Mixing system for various high-flow gases and semiconductor process equipment

By employing a combination design of multiple flow control modules and gas mixing modules in semiconductor process equipment, the problems of gas mixing error and concentration fluctuation during high-flow-rate gas mixing are solved, achieving stability and accuracy of the gas mixture and meeting the high-precision requirements of semiconductor process equipment.

CN223846842UActive Publication Date: 2026-01-30SHANGHAI LONGWELL M & E CO LTD
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Patent Information

Application Number
CN202423323061.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-31
Publication Date
2026-01-30
Estimated Expiration
2034-12-31

AI Technical Summary

Technical Problem

Existing technologies suffer from problems such as large mixing errors, large concentration fluctuations, and instability in the initial mixing stage during high-flow-rate gas mixing, which prevent semiconductor process equipment from meeting the process requirements.

Method used

The system employs a combination design of multiple flow control modules and gas mixing modules. Through the initial and fine mixing of the first and second gases, the flow control accuracy and concentration uniformity are improved. The system includes a first gas input module, a second gas input module, a flow control module, a gas mixing module, and a concentration analysis module, forming a mixing system for various high-flow-rate gases.

Benefits of technology

It improves the accuracy of flow control and concentration uniformity, ensures the stability and precision of gas mixtures, and meets the high precision requirements of semiconductor process equipment.

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Patent Text Reader

Abstract

The utility model relates to a mixing system for various high-flow gases and semiconductor process equipment. The system has the advantages that the first gas input module is communicated with the first flow control modules, the second gas input module is communicated with the second flow control modules, the second flow control modules are used for controlling flow at the same time, the flow control precision is improved, and then the concentration precision is improved; the first gas mixing module is respectively communicated with the first flow control module and the second flow control module, and the first gas and the second gas are primarily mixed through the first gas mixing module, so that the concentration uniformity of the whole system is improved; the second gas mixing module is communicated with the first gas mixing module, and the second mixed gas obtained by primary mixing is finely mixed, so that the concentration uniformity of gas mixing is further improved.
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Description

Technical Field

[0001] This utility model relates to the field of semiconductor process gas mixing technology, and in particular to a mixing system for multiple high-flow-rate gases and semiconductor process equipment. Background Technology

[0002] Gas mixing systems are primarily used to provide precisely proportioned and composed gas mixtures that are crucial for semiconductor device manufacturing processes. They are used in a variety of process steps, including cleaning, annealing, preparative atmospheres, chemical vapor deposition (CVD), etching, vapor phase doping, and high-temperature processes. Gas mixing equipment ensures that the composition, flow rate, and stability of the gas mixture meet the high-precision process requirements, which is essential for manufacturing high-performance semiconductor devices.

[0003] For gas mixtures with a flow rate exceeding 200 L / min, the existing technology involves controlling the flow rate of the two gas sources to a certain level using a flow control module, then delivering them to two 100 L buffer tanks, and finally to the process equipment (such as...). Figure 1 (As shown). Two concentration analyzers are used to detect the concentration before and after entering the buffer tank. The calibration gas module uses a mixed gas of a fixed concentration to calibrate the concentration analyzers. The exhaust module discharges the exhaust gas from the system.

[0004] However, existing technologies only use one flow control module, which is prone to large errors and large fluctuations in the concentration of the mixed gas during the process of supplying gas from the gas source to the mixing tank. In addition, existing equipment cannot stabilize the concentration during the initial mixing stage before the mixed gas enters the buffer tank.

[0005] Currently, no effective solutions have been proposed for the problems existing in related technologies, such as large mixing errors, large fluctuations in mixing concentration, and inability to stabilize concentration during the initial mixing stage. Utility Model Content

[0006] The purpose of this invention is to address the shortcomings of existing technologies by providing a mixing system for multiple high-flow-rate gases and semiconductor process equipment, thereby solving problems such as large mixing errors, large fluctuations in gas concentration, and inability to stabilize concentration during the initial mixing stage.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0008] In a first aspect, this utility model provides a mixing system for multiple high-flow-rate gases, comprising:

[0009] A first gas input module, which is connected to a first gas source, is used to deliver a first gas.

[0010] a second gas input module, which is in communication with a second gas source and is configured to deliver a second gas;

[0011] at least one first flow control module, which is in communication with the first gas input module and is located downstream of the first gas input module, and is configured to control the flow of the first gas;

[0012] at least one second flow control module, which is in communication with the second gas input module and is located downstream of the second gas input module, and is configured to control the flow of the second gas;

[0013] a first gas mixing module, which is in communication with the first flow control module and the second flow control module respectively, and is located downstream of the first flow control module and downstream of the second flow control module, and is configured to preliminarily mix the first gas and the second gas to obtain a first mixed gas;

[0014] a first concentration analysis module, which is in communication with the first gas mixing module and is located downstream of the first gas mixing module, and is configured to detect the concentration of the first mixed gas;

[0015] a second gas mixing module, which is in communication with the first gas mixing module, and is configured to finely mix the first mixed gas to obtain a second mixed gas;

[0016] a second concentration analysis module, which is in communication with the second gas mixing module and is located downstream of the second gas mixing module, and is configured to detect the concentration of the second mixed gas;

[0017] a first gas output module, which is in communication with the first gas mixing module, the second gas mixing module, the second concentration analysis module, and a process equipment respectively, and is located downstream of the second gas mixing module, and is configured to deliver the second mixed gas to the process equipment when the second concentration analysis module detects that the second mixed gas meets the standard;

[0018] a second gas output module, which is in communication with the first concentration analysis module, the second concentration analysis module, the first gas output module, and a waste gas treatment equipment respectively, and is configured to deliver waste gas.

[0019] In some embodiments, the system further comprises:

[0020] the first gas input module is in communication with the first concentration analysis module, and is configured to deliver the first gas to the first concentration analysis module so that the first concentration analysis module performs zero-gas calibration using the first gas;

[0021] The first gas input module is in communication with the second concentration analysis module for delivering a first gas to the second concentration analysis module for zero gas calibration of the second concentration analysis module;

[0022] A third gas input module is in communication with a standard gas source, the first concentration analysis module and the second concentration analysis module respectively for standard gas calibration of the first concentration analysis module and the second concentration analysis module.

[0023] In some embodiments thereof, further comprising:

[0024] A purge module is in communication with the second gas input module and the second gas output module respectively for purging the whole pipeline and equipment.

[0025] In some embodiments thereof, further comprising:

[0026] A pressure relief module is in communication with the first gas mixing module, the second gas mixing module and the second gas output module respectively for pressure relief.

[0027] In some embodiments thereof, further comprising:

[0028] A pressure protection module is in communication with the first gas output module, the second gas output module, the first gas mixing module and the second gas mixing module respectively for pipeline protection.

[0029] In some embodiments thereof, further comprising:

[0030] A standby mixed gas supply module is in communication with the first gas output module for delivering gas to the process equipment.

[0031] In a second aspect, the utility model also provides a kind of semiconductor process equipment, comprising:

[0032] The mixed system of multiple high-flow gases as described in the first aspect.

[0033] The utility model adopts above technical scheme, compared with prior art, with following technical effects:

[0034] The utility model discloses a kind of mixed system of multiple large flow gas and semiconductor process equipment, by with multiple first flow control module intercommunication of first gas input module, with multiple second flow control module intercommunication of second gas input module, use multiple second flow control module to control flow simultaneously, improve the control precision of flow, and then improve concentration accuracy;By with first flow control module, second flow control module intercommunication of first mixing module respectively, by first mixing module to first gas and second gas are initially mixed, to improve the concentration uniformity of overall system;By with first mixing module intercommunication of second mixing module, to the second mixed gas of initial mixing is refined, further improve the concentration uniformity of gas mixing. BRIEF DESCRIPTION OF DRAWINGS

[0035] Figure 1 It is the schematic diagram of the mixed system of multiple large flow gas according to the utility model embodiment;

[0036] Figure 2 It is the schematic diagram of first gas input module, second gas input module, at least one first flow control module, at least one second flow control module, first mixing module, first concentration analysis module, second mixing module, second concentration analysis module, first gas output module and second gas output module according to the utility model embodiment;

[0037] Figure 3 It is the schematic diagram of third gas input module according to the utility model embodiment;

[0038] Figure 4 It is the schematic diagram of purge module according to the utility model embodiment;

[0039] Figure 5 It is the schematic diagram of pressure relief module according to the utility model embodiment;

[0040] Figure 6 It is the schematic diagram of pressure protection module according to the utility model embodiment;

[0041] Figure 7 It is the schematic diagram of spare mixed gas supply module according to the utility model embodiment.

[0042] The reference signs in it are: 100, first gas input module;101, first gas input element;102, first control valve element;103, first pressure regulating element;104, first pressure monitoring element;105, second pressure monitoring element;106, third gas input element;107, thirteenth control valve element;108, fourth gas input element;109, fourteenth control valve element;110, fifth gas input element;111, fifteenth control valve element;

[0043] 200, second gas input module; 201, second gas input element; 202, second control valve element; 203, second pressure regulating element; 204, third pressure monitoring element; 205, fourth pressure monitoring element;

[0044] 300, first flow control module; 301, first flow line element; 302, first flow control element; 303, third control valve element;

[0045] 400, second flow control module; 401, second flow line element; 402, second flow control element; 403, fourth control valve element;

[0046] 500, first gas mixing module; 501, first gas mixing element; 502, fifth control valve element;

[0047] 600, first concentration analysis module; 601, first concentration line element; 602, first concentration analysis element; 603, sixth control valve element; 604, third pressure regulating element; 605, fifth pressure monitoring element;

[0048] 700, second gas mixing module; 701, second gas mixing element; 702, seventh control valve element;

[0049] 800, second concentration analysis module; 801, second concentration line element; 802, second concentration analysis element; 803, eighth control valve element; 804, fourth pressure regulating element; 805, sixth pressure monitoring element;

[0050] 900, first gas output module; 901, first gas output element; 902, ninth control valve element; 903, second gas output element; 904, tenth control valve element; 905, fifth pressure regulating element; 906, seventh pressure monitoring element; 907, first flow monitoring element; 908, second flow monitoring element;

[0051] 1000, second gas output module; 1001, third gas output element; 1002, eleventh control valve element; 1003, fourth gas output element; 1004, twelfth control valve element;

[0052] 1100, third gas input module; 1101, sixth gas input element; 1102, sixteenth control valve element;

[0053] 1200, purge module; 1201, first purge line element; 1202, seventeenth control valve element; 1203, second purge line element; 1204, eighteenth control valve element; 1205, third purge line element; 1206, nineteenth control valve element; 1207, vacuum line element; 1208, twentieth control valve element; 1209, vacuum element; 1210, power gas supply line element; 1211, twenty first control valve element;

[0054] 1300, pressure relief module; 1301, first pressure relief line element; 1302, first pressure relief valve element; 1303, second pressure relief line element; 1304, second pressure relief valve element;

[0055] 1400, pressure protection module; 1401, pressure protection line element; 1402, twenty second control valve element; 1403, first protection element; 1404, second protection element; 1405, eighth pressure monitoring element;

[0056] 1500, backup mixed gas supply module; 1501, backup gas supply line element; 1502, twenty third control valve element; 1503, ninth pressure monitoring element; 1504, third flow monitoring element. DETAILED DESCRIPTION

[0057] In order to make the objectives, technical solutions and advantages of the present application clearer, the present application is described and explained below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application. Based on the embodiments provided by the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort belong to the scope of the present application.

