PVD non-stick pan and preparation method thereof

Abstract

The invention discloses a PVD non-stick pan and a preparation method thereof.The PVD non-stick pan comprises a metal pan body and a PVD coating film attached to the surface of the metal pan body, and the PVD coating film is provided with a substrate layer which is configured to be a Cr-Ti alloy layer deposited on the metal pan body; the transition layer is configured to be a Cr-Si-N nitride layer which is deposited on the substrate layer; the surface layer is configured to be a Cr-Ti-Al-Cu-N nitride layer deposited on the surface of the transition layer; wherein the substrate layer is formed by physical vapor deposition in an inert atmosphere, the transition layer is formed by physical vapor deposition in a nitrogen atmosphere, and the surface layer is formed by physical vapor deposition in a nitrogen atmosphere; and the hardness of the transition layer is greater than that of the substrate layer and the surface layer. According to the PVD non-stick pan and the preparation method thereof, the PVD non-stick pan has high oil locking and anti-sticking capacity, the coating film microstructure is hard, and the lasting non-stick effect can be achieved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of cookware surface treatment, and more particularly to a PVD non-stick pan and a preparation method thereof. BACKGROUND

[0002] Currently, the common non-stick pan on the market mainly adopts a Teflon (polytetrafluoroethylene) coating. Although such a coating has good non-stick effect initially, it is prone to decompose and release harmful substances at high-temperature cooking (above 260℃), and the coating is easy to peel off after long-term use, so the service life is usually only 1-2 years. Although the ceramic coating developed later has improved high-temperature resistance, the hardness is relatively low (about HV500), and it is easy to scratch when using a metal spatula to stir-fry, and the inherent micro-cracks of the ceramic layer will cause the oil locking ability to gradually fail.

[0003] In order to solve the problem of wear resistance, some high-end pans begin to use metal nitride plating film technology, such as single-layer CrN or TiAlN coating. The hardness of such coating can reach HV1000 or more, but there are two obvious defects: first, the bonding force of single-layer film to the substrate is insufficient, and it is easy to fall off from the metal pan body after frequent cold and hot impact; second, the surface energy of pure nitride is too high, and the protein in the food is easy to combine with the metal elements to produce adhesion.

[0004] The multi-layer composite film layer design appeared in recent years attempts to improve the bonding problem, but such a scheme faces new challenges when implemented on a composite substrate (such as steel-aluminum-steel): the aluminum layer is easy to deform when plating at high temperature, and the steel layer interface is easy to oxidize, causing the film layer to blister. In addition, the existing technology excessively pursues high hardness (such as HV2500 or more), which increases the brittleness of the film layer, and may crack when using an iron spatula to stir hard-shell seafood.

[0005] More importantly, the traditional plating process requires a deposition temperature of 300℃ or more to ensure the film layer density, which is almost impossible for a composite metal pan body with an aluminum content of more than 50% — the aluminum core will soften and cause the metal pan body to deform at high temperature. If the temperature is lowered, the lower the temperature, the worse the plating density, and the film layer adhesion is also poor. Therefore, the industry urgently needs a new composite film layer technology that can form strong bonding force, high wear resistance and has long-lasting oil locking ability at low temperature, especially suitable for the manufacturing needs of modern lightweight composite metal cookware. SUMMARY

[0006] The present application aims to provide a PVD non-stick pan and a preparation method thereof, which has strong oil locking and anti-sticking ability, and the plating film layer microstructure is hard, which can achieve long-lasting non-stick effect.

[0007] In order to achieve the above-mentioned purpose, in a first aspect, the present application provides a PVD non-stick pan, comprising a metal pan body and a PVD plating film attached to the surface of the metal pan body, the PVD plating film has: a base layer configured to be deposited on the Cr-Ti alloy layer; a transition layer configured to be deposited on the base layer; a surface layer configured to be deposited on the Cr-Ti-Al-Cu-N nitride layer of the transition layer; wherein the base layer is formed by physical vapor deposition in an inert atmosphere, the transition layer is formed by physical vapor deposition in a nitrogen atmosphere, and the surface layer is formed by physical vapor deposition in a nitrogen atmosphere; and the hardness of the transition layer is greater than the hardness of the base layer and the surface layer.

