Modularized orthogonal decoupling vibration isolation system for ultrahigh frequency laser vibration measuring instrument

Abstract

The invention relates to the technical field of vibration control, and provides a modularized orthogonal decoupling vibration isolation system for an ultrahigh frequency laser vibration measuring instrument, which comprises a bearing platform, a rigid support beam, a Z-axis vibration isolation layer, an X-axis vibration isolation layer, a Y-axis vibration isolation layer, a Z-axis basic vibration isolation unit, a Y-axis basic vibration isolation unit and an X-axis basic vibration isolation unit, the X-axis basic vibration isolation unit, the Y-axis basic vibration isolation unit and the Z-axis basic vibration isolation unit are the same vibration isolation assembly, can move in the single direction and have the same mechanical property, and only the installation positions are different. The X-axis vibration isolation layer, the Y-axis vibration isolation layer and the Z-axis vibration isolation layer are sequentially connected in series from bottom to top; the bearing platform is used for installing an ultrahigh frequency vibration measuring instrument, and the bearing platform is fixed to the Z-axis vibration isolation layer through the rigid supporting beams in a bolt connection mode. The problems that in an existing ultrahigh frequency laser vibration measuring instrument, a pneumatic loop of an air floating vibration isolation platform is complex in structure, multi-degree-of-freedom vibration isolation performance is coupled, and the vibration isolation frequency band is limited are solved.

Description

Technical Field

[0001] This invention relates to the field of vibration control technology, and in particular to a modular orthogonal decoupling vibration isolation system for ultra-high frequency laser vibration measuring instruments. Background Technology

[0002] Ultra-high frequency laser vibration measurement technology, as a key technology in the field of precision measurement, boasts ultra-high sensitivity and micron- or even nanometer-level measurement accuracy, far exceeding traditional vibration measurement methods. It has been widely applied in scenarios with stringent accuracy requirements, such as vibration detection of aerospace components, micro-deformation measurement of semiconductor chips, and stability analysis of optical components, providing core technical support for high-precision vibration monitoring in industrial manufacturing, scientific research, and other fields. However, the high sensitivity of this technology also makes it extremely sensitive to environmental vibration interference. In practical applications, even weak vibrations in the environment can be transmitted to the vibration measuring instrument through ground conduction, equipment resonance, etc., thus interfering with the measurement results. The low- to mid-frequency vibration range of 0.1Hz to 300Hz is the most significantly affected frequency band. Vibrations in this band can originate from minor settlement of buildings, disturbances from surrounding vehicles, or vibrations from other equipment operating within the laboratory. Even if the vibration displacement amplitude is only at the micron level, it can still significantly disrupt the measurement benchmark of the ultra-high frequency laser vibration measuring instrument, leading to a substantial decrease in the accuracy and long-term stability of the measurement data.

[0003] From the perspective of the dimensions of vibration interference, it mainly acts on UHF laser vibration measuring instruments in three degrees of freedom: the first dimension is vertical translational vibration (corresponding to the Z-axis in the spatial coordinate system), which directly changes the vertical distance between the instrument and the measurement target, disrupting the fixed optical path difference of the laser beam; the second dimension is horizontal lateral oscillation vibration (corresponding to the X-axis in the spatial coordinate system), which causes the instrument to shift horizontally, resulting in the laser beam irradiation position deviating from the preset measurement point; the third dimension is horizontal longitudinal oscillation vibration (corresponding to the Y-axis in the spatial coordinate system), which causes the instrument to shift back and forth along the measurement optical path, further aggravating the fluctuation of the laser interference signal. These three degrees of freedom of vibration interference do not exist independently but often superimpose each other, directly destroying the stability of the laser interference signal—which is the core basis for achieving high-precision measurement in UHF laser vibration measuring technology. Once the signal stability is destroyed, not only will the measurement data show significant distortion, but when the vibration interference intensity exceeds the instrument's tolerance threshold, it will also trigger a fault alarm in the entire vibration measuring system, causing measurement interruption and severely restricting the reliable application of UHF laser vibration measuring technology in complex environments.