[0058] Obviously, the accompanying drawings in the following description are only some examples or embodiments of the present application, and for those of ordinary skill in the art, the present application can also be applied to other similar scenarios without creative effort based on these drawings. In addition, it can be understood that although the efforts made in this development process can be complex and lengthy, for those of ordinary skill in the art related to the content disclosed in the present application, some design, manufacture or production changes based on the technical content disclosed in the present application are only routine technical means and should not be understood as insufficient disclosure of the present application.

[0059] Reference to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are they necessarily all referring to a common or identical embodiment. One of ordinary skill in the art will readily recognize from the disclosure herein, that a combination of features, structures, or characteristics can be used in

[0060] Embodiment 1

[0061] This embodiment relates to the mixing system of multiple large flow gas in the utility model.

[0062] An illustrative embodiment of the utility model, such as Figure 1As shown in the figure, a mixed system of multiple high-flow gases comprises a first gas input module 100, a second gas input module 200, at least a first flow control module 300, at least a second flow control module 400, a first gas mixing module 500, a first concentration analysis module 600, a second gas mixing module 700, a second concentration analysis module 800, a first gas output module 900 and a second gas output module 1000. Wherein, the first gas input module 100 is in communication with a first gas source for conveying the first gas; the second gas input module 200 is in communication with a second gas source for conveying the second gas; the first flow control module 300 is in communication with the first gas input module 100 and located downstream of the first gas input module 100 for controlling the flow of the first gas; the second flow control module 400 is in communication with the second gas input module 200 and located downstream of the second gas input module 200 for controlling the flow of the second gas; the first gas mixing module 500 is in communication with the first flow control module 300 and the second flow control module 400 respectively and located downstream of the first flow control module 300 and downstream of the second flow control module 400 for mixing the first gas and the second gas and obtaining the first mixed gas; the first concentration analysis module 600 is in communication with the first gas mixing module 500 and located downstream of the first gas mixing module 500 for detecting the concentration of the first mixed gas; the second gas mixing module 700 is in communication with the first gas mixing module 500 for fine mixing the first mixed gas and obtaining the second mixed gas; the second concentration analysis module 800 is in communication with the second gas mixing module 700 and located downstream of the second gas mixing module 700 for detecting the concentration of the second mixed gas; the first gas output module 900 is in communication with the first gas mixing module 500, the second gas mixing module 700, the second concentration analysis module 800 and the process equipment respectively and located downstream of the second gas mixing module 700 for conveying the mixed gas to the process equipment when the second concentration analysis module 800 detects that the mixed gas meets the standard; the second gas output module 1000 is in communication with the first concentration analysis module 600, the second concentration analysis module 800, the first gas output module 900 and the waste gas treatment equipment respectively for conveying the waste gas.

[0063] It should be noted that the first end and the second end in the utility model are two ends of the length direction respectively.

[0064] As shown in the figure, Figure 2 The first gas input module 100 comprises a first gas input element 101 and a first control valve element 102. Wherein, the first gas input element 101 is in communication with the first gas source and the first flow control module 300 respectively for conveying the first gas; the first control valve element 102 is arranged in the first gas input element 101 for controlling the flow of the first gas input element 101.

[0065] Specifically, the first end of the first gas input element 101 is in communication with the first gas source, and the second end of the first gas input element 101 is in communication with the first flow control module 300.

[0066] In some embodiments, the first gas input element 101 includes, but is not limited to, a stainless steel pipe.

[0067] Specifically, the first control valve element 102 includes a first manual diaphragm valve and a second manual diaphragm valve. The first manual diaphragm valve is arranged on the first gas input element 101 and is used to manually control the flow between the first gas input element 101 and the first gas source. The second manual diaphragm valve is arranged on the first gas input element 101 and is located downstream of the first manual diaphragm valve, and is used to manually control the flow between the first gas input element 101 and the first gas mixing module 500.

[0068] In some embodiments, the first control valve element 102 includes, but is not limited to, a diaphragm valve.

[0069] Further, the first gas input module 100 further includes a first pressure regulating element 103 and a first pressure monitoring element 104. The first pressure regulating element 103 is arranged on the first gas input element 101 and is used to regulate the gas pressure inside the first gas input element 101. The first pressure monitoring element 104 is in communication with the first gas input element 101 and is used to monitor the gas pressure upstream and downstream of the first pressure regulating element 103.

[0070] Specifically, the first pressure regulating element 103 is located downstream of the first manual diaphragm valve and upstream of the second manual diaphragm valve.

[0071] In some embodiments, the first pressure regulating element 103 includes, but is not limited to, a pressure regulating valve.

[0072] Specifically, the first pressure monitoring element 104 includes a first pressure gauge and a second pressure gauge. The first pressure gauge is in communication with the first gas input element 101, and the communication point between the first pressure gauge and the first gas input element 101 is located downstream of the first manual diaphragm valve and upstream of the first pressure regulating element 103. The second pressure gauge is in communication with the first gas input element 101, and the communication point between the second pressure gauge and the first gas input element 101 is located downstream of the first pressure regulating element 103 and upstream of the second manual diaphragm valve.

[0073] In some embodiments, the first pressure monitoring element 104 includes, but is not limited to, a pressure gauge.

[0074] Further, the first gas input module 100 further comprises a second pressure monitoring element 105. Wherein, the second pressure monitoring element 105 is in communication with the first gas input element 101 and is located downstream of the first control valve element 102, for monitoring the air pressure inside the first gas input element 101.

[0075] Specifically, the second pressure monitoring element 105 comprises a first pressure sensor. Wherein, the first pressure sensor is in communication with the first gas input element 101, and the communication between the first pressure sensor and the first gas input element 101 is located downstream of the second manual diaphragm valve.

[0076] In some embodiments, the second pressure monitoring element 105 comprises, but is not limited to, a pressure sensor.

[0077] As shown in Figure 2 The second gas input module 200 comprises a second gas input element 201 and a second control valve element 202. Wherein, the second gas input element 201 is in communication with the second gas source and the second flow control module 400 respectively, for conveying the second gas; the second control valve element 202 is arranged in the second gas input element 201, for controlling the flow of the second gas input element 201.

[0078] Specifically, the first end of the second gas input element 201 is in communication with the second gas source, and the second end of the second gas input element 201 is in communication with the second flow control module 400.

[0079] In some embodiments, the second gas input element 201 comprises, but is not limited to, a stainless steel pipe.

[0080] Specifically, the second control valve element 202 comprises a third manual diaphragm valve and a fourth manual diaphragm valve. Wherein, the third manual diaphragm valve is arranged in the second gas input element 201, for manually controlling the flow of the second gas input element 201 and the second gas source; the fourth manual diaphragm valve is arranged in the second gas input element 201 and is located downstream of the third manual diaphragm valve, for manually controlling the flow of the second gas input element 201 and the first gas mixing module 500.

[0081] In some embodiments, the second control valve element 202 comprises, but is not limited to, a diaphragm valve.

[0082] Further, the second gas input module 200 further comprises a second pressure regulating element 203 and a third pressure monitoring element 204. Wherein, the second pressure regulating element 203 is arranged in the second gas input element 201, for regulating the air pressure inside the second gas input element 201; the third pressure monitoring element 204 is in communication with the second gas input element 201, for monitoring the air pressure upstream and downstream of the second pressure regulating element 203.

[0083] Specifically, the second pressure regulating element 203 is located downstream of the third manual diaphragm valve and upstream of the fourth manual diaphragm valve.

[0084] In some of these embodiments, the second pressure regulating element 203 includes, but is not limited to, a pressure regulating valve.

[0085] Specifically, the third pressure monitoring element 204 includes a third pressure gauge and a fourth pressure gauge. The third pressure gauge is connected to the second gas input element 201, and the connection point between the third pressure gauge and the second gas input element 201 is located downstream of the third manual diaphragm valve and upstream of the second pressure regulating element 203. The fourth pressure gauge is also connected to the second gas input element 201, and the connection point between the fourth pressure gauge and the second gas input element 201 is located downstream of the second pressure regulating element 203 and upstream of the fourth manual diaphragm valve.

[0086] In some of these embodiments, the third pressure monitoring element 204 includes, but is not limited to, a pressure gauge.

[0087] Furthermore, the second gas input module 200 also includes a fourth pressure monitoring element 205. The fourth pressure monitoring element 205 is connected to the second gas input element 201 and is located downstream of the second control valve element 202, and is used to monitor the gas pressure inside the second gas input element 201.

[0088] Specifically, the fourth pressure monitoring element 205 includes a second pressure sensor. The second pressure sensor is connected to the second gas input element 201, and the connection between the second pressure sensor and the second gas input element 201 is located downstream of the fourth manual diaphragm valve.

[0089] In some embodiments, the fourth pressure monitoring element 205 includes, but is not limited to, a pressure sensor.

[0090] like Figure 2 As shown, the first flow control module 300 includes at least one first flow pipeline element 301, at least one first flow control element 302, and at least one third control valve element 303. The first flow pipeline element 301 is connected to both the first gas input module 100 and the first gas mixing module 500, and is used to supply first gas to the first gas mixing module 500. The first flow control element 302 is disposed on the first flow pipeline element 301 and is used to control the flow rate to the first gas mixing module 500. The third control valve element 303 is disposed on the first flow pipeline element 301 and is used to control the flow within the first flow pipeline element 301.

[0091] Specifically, the first end of the first flow pipeline element 301 is connected to the second end of the first gas input element 101, and the second end of the first flow pipeline element 301 is connected to the first gas mixing module 500.

[0092] In some of these embodiments, the first flow conduit element 301 includes, but is not limited to, a stainless steel pipe.

[0093] More specifically, there are several first flow pipeline elements 301, and the first ends of several first flow pipeline elements 301 are connected in parallel with the second ends of the first gas input element 101, and the second ends of several first flow pipeline elements 301 are connected in parallel with the first gas mixing module 500.

[0094] It should be noted that the number of first flow control elements 302 is matched with the number of first flow piping elements 301. It should be understood that the number of first flow control elements 302 is the same as the number of first flow piping elements 301. That is, there is a one-to-one correspondence between the first flow control elements 302 and the first flow piping elements 301.

[0095] Specifically, the third control valve element 303 includes a first pneumatic diaphragm valve and a second pneumatic diaphragm valve. The first pneumatic diaphragm valve is disposed on the first flow line element 301 and located upstream of the first flow control element 302, and is used to automatically control the flow between the first flow line element 301 and the first gas input element 101. The second pneumatic diaphragm valve is disposed on the first flow line element 301 and located downstream of the first flow control element 302, and is used to automatically control the flow between the first flow line element 301 and the first gas mixing module 500.

[0096] In some of these embodiments, the third control valve element 303 includes, but is not limited to, a diaphragm valve.

