Preparation method for super-hydrophobic glass

Abstract

The present invention relates to a preparation method for super-hydrophobic glass, characterized in that the preparation method comprises two processes: glass surface roughening and surface treatment. A technical route covering chemical etching and nano SiO2 particle suspension spraying is used; a micro / nano structured coating is constructed on a glass surface, and the coating is further fluorinated to achieve super-hydrophobic performance. According to the present invention, a chemical etching liquid is used to carry out chemical etching treatment on the surface of sodium-calcium-silicon glass to obtain a glass surface having different rough structures, and a nano SiO2 coating is applied to the treated surface by spraying, so that the rigid micron-scale rough structures constructed by chemical etching on the glass surface interlace with a structure formed after accumulation of sprayed nanoscale SiO2 particles on the glass surface, thereby endowing the coating with good wear resistance.

Description

A preparation method of super-hydrophobic glass Technical Field

[0001] The invention relates to a glass surface treatment process, in particular to a method for preparing super-hydrophobic glass. Background Art

[0002] Due to their unique non-wetting properties, hydrophobic coatings offer excellent self-cleaning, waterproof, and hygroscopic properties, making them widely used in coating, lubrication, and waterproofing. Super-hydrophobic coatings have broad applications in various areas of life, such as encapsulating glass for solar panels, preventing fogging on glass surfaces in winter, and self-cleaning automotive windshields.

[0003] However, the application of super-hydrophobic coatings in real life is still relatively difficult. The preparation of super-hydrophobic coatings on glass surfaces and their application in life still have problems such as long preparation time, complex preparation process, poor stability, and poor mechanical properties.

[0004] Summary of the Invention

[0005] In order to solve the above problems, the purpose of the present invention is to provide a method for preparing super-hydrophobic glass, which comprises spraying a suspension of nano-SiO2 particles with different agglomeration degrees on an etched glass surface to prepare a coating, and then heat-treating the coating and fluorinating it with PFTS to obtain a super-hydrophobic coating.

[0006] To achieve the above object, the technical solution adopted by the present invention is as follows:

[0007] A method for preparing super-hydrophobic glass, characterized by comprising the following steps:

[0008] 1) Place the glass sample horizontally in a container containing etching solution, place the container in a constant temperature water bath and control the etching solution temperature to 25-85°C. The etching time is 30-80 minutes. Then remove the glass sample, rinse with deionized water and dry it.

[0009] 2) Using the etched glass surface as a substrate, spray the configured nano-SiO2 particle ethanol solution on the glass surface to form a film, and then place the glass sample in a high-temperature furnace for heat treatment;

[0010] 3) The heat-treated glass sample was placed in a n-hexane solution containing perfluorodecyltriethoxysilane for a reaction of 1 to 3 minutes to modify the nano-SiO2 particles and obtain a super-hydrophobic coating after heat treatment.

[0011] On the basis of the above technical solutions, there are the following further technical solutions:

[0012] The etching solution is composed of raw materials in the following mass ratio: ammonium fluoride: ammonium sulfate: oxalic acid: water = 10-15: 2.5-3: 5-9.5: 95-100.

[0013] The preparation of the nano-SiO2 particles comprises the following steps:

[0014] Add 0.15g to 0.35g of cetyltrimethylammonium bromide (CTAB) to a beaker containing 4mL of a mixed solution of 25% NH3·H2O and 80mL of a 95% C2H5OH solution. Place the mixed solution in a constant temperature magnetic stirrer and mix thoroughly. When the CTAB is completely dissolved, remove the solution to obtain a CTAB mixed solution.

[0015] Take 2 mL of tetraethyl orthosilicate (TEOS) and drop it into a beaker containing 80 mL of 95% C2H5OH solution;

[0016] The mixed solution of TEOS and C2H5OH was quickly poured into the beaker of the previously prepared CTAB mixed solution, and stirred evenly with a magnetic stirrer. The mixture was reacted at 40°C for 12 hours. After the reaction was completed, the beaker containing the reaction solution was placed in a drying oven for drying. Finally, nano-SiO2 particles with different agglomeration degrees were obtained, that is, SiO2 particles with different particle size distributions were obtained.