[0008] By adopting the technical scheme, the three-layer film layer forms a gradient hardness structure, reduces interlayer stress cracks, and meets the material mechanics principle. The base layer uses the toughness of the Cr-Ti alloy to realize close combination with the metal pot body, provides better metallurgical bonding and thermal expansion matching, reduces the substrate interface stress, and solves the problem of insufficient bonding force of the traditional film layer. The transition layer takes the high-hardness Cr-Si-N nitride layer as a support framework and can withstand high-frequency scraping load in the use process of the cookware. The surface layer, through the synergistic effect of the multi-element nitride, ensures sufficient hardness while relying on the special composition to build the anti-sticking performance and the surface morphology conducive to oil locking. The high-hardness transition layer (Cr-Si-N) provides core wear resistance, the moderate-hardness surface layer (containing Cu nitride) balances the non-stickness and impact resistance, and the low-hardness base layer (Cr-Ti alloy) optimizes the bonding force with the substrate and reduces the internal stress.

[0009] Through the gradual interface design of metallurgical bonding→coherent matching→composition gradient, the Cr-Ti infiltrates the substrate grain boundary, the CrSiN matches the Cr-Ti lattice, and the Cr / Ti atoms decrease to the surface layer, realizing the step-by-step release of stress from the substrate to the coating and solving the problem of falling caused by interface mutation. The continuous evolution of the metal bond→covalent bond→ionic bond, the metallurgical / coherent / gradient interface synergy, realize "atomic-level interlocking", so that the coating has the following properties: high toughness (impact resistance) of the base layer; extreme wear resistance of the transition layer; pure nitride + ionic bond surface layer, realizing the persistent non-stickness of the surface layer (Cu ionic bond reduces the surface energy).

[0010] The Cr-Ti-Al-Cu-N nitride layer in the surface layer significantly reduces the surface energy through the combination of multi-element metal nitride and forms a fine surface structure conducive to oil locking. Among them, chromium titanium nitride provides basic anti-sticking, the addition of aluminum nitride further enhances the ability to resist starch adhesion, and the copper element not only enhances the performance of resisting the adhesion of protein substances, but also endows the pot with persistent antibacterial properties. This composite nitride structure realizes better non-stick effect than single metal or ordinary alloy through the synergy of metal alloying and metal ceramics, and can effectively maintain the integrity of the oil film in the high-temperature stir-frying environment to prevent the adhesion of starch food from causing sticking.

[0011] The non-stick performance of the present application is derived from the technical evolution from single metal, to metal alloying, to multi-metallic compound: first, chromium titanium nitride (Cr-Ti-N) has certain anti-sticking property; on this basis, the introduction of aluminum nitride (Al-N) significantly improves the anti-starch adhesion performance; further adding copper element, on the one hand, it improves the anti-protein adhesion performance by forming copper-containing nitride, and on the other hand, it gives the coating a long-lasting antibacterial function. The synergistic effect of multiple components makes the surface layer maintain the high wear resistance of metal nitride while realizing the non-stick effect close to chemical coating.

[0012] The transition layer and the surface layer are both nitride layers, which improve wear resistance and thermal stability, and provide better biocompatibility and wear resistance. The three-layer structure cooperatively realizes the unity of film layer adhesion stability, anti-wear performance and long-acting non-stick performance, optimizes the stress distribution between layers, and prolongs the service life of the coating.

[0013] Further, the thickness of the base layer is 0.4-0.8 μm, the thickness of the transition layer is 0.4-0.6 μm, and the thickness of the surface layer is 0.5-1.0 μm.

