dirt better. By setting T / D to 1.30 or less, it is possible to easily reduce the refractive index of the low-refractive index layer.

[0194] T / D is more preferably 0.82 or more and 1.28 or less, and even more preferably 0.84 or more and 1.26 or less.

[0195] Examples of preferred ranges of T / D include 0.80 to 1.30, 0.80 to 1.28, 0.80 to 1.26, 0.82 to 1.30, 0.82 to 1.28, 0.82 to 1.26, 0.84 to 1.30, 0.84 to 1.28, and 0.84 to 1.26.

[0196] The low refractive index layer can be formed by applying a low refractive index layer coating solution containing components constituting the low refractive index layer and a solvent, drying the solution, and curing the solution by irradiating the solution with ionizing radiation as needed.

[0197] Solvent

[0198] Examples of the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), and cyclohexanone; ethers such as dioxane and tetrahydrofuran; aliphatic hydrocarbons such as hexane; alicyclic hydrocarbons such as cyclohexane; aromatic hydrocarbons such as toluene and xylene; halogenated carbons such as dichloromethane and dichloroethane; esters such as methyl acetate, ethyl acetate, and butyl acetate; alcohols such as isopropyl alcohol, butanol, and cyclohexanol; cellosolves such as methyl cellosolve and ethyl cellosolve; glycol ethers such as propylene glycol monomethyl ether acetate; cellosolve acetates; sulfoxides such as dimethyl sulfoxide; amides such as dimethylformamide and dimethylacetamide; and mixtures thereof.

[0199] The solvent of the low-refractive-index layer coating solution preferably comprises a plurality of solvents having different evaporation rates. Specifically, it is preferred to comprise three solvents: a solvent having a slow evaporation rate, a solvent having a standard evaporation rate, and a solvent having a fast evaporation rate. By comprising a plurality of solvents, the solvent gradually evaporates, and thus the configuration of the hollow particles can be easily controlled.

[0200] On the other hand, when only one type of solvent is used, the solvent evaporates rapidly, so the arrangement of the hollow particles is easily disturbed. In addition, even when two types of solvents are used, namely, a solvent with a slow evaporation rate and a solvent with a fast evaporation rate, the fluidity of the coating film is also prone to change rapidly during the drying process of the coating film, so the arrangement of the hollow particles is easily disturbed.

[0201] In this specification, a solvent with a slow evaporation rate refers to a solvent having an evaporation rate of less than 70 when the evaporation rate of butyl acetate is set to 100. In this specification, a solvent with a standard evaporation rate refers to a solvent having an evaporation rate of 70 or more and less than 220 when the evaporation rate of butyl acetate is set to 100. In this specification, a solvent with a fast evaporation rate refers to a solvent having an evaporation rate of 220 or more when the evaporation rate of butyl acetate is set to 100.

[0202] Examples of solvents having a slow evaporation rate include cyclohexanone (evaporation rate 32), 1-methoxy-2-propyl acetate (evaporation rate 44), and propylene glycol monomethyl ether acetate (evaporation rate 44).

[0203] Examples of solvents whose evaporation rates are standard include butyl acetate (evaporation rate 100), methyl isobutyl ketone (evaporation rate 160), and toluene (evaporation rate 200).

[0204] Examples of solvents having a fast evaporation rate include methylcyclohexanone (evaporation rate 320) and methyl ethyl ketone (evaporation rate 370).

[0205] The ratio of the solvent having a slow evaporation rate to the total amount of the solvent is preferably 10% by mass or more and 50% by mass or less, and more preferably 15% by mass or more and 45% by mass or less.

[0206] The ratio of the solvent based on the evaporation rate to the total amount of the solvent is preferably 30% by mass or more and 70% by mass or less, and more preferably 35% by mass or more and 65% by mass or less.

[0207] The ratio of the solvent having a fast evaporation rate to the total amount of the solvent is preferably 5% by mass or more and 35% by mass or less, and more preferably 10% by mass or more and 30% by mass or less.

[0208] Drying Conditions

[0209] The drying temperature of the low-refractive-index layer coating liquid is preferably 30° C. or higher and 80° C. or lower, and more preferably 38° C. or higher and 70° C. or lower.

[0210] Setting the drying temperature to 38°C or higher can suppress excessive aggregation of the hollow particles, easily preventing Lσ / La from becoming excessively large. Setting the drying temperature to 70°C or lower can moderately aggregate the hollow particles, easily preventing Lσ / La from becoming excessively small.

[0211] The wind speed of the drying air for the low-refractive-index layer coating liquid is preferably from 0.1 m / s to 30 m / s, and more preferably from 0.3 m / s to 25 m / s.

[0212] <Hard Coating>

[0213] The antireflection member of the present disclosure preferably has a hard coating layer between the substrate and the low refractive index layer. The hard coating layer can easily improve the scratch resistance of the antireflection member.

[0214] When a high refractive index layer described below is further provided between the substrate and the low refractive index layer, it is preferred to provide a substrate, a hard coat layer, a high refractive index layer, and a low refractive index layer in this order.

[0215] The hard coat layer preferably comprises a cured product of a curable resin composition such as a thermosetting resin composition or an ionizing radiation curable resin composition as a main component, and more preferably comprises a cured product of an ionizing radiation curable resin composition as a main component. The main component refers to 50% by mass or more of the resin component constituting the hard coat layer, preferably 70% by mass or more, and more preferably 90% by mass or more.

[0216] Examples of curable resin compositions such as thermosetting resin compositions and ionizing radiation curable resin compositions include the same compositions exemplified for the low refractive index layer. The ionizing radiation curable compound used in the hard coat layer preferably contains a polyfunctional (meth)acrylate compound.

[0217] The lower limit of the thickness of the hard coat layer is preferably 0.5 μm or more, more preferably 1 μm or more, and the upper limit is preferably 30 μm or less, more preferably 20 μm or less, and even more preferably 15 μm or less. By setting the thickness of the hard coat layer within the above range, it is possible to achieve good scratch resistance and easily suppress the generation of cracks during processing such as cutting.

[0218] Examples of preferred ranges of the thickness of the hard coat layer include 0.5 μm to 30 μm, 0.5 μm to 20 μm, 0.5 μm to 15 μm, 1 μm to 30 μm, 1 μm to 20 μm, and 1 μm to 15 μm.

[0219] The hard coat layer may further contain additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant, a light stabilizer, and an ultraviolet absorber.

[0220] <Other layers>

[0221] The anti-reflection member may have other layers such as a high refractive index layer and an antistatic layer.

[0222] By having a high refractive index layer, the light reflectance Y value of the anti-reflection component can be easily reduced. Preferably, there is a high refractive index layer between the base material and the low refractive index layer. When further having the above-mentioned hard coat between the base material and the low refractive index layer, preferably there is base material, hard coat, high refractive index layer and low refractive index layer in sequence.

[0223] High refractive index layer

[0224] The high refractive index layer can for example be formed with a coating liquid by a high refractive index layer of a composition comprising an adhesive component and high refractive index particles. That is, the high refractive index layer preferably comprises an adhesive component and high refractive index particles. As the adhesive component, general natural resins and synthetic resins etc. can be enumerated.

[0225] The binder component of the high refractive index layer preferably comprises a cured product of a curable resin composition. The cured product of the curable resin composition is preferably 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and most preferably 100% by mass relative to the ratio of the total binder components of the high refractive index layer.

[0226] As the curable resin composition of the high refractive index layer, a thermosetting resin composition or an ionizing radiation curable resin composition can be mentioned, preferably an ionizing radiation curable resin composition. The curable resin composition such as a thermosetting resin composition or an ionizing radiation curable resin composition can be mentioned by the same composition as exemplified in the low refractive index layer. The ionizing radiation curable compound used in the high refractive index layer preferably comprises a multifunctional (meth)acrylate compound.

[0227] Examples of the high refractive index particles include antimony pentoxide, zinc oxide, titanium oxide, cerium oxide, tin-doped indium oxide, antimony-doped tin oxide, yttrium oxide, and zirconium oxide.

