A polishing liquid recovery device

CN224738065UActive Publication Date: 2026-09-11SUZHOU SEMI PRECISION TECH CO LTD
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Patent Information

Application Number
CN202522137941.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-10-10
Publication Date
2026-09-11
Estimated Expiration
2035-10-10

AI Technical Summary

Technical Problem

[0006]本实用新型的目的在于提供一种抛光液回收装置,解决了背景技术中现如今的抛光液回收存在占地空间大、碎屑难以清理、软管易损坏和回收敞开易受到污染的问题

Benefits of technology

1、本实用新型提供的一种抛光液回收装置,通过回收装置隔离框体对于过滤机构和回收泵机构的包围设置,过滤机构上端的回收装置隔离框体螺丝固定可拆卸,防止回收液受到污染,回转摆动接液框替换了传统的三通球阀,将回收接液机构的接口高度控制在合理范围内,满足后续空间设计需求,光电传感器用于反馈气缸的动作情况,避免气缸动作不执行,直排槽和回收槽分别用于承接回转摆动接液框输出的回收液,并排设置节省空间,解决了现如今的抛光液回收存在占地空间大,回收敞开易受到污染的问题。

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Abstract

The utility model discloses a kind of polishing liquid recovery devices, it is related to chemical mechanical polishing technical field, including recovery device isolation frame, the recovery device isolation frame is connected with recovery liquid receiving mechanism in one side, the inside of the recovery device isolation frame is provided with filter mechanism, the one side of the filter mechanism is connected with recovery pump mechanism, the utility model solves the problem that the polishing liquid recovery exists large floor space, debris is difficult to clean, hose is easily damaged and recovery is open and is easily contaminated today, the utility model is surrounded by recovery device isolation frame to the setting of filter mechanism and recovery pump mechanism, prevent recovery liquid from being contaminated, rotary swing liquid receiving frame replaces traditional tee ball valve, direct discharge groove and recovery groove are used for respectively receiving recovery liquid, and save space by side arrangement, by the setting of filter mechanism, filter box inside recovery groove realizes front-end filtration, avoid the fragment produced by polishing machine to damage recovery pump mechanism or block pipeline.
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Description

Technical Field

[0001] This utility model relates to the field of chemical mechanical polishing technology, specifically a polishing slurry recovery device. Background Technology

[0002] To save on polishing slurry costs, some chemical mechanical polishing processes require the slurry to be recycled and reused. However, there are media that cannot be recycled and need to be directly discharged during the process. Therefore, a device is needed to separate the media that need to be recycled and those that cannot be recycled according to the polishing process instructions for recycling or direct discharge.

[0003] Currently, there are two methods for recycling polishing slurry: 1. The polishing machine's drain pipe is equipped with a three-way valve. The drain is divided into recovery or direct discharge by program commands and electrical control of the three-way valve. The problems are as follows: First, due to the structure of the three-way valve, either one outlet is lower, resulting in insufficient height space for the subsequent recovery device to be connected; or the rotation direction of the three-way valve increases the space occupied by the recovery device to ensure correct connection. Second, debris may be generated during polishing. This debris will flow into the drain pipe and the three-way valve. If the debris comes into contact with the valve diaphragm or ball, it will cause damage to the valve. Moreover, due to the presence of the valve, it is extremely difficult to completely clean the debris from the polishing machine's drain pipe.

[0004] 2. A flexible hose is installed at the outlet of the polishing machine's drain pipe. The hose's characteristics are used to swing the end to the recovery or drain port via a cylinder or other mechanical mechanism. The problems are as follows: the hose material does not meet the process requirements and is easily damaged after long-term use. Also, because the hose outlet needs to swing back and forth, the liquid inlet of the recovery device is usually open, which can easily cause 5S failure in the workshop environment. The polishing fluid is also more susceptible to the influence of external environmental particles.

[0005] To address the aforementioned problems, a polishing slurry recovery device is proposed. Utility Model Content

[0006] The purpose of this invention is to provide a polishing slurry recovery device that solves the problems of large footprint, difficulty in cleaning debris, easy damage to hoses, and easy contamination when the recovery process is open in the background.