[0014] The hardness of the base layer is HV800-900, the hardness of the transition layer is HV2000-2200, and the hardness of the surface layer is HV1500-1800.

[0015] By adopting the above technical scheme, the thickness and hardness parameter combination is optimized through multiple cooking simulation tests: the thickness of the base layer can ensure the bonding strength with the substrate, avoiding cost redundancy caused by excessive thickness; the hardness of the transition layer above 2000HV matched with the thickness of 0.4-0.6 μm can resist the impact load of metal cookware and avoid the increase of brittleness caused by excessive thickness; the hardness of the surface layer of 1500-1800HV matched with the thickness of 0.5-1.0 μm can withstand food friction in daily cooking, and at the same time, the stable attachment of oil film is realized through the surface microstructure, which can withstand more than 3000 times of stir-frying cycles while maintaining certain non-stick properties.

[0016] Further, the base layer is formed by physical vapor deposition in an argon atmosphere using 50% Cr target + 50% Ti target.

[0017] By adopting the above technical scheme, the 50:50 Cr-Ti target material ratio can fully utilize the performance advantages of the two metals —— the corrosion resistance of Cr and the high bonding force of Ti, and the alloy composition can be precisely controlled in an argon atmosphere to avoid impurity pollution. The base layer formed has good matching with the thermal expansion coefficient of steel, aluminum and other substrates, can withstand the sudden temperature difference of metal pot body cold and hot, and effectively prevents the film layer from warping and peeling.

[0018] Further, the transition layer is formed by physical vapor deposition in a nitrogen atmosphere using a 50% Cr target + 50% Si target.

[0019] By adopting the above technical solution, CrSiN nitride can be efficiently generated in a nitrogen atmosphere, the introduction of Si element can strengthen the nitride structure, and the wear-resistant life of the transition layer can be increased by more than 40% compared with pure CrN layer; in actual use scenarios, high-frequency scratches of hard objects such as shovels can be resisted, and the oil locking performance of the lower layer structure and the surface layer can be effectively protected.

[0020] Further, the surface layer is formed by physical vapor deposition in a nitrogen atmosphere using an alloy target, the chromium content in the alloy target is 50-70%, the titanium content is 10-25%, the aluminum content is 10-20%, and the copper content is 3-7%.

[0021] By adopting the above technical solution, the component ratio is the core of realizing oil locking and non-stick: the multi-element nitride composed of Cr, Ti and Al ensures the high-temperature stability of the surface layer, can withstand 260℃ dry burning conditions without oxidation failure; 3-7% Cu element can reduce the surface energy, promote the spreading of edible oil on the surface to form a uniform oil film, the oil film adhesion is increased by 30% compared with ordinary non-stick layer, realizes stable non-stick effect under low oil working condition, and meets the cooking demand of easy-to-stick food materials such as fried eggs and fried fish.

[0022] Further, the negative bias applied to the metal pot body when forming the base layer is greater than the negative bias applied to the metal pot body when forming the surface layer, so as to increase the adhesion of the PVD coating and the metal pot body. The negative bias applied to the metal pot body when forming the base layer is 300-700V, the negative bias applied to the metal pot body when forming the surface layer is 100-300V, and the negative bias applied to the metal pot body when forming the transition layer is 200-300V.

[0023] Further, the metal pot body is formed by stretching a metal composite plate, and the metal composite plate is selected from one of steel-aluminum-steel, steel-aluminum, titanium-aluminum and titanium-aluminum steel.

[0024] By adopting the above technical solution, the composite substrate can integrate the performance advantages of different metals — the high thermal conductivity of aluminum ensures that the metal pot body is evenly heated, avoiding local food material scorching; the rigidity of steel or titanium ensures the stability of the metal pot body structure, which can withstand long-term open flame heating without bottom deformation; the outer surface treatment not only improves the appearance quality of the product, but also reduces the oil stain adhesion rate, simplifying the daily cleaning process.

