Wet preparation device, wet preparation system and solar cell manufacturing production line

Abstract

The application relates to a wet preparation device, a wet preparation system and a solar cell manufacturing production line. The wet preparation device comprises a wet machine table having a preparation tank, an inlet and outlet opening communicated with the preparation tank and used for feeding and discharging the cell piece on the top surface of the wet machine table, and two cover plates arranged along the width direction of the wet machine table and connected with the wet machine table, the two cover plates are matched and used for jointly opening or closing the inlet and outlet opening, the top surface of the cover plate is configured to gradually descend along the width direction of the wet machine table and from the center of the wet machine table to the edge direction of the wet machine table when the cover plate closes the inlet and outlet opening, and a flow channel for circulating hot water is formed in the cover plate. The wet preparation device, the wet preparation system and the solar cell manufacturing production line provided by the application can reduce the formation of crystals.

Description

Technical Field

[0001] This application relates to the field of solar cell technology, specifically to a wet preparation apparatus, a wet preparation system, and a solar cell manufacturing production line. Background Technology

[0002] Wet fabrication is a crucial step in solar cell manufacturing. In this process, the cleanliness of the fabrication tank within the wet processing equipment is paramount. Contamination of the chemical solutions within the tank directly impacts cell yield and production efficiency.

[0003] During long-term production processes, chemical residues can easily accumulate on the cover of the preparation tank and form crystals. As the cover is opened and closed, the crystals on the cover can fall into the preparation tank and contaminate the chemical solution inside. Utility Model Content

[0004] Therefore, it is necessary to provide a wet preparation apparatus, a wet preparation system, and a solar cell manufacturing production line that can reduce the formation of crystals, in order to address the above problems.

[0005] A wet preparation apparatus, the wet preparation apparatus comprising: A wet processing machine, which includes a preparation tank and has an inlet / outlet on its top surface that communicates with the preparation tank and is used for the entry and exit of solar cells; and Two cover plates are arranged along the width direction of the wet processing machine, and both cover plates are connected to the wet processing machine. The two cover plates cooperate to open or close the inlet and outlet together. The top surface of the cover plate is configured to gradually descend along the width direction of the wet processing machine and from the center of the wet processing machine to the edge of the wet processing machine when the cover plate closes the inlet and outlet. The cover plate has a hollow interior forming a flow channel for hot water circulation.

[0006] In some embodiments, the outer surface of the cover plate is covered with an insulating coating.

[0007] In some embodiments, the wet process preparation apparatus further includes two rinsing pipes, which are respectively disposed at the two ends of the two cover plates that are close to each other along the width direction of the wet process machine. The rinsing pipes have a plurality of water outlets arranged sequentially along the length direction of the wet process machine, and the water outlets face the top surface of the cover plates.

[0008] In some embodiments, the wet process preparation apparatus further includes two sludge collection components located in the preparation tank and disposed at opposite ends of the wet process machine along the width direction of the wet process machine. The sludge collection components are recessed to form a sludge collection tank, and a sludge discharge port communicating with the sludge collection tank is provided on the sludge collection component. The cover plate corresponds one-to-one with the sludge collection component, and the cover plate is rotatably installed on the corresponding sludge collection component. The wet preparation apparatus also includes two drain pipes, each corresponding to a drain outlet. The drain pipes are connected to the corresponding drain outlets and communicate with them.

[0009] In some embodiments, the walls of the sludge collection tank are coated with a hydrophobic coating.

[0010] In some embodiments, the wet preparation apparatus further includes two baffles, which are respectively disposed on the two cover plates and respectively block the two rinsing pipes on the sides that are close to each other and / or the top sides of the two rinsing pipes. In the height direction of the wet rinsing machine, the projection of the baffle plate onto the corresponding cover plate completely covers the projection of the rinsing pipe.

[0011] In some embodiments, the baffle plate includes a first portion and a second portion bent relative to the first portion, the first portions of both baffle plates being located between the two flushing pipes, and the second portions of both baffle plates being located on the top side of the two flushing pipes and extending backward along the width direction of the wet processing machine.

[0012] In some embodiments, the cover plate is further provided with a connecting pipe and a control valve. The connecting pipe is connected between the flushing pipe and the flow channel, and the control valve is connected to the connecting pipe and is used to open and close the connecting pipe.

