Cover plate and method of manufacturing the same, electronic device

Abstract

The application provides a cover plate and a preparation method thereof and an electronic device. The cover plate comprises: an anti-glare layer, the anti-glare layer comprising a substrate and a microstructure layer, the microstructure layer being arranged on the surface of the substrate along the thickness direction of the substrate; an anti-reflection layer, the anti-reflection layer being arranged on one side of the anti-glare layer, the anti-reflection layer being a multilayer structure, the refractive index of the multilayer structure gradually decreasing from the side close to the anti-glare layer to the side away from the anti-glare layer; and an anti-fingerprint layer, the anti-fingerprint layer being arranged on the side of the anti-reflection layer away from the anti-glare layer. The cover plate can further reduce the reflectivity, improve the eye protection effect and appearance performance on the basis of ensuring the anti-glare effect.

Description

Technical Field

[0001] This invention relates to the field of display technology, and more particularly to a cover plate and its preparation method, as well as electronic devices. Background Technology

[0002] As the usage time of electronic devices continues to increase, users' demand for eye protection features is growing. Outdoor glare, as one of the important factors causing visual discomfort, has received widespread attention.

[0003] Furthermore, existing cover plates also have shortcomings in terms of overall blackness, and high reflectivity affects the consistency of the display appearance. Therefore, how to further reduce reflectivity, improve eye protection, and enhance appearance while ensuring anti-glare performance has become an urgent technical problem to be solved. Summary of the Invention

[0004] This application provides a cover plate and its preparation method, as well as an electronic device, which, while ensuring the anti-glare effect, further reduce reflectivity, improve eye protection, and enhance appearance.

[0005] This application provides a cover plate, including: An anti-glare layer, comprising a substrate and a microstructure layer, wherein the microstructure layer is disposed on the surface of the substrate along the thickness direction of the substrate; An anti-reflection layer is disposed on one side of the anti-glare layer. The anti-reflection layer has a multi-layer structure, and the refractive index of the multi-layer structure gradually decreases from the side closer to the anti-glare layer to the side farther away from the anti-glare layer. An anti-fingerprint layer is stacked on the side of the anti-reflective layer away from the anti-glare layer.

[0006] In some embodiments, the microstructure layer includes a plurality of microstructure units, and at least one of the microstructure units is projected onto the substrate as a rotationally symmetric pattern.

[0007] In some embodiments, the microstructure unit is in the shape of a frustum, a prism, or a hemispherical structure.

[0008] In some embodiments, the number of layers in the multilayer structure is greater than or equal to 3.

[0009] In some embodiments, the refractive index of the multilayer structure ranges from 1.5 to 2.0.

[0010] In some embodiments, the antireflective layer is made of one or more of zirconium oxide, magnesium fluoride, or aluminum oxide.

[0011] In some embodiments, the antireflective layer has a reflectivity of 0.5% to 2% for visible light.

[0012] In some embodiments, the pencil hardness of the antireflective layer is 6H to 10H.

[0013] This application embodiment also provides a method for preparing a cover plate, used to prepare the above-mentioned cover plate, the method for preparing the cover plate includes: A substrate is provided, and a microstructure layer is formed on one side of the substrate to form an anti-glare layer; An anti-reflection layer is provided on the side of the anti-glare layer away from the substrate. The anti-reflection layer includes a multilayer structure, and the refractive index of the multilayer structure gradually decreases from the side close to the anti-glare layer to the side away from the anti-glare layer. An anti-fingerprint layer is formed on the side of the anti-reflective layer away from the anti-glare layer.

[0014] In some embodiments, an anti-reflection layer is provided on the side of the anti-glare layer away from the substrate, including: forming a multilayer structure on the side of the anti-glare layer having a microstructure layer by a coating process to form an anti-reflection layer.

[0015] In some embodiments, forming a microstructure layer on one side of the substrate includes forming a plurality of microstructure units on the surface of the substrate by a chemical etching process to form the microstructure layer.

[0016] In some embodiments, the chemical etching process includes photolithography.

[0017] This application also provides an electronic device, including: Display panel; A cover plate, the cover plate described above, is disposed on the light-emitting side of the display panel.

[0018] In some embodiments, the microstructure layer includes a plurality of microstructure units, the size of a single microstructure unit being positively correlated with the pixel density of the display panel.