[0025] In a second aspect, the application provides a method for preparing the PVD non-stick pot of the first aspect, comprising the following steps: S01. Obtain a metal pot body and preheat for a set time; S02. Forming a base layer by physical vapor deposition in an argon atmosphere; S03. Forming a transition layer by physical vapor deposition in a nitrogen atmosphere; S04. Forming a surface layer by physical vapor deposition in a nitrogen atmosphere.

[0026] In step S01, the atmosphere pressure is 0.3-3 Pa, the preheating temperature is 100-200℃, and the preheating time is 10-25 min.

[0027] In step S02, the argon flow rate is 200-500 sccm, the current of the medium frequency power supply is 20-50 A, the atmosphere pressure is 0.3-0.9 Pa, the atmosphere temperature is 100-120℃, and the coating time is 10-20 min.

[0028] In step S03, the nitrogen flow rate is 200-500 sccm, the current of the medium frequency power supply is 20-40 A, the atmosphere pressure is 0.3-0.9 Pa, the atmosphere temperature is 100-120℃, and the coating time is 10-15 min.

[0029] In step S03, argon is introduced while nitrogen is introduced, and the argon flow rate is 200-500 sccm.

[0030] In step S04, the nitrogen flow rate is 50-100 sccm, the current of the medium frequency power supply is 20-30 A, and the coating time is 20-30 min.

[0031] In step S04, argon is introduced while nitrogen is introduced, and the argon flow rate is 200-500 sccm.

[0032] The frequency of the medium frequency power supply in the above technical solution is 40-100 kHz.

[0033] By adopting the above technical solution, the preheating and high-vacuum environment of the pretreatment can completely remove the oil stains and water vapor on the surface of the substrate, providing a clean substrate for film layer bonding; continuous vacuum deposition avoids oxidation pollution caused by exposure of the film layer in the air, and the interlayer bonding force is improved by 50% compared with step-by-step deposition.

[0034] Each parameter is accurately controlled according to the material properties: the negative bias voltage and current matching of the base layer can achieve sufficient bombardment of Cr-Ti ions on the surface of the substrate, forming a firm anchoring effect; the nitrogen flow rate of the transition layer ensures the formation of nitrides, ensuring that the hardness meets the standard; the low nitrogen partial pressure of the surface layer can retain an appropriate amount of metal phase in the multi-element nitride, and the negative bias voltage can construct a microstructure that is beneficial to oil locking. According to the above parameters, the product qualification rate can be stably maintained above 90%.

[0035] The process combination can stably generate a Cr-Ti layer of 0.4-0.8 μm, and a temperature of 100-120℃ can ensure atomic diffusion activity and avoid overheating of the substrate; a deposition time of 10-20 min realizes precise thickness control, and the bonding force between the substrate layer and the steel-aluminum composite substrate can reach more than 50 N, far exceeding the standard requirement of 30 N in the industry.

[0036] The transition layer parameters can improve the density of the CrSiN layer, the Si element is uniformly distributed in the nitride lattice, and the wear resistance is significantly improved compared with ordinary CrN layers; the surface layer is deposited under specific nitrogen partial pressure and time conditions, which can ensure the stability of the multi-element nitride and make the Cu element uniformly precipitate on the surface to form a nano-scale oil storage structure. The actual measurement shows that the oil locking capacity is improved compared with similar products, and a deposition time of 20-30 min can realize precise thickness control of the surface layer, taking into account performance and production efficiency.

[0037] In summary, the present application has at least one of the following beneficial technical effects: 1. Improved long-term non-stick performance: The microstructure formed by the special composition of the surface layer can realize stable adhesion of the oil film. Even if there is slight wear on the surface after long-term use, it can still maintain good non-stick effect, solving the technical pain point of short service life of traditional PVD non-stick pots.

[0038] 2. Excellent wear resistance of the film layer: The three-layer gradient hardness structure cooperates with the optimized thickness parameters, which can withstand high-frequency scraping and high-temperature impact of metal spatula, and the service life is more than 3 times that of ordinary ceramic PVD non-stick pots.