[0228] The average particle size of the high refractive index particles is preferably 2 nm or more, more preferably 5 nm or more, and even more preferably 10 nm or more. From the viewpoint of whitening suppression and transparency, the average particle size of the high refractive index particles is preferably 200 nm or less, more preferably 100 nm or less, more preferably 80 nm or less, more preferably 60 nm or less, and even more preferably 30 nm or less.

[0229] Examples of preferred ranges of the average particle size of the high refractive index particles include 2 nm and 200 nm, 2 nm and 100 nm, 2 nm and 80 nm, 2 nm and 60 nm, 2 nm and 30 nm, 5 nm and 200 nm, 5 nm and 100 nm, 5 nm and 80 nm, 5 nm and 60 nm, 5 nm and 30 nm, 10 nm and 200 nm, 10 nm and 100 nm, 10 nm and 80 nm, 10 nm and 60 nm, and 10 nm and 30 nm.

[0230] The lower limit of the content of the high refractive index particles relative to 100 parts by mass of the binder component is preferably 100 parts by mass or more, more preferably 150 parts by mass or more, and further preferably 250 parts by mass or more, and the upper limit is preferably 500 parts by mass or less, more preferably 400 parts by mass or less, and further preferably 350 parts by mass or less.

[0231] Embodiments of the preferred range of the content of the high refractive index particles relative to 100 parts by mass of the binder component include 100 parts by mass or more and 500 parts by mass or less, 100 parts by mass or more and 400 parts by mass or less, 100 parts by mass or more and 350 parts by mass or less, 150 parts by mass or more and 500 parts by mass or less, 150 parts by mass or more and 400 parts by mass or less, 150 parts by mass or more and 350 parts by mass or less, 250 parts by mass or more and 500 parts by mass or less, 250 parts by mass or more and 400 parts by mass or less, and 250 parts by mass or more and 350 parts by mass or less.

[0232] The lower limit of the refractive index of the high refractive index layer is preferably 1.53 or more, more preferably 1.54 or more, more preferably 1.55 or more, more preferably 1.56 or more, and the upper limit is preferably 1.85 or less, more preferably 1.80 or less, more preferably 1.78 or less, more preferably 1.77 or less.

[0233] Examples of preferred ranges of the refractive index of the high refractive index layer include 1.53 or more and 1.85 or less, 1.53 or more and 1.80 or less, 1.53 or more and 1.78 or less, 1.53 or more and 1.77 or less, 1.54 or more and 1.85 or less, 1.54 or more and 1.80 or less, 1.54 or more and 1.78 or less, 1.54 or more and 1.77 or less, 1.55 or more and 1.85 or less, 1.55 or more and 1.80 or less, 1.55 or more and 1.78 or less, 1.55 or more and 1.77 or less, 1.56 or more and 1.85 or less, 1.56 or more and 1.80 or less, 1.56 or more and 1.78 or less, and 1.56 or more and 1.77 or less.

[0234] The upper limit of the thickness of the high refractive index layer is preferably 200 nm or less, more preferably 185 nm or less, and even more preferably 175 nm or less, and the lower limit is preferably 50 nm or more, and more preferably 70 nm or more.

[0235] Examples of preferred ranges of the thickness of the high refractive index layer include 50 nm to 200 nm, 50 nm to 185 nm, 50 nm to 175 nm, 70 nm to 200 nm, 70 nm to 185 nm, and 70 nm to 175 nm.

[0236] The high refractive index layer may further contain additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant, a light stabilizer, and an ultraviolet absorber.

[0237] <Element Ratio>

[0238] The antireflection member of the present disclosure preferably has an element ratio analyzed by X-ray photoelectron spectroscopy on the surface region of the low refractive index layer side of the antireflection member that satisfies the following condition 1. In this specification, "X-ray photoelectron spectroscopy" may be referred to as "XPS."

[0239] In this specification, the element ratio refers to the average value of 10 measured values.

[0240] Condition 1

[0241] The ratio of the F element obtained by analyzing the surface region of the low refractive index layer side of the antireflection member by X-ray photoelectron spectroscopy is 28.0 atomic % or more and 42.0 atomic % or less.

[0242] By setting the ratio of the F element to be within the above range, it is possible to easily improve the wiping property of dirt. The F element is preferably an element derived from a binder component and / or a fluorine-based leveling agent.

[0243] In Condition 1, the ratio of the F element is more preferably 29.0 atomic % or more and 40.0 atomic % or less.

[0244] In this specification, the surface of the anti-reflection component on the low-refractive index layer side refers to the surface of the anti-reflection component on the side opposite to the substrate. In this specification, the surface area of ​​the anti-reflection component on the low-refractive index layer side refers to the area from the reference point to 80 nm in the thickness direction when the surface is used as the reference point.

[0245] In order to reduce environmental load, the antireflection member of the present disclosure preferably has an element ratio analyzed by X-ray photoelectron spectroscopy on the surface region of the antireflection member on the low refractive index layer side that satisfies the following condition 2.

[0246] Condition 2

[0247] The ratio of the F element, which is determined by X-ray photoelectron spectroscopy analysis of the surface region of the low-refractive-index layer side of the antireflection member, is 0.5 atomic % or less.

[0248] In condition 2, the ratio of the F element is more preferably 0.3 atomic % or less, and further preferably 0.1 atomic % or less.

[0249] <Surface shape>

[0250] As described above, La (the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer) is calculated from a scanning electron microscope image of the surface on the low refractive index layer side. In other words, La is a parameter that directly evaluates the distance between the hollow particles.

[0251] In contrast, the arithmetic mean roughness Ra is a value obtained by extracting a reference length from the roughness curve along its mean line and dividing the area of ​​the extracted portion by the reference length. In other words, the arithmetic mean roughness Ra of the surface of the low refractive index layer side of the anti-reflection component indicates the surface properties but is not a parameter for evaluating the height of the irregularities caused by the hollow particles.

[0252] The arithmetic mean roughness Ra of the surface on the low refractive index layer side of the antireflection member is preferably 4.0 nm to 15.0 nm, more preferably 4.5 nm to 14.5 nm, and even more preferably 5.0 nm to 14.0 nm.

[0253] When Ra is less than 4.0 nm, La and / or Lσ / La may become too small. When Ra exceeds 15.0 nm, La and / or Lσ / La may become too large.

[0254] The smoother the surface of the antireflection member, the better the scratch resistance tends to be. In order to achieve good scratch resistance, Ra is particularly preferably 10.0 nm or less.

[0255] Implementation examples of the preferred range of Ra include 4.0 nm to 15.0 nm, 4.0 nm to 14.5 nm, 4.0 nm to 14.0 nm, 4.0 nm to 10.0 nm, 4.5 nm to 15.0 nm, 4.5 nm to 14.5 nm, 4.5 nm to 14.0 nm, 4.5 nm to 10.0 nm, 5.0 nm to 15.0 nm, 5.0 nm to 14.5 nm, 5.0 nm to 14.0 nm, and 5.0 nm to 10.0 nm.

[0256] In this specification, Ra means the average value of the measured values ​​at 10 locations. In this specification, Ra can be measured in accordance with JIS B0601:1994.

[0257] <Pure water falling angle>

[0258] In the antireflection member of the present disclosure, the pure water roll-off angle of the surface of the antireflection member on the low refractive index layer side is preferably 80 degrees or less, more preferably 60 degrees or less, and even more preferably 50 degrees or less. The lower limit of the pure water roll-off angle is preferably 10 degrees or more, and more preferably 12 degrees or more.

[0259] By setting the pure water sliding angle to 80 degrees or less, it is possible to improve the wiping property of dirt.

[0260] Examples of preferred ranges of the pure water fall angle include 10 degrees to 80 degrees, 10 degrees to 60 degrees, 10 degrees to 50 degrees, 12 degrees to 80 degrees, 12 degrees to 60 degrees, and 12 degrees to 50 degrees.