[0007] To achieve the above objectives, this utility model provides the following technical solution: a polishing slurry recovery device, comprising a recovery device isolation frame, a recovery receiving mechanism for rotating discharge connected to one side of the recovery device isolation frame, a filter mechanism for filtering impurities disposed inside the recovery device isolation frame, a recovery pump mechanism connected to one side of the filter mechanism, the filter mechanism being disposed at the output end of the recovery receiving mechanism, the recovery device isolation frame surrounding the filter mechanism and the recovery pump mechanism, the recovery device isolation frame including a photoelectric sensor disposed at the lower end of the rotating swing receiving frame, the recovery receiving mechanism including a rotatable rotating swing receiving frame, the filter mechanism including a straight discharge trough and a recovery trough disposed side-by-side at the output end of the rotating swing receiving frame, a filter box disposed inside the recovery trough, the recovery pump mechanism being connected to one side of the recovery trough, a bypass pipe connected to one side of the recovery trough, and a built-in capacitive sensor in the bypass pipe.

[0008] Preferably, the liquid collection mechanism includes a rotary cylinder fixed inside the isolation frame of the recovery device, and the output end of the rotary cylinder is connected to the rotary swing liquid collection frame.

[0009] Preferably, a liquid receiving pipe is provided at the upper end of the rotary swing liquid receiving frame, and a liquid lowering trough is provided at the lower end of one side of the rotary swing liquid receiving frame.

[0010] Preferably, the output end of the straight discharge tank is connected to a drain connector.

[0011] Preferably, the output end of the recycling tank is connected to a T-junction pipe, and the bypass pipe is connected to one side of the T-junction pipe.

[0012] Preferably, the output end of the three-way pipe is connected to a pump connector, which is connected to a recovery pump mechanism.

[0013] Preferably, the filter box is placed in the recycling tank, the interior of the filter box is set with a sloping bottom, and a filter plate is horizontally placed in the filter box.

[0014] Preferably, the recycling pump mechanism includes a diaphragm pump connected to one side of the pump connector and a recycling connector fixed to the output end of the diaphragm pump.

[0015] Compared with the prior art, the beneficial effects of this utility model are as follows: 1. This utility model provides a polishing slurry recovery device. The recovery device isolation frame surrounds the filtration mechanism and the recovery pump mechanism. The isolation frame at the upper end of the filtration mechanism is screwed and removable to prevent the recovery slurry from being contaminated. The rotary swing receiving frame replaces the traditional three-way ball valve, controlling the interface height of the recovery receiving mechanism within a reasonable range to meet subsequent space design requirements. The photoelectric sensor is used to provide feedback on the cylinder's operation to prevent the cylinder from malfunctioning. The direct discharge tank and the recovery tank are used to receive the recovery slurry output from the rotary swing receiving frame, and their side-by-side arrangement saves space. This solves the problems of large footprint and open recovery that are easily contaminated in current polishing slurry recovery methods.

[0016] 2. The polishing liquid recovery device provided by this utility model, through the setting of the filtration mechanism, facilitates the selection of the treatment method for the recovered liquid. The filter box inside the recovery tank achieves front-end filtration, avoiding damage to the recovery pump mechanism or blockage of the pipeline by the debris generated by the polishing machine. The built-in capacitive sensor in the bypass pipe can effectively overcome the false signal problems and liquid level detection height problems caused by air bubbles and scale in the polishing liquid. It can effectively reduce sensor error signals, reduce the ineffective operation and dry pumping of the recovery pump mechanism, thus extending the machine life and solving the current problems of difficult cleaning of polishing liquid debris and easy damage to hoses. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the overall structure of this utility model; Figure 2 This is a schematic diagram of the isolation frame and the liquid receiving mechanism of the recycling device of this utility model; Figure 3 This is a schematic diagram of the filter mechanism of this utility model; Figure 4 This is a schematic diagram of the structure of the filtration mechanism and the recovery pump mechanism of this utility model; Figure 5 This is a schematic diagram showing the disassembled structure of the filtration mechanism of this utility model; Figure 6 This is a schematic diagram of the structure of the rotary swing liquid receiving frame of this utility model; Figure 7 This is a schematic diagram of the filter mechanism of this utility model.

