Abrasive polishing device for devolatilization extruders for plastic pelletization

Abstract

The present application relates to the field of polishing, in particular to the abrasive polishing device for the devolatilization extruder of plastic granulation, including abrasive polishing mechanism, auxiliary mechanism, clamping conveying mechanism, the shell of devolatilization machine is formed by splicing multiple cylinder sections, the clamping conveying mechanism includes sliding mechanism, the sliding mechanism is clamped after cylinder section and moves along horizontal direction, the auxiliary mechanism can be displaced left and right and then extend abrasive polishing mechanism into cylinder section, the abrasive polishing mechanism includes ring cylinder, multiple electromagnetic units, the ring cylinder is coaxially placed in cylinder section, and the two can rotate relative to each other, and the annular grinding gap is formed between the two, the outer surface of ring cylinder has multiple conductive protrusions, and adjacent conductive protrusions form a pair of magnetizing unit II, further including multiple electromagnetic units, and the abrasive can be adsorbed on the outer surface of ring cylinder when the electromagnetic unit is connected with direct current.The beneficial effects achieved by the present application are that each part of abrasive can be fully ground, the utilization rate of abrasive is improved, and the grinding effect of each batch is ensured.

Description

Technical Field

[0001] This invention relates to the field of devolatilizer preparation technology, and in particular to an abrasive polishing device for a devolatilizer extruder used in plastic granulation. Background Technology

[0002] Most current resin devolatilization equipment uses flash evaporators. However, after each feeding in a flash evaporator, the devolatilization must be completed before the next feeding can begin, making continuous devolatilization impossible.

[0003] In order to achieve continuous production and thus improve devolatilization efficiency, our company has designed a twin-screw extrusion devolatilizer with reference to the structure of twin-screw extruders (there are a few similar devices on the market, but the screw extrusion structures used by each company are different).

[0004] Currently, in existing twin-screw extruders (similar to twin-screw extruders), the cross-section is typically a horizontally tilted figure-eight shape—resembling the number "∞". However, these types of extractors are usually small-sized (most on the market are small-diameter), and often use two steel pipes cut in half and welded together to form a barrel with an "∞" cross-section—as the inner liner of the barrel. However, for large-sized twin-screw extruders (with larger inner cylinder diameters), it is no longer possible to use two steel pipes welded together—because two independent steel pipes cannot provide sufficient structural strength to withstand the high pressure during extrusion.

[0005] Therefore, for large-size twin-screw extruder devolatilizers, our company directly uses a section of base steel, machining a straight hole in the shape of an infinity symbol (∞) onto this base steel. Then, through centrifugal casting, a layer of wear-resistant alloy (such as tungsten boride, chromium boride, etc.) is metallurgically bonded to the inner cavity of the infinity symbol. Afterward, a precise infinity-shaped inner cavity is machined to form the cylinder section of the large-size twin-screw extruder devolatilizer; then, the corresponding cylinder sections are welded. However, it was found that although this method is convenient for processing, the roughness and precision of the inner cavity are difficult to meet the standards, thus affecting the devolatilization effect.

[0006] To this end, our company processes a cylindrical section (ensuring a certain wall thickness) on a base steel material, then polishes the inner wall of the cylindrical section using magnetic grinding; then, after cutting off a portion of the two cylindrical sections, they are welded together to finally form an outer shell section with a cross-section of "∞".

[0007] When grinding the cylindrical sections using ordinary magnetic abrasive grinding, the grinding effect was found to be less than ideal. The results of each batch of grinding were highly random (requiring frequent testing after grinding for a period of time), and the abrasive was wasted significantly (leading to high costs). In addition, if the tooling used for fixing and clamping is not precise enough after grinding the cylindrical sections of this large-sized devourer, it is easy for the cylindrical sections to be out of sync with the axis.