[0097] like Figure 2 As shown, the second flow control module 400 includes at least one second flow pipeline element 401, at least one second flow control element 402, and at least one fourth control valve element 403. The second flow pipeline element 401 is connected to both the second gas input module 200 and the first gas mixing module 500, and is used to supply the second gas to the first gas mixing module 500. The second flow control element 402 is disposed on the second flow pipeline element 401 and is used to control the flow rate to the first gas mixing module 500. The fourth control valve element 403 is disposed on the second flow pipeline element 401 and is used to control the flow within the second flow pipeline element 401.

[0098] Specifically, the first end of the second flow pipeline element 401 is connected to the second gas input element 201, and the second end of the second flow pipeline element 401 is connected to the first gas mixing module 500.

[0099] In some of these embodiments, the second flow conduit element 401 includes, but is not limited to, a stainless steel pipe.

[0100] More specifically, the number of the second flow pipeline elements 401 is several, and the first ends of the several second flow pipeline elements 401 are connected in parallel with the second end of the second gas input element 201, and the second ends of the several second flow pipeline elements 401 are connected in parallel with the first gas mixing module 500.

[0101] It should be noted that the number of the second flow control elements 402 is adapted to the number of the second flow pipeline elements 401. It should be understood that the number of the second flow control elements 402 is the same as the number of the second flow pipeline elements 401. That is, the second flow control elements 402 correspond one-to-one to the second flow pipeline elements 401.

[0102] Specifically, the fourth control valve element 403 includes a third pneumatic diaphragm valve and a fourth pneumatic diaphragm valve. Among them, the third pneumatic diaphragm valve is arranged in the second flow pipeline element 401 and is located upstream of the second flow control element 402, for automatically controlling the flow communication between the second flow pipeline element 401 and the second gas input element 201; the fourth pneumatic diaphragm valve is arranged in the second flow pipeline element 401 and is located downstream of the second flow control element 402, for automatically controlling the flow communication between the second flow pipeline element 401 and the first gas mixing module 500.

[0103] In some embodiments, the fourth control valve element 403 includes but is not limited to a diaphragm valve.

[0104] As shown in FIG. 5, the first gas mixing module 500 includes a first gas mixing element 501 and a fifth control valve element 502. Among them, the first gas mixing element 501 is in communication with the first flow control module 300, the second flow control module 400, the first concentration analysis module 600, the first gas output module 900, and the second gas mixing module 700, respectively, for mixing the first gas and the second gas to obtain the first mixed gas; the fifth control valve element 502 is arranged in the first gas mixing element 501, for controlling the flow communication of the first gas mixing element 501. Figure 2 Specifically, the first gas mixing element 501 includes a first gas mixing input pipeline, a buffer pipe, and a first gas mixing output pipeline. Among them, the first end of the first gas mixing input pipeline is in communication with the second end of the first flow pipeline element 301 and the second end of the second flow pipeline element 401, respectively; the first end of the buffer pipe is in communication with the second end of the first gas mixing pipeline; the first end of the first gas mixing output pipeline is in communication with the second end of the buffer pipe, and the second end of the first gas mixing output pipeline is in communication with the first gas output module 900, the first concentration analysis module 600, and the second gas mixing module 700, respectively.

[0105] In some embodiments, the first gas mixing input pipeline includes but is not limited to a stainless steel pipe.

[0106] In some embodiments, the first gas mixing input pipeline includes but is not limited to a stainless steel pipe.

[0107] In some embodiments, the buffer tube includes, but is not limited to, a buffer tube.

[0108] In some of these embodiments, the first mixed-gas output line includes, but is not limited to, a stainless steel pipe.

[0109] Specifically, the fifth control valve element 502 includes a fifth manual diaphragm valve. This fifth manual diaphragm valve is located in the first mixed-gas output line and is used to manually control the flow in the first mixed-gas output line.

[0110] In some of these embodiments, the fifth control valve element 502 includes, but is not limited to, a diaphragm valve.

[0111] like Figure 2 As shown, the first concentration analysis module 600 includes a first concentration pipeline element 601, a first concentration analysis element 602, and a sixth control valve element 603. The first concentration pipeline element 601 is connected to both the first gas mixing module 500 and the first gas output module 900, and is used to transport the first mixed gas. The first concentration analysis element 602 is connected to the first concentration pipeline element 601 and is used to detect the concentration of the first mixed gas. The sixth control valve element 603 is disposed on the first concentration pipeline element 601 and is used to control the flow of gas through the first concentration pipeline element 601.

[0112] Specifically, the first concentration pipeline element 601 includes a first concentration input pipeline and a first concentration output pipeline. The first end of the first concentration input pipeline is connected to the second end of the first mixed gas output pipeline, and the second end of the first concentration input pipeline is connected to the first concentration analysis element 602; the first end of the first concentration output pipeline is connected to the first concentration analysis element 602, and the second end of the first concentration output pipeline is connected to the second gas output module 1000.

[0113] In some of these embodiments, the first concentration inlet line includes, but is not limited to, a stainless steel pipe.

[0114] In some of these embodiments, the first concentration output pipeline includes, but is not limited to, a stainless steel pipe.

[0115] Specifically, the first concentration analysis element 602 includes a first analysis pipeline, a first flow meter, a first analysis instrument, a second analysis pipeline, a second flow meter, and a third analysis pipeline. Among them, the first end of the first analysis pipeline is in communication with the second end of the first concentration input pipeline; the first flow meter is arranged in the first analysis pipeline, used to adjust the flow of the first mixed gas to adapt to the first analysis instrument; the first analysis instrument is in communication with the second end of the first analysis pipeline; the first end of the second analysis pipeline is in communication with the second end of the first concentration input pipeline, and the second end of the second analysis pipeline is in communication with the first end of the first concentration output pipeline; the second flow meter is arranged in the second analysis pipeline, used to directly discharge the excess first mixed gas to the second gas output module 1000; the first end of the third analysis pipeline is in communication with the first analysis instrument, and the second end of the third analysis pipeline is in communication with the first end of the first concentration output pipeline.

[0116] In some embodiments, the first analysis pipeline includes but is not limited to a stainless steel pipe.

[0117] In some embodiments, the first flow meter includes but is not limited to a float flow meter.

[0118] In some embodiments, the first analysis instrument includes but is not limited to a concentration analyzer.

[0119] In some embodiments, the second analysis pipeline includes but is not limited to a stainless steel pipe.

[0120] In some embodiments, the second flow meter includes but is not limited to a float flow meter.

[0121] In some embodiments, the third analysis pipeline includes but is not limited to a stainless steel pipe.

[0122] Specifically, the sixth control valve element 603 includes a fifth pneumatic diaphragm valve, a first one-way valve, and a second one-way valve. Among them, the fifth pneumatic diaphragm valve is arranged in the first concentration input pipeline, used to automatically control the flow communication between the first concentration input pipeline and the first mixed gas output pipeline; the first one-way valve is arranged in the first concentration input pipeline and located downstream of the fifth pneumatic diaphragm valve, used to make the first mixed gas in the first concentration input pipeline flow in one direction; the second one-way valve is arranged in the first concentration output pipeline, used to make the first mixed gas in the first concentration output pipeline flow in one direction.

[0123] In some embodiments, the sixth control valve element 603 includes but is not limited to a diaphragm valve and a one-way valve.

[0124] Furthermore, the first concentration analysis module 600 also includes a third pressure regulating element 604 and a fifth pressure monitoring element 605. The third pressure regulating element 604 is disposed in the first concentration pipeline element 601 and is used to regulate the gas pressure inside the first concentration pipeline element 601; the fifth pressure monitoring element 605 is connected to the first concentration pipeline element 601 and is used to monitor the gas pressure inside the first concentration pipeline element 601.

[0125] Specifically, the third pressure regulating element 604 is disposed in the first concentration input pipeline and located downstream of the first check valve, and is used to regulate the gas pressure inside the first concentration input pipeline.

[0126] In some of these embodiments, the third pressure regulating element 604 includes, but is not limited to, a pressure regulating valve.

[0127] Specifically, the fifth pressure monitoring element 605 includes a fifth pressure gauge. The fifth pressure gauge is connected to the first concentration input line, and the connection between the fifth pressure gauge and the first concentration input line is located downstream of the first check valve, for real-time monitoring of the gas pressure inside the first concentration input line.

[0128] In some of these embodiments, the fifth pressure monitoring element 605 includes, but is not limited to, a pressure gauge.

[0129] like Figure 2 As shown, the second gas mixing module 700 includes a plurality of second gas mixing elements 701 and a plurality of seventh control valve elements 702. The plurality of second gas mixing elements 701 are connected in series, with one second gas mixing element 701 located on either side connected to the first gas mixing module 500, and the other second gas mixing element 701 connected to the first gas output module 900. Located downstream of the first gas mixing module 500 and upstream of the first gas output module 900, these elements are used to finely mix the first mixed gas to obtain a second mixed gas. The plurality of seventh control valve elements 702 are respectively disposed on the corresponding second gas mixing elements 701 and are used to control the flow of the second gas mixing elements 701.

[0130] More specifically, there are three second mixing elements 701, which are connected in series. The two outermost second mixing elements 701 are connected to the first mixing output pipeline and the first gas output pipeline, respectively.

[0131] In some of these embodiments, the second mixing element 701 includes, but is not limited to, a mixing tank.

[0132] In some of these embodiments, the second mixing element 701 includes, but is not limited to, a 29L mixing tank.

[0133] In some embodiments, a plurality of second mixing elements 701 form a plurality of groups of second mixing elements 701. Each group of second mixing elements 701 includes a plurality of second mixing elements 701. Generally, each group of second mixing elements 701 contains the same number of second mixing elements 701. That is, the number of second mixing elements 701 is a = b * c, where a is the total number, b is the number of groups, and c is the number of second mixing elements 701 in each group.

[0134] Specifically, the seventh control valve element 702 includes a sixth manual diaphragm valve. The sixth manual diaphragm valve is located at the inlet and / or outlet of the second mixing element 701.

[0135] In some of these embodiments, the seventh control valve element 702 includes, but is not limited to, a diaphragm valve.

[0136] It should be noted that the number of the seventh control valve element 702 is matched with the number of the second mixing element 701; it should be understood that the number of the seventh control valve element 702 is an integer multiple of the number of the second mixing element 701. For example, the number of the seventh control valve element 702 is equal to the number of the second mixing element 701, or the number of the seventh control valve element 702 is twice the number of the second mixing element 701.

[0137] like Figure 2 As shown, the second concentration analysis module 800 includes a second concentration pipeline element 801, a second concentration analysis element 802, and an eighth control valve element 803. The second concentration pipeline element 801 is connected to both the first gas output module 900 and the second gas output module 1000, and is used to deliver the second mixed gas. The second concentration analysis element 802 is connected to the second concentration pipeline element 801 and is used to detect the concentration of the second mixed gas. The eighth control valve element 803 is disposed on the second concentration pipeline element 801 and is used to control the flow of gas through the second concentration pipeline element 801.

[0138] Specifically, the second concentration pipeline element 801 includes a second concentration input pipeline and a second concentration output pipeline. The first end of the second concentration input pipeline is connected to the first gas output module 900, thereby connecting to the second gas mixing module 700 via the first gas output module 900. The second end of the second concentration input pipeline is connected to the second concentration analysis element 802. The first end of the second concentration output pipeline is connected to the second concentration analysis element 802, and the second end of the second concentration output pipeline is connected to the second gas output module 1000.