[0261] <Hexadecane Slip Angle>

[0262] In the antireflection member of the present disclosure, the upper limit of the hexadecane slide angle of the low refractive index layer-side surface of the antireflection member is preferably 50 degrees or less, more preferably 45 degrees or less, and the lower limit is preferably 8 degrees or more, more preferably 10 degrees or more.

[0263] Examples of preferred ranges of the hexadecane slide angle include 8 degrees to 50 degrees, 8 degrees to 45 degrees, 10 degrees to 50 degrees, and 10 degrees to 45 degrees.

[0264] In this specification, the pure water slide angle and the hexadecane slide angle refer to the average value of 10 measured values.

[0265] In this specification, the "pure water slide angle" is measured according to the following procedures (1) to (3).

[0266] General-purpose pure water is used as pure water. Pure water generally has a resistivity of 0.1 MΩ·cm or more and 15 MΩ·cm or less.

[0267] In this specification, the "hexadecane slide angle" can be measured by replacing "pure water" with "hexadecane" in the following steps (1) to (3).

[0268] (1) Cut a 2 cm x 8 cm sample from the anti-reflection component. Apply double-sided tape to the substrate side of the sample and secure the sample to a horizontal table with a 0-degree inclination angle through the double-sided tape. The double-sided tape should be at least 8 cm long and 5 mm wide. When securing the sample to the table, ensure that the sample does not wrinkle and that air bubbles do not enter between the sample and the table.

[0269] (2) 15 μL of pure water was added dropwise to the surface of the sample on the low refractive index layer side.

[0270] (3) The stage on which the sample is placed is gradually tilted at a rate of 2 degrees per second. When the tip of the droplet moves more than 0.2835 mm, the droplet is judged to be flowing down. The angle of the stage when the droplet flows down is referred to as the "pure water sliding angle." The "stage angle" refers to the angle between the horizontal plane and the plane of the stage.

[0271] <Pencil Hardness>

[0272] In order to improve the scratch resistance, the pencil hardness of the surface of the low refractive index layer side of the antireflection member is preferably 2H or higher, more preferably 3H or higher.

[0273] In this specification, pencil hardness is measured in accordance with JIS K5600-5-4:1999 under the conditions of a load of 500 g and a speed of 1.4 mm / sec.

[0274] The pencil hardness test was performed five times on each sample. The pencil hardness value for each sample was determined when no visual abnormalities, such as scratches, were observed four or more times. For example, if no visual abnormalities were observed four times out of five tests using a 2H pencil, the pencil hardness for that sample was 2H. Visual abnormalities did not include discoloration, but only scratches and dents were observed.

[0275] <Optical Characteristics>

[0276] The total light transmittance of the antireflection member in accordance with JIS K7361-1:1997 is preferably 70% or higher, more preferably 80% or higher, and even more preferably 85% or higher.

[0277] The light incident surface when measuring the total light transmittance and the haze described later is the side opposite to the surface on the low refractive index layer side.

[0278] In this specification, the total light transmittance, haze, and light reflectance Y value refer to the average value of 10 measured values.

[0279] The haze of the antireflection member according to JIS K7136:2000 is preferably 1.0% or less, more preferably 0.7% or less, and even more preferably 0.5% or less. A haze of 1.0% or less facilitates good image resolution. While the lower limit of the haze is not particularly limited, it is generally preferably 0.03% or more, and more preferably 0.06% or more.

[0280] Preferred embodiments of the haze range of the antireflection member include 0.03% to 1.0%, 0.06% to 1.0%, 0.03% to 0.7%, 0.06% to 0.7%, 0.03% to 0.5%, and 0.06% to 0.5%.

[0281] <Light reflectance Y value>

[0282] The antireflection member of the present disclosure preferably has a light reflectance Y value of 0.80% or less, more preferably 0.70% or less, further preferably 0.65% or less, and particularly preferably 0.25% or less, measured from the low refractive index layer side at a light incident angle of 5 degrees.

[0283] In this disclosure, the light reflectance Y value is measured as follows: a sample is prepared by attaching a black plate to the substrate-side surface of an antireflection member via a transparent adhesive layer. Light is incident on the sample from the low-refractive-index layer side at an incident angle of 5°. The light source conditions for calculating the reflectance are preferably D65 light sources.

[0284] The difference in refractive index between the component in contact with the transparent adhesive layer of the sample and the transparent adhesive layer is preferably within 0.15, more preferably within 0.10, and even more preferably within 0.05. The component in contact with the transparent adhesive layer of the sample is, for example, a substrate. The black plate preferably has a total light transmittance of 1% or less, more preferably 0%, according to JIS K7361-1:1997. The difference in refractive index between the resin constituting the black plate and the transparent adhesive layer is preferably within 0.15, more preferably within 0.10, and even more preferably within 0.05.

[0285] <Size, shape, etc.>

[0286] The anti-reflection component may be in the form of a single leaf cut to a specified size, or in the form of a roll formed from a long sheet. The size of the single leaf is not particularly limited, but the maximum diameter is approximately 2 inches to 500 inches. "Maximum diameter" refers to the maximum length connecting any two points of the anti-reflection component. If the anti-reflection component is rectangular, the maximum diameter is the diagonal of the rectangle. If the anti-reflection component is circular, the maximum diameter is the diameter of the circle.

[0287] The width and length of the roll are not particularly limited; however, the width is typically between 500 mm and 3000 mm, and the length is between 500 m and 5000 m. The roll-shaped anti-reflection member can be cut into individual leaves according to the size of the image display device, etc. When cutting, it is preferable to exclude the ends of the roll, where physical properties are unstable.

[0288] The shape of the individual leaves is not particularly limited; for example, they can be polygonal shapes such as triangles, rectangles, and pentagons, or they can be circular or randomly amorphous. More specifically, when the anti-reflection member is rectangular, the aspect ratio is not particularly limited as long as it is suitable for use as a display screen. Examples include aspect ratios of 1:1, 4:3, 16:10, 16:9, and 2:1.

[0289] [Polarizing plate]

[0290] The polarizing plate disclosed herein is a polarizing plate comprising a polarizing element, a first transparent protective plate arranged on one side of the polarizing element, and a second transparent protective plate arranged on the other side of the polarizing element, wherein either the first transparent protective plate or the second transparent protective plate is the anti-reflection component disclosed herein above, and is arranged in such a manner that the surface of the anti-reflection component on the side of the low refractive index layer faces the opposite side of the polarizing element.

[0291] Polarizing plates are used to impart antireflection properties by, for example, combining them with a λ / 4 retardation plate. In this case, the λ / 4 retardation plate is placed on the display element of the image display device, and the polarizing plate is placed closer to the viewer than the λ / 4 retardation plate.

[0292] In the application of liquid crystal display devices, polarizers are used to give the function of liquid crystal light valves. In this case, the liquid crystal display device is configured in the order of a lower polarizer, a liquid crystal display element, and an upper polarizer from the backlight side, and the absorption axis of the polarizer of the lower polarizer is configured orthogonally to the absorption axis of the polarizer of the upper polarizer. In the configuration of the liquid crystal display device, the polarizer of the present invention can be used as the upper polarizer and the lower polarizer, and the polarizer of the present invention is preferably used as the upper polarizer. In the upper polarizer, as a transparent protective plate on the light emitting side of the polarizer, the anti-reflection component of the present invention is preferably used. In the lower polarizer, as a transparent protective plate on the light incident side of the polarizer, the anti-reflection component of the present invention is preferably used.

[0293] <Transparent protective plate>

[0294] The polarizing plate of the present disclosure includes the antireflection member of the present disclosure as at least one of the first transparent protective plate and the second transparent protective plate. In a preferred embodiment, both the first transparent protective plate and the second transparent protective plate include the antireflection member of the present disclosure.

[0295] When one of the first transparent protective plate and the second transparent protective plate includes the above-mentioned antireflection member of the present disclosure, the other transparent protective plate is preferably an optically isotropic transparent protective plate.