[0008] To address these issues, our company has designed an abrasive polishing device for a devolatilization extruder used in plastic granulation; and for better protection, we have filed separate patent applications for each patent point. Summary of the Invention

[0009] The purpose of this invention is to overcome the shortcomings of the prior art and provide an abrasive polishing device for a devolatilization extruder used in plastic granulation, solving the problems of poor grinding effect, serious abrasive waste, and low fixing accuracy when fixed with subsequent welding fixtures.

[0010] The objective of this invention is achieved through the following technical solution: an abrasive polishing device for a devolatilization extruder used for plastic granulation, and a large-size devolatilization extruder shell, the shell being composed of multiple cylindrical sections machined into a circle and spliced ​​together; The large-size devourer housing is composed of multiple machined circular cylindrical sections, including an abrasive polishing mechanism, an auxiliary mechanism, and a clamping and conveying mechanism. The clamping and conveying mechanism includes multiple sliding mechanisms on the front side and multiple sliding mechanisms on the rear side. All sliding mechanisms can slide horizontally left and right. Both the front and rear sliding mechanisms have clamping arms, and the ends of the clamping arms are semi-circular grooves A. The semi-circular grooves A on the front and rear sides can completely clamp and hold the cylinder sections of the twin-screw extruder. The auxiliary mechanism can move left and right along the top of the factory building. The auxiliary mechanism has an extended abrasive polishing mechanism that can extend into the cylindrical section. The abrasive polishing mechanism includes a ring cylinder and multiple electromagnetic units; The ring cylinder is coaxially placed inside the cylindrical section, and the two can rotate relative to each other, forming an annular grinding gap between them. Abrasive is then filled into the grinding gap. Furthermore, the ring cylinder is a non-magnetic and non-conductive cylinder with multiple conductive protrusions on its outer surface. A pair of magnetizing units II are formed between adjacent conductive protrusions. When a direct current is applied to adjacent conductive protrusions, the abrasive between them can be magnetized. When the electromagnetic unit is supplied with DC, it can cause the abrasive to adhere to the outer surface of the ring cylinder; when the electromagnetic unit is supplied with AC, it can cause the abrasive to demagnetize. Furthermore, the cylinder can be radially magnetized. In addition, the abrasive contains iron powder, magnetite powder, and corundum powder—allowing the abrasive to be magnetized and demagnetized. After the ring and cylinder sections rotate relative to each other and grind normally for a period of time: first, the abrasive is demagnetized by the electromagnetic unit, and then the ring and cylinder sections are rotated again - causing the abrasive to flip and change its orientation. Then, the abrasive is magnetized by the magnetization unit II - so that the abrasive has new N and S poles in the new orientation. Then, normal grinding is performed, thus forming a process in which all parts of the abrasive can be utilized.

[0011] As a preferred technical solution of this application, the structure of the conductive protrusions on the surface of the ring cylinder is as follows: grooves are uniformly opened on the surface of the ring cylinder, so that the surface of the ring cylinder has multiple protruding strips, the protruding strips are parallel to the axis, and conductive strips are embedded in the protruding surfaces of the protruding strips, and only the corresponding wires of the conductive strips are connected to the DC magnetizer.

[0012] As a preferred technical solution of this application, a plurality of electromagnetic units are evenly distributed in a ring along the inner wall of the annular cylinder; the direction of the nearest N / S poles of the electromagnetic units is from the inner ring to the outer ring. When the electromagnetic units are not energized, the magnetized abrasive adheres to the inner wall of the cylinder for coarse grinding; when the electromagnetic units are energized, the magnetized abrasive adheres to the outer surface of the annular cylinder—forming a form for fine grinding of the inner wall of the cylinder, and during fine grinding, the N / S poles of the electromagnetic units can change at intervals to cause the abrasive to tumble.

[0013] Furthermore, the adjacent electromagnetic units distributed in a ring on the inner wall of the ring cylinder have opposite magnetic polarities at the outer ring position; when the abrasive changes position along the ring on the outer surface of the ring cylinder, the abrasive can be agitated.

