Slit device and transmission small-angle scattering device

Abstract

A configuration is provided such that slit members 51 having slits can be moved by a slit-moving mechanism 60. The slit members 51 are moved by the slit-moving mechanism 60, so that the slits are arranged at positions near an inspection region of a sample held by a sample holding part. For example, during the replacement of the sample, the slit members 51 are retracted from the positions near the inspection region of the sample.

Description

Slit device and transmission type small angle scattering device

[0001] The present invention relates to a slit device used to limit the cross-sectional area of ​​X-rays irradiated onto a sample, and in particular to a slit device suitable for a transmission-type small-angle X-ray scattering (T-SAXS) device.

[0002] In recent years, semiconductor devices have become increasingly dense, multi-layered, and have increasingly complex circuit patterns in order to improve performance. In particular, in three-dimensional NAND flash memory (3D-NAND), the number of layers has increased in line with the increase in capacity density, resulting in structures with pillars (diameter: tens to hundreds of nm, height: several μm) and trenches (deep grooves) with large aspect ratios. In view of the circumstances in the semiconductor manufacturing field, the present applicant has previously proposed a transmission small-angle scattering instrument that can nondestructively and efficiently measure the microscopic shapes of semiconductor devices with complex structures at the manufacturing process site (see Patent Document 1).

[0003] The transmission small-angle scattering device disclosed in Patent Document 1 is configured such that a sample (i.e., a semiconductor wafer with an integrated circuit pattern formed on its surface) placed on a sample holder is irradiated with X-rays from an X-ray irradiation unit installed below the sample. The scattered X-rays generated around the X-rays that have passed through the sample are detected by a two-dimensional X-ray detector installed above the sample. The reference numerals in parentheses are the reference numerals assigned to the respective components in the drawings of Patent Document 1.

[0004] In order to use such a transmission small-angle scattering device to inspect with high precision the fine shapes of integrated circuit patterns formed on the surfaces of semiconductor wafers that are manufactured one after another at a manufacturing process site, it is preferable to narrow the cross-sectional area of ​​the X-rays so that the X-rays can be accurately irradiated onto the inspection area without going beyond a fine area (inspection area) set at an inspection point on the sample. Therefore, there has been a need for the development of a slit device that places a slit close to the inspection area of ​​the sample, limits the cross-sectional area of ​​the X-rays emitted from an X-ray irradiation unit through the slit, and enables accurate irradiation onto the inspection area.

[0005] International Publication No. 2020 / 194986

[0006] The present invention has been made in view of the above circumstances, and has as its object to provide a slit device that can accurately irradiate X-rays onto a minute area set as an inspection point on a sample.

[0007] The present invention targets a transmission type small-angle scattering device comprising a sample holder for holding a sample, an X-ray irradiation unit for irradiating X-rays, and a two-dimensional X-ray detector, wherein a sample placed on the sample holder is irradiated from below with X-rays emitted from the X-ray irradiation unit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have transmitted through the sample at a position above the sample. The present invention is characterized by comprising: a slit device to be incorporated into the transmission type small-angle scattering device, the slit member including a slit piece formed with a slit that allows a portion of the X-rays to pass, and an X-ray guide cylinder that is open at both ends, with the slit piece attached to one opening and that allows X-rays to be incident on a hollow space from the other opening and guided to the slit; and a slit movement mechanism that supports the slit member and moves the slit member to position the slit in a position near an inspection area of ​​the sample held in the sample holder, and that moves the slit member to retract it from the position near the inspection area.

[0008] Furthermore, the present invention can also be configured as follows, if necessary: ​​the slit member has an intermediate slit piece provided in the hollow portion of the X-ray guide cylinder, and the intermediate slit piece has an intermediate slit formed therein that allows part of the X-rays to pass through.

[0009] The apparatus is configured to include a plurality of slit members having different slit dimensions and shapes, and the slit moving mechanism moves one of the plurality of slit members to position the slit attached to that slit member near the inspection area of ​​the sample held in the sample holding section.

[0010] The configuration includes an inclination correction unit that aligns the direction of the central axis of the slit member with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit.