[0296] In this specification, optical isotropy means that the in-plane retardation is 20 nm or less, preferably 10 nm or less, and more preferably 5 nm or less. Acrylic films and triacetylcellulose (TAC) films can be easily imparted with optical isotropy.

[0297] When one of the first transparent protective plate and the second transparent protective plate includes the above-mentioned antireflection member of the present disclosure, it is preferred that the transparent protective plate on the light-emitting side includes the above-mentioned antireflection member of the present disclosure.

[0298] <Polarizing Element>

[0299] Examples of polarizing elements include sheet-type polarizing elements such as polyvinyl alcohol films, polyvinyl formal films, polyvinyl acetal films, and saponified films of ethylene-vinyl acetate copolymers dyed with iodine or the like and stretched; wire-grid polarizing elements composed of a large number of parallel metal wires; coated polarizing elements coated with lyotropic liquid crystals or dichroic host-guest materials; and multilayer thin-film polarizing elements. These polarizing elements may be reflective polarizing elements that reflect polarized components that are not transmitted.

[0300] [panel]

[0301] The panel disclosed herein comprises: a display element; and an optical film disposed on the light emitting surface side of the display element, wherein the optical film comprises the anti-reflection member disclosed herein, the anti-reflection member being disposed such that the surface of the anti-reflection member on the side of the low refractive index layer faces the side opposite to the display element, and the anti-reflection member is disposed on the outermost surface (refer to FIG. Figure 2 ).

[0302] Examples of display elements include liquid crystal display elements, EL display elements such as organic EL display elements and inorganic EL display elements, plasma display elements, and LED display elements such as micro LED display elements. These display elements may have a touch panel function inside the display element.

[0303] Examples of the liquid crystal display method of the liquid crystal display element include an IPS method, a VA method, a multi-domain method, an OCB method, an STN method, and a TSTN method.

[0304] The panel disclosed herein may be a panel with a touch panel having a touch panel between a display element and an anti-reflection component. In this case, the anti-reflection component is disposed on the outermost surface of the panel with a touch panel, with the low refractive index layer of the anti-reflection component facing the side opposite to the display element.

[0305] The size of the panel is not particularly limited, but the maximum diameter is approximately 2 inches to 500 inches. The maximum diameter refers to the maximum length when any two points within the surface of the panel are connected.

[0306] [Image Display Device]

[0307] The image display device of the present disclosure includes the panel of the present disclosure, and the anti-reflection member is disposed on the outermost surface.

[0308] The image display device of the present disclosure preferably further includes a drive control unit electrically connected to the panel, and a housing that houses the panel, the drive control unit, and the like.

[0309] When the display element is a liquid crystal display element, the image display device of the present disclosure requires a backlight. The backlight is arranged on the side of the liquid crystal display element opposite to the light emitting surface.

[0310] The size of the image display device is not particularly limited, but the maximum diameter of the effective display area is approximately not less than 2 inches and not more than 500 inches.

[0311] The effective display area of ​​an image display device refers to an area where an image can be displayed. For example, when the image display device includes a housing surrounding a display element, the area inside the housing becomes the effective display area.

[0312] The maximum diameter of the effective display area is the maximum length when connecting any two points within the effective display area. For example, if the effective display area is rectangular, the diagonal of the rectangle is the maximum diameter. If the effective display area is circular, the diameter of the circle is the maximum diameter.

[0313] [Anti-reflective items]

[0314] The antireflection article of the present disclosure is arranged on a component such that the low refractive index layer side of the antireflection member of the present disclosure faces the opposite side of the component, and the antireflection member is arranged on the outermost surface.

[0315] The member and the antireflection member are preferably laminated with an adhesive layer interposed therebetween.

[0316] Examples of the parts include dashboards, clocks, display cases, display cases, and windows. The parts may be transparent or opaque, and the color tone is not particularly limited.

[0317] [How to select anti-reflection materials]

[0318] In the method for selecting an anti-reflection member disclosed in the present invention, it is determined whether the following (1) to (4) are satisfied, and an anti-reflection member satisfying the following (1) to (4) is selected.

[0319] (1) An antireflection member having a low refractive index layer on a substrate.

[0320] (2) The low refractive index layer contains a binder component and hollow particles.

[0321] (3) The average particle size of the hollow particles exceeds 75.0 nm and is 140.0 nm or less.

[0322] (4) When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is greater than or equal to 105.0 nm and less than or equal to 142.0 nm, and Lσ / La is greater than or equal to 0.100 and less than or equal to 0.300.

[0323] The method for selecting an antireflection member disclosed in the present invention can efficiently select an antireflection member having good dirt wiping properties by selecting an antireflection member that satisfies the above-mentioned (1) to (4).

[0324] The preferred embodiments of (1) to (4) described above are in accordance with the preferred embodiments of the antireflection member of the present disclosure described above.

[0325] Regarding the above (1), for example, "an antireflection member having a substrate, a hard coat layer, and a low refractive index layer in this order" is preferred.

[0326] Regarding the above-mentioned (2), for example, a cured product containing a fluorine-containing polyfunctional (meth)acrylate compound is preferably used as the binder component.

[0327] Regarding the above (3), for example, the average particle size of the hollow particles is preferably 90.0 nm or more and 120.0 nm or less.

[0328] Regarding the above (4), for example, it is preferable that La is 107.0 nm or more and 139.0 nm or less, and Lσ / La is 0.101 or more and 0.295 or less.

[0329] The method for selecting an anti-reflection member disclosed herein preferably further includes additional determination conditions. The additional determination conditions may be one or more selected from the preferred embodiments exemplified in the anti-reflection member disclosed herein.

[0330] Specific examples of additional determination conditions include the following (5) to (8). That is, the method for selecting an anti-reflection component disclosed herein preferably includes one or more determination conditions selected from the following (5) to (8). Preferred embodiments of the following (5) to (8) are based on the preferred embodiments of the anti-reflection component disclosed herein.

[0331] (5) The arithmetic mean roughness Ra of the surface of the antireflection member on the low refractive index layer side is 4.0 nm or more and 15.0 nm or less.

[0332] (6) The ratio of the F element, as determined by X-ray photoelectron spectroscopy analysis of a surface region of the antireflection member on the low refractive index layer side, is 28.0 atomic % or more and 42.0 atomic % or less.

[0333] (7) The pure water roll-off angle of the surface of the antireflection member on the low refractive index layer side is 75 degrees or less.

[0334] (8) The light reflectance Y value measured from the low refractive index layer side at a light incident angle of 5 degrees is 0.80% or less.

[0335] This disclosure includes the following <1> ~ <20> .

[0336] <1> An anti-reflection component comprising a low-refractive-index layer on a substrate, wherein:

[0337] The low refractive index layer comprises a binder component and hollow particles,

[0338] The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm.

[0339] When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is 105.0 nm to 142.0 nm, and Lσ / La is 0.100 to 0.300.

[0340] <2> according to <1> The anti-reflection component has Lσ of 7 nm to 35 nm.

[0341] <3> according to <1> or <2> In the antireflection member, when the average particle size of the hollow particles is defined as D and the standard deviation of the particle size of the hollow particles is defined as Dσ, Dσ / D is equal to or greater than 0.09.

[0342] <4> according to <1> ~ <3> The antireflection member according to any one of the preceding claims, wherein, when the thickness of the low refractive index layer is defined as T and the average particle size of the hollow particles is defined as D, T / D is 0.80 or more and 1.30 or less.

[0343] <5> according to <1> ~ <4> The anti-reflection member according to any one of the preceding claims, wherein the hollow particles are hollow silica particles.

[0344] <6> according to <1> ~ <5> The anti-reflection member described in any one of the preceding claims, wherein the low refractive index layer further comprises solid particles.

[0345] <7> according to <1> ~ <6> The antireflection member according to any one of the preceding claims, wherein the binder component comprises a cured product of a fluorine-containing polyfunctional (meth)acrylate compound.