[0017] The nano-SiO2 particle ethanol solution is sprayed on the glass surface to form a film, comprising the following steps: taking 0.15g to 0.35g of nano-SiO2 particles of different agglomeration degrees and placing them in a beaker, adding 30 to 40mL of 95% C2H5OH solution respectively, placing them in an ultrasonic cleaner and stirring for 25 to 35 minutes to obtain a nano-SiO2 particle spray solution;

[0018] The nano-SiO2 particle spraying liquid is sprayed onto the etched surface of the glass sample. After the spraying is completed, the glass sample is placed in a high-temperature furnace and heat-treated at 300-550°C for 30-60 minutes, and then taken out and cooled naturally;

[0019] The glass sample was then placed in a 2% by mass perfluorodecyltriethoxysilane PFTS n-hexane solution for reaction for 1 to 3 minutes, naturally air-dried, and then placed in a high-temperature furnace at 400 to 430° C. for 3 to 5 minutes, taken out, and cooled to room temperature.

[0020] The present invention achieves super-hydrophobicity by depositing nano-SiO2 particles on a chemically etched glass surface. Nano-SiO2 particles have many unique properties, such as improving the aging resistance, strength, UV resistance, and chemical resistance of other materials, and have a wide range of applications. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] FIG1 is a relationship between the number of frictions on sandpaper and the water contact angle of the coating prepared in Example 1;

[0022] FIG2 is a graph showing the relationship between the amount of NH4F added and the roughness and transmittance in Example 2;

[0023] FIG3 is a graph showing the relationship between the amount of (NH4)2SO4 added and the roughness and transmittance in Example 2;

[0024] FIG4 is a graph showing the relationship between the amount of C2H2O4·2H2O added and the roughness and transmittance in Example 2;

[0025] FIG5 is a graph showing the relationship between the amount of H2O added and the roughness and transmittance in Example 2;

[0026] FIG6 shows the effect of etching temperature on glass roughness and transmittance in Example 3;

[0027] FIG7 shows the effect of etching time on glass roughness and transmittance in Example 4;

[0028] FIG8 is the relationship between the number of frictions on sandpaper and the water contact angle of the coating prepared in Comparative Example 1;

[0029] FIG9 shows the relationship between the number of frictions on sandpaper and the water contact angle of the coating prepared in Comparative Example 2.

[0030] Implementation Method

[0031] The present invention will be further described in detail below through specific embodiments. The specific embodiments described herein are only used to illustrate and explain the present invention, but are not used to limit the present invention. Example

[0032] A method for preparing superhydrophobic glass involves preparing an etching solution in a ratio of NH₄F:(NH₄)₂SO₄:C₂H₂O₄·2H₂O:H₂O = 10:2.5:9.5:95, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etching solution. A protective film is applied to the glass surface not to be etched. The etching solution is then precisely controlled to maintain a temperature of 75°C in an electronic thermostatic water bath for 50 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0033] A certain amount of cetyltrimethylammonium bromide (CTAB) is added to a mixed solution of 4mL of 25% NH3·H2O and 80mL of 95% C2H5OH. The mixture is placed in a constant temperature magnetic stirrer and mixed thoroughly. When the CTAB is completely dissolved, the mixture is removed. Separately, 2mL of tetraethyl orthosilicate (TEOS) is dripped into a beaker containing 80mL of 95% C2H5OH solution using a dropper. The mixed solution of TEOS and C2H5OH is quickly poured into the beaker containing the previously prepared CTAB mixed solution and stirred thoroughly with a magnetic stirrer. The mixture is then reacted at 40°C for 12 hours. After the reaction is complete, the beaker containing the fully reacted solution is placed in a drying oven to dry. Finally, nano-SiO2 particles with different degrees of agglomeration, that is, SiO2 particles with different particle size distributions, are obtained.

[0034] 0.3g of nano-SiO2 particles of varying degrees of agglomeration were placed in a beaker, each containing 35mL of a 95% C2H5OH solution. The mixture was then stirred in an ultrasonic cleaner for 30 minutes. The ultrasonically dispersed nano-SiO2 particles were sprayed onto the etched glass surface using an airbrush. After spraying, the glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass was placed in a 2% (by mass) solution of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFTS) in n-hexane for 1 minute, air-dried for 30 minutes, and then placed in a 420°C high-temperature furnace for 3 minutes. The heat treatment was then removed and cooled to room temperature.

[0035] There are many methods for testing the wear resistance of superhydrophobic coatings, such as friction tests, sand impact tests, pencil hardness tests, and tape tests. This patent ultimately uses a sandpaper friction test experiment. The sample is loaded with a 100g weight and abraded on 600-mesh sandpaper. The relationship between different friction times and water contact angle is tested. As shown in Figure 1, the coating has a contact angle of 167.34° before abrasion. After 50 sandpaper friction cycles, the contact angle changes, but basically remains above 156°, indicating that the coating maintains good superhydrophobicity and significantly improves its wear resistance.