[0019] In the cover plate and its preparation method and electronic device provided in this application embodiment, while retaining the anti-glare layer to diffusely reflect incident light to achieve the anti-glare effect, a refractive index-gradient anti-reflection layer is further introduced. This effectively reduces interface reflection using optical interference effects, and an anti-fingerprint layer is integrated on the outermost layer. The three-layer structure works synergistically to reduce the scattering of direct light and significantly reduce reflectivity, thereby improving eye protection while also contributing to the seamless black appearance of the cover plate. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of a first structure of the cover plate provided in an embodiment of this application.

[0022] Figure 2 This is a schematic diagram of a second structure of the cover plate provided in an embodiment of this application.

[0023] Figure 3 This is a schematic diagram of a third structure of the cover plate provided in an embodiment of this application.

[0024] Figure 4 This is a schematic diagram of the anti-glare layer provided in an embodiment of this application.

[0025] Figure 5 This is a schematic flowchart illustrating the method for preparing the cover plate provided in an embodiment of this application.

[0026] Figure 6 This is a schematic diagram of a first structure of an electronic device provided in an embodiment of this application.

[0027] Figure 7 This is a schematic diagram of a second structure of an electronic device provided in an embodiment of this application.

[0028] Figure 8 This is a schematic diagram of a third structure of an electronic device provided in an embodiment of this application. Detailed Implementation

[0029] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0030] This application provides a cover plate and its manufacturing method, as well as an electronic device, which, while ensuring anti-glare effect, further reduce reflectivity, improve eye protection, and enhance appearance. The following detailed description is provided in conjunction with the accompanying drawings.

[0031] Please see Figure 1 as well as Figure 2 , Figure 1 This is a schematic diagram of a first structure of the cover plate provided in an embodiment of this application. Figure 2This is a schematic diagram of a second structure of the cover plate provided in an embodiment of this application.

[0032] This application provides a cover plate 10. The cover plate 10 includes an anti-glare layer 11, an anti-reflective layer 12, and an anti-fingerprint layer 13.

[0033] The anti-glare layer 11 is used to suppress visual interference caused by ambient light reflection, and it includes a substrate 111 and a microstructure layer 112. The microstructure layer 112 is disposed on the surface of the substrate 111 along the thickness direction of the substrate 111. The microstructure layer 112 is used to scatter incident ambient light, converting specular reflection into diffuse reflection, thereby reducing the stimulation of direct reflected light to the human eye.

[0034] Compared to the randomly rough surface formed by traditional chemical etching, the microstructure layer 112 in this application can be fabricated using precision techniques such as nanolithography or laser micro-engraving to form regularly arranged microstructure units 1121, such as hexagonal frustums, quadrangular frustums, or hemispherical structures, thereby achieving precise control over the light emission direction. These microstructure units 1121 can effectively suppress the flash point effect caused by the superposition of periodic pixel arrangement and random surface refraction, while also avoiding the problem of decreased clarity due to excessive haze.

[0035] The antireflective layer 12 is disposed on one side of the anti-glare layer 11, specifically on the side of the anti-glare layer 11 with the microstructure layer 112. The antireflective layer 12 has a multilayer structure. The refractive index of the multilayer structure gradually decreases from the side closer to the anti-glare layer 11 to the side farther away from the anti-glare layer 11, that is, the layers are arranged in order of decreasing refractive index. This multilayer structure with gradually changing refractive index utilizes the principle of optical interference to cancel out the reflected light at the interfaces of each layer, thereby significantly reducing the reflectivity of the cover plate 10.

[0036] By combining the antireflection layer 12 with the antiglare layer 11, the incident light first has its reflection energy weakened by the antireflection layer 12, and then is evenly dispersed by the antiglare layer 11. Compared with the cover plate 10 using a single antiglare layer structure, this further reduces the harmful reflected light entering the human eye and improves the eye protection effect.

[0037] An anti-fingerprint layer 13 is stacked on the side of the anti-reflective layer 12 away from the anti-glare layer 11. It provides a hydrophobic and oleophobic surface to prevent the adhesion of fingerprints, oil, and other contaminants, while also facilitating cleaning and ensuring the optical performance and appearance consistency of the cover plate 10 during long-term use. The anti-fingerprint layer 13 covers the anti-reflective layer 12, improving the durability and user experience of the cover plate 10 while maintaining optical performance.