[0039] 3. Balanced compatibility and thermal performance of the substrate: The combination of low-temperature deposition process and composite substrate design can ensure uniform heat conduction of the metal pot body to avoid food burning, and can prevent substrate deformation caused by high temperature, and is suitable for various heat sources such as open flame and induction cooker.

[0040] 4. High stability of industrial production: The continuous vacuum deposition process and precise parameter control ensure the consistency of film layer performance, and the industrial production qualification rate is stable, which is suitable for large-scale production.

[0041] 5. Optimized use and cleaning performance: The easy-to-clean design of the outer surface combined with long-term non-stick performance can simplify cooking operations and cleaning processes, and meet the actual use requirements of non-stick frying eggs, non-stick frying meat, and easy cleaning. BRIEF DESCRIPTION OF DRAWINGS

[0042] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings described below are only part of the embodiments of the present application, and for those skilled in the art, other drawings can be obtained without creative labor based on the provided drawings.

[0043] Figure 1 The cross-sectional structure of the PVD non-stick pot of the present application is shown in the figure. Figure 2 The cross-sectional structure of the PVD non-stick pot of the present application is shown in the figure. Figure 1 The enlarged structure of area A in the figure is shown in the figure.

[0044] Reference signs: 1, metal pot body; 2, composite film layer; 21, surface layer; 22, transition layer; 23, base layer. DETAILED DESCRIPTION

[0045] The technical solutions in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0046] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through intermediate medium, or the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0047] In the description of the present application, it should be understood that the terms "up", "down", "left", "right" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore it cannot be understood as a limitation of the present application.

[0048] The technical solutions of the present application will be described in detail below in combination with the drawings, and the features in the following embodiments can be combined with each other without conflict.

[0049] Embodiment 1: Please refer to Figure 1 and Figure 2The embodiment discloses a PVD non-stick pot, which adopts a gradient functional film layer design, and realizes excellent non-stickness, wear resistance and high-temperature resistance through the synergistic effect of a metal pot body and a multi-layer composite film. The core structure is composed of a metal pot body 1 and a surface composite film layer 2. The composite film layer 2 comprises, from inside to outside, a base layer 23, a transition layer 22 and a surface layer 21, forming a gradient distribution of increasing hardness (hardness of the transition layer 22 > hardness of the surface layer 21 > hardness of the base layer 23). This design can effectively relieve stress concentration between the film layer and the substrate, and significantly improve the overall bonding strength. The metal pot body 1 is made of a composite sheet material and is stretched to form. Specifically, a steel-aluminum-steel, steel-aluminum, titanium-aluminum or titanium-aluminum steel composite sheet material can be selected. Such a composite substrate has high strength and excellent thermal conductivity. The steel layer ensures structural stability, the aluminum layer realizes rapid and uniform heat transfer, and the titanium layer can enhance corrosion resistance (suitable for acidic cooking environment). The outer surface of the metal pot body 1 is polished (Ra≤0.8μm) or sprayed with a ceramic coating (thickness 5~10μm), further improving the heat insulation and aesthetics. In the composite film layer 2, the base layer 23 is a Cr-Ti alloy layer, which is used as a transition layer between the film layer and the substrate, with a thickness of 0.4~0.8μm and a hardness of HV800~900. This layer is formed by physical vapor deposition of 50% Cr target + 50% Ti target in an inert atmosphere, which utilizes the high bonding force of Cr and the flexibility of Ti to achieve close adhesion of the film layer to the metal pot body, avoiding peeling during subsequent use. The inert gas is pure argon or helium, and argon is used in this embodiment. The transition layer 22 is a CrSiN nitride layer with a thickness of 0.4~0.6μm and a hardness of HV2000~2200, which is the main wear-resistant support layer of the film layer. It is formed by physical vapor deposition of 50% Cr target + 50% Si target in a nitrogen atmosphere. The introduction of Si can significantly improve the density and oxidation resistance of the nitride, and its ultra-high hardness can resist scratching by hard objects such as metal spatulas. The surface layer 21 is a (Cr, Ti, Al, Cu) N multi-element nitride layer with a thickness of 0.5~1.0μm and a hardness of HV1500~1800, which has wear resistance and non-stickness. It is formed by physical vapor deposition of a target material with a composition of Cr 50~70%, Ti 10~25%, Al 10~20% and Cu 3~7% in a nitrogen atmosphere. The Cu element can reduce the surface energy, giving the cookware excellent non-stick effect, and the Al element can enhance the high-temperature oxidation resistance of the film layer (can withstand long-term use at 300℃ or above).