[0004] To address the aforementioned vibration interference issues, air-bearing vibration isolation platforms are widely adopted as the core protection solution in the field of optical experiments. The working principle of an air-bearing vibration isolation platform is based on air elastic support technology: a high-pressure gas source continuously supplies high-pressure gas to the air cushion assembly at the bottom of the platform, forming a uniformly thick, low-stiffness air support layer on the support surface. This support layer effectively weakens the direct transmission of ground vibrations to the platform. Simultaneously, by integrating components such as inertial mass blocks and damping adjustment devices, the platform further optimizes the attenuation effect on vibrations of different frequencies, thereby providing a relatively stable working environment for ultra-high frequency laser vibration measuring instruments placed on the platform.

[0005] Although air-floating vibration isolation platforms can meet basic vibration isolation requirements, they still have several insurmountable drawbacks when adapting to high-precision applications using ultra-high frequency laser vibration measurement technology: First, the platform is highly dependent on external power supply—it must continuously provide a stable high-pressure air source. Once the air source pressure fluctuates, the pipeline leaks, or the air source is interrupted, the stability of the air support layer will be instantly destroyed, the vibration isolation performance will drop sharply, and it may even cause the platform to directly contact the support surface, causing vibration impact; Second, the long-term energy consumption and maintenance costs are high—the continuous operation of the high-pressure air source requires a large amount of electrical energy, and components such as air cushion components, pipeline interfaces, and pressure regulating valves need to be regularly inspected and replaced, otherwise the vibration isolation performance will easily degrade due to component aging, increasing the long-term use cost of the equipment; Third, the vibration isolation frequency band is significantly limited—the optimal vibration isolation frequency band of the air-floating vibration isolation platform is limited. Concentrated in the mid-to-high frequency range, the attenuation effect of the 0.1Hz~300Hz low-to-mid frequency vibrations, which are sensitive to ultra-high frequency laser vibration measurement technology, is limited and it is difficult to completely isolate the interference of vibrations in this frequency band to the instrument. Finally, the coupling problem of multi-degree-of-freedom vibration isolation performance is prominent. The air cushion support structure of the air-bearing vibration isolation platform determines that its mechanical characteristics (such as stiffness and damping coefficient) in the three degrees of freedom of X-axis, Y-axis and Z-axis are interrelated and cannot be adjusted independently. That is, the adjustment of the vibration isolation parameters in one direction will simultaneously affect the vibration isolation effect in other directions. This makes it difficult for the platform to accurately control the vibration isolation for different vibration interference characteristics in the three degrees of freedom. When facing environmental vibrations with complex frequency components and multiple superpositions, the vibration isolation effect cannot meet the high-precision measurement requirements of ultra-high frequency laser vibration measurement technology, which has become a key bottleneck restricting the further promotion and application of ultra-high frequency laser vibration measurement technology. Summary of the Invention

[0006] To address the aforementioned problems, the present invention aims to provide a modular orthogonal decoupling vibration isolation system for ultra-high frequency laser vibration measuring instruments. Addressing the issues of complex structures such as the aerodynamic circuits of existing air-bearing vibration isolation platforms, coupled multi-degree-of-freedom vibration isolation performance, and limited vibration isolation frequency bands in existing ultra-high frequency laser vibration measuring instruments, the present invention proposes a modular orthogonal decoupling vibration isolation platform that can achieve low-frequency, high-performance vibration isolation without external power supply. By adjusting the number of Z-axis foundation vibration isolation units, the platform's load capacity can be modularly and rapidly deployed on demand. By arranging the X-axis and Y-axis foundation vibration isolation units in both forward and reverse directions, identical mechanical characteristics in the X, Y, and Z directions can be achieved. Orthogonal decoupling vibration control is achieved through the series and orthogonal arrangement of the X, Y, and Z-axis vibration isolation layers.