[0038] In summary, this application forms a three-layer composite cover plate 10 with a clear structure and complementary functions by stacking the anti-glare layer 11, the anti-reflective layer 12, and the anti-fingerprint layer 13 in a specific optical order. Please refer to [link / reference]. Figure 3 , Figure 3This is a schematic diagram of a third structure of the cover plate provided in this application embodiment. External light sequentially passes through the anti-fingerprint layer 13 and the anti-reflection layer 12 before entering the anti-glare layer 11. Upon exiting, it again passes through the anti-reflection layer 12 and the anti-fingerprint layer 13, forming a light path of "first reducing reflection, then dispersing glare." Compared to the traditional anti-glare layer 11 acting alone, this application's solution effectively reduces reflected energy before the light is dispersed, further weakening the light intensity entering the human eye, thus achieving a superior eye protection effect. Specifically, the anti-glare layer 11 achieves a low flash point and high-definition light scattering effect, the anti-reflection layer 12 suppresses reflection through a multi-layered refractive index gradient design, and the anti-fingerprint layer 13 ensures surface cleanliness and durability. The three layers together constitute a complete anti-glare and anti-reflection optical system, which not only reduces the scattering of direct light but also significantly reduces reflectivity, thereby improving the eye protection effect while contributing to the integrated black appearance of the cover plate 10.

[0039] In some embodiments, please refer to Figure 4 , Figure 4 This is a schematic diagram of the anti-glare layer provided in an embodiment of this application. The microstructure layer 112 includes multiple microstructure units 1121, and at least one microstructure unit 1121 is projected onto the substrate 111 as a rotationally symmetric figure. The microstructure unit 1121 is the basic geometric unit constituting the optical control function of the surface of the anti-glare layer 11. By changing the propagation path of incident light through morphological design, it transforms the specular reflection originally generated on the cover plate 10 into uniform diffuse reflection, thereby reducing the irritating glare of ambient light to the human eye.

[0040] The fact that the projection of the microstructure unit 1121 onto the substrate 111 is a rotationally symmetric pattern means that the orthographic projection of the microstructure unit 1121 onto the plane of the substrate 111 has isotropic characteristics, which can make the light present a uniform scattering distribution in all directions, avoid local bright spots or texture interference caused by uneven directional reflection, and help improve visual comfort and display uniformity.

[0041] Among them, the shape of the microstructure unit 1121 is a frustum structure, a prism structure or a hemispherical structure.

[0042] The aforementioned shapes all have clear geometric contours and can be arrayed on the surface of the substrate 111 using precision processing methods such as nanolithography or laser micro-engraving. Compared with the random rough surface formed by traditional chemical etching, such regular microstructure units 1121 can achieve precise control of the light emission direction.

[0043] Specifically, frustum-shaped structures such as triangular frustums, quadrangular frustums, and hexagonal frustums achieve multiple refractions and scatterings of light through inclined sides, and the angle design of their top and side surfaces can optimize light emission efficiency; columnar structures such as triangular prisms, quadrangular prisms, and hexagonal prisms enhance the lateral emission of light through the vertical or near-vertical shape of their sides; hemispherical structures utilize continuously varying curvature surfaces to achieve smooth scattering transitions over a wide range of angles.

[0044] In some embodiments, please continue reading Figure 1 as well as Figure 2 The multilayer structure has three or more layers, such as three, four, five, or six layers. The antireflection layer 12 employs a stacked structure of three or more film layers, aiming to achieve destructive interference of reflected light in a specific wavelength band through multi-interface interference effects. The choice of the number of layers directly determines the degree of freedom in reflectivity control: the more layers, the more adjustable optical parameters, and theoretically, a wider wavelength and lower residual reflection antireflection effect can be obtained; however, increasing the number of layers also leads to increased process complexity and film thickness. Setting the number of layers to no less than three ensures that the cover plate 10 has stable reflection suppression capabilities in the visible light range.

[0045] The refractive index of the multilayer structure ranges from 1.5 to 2.0. Within this range, the layers are arranged with their refractive indices decreasing progressively from the side closest to the anti-glare layer 11 to the side furthest from it, forming a gradually changing optical path. This gradient distribution of refractive index causes light to refract gradually as it passes through the interfaces between layers, reducing reflection energy at individual interfaces and achieving destructive interference through the phase difference between the reflected light from each layer. Limiting the refractive index to between 1.5 and 2.0 takes into account the refractive index characteristics of common optical coating materials while ensuring a moderate refractive index difference with adjacent layers, such as the anti-glare layer 11 with a refractive index of approximately 1.5, thus avoiding excessive interface reflections caused by abrupt changes in refractive index.

