Angle-adjustable rotary ICP etching mechanical system
By designing an adjustable-angle rotary ICP etching mechanical system, the wafer disk is rotated at a constant speed using an angle adjustment motor and a rotary motor to form an inverted trapezoidal structure. This solves the problem of low light extraction efficiency of LED chips in existing technologies and achieves higher light extraction efficiency and diversified etching adaptability.
Patent Information
- Application Number
- CN202423134225.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-19
- Publication Date
- 2025-12-23
- Estimated Expiration
- 2034-12-19
AI Technical Summary
Existing ICP etching systems cannot form inverted trapezoidal structures, resulting in low light extraction efficiency of LED chips.
Design an adjustable-angle rotary ICP etching mechanical system. The system is connected to the stage via a connecting rod. An angle adjustment motor and a rotary motor are used to achieve uniform, fixed-point rotation of the substrate disk, forming an inverted trapezoidal structure.
It improves the front light emission efficiency of LED chips and adapts to diverse etching requirements.
Smart Images
Figure CN223712745U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model belongs to the technical field of emitting diode, concretely relates to a rotatory ICP etching mechanical system of adjustable angle. BACKGROUND
[0002] ICP etching is based on inductive coupling plasma technology, and high-density plasma is generated through glow discharge to etch materials. ICP etching has high etching accuracy, and ICP is usually used for etching in the LED chip processing process, but the existing ICP etching wafer plate can only be placed horizontally, so that the etched pattern can only be perpendicular or trapezoidal, however, LED research shows that the light efficiency of inverted trapezoidal structure is higher, and the conventional ICP etching system cannot meet the requirements. UTILITARIAN CONTENT
[0003] The utility model in prior art, research and development a rotatory ICP etching mechanical system of adjustable angle, the axle of wafer plate and the platform present certain angle, and can rotate at constant speed at fixed point when operating, through the system can make the chip side wall form inverted trapezoidal structure, to improve the light efficiency of LED chip front, also can meet the demand of different side wall angle by modifying the angle of rotating shaft.
[0004] To achieve the above object, the utility model adopts the following technical scheme:
[0005] A rotatory ICP etching mechanical system of adjustable angle, including wafer plate and platform, the wafer plate and platform are connected through connecting rod, the connecting rod bottom is installed with rotating motor and angle adjusting motor, the angle adjusting motor output shaft is connected with rotating motor vertical direction through fixed block, the rotating motor output shaft is connected with connecting rod.
[0006] Preferably, the angle adjusting motor and rotating motor are both servo motors.
[0007] Further, the bottom of the fixed block is circular, and is vertically sleeved and fastened on the output shaft of the angle adjusting motor. The fixed block is rotated in the vertical direction by horizontal rotation of the output shaft of the angle adjusting motor.
[0008] Further, the connecting rod is open at the bottom and is fixed on the output shaft of the rotating motor, and is in a straight line with the output shaft of the rotating motor. The connecting rod is rotated in the same direction by rotation of the output shaft of the rotating motor.
[0009] Further, the angle adjusting motor and rotating motor are installed in the platform.
[0010] Compared with the prior art, the utility model has the following beneficial effects:
[0011] The utility model discloses a connecting rod is arranged between the carrier disc and the carrier and is connected, and the connecting rod is driven by the angle adjusting motor and the rotating motor, can rotate around the carrier axle center according to the setting angle, the even speed, wherein the connecting rod angle can be controlled accurately through the bottom angle adjusting motor, thereby making the LED chip side wall receive the direct type etching, forms the inverted trapezoidal appearance, and further improves the chip's front light efficiency. BRIEF DESCRIPTION OF DRAWINGS
[0012] Figure 1 For the conventional ICP etching mechanical system structure.
[0013] Figure 2 For the utility model ICP etching mechanical system structure.
[0014] Figure 3 For the utility model concrete transmission structure.
[0015] Figure 4 For the structure after using conventional ICP etching and the structure after using the utility model IPC etching. DETAILED DESCRIPTION
[0016] For further illustrating the technical means and effects that the utility model adopts to realize the predetermined utility model purposes, the following will be combined with the drawings and the preferred embodiments, and the specific embodiments, structure, features and effects of the utility model will be described in detail as follows.
[0017] As shown in Figure 1 A conventional ICP etching mechanical system includes a carrier disc and a carrier, and the carrier disc is horizontally installed on the carrier.
[0018] As shown in Figures 2-3 The utility model discloses a rotatory ICP etching mechanical system of adjustable angle, including carrier disc 1 and carrier 2, and the carrier disc 1 is connected through connecting rod 3 between carrier 2, and the connecting rod 3 bottom is installed with rotating motor 4 and angle adjusting motor 5, wherein, angle adjusting motor 5 is horizontally installed in carrier 2, and its output shaft is connected with the left side of fixed block 6, and the upper side of fixed block is fixedly connected with rotating motor 4, and the output shaft of rotating motor 4 is connected with the bottom end of connecting rod 3, and the top end of connecting rod 3 is fixedly connected with the bottom center position of carrier disc 1.
[0019] When working, angle adjusting motor 5 rotates and drives fixed block 6 to rotate, and rotating motor 4 and connecting rod 3 are driven to realize angle adjustment, and at the same time, rotating motor 4 rotates and drives connecting rod 3 to rotate, realizing uniform rotation.
[0020] As shown in Figure 4As shown, using the ICP etching mechanical system of the present application can make the chip sidewall form an inverted trapezoidal structure to improve the front light efficiency of the LED chip. By using the system, the ICP etching technology can be more suitable for the diversified etching requirements, thereby being applied to more device manufacturing processes.
[0021] The above is only a preferred embodiment of the present application, and does not limit the present application in any form. Although the present application has been disclosed as above with a preferred embodiment, it is not intended to limit the present application. Any person skilled in the art can make slight changes or modifications to the above disclosed technical content to obtain equivalent embodiments without departing from the technical solution of the present application. Any modification, equivalent change and modification of the above embodiments made in accordance with the technical essence of the present application shall still fall within the scope of the technical solution of the present application.
Claims
1. An angle adjustable rotary ICP etching mechanical system comprising a wafer disk and a stage, characterized in that: The slide disc is connected with the stage through a connecting rod, the bottom of the connecting rod is provided with a rotating motor and an angle adjusting motor, the output shaft of the angle adjusting motor is connected with the rotating motor in a vertical direction through a fixing block, and the output shaft of the rotating motor is connected with the connecting rod.
2. An angle adjustable rotary ICP etching mechanical system as claimed in claim 1, wherein: The angle adjusting motor and the rotating motor are both servo motors.
3. An angle adjustable rotary ICP etching mechanical system as claimed in claim 1, wherein: The bottom of the fixing block is in a circular ring shape, is vertically sleeved and fastened on the output shaft of the angle adjusting motor, is horizontally rotated through the output shaft of the angle adjusting motor, and drives the fixing block to rotate in a vertical direction.
4. An angle adjustable rotary ICP etching mechanical system as claimed in claim 1 or 3, wherein: The bottom of the connecting rod is fixed on the output shaft of the rotating motor and is in a straight line with the output shaft of the rotating motor, is rotated through the output shaft of the rotating motor, and drives the connecting rod to rotate in the same direction.
5. An angle adjustable rotary ICP etching mechanical system as claimed in claim 4, wherein: The top end of the connecting rod is fixedly connected with the bottom center position of the slide disc.
6. An angle adjustable rotary ICP etching mechanical system as claimed in claim 1 or 2, wherein: The angle adjusting motor and the rotating motor are installed in the stage.