[0007] The above-mentioned objective of this invention is achieved through the following technical solutions: A modular orthogonal decoupling vibration isolation system for ultra-high frequency laser vibration measuring instruments includes a load-bearing platform, a rigid support beam, a Z-axis vibration isolation layer, an X-axis vibration isolation layer, a Y-axis vibration isolation layer, a Z-axis foundation vibration isolation unit, a Y-axis foundation vibration isolation unit, and an X-axis foundation vibration isolation unit. The X-axis base vibration isolation unit, the Y-axis base vibration isolation unit, and the Z-axis base vibration isolation unit are the same vibration isolation component. They can all move in a single direction and have the same mechanical properties, with only differences in their installation positions. The X-axis vibration isolation layer, the Y-axis vibration isolation layer, and the Z-axis vibration isolation layer are connected in series from bottom to top; The support platform is used to install ultra-high frequency vibration measuring instruments, and the support platform is fixed to the Z-axis vibration isolation layer by bolt connection through the rigid support beam.

[0008] Furthermore, the Z-axis vibration isolation layer is equipped with multiple Z-axis basic vibration isolation units. Each Z-axis basic vibration isolation unit is arranged in parallel in the Z-axis vibration isolation layer in the form of a modular co-directional array. The multiple Z-axis basic vibration isolation units work together to provide load-bearing capacity for the entire vibration isolation system.

[0009] Furthermore, the system's load capacity can be adjusted as needed by changing the number of Z-axis foundation vibration isolation unit arrays in the Z-axis vibration isolation layer.

[0010] Furthermore, when the Z-axis vibration isolation layer adopts two Z-axis foundation vibration isolation units, the resultant force F of the restoring force of the two Z-axis foundation vibration isolation units satisfies the formula F=k1(x-x0)+k3(x-x0). 3 +2G, where G represents the load capacity of a single foundation vibration isolation unit, x0 is the equilibrium position of the vibration measuring instrument after it is installed on the bearing platform, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement. When the Z-axis vibration isolation layer uses four Z-axis foundation vibration isolation units, the resultant restoring force F of the four Z-axis foundation vibration isolation units satisfies the formula F=2k1(x-x0)+2k3(x-x0). 3 +4G, where G represents the load capacity of a single foundation vibration isolation unit, x0 is the equilibrium position of the vibration measuring instrument after it is installed on the bearing platform, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0011] Furthermore, two X-axis base vibration isolation units are fixedly installed on the X-axis vibration isolation layer. The two X-axis base vibration isolation units are installed in a reverse parallel manner, with an installation angle of 180° between them. The two X-axis base vibration isolation units together constitute the core vibration isolation structure of the X-axis vibration isolation layer.

[0012] Furthermore, the resultant restoring force of the X-axis isolation layer along the X-axis direction is provided by the two X-axis foundation isolation units, and satisfies the formula F=k1(x-x0)+k3(x-x0). 3 , where x0 is the static equilibrium position in the X-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0013] Furthermore, two Y-axis base vibration isolation units are fixedly installed on the Y-axis vibration isolation layer. The two Y-axis base vibration isolation units are installed in a reverse parallel manner, with an installation angle of 180° between them. The two Y-axis base vibration isolation units together constitute the core vibration isolation structure of the Y-axis vibration isolation layer, which is consistent with the unit installation structure of the X-axis vibration isolation layer.

[0014] Furthermore, the resultant restoring force of the Y-axis vibration isolation layer along the Y-axis direction is provided by the two Y-axis foundation vibration isolation units, and satisfies the formula F=k1(x-x0)+k3(x-x0). 3 , where x0 is the static equilibrium position in the Y-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0015] Furthermore, the Y-axis vibration isolation layer is fixed to the two X-axis basic vibration isolation units of the X-axis vibration isolation layer by assembly, and the movement direction of the Y-axis vibration isolation layer is perpendicular to the movement direction of the X-axis vibration isolation layer, with an installation angle of 90° between them, thereby realizing orthogonal decoupling vibration control in the X-axis and Y-axis directions.

[0016] Furthermore, the Z-axis vibration isolation layer is fixed to the two Y-axis basic vibration isolation units of the Y-axis vibration isolation layer in an assembly manner, so that the Z-axis vibration isolation layer can move smoothly as a whole along the Y-axis direction; at the same time, the bearing platform can move independently along the Z-axis direction with the movement of the Z-axis vibration isolation layer, ensuring the movement independence and vibration isolation effectiveness in the three degrees of freedom directions of X-axis, Y-axis and Z-axis.