[0013] A wet preparation system comprising the wet preparation apparatus as described in any of the above embodiments.

[0014] A solar cell manufacturing production line includes a wet preparation system as described in the above embodiments.

[0015] Compared with the prior art, this application has the following beneficial effects: In the aforementioned wet process preparation apparatus, wet process preparation system, and solar cell manufacturing production line, a hollow cover plate forms a flow channel for circulating hot water. The hot water heats the chemicals through heat transfer, preventing crystallization. The heated chemicals retain some fluidity, and the top surface of the cover plate is configured to gradually descend along the width of the wet process machine from its center to its edge when the inlet and outlet are closed. Therefore, the fluid chemicals can also slide down the downward slope of the top surface and eventually fall off the cover plate. This design reduces the risk of chemicals forming crystals on the cover plate and falling into the preparation tank, thus preventing crystal contamination of the chemical solution in the preparation tank. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the wet preparation apparatus in one embodiment of this application; Figure 2 for Figure 1 An enlarged schematic diagram of a local structure A in the wet preparation apparatus shown; Figure 3 for Figure 1 A schematic diagram of the structure of the wet process preparation apparatus and the sludge collection unit shown; Figure 4 This is a schematic diagram of a cover plate coated with a thermal insulation coating in one embodiment of this application; Figure 5 for Figure 4 The enlarged schematic diagram shows a portion of structure D on the cover plate coated with an insulating coating.

[0017] Icon labels: 100. Wet preparation apparatus; 10. Wet process machine; 20. Cover plate; 30. Flushing pipe; 40. Sludge collection device; 50. Baffle plate; 11. Inlet and outlet; 12. Preparation tank; 21. Thermal insulation coating; 31. Water outlet; 41. Sewage collection tank; 42. Sewage outlet; 51. Part One; 52. Part Two; X represents the width of the wet processing machine 10; Y represents the length of the wet processing machine 10; and Z represents the height of the wet processing machine 10. Detailed Implementation

[0018] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0019] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0020] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0021] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0022] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0023] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0024] Wet fabrication is a crucial step in solar cell manufacturing. In this process, the cleanliness of the fabrication tank within the wet processing equipment is paramount. Contamination of the chemical solutions within the tank directly impacts cell yield and production efficiency.

[0025] During long-term production processes, chemical residues can easily accumulate on the cover of the preparation tank and form crystals. As the cover is opened and closed, the crystals on the cover can fall into the preparation tank and contaminate the chemical solution inside.

[0026] Please see Figures 1 to 5 In view of this, and to address the aforementioned problems, the applicant, after in-depth research, designed a wet preparation apparatus 100, which includes a wet processing platform 10 and two cover plates 20. The wet processing platform 10 has a preparation tank 12, and the top surface of the wet processing platform 10 (specifically as shown in the figure) Figure 3 (Indicated by arrow C) An inlet / outlet 11 is provided, which communicates with the preparation tank 12 and is used for the entry and exit of the battery cells. Two cover plates 20 are arranged along the width direction X of the wet processing machine 10, and both cover plates 20 are connected to the wet processing machine 10. The two cover plates 20 cooperate to open or close the inlet / outlet 11 together. The top surface of the cover plate 20 (specifically as shown in the figure) Figure 1 and Figure 5 The area indicated by the middle arrow B is configured to gradually descend along the width direction X of the wet processing machine 10 and from the center of the wet processing machine 10 to the edge of the wet processing machine 10 when the cover plate 20 closes the inlet and outlet 11; wherein, the cover plate 20 is hollow to form a flow channel for the flow of hot water.

[0027] Specifically, the preparation tank 12 of the wet processing machine 10 contains a chemical solution for wet processing. During actual processing, multiple solar cells are carried in baskets within the preparation tank 12, ensuring sufficient contact between the cells and the chemical solution for wet processing. After processing, the baskets carrying the cells are transferred to the next step. During this transfer, chemicals formed during wet processing and adsorbed on the cells and baskets easily drip onto the top surface of the cover plate 20, forming crystals. Subsequently, with the opening and closing of the cover plate 20, the crystals on the cover plate 20 fall into the preparation tank 12, contaminating the chemical solution within.

[0028] The inlet and outlet 11 on the wet processing machine 10 are used for loading and unloading flower baskets and battery cells.