[0014] As a preferred technical solution of this application, it also includes a double-layer auxiliary thin cylinder; the double-layer auxiliary thin cylinder includes an inner cylinder and an outer cylinder, with an annular gap formed between the inner and outer cylinders, and annular caps at both ends of the annular gap; the inner diameter of the inner cylinder is larger than the outer diameter of the annular cylinder, and the outer diameter of the outer cylinder is smaller than the inner diameter of the cylinder section. When loading abrasive: the cylinder section is magnetized axially, the annular gap of the double-layer auxiliary thin cylinder is filled with abrasive, the double-layer auxiliary thin cylinder filled with abrasive is inserted along the inner wall of the cylinder section, and then the annular cylinder is inserted along the inner wall of the double-layer auxiliary thin cylinder; then the annular caps are removed, and the outer cylinder is gradually removed by rotation. At this time, the abrasive is adsorbed on the inner wall of the cylinder section, and then the inner cylinder is gradually removed by rotation.

[0015] As a preferred technical solution of this application, the auxiliary mechanism includes a left auxiliary part and a right auxiliary part. The left auxiliary part includes a circular seat A, with a rotatable shaft passing through the center of the circular seat A. One end of the shaft is connected to a grinding auxiliary motor, and the other end of the shaft is fixed to the axis of the ring cylinder of the abrasive polishing mechanism. The shaft has a recessed hole at the end face of the abrasive polishing mechanism. The right auxiliary part includes a circular seat B, which has a pin head. The circular seat A is fixed to the output end of the vertical telescopic cylinder A, and the circular seat B is fixed to the output end of the vertical telescopic cylinder B. A track C is provided on the top of the workshop along the left and right direction. The tops of the vertical telescopic cylinder A and the vertical telescopic cylinder B are respectively mounted on the track C via corresponding movable seats. When the left auxiliary part moves, the abrasive polishing mechanism can be inserted into the cylinder section. When the right auxiliary part moves, the pin head abuts against the recessed hole of the rotating shaft on the left auxiliary part. The cylindrical energy-saving device moves via a clamping and conveying mechanism to the next plasma welding process after grinding and polishing, and plasma welding is performed under the clamping of the clamping and conveying mechanism.

[0016] As a preferred technical solution of this application, the clamping and conveying mechanism includes a slide rail A, a slide block A, and a semi-circular groove head A; the front and rear walls of the factory are respectively provided with left and right horizontal slide rails A, and the slide block A is installed inside the slide rail A; after the slide block A is electrically connected to the control panel, it can slide left and right along the slide rail A and can slide to any position; the slide block A has a corresponding clamping arm that can extend and retract forward / backward, and the end of the clamping arm has a semi-circular groove head A; after the front and rear semi-circular groove heads A clamp the cylinder section, the two semi-circular groove heads A can form a complete cylindrical surface - thereby completely clamping the cylinder section and keeping the axis of the cylinder section in a horizontal state.

[0017] As a preferred technical solution of this application, the clamping and conveying mechanism further includes a flexible-rigidity variable clamping part and a clamping bearing. The flexible-rigidity variable clamping part includes a flat rubber ring A and a flat rubber ring B, with a flat rubber ring B on each side of the flat rubber ring A, and all three are fitted onto the outer cylindrical surface of the cylindrical section. The flat rubber ring A contains a liquid alloy, and the flat rubber ring B contains a medium liquid, which is connected to a heating-cooling circulation device. When the heating-cooling circulation device heats the medium liquid, the heated medium liquid transfers heat to the liquid alloy in the flat rubber ring B, keeping the liquid alloy in a liquid state. When the heating-cooling circulation device heats the medium liquid, the cooling effect causes the liquid alloy in the flat rubber ring B to solidify. The clamping bearing is fitted onto the flexible-rigidity variable clamping part, and the semi-circular groove A on the front and rear sliding mechanisms clamps the clamping bearing.

[0018] As a preferred technical solution of this application, slide rails B are provided at the base of the front and rear walls of the delivery room in the left and right directions. Each flat rubber ring B is connected to a heating-cooling circulation device. Each heating-cooling circulation device slides along the slide rail B with the left and right position of the cylinder section through a corresponding drive mechanism. The heating-cooling circulation device is connected to the control panel.