[0017] Compared with the prior art, the present invention has at least one of the following beneficial effects: (1) Achieving orthogonal decoupling control of three degrees of freedom vibration: This invention adopts an orthogonal arrangement in which the X-axis vibration isolation layer, the Y-axis vibration isolation layer and the Z-axis vibration isolation layer are connected in series from bottom to top, and the movement direction of the Y-axis vibration isolation layer is perpendicular to the movement direction of the X-axis vibration isolation layer (with an angle of 90°). With the help of pure mechanical structure design, the mutual interference of vibration in the three degrees of freedom directions is effectively broken, so that the vibration isolation platform has independent vibration isolation capabilities in the X-axis, Y-axis and Z-axis directions, avoiding the problem of multi-degree-of-freedom vibration isolation performance coupling, and ensuring the measurement stability of the ultra-high frequency laser vibration measuring instrument in complex vibration environment.

[0018] (2) Achieving consistent mechanical properties in the XYZ directions: Differentiated arrangement strategy is adopted for the basic vibration isolation units of different vibration isolation layers. The Z-axis basic vibration isolation units in the Z-axis vibration isolation layer are arranged in a forward parallel (0° angle) manner, while the X-axis basic vibration isolation units in the X-axis vibration isolation layer and the Y-axis basic vibration isolation units in the Y-axis vibration isolation layer are arranged in a reverse parallel (180° angle) manner. Through this arrangement design, the stiffness in the X-axis, Y-axis and Z-axis directions is kept consistent, thereby achieving the same mechanical properties in the three directions, ensuring the balanced vibration isolation effect in each direction, and meeting the uniform accuracy requirements of ultra-high frequency laser vibration measuring instruments for multi-directional vibration isolation.

[0019] (3) Modular adjustment and rapid on-demand deployment of load capacity: The present invention adopts a modular vibration isolation unit design, setting the X-axis basic vibration isolation unit, Y-axis basic vibration isolation unit and Z-axis basic vibration isolation unit as the same vibration isolation component. By simply adjusting the number of Z-axis basic vibration isolation units in the Z-axis vibration isolation layer, the load capacity of the platform can be flexibly changed without major modifications to the overall structure. This realizes the modular and rapid adjustment and on-demand deployment of the platform's load capacity, adapting to the installation requirements of ultra-high frequency laser vibration measuring instruments of different weights and specifications, and improving the platform's versatility and flexibility of use.

[0020] (4) Achieving low-frequency high-performance vibration isolation without external power supply: Compared with the existing air-bearing vibration isolation platform that relies on high-pressure air source, the present invention can operate stably without external power supply by using a series of vibration isolation layers of pure mechanical structure and a forward and reverse arrangement of basic vibration isolation units. At the same time, it can achieve high-performance vibration isolation for the low-frequency (0.1Hz~300Hz) to medium-frequency vibration range that ultra-high frequency laser vibration measuring instruments are sensitive to, effectively covering the vibration isolation frequency band that air-bearing vibration isolation platforms cannot handle. It solves the defects of existing air-bearing vibration isolation platforms, such as complex pneumatic circuit structure, reliance on external power supply, and limited vibration isolation frequency band. While reducing equipment energy consumption and maintenance costs, it further ensures measurement accuracy. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram showing the movement directions of the horizontal and vertical layers in this invention; Figure 3 This is a layout diagram of the vertical motion layer vibration isolation unit of the present invention; Figure 4 This is a disassembly and assembly diagram of the horizontal motion layer of the present invention; Figure 5 This is a schematic diagram of the mechanical characteristics of the foundation vibration isolation unit in this invention; Figure 6 This is a schematic diagram of the vertical mechanical properties of the present invention; Figure 7 This is a diagram illustrating the horizontal mechanical properties and force composition principle of the present invention.

