Shooting mechanism adaptive to feeding of chain machine
By designing a wafer-tapping mechanism adapted to chain-type feeding, automatic adjustment and leveling of silicon wafers of different specifications were achieved, solving the compatibility problem when switching silicon wafer specifications in existing technologies, and improving production efficiency and product quality.
Patent Information
- Application Number
- CN202520290780.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-24
- Publication Date
- 2025-12-23
- Estimated Expiration
- 2035-02-24
AI Technical Summary
Existing wafer fabrication facilities are incompatible when switching between different silicon wafer specifications, leading to decreased production efficiency and unstable product quality. Work needs to be suspended for shielding, increasing the breakage rate and rework rate.
A film-shooting mechanism adapted to chain-type feeding was designed. By adjusting the height of the adjusting plate and rollers, it can accommodate silicon plates of different thicknesses. Combined with the leveling system of electric cylinder and beam emitter, it ensures that the silicon plate is parallel to the conveying direction.
It enables effective leveling of silicon boards of different specifications, improves production efficiency and product quality stability, reduces breakage rate and rework, and enhances the continuity and accuracy of automated production.
Smart Images

Figure CN223703937U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to photovoltaic panel processing technical field especially relates to a kind of piece shooting mechanism of adaptation chain type machine feeding. BACKGROUND
[0002] Photovoltaic panel processing is a comprehensive manufacturing process, and the transportation process as a link connecting each production link is particularly important. In the processing of photovoltaic panels, each step of conversion from raw materials to finished products is accompanied by precise and efficient logistics transportation. First, high-purity silicon raw materials need to be safely transported to the processing workshop after strict quality control, which requires the transportation tool to have shockproof and dustproof functions to ensure that the quality of the raw materials is not damaged. Subsequently, in the silicon wafer cutting, cell preparation, assembly packaging and other processing stages, semi-finished products need to be circulated on highly automated production lines, which relies on intelligent logistics systems to achieve fast and accurate positioning and transmission.
[0003] In the fine process of silicon wafer processing and transportation, due to the combined effect of various physical factors, silicon wafers may experience slight deviation. This deviation may be caused by mechanical vibration during processing, incomplete uniformity of the transmission belt, or small size differences and surface property changes in the silicon wafer itself. Especially on high-speed automated production lines, the slight deviation at each step may accumulate when the silicon wafer undergoes cutting, polishing, cleaning and other processes, ultimately causing the silicon wafer to deviate from the predetermined trajectory during transportation. This deviation not only affects the continuity and stability of the production line, but also may adversely affect subsequent processing steps such as precise alignment and assembly, thereby affecting the quality and performance of the final product.
[0004] Due to the possibility of deviation of the silicon wafer during transportation, the role of the wafer shooting mechanism is particularly important, as it can effectively flatten the silicon wafer and ensure that it is parallel to the conveying direction of the conveying mechanism, thereby preventing excessive deviation from affecting subsequent production. However, in actual operation, when switching between different specifications of silicon wafer sources, the original wafer shooting mechanism may not be compatible with the new specification, resulting in the need to adopt shielding processing, i.e. temporarily stopping the work of the wafer shooting mechanism. This shielding solves the compatibility problem, but also increases the fragment rate and rework ratio during the feeding process, posing a challenge to production efficiency and product quality. SUMMARY
[0005] The utility model aims to provide a kind of piece shooting mechanism of adaptation chain type machine feeding to solve the above deficiencies in the prior art.
[0006] In order to achieve the above object, the utility model discloses the following technical scheme: a kind of film taking mechanism of adapting chain type machine loading, including crossbeam, two sliding frames are slidably installed on the crossbeam, the bottom of two sliding frames is fixedly installed with fixed plate, the lower of two fixed plates is provided with adjusting plate, the bottom of adjusting plate is fixedly installed with connecting plate, the top of connecting plate is rotatably installed with pivot, the bottom of pivot is connected with connecting plate and fixedly installed with gyro wheel, the lateral wall of adjusting plate is equipped with two sliding slots, the lateral wall of fixed plate is equipped with two threaded holes, bolt is provided on the sliding slot, bolt is threadedly connected with threaded hole, leveling assembly is arranged between two adjusting plates.
[0007] As further description of the above technical solution: the bottom of the crossbeam is fixedly installed with two electric cylinders, and the output end of the two electric cylinders is drivingly connected with the sliding frame.