[0036] Example 2 (Changing the Etching Solution Ratio)

[0037] A method for preparing superhydrophobic glass involves preparing an etching solution in a ratio of NH₄F:(NH₄)₂SO₄:C₂H₂O₄·2H₂O:H₂O = 15:3:5:100, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etching solution. A protective film is applied to the glass surface not to be etched. The etching solution is then precisely controlled to maintain a temperature of 75°C in an electronic thermostatic water bath for 50 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0038] A certain amount of cetyltrimethylammonium bromide (CTAB) is added to a mixed solution of 4mL of 25% NH3·H2O and 80mL of 95% C2H5OH. The mixture is placed in a constant temperature magnetic stirrer and mixed thoroughly. When the CTAB is completely dissolved, the mixture is removed. Separately, 2mL of tetraethyl orthosilicate (TEOS) is dripped into a beaker containing 80mL of 95% C2H5OH solution using a dropper. The mixed solution of TEOS and C2H5OH is quickly poured into the beaker containing the previously prepared CTAB mixed solution and stirred thoroughly with a magnetic stirrer. The mixture is then reacted at 40°C for 12 hours. After the reaction is complete, the beaker containing the fully reacted solution is placed in a drying oven to dry. Finally, nano-SiO2 particles with different degrees of agglomeration, that is, SiO2 particles with different particle size distributions, are obtained.

[0039] 0.3g of nano-SiO2 particles of varying degrees of agglomeration were placed in a beaker, each containing 35mL of a 95% C2H5OH solution. The mixture was then stirred in an ultrasonic cleaner for 30 minutes. The ultrasonically dispersed nano-SiO2 particles were sprayed onto the etched glass surface using an airbrush. After spraying, the glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass was placed in a 2% (by mass) solution of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFTS) in n-hexane for 1 minute, air-dried for 30 minutes, and then placed in a 420°C furnace for 3 minutes. The heat treatment was then removed and cooled to room temperature.

[0040] Single-factor experiments using transmittance and roughness data determined the composition of various chemical components and investigated the correlation between the glass surface microstructure, the preparation process, and the optical properties of the glass. As shown in Figure 2, as the amount of NH₄F added to the etching solution gradually increased, the roughness and transmittance of the glass initially increased and then decreased. When the amount of NH₄F added reached 10g, the roughness and transmittance of the glass reached their maximum values. Further addition of NH₄F decreased both the roughness and transmittance.

[0041] As shown in Figure 3, the roughness and transmittance of the glass show a more complex development trend as the amount of (NH4)2SO4 added increases; when the amount of (NH4)2SO4 added is 3g, the transmittance is the largest, but the roughness is smaller at this time; when the amount of (NH4)2SO4 added is 4g, the roughness is the largest, but the transmittance is smaller at this time. When the amount of (NH4)2SO4 added is 2g, both the roughness and transmittance are larger, and (NH4)2SO4 can be used as a dispersant to adjust the viscosity of the etching solution formula and can also be used as a dispersant for the etching solution. It has a good etching effect, but the amount added should not be excessive, as excessive addition will reduce the concentration of the effective ingredients. Too much NH4 +It will combine with HF, thereby reducing the concentration of HF, so the amount of (NH4)2SO4 should not be too large. In summary, the amount of (NH4)2SO4 added is initially selected to be 2g.

[0042] As shown in Figure 4, the effect curve of the amount of C2H2O4·2H2O added on the roughness and transmittance shows an overall trend of first decreasing, then increasing, and then decreasing. When the amount of C2H2O4·2H2O reaches 9g, the transmittance and roughness of the sample decrease with the increase of the amount of C2H2O4·2H2O. This may be because C2H2O4·2H2O increases the H in the etching solution. + amount, and ionized F with fluoride - However, adding too much C2H2O4·2H2O will cause uneven corrosion and reduce the roughness and transmittance of the glass.

[0043] Figure 5 shows that as the amount of HO increases, the roughness and transmittance initially increase and then decrease. The roughness reaches its maximum at 95g, at which point the transmittance is also high; the transmittance reaches its maximum at 100g, at which point the roughness is also high. Based on these considerations, a 100g HO dosage was initially selected.