[0022] Figure Labels 1: Load-bearing platform; 2: Rigid support beam; 3: Z-axis vibration isolation layer; 4: Y-axis vibration isolation layer; 5: X-axis vibration isolation layer; 3.1: Z-axis foundation vibration isolation unit; 4.1: Y-axis foundation vibration isolation unit; 5.1: X-axis foundation vibration isolation unit. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0024] Those skilled in the art will understand that, unless specifically stated otherwise, the singular forms “a,” “an,” “the,” and “the” used herein may also include the plural forms. It should be further understood that the term “comprising” as used in this specification means the presence of the stated features, integers, steps, operations, elements, and / or components, but does not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0025] First Embodiment like Figure 1-4 As shown, this embodiment provides a modular orthogonal decoupling vibration isolation system for ultra-high frequency laser vibration measuring instruments, including a load-bearing platform 1, a rigid support beam 2, a Z-axis vibration isolation layer 3, an X-axis vibration isolation layer 5, a Y-axis vibration isolation layer 4, a Z-axis basic vibration isolation unit 3.1, a Y-axis basic vibration isolation unit 4.1, and an X-axis basic vibration isolation unit 5.1; The X-axis foundation vibration isolation unit 5.1, the Y-axis foundation vibration isolation unit 4.1, and the Z-axis foundation vibration isolation unit 3.1 are the same vibration isolation component. They can all move in a single direction and have the same mechanical properties, with only differences in their installation positions. The X-axis vibration isolation layer 5, the Y-axis vibration isolation layer 4, and the Z-axis vibration isolation layer 3 are connected in series from bottom to top; The support platform 1 is used to install ultra-high frequency vibration measuring instruments, and the support platform 1 is fixed to the Z-axis vibration isolation layer 3 by bolt connection through the rigid support beam 2. Specifically, the support platform 1 is connected to the Z-axis base vibration isolation unit 3.1 through the rigid support beam 2, and the support platform 1 can move along the Z-axis.

[0026] Furthermore, the Z-axis vibration isolation layer 3 is equipped with a plurality of Z-axis basic vibration isolation units 3.1. Each Z-axis basic vibration isolation unit 3.1 is arranged in parallel in the Z-axis vibration isolation layer 3 in the form of a modular co-directional array. The plurality of Z-axis basic vibration isolation units 3.1 work together to provide load-bearing capacity for the entire vibration isolation system.

[0027] Furthermore, the system's load capacity can be adjusted as needed by changing the number of the Z-axis base vibration isolation units 3.1 array in the Z-axis vibration isolation layer 3. The number can be changed; in the embodiments, two and four Z-axis base vibration isolation units 3.1 are used respectively. The load-bearing capacity of the decoupled vibration isolation platform depends on the number of Z-axis base vibration isolation units 3.1. For example, the load-bearing capacity of a single base vibration isolation unit is G, the load-bearing capacity of two base vibration isolation units is 2G, and the load-bearing capacity of four base vibration isolation units is 4G.

[0028] The basic vibration isolation unit 3.1 has Figure 5The mechanical properties shown are as follows: when the Z-axis vibration isolation layer 3 is equipped with two and four Z-axis foundation vibration isolation units 3.1 respectively, the resultant force characteristics of the restoring force of the Z-axis vibration isolation layer 3 in the Z-axis direction are as follows. Figure 6 As shown.

[0029] When the Z-axis vibration isolation layer 3 adopts two Z-axis foundation vibration isolation units 3.1, the resultant force F of the restoring force of the two Z-axis foundation vibration isolation units 3.1 satisfies the formula F=k1(x-x0)+k3(x-x0). 3 +2G, where G represents the load capacity of a single foundation vibration isolation unit, x0 is the equilibrium position of the vibration measuring instrument after it is installed on the bearing platform 1, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement. When the Z-axis vibration isolation layer 3 uses four Z-axis foundation vibration isolation units 3.1, the resultant restoring force F of the four Z-axis foundation vibration isolation units 3.1 satisfies the formula F=2k1(x-x0)+2k3(x-x0). 3 +4G, where G represents the load capacity of a single foundation vibration isolation unit, x0 is the equilibrium position of the vibration measuring instrument after it is installed on the bearing platform 1, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0030] Furthermore, two X-axis base vibration isolation units 5.1 are fixedly installed on the X-axis vibration isolation layer 5. The two X-axis base vibration isolation units 5.1 are installed in a reverse parallel manner, with an installation angle of 180° between them. The two X-axis base vibration isolation units 5.1 together constitute the core vibration isolation structure of the X-axis vibration isolation layer 5.