[0008] As further description of the above technical solution: the leveling assembly includes a first support plate and a second support plate, the first support plate is fixedly installed on the lateral wall of one of the adjusting plates, the second support plate is fixedly installed on the lateral wall of the other adjusting plate, the first support plate is fixedly installed with a light beam emitter, one end of the light beam emitter is provided with a start button, one side of the second support plate is fixedly installed with a dark box, the lateral wall of the second support plate is provided with a light transmission hole, and the light transmission hole is in communication with the inside of the dark box.
[0009] As further description of the above technical solution: the side of the dark box away from the light transmission hole is provided with a light-emitting plate.
[0010] As further description of the above technical solution: the lateral wall of the gyro wheel is provided with a rubber layer.
[0011] The utility model provides a kind of film taking mechanism of adapting chain type machine loading.It has the following beneficial effects: the silicon wafer is conveyed from two conveyors, in the conveying process, by two groups of gyro wheels on both sides, two groups of gyro wheels can flatten the silicon plate that occurs relative offset, so that the silicon plate can keep and transport direction level, when the silicon plate of different specifications thickness needs to be transported and processed, the height of adjusting plate on fixed plate can be adjusted, then locked by bolt, and then the height of two groups of gyro wheels is adjusted, so that two groups of gyro wheels can adapt to silicon plate of different thickness.
[0012] It should be understood that the foregoing general description and the following detailed description are merely exemplary and illustrative, but not for limiting the present disclosure.
[0013] The present application provides an overview of various implementations or examples of the technology described in the present disclosure, and is not a comprehensive disclosure of the full scope or all features of the disclosed technology. BRIEF DESCRIPTION OF DRAWINGS
[0014] Figure 1 A whole three-dimensional structure schematic diagram of the film shooting mechanism suitable for the chain type machine loading is provided in the utility model;
[0015] Figure 2 A three-dimensional structure schematic diagram of another view of the utility model;
[0016] Figure 3 A three-dimensional explosion structure schematic diagram of the adjusting plate and the fixed plate of the utility model;
[0017] Figure 4 A three-dimensional structure schematic diagram of the leveling assembly of the utility model;
[0018] Figure 5 A sectional structure schematic diagram of the utility model's dark box;
[0019] Figure 6 A sectional structure schematic diagram of the utility model's roller side wall provided with a rubber layer.
[0020] Legend:
[0021] 1, crossbeam; 2, sliding frame; 3, electric cylinder; 4, fixed plate; 5, adjusting plate; 6, connecting plate; 7, rotating shaft; 8, roller; 9, conveying belt; 10, sliding groove; 11, bolt; 12, screw hole; 13, first support plate; 14, starting button; 15, light beam emitter; 16, second support plate; 17, light transmission hole; 18, dark box; 19, light display plate; 20, rubber layer. Specific implementation
[0022] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments.
[0023] Reference Figures 1-6The utility model provides a kind of film shooting mechanism of adapting chain type on-machine loading, including beam 1, two sliding frames 2 are slidably installed on the beam 1, the bottom end of two sliding frames 2 is fixedly installed with fixed plate 4, the below of two fixed plate 4 is provided with adjusting plate 5, the bottom end of adjusting plate 5 is fixedly installed with connecting plate 6, the top end of connecting plate 6 is rotatably installed with rotating shaft 7, the bottom end of rotating shaft 7 is connected with connecting plate 6 and is fixedly installed with gyro wheel 8, the lateral wall of adjusting plate 5 is equipped with two sliding grooves 10, the lateral wall of fixed plate 4 is equipped with two threaded holes 12, the sliding groove 10 is provided with bolt 11, the bolt 11 is threadedly connected with threaded hole 12, and leveling assembly is provided between two adjusting plates 5;Silicon wafer is conveyed from two conveyors 9, in the conveying process, two groups of gyro wheel 8 on both sides can level the silicon plate that occurs relative deviation, so that the silicon plate can keep and transport direction level, when the silicon plate of different specifications thickness needs to be transported and processed, the height of adjusting plate 5 on fixed plate 4 can be adjusted, then locked by bolt 11, and then the height of two groups of gyro wheel 8 is adjusted, so that two groups of gyro wheel 8 can adapt to silicon plate of different thickness.
[0024] As the preferred technical solution of the embodiment, the bottom end of the beam 1 is fixedly installed with two electric cylinders 3, and the output ends of the two electric cylinders 3 are drivingly connected with the sliding frames 2;The electric cylinder 3 is electrically connected with the external transmission device through the PLC sensor, which is a prior art, and can realize that when the silicon plate is transported to the position between the two groups of gyro wheel 8, the two electric cylinders 3 simultaneously push the two sliding frames 2 to the middle, so that the two groups of gyro wheel 8 clamp and level the silicon plate at the middle position.