[0046] The antireflective layer 12 is made of one or more of zirconium oxide, magnesium fluoride, or aluminum oxide. All of these materials possess high light transmittance, good chemical stability, and suitable refractive indices, making them suitable optical coating materials. Zirconia has a relatively high refractive index (approximately 2.0), making it suitable for high-refractive-index layers in multilayer structures; magnesium fluoride has a relatively low refractive index (approximately 1.38), commonly used for low-refractive-index layers; and aluminum oxide has a refractive index between the two (approximately 1.65), making it suitable as an intermediate refractive-index layer. By combining different materials, a multilayer structure with a gradual change in refractive index from high to low can be constructed, achieving the antireflective spectral characteristics required by the design goals.

[0047] The antireflection layer 12 has a reflectivity of 0.5% to 2% for visible light, for example, 0.5%, 1%, 1.5%, or 2%. Reflectivity is an indicator of the performance of the antireflection layer 12, representing the proportion of incident visible light energy that returns to the environment after being reflected from the surface of the cover plate 10. Compared to the typical reflectivity of 4% to 8% for a cover plate 10 without an antireflection layer 12, the antireflection layer 12 in this embodiment has a reflectivity of 0.5% to 2%, which can significantly reduce the intensity of reflected light and reduce visual interference and eye irritation caused by specular reflection from the screen surface. This reflectivity range is achieved through the optimization of the thickness and refractive index of the multilayer film system, further weakening the reflected light energy entering the human eye while maintaining the original scattering effect of the anti-glare layer 11, thus improving visibility and eye protection performance in outdoor or strong light environments.

[0048] Based on this, when the electronic device is in a screen-off state, the reduction in the intensity of reflected light on the cover surface makes its overall blackness more uniform and consistent, avoiding color differences or hazy feeling caused by local reflection differences, achieving a "one-piece black" appearance, and improving the visual unity of the electronic device in the screen-off state.

[0049] The pencil hardness of the antireflective layer 12 is between 6H and 10H, such as 6H, 8H, or 10H. Pencil hardness is a standard indicator of the scratch resistance of the film surface; a higher value indicates a harder surface and stronger wear resistance. The antireflective layer 12 is located above the anti-glare layer 11 in the cover plate 10 structure and directly bears external contact and wiping; therefore, it needs sufficient mechanical strength to maintain long-term stability of optical performance. Controlling the hardness of the antireflective layer 12 within the range of 6H to 10H allows it to not only perform optical antireflection but also act as a physical protective layer for the anti-glare layer 11, effectively resisting scratches and wear during daily use, preventing optical degradation caused by surface damage, and extending the service life and visual consistency of the cover plate 10.

[0050] Please see Figure 5 , Figure 5 This is a schematic flowchart illustrating the method for preparing the cover plate provided in an embodiment of this application.

[0051] This application provides a method for preparing a cover plate 10, used to prepare the cover plate 10 in the above embodiments. This preparation method integrates anti-glare, anti-reflection, and surface protection functions onto the same cover plate 10 by sequentially forming a stacked structure of an anti-glare layer 11, an anti-reflection layer 12, and an anti-fingerprint layer 13, thereby obtaining a composite optical cover plate 10 that combines low reflection, low glare, high definition, and good mechanical properties. The preparation method of the cover plate 10 includes the following steps.

[0052] S1. A substrate 111 is provided, and a microstructure layer 112 is formed on one side of the substrate 111 to form an anti-glare layer 11.

[0053] The substrate 111 serves as the structural basis of the cover plate 10 and is typically made of glass, i.e., a glass substrate. The light transmittance, mechanical strength, and chemical stability of this glass substrate provide support for the formation of subsequent functional layers.

[0054] A microstructure layer 112 is disposed on the surface of the substrate 111 to convert incident ambient light from specular reflection to diffuse reflection, thereby reducing glare stimulation to the human eye. The microstructure layer 112 can be formed into an array of regularly arranged microstructure units 1121 through precision processing technology, realizing active control of the direction and uniformity of light scattering, and providing a basic interface for the subsequent optical design of the antireflection layer 12.

[0055] S2. An anti-reflection layer 12 is provided on the side of the anti-glare layer 11 away from the substrate 111. The anti-reflection layer 12 includes a multilayer structure, and the refractive index of the multilayer structure gradually decreases from the side close to the anti-glare layer 11 to the side away from the anti-glare layer 11.