[0139] In some of these embodiments, the second concentration inlet conduit includes, but is not limited to, a stainless steel pipe.

[0140] In some embodiments, the second concentration output pipeline includes, but is not limited to, a stainless steel pipe.

[0141] Specifically, the second concentration analysis element 802 includes a fourth analysis pipeline, a third flow meter, a second analyzer, a fifth analysis pipeline, a fourth flow meter, and a sixth analysis pipeline. Among them, the first end of the fourth analysis pipeline is in communication with the second end of the second concentration input pipeline; the third flow meter is arranged in the fourth analysis pipeline, used to adjust the flow of the second mixed gas to adapt to the second analyzer; the second analyzer is in communication with the second end of the fourth analysis pipeline; the first end of the fifth analysis pipeline is in communication with the second end of the second concentration input pipeline, and the second end of the fifth analysis pipeline is in communication with the first end of the second concentration output pipeline; the third flow meter is arranged in the fifth analysis pipeline, used to directly discharge the excess first mixed gas to the second gas output module 1000; the first end of the sixth analysis pipeline is in communication with the second analyzer, and the second end of the sixth analysis pipeline is in communication with the first end of the second concentration output pipeline.

[0142] In some embodiments, the fourth analysis pipeline includes, but is not limited to, a stainless steel pipe.

[0143] In some embodiments, the third flow meter includes, but is not limited to, a float flow meter.

[0144] In some embodiments, the second analyzer includes, but is not limited to, a concentration analyzer.

[0145] In some embodiments, the fifth analysis pipeline includes, but is not limited to, a stainless steel pipe.

[0146] In some embodiments, the fourth flow meter includes, but is not limited to, a float flow meter.

[0147] In some embodiments, the sixth analysis pipeline includes, but is not limited to, a stainless steel pipe.

[0148] Specifically, the eighth control valve element 803 includes a sixth pneumatic diaphragm valve, a third one-way valve, and a fourth one-way valve. Among them, the sixth pneumatic diaphragm valve is arranged in the second concentration input pipeline, used to automatically control the flow communication between the second concentration input pipeline and the first gas output module 900; the third one-way valve is arranged in the second concentration input pipeline and located downstream of the sixth pneumatic diaphragm valve, used to make the second mixed gas in the second concentration input pipeline flow in one direction; the fourth one-way valve is arranged in the second concentration output pipeline, used to make the second mixed gas in the second concentration output pipeline flow in one direction.

[0149] In some embodiments, the eighth control valve element 803 includes, but is not limited to, a diaphragm valve, a one-way valve.

[0150] Furthermore, the second concentration analysis module 800 also includes a fourth pressure regulating element 804 and a sixth pressure monitoring element 805. The fourth pressure regulating element 804 is disposed in the second concentration pipeline element 801 and is used to regulate the gas pressure inside the second concentration pipeline element 801; the sixth pressure monitoring element 805 is connected to the second concentration pipeline element 801 and is used to monitor the gas pressure inside the second concentration pipeline element 801.

[0151] Specifically, the fourth pressure regulating element 804 is disposed in the second concentration input pipeline and located downstream of the third check valve, and is used to regulate the gas pressure inside the second concentration input pipeline.

[0152] In some of these embodiments, the fourth pressure regulating element 804 includes, but is not limited to, a pressure regulating valve.

[0153] Specifically, the sixth pressure monitoring element 805 includes a sixth pressure gauge. The sixth pressure gauge is connected to the second concentration input line, and the connection between the sixth pressure gauge and the second concentration input line is located downstream of the third check valve, for real-time monitoring of the gas pressure inside the second concentration input line.

[0154] In some of these embodiments, the sixth pressure monitoring element 805 includes, but is not limited to, a pressure gauge.

[0155] like Figure 2 As shown, the first gas output module 900 includes a first gas output element 901, a ninth control valve element 902, at least one second gas output element 903, and at least one tenth control valve element 904. The first gas output element 901 is connected to a first gas mixing module 500, a first concentration analysis module 600, a second gas mixing module 700, and a second concentration analysis module 800, respectively, and is used to deliver a first mixed gas or a second mixed gas. The ninth control valve element 902 is disposed on the first gas output element 901 and is used to control the flow of gas through the first gas output element 901. The second gas output element 903 is connected to the first gas output element 901 and a process device, respectively, and is used to deliver a second mixed gas to the process device. The tenth control valve element 904 is disposed on the second gas output element 903 and is used to control the flow of gas through the second gas output element 903.

[0156] Specifically, the first end of the first gas output element 901 is connected to the second end of the first mixed gas output pipeline, and the second end of the first gas output element 901 is connected to the first end of the second gas output element 903, the second concentration input pipeline, and the second gas output module 1000.

[0157] In some of these embodiments, the first gas output element 901 includes, but is not limited to, a stainless steel tube.

[0158] Specifically, the ninth control valve element 902 includes a seventh manual diaphragm valve, an eighth manual diaphragm valve, and a seventh pneumatic diaphragm valve. Among them, the seventh manual diaphragm valve is arranged at the first gas output element 901 and is located at the upstream of the downstream of the second gas mixing element 701 and the first gas output element 901 and the upstream of the communication between the second gas mixing element 701 and the first gas output element 901, for controlling the flow between the first gas mixing output pipeline and the first gas output element 901; the eighth manual diaphragm valve is arranged at the first gas output element 901 and is located at the upstream of the downstream of the second gas mixing element 701 and the first gas output element 901 and the upstream of the communication between the first gas output element 901 and the second gas output module 1000, for manually controlling the flow between the first gas output element 901 and the second gas mixing element 701; and the seventh pneumatic diaphragm valve is arranged at the first gas output element 901 and is located at the downstream of the communication between the first gas output element 901 and the second gas output module 1000, for automatically controlling the flow between the first gas output element 901 and the second gas output element 903.

[0159] In some embodiments, the ninth control valve element 902 includes, but is not limited to, a diaphragm valve.

[0160] Specifically, the number of the second gas output elements 903 is several, and the first ends of the several second gas output elements 903 are connected in parallel with the second end of the first gas output element 901, and the second ends of the several second gas output elements 903 are respectively communicated with corresponding process equipment.

[0161] In some embodiments, the second gas output element 903 includes, but is not limited to, a stainless steel pipe.

[0162] It should be noted that the number of the second gas output elements 903 is adapted to the number of the process equipment or the number of the gas inlets of the process equipment; it should be understood that the number of the second gas output elements 903 is the same as the number of the process equipment or the number of the gas inlets of the process equipment.

[0163] Specifically, the tenth control valve element 904 includes a ninth manual diaphragm valve. Among them, the ninth manual diaphragm valve is arranged at the corresponding second gas output element 903, for manually controlling the flow between the second gas output element 903 and the process equipment.

[0164] In some embodiments, the tenth control valve element 904 includes, but is not limited to, a diaphragm valve.

[0165] It should be noted that the number of the tenth control valve element 904 is adapted to the number of the second gas input element 201; it should be understood that the number of the tenth control valve element 904 is the same as the number of the second gas input element 201. That is, the tenth control valve element 904 corresponds to the second gas input element 201 one by one.

[0166] Further, the first gas output module 900 further comprises a fifth pressure regulating element 905 and a seventh pressure monitoring element 906. The fifth pressure regulating element 905 is arranged in the first gas output element 901 for regulating the pressure inside the first gas output element 901. The seventh pressure monitoring element 906 is in communication with the first gas output element 901 for monitoring the pressure upstream and downstream of the fifth pressure regulating element 905.

[0167] Specifically, the fifth pressure regulating element 905 is located downstream of the eighth manual diaphragm valve and upstream of the communication between the first gas output element 901 and the second concentration input pipeline.

[0168] In some embodiments, the fifth pressure regulating element 905 includes but is not limited to a pressure regulating valve.

[0169] Specifically, the seventh pressure monitoring element 906 comprises a third pressure sensor and a fourth pressure sensor. The third pressure sensor is in communication with the first gas output element 901, and the communication between the third pressure sensor and the first gas output element 901 is located downstream of the eighth manual diaphragm valve and upstream of the fifth pressure regulating element 905. The fourth pressure sensor is in communication with the first gas output element 901, and the communication between the fourth pressure sensor and the first gas output element 901 is located downstream of the communication between the first gas output element 901 and the second concentration input element and upstream of the communication between the first gas output element 901 and the second gas output module 1000.

[0170] In some embodiments, the seventh pressure monitoring element 906 includes but is not limited to a pressure sensor.

[0171] Further, the first gas output module 900 further comprises a first flow monitoring element 907 and at least one second flow monitoring element 908. The first flow monitoring element 907 is arranged in the first gas output element 901 for detecting the flow inside the first gas output element 901. The second flow monitoring element 908 is arranged in the corresponding second gas output element 903 for detecting the flow inside the second gas output element 903.

[0172] Specifically, the first flow monitoring element 907 is located downstream of the fourth pressure sensor and upstream of the communication between the first gas output element 901 and the second gas output module 1000.

[0173] In some embodiments, the first flow monitoring element 907 includes but is not limited to a flow meter.

[0174] Specifically, the second flow monitoring element 908 is located downstream of the ninth manual diaphragm valve.

[0175] In some of these embodiments, the second flow monitoring element 908 includes, but is not limited to, a flow meter.

[0176] like Figure 3 As shown, the second gas output module 1000 includes a third gas output element 1001, an eleventh control valve element 1002, at least one fourth gas output element 1003, and at least one twelfth control valve element 1004. The third gas output element 1001 is connected to the first gas output module 900 and is used to transport waste gas; the eleventh control valve element 1002 is disposed on the second gas output element 903 and is used to control the flow rate of the second gas output element 903; the fourth gas output element 1003 is connected to both the third gas output element 1001 and the waste gas treatment equipment and is used to transport waste gas; the twelfth control valve element 1004 is disposed on the fourth gas output element 1003 and is used to control the flow of the fourth gas output element 1003.

[0177] Specifically, the first end of the third gas output element 1001 is connected to the first gas output element 901, and the connection between the first end of the third gas output element 1001 and the first gas output element 901 is located downstream of the first flow monitoring element 907 and upstream of the seventh pneumatic diaphragm valve. The second end of the third gas output element 1001 is connected to the first end of the fourth gas output element 1003.

[0178] In some of these embodiments, the third gas output element 1001 includes, but is not limited to, a stainless steel tube.

[0179] Specifically, the eleventh control valve element 1002 includes a tenth manual diaphragm valve. The tenth manual diaphragm valve is disposed on the third gas output element 1001 and located upstream of the connection between the third gas output element 1001 and the first concentration output pipeline and the second concentration output pipeline, and is used to manually control the flow between the third gas output element 1001 and the first gas output element 901.

[0180] In some of these embodiments, the eleventh control valve element 1002 includes, but is not limited to, a diaphragm valve.

[0181] Specifically, there are several fourth gas output elements 1003, and the first end of several fourth gas output elements 1003 is connected in parallel with the second end of the third gas output element 1001, and the second end of several fourth gas output elements 1003 is connected to the corresponding waste gas treatment equipment.

[0182] In some of these embodiments, the fourth gas output element 1003 includes, but is not limited to, a stainless steel tube.