[0019] The present invention has the following advantages: it can fully grind all parts of the abrasive, improve the utilization rate of the abrasive, and ensure the grinding effect of each batch; and it can ensure the tooling accuracy of subsequent welding. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the structure of the present invention (a schematic diagram of the entire abrasive polishing device being set up in the process preceding the plasma welding process via corresponding slide rail A). Figure 2 This is a schematic diagram of an abrasive polishing device where the abrasive polishing mechanism is not inserted into the cylindrical section. Figure 3 This is a schematic diagram of a structure in which the abrasive polishing device does not extend the abrasive polishing mechanism into the cylinder section after the abrasive is loaded onto the double-layer auxiliary thin cylinder. Figure 4 A schematic diagram of the cross-section in which the clamping and conveying mechanism clamps the cylinder section; Figure 5 This is a schematic diagram of the structure in which the annular cylinder is located inside the cylinder section and magnetic lines of force are formed between the various protrusions of the annular cylinder. Figure 6 for Figure 5 Enlarged view of part of the image; Figure 7 This is a schematic diagram of the double-layer auxiliary thin cylinder structure; In the picture: 100-Abrasive polishing mechanism, 10-Cylinder section, 20-Ring cylinder, 21-Conductive protrusion, 2101-Protrusion strip, 2102-Conductive strip, 30-Electromagnetic unit, 40-Double-layer auxiliary thin cylinder, 41-Inner cylinder, 42-Outer cylinder; 200-Auxiliary mechanism, 51-Left auxiliary part, 5101-Auxiliary motor, 5102-Vertical telescopic cylinder A, 52-Right auxiliary part, 5201-Ejector head, 5202-Vertical telescopic cylinder B; 300-Clamping and conveying mechanism, 61-Semi-circular groove head A, 62-Slide rail A, 63-Slide seat A, 71-Flat rubber ring A, 72-Flat rubber ring B, 81-Clamping bearing. Detailed Implementation

[0021] The present invention will be further described below with reference to the accompanying drawings, but the scope of protection of the present invention is not limited to the following description.

[0022] It should be noted that the orientation or positional relationship indicated by terms such as "left" and "right" is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of the invention is usually placed during use, or the orientation or positional relationship in which those skilled in the art would conventionally understand it. Such terms are only for the convenience of describing the invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention.

[0023] It should be noted that, unless otherwise specified, the embodiments and features and technical solutions in the present invention can be combined with each other.

[0024] like Figures 1-7 As shown, the abrasive polishing device for a devolatilization extruder used for plastic granulation includes an abrasive polishing mechanism 100, an auxiliary mechanism 200, and a clamping and conveying mechanism 300. For large-size devourer housings, the housing is composed of multiple cylindrical sections 10 that have been machined into a circle and spliced ​​together; The clamping and conveying mechanism 300 includes multiple sliding mechanisms on the front side and multiple sliding mechanisms on the rear side. All sliding mechanisms can slide horizontally left and right. Both the front and rear sliding mechanisms have clamping arms, and the ends of the clamping arms are semi-circular grooves A61. The semi-circular grooves A on the front and rear sides can completely clamp the cylinder section 10 of the twin-screw extruder. The auxiliary mechanism 200 can move left and right along the top of the factory building. The auxiliary mechanism 200 has an extended abrasive polishing mechanism 100, which can extend into the cylindrical section 10. The abrasive polishing mechanism 100 includes a ring cylinder 20 and multiple electromagnetic units 30. The ring cylinder 20 is coaxially placed inside the cylinder section 10, and the two can rotate relative to each other, forming an annular grinding gap between them. The grinding material is then filled into the grinding gap. Furthermore, the ring cylinder 20 is a non-magnetic and non-conductive cylinder, and has multiple conductive protrusions 21 on its outer surface. A pair of magnetizing units II are formed between adjacent conductive protrusions 21, and the adjacent conductive protrusions 21 can magnetize the abrasive material between them when a direct current is applied. When DC current is applied to the electromagnetic unit 30, the abrasive can be adsorbed onto the outer surface of the ring cylinder 20; when AC current is applied to the electromagnetic unit 30, the abrasive can be demagnetized; and the cylinder section 10 can be radially magnetized. In addition, the abrasive contains iron powder, magnetite powder, and corundum powder—allowing the abrasive to be magnetized and demagnetized. After the ring and cylinder sections rotate relative to each other and grind normally for a period of time: first, the abrasive is demagnetized by the electromagnetic unit 30, and then the ring and cylinder sections are rotated again - causing the abrasive to flip and change its orientation. Then, the abrasive is magnetized by the magnetization unit II - so that the abrasive has new N and S poles in the new orientation, and then it is ground normally again, thus forming a process in which all parts of the abrasive can be utilized.