[0050] Referring to Table 1 and Table 2, to further verify the creativity and feasibility of the PVD non-stick pot technical solution with a composite film layer in Example 1, three groups of examples (based on the parameter optimization of Example 1) and three groups of comparative examples (comparing the traditional technical solution) are designed, and their technical advantages are compared and analyzed through performance testing. The same metal pot body (steel-aluminum-steel composite plate) and preparation equipment are used for all test samples, and only the film layer structure or material composition is changed.

[0051] Table 1 Design parameters of examples and comparative examples Table 2 Comparison of performance test results Comparative analysis conclusion: 1. Creativity Examples 1-3 solve the problem of "wear resistance and non-stickness cannot be considered together" caused by uniform hardness in Comparative Example 1 (single film layer) through gradient hardness design (transition layer 22 > surface layer 21 > base layer 23), and their wear resistance (thickness loss rate ≤8%) and non-stickness (500 cycle attenuation rate ≤12%) are significantly better than those of the comparative examples. The introduction of Cu element in the surface layer 21 is a key innovation: the initial non-stickness of Examples 1-3 (4-5 points) is much better than that of Comparative Examples 2-3 (3 points) without Cu, and the performance attenuation after long-term use is slower (Examples ≤12% vs. Comparative Examples ≥35%), which proves the decisive role of Cu element in reducing surface energy and improving non-stickness. The base layer 23 uses Cr-Ti alloy instead of pure Cr (Comparative Example 2), and the bonding force is improved to 0 level, avoiding the film layer peeling off (level 1) caused by the brittleness of the Cr layer in Comparative Example 2. 2. Feasibility verification The performance data of Examples 1-3 changes regularly with parameters (thickness, Cu content): the non-stickness improves with the increase of Cu content (3%→7%); the wear resistance enhances with the increase of film thickness (0.4 μm→1.0 μm), which shows that the process parameters are controllable and the scheme is feasible for industrial production. All examples pass the corrosion resistance test (5 points), which proves that the synergistic effect of CrSiN transition layer 22 and multi-element nitride surface layer 21 can effectively resist acid environment erosion, solving the problem of insufficient corrosion resistance of Comparative Example 1 (single film layer) (2 points). In summary, the technical solution of Example 1 is superior to the traditional scheme in non-stickness, wear resistance, bonding force and other core performances through multi-layer gradient design and key element regulation, and its creativity and feasibility are fully verified.

[0052] The above technical scheme ensures the feasibility and creativity of the scheme by clearly defining the function positioning of each layer, optimizing the process parameters and material ratio, and is suitable for the production of various cookware such as household frying pans and frying pans. Example 2: The present embodiment discloses a method for preparing the PVD non-stick pan in Example 1, which adopts a continuous vacuum sputtering process to complete the deposition of three layers of films in the same vacuum chamber throughout the process, avoiding oxidation pollution caused by exposure of the substrate to the atmosphere, and significantly improving the film layer bonding force. The specific steps are as follows: Forming: Various composite sheet materials such as steel-aluminum-steel, steel-aluminum, titanium-aluminum, and titanium-aluminum-steel are stretched into pans.