[0056] An antireflective layer 12 is disposed on one side of the antiglare layer 11 with microstructure layer 112, used to further reduce the surface reflectivity of the cover plate 10, achieving a seamless black effect when the screen is off. The multi-layer structure adopts a gradient design with a progressively decreasing refractive index, utilizing the interference cancellation effect between reflected light at the interfaces of each layer to gradually weaken the reflected energy of incident visible light as it passes through the antireflective layer 12. The antireflective layer 12 and the underlying antiglare layer 11 form a synergistic optical path: the antireflective layer 12 first weakens the intensity of reflected light, and the antiglare layer 11 then evenly disperses the residual light, further reducing the reflected light entering the human eye compared to a single antiglare layer 11 structure.

[0057] S3. An anti-fingerprint layer 13 is formed on the side of the anti-reflective layer 12 away from the anti-glare layer 11.

[0058] An anti-fingerprint layer 13 covers the anti-reflective layer 12 and provides a hydrophobic and oleophobic surface to prevent the adhesion of fingerprints, oil, and other contaminants, while facilitating cleaning and maintenance. This anti-fingerprint layer 13 improves the anti-fouling ability and touch smoothness of the cover plate 10 surface while maintaining the optical performance of the underlying anti-reflective layer 12 and anti-glare layer 11, ensuring the consistent appearance and optical stability of the cover plate 10 during long-term use.

[0059] In some embodiments, an anti-reflection layer 12 is provided on the side of the anti-glare layer 11 away from the substrate 111, including: forming a multilayer structure on the side of the anti-glare layer 11 with the microstructure layer 112 by a coating process to form the anti-reflection layer 12.

[0060] The coating process can employ methods such as vapor deposition, sputtering, or atomic layer deposition to achieve precise control over the thickness and refractive index of multilayer films. Since a microstructure layer 112 already exists on the surface of the anti-glare layer 11, the film material will be uniformly deposited along the surface contour of the microstructure layer 112 during the coating process, forming a conformal interface between the anti-reflection layer 12 and the anti-glare layer 11. This maintains the original scattering morphology of the microstructure layer 112 while adding interference anti-reflection functionality to the surface of the microstructure layer 112. The two are optically complementary rather than mutually canceling.

[0061] The formation of a microstructure layer 112 on one side of the substrate 111 includes: forming a plurality of microstructure units 1121 on the surface of the substrate 111 by a chemical etching process to form the microstructure layer 112.

[0062] Chemical etching is a process that uses an etching solution to selectively corrode the glass surface. By controlling the etching time, etching solution concentration, and mask pattern, multiple microstructure units 1121 with specific morphologies are formed on the surface of the substrate 111. This chemical etching process is suitable for large-area, mass production and can obtain a uniformly distributed rough surface, achieving an anti-glare effect.

[0063] Chemical etching processes include photolithography. Photolithography introduces photomask technology on the basis of traditional chemical etching. By coating photoresist, exposing and developing, a nanoscale patterned mask is formed. Then, combined with the etching process, the mask pattern is transferred to the surface of the substrate 111, thereby achieving precise control of the shape, size and arrangement of the microstructure unit 1121.

[0064] Compared to the random rough surface formed by isotropic etching of etchant alone, the photolithography process can produce microstructure units 1121 arranged in a regular pattern, such as truncated squares, hexagonal truncated squares, or hemispheres. Furthermore, the feature size of the microstructure unit 1121 can be matched with the thickness of the substrate 111 according to the pixel size and arrangement characteristics of the display panel 20. This effectively suppresses the flash point effect caused by the superposition of periodic pixel arrangement and random refraction of microstructure unit 1121, and significantly improves display clarity while maintaining anti-glare performance.

[0065] Please see Figure 6 , Figure 6 This is a schematic diagram of a first structure of an electronic device provided in an embodiment of this application.

[0066] This application also provides an electronic device 100, which refers to a terminal product or device that includes a display function and needs to provide visual information to users in complex lighting environments. This includes, but is not limited to, smartphones, tablets, laptops, smartwatches, in-vehicle display systems, aviation instrument displays, outdoor advertising screens, medical display devices, and industrial control human-machine interfaces. This application uses a smartphone as an example for specific description.

[0067] The electronic device 100 includes a display panel 20 and a cover plate 10. The cover plate 10 is the cover plate 10 described in the above embodiments, or the cover plate 10 is a cover plate 10 prepared by the preparation method of the cover plate 10 in the above embodiments. The cover plate 10 is disposed on the light-emitting side of the display panel 20.

[0068] As the core component for image information output, the light emission characteristics of the display panel 20 are determined by the periodic arrangement and density of its pixels. The cover plate 10 is stacked on the light-emitting side of the display panel 20 to regulate the emitted light and process ambient incident light, thereby reducing the impact of reflection and glare on display performance and visual comfort. The cover plate 10 and the display panel 20 together constitute a complete optical system, which are structurally coupled and optically matched.