[0011] The tilt correction unit is configured to include a tilt measuring instrument that irradiates a surface of the slit piece with laser light and calculates the tilt of the direction of the central axis of the slit member relative to the direction of the optical axis of the X-ray emitted from the X-ray irradiation unit based on the reflection angle of the laser light reflected from the surface of the slit piece.

[0012] The tilt correction unit is configured to measure the intensity of the X-rays that are emitted from the X-ray irradiation unit, pass through the hollow portion of the slit member, and enter the two-dimensional X-ray detector, and correct the tilt of the slit member so that the intensity of the X-rays is maximized.

[0013] Furthermore, a transmission small-angle scattering device according to the present invention comprises a sample holder that holds a sample, an X-ray irradiation unit that irradiates X-rays, a two-dimensional X-ray detector, and a slit device having the above-described configuration, wherein a sample placed on the sample holder is irradiated from below with X-rays that have been emitted from the X-ray irradiation unit and passed through the slit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample.

[0014] According to the slit device of the present invention, the slit member can be moved and adjusted using a slit moving mechanism, and the slit can be accurately positioned in a close position opposite a microscopic area (inspection area) set at the inspection point of the sample, so that X-rays whose cross-sectional area has been narrowed by the slit can be accurately irradiated onto the inspection area of ​​the sample.

[0015] Furthermore, when replacing the sample, the slit movement mechanism can be used to move the slit placed close to the sample away from the sample and retract the slit member to a position where it does not interfere with the surrounding operating parts of the transmission type small-angle scattering device.

[0016] FIG. 1A is a side view showing a schematic configuration of the overall structure of a transmission type small-angle scattering device according to an embodiment of the present invention. FIG. 1B is a front view showing the same. FIG. 2 is a schematic view showing an optical system configured between an X-ray irradiation unit and a two-dimensional X-ray detector. FIGS. 3A and 3B are perspective views showing the external configuration of a slit device according to an embodiment of the present invention, viewed from different angles. FIG. 4A is an exploded perspective view of a slit member. FIG. 4B is a perspective view of a slit member. FIG. 4C is an enlarged perspective view of a slit piece. FIG. 5A is a front view showing a configuration example of a tilt correction unit. FIG. 5B is a schematic view showing another configuration example of the tilt correction unit. FIG. 6 is a front cross-sectional view showing another configuration example of the slit member.

[0017] S: sample, P: measurement position, 10: goniometer, 11: swivel arm, 20: X-ray irradiation unit, 21: X-ray tube, 22: focusing mirror, 23: aperture, 30: two-dimensional X-ray detector, 31: direct beam stopper, 32: vacuum path, 35: optical microscope, 40: sample stage, 41: frame, 42: sample holder, 43: cavity, 50: slit device, 51: slit member, 52: X-ray guide tube, 53: slit piece, 53a: slit, 54: intermediate slit piece, 54a: intermediate slit, 60: Slit movement mechanism, 61: Base, 62: Horizontal movement table, 63: Support table, 65: X guide rail, 66: X drive motor, 67: X slider, 69: Y guide rail, 70: Y drive motor, 71: Y slider, 73: Z guide rail, 74: Z drive motor, 75: Z slider, 80: Tilt correction unit, 81: Laser tilt measuring device, 82: Moving table, 83: Laser light source, 84: Laser detector, 90: Tilt correction mechanism, 91: Support

[0018] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. [Outline of Transmission Small-Angle Scattering Apparatus] First, an outline of a transmission small-angle scattering apparatus according to an embodiment of the present invention will be described. When an X-ray beam is irradiated onto a sample, the X-rays are scattered in a small angle region (small-angle region) near the direction of propagation of the X-ray beam. This scattering is called small-angle scattering, and measuring this scattering can reveal the particle size and periodic structure of a substance. Furthermore, in recent years, analytical techniques have been developed that use this small-angle scattering measurement to obtain various information about thin films that form semiconductor devices. A small-angle scattering apparatus is an apparatus for measuring this small-angle scattering.