[0183] It should be noted that the number of the fourth gas output elements 1003 is adapted to the number of the exhaust treatment devices or the number of the gas inlets on the exhaust treatment devices; it should be understood that the number of the fourth gas output elements 1003 is the same as the number of the exhaust treatment devices or the number of the gas inlets on the exhaust treatment devices.

[0184] Specifically, the twelfth control valve element 1004 comprises an eleventh manual diaphragm valve. The eleventh manual diaphragm valve is arranged on the fourth gas output element 1003 and is used for manually controlling the communication between the fourth gas output element 1003 and the exhaust treatment device.

[0185] In some embodiments, the twelfth control valve element 1004 comprises but is not limited to a diaphragm valve.

[0186] It should be noted that the number of the twelfth control valve element 1004 is adapted to the number of the fourth gas output element 1003; it should be understood that the number of the twelfth control valve element 1004 is the same as the number of the fourth gas output element 1003. That is, the twelfth control valve element 1004 corresponds to the fourth gas output element 1003 one by one.

[0187] The use method of the embodiment is as follows:

[0188] The system controls the first gas source and the second gas source to respectively transport the first gas and the second gas to the first gas input element 101 and the second gas input element 201, and opens the first manual diaphragm valve, the second manual diaphragm valve, the third manual diaphragm valve, the fourth manual diaphragm valve, the first pressure regulating element 103 and the second pressure regulating element 203, so that the first pressure regulating element 103 and the second pressure regulating element 203 can respectively regulate the gas pressure inside the first gas input element 101 and the second gas input element 201 to a proper value;

[0189] After the pressure regulation is completed, the system opens the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the first flow control element 302 and the second flow control element 402, so that the first flow pipeline element 301 and the second flow pipeline element 401 can transport the first gas and the second gas with proper flow size to the first gas mixing element 501, and then the first gas mixing element 501 can preliminarily mix the first gas and the second gas to obtain the first mixed gas;

[0190] The system opens the fifth manual diaphragm valve, the fifth pneumatic diaphragm valve and the third pressure regulating element 604, so that the pressure of the first mixed gas transported to the first flow meter meets the standard. The first mixed gas after the pressure regulation can be adjusted by the first flow meter, so that the flow of the first mixed gas transported to the first analyzer meets the standard, and then the first analyzer can detect the first mixed gas until the concentration of the first mixed gas meets the standard.

[0191] When the concentration of the first mixed gas reaches the preset standard, the system closes the fifth pneumatic diaphragm valve, the sixth manual diaphragm valve, and opens the sixth manual diaphragm valve, so that the first mixed gas enters the second gas mixing element 701 in sequence for mixing to obtain a second mixed gas;

[0192] The system opens the sixth pneumatic diaphragm valve and the fourth pressure regulating element 804, so that the pressure of the second mixed gas flowing to the third flow meter meets the standard. The second mixed gas after pressure regulation can pass through the third flow meter to adjust the flow of the second mixed gas flowing to the second analyzer to meet the standard, so that the second analyzer can detect the second mixed gas until the concentration of the second mixed gas meets the standard;

[0193] When the concentration of the second mixed gas reaches the preset standard, the system opens the seventh pneumatic diaphragm valve and the ninth manual diaphragm valve, so that the second mixed gas can be delivered to the process equipment through the first gas output element 901 and the second gas output element 903;

[0194] In addition, in order to discharge the excess gas flowing to the first concentration input pipeline, the system opens the sixth manual diaphragm valve, the eighth manual diaphragm valve, the fifth pressure regulating element 905, the tenth manual diaphragm valve, and the eleventh manual diaphragm valve, so that the excess first mixed gas can be discharged to the waste gas treatment equipment through the first gas output pipeline, the first gas output element 901, the third gas output element 1001, and the fourth gas output element 1003. In order to discharge the excess gas flowing to the first flow meter, it can be discharged to the waste gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element 1003. The first mixed gas after detection by the first analyzer can be discharged to the waste gas treatment equipment through the third analysis pipeline, the first concentration output pipeline, and the fourth gas output element 1003.

[0195] In addition, in order to discharge the excess gas flowing to the second flow meter, it can be discharged to the waste gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element 1003. The second mixed gas after detection by the second analyzer can be discharged to the waste gas treatment equipment through the sixth analysis pipeline, the first concentration output pipeline, and the fourth gas output element 1003.

[0196] The embodiment has the advantages that: by connecting the first gas input module with the plurality of first flow control modules, connecting the second gas input module with the plurality of second flow control modules, and simultaneously controlling the flow by using the plurality of second flow control modules, the control accuracy of the flow is improved, and the concentration accuracy is further improved; by connecting the first mixing module with the first flow control module and the second flow control module respectively, and preliminarily mixing the first gas and the second gas by the first mixing module, the concentration uniformity of the overall system is improved; by connecting the second mixing module with the first mixing module, and finely mixing the second mixed gas obtained by the preliminary mixing, the concentration uniformity of the gas mixing is further improved.

[0197] Embodiment 2

[0198] The embodiment is a variant of the embodiment 1.

[0199] As shown in Figure 3 the plurality of high-flow gas mixing systems further includes a third gas input module 1100. The first gas input module 100 is connected with the first concentration analysis module 600, and is used to deliver the first gas to the first concentration analysis module 600 to enable the first concentration analysis module 600 to perform zero gas calibration by using the first gas. The first gas input module 100 is connected with the second concentration analysis module 800, and is used to deliver the first gas to the second concentration analysis module 800 to enable the second concentration analysis module 800 to perform zero gas calibration by using the first gas. The third gas input module 1100 is connected with the standard gas source, the first concentration analysis module 600 and the second concentration analysis module 800 respectively, and is used to perform standard gas calibration on the first concentration analysis module 600 and the second concentration analysis module 800.

[0200] As shown in Figure 3As shown, the first gas input module 100 further comprises a third gas input element 106, a thirteenth control valve element 107, a fourth gas input element 108, a fourteenth control valve element 109, a fifth gas input element 110, and a fifteenth control valve element 111. The third gas input element 106 is in communication with the first gas input element 101 for conveying the first gas; the thirteenth control valve element 107 is disposed on the third gas input element 106 for controlling the flow of the third gas input element 106; the fourth gas input element 108 is in communication with the third gas input element 106 and the first concentration analysis module 600 respectively for conveying the first gas to the first concentration analysis module 600 to calibrate the first concentration analysis module 600 with zero gas; the fourteenth control valve element is disposed on the fourth gas input element 108 for controlling the flow of the fourth gas input element 108; the fifth gas input element 110 is in communication with the third gas input element 106 and the second concentration analysis module 800 respectively for conveying the first gas to the second concentration analysis module 800 to calibrate the second concentration analysis module 800 with zero gas; and the fifteenth control valve element 111 is disposed on the fifth gas input element 110 for controlling the flow of the fifth gas input element 110.

[0201] Specifically, the first end of the third gas input element 106 is in communication with the first gas input element 101 downstream of the second pressure monitoring element 105 and upstream of the first gas input element 101 and the first flow pipeline element 301.

[0202] In some embodiments, the third gas input element 106 comprises, but is not limited to, a stainless steel pipe.

[0203] Specifically, the thirteenth control valve element 107 comprises a twelfth manual diaphragm valve and a fifth one-way valve. The twelfth manual diaphragm valve is disposed on the third gas input element 106 for manually controlling the flow of the first gas input element 101 and the third gas input element 106; and the fifth one-way valve is disposed on the third gas input element 106 downstream of the twelfth manual diaphragm valve for allowing the gas in the third gas input element 106 to flow in one direction.

[0204] In some embodiments, the thirteenth control valve element 107 comprises, but is not limited to, a diaphragm valve and a one-way valve.

[0205] Specifically, the first end of the fourth gas input element 108 is in communication with the second end of the third gas input element 106, and the second end of the fourth gas input element 108 is in communication with the first concentration input pipeline.

[0206] In some embodiments, the fourth gas input element 108 comprises, but is not limited to, a stainless steel pipe.

[0207] Specifically, the fourteenth control valve element 109 includes a thirteenth manual diaphragm valve. The thirteenth manual diaphragm valve is located on the fourth gas input element 108 and is used to manually control the flow through the fourth gas input element 108.

[0208] In some of these embodiments, the fourteenth control valve element 109 includes, but is not limited to, a diaphragm valve.

[0209] Specifically, the first end of the fifth gas input element 110 is connected to the second end of the third gas input element 106, and the second end of the fifth gas input element 110 is connected to the second concentration input pipeline.

[0210] In some of these embodiments, the fifth gas input element 110 includes, but is not limited to, a stainless steel tube.

[0211] Specifically, the fifteenth control valve element 111 includes a fourteenth manual diaphragm valve. The fourteenth manual diaphragm valve is located on the fifth gas input element 110 and is used to manually control the flow through the fifth gas input element 110.

[0212] In some of these embodiments, the fifteenth control valve element 111 includes, but is not limited to, a diaphragm valve.

[0213] like Figure 4 As shown, the third gas input module 1100 includes a sixth gas input element 1101 and a sixteenth control valve element 1102. The sixth gas input element 1101 is connected to a standard gas source and a third gas input element 106, respectively, and is used to supply standard gas to the first concentration analysis module 600 and the second concentration analysis module 800 so that the second concentration analysis module 800 can perform standard gas calibration. The sixteenth control valve element 1102 is disposed on the sixth gas input element 1101 and is used to control the flow of gas through the sixth gas input element 1101.

[0214] Specifically, the first end of the sixth gas input element 1101 is connected to the standard gas source, the second end of the sixth gas input element 1101 is connected to the third gas input element 106, and the connection between the second end of the sixth gas input element 1101 and the third gas input element 106 is located downstream of the fifth check valve.

[0215] In some of these embodiments, the sixth gas input element 1101 includes, but is not limited to, a stainless steel tube.

[0216] Specifically, the sixteenth control valve element 1102 includes a fifteenth manual diaphragm valve. The fifteenth manual diaphragm valve is disposed on the sixth gas input element 1101 and is used to manually control the flow of gas into the sixth gas input element 1101.

[0217] In some embodiments thereof, the sixteenth control valve element 1102 includes, but is not limited to, a diaphragm valve.

[0218] The use method of the embodiment is as follows:

[0219] Before the system works on mixed gas, the first concentration analysis module 600 and the second concentration analysis module 800 need to be calibrated by zero gas and standard gas to ensure detection accuracy and improve instrument precision.

[0220] The system opens the first manual diaphragm valve and the second manual diaphragm valve, so that the first pressure regulating element 103 can regulate the gas pressure in the first gas input element 101 to a suitable value.

[0221] The system opens the twelfth manual diaphragm valve and the thirteenth manual diaphragm valve, so that the pressure of the first gas flowing to the first flowmeter meets the standard. The first gas after pressure regulation can pass through the first flowmeter to adjust the flow to the first analyzer to meet the standard, thereby realizing zero gas calibration of the first analyzer.

[0222] The system opens the fourteenth manual diaphragm valve, so that the pressure of the standard gas flowing to the third flowmeter meets the standard. The standard gas after pressure regulation can pass through the third flowmeter to adjust the flow to the second analyzer to meet the standard, thereby realizing zero gas calibration of the second analyzer.