[0029] Two cover plates 20 are arranged along the width direction X of the wet processing machine 10, and both cover plates 20 are connected to the wet processing machine 10 and are used together to open or close the inlet and outlet 11. Generally speaking, during the wet processing, the two cover plates 20 close the inlet and outlet 11 to prevent external substances from entering the preparation tank 12 and interfering with the wet processing. After the wet processing is completed, the two cover plates 20 are opened, and the basket and the battery cells are removed from the preparation tank 12 through the inlet and outlet 11.

[0030] The cover plate 20 has a hollow interior forming a flow channel for circulating hot water. Both the inlet and outlet of the flow channel are connected to an external hot water source, enabling the hot water to circulate between the source and the flow channel. The hot water heats the chemicals through heat transfer, preventing crystallization. Even after heating, the chemicals retain some fluidity. The top surface of the cover plate 20 is configured to gradually descend along the width X of the wet processing machine 10 from its center to its edge when the inlet / outlet 11 is closed. Therefore, the fluid chemicals can slide down the downward slope of the top surface and eventually fall off the cover plate 20. This design reduces the risk of chemicals crystallizing on the cover plate 20 and falling into the preparation tank 12, thus preventing crystal contamination of the chemical solution in the preparation tank 12.

[0031] Please see Figure 5 Furthermore, in some embodiments, the outer surface of the cover plate 20 is covered with an insulating coating 21.

[0032] As an example, the thermal insulation coating 21 can be, but is not limited to, an epoxy coal tar coating, a polytetrafluoroethylene vinyl coating, a silicon carbide ceramic anti-corrosion coating, or other coatings that are acid and alkali resistant and capable of thermal insulation. The specific type of thermal insulation coating 21 can be set according to requirements and is not limited here.

[0033] By designing the thermal insulation coating 21, the diffusion of heat from hot water inside the cover plate 20 can be reduced, thereby maintaining the temperature of the cover plate 20 and reducing the risk of chemical crystallization on the cover plate 20.

[0034] Please see Figures 1 to 3 In some embodiments, the wet preparation apparatus 100 further includes two rinsing pipes 30, which are respectively arranged at the two ends of the two cover plates 20 close to each other along the width direction X of the wet processing machine 10. The rinsing pipes 30 have a plurality of water outlets 31 arranged sequentially along the length direction Y of the wet processing machine 10, and the water outlets 31 face the top surface of the cover plate 20.

[0035] When the cover plate 20 closes the inlet and outlet 11, the cover plate 20 has a first end and a second end that are arranged opposite to each other along the width direction X of the wet processing machine 10. The height of the top surface of the first end is higher than the height of the top surface of the second end. The two first ends of the two cover plates 20 are arranged close to each other, and the two second ends of the two cover plates 20 are arranged far apart from each other. The two flushing pipes 30 are respectively arranged at the two first ends of the two cover plates 20.

[0036] During solution change, the two cover plates 20 close the inlet and outlet 11 of the wet processing machine 10. The clean water sprayed from the two flushing pipes 30 can flush from high to low along the slope of the top surface of the cover plates 20 to ensure the cleanliness of the top surface of the cover plates 20 and prevent crystallization on the cover plates 20. This reduces the contamination of the chemical solution in the preparation tank 12 and eliminates the need for manual cleaning of crystals, effectively improving cleaning and production efficiency. Moreover, the multiple water outlets 31 on the flushing pipes 30 are arranged sequentially along the length Y of the wet processing machine 10, which allows for comprehensive flushing of the top surface of the cover plates 20, resulting in a good flushing effect.

[0037] In some embodiments, a connecting pipe and a control valve are also provided inside the cover plate 20. The connecting pipe connects the flushing pipe 30 and the flow channel, and the control valve is connected to the connecting pipe and used to open and close the connecting pipe. It is understood that the connecting pipe is located between the inlet and outlet ends of the flow channel. During liquid replacement, the control valve opens, and the hot water in the flow channel flows through the connecting pipe into the flushing pipe 30, and is sprayed out from the outlet 31 of the flushing pipe 30 to flush the cover plate 20. This design allows the flushing pipe 30 and the flow channel within the same cover plate 20 to share the same hot water source, thereby reducing the design of the hot water source and piping, simplifying the structure of the wet preparation apparatus 100, and helping to reduce the manufacturing cost of the wet preparation apparatus 100.