[0053] Substrate pretreatment: First, ultrasonic cleaning is used to remove oil stains on the surface of the substrate (cleaning agent is a neutral detergent, temperature is 50-60℃), then deionized water is used to rinse to pH value 7.0±0.2, and finally hot air drying (80-100℃, time 5-10min) is performed. The cleaned substrate is then placed in a vacuum chamber and preheated at 100-200℃ for 10-25min while being vacuumed to a base vacuum of 3.0×10⁻³~3.0×10⁻²Pa (preferably 5.0×10⁻³Pa) to completely remove water vapor and impurities adsorbed on the surface of the substrate. Substrate layer deposition: Perform substrate layer 23 deposition (Cr-Ti alloy layer), target material configuration uses 50% Cr target + 50% Ti target (purity ≥99.95%), target material distance from substrate is 10-15cm. Process parameters are: argon gas (purity 99.999%) is introduced, flow rate is 200-500sccm, vacuum degree is maintained at 0.3-0.9Pa, negative bias voltage is 300-700V (through gradient voltage rise: 200V for 2min, then rise to set value), current is 20-50A, deposition temperature is controlled at 100-120℃, time is 10-20min, to ensure the formation of a uniform and dense transition layer. Transition layer deposition: Transition layer 22 deposition (CrSiN nitride layer), target material configuration uses 50% Cr target + 50% Si target (purity ≥99.95%), target material distance from substrate is 12-18cm. Process parameters are: mixed gas (argon gas 200-500sccm + nitrogen gas 200-500sccm, nitrogen gas accounts for 50%) is introduced, vacuum degree is 0.3-0.9Pa, negative bias voltage is 200-300V, current is 20-40A, deposition temperature is 100-120℃, thickness is controlled to 0.4-0.6μm by controlling sputtering time (8-15min), and the combination of Si and N can form stable Si3N4 phase to improve the chemical stability of the film layer. Surface layer deposition: surface layer 21 deposition ((Cr, Ti, Al, Cu) N multi-element nitride layer), the target material is configured according to atomic percentage Cr 50~70%, Ti 10~25%, Al 10~20%, Cu 3~7% to prepare an alloy target (the purity of each element is ≥99.9%), and the distance between the target material and the substrate is 10~15cm. The process parameters are as follows: mixed gas (argon 200~500sccm + nitrogen 50~100sccm, nitrogen accounts for 10~20%) is introduced, the vacuum degree is 0.3~0.9Pa, a negative bias of 100~300V is applied, the current is 20~30A, the deposition temperature is ≤120℃, the sputtering time is 20~30min, and the Cu element is uniformly distributed on the surface of the film layer to form a low surface energy structure. Post-processing: After deposition, the product is naturally cooled to below 80℃ under vacuum, and then taken out after breaking the vacuum.

[0054] External treatment of the pot: after coating, polish the outside of the pot or spray ceramic coating on the outside of the pot for protection.

[0055] Handle installation: rivet the handle.

[0056] Through this preparation method, the composition, thickness and performance of each film layer can be accurately controlled, and the prepared PVD non-stick pot has the excellent performance described in Embodiment 1.

[0057] The principles and implementation modes of the present application are described by applying specific examples in this paper, and the above examples are only used to help understand the method of the present application and its core idea. It should be noted that for ordinary skilled persons in the technical field, without departing from the principles of the present application, the present application can be improved and modified in several ways, and these improvements and modifications also fall within the protection scope of the claims of the present application.

Claims

1. A PVD non-stick pan, comprising a metal pan body and a PVD coating adhered to the surface of the metal pan body, characterized in that, The PVD coating has the following characteristics: A base layer configured as a Cr-Ti alloy layer deposited on the metal pot body; A transition layer configured as a Cr-Si-N nitride layer deposited on the substrate layer; as well as A surface layer, configured as a Cr-Ti-Al-Cu-N nitride layer deposited on the surface of the transition layer; The base layer is formed by physical vapor deposition in an inert atmosphere, the transition layer is formed by physical vapor deposition in a nitrogen atmosphere, and the surface layer is formed by physical vapor deposition in a nitrogen atmosphere; furthermore, the hardness of the transition layer is greater than that of the base layer and the surface layer.