[0019] Small-angle scattering instruments include reflection-type instruments that irradiate the surface of a sample with X-rays and detect scattered X-rays reflected from the surface of the sample, and transmission-type instruments that irradiate the back surface of a sample with X-rays and detect scattered X-rays emitted from the surface.

[0020] The present invention is a transmission-type small-angle scattering instrument. This transmission-type small-angle scattering instrument has a basic structure in which an X-ray source and a two-dimensional X-ray detector are arranged opposite each other with a sample in between, X-rays from the X-ray source are irradiated onto the back surface of the sample, and scattered X-rays emitted from the front surface of the sample at a specific angle are detected by the two-dimensional X-ray detector.

[0021] Conventional small-angle scattering devices generally have a horizontal structure in which the X-ray source and two-dimensional X-ray detector are arranged horizontally, and therefore require a large installation area. In contrast, the transmission small-angle scattering device according to this embodiment has a vertical structure in which the X-ray source and two-dimensional X-ray detector are arranged vertically, so that it can be installed on the limited floor area of ​​a clean room in which a semiconductor production line is constructed.

[0022] 1A is a side view of a transmission-type small-angle scattering device according to an embodiment of the present invention, and FIG. 1B is a front view of the same device.

[0023] The transmission small-angle scattering instrument according to this embodiment includes a goniometer 10. The goniometer 10 has the function of rotating a rotary arm 11 around a θ axis extending horizontally. An X-ray irradiation unit 20 and a two-dimensional X-ray detector 30 are mounted on both ends of the rotary arm 11. Here, the rotary arm 11 has its origin in a vertically arranged state. The X-ray irradiation unit 20 is mounted on the lower end, and the two-dimensional X-ray detector 30 is mounted on the upper end. This vertical arrangement structure allows the instrument to be installed on a relatively small floor area.

[0024] The X-ray irradiation unit 20 and the two-dimensional X-ray detector 30 are arranged opposite each other with a sample stage 40 in between, and the X-ray irradiation unit 20 irradiates X-rays from below onto the sample S supported by the sample holder 42 of the sample stage 40. The two-dimensional X-ray detector 30 is configured to detect scattered X-rays generated in a small angle region around the X-rays transmitted from the sample S.

[0025] As shown in Figures 1A and 1B, the sample stage 40 has a cavity 43 formed therein that allows the X-rays emitted from the X-ray irradiation unit 20 to pass through, and the X-rays are irradiated onto the back surface of the sample S through this cavity 43.

[0026] Furthermore, a slit device 50 including a slit member 51 as a component is installed below the sample stage 40. The slit member 51 is provided below the sample S placed in the sample holder 42 and on the optical axis of the X-rays emitted from the X-ray irradiation unit 20. Details of the slit device 50 will be described later.

[0027] A cylindrical vacuum path 32 is mounted on the rotary arm 11 of the goniometer 10. This vacuum path 32 has the function of eliminating air scattering that occurs when X-rays that have passed through the sample S collide with air, thereby improving the measurement accuracy of small-angle scattering.

[0028] The sample stage 40 is equipped with a sample positioning mechanism (not shown) that moves the sample holder 42 in the forward / backward direction (Y direction) and the lateral direction (X direction) parallel to the horizontal plane, and in the up / down direction (Z direction) perpendicular to the horizontal plane, to position the inspection point of the sample S at the measurement position P of the transmission small-angle scattering device.

[0029] The sample positioning mechanism (not shown) has the function of rotating the sample S supported by the sample holder 42 in-plane (φ rotation) and the function of swinging it around the χ axis (χ swing). The χ axis is an axis that intersects at a right angle with the θ axis of the goniometer 10 in the horizontal plane, and the intersection of the θ axis and the χ axis is positioned to coincide with the measurement position P of the transmission small-angle scattering device.

[0030] The sample stage 40 is supported by a frame 41. The relative positions of the frame 41 and the rotary arm 11 of the goniometer 10 are adjusted so that they do not interfere with each other.