[0223] In addition, after the first gas and the standard gas are used for calibration of the first analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and the standard gas can be discharged to the waste gas treatment equipment through the second analysis pipeline, the second flowmeter, the first concentration output pipeline, and the fourth gas output element 1003.

[0224] In addition, after the first gas and the standard gas are used for calibration of the second analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and the standard gas can be discharged to the waste gas treatment equipment through the fifth analysis pipeline, the fourth flowmeter, the second concentration output pipeline, and the fourth gas output element 1003.

[0225] The embodiment has the advantage that the first gas input module and the third gas input module are connected with the first concentration analysis module and the second concentration analysis module, so that zero gas calibration and standard gas calibration of the first concentration analysis module and the second concentration analysis module can be performed to ensure detection accuracy and improve instrument precision.

[0226] Embodiment 3

[0227] The embodiment is a variant of embodiments 1-2.

[0228] As Figure 4As shown, the mixing system for multiple high-flow-rate gases also includes a purging module 1200. The purging module 1200 is connected to the second gas input module 200 and the second gas output module 1000, respectively, and is used to purge the entire pipeline and equipment.

[0229] like Figure 5 As shown, the purging module 1200 includes a first purging pipeline element 1201, a seventeenth control valve element 1202, a second purging pipeline element 1203, an eighteenth control valve element 1204, a third purging pipeline element 1205, a nineteenth control valve element 1206, a vacuum element 1209, a vacuum pipeline element 1207, a twentieth control valve element 1208, a power gas supply pipeline element 1210, and a twenty-first control valve element 1211. The first purge pipeline element 1201 is connected to the purge gas source and the second gas input module 200, respectively, for conveying purge gas; the seventeenth control valve element 1202 is disposed on the first purge pipeline element 1201, for controlling the flow of the first purge pipeline element 1201; the second purge pipeline element 1203 is connected to the second gas input module 200 and the first gas mixing module 500, respectively, for conveying purge gas; the eighteenth control valve element 1204 is disposed on the second purge pipeline element 1203, for controlling the flow of the second purge pipeline element 1203; the third purge pipeline element 1205 is connected to the first gas mixing module 500 and the second gas output module 1000, respectively, for conveying purge gas; the nineteenth control valve element 1206 is disposed on... The third purging pipeline element 1205 is used to control the flow of the third purging pipeline element 1205; the vacuum pipeline element 1207 is connected to the second gas output module 1000 and the waste gas treatment equipment respectively, and is used to transport waste gas; the twentieth control valve element 1208 is disposed on the vacuum pipeline element 1207, and is used to control the flow of the vacuum pipeline element 1207; the vacuum element 1209 is disposed on the vacuum pipeline element 1207, and is used to form a vacuum negative pressure at the end of the second gas input module 200; the power gas supply pipeline element 1210 is connected to the vacuum element 1209 and the power gas source respectively, and is used to transport the power gas source; the twenty-first control valve element 1211 is disposed on the power supply pipeline element, and is used to control the flow of the power gas supply pipeline element 1210.

[0230] Specifically, the first end of the first purge pipeline element 1201 is connected to the purge gas source, the second end of the first purge pipeline element 1201 is connected to the second gas input element 201, and the connection between the second end of the first purge pipeline element 1201 and the second gas input element 201 is located downstream of the second pressure regulating element 203 and upstream of the fourth manual diaphragm valve.

[0231] In some of these embodiments, the first purge conduit element 1201 includes, but is not limited to, a stainless steel tube.

[0232] Specifically, the seventeenth control valve element 1202 comprises a sixteenth manual diaphragm valve and an eighth pneumatic diaphragm valve. Among them, the sixteenth manual diaphragm valve is arranged on the first purge pipeline element 1201 and is used for manually controlling the flow of the first purge pipeline element 1201; the eighth pneumatic diaphragm valve is arranged on the first purge pipeline element 1201 and is located downstream of the sixteenth manual diaphragm valve, and is used for automatically controlling the flow of the first purge pipeline element 1201.

[0233] In some embodiments, the seventeenth control valve element 1202 comprises, but is not limited to, a diaphragm valve.

[0234] Specifically, the first end of the second purge pipeline element 1203 is in communication with the second end of the second gas input element 201, and the second end of the second purge pipeline element 1203 is in communication with the first gas mixing element 501.

[0235] In some embodiments, the second purge pipeline element 1203 comprises, but is not limited to, a stainless steel pipe.

[0236] Specifically, the eighteenth control valve element 1204 comprises a ninth pneumatic diaphragm valve. Among them, the ninth pneumatic diaphragm valve is arranged on the second purge pipeline element 1203 and is used for automatically controlling the flow of the second purge pipeline element 1203.

[0237] In some embodiments, the eighteenth control valve element 1204 comprises, but is not limited to, a diaphragm valve.

[0238] Specifically, the first end of the third purge pipeline element 1205 is in communication with the first gas mixing output pipeline, and the communication position of the first end of the third purge pipeline element 1205 with the first gas mixing output pipeline is located upstream of the communication position of the first gas mixing output pipeline with the first concentration input pipeline, and the second end of the third purge pipeline element 1205 is in communication with the third gas output element 1001.

[0239] In some embodiments, the third purge pipeline element 1205 comprises, but is not limited to, a stainless steel pipe.

[0240] Specifically, the nineteenth control valve element 1206 comprises a tenth pneumatic diaphragm valve and a sixth one-way valve. Among them, the tenth pneumatic diaphragm valve is arranged on the third purge pipeline element 1205 and is used for automatically controlling the flow of the third purge pipeline element 1205; the sixth one-way valve is arranged on the third purge pipeline element 1205 and is located downstream of the tenth pneumatic diaphragm valve, and is used for allowing the gas in the third purge pipeline element 1205 to flow in one direction.

[0241] In some embodiments, the nineteenth control valve element 1206 comprises, but is not limited to, a diaphragm valve and a one-way valve.

[0242] Specifically, the first end of the vacuum pipeline element 1207 is in communication with the second end of the third gas output element 1001, and the second end of the vacuum pipeline element 1207 is in communication with the waste gas treatment device.

[0243] In some embodiments, the vacuum pipeline element 1207 includes, but is not limited to, a stainless steel pipe.

[0244] Specifically, the twentieth control valve element 1208 includes a seventeenth manual diaphragm valve and an eighteenth manual diaphragm valve. The seventeenth manual diaphragm valve is arranged on the vacuum pipeline element 1207 and is used to manually control the flow of the vacuum pipeline element 1207. The eighteenth manual diaphragm valve is arranged on the vacuum pipeline element 1207 and is located downstream of the seventeenth manual diaphragm valve, and is used to manually control the flow of the vacuum pipeline element 1207.

[0245] In some embodiments, the twentieth control valve element 1208 includes, but is not limited to, a diaphragm valve.

[0246] Specifically, the vacuum element 1209 is located downstream of the seventeenth manual diaphragm valve and upstream of the eighteenth manual diaphragm valve, and is used to provide a vacuum negative pressure to the second end of the third gas input element 106.

[0247] In some embodiments, the vacuum element 1209 includes, but is not limited to, a Venturi vacuum pump.

[0248] Specifically, the first end of the power gas supply pipeline element 1210 is in communication with the power gas source, and the second end of the power gas supply pipeline element 1210 is in communication with the vacuum element 1209.

[0249] In some embodiments, the power gas supply pipeline element 1210 includes, but is not limited to, a stainless steel pipe.

[0250] Specifically, the twenty-first control valve element 1211 includes a nineteenth manual diaphragm valve. The nineteenth manual diaphragm valve is arranged on the power gas supply pipeline element 1210 and is used to manually control the flow of the power gas supply pipeline element 1210.

[0251] In some embodiments, the twenty-first control valve element 1211 includes, but is not limited to, a diaphragm valve.

[0252] The use method of the embodiment is as follows:

[0253] In order to ensure the accuracy of the mixing concentration of the mixed system of multiple high-flow gases, the overall pipeline of the system needs to be purged before mixing gas in the mixed system of multiple high-flow gases.

[0254] The system keeps all the diaphragm valves closed, and opens the sixteenth manual diaphragm valve, the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, the sixth manual diaphragm valve, the seventh manual diaphragm valve, and the eighth manual diaphragm valve, so that the purge gas fills the pipeline in the entire system and maintains the pressure for a period of time.

[0255] Subsequently, the system opens the nineteenth manual diaphragm valve and the vacuum element 1209, so that the power gas supply pipeline element 1210 provides power gas to the vacuum element 1209, and the vacuum element 1209 provides negative pressure at the second end of the third gas input element 106;

[0256] Finally, the system opens the tenth pneumatic diaphragm valve, the tenth manual diaphragm valve, the eleventh manual diaphragm valve, the seventeenth manual diaphragm valve, and the eighteenth manual diaphragm valve, so that the gas in the entire pipeline is discharged through the third purge pipeline element 1205, the third gas output element 1001, and the vacuum pipeline element 1207.

[0257] The advantage of the embodiment is that by connecting the purge module with the second gas input module and the second gas output module, the entire pipeline of the mixed gas system can be purged before mixing, thereby ensuring the accuracy of the mixed gas concentration of the mixed gas system.

[0258] Embodiment 4

[0259] The embodiment is a variant of embodiments 1-3.

[0260] As shown in Figure 5 The mixed gas system further comprises a pressure relief module 1300. The pressure relief module 1300 is in communication with the first mixed gas module 500, the second mixed gas module 700, and the second gas output module 1000, and is used for pressure relief.

[0261] As shown in Figure 6 The pressure relief module 1300 comprises a first pressure relief pipeline element 1301, a first pressure relief valve element 1302, a plurality of second pressure relief pipeline elements 1303, and a plurality of second pressure relief valve elements 1304. The first pressure relief pipeline element 1301 is in communication with the first gas output module 900 and the second gas output module 1000. The first pressure relief valve element 1302 is arranged in the first pressure relief pipeline element 1301 and is used to open and relieve pressure when the pressure inside the first pressure relief pipeline element 1301 exceeds a preset pressure threshold. The plurality of second pressure relief pipeline elements 1303 are in communication with the second mixed gas module 700 and the second gas output module 1000. The plurality of second pressure relief valve elements 1304 are arranged in the corresponding second pressure relief pipeline elements 1303 and are used to open and relieve pressure when the pressure inside the second pressure relief pipeline elements 1303 exceeds a preset pressure threshold.

[0262] Specifically, the first end of the first pressure relief pipeline element 1301 is in communication with the first gas mixing output pipeline, and the second end of the first pressure relief pipeline element 1301 is in communication with the first end of the fourth gas output element 1003.

[0263] In some embodiments, the first pressure relief pipeline element 1301 includes, but is not limited to, a stainless steel pipe.

[0264] In some embodiments, the first pressure relief valve element 1302 includes, but is not limited to, a safety relief valve.

[0265] Specifically, the first end of the second pressure relief pipeline element 1303 is in communication with the second gas mixing element 701, and the second end of the second pressure relief pipeline element 1303 is in communication with the third gas output element 1001.

[0266] In some embodiments, the second pressure relief pipeline element 1303 includes, but is not limited to, a stainless steel pipe.