[0069] The display panel 20 also includes a liquid crystal cell 21, a first polarizer 22, and a second polarizer 23. The first polarizer 22 is disposed on the light-incident side of the liquid crystal cell 21 and is used to convert the unpolarized natural light emitted by the backlight module into linearly polarized light in a specific direction before it is incident on the liquid crystal cell 21. The second polarizer 23 is disposed on the light-emitting side of the liquid crystal cell 21 and is used in conjunction with the first polarizer 22 to achieve brightness modulation of the image by filtering the polarization state of the emitted light. Together, they constitute the light control structure of the display panel 20.

[0070] The microstructure layer 112 includes multiple microstructure units 1121, and the size of a single microstructure unit 1121 is positively correlated with the pixel density of the display panel 20. Pixel density refers to the number of pixels contained in a unit length of the display panel 20, usually characterized by PPI (Pixels Per Inch), and its value directly determines the spatial frequency of the pixel array.

[0071] As the core geometric element for light scattering in the anti-glare layer 11, the size of the microstructure unit 1121 needs to be designed to match the pixel density: when the pixel density is high, the pixel size is small, and if the size of the microstructure unit 1121 is too large, it is easy to form superimposed interference with the pixel period, producing a random moiré effect, i.e., flash point; when the pixel density is low, the pixel size is large, and if the size of the microstructure unit 1121 is too small, it is difficult to form an effective optical scattering effect. Setting the size of the microstructure unit 1121 to be positively correlated with the pixel density aims to keep the spatial frequency of the microstructure unit 1121 and the spatial frequency of the pixel array appropriately deviated, thereby avoiding the formation of obvious periodic interference patterns and suppressing the generation of flash point effect from a physical mechanism.

[0072] The projection of the microstructure unit 1121 onto the substrate 111 is a rotationally symmetric figure. A rotationally symmetric figure refers to a microstructure unit 1121 whose orthographic projection onto the plane of the substrate 111 has isotropic characteristics; that is, after rotating a certain angle in any direction, the figure coincides with itself or has the same geometric contour. Common rotationally symmetric figures include circles, regular hexagons, and squares. The microstructure unit 1121, designed with a rotationally symmetric figure, can generate a uniform light scattering distribution in all directions when subjected to ambient light, avoiding local bright spots or texture interference caused by uneven directional reflection, thereby improving visual comfort and display uniformity.

[0073] Please see Figure 7 , Figure 7 This is a schematic diagram of a second structure of an electronic device provided in an embodiment of this application.

[0074] The dimensions of the microstructure unit 1121 include the lateral feature dimensions, which satisfy equation (1): X = (PPI×10 2 ) / a(1)。

[0075] Where X is the lateral feature size of a single microstructure unit 1121, in nanometers; PPI is the pixel density of the display panel 20, in pixels per inch; and a is a constant in the range of 9 to 15.

[0076] The lateral feature dimension refers to the characteristic geometric dimension of the microstructure unit 1121 in the plane direction of the substrate 111. It can be understood as the diameter of the circumcircle of the projection of the microstructure unit 1121 onto the substrate 111. Taking the microstructure unit 1121 as a frustum structure as an example, the lateral feature dimension can be understood as the diameter of the circumcircle of the base.

[0077] This formula establishes a correlation between pixel density and the lateral feature size of the microstructure unit 1121 through a constant 'a'. The value of 'a', ranging from 9 to 15, is determined based on experimental optimization results from display panels 20 with different resolutions. When 'a' is less than 9, the lateral size of the microstructure unit 1121 is too large, easily causing significant interference with the pixel period, exacerbating the flash point effect. When 'a' is greater than 15, the lateral feature size of the microstructure unit 1121 is too small, resulting in insufficient scattering ability and a decrease in anti-glare effect. Limiting 'a' to the range of 9 to 15 can effectively suppress flash point while ensuring anti-glare effect, reducing the flash point value from 8 to 12 in traditional AG etching to 3 to 4, an improvement of approximately 60%.

[0078] As can be seen from equation (1), the lateral feature size of the microstructure unit is positively correlated with the pixel density. That is, the higher the pixel density, the larger the size of the microstructure unit, so as to avoid the flash point effect.

[0079] The dimensions of the microstructure unit 1121 also include the longitudinal height dimension, which satisfies equation (2).

[0080] Y = (PPI × 10) 4 ) / b(2)。

[0081] Where Y is the longitudinal height dimension of a single microstructure unit 1121, in nanometers; b is a constant in the range of 60 to 80.