[0038] Please see Figures 1 to 3 In some embodiments, the wet preparation apparatus 100 further includes two sludge collection components 40, which are located in the preparation tank 12 and are disposed at opposite ends of the wet processing machine 10 along the width direction X. The sludge collection components 40 are recessed to form a sludge collection tank 41, and a sludge discharge port 42 communicating with the sludge collection tank 41 is provided on the sludge collection component 40. The cover plate 20 corresponds to the sludge collection component 40 one by one, and the cover plate 20 is rotatably installed on the corresponding sludge collection component 40. The wet preparation apparatus 100 also includes two sludge discharge pipes, which correspond to the sludge discharge ports 42 one by one. The sludge discharge pipes are connected to the corresponding sludge discharge ports 42 and communicate with the sludge discharge ports 42.

[0039] The wastewater collection device 40 is used to collect the wastewater flowing down from the top surface of the corresponding cover plate 20, and to discharge the wastewater through the drain outlet 42 and the drain pipe, thereby reducing the pollution of the workshop environment where the wet preparation device 100 is located by the wastewater.

[0040] It is worth mentioning that when the cover plate 20 is rotatably installed on the dirt collection component 40, both ends of the cover plate 20, which are arranged opposite each other along the length Y of the wet processing machine 10, overlap the top surface of the wet processing machine 10 to improve the stability of the cover plate 20 rotation.

[0041] In some embodiments, the walls of the sludge collection tank 41 are coated with a hydrophobic coating.

[0042] As an example, hydrophobic coatings can be, but are not limited to, acid and alkali resistant hydrophobic coatings such as fluorocarbon coatings and nano-coatings based on materials such as silica.

[0043] The hydrophobic coating design reduces the adhesion of sewage, allowing sewage to be quickly discharged through the collection tank 41.

[0044] Please see Figure 1 and Figure 2 In some embodiments, the wet preparation apparatus 100 further includes two baffle plates 50, which are respectively disposed on two cover plates 20, and the two baffle plates 50 respectively block the two rinsing pipes 30 on the sides that are close to each other and / or the top side of the two rinsing pipes 30; in the height direction Z of the wet processing machine 10, the projection of the baffle plate 50 on the corresponding cover plate 20 completely covers the projection of the rinsing pipe 30.

[0045] Specifically, the two baffles 50 are located between the two flushing pipes 30, and the two baffles 50 respectively block the two flushing pipes 30 on the sides and / or the top sides of the two flushing pipes 30 that are close to each other. Preferably, the two baffles 50 respectively block the two flushing pipes 30 on the sides and the top sides of the two flushing pipes 30 that are close to each other.

[0046] The two flushing pipes 30 are typically flushed when the two cover plates 20 close the inlet and outlet 11 of the wet processing machine 10. The two baffle plates 50 are respectively positioned on the two sides of the two flushing pipes 30 that are close to each other, which can reduce the risk of flushing wastewater falling into the preparation tank 12 through the gap formed between the two cover plates 20, thereby reducing the interference of wastewater with the chemical solution in the preparation tank 12.

[0047] The two baffles 50 block the top sides of the two flushing pipes 30 respectively, which can also reduce the risk of splashed sewage falling into the preparation tank 12, thereby further improving the reliability of wet preparation.

[0048] Furthermore, in some embodiments, the baffle plate 50 includes a first portion 51 and a second portion 52 bent relative to the first portion 51. The first portions 51 of the two baffle plates 50 are both located between the two flushing pipes 30, and the second portions 52 of the two baffle plates 50 are respectively located on the top side of the two flushing pipes 30 and extend backward along the width direction X of the wet processing machine 10.

[0049] That is, the baffle plate 50 is L-shaped or roughly L-shaped.

[0050] The baffle plate 50 of this structure has a good blocking effect on the flushing sewage, which helps to reduce the risk of sewage falling into the preparation tank 12 through the gap between the two cover plates 20.

[0051] This application also relates to a wet preparation system, which includes the wet preparation apparatus 100 as described in any of the above embodiments. The wet preparation apparatus 100 has the effects of any of the above embodiments, and therefore will not be described again here.

[0052] This application also relates to a solar cell manufacturing production line, which includes the wet preparation system as described in the above embodiments. The solar cell manufacturing production line of this application has the effects of the aforementioned wet preparation system, and therefore will not be described again here.