[0267] More specifically, the number of the second pressure relief pipeline element 1303 is 6, and the first end of each of the 6 second pressure relief pipeline elements 1303 is in communication with a corresponding second gas mixing element 701, and the second end of each of the 6 second pressure relief pipeline elements 1303 is in parallel connection with the third gas output element 1001.

[0268] It should be noted that the number of the second pressure relief pipeline element 1303 is adapted to the number of the second gas mixing element 701. It should be understood that the number of the second pressure relief pipeline element 1303 is the same as the number of the second gas mixing element 701. That is, the second pressure relief pipeline element 1303 corresponds to the second gas mixing element 701 one-to-one.

[0269] Specifically, the number of the second pressure relief valve element 1304 is 6, and each of the 6 second pressure relief valve elements 1304 is arranged in a corresponding second pressure relief pipeline element 1303.

[0270] In some embodiments, the second pressure relief valve element 1304 includes, but is not limited to, a safety valve.

[0271] It should be noted that the number of the second pressure relief valve element 1304 is adapted to the number of the second pressure relief pipeline element 1303; it should be understood that the number of the second pressure relief valve element 1304 is the same as the number of the second pressure relief pipeline element 1303.

[0272] The use method of the present embodiment is as follows:

[0273] After the pressure in the pipeline in the mixing system of multiple high-flow gases reaches a threshold value of 1Mpa, the gas in the pipeline can be discharged to the waste gas treatment equipment through the first pressure relief valve element 1302 and the second pressure relief valve element 1304.

[0274] The advantage of the embodiment is that by setting the pressure relief module in the pipeline in the system, the pressure in the pipeline in the mixed system of multiple high-flow gases can be automatically relieved to protect the overall system when the pressure reaches the threshold value of 1 Mpa.

[0275] Embodiment 5

[0276] The embodiment is a variant of embodiments 1-4.

[0277] As shown in Figure 6 , the mixed system of multiple high-flow gases further comprises a pressure protection module 1400. The pressure protection module 1400 is in communication with the first gas output module 900, the second gas output module 1000, the first gas mixing module 500, and the second gas mixing module 700, respectively, for protecting the pipeline.

[0278] As shown in Figure 7 , the pressure protection module 1400 comprises a pressure protection pipeline element 1401, a twenty-second control valve element 1402, a first protection element 1403, a second protection element 1404, and an eighth pressure monitoring element 1405. The pressure protection pipeline element 1401 is in communication with the first gas output module 900 and the second gas output module 1000, respectively, and the communication part of the pressure protection pipeline element 1401 with the first gas output module 900 is located between the second gas mixing module 700 and the second concentration analysis module 800, for conveying gas; the twenty-second control valve element 1402 is arranged in the pressure protection pipeline element 1401, for controlling the flow of the pressure protection pipeline element 1401; the first protection element 1403 is arranged in the pressure protection pipeline element 1401 and located downstream of the twenty-second control valve element 1402, for opening in the case of excessive gas flow in the pipeline; the second protection element 1404 is arranged in the pressure protection pipeline element 1401 and located downstream of the first protection element 1403, for opening in the case of excessive gas pressure in the pipeline; the eighth pressure monitoring element 1405 is in communication with the pressure protection pipeline element 1401 and located downstream of the second protection element 1404, for monitoring the gas pressure inside the pressure protection pipeline element 1401.

[0279] Specifically, the first end of the pressure protection pipeline element 1401 is in communication with the first gas output element 901, and the second end of the pressure protection pipeline element 1401 is in communication with the second pressure relief pipeline element 1303.

[0280] In some embodiments, the pressure protection pipeline element 1401 includes but is not limited to a stainless steel pipe.

[0281] Specifically, the twenty-second control valve element 1402 comprises an eleventh pneumatic diaphragm valve. Wherein, the eleventh pneumatic diaphragm valve is arranged in the pressure protection pipeline element 1401, for automatically controlling the flow of the pressure protection pipeline element 1401.

[0282] In some embodiments thereof, the twenty-second control valve element 1402 comprises, but is not limited to, a diaphragm valve.

[0283] In some embodiments thereof, the first protection element 1403 comprises, but is not limited to, a needle valve.

[0284] In some embodiments thereof, the second protection element 1404 comprises, but is not limited to, a back pressure valve.

[0285] Specifically, the eighth pressure monitoring element 1405 comprises a fifth pressure sensor. Wherein, the fifth pressure sensor is in communication with the pressure protection pipeline element 1401, for monitoring the gas pressure passing through the second protection element 1404 in real time.

[0286] In some embodiments thereof, the eighth pressure monitoring element 1405 comprises, but is not limited to, a pressure sensor.

[0287] The use method of the present embodiment is as follows:

[0288] In order to prevent the delivery pressure from being too high to affect the back-end machine, the system is provided with a pressure protection module 1400, the eleventh pneumatic diaphragm valve is always open, the first protection element 1403 is adjusted to a suitable flow, and the second protection element 1404 is adjusted to a protection pressure. When the pressure is higher than the protection pressure, the gas will pass through the eleventh pneumatic diaphragm valve, the first protection element 1403, the second protection element 1404, and finally be discharged from the fourth gas output element 1003.

[0289] The advantage of the present embodiment is that by communicating the pressure protection module with the first gas output module and the second gas output module, the gas can be automatically discharged to the second output module in the case that the gas pressure delivered by the first gas output module is too high, thereby protecting the pipeline of the overall system.

[0290] Embodiment 6

[0291] The present embodiment is a variant of embodiments 1-5.

[0292] As Figure 7 shown, the mixed system of multiple high-flow gases further comprises a backup mixed gas supply module 1500. Wherein, the backup mixed gas supply module 1500 is in communication with the first gas output module 900, for delivering gas to the process equipment.

[0293] As ​As shown, the backup mixed gas supply module 1500 includes a backup gas supply pipeline element 1501, a twenty-third control valve element 1502, a ninth pressure monitoring element 1503, and a third flow monitoring element 1504. The backup gas supply pipeline element 1501 is connected to a backup gas source and a first gas output module 900, respectively, for supplying mixed gas to the process equipment; the twenty-third control valve element 1502 is located in the backup gas supply pipeline element 1501 and is used to control the flow within the backup gas supply pipeline element 1501; the ninth pressure monitoring element 1503 is connected to the backup gas supply pipeline element 1501 and is used to monitor the gas pressure inside the backup gas supply pipeline element 1501; the third flow monitoring element 1504 is located in the backup gas supply pipeline element 1501 and is used to detect the flow rate inside the backup gas supply pipeline element 1501.

[0294] Specifically, the first end of the backup gas supply pipeline element 1501 is connected to the backup gas source, and the second end of the backup gas supply pipeline element 1501 is connected to the second gas output element 903.

[0295] In some of these embodiments, the backup gas supply piping element 1501 includes, but is not limited to, a stainless steel pipe.

[0296] Specifically, the twenty-third control valve element 1502 includes a twentieth manual diaphragm valve and a twelfth pneumatic diaphragm valve. The twentieth manual diaphragm valve is located in the backup gas supply line element 1501 and is used to manually control the flow of gas in the backup gas supply line element 1501. The twelfth pneumatic diaphragm valve is located downstream of the backup gas supply line element 1501 and is used to automatically control the flow of gas in the backup gas supply line element 1501.

[0297] In some of these embodiments, the twenty-third control valve element 1502 includes, but is not limited to, a diaphragm valve.

[0298] Specifically, the ninth pressure monitoring element 1503 includes a sixth pressure sensor. The sixth pressure sensor is connected to the backup gas supply line element 1501 and is located downstream of the nineteenth manual diaphragm valve and upstream of the twelfth pneumatic diaphragm valve.

[0299] In some of these embodiments, the ninth pressure monitoring element 1503 includes, but is not limited to, a pressure sensor.

[0300] Specifically, the third flow monitoring element 1504 is located downstream of the twelfth pneumatic diaphragm valve.

[0301] In some of these embodiments, the third flow meter includes, but is not limited to, a flow meter.

[0302] The usage method of this embodiment is as follows:

[0303] In the case of mixed gas supply interruption in system failure, the system opens the twentieth manual diaphragm valve, and the gas in the standby gas tank can flow to the standby gas supply pipeline element 1501, and in the case that the gas pressure monitored by the twelfth pressure sensor meets the requirements, the system opens the twelfth pneumatic diaphragm valve, so that the subsequent process equipment can work normally in the case of mixed gas supply interruption in system failure.

[0304] The embodiment has the advantages that by communicating the standby mixed gas supply module with the first gas output module, the subsequent process equipment can be ensured to work normally in the case of mixed gas supply interruption in system failure.

[0305] Embodiment 7

[0306] The embodiment relates to the process equipment in the utility model.

[0307] The semiconductor process equipment comprises the mixed system of multiple large-flow gases as described in Embodiments 1 to 6.

[0308] In addition, the semiconductor process equipment further comprises a first gas supply device, a second gas supply device, a purge gas supply device, a standard gas supply device, a waste gas treatment device, a power gas supply device and a standby gas supply device. The first gas supply device is communicated with the first gas input module 100; the second gas supply device is communicated with the second gas input module 200; the purge gas supply device is communicated with the purge module 1200; the standard gas supply device is communicated with the third gas input module 1100; the waste gas treatment device is communicated with the second gas output module 1000; the power gas supply device is communicated with the vacuum element 1209 of the purge module 1200; and the standby gas supply device is communicated with the standby mixed gas supply module 1500.

[0309] The use method of the embodiment is basically the same as that of Embodiments 1 to 6, and will not be described here.

[0310] The technical effects of the embodiment are basically the same as those of Embodiments 1 to 6, and will not be described here.

[0311] The technical features of the above-described embodiments can be combined arbitrarily, and in order to make the description simple, all possible combinations of the technical features in the above-described embodiments are not described, however, as long as the combinations of the technical features do not exist contradictory, it should be considered that it is within the scope of the description.

[0312] The above-described embodiments only express several implementation manners of the application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the scope of the utility model patent. It should be pointed out that for ordinary skilled persons in the art, without departing from the concept of the application, a number of modifications and improvements can be made, which all belong to the protection scope of the application. Therefore, the protection scope of the patent of the application should be subject to the appended claims.

Claims

1. A mixing system of a plurality of high flow gases, characterized by, The application relates to a gas mixing device for a process equipment, comprising: a first gas input module in communication with a first gas source for delivering a first gas; a second gas input module in communication with a second gas source for delivering a second gas; at least one first flow control module in communication with and downstream of the first gas input module for controlling the flow of the first gas; at least one second flow control module in communication with and downstream of the second gas input module for controlling the flow of the second gas; a first gas mixing module in communication with and downstream of the first flow control module and the second flow control module for mixing the first gas and the second gas to obtain a first mixed gas; a first concentration analysis module in communication with and downstream of the first gas mixing module for detecting the concentration of the first mixed gas; a second gas mixing module in communication with the first gas mixing module for mixing the first mixed gas to obtain a second mixed gas; a second concentration analysis module in communication with and downstream of the second gas mixing module for detecting the concentration of the second mixed gas; a first gas output module in communication with the first gas mixing module, the second gas mixing module, the second concentration analysis module and the process equipment, and downstream of the second gas mixing module, for delivering the second mixed gas to the process equipment when the second concentration analysis module detects that the second mixed gas meets the standard; a second gas output module in communication with the first concentration analysis module, the second concentration analysis module, the first gas output module and the waste gas treatment equipment, for delivering waste gas.