[0044] Example 3 (Changing Etching Temperature)

[0045] A method for preparing superhydrophobic glass involves preparing an etching solution in a ratio of NH₄F:(NH₄)₂SO₄:C₂H₂O₄·2H₂O:H₂O = 10:2.5:9.5:95, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etching solution. A protective film is applied to the glass surface not to be etched. The etching solution is then precisely controlled to maintain a temperature of 50°C in an electronic thermostatic water bath for 50 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0046] A certain amount of cetyltrimethylammonium bromide (CTAB) is added to a mixed solution of 4mL of 25% NH3·H2O and 80mL of 95% C2H5OH. The mixture is placed in a constant temperature magnetic stirrer and mixed thoroughly. When the CTAB is completely dissolved, the mixture is removed. Separately, 2mL of tetraethyl orthosilicate (TEOS) is dripped into a beaker containing 80mL of 95% C2H5OH solution using a dropper. The mixed solution of TEOS and C2H5OH is quickly poured into the beaker containing the previously prepared CTAB mixed solution and stirred thoroughly with a magnetic stirrer. The mixture is then reacted at 40°C for 12 hours. After the reaction is complete, the beaker containing the fully reacted solution is placed in a drying oven to dry. Finally, nano-SiO2 particles with different degrees of agglomeration, that is, SiO2 particles with different particle size distributions, are obtained.

[0047] 0.3g of nano-SiO2 particles of varying degrees of agglomeration were placed in a beaker, each containing 35mL of a 95% C2H5OH solution. The mixture was then stirred in an ultrasonic cleaner for 30 minutes. The ultrasonically dispersed nano-SiO2 particles were sprayed onto the etched glass surface using an airbrush. After spraying, the glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass was placed in a 2% (by mass) solution of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFTS) in n-hexane for 1 minute, air-dried for 30 minutes, and then placed in a 420°C furnace for 3 minutes. The heat treatment was then removed and cooled to room temperature.

[0048] Transmittance and roughness data were used to investigate the optimal etching temperature for glass during the etching process. As shown in Figure 6, for a constant etching time, as the temperature continues to rise, the roughness of the glass gradually increases. The transmittance of the glass, however, first increases and then decreases with increasing temperature. The transmittance of the glass reaches its highest value at 75°C. This phenomenon occurs because rising temperature increases the activity of the reactants, gradually increasing the etching rate. When the chemical etching temperature is 75°C, the microparticles are evenly distributed on the etched glass surface and exhibit a good surface morphology, achieving the highest transmittance at this point. As the temperature continues to rise, the microparticles on the glass surface dissolve due to the high temperature, disrupting the surface morphology and reducing the ability of the rough surface structure to capture light, thereby reducing the transmittance of the etched glass. Therefore, the glass etching temperature is controlled at 75°C.

[0049] Example 4 (Changing Etching Time)

[0050] A method for preparing superhydrophobic glass involves preparing an etching solution in a ratio of NH₄F:(NH₄)₂SO₄:C₂H₂O₄·2H₂O:H₂O = 10:2.5:9.5:95, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etching solution. A protective film is applied to the glass surface not to be etched. The etching solution is then precisely controlled to maintain a temperature of 75°C in an electronic thermostatic water bath for 30 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0051] A certain amount of cetyltrimethylammonium bromide (CTAB) is added to a mixed solution of 4mL of 25% NH3·H2O and 80mL of 95% C2H5OH. The mixture is placed in a constant temperature magnetic stirrer and mixed thoroughly. When the CTAB is completely dissolved, the mixture is removed. Separately, 2mL of tetraethyl orthosilicate (TEOS) is dripped into a beaker containing 80mL of 95% C2H5OH solution using a dropper. The mixed solution of TEOS and C2H5OH is quickly poured into the beaker containing the previously prepared CTAB mixed solution and stirred thoroughly with a magnetic stirrer. The mixture is then reacted at 40°C for 12 hours. After the reaction is complete, the beaker containing the fully reacted solution is placed in a drying oven to dry. Finally, nano-SiO2 particles with different degrees of agglomeration, that is, SiO2 particles with different particle size distributions, are obtained.

[0052] 0.3g of nano-SiO2 particles of varying degrees of agglomeration were placed in a beaker, each containing 35mL of a 95% C2H5OH solution. The mixture was then stirred in an ultrasonic cleaner for 30 minutes. The ultrasonically dispersed nano-SiO2 particles were sprayed onto the etched glass surface using an airbrush. After spraying, the glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass was placed in a 2% (by mass) solution of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFTS) in n-hexane for 1 minute, air-dried for 30 minutes, and then placed in a 420°C furnace for 3 minutes. The heat treatment was then removed and cooled to room temperature.