[0025] As the preferred technical solution of the embodiment, the leveling assembly includes a first support plate 13 and a second support plate 16, the first support plate 13 is fixedly installed on the side wall of one of the adjusting plates 5, the second support plate 16 is fixedly installed on the side wall of the other adjusting plate 5, the first support plate 13 is fixedly installed with a light beam emitter 15, one end of the light beam emitter 15 is provided with a start button 14, one side of the second support plate 16 is fixedly installed with a dark box 18, a light transmission hole 17 is formed in the side wall of the second support plate 16, and the light transmission hole 17 is in communication with the inside of the dark box 18;When the height of the adjusting plate 5 on both sides needs to be adjusted, the light beam emitter 15 is turned on by the start button 14, because the initial positions of the light beam emitter 15 and the light transmission hole 17 are flush, in the adjusting process, the light beam of the light beam emitter 15 needs to pass through the light transmission hole 17, so that the heights of the two adjusting plates 5 are flush, and the light beam emitter 15 can also be in the open state during the working process, when the light beam emitted by the light beam emitter 15 cannot be observed by the light-emitting plate 19 on one side of the dark box 18, it indicates that the height of the two adjusting plates 5 needs to be leveled, and the leveling prompt function is realized.
[0026] As the preferred technical scheme of the embodiment, the light box 18 is provided with a light display plate 19 away from the side of the light transmission hole 17; the material of the light display plate 19 is acrylic material, the acrylic material has good light transmission, the light beam enters the inside of the light box 18 through the light transmission hole 17, and finally irradiates on the light display plate 19, the light beam point can be observed, that is, it can be determined that the two adjusting plates 5 are in the same plane, the condition that the two adjusting plates 5 are in the same plane is visualized, and the convenience of leveling is increased.
[0027] As the preferred technical scheme of the embodiment, the side wall of the roller 8 is provided with a rubber layer 20; the side wall of the roller 8 is provided with the rubber layer 20, the scratch drawn by the side wall of the silicon plate after use for a period of time can become a kind of mark, when the same specification and thickness of the silicon wafer is carried out again, the height of the two groups of rollers 8 can be quickly positioned through the scratch.
[0028] The above is only the preferred specific embodiment of the present application, but the protection scope of the present application is not limited to this, any skilled person in the art can make equivalent replacement or change according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.
Claims
1. An X-ray film loading mechanism adapted to chain feeding on a machine, comprising a cross beam (1), two sliding frames (2) being slidingly mounted on the cross beam (1), characterized in that, The bottom end of two sliding frames (2) is fixedly provided with a fixed plate (4), the lower portion of two fixed plates (4) is provided with an adjusting plate (5), the bottom end of the adjusting plate (5) is fixedly provided with a connecting plate (6), the top end of the connecting plate (6) is rotatably provided with a rotating shaft (7), the bottom end of the rotating shaft (7) penetrates through the connecting plate (6) and is fixedly provided with a roller (8), the side wall of the adjusting plate (5) is provided with two sliding grooves (10), the side wall of the fixed plate (4) is provided with two threaded holes (12), the sliding groove (10) is provided with a bolt (11), the bolt (11) is threadedly connected with the threaded hole (12), and leveling assemblies are arranged between two adjusting plates (5).
2. The film loading mechanism for adapting chain on-machine loading according to claim 1, characterized in that, The bottom end of the cross beam (1) is fixedly provided with two electric cylinders (3), and the output ends of the two electric cylinders (3) are drivingly connected with the sliding frame (2).
3. The film loading mechanism for adapting chain on-machine loading according to claim 1, wherein, The leveling assembly comprises a first supporting plate (13) and a second supporting plate (16), the first supporting plate (13) is fixedly installed on the side wall of one of the adjusting plates (5), the second supporting plate (16) is fixedly installed on the side wall of the other adjusting plate (5), the first supporting plate (13) is fixedly provided with a light beam emitter (15), one end of the light beam emitter (15) is provided with a starting button (14), one side of the second supporting plate (16) is fixedly provided with a dark box (18), the side wall of the second supporting plate (16) is provided with a light transmission hole (17), and the light transmission hole (17) is in communication with the inside of the dark box (18).
4. The film loading mechanism for adapting chain on-machine loading according to claim 3, characterized in that, The side, away from the light transmission hole (17), of the dark box (18) is provided with a light display plate (19).
5. The film loading mechanism for adapting chain on-machine loading according to claim 1, wherein, The side wall of the roller (8) is provided with a rubber layer (20).