[0031] The transmission small-angle scattering instrument according to this embodiment also includes an optical microscope 35 for observing the surface of the sample S. The optical microscope 35 is installed in a position where it does not interfere with the surrounding components, such as the components driven by the sample positioning mechanism, the X-ray irradiation unit 20 rotated by the goniometer 10, and the two-dimensional X-ray detector 30. The sample S can be moved to a position below the optical microscope 35 by a sample positioning mechanism (not shown).

[0032] [X-ray Optical System] Next, an overview of the X-ray optical system configured between the X-ray irradiation unit and the two-dimensional X-ray detector will be described with reference to Fig. 2. The X-ray irradiation unit 20 includes an X-ray tube 21, a focusing mirror 22, and an aperture 23 as its components. As described above, a slit member 51 is provided below the sample S placed in the sample holder 42 and on the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0033] An X-ray tube with an electron beam focal spot size on the target of 70 μm or less, preferably 40 μm or less, is used as the X-ray tube 21. Copper (Cu), molybdenum (Mo), silver (Ag), gold (Au), etc. can be selected as the target material, but in the case of a transmission type, high-energy X-rays that can penetrate the Si wafer substrate are required, so it is desirable to use molybdenum (Mo) or silver (Ag) that make this possible.

[0034] The collector mirror 22 may be a side-by-side type collector mirror 22 in which two multilayer mirrors with multilayer films formed on their surfaces are arranged in an L-shape and integrated together. Alternatively, a Kirkpatrick-Baez type collector mirror in which two multilayer mirrors are arranged independently may be used. The collector mirror 22 is adjusted to focus on the detection surface of the two-dimensional X-ray detector 30, and has the function of focusing the X-rays into a rectangular spot at the focus that is 100 μm in length and width or less, preferably 50 μm in width or less.

[0035] The aperture 23 has a function of blocking leakage light of X-rays emitted from the X-ray tube 21 that pass through the outside without entering the condenser mirror 22. The X-rays emitted from the X-ray tube 21 are blocked by the aperture 23 to be monochromatized and focused by the condenser mirror 22.

[0036] The X-rays emitted from the X-ray tube 21 are blocked from leakage light by the aperture 23 and then enter the collecting mirror 22. The X-rays are monochromatized and converged by the collecting mirror 22, and pass through a slit formed in the slit member 51, thereby narrowing the cross-sectional area, and are irradiated onto an inspection region of a very small area set on the surface of the sample S.

[0037] Next, the X-rays that have passed through the sample S and the scattered X-rays generated in the small-angle region around it pass through the vacuum path 32 shown in FIG. 1A and travel toward the two-dimensional X-ray detector 30. Of these, the X-rays that have passed through the sample S from the X-ray irradiation unit 20 and traveled straight ahead are blocked by a direct beam stopper 31 provided in front of the two-dimensional X-ray detector 30. As a result, only the scattered X-rays generated in the small-angle region of the X-rays are incident on the two-dimensional X-ray detector 30.

[0038] Here, the distance L1 from the focal point of the X-ray tube 21 to the sample S affects the focal area of ​​the X-rays irradiated onto the sample S. That is, the longer the distance L1, the smaller the focal area of ​​the X-rays irradiated onto the sample S. Furthermore, in a transmission small-angle scattering device, the distance L2 from the sample S to the two-dimensional X-ray detector 30 is called the camera length, and this camera length L2 affects the angular resolution of the two-dimensional X-ray detector 30. That is, the longer the camera length L2, the more improved the angular resolution.

[0039] However, in a transmission-type small-angle scattering instrument arranged vertically as in this embodiment, there is a limit to how long the distance L1 and camera length L2 can be secured, and therefore it is preferable to determine these dimensions appropriately by comprehensively taking into consideration the environment of the site where the instrument is installed, the focused area of ​​X-rays on the sample S, and the angular resolution.