[0025] The structure of the conductive protrusions will be further explained below.

[0026] The structure of the conductive protrusions 21 on the surface of the ring cylinder 20 is as follows: grooves are uniformly opened on the surface of the ring cylinder 20, so that the surface of the ring cylinder has multiple protrusions 2101, the protrusions 2101 are parallel to the axis, and conductive strips 2102 are embedded in the protrusions of the protrusions 2101. Only the corresponding wires of the conductive strips 2102 are connected to the DC magnetizer.

[0027] During operation, the abrasive material can be tumbled as the ring and cylinder sections rotate relative to each other.

[0028] The electromagnetic unit will be further explained below.

[0029] Multiple electromagnetic units 30 are evenly distributed in a ring along the inner wall of the annular cylinder 20, with the direction of the nearest N / S poles of the electromagnetic units 30 from the inner ring to the outer ring. Therefore, when the electromagnetic units 30 are not energized, the magnetized abrasive adheres to the inner wall of the cylinder for rough grinding. When the electromagnetic units 30 are energized, the magnetized abrasive adheres to the outer surface of the annular cylinder—forming a process of fine grinding of the inner wall of the cylinder. During fine grinding, the N / S poles of the electromagnetic units 30 can change at regular intervals, causing the abrasive to tumble.

[0030] Furthermore, the adjacent electromagnetic units 30 distributed in a ring on the inner wall of the ring cylinder 20 have opposite magnetic polarities at their outer ring positions. When the abrasive changes position along the ring on the outer surface of the ring cylinder, the abrasive can be agitated.

[0031] This solution also includes a double-layer auxiliary thin cylinder 40, which is used to assist in loading abrasive.

[0032] Specifically, the double-layer auxiliary thin cylinder 40 includes an inner cylinder 41 and an outer cylinder 42, with an annular gap between them. Annular caps are provided at both ends of the annular gap. The inner diameter of the inner cylinder is larger than the outer diameter of the annular cylinder 20, and the outer diameter of the outer cylinder 42 is smaller than the inner diameter of the cylinder section 10. When loading abrasive: the cylinder section 10 is magnetized axially, and the annular gap of the double-layer auxiliary thin cylinder 40 is filled with abrasive. The abrasive-filled double-layer auxiliary thin cylinder 40 is inserted along the inner wall of the cylinder section 10, and then the annular cylinder 20 is inserted along the inner wall of the double-layer auxiliary thin cylinder 40. The annular caps are then removed, and the outer cylinder 42 is gradually removed by rotation. At this time, the abrasive adheres to the inner wall of the cylinder section. The inner cylinder 41 is then gradually removed by rotation.

[0033] The auxiliary mechanisms will be further explained below.