[0082] The longitudinal height dimension refers to the protrusion height of the microstructure unit 1121 along the thickness direction of the substrate 111. Its size directly affects the refraction angle and optical path difference of light at the interface of the microstructure layer 112. If the longitudinal height is too small, the light deflection angle is insufficient, and the scattering effect is inadequate; if the longitudinal height dimension is too large, it is easy for light to undergo multiple reflections between adjacent microstructure units 1121, resulting in an increase in stray light. The value of the constant b, ranging from 60 to 80, was determined through optical simulation and experimental verification. Within this range, the microstructure unit 1121 can provide a suitable scattering angle distribution, so that the light maintains sufficient scattering uniformity while avoiding a decrease in clarity due to excessive scattering.

[0083] The thickness of the anti-glare layer satisfies equation (3).

[0084] Z = (PPI × 10) 4 ) / c (3).

[0085] Where Z is the thickness of the anti-glare layer 11, PPI is the pixel density of the display panel 20, and c is a constant in the range of 5 to 10.

[0086] The thickness of the anti-glare layer 11 is composed of the thickness of the substrate 111 and the thickness of the microstructure layer 112. The thickness of the substrate 111 determines the optical path length of light after it is emitted from the display panel 20 and reaches the microstructure layer 112, while the thickness of the microstructure layer 112 corresponds to the vertical height dimension of the microstructure unit 1121. The two work together in the optical path system to jointly affect the propagation path and phase change of light inside the cover plate 10. The value of the constant c is determined based on optical matching experiments under different pixel densities: if the value of c is too small, the anti-glare layer 11 will be too thick, which will easily produce diffraction fringes and will not be conducive to thinning; if the value of c is too large, the anti-glare layer 11 will be too thin, and the superposition of pixel emitted light and microstructure periodicity will easily form a flash point effect.

[0087] Equation (3), together with the design formulas for the lateral feature dimension X and the vertical height dimension Y of the microstructure, constitutes the optical design criteria of this application. By precisely linking the thickness of the anti-glare layer 11 with the pixel density, the thickness of the substrate 111 and the height of the microstructure are synergistically matched. Experiments show that this design can reduce the flash point value from 8 to 12 in the traditional scheme to 3 to 4, significantly improving display clarity while ensuring the anti-glare effect.

[0088] The electronic device 100 also includes a backlight module, which is located on the light-incident side of the display panel 20 and is used to provide a uniform and high-brightness surface light source for the liquid crystal display. Depending on the arrangement of the light source, the backlight module can be designed as a direct-lit backlight module or an edge-lit backlight module 30. The direct-lit backlight module arranges the light source array directly below the diffuser plate, which has the advantages of high brightness and multiple zones; the edge-lit backlight module 30 places the light source on the side of the light guide plate 31, which is more conducive to achieving a thinner and lighter electronic device 100.

[0089] Please see Figure 8 , Figure 8 This is a schematic diagram of a third structure of an electronic device provided in an embodiment of this application. In this application, a side-lit backlight module 30 is used as an example, chosen based on its significant adaptability to the ultra-thin electronic device 100.

[0090] The side-lit backlight module 30 includes a light guide plate 31 and a light source assembly 32. The light source assembly 32 is disposed on one side of the light-incident end face of the light guide plate 31, and the light guide plate 31 is disposed on the light-incident side of the display panel 20.

[0091] The light guide plate 31 is usually made of polymethyl methacrylate or polycarbonate with high light transmittance, and its function is to convert the line light source located on the side into a uniform surface light source.

[0092] The light source assembly 32 includes a photomask 321 and a light strip 322 disposed inside the photomask 321. The light strip 322 is typically a surface-mount light-emitting diode array, and the light emitted by it is reflected and guided by the photomask 321 before entering the interior of the light guide plate 31 for propagation.

[0093] The side-lit backlight module 30 includes, sequentially along the light-emitting direction, a lower diffuser film 33, a first brightness enhancement film 34, a second brightness enhancement film 35, and an upper diffuser film 36. The lower diffuser film 33, the first brightness enhancement film 34, the second brightness enhancement film 35, and the upper diffuser film 36 are disposed on the light-emitting side of the light guide plate 31. The lower diffuser film 33 and the upper diffuser film 36 are used to further scatter light, eliminate smudges and hot spots, and improve brightness uniformity. The first brightness enhancement film 34 and the second brightness enhancement film 35 are typically prism films or reflective polarization brightness enhancement films; their stacked arrangement can effectively converge light and recover polarized redundant light, significantly improving front brightness and optical efficiency.