[0031] Furthermore, the resultant restoring force of the X-axis isolation layer 5 along the X-axis direction is jointly provided by the two X-axis foundation isolation units 5.1, and satisfies the formula F=k1(x-x0)+k3(x-x0). 3 , where x0 is the static equilibrium position in the X-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0032] Furthermore, two Y-axis base vibration isolation units 4.1 are fixedly installed on the Y-axis vibration isolation layer 4. The two Y-axis base vibration isolation units 4.1 are installed in a reverse parallel manner, with an installation angle of 180° between them. The two Y-axis base vibration isolation units 4.1 together constitute the core vibration isolation structure of the Y-axis vibration isolation layer 4, which is consistent with the unit installation structure of the X-axis vibration isolation layer 5.

[0033] Furthermore, the resultant restoring force of the Y-axis isolation layer 4 along the Y-axis direction is jointly provided by the two Y-axis foundation isolation units 4.1, and satisfies the formula F=k1(x-x0)+k3(x-x0). 3, where x0 is the static equilibrium position in the Y-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

[0034] The mechanical properties of the two Y-axis foundation vibration isolation units described in section 4.1 conform to... Figure 5 As shown, two units are installed in parallel, opposite directions (with an included angle of 180°) in the Y-axis vibration isolation layer 4. The load capacity of the unit installed in the forward direction is G, and the load capacity of the unit installed in the reverse direction is -G. Therefore, the resultant force of the Y-axis vibration isolation layer in the Y-axis direction is 0G; the force composition process is as follows... Figure 7 As shown. The structure and mechanical properties of the X-axis vibration isolation layer 5 are completely consistent with those of the Y-axis vibration isolation layer 4. The mechanical properties and installation methods of the two X-axis foundation vibration isolation units 5.1 are completely consistent with those of the two Y-axis foundation vibration isolation units 4.1.

[0035] Furthermore, the Y-axis vibration isolation layer 4 is fixed to the two X-axis basic vibration isolation units 5.1 of the X-axis vibration isolation layer 5 by assembly, and the movement direction of the Y-axis vibration isolation layer 4 is perpendicular to the movement direction of the X-axis vibration isolation layer 5, with an installation angle of 90° between them, thereby realizing orthogonal decoupling vibration control in the X-axis and Y-axis directions.

[0036] Furthermore, the Z-axis vibration isolation layer 3 is fixed to the two Y-axis basic vibration isolation units 4.1 of the Y-axis vibration isolation layer 4 in an assembly manner, so that the Z-axis vibration isolation layer 3 can move smoothly as a whole along the Y-axis direction; at the same time, the bearing platform 1 can move independently along the Z-axis direction with the movement of the Z-axis vibration isolation layer 3, ensuring the independence of movement and the effectiveness of vibration isolation in the three degrees of freedom directions of X-axis, Y-axis and Z-axis.

[0037] A computer-readable storage medium stores computer code that, when executed, performs the methods described above. Those skilled in the art will understand that all or part of the steps in the various methods of the above embodiments can be implemented by a program instructing related hardware. This program can be stored in a computer-readable storage medium, which may include: read-only memory (ROM), random access memory (RAM), a magnetic disk, or an optical disk, etc.

[0038] The above description is merely a preferred embodiment of the present invention. The scope of protection of the present invention is not limited to the above embodiments. All technical solutions falling within the scope of the present invention's concept are within the scope of protection of the present invention. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principles of the present invention should also be considered within the scope of protection of the present invention.