2. The PVD non-stick pan as described in claim 1, characterized in that: The base layer is formed by physical vapor deposition of a 50% Cr target + a 50% Ti target in an argon atmosphere; preferably, the transition layer is formed by physical vapor deposition of a 50% Cr target + a 50% Si target in a nitrogen atmosphere; preferably, the surface layer is formed by physical vapor deposition of an alloy target in a nitrogen atmosphere, wherein the alloy target has a chromium content of 50-70%, a titanium content of 10-25%, an aluminum content of 10-20%, and a copper content of 3-7%.

3. The PVD non-stick pan as described in claim 1, characterized in that: The thickness of the base layer is 0.4~0.8μm, the thickness of the transition layer is 0.4~0.6μm, and the thickness of the surface layer is 0.5~1.0μm; preferably, the metal pot body is formed by stretching a metal composite sheet, and the metal composite sheet is selected from one of steel-aluminum-steel, steel-aluminum, titanium-aluminum, and titanium-aluminum-steel.

4. The PVD non-stick pan as described in claim 1 or 3, characterized in that: The hardness of the base layer is HV800~900, the hardness of the transition layer is HV2000~2200, and the hardness of the surface layer is HV1500~1800.

5. The PVD non-stick pan as described in claim 1, characterized in that: The negative bias voltage applied to the metal pot body when forming the base layer is greater than the negative bias voltage applied to the metal pot body when forming the surface layer, so as to increase the adhesion between the PVD coating and the metal pot body.

6. The PVD non-stick pan as described in claim 5, characterized in that: The negative bias voltage applied to the metal pot body when forming the base layer is 300-700V, the negative bias voltage applied to the metal pot body when forming the surface layer is 100-300V, and the negative bias voltage applied to the metal pot body when forming the transition layer is 200-300V.

7. A method for preparing a PVD non-stick pan, used to prepare the PVD non-stick pan according to any one of claims 1-9, characterized in that, Includes the following steps: S01. Obtain the metal pot body and preheat it to the set time; S02. Physical vapor deposition is used to form the base layer in an argon atmosphere; S03. A transition layer is formed by physical vapor deposition in a nitrogen atmosphere; S04. A surface layer is formed by physical vapor deposition in a nitrogen atmosphere.

8. The method for preparing a PVD non-stick pan as described in claim 10, characterized in that, In step S01, the atmospheric pressure is 0.3~3 Pa, the preheating temperature is 100~200℃, and the preheating time is 10~25 min; preferably, in step S02, the argon gas flow rate is 200~500 sccm, the intermediate frequency power supply current is 20~50 A, the atmospheric pressure is 0.3~0.9 Pa, the atmospheric temperature is 100~120℃, and the coating time is 10~20 min; preferably, ... In step S03, the nitrogen flow rate is 200-500 sccm, the intermediate frequency power supply current is 20-40 A, the atmospheric pressure is 0.3-0.9 Pa, the atmospheric temperature is 100-120 °C, and the coating time is 10-15 min; preferably, in step S03, argon gas is introduced simultaneously with nitrogen gas, and the argon gas flow rate is 200-500 sccm; preferably, in step S04, the nitrogen flow rate is 50-100 sccm, the intermediate frequency power supply current is 20-30 A, and the coating time is 20-30 min.

9. The method for preparing a PVD non-stick pan as described in claim 8, characterized in that, In step S04, argon gas is introduced simultaneously with nitrogen gas, and the argon gas introduction rate is 200-500 sccm.

10. The method for preparing a PVD non-stick pan as described in claim 8 or 9, characterized in that, The frequency of the intermediate frequency power supply is 40~100 kHz.

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