[0094] In addition, the side-lit backlight module 30 also includes a reflective film 37, which is disposed on the side of the light guide plate 31 away from the lower diffuser film 33 (i.e., the bottom of the light guide plate 31). Its function is to reflect the light leaking to the bottom of the light guide plate 31 back into the light guide plate 31, thereby reducing light energy loss and improving light utilization and overall backlight brightness.

[0095] In summary, the cover plate 10 and its preparation method, as well as the electronic device 100 provided in this application embodiment, while retaining the anti-glare layer 11 to diffusely reflect incident light to achieve the anti-glare effect, further introduce an anti-reflection layer 12 with a gradually changing refractive index. This effectively reduces interface reflection using optical interference effects, and the anti-fingerprint layer 13 is integrated on the outermost layer. The three-layer structure works synergistically to reduce the scattering of direct light and significantly reduce reflectivity, thereby improving the eye protection effect while enhancing the integrated black appearance of the cover plate 10.

[0096] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0097] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more features.

[0098] The foregoing has provided a detailed description of the cover plate, its preparation method, and the electronic device provided in the embodiments of this application. Specific examples have been used to illustrate the principles and implementation methods of this application, and the descriptions of the embodiments above are only for the purpose of helping to understand this application. Furthermore, those skilled in the art will recognize that, based on the ideas of this application, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A cover plate, characterized in that, include: An anti-glare layer, comprising a substrate and a microstructure layer, wherein the microstructure layer is disposed on the surface of the substrate along the thickness direction of the substrate; An anti-reflection layer is disposed on one side of the anti-glare layer. The anti-reflection layer has a multi-layer structure, and the refractive index of the multi-layer structure gradually decreases from the side closer to the anti-glare layer to the side farther away from the anti-glare layer. An anti-fingerprint layer is stacked on the side of the anti-reflective layer away from the anti-glare layer.

2. The cover plate according to claim 1, characterized in that, The microstructure layer includes multiple microstructure units, and at least one of the microstructure units has a rotationally symmetric projection on the substrate.

3. The cover plate according to claim 2, characterized in that, The microstructure unit has the shape of a frustum, prism, or hemispherical structure.

4. The cover plate according to any one of claims 1 to 3, characterized in that, The number of layers in the multi-layer structure is greater than or equal to 3.

5. The cover plate according to any one of claims 1 to 3, characterized in that, The refractive index of the multilayer structure ranges from 1.5 to 2.

0.

6. The cover plate according to any one of claims 1 to 3, characterized in that, The antireflective layer is made of one or more of zirconium oxide, magnesium fluoride, or aluminum oxide.

7. The cover plate according to any one of claims 1 to 3, characterized in that, The antireflective layer has a reflectivity of 0.5% to 2% for visible light.

8. The cover plate according to any one of claims 1 to 3, characterized in that, The pencil hardness of the antireflective layer is 6H to 10H.

9. A method for preparing a cover plate, characterized in that, The method for preparing the cover plate according to any one of claims 1 to 8 includes: A substrate is provided, and a microstructure layer is formed on one side of the substrate to form an anti-glare layer; An anti-reflection layer is provided on the side of the anti-glare layer away from the substrate. The anti-reflection layer includes a multilayer structure, and the refractive index of the multilayer structure gradually decreases from the side close to the anti-glare layer to the side away from the anti-glare layer. An anti-fingerprint layer is formed on the side of the anti-reflective layer away from the anti-glare layer.

10. The method for preparing the cover plate according to claim 9, characterized in that, The anti-reflection layer is disposed on the side of the anti-glare layer away from the substrate, including: forming a multilayer structure on the side of the anti-glare layer with a microstructure layer by means of a coating process to form an anti-reflection layer.

11. The method for preparing the cover plate according to claim 9, characterized in that, Forming a microstructure layer on one side of the substrate includes: forming a plurality of microstructure units on the surface of the substrate by a chemical etching process to form the microstructure layer.

12. The method for preparing the cover plate according to claim 11, characterized in that, The chemical etching process includes photolithography.

13. An electronic device, characterized in that, include: Display panel; A cover plate, wherein the cover plate is the cover plate according to any one of claims 1 to 8, and the cover plate is disposed on the light-emitting side of the display panel.

14. The electronic device according to claim 13, characterized in that, The microstructure layer includes multiple microstructure units, and the size of a single microstructure unit is positively correlated with the pixel density of the display panel.

Images