[0346] <8> according to <1> ~ <7> The antireflection member according to any one of the preceding claims, wherein the binder component includes a cured product of polysilsesquioxane.

[0347] <9> according to <1> ~ <8> The antireflection member according to any one of the preceding claims, wherein the arithmetic mean roughness Ra of the surface of the antireflection member on the low refractive index layer side is 4.0 nm or more and 15.0 nm or less.

[0348] <10> according to <1> ~ <9> The anti-reflection member according to any one of the preceding claims, wherein a ratio of F element, as determined by X-ray photoelectron spectroscopy analysis of a surface region of the anti-reflection member on the low refractive index layer side, is 28.0 atomic % or more and 42.0 atomic % or less.

[0349] <11> according to <1> ~ <9> The anti-reflection member according to any one of the preceding claims, wherein a ratio of F element, as determined by X-ray photoelectron spectroscopy analysis of a surface region of the anti-reflection member on the low-refractive index layer side, is 0.5 atomic % or less.

[0350] <12> according to <1> ~ <11> The antireflection member according to any one of the preceding claims, wherein a pure water roll-off angle of a surface of the antireflection member on the low refractive index layer side is 80 degrees or less.

[0351] <13> according to <1> ~ <12> The antireflection member according to any one of the preceding claims, wherein a hexadecane slide angle of a surface of the antireflection member on the low refractive index layer side is 50 degrees or less.

[0352] <14> according to <1> ~ <13> The antireflection member according to any one of the preceding claims, further comprising a hard coating layer between the substrate and the low refractive index layer.

[0353] <15> according to <1> ~ <14> The antireflection member according to any one of the preceding claims, further comprising a high refractive index layer between the substrate and the low refractive index layer.

[0354] <16> A polarizing plate comprising a polarizing element, a first transparent protective plate disposed on one side of the polarizing element, and a second transparent protective plate disposed on the other side of the polarizing element, wherein either the first transparent protective plate or the second transparent protective plate is <1> ~ <15> The anti-reflection member according to any one of the preceding claims, wherein the anti-reflection member is arranged such that a surface on the low refractive index layer side faces a side opposite to the polarizing element.

[0355] <17> An image display panel includes a display element and an optical film disposed on the light emitting surface side of the display element, wherein the optical film comprises <1> ~ <15> The antireflection member described in any one of the preceding claims is disposed such that the surface of the antireflection member on the low refractive index layer side faces the opposite side to the display element, and the antireflection member is disposed on the outermost surface.

[0356] <18> An image display device comprising <17> The image display panel is provided, and the anti-reflection component is arranged on the outermost surface.

[0357] <19> An anti-reflective article, wherein, on a component, <1> ~ <15> The antireflection member according to any one of the preceding claims is disposed so that the surface on the low refractive index layer side faces the opposite side of the member, and the antireflection member is disposed on the outermost surface.

[0358] <20> A method for selecting an anti-reflection component, wherein it is determined whether the following (1) to (4) are satisfied, and an anti-reflection component satisfying the following (1) to (4) is selected.

[0359] (1) An antireflection member having a low refractive index layer on a substrate.

[0360] (2) The low refractive index layer contains a binder component and hollow particles.

[0361] (3) The average particle size of the hollow particles exceeds 75.0 nm and is 140.0 nm or less.

[0362] (4) When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is greater than or equal to 105.0 nm and less than or equal to 142.0 nm, and Lσ / La is greater than or equal to 0.100 and less than or equal to 0.300.

[0363] Example

[0364] Next, the present disclosure will be described in more detail with reference to Examples, but the present disclosure is not limited to these Examples. Unless otherwise specified, "parts" and "%" are based on mass.

[0365] 1. Measurement and evaluation

[0366] The antireflection members of Examples and Comparative Examples were measured and evaluated as follows.

[0367] The atmosphere during each measurement and evaluation was set to a temperature of 23±5°C and a relative humidity of 40% to 65%. Before starting each measurement and evaluation, the target sample was exposed to the above atmosphere for 30 minutes to 60 minutes before measurement and evaluation.

[0368] The samples used in each measurement and evaluation can be prepared by cutting the antireflection members of Examples and Comparative Examples. The cut portions are selected from random locations after visually confirming that there are no abnormalities such as dust or scratches.

[0369] 1-1. Determination of La, Lσ, and Lσ / La

[0370] For the antireflection members of Examples and Comparative Examples, the average value "La" of the distance between the centers of gravity of the hollow particles in the low refractive index layer, the standard deviation "Lσ" of the distance between the centers of gravity of the hollow particles in the low refractive index layer, and "Lσ / La" were measured.

[0371] The measurement was carried out according to the steps (1) to (5) in the main text of the specification. The scanning electron microscope (SEM) used in (1) was a Hitachi High-Technologies Corporation SU-9000, with an accelerating voltage of 30 kV. The image analysis in the step (2) was specifically carried out according to the following steps (a) to (h). For image analysis, the free image analysis software "ImageJ" (Version 1.54b) developed by the National Institutes of Health (NIH) of the United States and "Fiji", a plug-in package for the software, were used.

[0372] <Image Analysis Step>

[0373] (a) Image selection

[0374] In the free image analysis software "Trade Name: ImageJ", select the "Open" command from the "File" tab.

[0375] An image to be processed is selected from the displayed images.

[0376] (b) Image resizing

[0377] Select the "Adjust" command from the "Image" tab.

[0378] In the displayed "Resize" screen, set "Width" to "1208" and "Hight" to "906." Also, check "Constrain aspect ratio" and "Average when downsizing." Set "Interpolation" to "Bilinear."

[0379] (c) Image shearing

[0380] Select the "Crop" command from the "Image" tab. This will crop the area to be analyzed from the image.

[0381] (d) Filter processing

[0382] Display the cropped image and select the "KuwaharaFilter" command in the "Filters" command from the "Process" tab.

[0383] In the displayed screen, enter "5" in the "Sampling window width" item.

[0384] (e) Binarization

[0385] From the "Image" tab, select the "Auto Local Threshold" command in the "Adjust" command.

[0386] In the displayed screen, select "Median" from the "Method" item. Enter "30" for the "Radius" item. Enter "0" for both the "Parameter1" and "Parameter2" items. Check the "White objects on black background" item.

[0387] (f) Noise Removal 1

[0388] From the "Tag" process, select the "Despeckle" item in the "Noise" instruction.

[0389] (g) Particle separation

[0390] From the "Tags" process, select the project "Watershed" in the instruction "Binary".

[0391] (h) Noise Removal 2

[0392] From the "Tags" process, select the "Open" item in the "Binary" instruction.

[0393] Furthermore, in step (4), the plug-in set "Fiji" is used to analyze the center of gravity coordinates through the following steps.

[0394] <Barycentric Coordinate Analysis Steps>

[0395] Select Analyze Particles from the Analyze tab.

[0396] In the displayed screen, select "0-Infunity" for "Size" and "Nothing" for "Show." Enter "0.00-1.00" for "Circularity." Check "Display results" and "Clear results."

[0397] 1-2. Average particle size D

[0398] For the antireflection members of Examples and Comparative Examples, the average particle size "D" of the hollow particles in the low refractive index layer was measured.

[0399] The measurement was performed according to the procedures A1 to A3 in the main text of the specification. The standard deviation "Dσ" of the hollow particle diameter was calculated from the particle diameter of 90% of the hollow particles obtained in the procedure A3.

[0400] The sample with the cross section of the antireflection member exposed in step A1 was produced according to the following steps X1 to X2.

[0401] X1: The anti-reflection member was cut into strips of 10 mm in length and 3 mm in width to prepare cut samples.

[0402] Next, after placing the cut sample in the silicon embedding plate, embedding resin was poured in. The plate was then left at room temperature for 12 hours to cure the embedding resin. The cut sample and the embedded resin were then removed from the silicon embedding plate, creating an embedded sample in which the cut sample was embedded in the resin. A silicon embedding material manufactured by Dosaka EM was used as the silicon embedding plate. The embedding epoxy resin used was, for example, a mixture of "EPOFIX" (trade name) manufactured by Struers and "EPOFIX Curing Agent" (trade name) manufactured by the same company at a ratio of 10:1.2.