[0018] In the diagram: 1. Isolation frame of the recovery device; 11. Photoelectric sensor; 2. Recovery liquid receiving mechanism; 21. Rotary cylinder; 22. Rotary swing liquid receiving frame; 221. Liquid receiving pipe; 222. Liquid lower tank; 3. Filtration mechanism; 31. Straight discharge tank; 311. Liquid discharge connector; 32. Recovery tank; 321. T-connector; 322. Bypass pipe; 323. Pump connection pipe; 33. Filter box; 331. Sloping bottom; 332. Filter plate; 4. Recovery pump mechanism; 41. Diaphragm pump; 42. Recovery connector. Detailed Implementation

[0019] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0020] To further understand the content of this utility model, a detailed description of this utility model will be provided in conjunction with the accompanying drawings.

[0021] Combination Figure 1 This utility model discloses a polishing liquid recovery device, comprising a recovery device isolation frame 1, a recovery receiving mechanism 2 for rotating discharge connected to one side of the recovery device isolation frame 1, a filter mechanism 3 for filtering impurities disposed inside the recovery device isolation frame 1, a recovery pump mechanism 4 connected to one side of the filter mechanism 3, the filter mechanism 3 being disposed at the output end of the recovery receiving mechanism 2, the recovery device isolation frame 1 surrounding the filter mechanism 3 and the recovery pump mechanism 4, the recovery device isolation frame 1 including a photoelectric sensor 11 disposed at the lower end of a rotary swing receiving frame 22, the recovery receiving mechanism 2 including a rotatable rotary swing receiving frame 22, the filter mechanism 3 including a straight discharge trough 31 and a recovery trough 32 disposed side by side at the output end of the rotary swing receiving frame 22, a filter box 33 disposed inside the recovery trough 32, the recovery pump mechanism 4 being connected to one side of the recovery trough 32, a bypass pipe 322 being connected to one side of the recovery trough 32, and a built-in capacitive sensor in the bypass pipe 322.

[0022] Specifically, the isolation frame 1 of the recovery device surrounds the filter mechanism 3 and the recovery pump mechanism 4, and the isolation frame 1 of the recovery device at the upper end of the filter mechanism 3 is screwed and removable to prevent the recovery liquid from being contaminated. The rotary swing receiving frame 22 replaces the traditional three-way ball valve, controlling the interface height of the recovery receiving mechanism 2 within a reasonable range to meet the subsequent space design requirements. The photoelectric sensor 11 is used to provide feedback on the cylinder's action to prevent the cylinder from malfunctioning. The direct discharge tank 31 and the recovery tank 32 are used to receive the recovery liquid output by the rotary swing receiving frame 22, respectively. Their side-by-side arrangement saves space and facilitates the selection of the treatment method for the recovery liquid. The filter box 33 inside the recovery tank 32 performs front-end filtration to prevent debris generated by the polishing machine from damaging the recovery pump mechanism 4 or clogging the pipeline. The built-in capacitive sensor in the bypass pipe 322 can effectively overcome the false signal problems and liquid level detection height problems caused by bubbles and scale in the polishing liquid. It can effectively reduce sensor error signals, reduce the ineffective operation and dry pumping of the recovery pump mechanism 4, and thus extend the machine's life.

[0023] The present invention will be further described below with reference to the embodiments.

[0024] Example 1: Combination Figures 2-6 The liquid receiving mechanism 2 includes a rotary cylinder 21 fixed inside the isolation frame 1 of the recovery device. The output end of the rotary cylinder 21 is connected to the rotary swing liquid receiving frame 22. The rotary cylinder 21 controls the rotary swing liquid receiving frame 22 to rotate. The rotary swing liquid receiving frame 22 can rotate to be aligned with the straight discharge tank 31 and the recovery tank 32 respectively.

[0025] A liquid receiving pipe 221 is provided at the upper end of the rotary swing liquid receiving frame 22, and a liquid trough 222 is provided at the lower end of one side of the rotary swing liquid receiving frame 22. The liquid receiving pipe 221 is aligned with the output end of the polishing machine's recovery liquid. The liquid receiving pipe 221 is perpendicular and collinear with the center of the rotary cylinder 21, so that the position of the liquid receiving pipe 221 remains unchanged when the rotary swing liquid receiving frame 22 rotates. The liquid trough 222 discharges the recovery liquid downwards. The cooperation between the recovery liquid receiving mechanism 2 and the filtration mechanism 3 solves the problem of limited space, and at the same time meets the functions of recovery and direct discharge. The pipelines and devices are easy to clean, not easy to be damaged, and have a long service life.