2. The mixing system of claim 1, wherein The first gas input module comprises: a first gas input element in communication with the first gas source and the first flow control module, for delivering the first gas; a first control valve element arranged in the first gas input element, for controlling the flow of the first gas input element; and / or The second gas input module comprises: a second gas input element in communication with the second gas source and the second flow control module, for delivering the second gas; a second control valve element arranged in the second gas input element, for controlling the flow of the second gas input element; and / or The first flow control module comprises: at least one first flow pipeline element in communication with the first gas input module and the first gas mixing module, for delivering the first gas to the first gas mixing module; at least one first flow control element disposed in the first flow pipe element for controlling the flow to the first mixing module; at least one third control valve element disposed in the first flow pipe element for controlling the flow through the first flow pipe element; and / or the second flow control module comprises: at least one second flow pipe element in communication with the second gas input module and the first mixing module respectively for delivering the second gas to the first mixing module; at least one second flow control element disposed in the second flow pipe element for controlling the flow to the first mixing module; at least one fourth control valve element disposed in the second flow pipe element for controlling the flow through the second flow pipe element; and / or the first mixing module comprises: a first mixing element in communication with the first flow control module, the second flow control module, the first concentration analysis module, the first gas output module and the second mixing module respectively for mixing the first gas and the second gas to obtain the first mixed gas; a fifth control valve element disposed in the first mixing element for controlling the flow through the first mixing element; and / or the first concentration analysis module comprises: a first concentration pipe element in communication with the first mixing module and the first gas output module respectively for delivering the first mixed gas; a first concentration analysis element in communication with the first concentration pipe element for detecting the concentration of the first mixed gas; a sixth control valve element disposed in the first concentration pipe element for controlling the flow through the first concentration pipe element; and / or the second mixing module comprises: a plurality of second mixing elements connected in series with each other, and any one of the second mixing elements on the two sides is in communication with the first mixing module and the other second mixing element is in communication with the first gas output module, and located downstream of the first mixing module and upstream of the first gas output module, for fine mixing the first mixed gas to obtain the second mixed gas; a plurality of seventh control valve elements disposed in the corresponding second mixing elements respectively for controlling the flow through the second mixing elements; and / or the second concentration analysis module comprises: a second concentration pipe element in communication with the first gas output module and the second gas output module respectively for delivering the second mixed gas; a second concentration analysis element in communication with the second concentration pipe element for detecting the concentration of the second mixed gas; an eighth control valve element disposed in the second concentration pipe element for controlling the flow through the second concentration pipe element; and / or the first gas output module comprises: a first gas output element, which is in communication with the first gas mixing module, the first concentration analyzing module, the second gas mixing module, and the second concentration analyzing module respectively, and is configured to deliver the first mixed gas and the second mixed gas; a ninth control valve element, which is arranged in the first gas output element and is configured to control the flow of the first gas output element; at least one second gas output element, which is in communication with the first gas output element and the process equipment respectively, and is configured to deliver the second mixed gas to the process equipment; at least one tenth control valve element, which is arranged in the second gas output element and is configured to control the flow of the second gas output element; and / or the second gas output module comprises: a third gas output element, which is in communication with the first gas output module and is configured to deliver the exhaust gas; an eleventh control valve element, which is arranged in the second gas output element and is configured to control the flow of the second gas output element; at least one fourth gas output element, which is in communication with the third gas output element and the exhaust gas treatment equipment respectively, and is configured to deliver the exhaust gas; at least one twelfth control valve element, which is arranged in the fourth gas output element and is configured to control the flow of the fourth gas output element.

3. The mixing system of claim 2, wherein, The first gas input module further comprises: a first pressure regulating element, which is arranged in the first gas input element and is configured to regulate the gas pressure inside the first gas input element; a first pressure monitoring element, which is in communication with the first gas input element and is configured to monitor the gas pressure upstream and downstream of the first pressure regulating element; and / or The first gas input module further comprises: a second pressure monitoring element, which is in communication with the first gas input element and is located downstream of the first control valve element, and is configured to monitor the gas pressure inside the first gas input element; and / or The second gas input module further comprises: a second pressure regulating element, which is arranged in the second gas input element and is configured to regulate the gas pressure inside the second gas input element; a third pressure monitoring element, which is in communication with the second gas input element and is configured to monitor the gas pressure upstream and downstream of the second pressure regulating element; and / or The second gas input module further comprises: a fourth pressure monitoring element, which is in communication with the second gas input element and is located downstream of the second control valve element, and is configured to monitor the gas pressure inside the second gas input element; and / or The first concentration analyzing module further comprises: a third pressure regulating element, which is arranged in the first concentration pipeline element and is configured to regulate the gas pressure inside the first concentration pipeline element; a fifth pressure monitoring element, which is in communication with the first concentration pipeline element and is configured to monitor the gas pressure inside the first concentration pipeline element; and / or The second concentration analyzing module further comprises: a fourth pressure regulating element disposed in the second concentration pipeline element for regulating the pressure inside the second concentration pipeline element; a sixth pressure monitoring element in communication with the second concentration pipeline element for monitoring the pressure inside the second concentration pipeline element; and / or the first gas output module further comprises: a fifth pressure regulating element disposed in the first gas output element for regulating the pressure inside the first gas output element; a seventh pressure monitoring element in communication with the first gas output element for monitoring the pressure upstream and downstream of the fifth pressure regulating element.

4. The mixing system of claim 2, wherein, the first gas output module further comprises: a first flow monitoring element disposed in the first gas output element for detecting the flow inside the first gas output element; at least one second flow monitoring element disposed in the corresponding second gas output element for detecting the flow inside the second gas output element.

5. The system for mixing a plurality of high flow gases of any of claims 1-3, wherein, the first gas input module is in communication with the first concentration analysis module for delivering the first gas to the first concentration analysis module for zero gas calibration of the first concentration analysis module; the first gas input module is in communication with the second concentration analysis module for delivering the first gas to the second concentration analysis module for zero gas calibration of the second concentration analysis module; a third gas input module in communication with a standard gas source, the first concentration analysis module, and the second concentration analysis module for standard gas calibration of the first concentration analysis module and the second concentration analysis module. the first gas input module further comprises:

6. The mixing system of claim 5, wherein, a third gas input element in communication with the first gas input unit for delivering the first gas; a thirteenth control valve element disposed in the third gas input element for controlling the flow of the third gas input element; a fourth gas input element in communication with the third gas input element and the first concentration analysis module for delivering the first gas to the first concentration analysis module for zero gas calibration of the first concentration analysis module; a fourteenth control valve element disposed in the fourth gas input element for controlling the flow of the fourth gas input element; a fifth gas input element in communication with the third gas input element and the second concentration analysis module for delivering the first gas to the second concentration analysis module for zero gas calibration of the second concentration analysis module; a fifteenth control valve element disposed in the fifth gas input element for controlling the flow of the fifth gas input element; and / or the third gas input module comprises: ​ a sixth gas input element in communication with a standard gas source, the first concentration analysis module, and the second concentration analysis module, for delivering standard gas to the first concentration analysis module and the second concentration analysis module to calibrate the second concentration analysis module with standard gas; a sixteenth control valve element disposed in the sixth gas input element, for controlling the flow of the sixth gas input element; 7. The mixing system of any of claims 1-3, wherein Further comprising: a purge module in communication with the second gas input module and the second gas output module, for purging the overall pipeline and equipment; and / or a pressure relief module in communication with the first gas mixing module, the second gas mixing module, and the second gas output module, for pressure relief; and / or a pressure protection module in communication with the first gas output module, the second gas output module, the first gas mixing module, and the second gas mixing module, for protecting the pipeline; and / or a standby mixed gas supply module in communication with the first gas output module, for delivering gas to the process equipment.

8. The mixing system of claim 7, wherein, The purge module comprises: a first purge pipeline element in communication with a purge gas source and the second gas input module, for delivering purge gas; a seventeenth control valve element disposed in the first purge pipeline element, for controlling the flow of the first purge pipeline element; a second purge pipeline element in communication with the second gas input module and the first gas mixing module, for delivering purge gas; an eighteenth control valve element disposed in the second purge pipeline element, for controlling the flow of the second purge pipeline element; a third purge pipeline element in communication with the first gas mixing module and the second gas output module, for delivering purge gas; a nineteenth control valve element disposed in the third purge pipeline element, for controlling the flow of the third purge pipeline element; a vacuum pipeline element in communication with the second gas output module and a waste gas treatment device, for delivering waste gas; a twentieth control valve element disposed in the vacuum pipeline element, for controlling the flow of the vacuum pipeline element; a vacuum element disposed in the vacuum pipeline element, for forming a vacuum negative pressure at the end of the second gas input module; a power gas supply pipeline element in communication with the vacuum element and a power gas source, for delivering the power gas source; a twenty-first control valve element disposed in the power supply pipeline element, for controlling the flow of the power gas supply pipeline element; and / or The pressure relief module comprises: a first pressure relief pipeline element in communication with the first gas output module and the second gas output module; A first pressure relief valve element is arranged in the first pressure relief pipeline element, and is configured to be opened and release pressure when the pressure inside the first pressure relief pipeline element exceeds a preset pressure threshold; A plurality of second pressure relief pipeline elements are respectively in communication with the second gas mixing module and the second gas output module; A plurality of second pressure relief valve elements are respectively arranged in the corresponding second pressure relief pipeline elements, and are configured to be opened and release pressure when the pressure inside the second pressure relief pipeline elements exceeds a preset pressure threshold; and / or The pressure protection module comprises: A pressure protection pipeline element is in communication with the first gas output module and the second gas output module, and the communication position of the pressure protection pipeline element with the first gas output module is between the second gas mixing module and the second concentration analysis module, and is configured to transport gas; A twenty-second control valve element is arranged in the pressure protection pipeline element, and is configured to control the flow of the pressure protection pipeline element; A first protection element is arranged in the pressure protection pipeline element and is located downstream of the twenty-second control valve element, and is configured to be opened when the gas flow in the pipeline is too large; A second protection element is arranged in the pressure protection pipeline element and is located downstream of the first protection element, and is configured to be opened when the gas pressure in the pipeline is too large; and / or The backup mixed gas supply module comprises: A backup gas supply pipeline element is in communication with a backup gas source and the first gas output module, and is configured to transport mixed gas to a process equipment; A twenty-third control valve element is arranged in the backup gas supply pipeline element, and is configured to control the flow of the backup gas supply pipeline element.

9. The mixing system of claim 8, wherein, The pressure protection module further comprises: An eighth pressure monitoring element is in communication with the pressure protection pipeline element and is located downstream of the second protection element, and is configured to monitor the gas pressure inside the pressure protection pipeline element; and / or The backup mixed gas supply module further comprises: A ninth pressure monitoring element is in communication with the backup gas supply pipeline element, and is configured to monitor the gas pressure inside the backup gas supply pipeline element; A third flow monitoring element is arranged in the backup gas supply pipeline element, and is configured to detect the flow inside the backup gas supply pipeline element.

10. A semiconductor process apparatus characterized by comprising: The mixed system comprises: The mixed system according to any one of claims 1-9.