[0053] As shown in Figure 7, the transmittance and roughness data are used to explore the optimal etching time for glass during the etching process. It can be seen that the transmittance of the glass fluctuates over time. When the chemical etching time is 70 minutes, the transmittance of the glass reaches its maximum value after etching, and when the chemical etching time is 50 minutes, the transmittance of the glass reaches its second maximum value after etching. However, as the etching reaction continues, the transmittance decreases. This phenomenon occurs because as the etching reaction proceeds, a more insoluble fluorosilicate is produced and deposited on the glass surface, preventing further reaction between the glass and the etching solution, thereby reducing the transmittance of the glass. To obtain high transmittance glass, control the roughness within an appropriate range, and improve glass preparation efficiency, an etching time of 50 minutes was selected.

[0054] Comparative Example 1 (Changing the Method of Bonding SiO2 Particles to Glass Surface)

[0055] A method for preparing superhydrophobic glass involves preparing an etching solution in a ratio of NH₄F:(NH₄)₂SO₄:C₂H₂O₄·2H₂O:H₂O = 10:2.5:9.5:95, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etching solution. A protective film is applied to the glass surface not to be etched. The etching solution is then precisely controlled to maintain a temperature of 75°C in an electronic thermostatic water bath for 50 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0056] A certain amount of cetyltrimethylammonium bromide (CTAB) is added to a mixed solution of 4mL of 25% NH3·H2O and 80mL of 95% C2H5OH. The mixture is placed in a constant temperature magnetic stirrer and mixed thoroughly. When the CTAB is completely dissolved, the mixture is removed. Separately, 2mL of tetraethyl orthosilicate (TEOS) is dripped into a beaker containing 80mL of 95% C2H5OH solution using a dropper. The mixed solution of TEOS and C2H5OH is quickly poured into the beaker containing the previously prepared CTAB mixed solution and stirred thoroughly with a magnetic stirrer. The mixture is then reacted at 40°C for 12 hours. After the reaction is complete, the beaker containing the fully reacted solution is placed in a drying oven to dry. Finally, nano-SiO2 particles with different degrees of agglomeration, that is, SiO2 particles with different particle size distributions, are obtained.

[0057] 0.3g of nano-SiO2 particles with different agglomeration degrees were placed in a beaker, and 35mL of 95% C2H5OH solution was added to each sample. The sample was then placed in an ultrasonic cleaner and stirred for 30 minutes. A chemically etched glass sample was immersed in a beaker containing dispersed nano-SiO2 particles (a protective film was also applied to the glass surface that did not need to be etched), left to stand for a period of time, and then removed. The glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass piece was placed in a 2% by mass concentration of 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFTS) in n-hexane for 1 minute, allowed to air dry for 30 minutes, and then placed in a high-temperature furnace at 420°C for 3 minutes. After removal, the sample was cooled to room temperature.

[0058] The sample was loaded with a 100g weight and abraded on 600-grit sandpaper. The relationship between the number of abrasions and the water contact angle was measured. As shown in Figure 8, the contact angle of the coating before abrasion was 166.06±2°, which dropped slightly to 164.02±2° after the first abrasion. After 50 abrasions with sandpaper, the rough structure of the coating surface was partially destroyed, but the effect was not as good as that of the coating produced by the spray coating method.

[0059] Comparative Example 2 (Changing the Type of Etching Solution)

[0060] A method for preparing superhydrophobic glass involves preparing an etchant solution containing 8% HF and 5% HCl, stirring thoroughly on a thermostatic magnetic stirrer, and then allowing the solution to stand at room temperature for 12 hours. The glass is then placed horizontally in the prepared etchant solution, which is then maintained in an electronic thermostatic water bath at a precise temperature of 75°C for 30 minutes. After the reaction is complete, the sample is removed, rinsed with deionized water, and dried.

[0061] Add a certain amount of CTAB to a mixed solution of 4mL NH3·H2O and 80mL C2H5OH. Mix thoroughly in a constant-temperature magnetic stirrer and remove once the CTAB is completely dissolved. Separately, use a dropper to drop 2mL of TEOS into a beaker containing 80mL of C2H5OH solution. Quickly pour the TEOS and C2H5OH mixed solution into the previously prepared CTAB mixed solution in a beaker and stir thoroughly with a magnetic stirrer. Allow the mixture to react at 40°C for 12 hours. After the reaction is complete, dry the beaker containing the fully reacted solution in a drying oven to obtain nano-SiO2 particles with varying degrees of agglomeration.