[0026] Example 2: Combination Figures 4-7 The output end of the straight discharge tank 31 is connected to a drain connector 311. The drain connector 311 has a large diameter, which can prevent impurities from clogging the tank and increase the draining efficiency.

[0027] The output end of the recovery tank 32 is connected to a three-way pipe 321, and a bypass pipe 322 is connected to one side of the three-way pipe 321. The three-way pipe 321 is set so that the recovery tank 32 is connected to the bypass pipe 322, which makes it convenient for the built-in capacitive sensor of the bypass pipe 322 to observe the liquid level.

[0028] The output end of the three-way pipe 321 is connected to the pump pipe 323, which is connected to the recovery pump mechanism 4. The pump pipe 323 delivers polishing recovery liquid to the recovery pump mechanism 4.

[0029] The filter box 33 is placed inside the recovery tank 32. The interior of the filter box 33 is set with a sloping bottom 331. A filter plate 332 is horizontally placed in the filter box 33. The filter plate 332 completes the filtration of impurities, and the sloping bottom 331 realizes the centralized discharge of the filtered liquid.

[0030] The recovery pump mechanism 4 includes a diaphragm pump 41 connected to one side of the pump connector 323 and a recovery connector 42 fixed to the output end of the diaphragm pump 41. The diaphragm pump 41 is a positive displacement pump that relies on the reciprocating motion of the elastic diaphragm to realize the transportation of the recovery liquid. It does not contaminate the fluid or damage the transport medium, and transports the recovery liquid from the low-pressure area to the high-pressure area. The recovery connector 42 discharges the recovery liquid outward for collection.

[0031] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0032] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A polishing liquid recovery device comprising a recovery device isolation frame (1), characterized by: The isolation frame (1) of the recycling device is connected to a recycling liquid receiving mechanism (2) for rotating discharge, and a filter mechanism (3) for filtering impurities is provided inside the isolation frame (1) of the recycling device. A recycling pump mechanism (4) is connected to one side of the filter mechanism (3). The filtration mechanism (3) is located at the output end of the recovery receiving mechanism (2). The isolation frame (1) of the recovery device surrounds the filtration mechanism (3) and the recovery pump mechanism (4). The isolation frame (1) of the recovery device includes a photoelectric sensor (11) located at the lower end of the rotary swing receiving frame (22). The recovery receiving mechanism (2) includes a rotatable rotary swing receiving frame (22). The filtration mechanism (3) includes a straight discharge trough (31) and a recovery trough (32) arranged side by side at the output end of the rotary swing receiving frame (22). The recovery trough (32) is equipped with a filter box (33). The recovery pump mechanism (4) is connected to one side of the recovery trough (32). A bypass pipe (322) is connected to one side of the recovery trough (32). The bypass pipe (322) has a built-in capacitive sensor.

2. The polishing solution recovery apparatus of claim 1, wherein: The liquid receiving mechanism (2) includes a rotary cylinder (21) fixed inside the isolation frame (1) of the recovery device, and the output end of the rotary cylinder (21) is connected to the rotary swing liquid receiving frame (22).

3. The polishing solution recovery apparatus of claim 1, wherein: The upper end of the rotary swing liquid receiving frame (22) is provided with a liquid receiving pipe (221), and the lower end of one side of the rotary swing liquid receiving frame (22) is provided with a liquid lowering tank (222).

4. The polishing solution recovery apparatus of claim 1, wherein: The output end of the straight drain tank (31) is connected to a drain connector (311).

5. The polishing solution recovery apparatus of claim 1, wherein: The output end of the recycling tank (32) is connected to a three-way pipe (321), and the bypass pipe (322) is connected to one side of the three-way pipe (321).

6. The polishing solution recovery apparatus of claim 5, wherein: The output end of the three-way pipe (321) is connected to the pump connector (323), which is connected to the recovery pump mechanism (4).

7. The polishing solution recovery apparatus of claim 1, wherein: The filter box (33) is placed in the recycling tank (32), and the interior of the filter box (33) is set with a sloping bottom (331). A filter plate (332) is horizontally placed in the filter box (33).

8. The polishing solution recovery apparatus of claim 6, wherein: The recovery pump mechanism (4) includes a diaphragm pump (41) connected to one side of the pump connector (323) and a recovery connector (42) fixed to the output end of the diaphragm pump (41).