[0034] The auxiliary mechanism 200 includes a left auxiliary part 51 and a right auxiliary part 52; The left auxiliary part 51 includes a circular seat A, with a rotatable shaft passing through the center of the circular seat A. One end of the shaft is connected to the grinding auxiliary motor 5101, and the other end of the shaft is fixed at the axis of the ring cylinder 20 of the abrasive polishing mechanism 100. Furthermore, the shaft has a recessed hole at the end face of the abrasive polishing mechanism 100. The right auxiliary part 52 includes a round seat B, which has a pin head 5201; Among them, round seat A is fixed to the output end of vertical telescopic cylinder A5102, and round seat B is fixed to the output end of vertical telescopic cylinder B5202; a track C is provided on the top of the factory building along the left and right direction, and the tops of vertical telescopic cylinder A5102 and vertical telescopic cylinder B5202 are respectively installed on track C via corresponding movable seats. During operation, when the left auxiliary part 51 moves, the abrasive polishing mechanism 100 can be inserted into the cylindrical section 10. When the right auxiliary part 52 moves, the ejector head 5201 abuts against the recessed hole of the rotating shaft on the left auxiliary part 51.

[0035] The clamping and conveying mechanism will be further explained below.

[0036] The clamping and conveying mechanism 300 includes a slide rail A62, a slide block A63, and a semi-circular groove head A61. The slide rail A62 is installed horizontally on the front and rear walls of the factory building, and the slide block A63 is installed inside the slide rail A62. After being electrically connected to the control panel, the slide block A63 can slide left and right along the slide rail A62 and can slide to any position. The slide block A63 has corresponding clamping arms that can extend and retract forward and backward, and the ends of the clamping arms have semi-circular groove heads A61.

[0037] During operation, after the front and rear semicircular groove heads A61 clamp the cylinder section 10, the two semicircular groove heads A61 can form a complete cylindrical surface - thus completely clamping the cylinder section and keeping the axis of the cylinder section in a horizontal state. Furthermore, the cylindrical section 10 can be moved by the clamping and conveying mechanism 300 to the next plasma welding process after grinding and polishing, and plasma welding is performed under the clamping of the clamping and conveying mechanism 300.

[0038] In this embodiment, the clamping and conveying mechanism 300 further includes a flexible-rigidity variable clamping part and a clamping bearing 81; The flexible-rigidity change clamping part includes a flat rubber ring A71 and a flat rubber ring B72. A flat rubber ring B72 is provided on both sides of the flat rubber ring A71 and the three are sleeved on the outer cylindrical surface of the cylindrical section 10. The flat rubber ring A71 contains a liquid alloy, and the flat rubber ring B72 contains a medium liquid. The medium liquid is connected to a heating-cooling circulation device. When the heating-cooling circulation device heats the medium liquid, the heated medium liquid transfers heat to the liquid alloy in the flat rubber ring B72, keeping the liquid alloy in a liquid state. When the heating-cooling circulation device heats the medium liquid, the cooling effect keeps the liquid alloy in the flat rubber ring B72 in a solid state. The clamping bearing is sleeved on the flexible-rigidity variable clamping part, and the semi-circular groove A61 on the front and rear sliding mechanism clamps the clamping bearing 81.

[0039] Furthermore, slide rails B are installed at the base of the front and rear walls of the delivery room in the left and right directions. Each flat rubber ring B72 is connected to a heating-cooling circulation device. Each heating-cooling circulation device slides along slide rail B with the left and right position of the cylinder section through a corresponding drive mechanism. The heating-cooling circulation device is connected to the control panel.

[0040] Preferably, in this solution, the abrasive contains iron powder, magnetite powder, and corundum powder—allowing the abrasive to be magnetized and demagnetized.

[0041] The above embodiments only illustrate preferred implementation methods, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of this invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this invention, and these all fall within the protection scope of this invention.