[0053] In the aforementioned wet process preparation apparatus 100, wet process preparation system, and solar cell manufacturing production line, the cover plate 20 has a hollow interior with a flow channel for circulating hot water. The hot water heats the chemicals through heat transfer, preventing crystallization. The heated chemicals retain some fluidity, and the top surface of the cover plate 20 is configured to gradually descend along the width X of the wet process machine 10 from its center to its edge when the inlet / outlet 11 is closed. Therefore, the fluid chemicals can also slide down the downward slope of the top surface and eventually fall off the cover plate 20. This design reduces the risk of chemicals forming crystals on the cover plate 20 and falling into the preparation tank 12, thus preventing crystal contamination of the chemical solution in the preparation tank 12.

[0054] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0055] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A wet preparation apparatus, characterized in that, The wet preparation apparatus includes: A wet processing machine (10) having a preparation tank (12) inside, and an inlet / outlet (11) on its top surface communicating with the preparation tank (12) and used for the entry and exit of battery cells; and Two cover plates (20) are arranged along the width direction (X) of the wet processing machine (10), and both cover plates (20) are connected to the wet processing machine (10). The two cover plates (20) cooperate to open or close the inlet and outlet (11) together. The top surface of the cover plate (20) is configured to gradually descend along the width direction (X) of the wet processing machine (10) and from the center of the wet processing machine (10) to the edge of the wet processing machine (10) when the cover plate (20) closes the inlet and outlet (11). The cover plate (20) is hollow to form a flow channel for hot water circulation.

2. The wet preparation apparatus according to claim 1, characterized in that, The outer surface of the cover plate (20) is covered with a thermal insulation coating (21).

3. The wet preparation apparatus according to claim 1, characterized in that, The wet process preparation apparatus further includes two rinsing pipes (30). The two rinsing pipes (30) are respectively arranged at the two ends of the two cover plates (20) close to each other along the width direction (X) of the wet process machine (10). The rinsing pipes (30) have a plurality of water outlets (31) arranged sequentially along the length direction (Y) of the wet process machine (10). The water outlets (31) face the top surface of the cover plate (20).

4. The wet preparation apparatus according to claim 3, characterized in that, The wet process preparation apparatus further includes two collection components (40). The two collection components (40) are located in the preparation tank (12) and are arranged at opposite ends of the wet process machine (10) along the width direction (X). The collection components (40) are recessed to form a collection tank (41), and the collection components (40) are provided with a drain port (42) communicating with the collection tank (41). The cover plate (20) corresponds to the collection components (40) one by one, and the cover plate (20) is rotatably installed on the corresponding collection component (40). The wet preparation device also includes two drain pipes, each drain pipe corresponding to a drain outlet (42). The drain pipes are connected to the corresponding drain outlets (42) and communicate with the drain outlets (42).

5. The wet preparation apparatus according to claim 4, characterized in that, The walls of the sludge collection tank (41) are covered with a hydrophobic coating.

6. The wet preparation apparatus according to claim 3, characterized in that, The wet preparation apparatus further includes two baffle plates (50), which are respectively disposed on the two cover plates (20), and the two baffle plates (50) respectively block the two rinsing pipes (30) on the sides that are close to each other and / or the top side of the two rinsing pipes (30); In the height direction (Z) of the wet processing machine (10), the projection of the baffle plate (50) on the corresponding cover plate (20) completely covers the projection of the flushing pipe (30).

7. The wet preparation apparatus according to claim 6, characterized in that, The baffle (50) includes a first part (51) and a second part (52) bent relative to the first part (51). The first parts (51) of both baffles (50) are located between the two flushing pipes (30), and the second parts (52) of both baffles (50) are located on the top side of the two flushing pipes (30) and extend backward along the width direction (X) of the wet processing machine (10).

8. The wet preparation apparatus according to claim 3, characterized in that, The cover plate (20) is also provided with a connecting pipe and a control valve. The connecting pipe is connected between the flushing pipe (30) and the flow channel. The control valve is connected to the connecting pipe and is used to open and close the connecting pipe.

9. A wet preparation system, characterized in that, Includes the wet preparation apparatus as described in any one of claims 1 to 8 above.

10. A solar cell manufacturing production line, characterized in that, Includes the wet preparation system as described in claim 9 above.

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