[0403] X2: The block-shaped embedded sample is cut vertically with a microtome to prepare a slice sample in which the cross section of the anti-reflection member is exposed.

[0404] A microtome (trade name "Ultra Microtome EMUC7" manufactured by Leica MicroSystems) was used as a microtome. First, the embedded sample block was roughly cut with a glass knife to create a cross-section (rough trimming) of approximately 100 μm long x 20 μm wide, including the coated surface. This surface was cut using a diamond knife at a speed of 1.40 mm / s and a feed of 80 nm, allowing it to float on water. The sections above the water were collected using a screen (collodion film-coated screen manufactured by Nissin EM (Cat. No. 651)).

[0405] 1-3. Arithmetic mean roughness Ra

[0406] The anti-reflection components of the examples and comparative examples were cut into 1 cm × 0.5 cm pieces. The cut portion was selected from a random portion after visually confirming that there were no abnormalities such as dust and scratches. The substrate side of the cut anti-reflection component was fixed to the AFM sample stage with a carbon double-sided tape manufactured by Nissin EM. Using a scanning probe microscope ("SPM-9700" manufactured by Shimadzu Corporation), the surface shape of the low refractive index layer side was measured under the following measurement conditions, and the arithmetic mean roughness Ra was calculated.

[0407] <Measurement Conditions>

[0408] Device: Trade name "SPM-9700" manufactured by Shimadzu Corporation

[0409] Observation Mode: Phase

[0410] Scanner: 10μm (Head Up Base)

[0411] Cantilever: NCHR

[0412] Scanning range (R): 5.0 μm

[0413] Scan speed (E): 2.0Hz

[0414] Number of pixels: 512×512

[0415] 1-4.XPS analysis

[0416] Measurement samples were cut from the antireflection members of the Examples and Comparative Examples. Using an X-ray photoelectron spectrometer, under the conditions described below, the X-ray photoelectron spectra of the C1s orbital, O1s orbital, Si2p orbital, and F1s orbital on the surface of the low-refractive-index layer of each measurement sample were measured. Peak separation was performed on each X-ray photoelectron spectrum to determine the ratio of the F element relative to the total elements.

[0417] <Measurement>

[0418] Device: Shimadzu Corporation, trade name "AXIS-NOVA"

[0419] X-ray source: AlKα

[0420] X-ray output: 150W

[0421] Emission current: 10mA

[0422] Accelerating voltage: 15 kV

[0423] Measurement area: 300×700μm

[0424] Charge neutralization mechanism: ON

[0425] Pass energy (narrow spectrum measurement): 40eV

[0426] 1-5. Fingerprint wipeability

[0427] The antireflection members of Examples and Comparative Examples were fingerprinted with their index fingers on the low-refractive-index layer-side surfaces. The fingerprinted area was 1 cm long by 1 cm wide.

[0428] A cleanroom wiper (AS ONE product name "PROPLEAL W") was fixed to the entire surface of a 1 kg weight to create a wiping jig. The jig was rectangular and 6 inches diagonally. The jig was manually reciprocated over the area covered with sebum. The number of reciprocations required to wipe away the fingerprint was measured and graded according to the following criteria.

[0429] 5 points: Wipe away fingerprints with two or fewer reciprocating strokes.

[0430] 4 points: The fingerprint was removed by wiping back and forth 3 or more times and 5 or less times.

[0431] 3 points: Wipe off fingerprints by wiping them back and forth 6 to 10 times.

[0432] 1 point: The fingerprint was removed by wiping it back and forth 11 to 20 times.

[0433] 0 points: Fingerprints cannot be wiped off even after 20 reciprocating strokes.

[0434] 1-6. Wipeability of ink

[0435] Ink was applied to the low-refractive-index layer-side surface of the antireflection members of Examples and Comparative Examples using a black marker (ZEBRA, Model: YYTS5-BK). The ink-applied area was 1 cm long x 1 cm wide.

[0436] A cleanroom wiper (AS ONE product name "PROPLEAL W") was fixed to the entire surface of a 1 kg weight to create a wiping jig. The jig was rectangular and 6 inches diagonally. The jig was manually reciprocated over the ink-adhered area. The number of reciprocations required to wipe the ink off was measured and graded according to the following criteria.

[0437] 5 points: Wipe off the ink by reciprocating twice.

[0438] 4 points: The ink was wiped off by reciprocating 3 or more times and 5 or less times.

[0439] 3 points: The ink was removed by wiping it back and forth 6 to 10 times.

[0440] 1 point: The ink was wiped off by reciprocating 11 times or more and 20 times or less.

[0441] 0 points: The ink cannot be wiped off even after 20 or more reciprocating strokes.

[0442] 1-7. Scratch resistance

[0443] <Trial Operation>

[0444] A polyethylene terephthalate film (thickness 100 μm) was attached to the measuring table of a measuring device (SAM JEE TECK, trade name "SJTR-053"). Next, steel wool (#0000, manufactured by Japan Steel Wool Co., Ltd., trade name "BONSTARB-204") was placed. The steel wool was brought into contact with the surface of the polyethylene terephthalate film and reciprocated 10 times under the conditions of a load of 500 g, a moving speed of 100 mm / second, and a moving distance of 170 mm per reciprocation. The contact area between the steel wool and the polyethylene terephthalate film was set to 4 cm 2 .

[0445] <Formal Measurement>

[0446] The antireflection members of Examples and Comparative Examples were cut into 3 cm x 25 cm samples. Two samples of each were prepared. The cut locations were randomly selected after visually confirming that there were no abnormalities such as dust or scratches.

[0447] The sample was placed on the measuring table of the measuring device with the low refractive index layer side as the upper surface. The steel wool was brought into contact with the surface of the low refractive index layer and reciprocated 10 times under the conditions of a load of 400 g, a moving speed of 4500 mm / min, and a moving distance of 170 mm per reciprocation. The contact area between the steel wool and the sample was 4 cm 2 .

[0448] Another sample was placed on the measuring table of the measuring device with the low refractive index layer side as the upper surface. The steel wool was brought into contact with the surface of the low refractive index layer and reciprocated 10 times under the conditions of a load of 600 g, a moving speed of 4500 mm / min, and a moving distance of 170 mm per reciprocation. The contact area between the steel wool and the sample was 4 cm 2 .

[0449] Next, under a brightroom environment of 1300 Lux to 1700 Lux, the number of scratches longer than 1 cm was visually inspected for each sample, and the samples were graded according to the following criteria. However, as mentioned above, scratches shorter than 1 cm were not counted. Furthermore, the speed of the steel wool within the 30 mm region of each end was not constant during the 170 mm travel distance. Therefore, scratches within the 30 mm region of each end were not counted during the 170 mm travel distance.

[0450] AAA: The number of scars is 2 or less

[0451] AA: The number of scars is 3

[0452] A: The number of scars is 4 or more and 5 or less

[0453] B: The number of scars is 6 or more and less than 10

[0454] C: The number of scars is 11 or more

[0455] 1-8. Light reflectivity Y value

[0456] The antireflection members of the Examples and Comparative Examples were cut into 5 cm x 5 cm pieces. The substrate side of the cut antireflection members was bonded to a 5 cm x 5 cm black plate (Kuraray Co., Ltd., trade name: Comoglass DFA2CG 502K (black), 2 mm thick) via an optically clear adhesive sheet (PANAC, trade name: PANACLEAN PD-S1) to prepare samples.

[0457] When the direction perpendicular to the surface of the sample on the low refractive index layer side is defined as 0 degrees, light is incident on the sample from a direction of 5 degrees, and the light reflectance Y value of the sample is measured based on the regular reflection of the incident light.