Claims

1. An abrasive polishing device for a devolatilization extruder used in plastic granulation, comprising a large-size devolatilization extruder shell, the shell being composed of multiple mechanically machined circular cylindrical sections (10) joined together, characterized in that: It includes an abrasive polishing mechanism (100), an auxiliary mechanism (200), and a clamping and conveying mechanism (300). The clamping and conveying mechanism (300) includes multiple sliding mechanisms on the front side and multiple sliding mechanisms on the rear side, all of which can slide horizontally left and right. Both the front and rear sliding mechanisms have clamping arms, and the ends of the clamping arms are semi-circular grooves A (61); the semi-circular grooves A on the front and rear sides can completely clamp the cylinder section (10) of the twin-screw extruder. The auxiliary mechanism (200) can move left and right along the top of the factory building. The auxiliary mechanism (200) has an extended abrasive polishing mechanism (100) that can extend into the cylindrical section (10). The abrasive polishing mechanism (100) includes an annular cylinder (20) and multiple electromagnetic units (30); The annular cylinder (20) is coaxially placed inside the cylindrical section (10), and the two can rotate relative to each other, forming an annular grinding gap between them. Abrasive is then filled into the grinding gap. Furthermore, the annular cylinder (20) is a non-magnetic and non-conductive cylinder, and has multiple conductive protrusions (21) on its outer surface. A pair of magnetizing units II are formed between adjacent conductive protrusions (21), and the adjacent conductive protrusions (21) can magnetize the abrasive between them after being energized with direct current. When the electromagnetic unit (30) is supplied with DC, it can cause the abrasive to adhere to the outer surface of the ring cylinder (20); when the electromagnetic unit (30) is supplied with AC, it can cause the abrasive to be demagnetized; and the cylinder section (10) can be radially magnetized. In addition, the abrasive contains iron powder, magnetite powder, and corundum powder—allowing the abrasive to be magnetized and demagnetized. After the ring and cylinder sections rotate relative to each other and are ground normally for a period of time: first, the abrasive is demagnetized by the electromagnetic unit (30), and then the ring and cylinder sections are rotated again to make the abrasive flip and change its orientation. Then, the abrasive is magnetized by the magnetizing unit II to make the abrasive have new N and N poles in the new orientation. Then, normal grinding is performed to form a system in which all parts of the abrasive can be utilized.

2. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 1, characterized in that: The structure of the conductive protrusions (21) on the surface of the ring cylinder (20) is as follows: Grooves are uniformly provided on the surface of the ring cylinder (20) to give the surface of the ring cylinder multiple raised strips (2101), the raised strips (2101) are parallel to the axis, and a conductive strip (2102) is embedded in the raised surface of the raised strip (2101). Only the corresponding wire of the conductive strip (2102) is connected to the DC magnetizer.

3. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 2, characterized in that: The multiple electromagnetic units (30) are evenly distributed in a ring along the inner wall of the annular cylinder (20); The direction of the N and S poles of the electromagnetic unit (30) is from the inner ring to the outer ring. When the electromagnetic unit (30) is not powered, the magnetized abrasive is adsorbed on the inner wall of the cylinder for rough grinding; When the electromagnetic unit (30) is energized, the magnetized abrasive is adsorbed on the outer surface of the ring cylinder, forming a form of fine grinding of the inner wall of the cylinder section. During fine grinding, the N and N poles of the electromagnetic unit (30) can change at intervals to make the abrasive turn over.

4. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 3, characterized in that: The adjacent electromagnetic units (30) distributed in a ring on the inner wall of the ring cylinder (20) have opposite magnetic polarities at the outer ring position; When the abrasive changes position along the ring on the outer surface of the ring cylinder, the abrasive can be tumbled.

5. The abrasive polishing apparatus for a devolatilization extruder for plastic granulation according to any one of claims 2 to 4, characterized in that: It also includes a double-layer auxiliary thin cylinder (40); The double-layer auxiliary thin cylinder (40) includes an inner cylinder (41) and an outer cylinder (42), with an annular gap formed between the inner cylinder and the outer cylinder, and annular caps provided at both ends of the annular gap; The inner diameter of the inner cylinder is greater than the outer diameter of the ring cylinder (20), and the outer diameter of the outer cylinder (42) is smaller than the inner diameter of the cylinder section (10); When filling abrasive: magnetize the cylinder section (10) along the axial direction, fill the annular gap of the double-layer auxiliary thin cylinder (40) with abrasive, insert the double-layer auxiliary thin cylinder (40) filled with abrasive along the inner wall of the cylinder section (10), and then insert the ring cylinder (20) along the inner wall of the double-layer auxiliary thin cylinder (40); then unscrew the annular cover, and gradually remove the outer cylinder (42) by rotating the cylinder. At this time, the abrasive is adsorbed on the inner wall of the cylinder section, and then gradually remove the inner cylinder (41) by rotating the cylinder.

6. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 1, characterized in that: The auxiliary mechanism (200) includes a left auxiliary part (51) and a right auxiliary part (52); The left auxiliary part (51) includes a round seat A, with a rotating shaft passing through the center of the round seat A. One end of the rotating shaft is connected to the grinding auxiliary motor (5101), and the other end of the rotating shaft passes through and is fixed at the center of the ring cylinder (20) of the abrasive polishing mechanism (100). The shaft has a recessed hole at the end face of the abrasive polishing mechanism (100); The right auxiliary part (52) includes a round seat B, which has a pin head (5201). The circular seat A is fixed to the output end of the vertical telescopic cylinder A (5102), and the circular seat B is fixed to the output end of the vertical telescopic cylinder B (5202). A track C is provided on the top of the factory building along the left and right direction. The tops of the vertical telescopic cylinder A (5102) and the vertical telescopic cylinder B (5202) are respectively installed on the track C via corresponding movable seats. When the left auxiliary part (51) moves, the abrasive polishing mechanism (100) can be inserted into the cylindrical section (10). When the right auxiliary part (52) moves, the ejector pin (5201) abuts against the recessed hole of the rotating shaft on the left auxiliary part (51).

7. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 1, characterized in that: The clamping and conveying mechanism (300) includes a slide rail A (62), a slide block A (63), and a semi-circular groove head A (61); The front and rear walls of the factory building are respectively equipped with horizontal slide rails A (62) in the left and right directions. The slide rails A (62) are equipped with slide blocks A (63). After the slide blocks A (63) are electrically connected to the control panel, they can slide left and right along the slide rails A (62) and can slide to any position. The slide blocks A (63) have corresponding clamping arms that can extend forward / backward. The ends of the clamping arms have semi-circular grooves A (61). After the front and rear semicircular groove head A (61) clamps the cylinder section (10), the two semicircular groove heads A (61) can form a complete cylindrical surface - thus completely clamping the cylinder section and keeping the axis of the cylinder section in a horizontal state; The cylindrical section (10) can be moved by the clamping and conveying mechanism (300) to the next plasma welding process after grinding and polishing, and plasma welding is performed under the clamping of the clamping and conveying mechanism (300).

8. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 7, characterized in that: The clamping and conveying mechanism (300) further includes a flexible-rigidity variable clamping part and a clamping bearing (81). The flexible-rigid change clamping part includes a flat rubber ring A (71) and a flat rubber ring B (72). A flat rubber ring B (72) is provided on both sides of the flat rubber ring A (71), and the three are sleeved on the outer cylindrical surface of the cylindrical section (10). Among them, the flat rubber ring A (71) contains a liquid alloy, and the flat rubber ring B (72) contains a medium liquid. The medium liquid is connected to the heating-cooling circulation equipment. When the heating-cooling circulation equipment heats up the medium liquid, the heated medium liquid transfers heat to the liquid alloy of the flat rubber ring B (72) to keep the liquid alloy in a liquid state. When the heating-cooling circulation equipment heats up the medium liquid, the cooling energy keeps the liquid alloy of the flat rubber ring B (72) in a solid state. The clamping bearing is sleeved on the flexible-rigid changing clamping part, and the semi-circular groove A (61) on the front and rear sliding mechanism clamps the clamping bearing (81) with a hoop.

9. The abrasive polishing device for a devolatilization extruder for plastic granulation according to claim 8, characterized in that: Slide rails B are provided at the base of the front and rear walls of the delivery room in the left and right directions. Each flat rubber ring B (72) is connected to a heating-cooling circulation device. Each heating-cooling circulation device slides along slide rail B with the left and right position of the cylinder section through a corresponding drive mechanism. The heating-cooling cycle equipment is connected to the control panel.

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