[0039] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0040] It should be noted that the above embodiments can be freely combined as needed. The above description is only a preferred embodiment of the present invention. It should be pointed out that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A modular orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument, characterized in that, The bearing platform, the rigid support beam, the Z-axis vibration isolation layer, the X-axis vibration isolation layer, the Y-axis vibration isolation layer, the Z-axis base vibration isolation unit, the Y-axis base vibration isolation unit and the X-axis base vibration isolation unit are included. The X-axis base vibration isolation unit, the Y-axis base vibration isolation unit and the Z-axis base vibration isolation unit are the same vibration isolation assembly, can move in a single direction and have the same mechanical properties, and only the installation positions are different. The X-axis vibration isolation layer, the Y-axis vibration isolation layer and the Z-axis vibration isolation layer are connected in series from bottom to top. The bearing platform is used for installing an ultrahigh frequency vibration measuring instrument, and is fixed on the Z-axis vibration isolation layer by the rigid support beam in a bolted manner.

2. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, A plurality of Z-axis base vibration isolation units are arranged in the Z-axis vibration isolation layer in a modular same-direction array in parallel.

3. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, The load capacity of the system is adjusted by adjusting the number of the Z-axis base vibration isolation unit array in the Z-axis vibration isolation layer.

4. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 3, wherein, When the Z-axis vibration isolation layer adopts two Z-axis basic vibration isolation units, the resultant force F of the restoring force of the two Z-axis basic vibration isolation units satisfies the formula F=k1(x-x0)+k3(x-x0) 3 +2G, wherein G represents the load capacity of a single basic vibration isolation unit, x0 is the equilibrium position of the vibration measuring instrument after being installed on the bearing platform, k1 is a linear stiffness coefficient, k3 is a nonlinear stiffness coefficient, and x is the actual displacement. When the Z-axis vibration isolation layer adopts four Z-axis basic vibration isolation units, the resultant force F of the restoring force of the four Z-axis basic vibration isolation units satisfies the formula F=2k1(x-x0)+2k3(x-x0) 3 +4G, wherein G represents the load capacity of a single basic vibration isolation unit, x0 is the balance position of the bearing platform after the vibration measuring instrument is installed, k1 is a linear stiffness coefficient, k3 is a nonlinear stiffness coefficient, and x is an actual displacement.

5. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, Two X-axis base vibration isolation units are fixedly installed on the X-axis vibration isolation layer in a reverse parallel manner, and the installation angle between the two X-axis base vibration isolation units is 180°.

6. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, The resultant of the restoring force of the X-axis vibration isolation layer in the X-axis direction is provided by the two X-axis base vibration isolation units, and satisfies the formula F=k1(x-x0)+k3(x-x0) 3 Wherein x0 is the static equilibrium position in the X-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

7. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, Two Y-axis base vibration isolation units are fixedly installed on the Y-axis vibration isolation layer in a reverse parallel manner, and the installation angle between the two Y-axis base vibration isolation units is 180°.

8. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, The resultant force of the restoring force of the Y-axis vibration isolation layer in the Y-axis direction is provided by the two Y-axis base vibration isolation units, and satisfies the formula F=k1(x-x0)+k3(x-x0) 3 Wherein x0 is the static equilibrium position in the Y-axis direction, k1 is the linear stiffness coefficient, k3 is the nonlinear stiffness coefficient, and x is the actual displacement.

9. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, The Y-axis vibration isolation layer is fixed on the two X-axis base vibration isolation units of the X-axis vibration isolation layer in an assembled manner, and the movement direction of the Y-axis vibration isolation layer is perpendicular to the movement direction of the X-axis vibration isolation layer, and the installation angle between the two is 90°, so as to realize orthogonal decoupling vibration control of the X-axis and the Y-axis directions.

10. The modular, orthogonal decoupled vibration isolation system for an ultra-high frequency laser vibrometry instrument of claim 1, wherein, The Z-axis vibration isolation layer is fixed on the two Y-axis base vibration isolation units of the Y-axis vibration isolation layer in an assembled manner, so that the Z-axis vibration isolation layer can move stably as a whole along the Y-axis direction; at the same time, the bearing platform can move independently along the Z-axis direction with the movement of the Z-axis vibration isolation layer, thereby guaranteeing the movement independence and vibration isolation effectiveness of the X-axis, Y-axis and Z-axis three degrees of freedom directions.

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