[0458] The measurement device used was a spectroscopic reflectometer (manufactured by Shimadzu Corporation, trade name: UV-2450). The device measured reflectance at 0.5 nm intervals within a wavelength range of 380 nm to 780 nm. Software was then used to convert the reflectance to the brightness perceived by the human eye. The software was built into the device. The reflectance was calculated using a D65 illuminant and a 2-degree viewing angle.

[0459] 1-9. Total light transmittance (Tt) and haze (Hz)

[0460] The antireflection members of Examples and Comparative Examples were cut into 10 cm x 10 cm pieces to prepare measurement samples. The total light transmittance according to JIS K7361-1:1997 and the haze according to JIS K7136:2000 of each sample were measured using a haze meter (HM-150, manufactured by Murakami Color Research Laboratory) under the following conditions.

[0461] To stabilize the light source, after turning on the device's power switch and allowing at least 15 minutes to pass, perform a calibration with nothing installed at the entrance opening, where the measurement sample will be placed. Then, place the measurement sample at the entrance opening and measure the total light transmittance and haze. The light incident surface during measurement is the substrate side.

[0462] 1-10. Pure water sliding angle, hexadecane sliding angle

[0463] The pure water and hexadecane slide angles of the antireflection components of Examples and Comparative Examples were measured using the procedures (1) to (3) in the main text. The measurements were performed using the "DropMaster" series product number "DMo-701" from Kyowa Interface Science Co., Ltd., with the "SA-301" accessory. Results indicating no slide angle even at an angle exceeding 90 degrees were marked "×."

[0464] 1-11. Pencil hardness

[0465] The antireflection members of Examples and Comparative Examples were cut into 5 cm x 10 cm pieces to prepare samples, and the pencil hardness of the low refractive index layer-side surface of the samples was measured under conditions of a load of 500 g and a speed of 1.4 mm / s in accordance with JIS K5600-5-4:1999.

[0466] The measurement was performed using a pencil hardness tester manufactured by Toyo Seiki Co., Ltd. (model: NP-type pencil scratch coating hardness tester). A repair tape (3M, product number "810-3-18") was used to adhere the two ends of the cut sample to the base of the pencil hardness tester. The pencil hardness test was performed 5 times, and the hardness when no abnormal appearance such as damage was confirmed 4 or more times was used as the value of the pencil hardness of each sample. For example, 5 tests were performed using a 2H pencil. If no abnormal appearance occurred 4 times, the pencil hardness of the anti-glare laminate was 2H. Regarding abnormal appearance, discoloration was not included, and scars and depressions were confirmed. A pencil hardness of 2H or above is a qualified level.

[0467] 2. Production of anti-reflective components

[0468] [Example 1]

[0469] A hard coat coating solution 1 of the following formulation was applied to a triacetyl cellulose film having a thickness of 80 μm and then dried at 70°C for 1 minute to volatilize the solvent. Subsequently, the film was subjected to a 30-minute exposure to a cumulative light intensity of 100 mJ / cm in a nitrogen atmosphere with an oxygen concentration of 200 ppm or less. 2 Ultraviolet irradiation was performed to form a hard coat layer having a dry thickness of 10 μm.

[0470] Next, the high refractive index layer coating solution 1 with the following formulation was applied on the hard coat layer and dried at 70°C for 1 minute to volatilize the solvent. Next, the coating solution was irradiated in a nitrogen atmosphere with an oxygen concentration of 200 ppm or less at a cumulative light intensity of 100 mJ / cm 2 Ultraviolet irradiation was performed to form a high refractive index layer having a dry thickness of 150 nm.

[0471] Next, the coating liquid 1 for the low refractive index layer of the following formulation was applied on the high refractive index layer and dried at 40°C for 60 seconds (drying wind speed 20 m / s) to volatilize the solvent. Next, the coating liquid was irradiated in a nitrogen atmosphere with an oxygen concentration of 200 ppm or less at a cumulative light intensity of 200 mJ / cm 2 Ultraviolet irradiation was performed to form a low refractive index layer having a dry thickness of 100 nm, thereby obtaining the antireflection member of Example 1.

[0472] <Hard Coating Liquid 1>

[0473] 22 parts by mass of a composition containing ultraviolet curable acrylate

[0474] (Manufactured by Toagosei Co., Ltd., trade name "ARONIX M-450", solid content 100%)

[0475] 17 parts by mass of a composition containing ultraviolet curable acrylate

[0476] (Daiichi Kogyo Seiyaku Co., Ltd., trade name "NEW FRONTIER R-1403MB", solid content 80%)

[0477] 1 part by mass of silicone leveling agent

[0478] (Made by Kyoeisha Chemical Co., Ltd., trade name "LE-304")

[0479] 1 part by mass of photopolymerization initiator

[0480] (IGM Resins, trade name "Omnirad 184")

[0481] 15 parts by mass of methyl isobutyl ketone

[0482] 44 parts by mass of methyl ethyl ketone

[0483] <Preparation of Coating Liquid 1 for Forming High Refractive Index Layer>

[0484] 0.1 parts by mass of a photopolymerization initiator (Irgacure 127, manufactured by BASF) and 92.6 parts by mass of a diluent (methyl isobutyl ketone / cyclohexanone / methyl ethyl ketone = 4 / 2 / 4) were added, and the mixture was stirred until any dissolved residue disappeared. 1.25 parts by mass of a photocurable resin (Beamset 577, manufactured by Arakawa Chemical Co., Ltd.) was added, and the mixture was stirred until any dissolved residue disappeared. Furthermore, 6 parts by mass of zirconium oxide (MZ-230X, manufactured by Sumitomo Osaka Cement Co., Ltd., solid content 32.5% by mass, average particle size 15-50 nm) and 0.05 parts by mass of a leveling agent (SEIKA Beam 10-28 (MB), manufactured by Dainichi Seika Industries, Ltd.) were added, and the mixture was stirred to prepare a coating solution 1 for forming a high refractive index layer.

[0485] <Low Refractive Index Layer Coating Liquid 1>

[0486] 100 parts by mass of a fluorine-containing polyfunctional (meth)acrylate oligomer (a polyfunctional (meth)acrylate oligomer having a perfluoropolyether group)

[0487] (Shin-Etsu Chemical Co., Ltd., trade name "X-71-1203M")

[0488] 20 parts by mass of the first hollow silica particles

[0489] (Hollow silica particles with an average particle size of 100 nm, surface-treated with a silane coupling agent having a methacryloyl group)

[0490] 25 parts by mass of solid silica particles

[0491] (Average particle size 12nm)

[0492] 0.1 parts by mass of leveling agent

[0493] (Dainichi Seika Industries, trade name: SEIKABeam 1028(MB))

[0494] 4.3 parts by mass of photopolymerization initiator

[0495] (IGM Resins, trade name "Omnirad 127")

[0496] 20 parts by mass of methyl ethyl ketone

[0497] 50 parts by mass of methyl isobutyl ketone

[0498] 30 parts by mass of propylene glycol monomethyl ether acetate

[0499] [Examples 2 to 10]

[0500] Except having changed the compounding of the coating liquid for low refractive index layer into the compounding described in Table 1, it carried out similarly to Example 1, and obtained the antireflection member of Example 2 to Example 10.

[0501] [Example 11]

[0502] An antireflection member of Example 11 was obtained in the same manner as in Example 1 except that the composition of the low-refractive-index layer coating liquid was changed to that described in Table 1 and the leveling agent was changed to the following leveling agent.

[0503] Leveling agent of Example 11: Model number: KP-414 manufactured by Shin-Etsu Chemical Co., Ltd.

[0504] [Comparative Examples 1 to 3, 6]

[0505] Except having changed the compounding of the coating liquid for low refractive index layer into the compounding described in Table 2, it carried out similarly to Example 1, and obtained the antireflection member of Comparative Example 1 to Comparative Example 3 and Comparative Example 6.

[0506] [Comparative Example 4]

[0507] An antireflection member of Comparative Example 4 was obtained in the same manner as in Example 1 except that the mixing and drying temperatures of the low-refractive-index layer coating liquid were changed to those described in Table 2.