[0062] Nano-SiO2 particles of varying degrees of agglomeration were placed in a beaker, each containing 35 mL of a C2H5OH solution. The mixture was then stirred in an ultrasonic cleaner for 30 minutes. The ultrasonically dispersed nano-SiO2 particles were then sprayed onto the etched glass surface using an airbrush. After spraying, the glass sample was placed in a high-temperature furnace and heat-treated at 550°C for 1 hour. After cooling, the treated glass was placed in a 2% PFTS solution in n-hexane for 1 minute, air-dried for 30 minutes, and then placed in a 420°C furnace for 3 minutes. The heat was then removed and cooled to room temperature.

[0063] The sample was loaded with a 100g weight and abraded on 600-grit sandpaper to test the relationship between the number of friction cycles and the water contact angle. As shown in Figure 9, after 38 friction cycles, the water contact angle of the unetched coating fell below 150°, indicating a loss of superhydrophobicity.

[0064] The above description is merely a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Any person skilled in the art can, without departing from the scope of the technical solution of the present invention, utilize the methods and technical contents disclosed above to make many possible changes and modifications to the technical solution of the present invention, or modify it into an equivalent embodiment with equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change, and modification of the above embodiments made in accordance with the technical essence of the present invention without departing from the content of the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A method for preparing superhydrophobic glass, characterized in that The following steps are involved: 1). Place the glass sample horizontally in a container containing etching solution, place the container in a constant temperature water bath, control the temperature of the etching solution to 25-85°C, and the etching time to 30-80 minutes. Then take out the glass sample, wash it with deionized water and dry it; 2). Using the etched surface of glass as the substrate, spray the configured nano-SiO2 particle ethanol solution on the glass surface to form a film, and then put the glass sample into a high-temperature furnace for heat treatment; 3). The heat-treated glass sample is placed in a n-hexane solution containing perfluorodecyltriethoxysilane for a reaction treatment of 1 to 3 minutes to modify the nano-SiO2 particles and obtain a super-hydrophobic coating after heat treatment.

2. A method for preparing super hydrophobic glass according to claim 1, characterized in that, The etching solution is composed of raw materials in the following mass ratio: ammonium fluoride: ammonium sulfate: oxalic acid: water = 10-15: 2.5-3: 5-9.5: 95-100.

3. A method for preparing super hydrophobic glass according to claim 1, characterized in that, The preparation of nano-SiO2 particles includes the following steps: Add 0.15 g to 0.35 g of hexadecyltrimethylammonium bromide (CTAB) to a beaker containing 4 mL of a mixed solution of 25% NH3·H2O and 80 mL of 95% C2H5OH, place the mixed solution in a constant temperature magnetic stirrer and mix evenly, and take out the CTAB mixed solution when the CTAB is completely dissolved; Take 2 mL of tetraethyl orthosilicate TEOS and drop it into a beaker containing 80 mL of 95% C2H5OH solution; The mixed solution of TEOS and C2H5OH was quickly poured into the beaker of the previously prepared CTAB mixed solution, and stirred evenly with a magnetic stirrer. The mixture was reacted at 40°C for 12 hours. After the reaction was completed, the beaker containing the reaction solution was placed in a drying oven for drying. Finally, nano-SiO2 particles with different agglomeration degrees, that is, SiO2 particles with different particle size distributions were obtained.

4. A method for preparing super hydrophobic glass according to claim 3, characterized in that The method comprises the following steps: taking 0.15g to 0.35g of nano-SiO2 particles with different agglomeration degrees and putting them into a beaker, respectively adding 30 to 40mL of 95% C2H5OH solution, putting them into an ultrasonic cleaner and stirring for 25 to 35min to obtain a nano-SiO2 particle spray liquid; The nano-SiO2 particle spraying liquid is sprayed onto the etched surface of the glass sample. After the spraying is completed, the glass sample is placed in a high-temperature furnace and heat-treated at 300-550°C for 30-60 minutes, and then taken out and cooled naturally; Then the glass sample was placed in a n-hexane solution of 2% perfluorodecyltriethoxysilane PFTS to react for 1 to 3 minutes, naturally air-dried, and then placed in a high-temperature furnace at 400 to 430° C. for 3 to 5 minutes, taken out and cooled to room temperature.

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