[0508] [Comparative Example 5]

[0509] An antireflection member of Comparative Example 5 was obtained in the same manner as in Example 1 except that the composition of the low-refractive-index layer coating liquid was changed to that described in Table 2 and the leveling agent was changed to the following leveling agent.

[0510] Leveling agent of Comparative Example 5: Model number: KP-414 manufactured by Shin-Etsu Chemical Co., Ltd.

[0511] In Tables 1 and 2 below, the second hollow silica particles, PSQ, PETA, MEK, MIBK, and PGME represent the following substances.

[0512] Second hollow silica particles: Hollow silica particles with an average particle size of 75 nm, surface-treated with a silane coupling agent having a methacryloyl group

[0513] PSQ: Polysilsesquioxane with a methacryloyl group (Construe Chemical Co., Ltd. trade name "Acryloyl polysilsesquioxane cage mixture"; weight average molecular weight: 1320)

[0514] PETA: Pentaerythritol triacrylate

[0515] MEK: Methyl Ethyl Ketone

[0516] MIBK: Methyl isobutyl ketone

[0517] PGME: Propylene glycol monomethyl ether acetate

[0518] Table 1

[0519] Table 2

[0520]

[0521] In Tables 1 and 2, the obtained values ​​of La, Lσ, and 3Lσ are expressed to one decimal place.

[0522] Tables 1 and 2 show the “comprehensive evaluation of wiping properties” determined according to the following criteria.

[0523] Comprehensive evaluation of wiping performance

[0524] A: Fingerprint wiping and ink wiping are rated 4 points or higher

[0525] B: Fingerprint wiping and ink wiping were both rated 3 points

[0526] C: Either the fingerprint wipeability or the ink wipeability is 1 point or less

[0527] Regarding the scratch resistance, the lower evaluation between the evaluation under a load of 400 g and the evaluation under a load of 600 g is shown in Tables 1 and 2 as “comprehensive evaluation of scratch resistance”.

[0528] The results in Tables 1 and 2 confirm that the anti-reflection components of the Examples provide excellent dirt wiping properties. In particular, Examples 7-11, which contain two or more hollow particles of varying particle sizes, facilitate control of film thickness. Consequently, adjustment of reflectivity and reflected hue is easy, resulting in excellent processability.

[0529] From the results in Tables 1 and 2, it can be confirmed that the antireflection members of Examples also have good scratch resistance.

[0530] Comparing Examples 1-6 with Examples 7-11, it was found that Example 7-11 having a large Dσ / D showed a tendency to have good scratch resistance under a load of 400 g and good scratch resistance under a load of 600 g.

[0531] When comparing Examples 7 to 11, it was observed that the larger La, Lσ, 3Lσ, Lσ / La, and Dσ / D, the higher the scratch resistance.

[0532] Examples 5-6 incorporate a single type of hollow silica, while Examples 7-8 incorporate the same binder components as Examples 5-6 but incorporate two types of hollow silica. Compared to Examples 5-6, Examples 7-8, in which two types of hollow silica are incorporated, show a tendency toward greater Lσ / La and Dσ / D, suggesting further improvement in scratch resistance.

[0533] Comparisons between Examples 3, 5, and 6 reveal that the addition of polysilsesquioxane (PSQ) improves scratch resistance. Comparisons between Examples 7 to 11 also reveal a tendency for increased scratch resistance, particularly under a load of 600 g, to increase with increasing amounts of polysilsesquioxane (PSQ).

[0534] Examples 1-3 show the results of varying the amount of hollow silica blended without polysilsesquioxane (PSQ). A tendency was observed whereby the amount of hollow silica blended increased, resulting in a decrease in Ra and improved scratch resistance.

[0535] Explanation of symbols

[0536] 10: Base material

[0537] 20: Hard coating

[0538] 30: Low refractive index layer

[0539] 100: Anti-reflective components

[0540] 110: Display components

[0541] 120: Panel

Claims

1. An anti-reflection component comprising a low refractive index layer on a substrate, wherein: The low refractive index layer comprises a binder component and hollow particles, The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm. When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is 105.0.0 nm to 142.0 nm, and Lσ / La is 0.100 to 0.

300.

2. The anti-reflection member according to claim 1, wherein Lσ is greater than or equal to 7 nm and less than or equal to 35 nm.

3. The anti-reflection member according to claim 1, wherein When the average particle size of the hollow particles is defined as D and the standard deviation of the particle size of the hollow particles is defined as Dσ, Dσ / D is 0.09 or more.

4. The anti-reflection member according to claim 1, wherein When the thickness of the low refractive index layer is defined as T and the average particle size of the hollow particles is defined as D, T / D is 0.80 or more and 1.30 or less.

5. The anti-reflection member according to claim 1, wherein The hollow particles are hollow silica particles. The anti-reflection member according to claim 1 , wherein: The low refractive index layer further comprises solid particles.

7. The anti-reflection member according to claim 1, wherein The binder component includes a cured product of a fluorine-atom-containing polyfunctional (meth)acrylate compound.

8. The anti-reflection member according to claim 1, wherein The binder component includes a cured product of polysilsesquioxane.

9. The anti-reflection member according to claim 1, wherein The arithmetic mean roughness Ra of the surface of the antireflection member on the low refractive index layer side is 4.0 nm or more and 15.0 nm or less.

10. The anti-reflection member according to claim 1, wherein The ratio of the F element, as analyzed by X-ray photoelectron spectroscopy in a surface region of the antireflection member on the low refractive index layer side, is 28.0 atomic % or more and 42.0 atomic % or less.

11. The anti-reflection member according to claim 1, wherein The ratio of the F element, as determined by X-ray photoelectron spectroscopy analysis of a surface region of the antireflection member on the low refractive index layer side, is 0.5 atomic % or less.

12. The anti-reflection member according to claim 1, wherein A pure water roll-off angle of a surface of the antireflection member on the low refractive index layer side is 80 degrees or less.

13. The anti-reflection member according to claim 1, wherein A hexadecane slide angle of a surface of the antireflection member on the low refractive index layer side is 50 degrees or less.

14. The anti-reflection member according to claim 1, wherein A hard coating layer is provided between the substrate and the low refractive index layer.

15. The anti-reflection member according to claim 1, wherein A high refractive index layer is provided between the substrate and the low refractive index layer.

16. A polarizing plate comprising a polarizing element, a first transparent protective plate disposed on one side of the polarizing element, and a second transparent protective plate disposed on the other side of the polarizing element, wherein: Either the first transparent protective plate or the second transparent protective plate is the antireflection member according to any one of claims 1 to 15 , and is arranged so that the low refractive index layer-side surface of the antireflection member faces the side opposite to the polarizing element.

17. An image display panel comprising a display element and an optical film disposed on a light emitting surface side of the display element, wherein: The optical film includes the antireflection member according to any one of claims 1 to 15, the antireflection member being arranged such that the low refractive index layer-side surface of the antireflection member faces the opposite side of the display element, and the antireflection member is arranged on the outermost surface. 18 . An image display device comprising the image display panel according to claim 17 , wherein the anti-reflection member is arranged on the outermost surface.

19. An anti-reflective article, wherein: The antireflection member according to any one of claims 1 to 15 is disposed on a member such that the surface thereof on the low refractive index layer side faces the opposite side of the member, and the antireflection member is disposed on the outermost surface.

20. A method for selecting an anti-reflection component, wherein: Determine whether the following (1) to (4) are satisfied, and select an anti-reflection component that satisfies the following (1) to (4). (1) An anti-reflection component having a low refractive index layer on a substrate; (2) The low refractive index layer comprises a binder component and hollow particles; (3) The average particle size of the hollow particles is greater than 75.0 nm and less than 140.0 nm; (4) When the average value of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as La and the standard deviation of the distance between the centers of gravity of the hollow particles in the low refractive index layer is defined as Lσ, La is greater than or equal to 105.0 nm and less than or equal to 142.0 nm, and Lσ / La is greater than or equal to 0.100 and less than or equal to 0.300.

Images