[0040] The rotating arm 11 is composed of multiple arm members, and the camera length L2 can be set arbitrarily by sliding these arm members in the lengthwise direction. Note that the rotating arm 11 may be provided with a position adjustment mechanism for moving the X-ray irradiation unit 20 in the X-ray optical axis direction to arbitrarily change the distance L1. Furthermore, the rotating arm 11 may be configured to be equipped with a position adjustment mechanism for moving the two-dimensional X-ray detector 30 in the X-ray optical axis direction to arbitrarily change the camera length L2.

[0041] 3A to 5B, the slit device 50 will be described in detail. The slit device 50 includes a plurality of slit members 51 (four in the figure), a slit moving mechanism 60, and an inclination correction unit 80.

[0042] 3A and 3B, the slit movement mechanism 60 is composed of an X movement mechanism, a Y movement mechanism, and a Z movement mechanism. The X movement mechanism and the Y movement mechanism have the function of moving the horizontal movement platform 62 in two orthogonal directions (X direction and Y direction) on a horizontal plane. Specifically, the X movement mechanism is mounted on a base 61, and an X slider 67 is moved on an X guide rail 65 extending in the X direction by the driving force of an X drive motor 66. The Y movement mechanism is mounted on the upper surface of the X slider 67, and a Y slider 71 is moved on a Y guide rail 69 extending in the Y direction by the driving force of a Y drive motor 70.

[0043] The Z movement mechanism is mounted on a Y slider 71, and is configured such that a Z slider 75 moves along a Z guide rail 73 extending in the vertical direction (Z direction) by the driving force of a Z drive motor 74. A support base 63 is fixed to the Z slider 75, and a plurality of slit members 51 are bundled and mounted on this support base 63. Each slit member 51 is arranged so that its central axis extends in the vertical direction (Z direction).

[0044] 4A and 4B, the slit member 51 is composed of a rod-shaped X-ray guide cylinder 52 with both ends open, and a slit piece 53. The X-ray guide cylinder 52 is made of a highly rigid metal such as stainless steel, and the slit piece 53 is fixed to the opening at one end of the X-ray guide cylinder 52 as shown in FIG.

[0045] As shown in FIG. 4C , the slit piece 53 is composed of a small plate-like piece, and a slit 53 a is formed in the center thereof, penetrating from the rear surface to the front surface. The slit piece 53 is preferably made of a material (e.g., tantalum) that is difficult for X-rays to transmit. The slit 53 a is manufactured to fit the area of ​​a microscopic region (inspection region) set at an inspection point on the sample S (e.g., a semiconductor wafer) and the surface shape of the microscopic region (e.g., the pattern shape of an integrated circuit). That is, the opening shape and opening area of ​​the slit 53 a are adjusted so that X-rays having a reduced cross-sectional area after passing through the slit 53 a are accurately irradiated onto the inspection region without escaping from the inspection region. This enables highly accurate detection of scattered X-rays generated from the inspection region, and enables the acquisition of a measurement waveform of scattered X-rays with reduced noise.

[0046] 3A and 3B, in this embodiment, a plurality of slit members 51 are mounted on the support base 63 of the slit moving mechanism 60. The slit pieces 53 attached to the plurality of slit members 51 each have a slit 53a formed therein to fit the inspection area of ​​each sample S in order to accommodate a plurality of samples S having different areas and surface shapes of the inspection area.

[0047] The above-mentioned slit device 50 is installed below the sample holder 42 shown in FIGS. 1A and 1B, selects a slit member 51 having a slit 53 a formed therein that fits the inspection area of ​​the sample S, and by driving the slit moving mechanism 60 in the X and Y directions, positions the selected slit member 51 so that the central axis of the X-ray guide cylinder 52 that constitutes the selected slit member 51 coincides with the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0048] Next, the slit moving mechanism 60 is driven in the XY directions to position the surface of the slit piece 53 attached to the slit member 51 at a position near the inspection area of ​​the sample S held by the sample holding portion 42 (specifically, at a position close to the back surface of the inspection area of ​​the sample S).

[0049] The X-rays emitted from the X-ray irradiation unit 20 pass through the hollow portion of the X-ray guide cylinder 52, have their cross-sectional area narrowed by the slit 53a, and are accurately irradiated onto an inspection area set on the sample S. This makes it possible to realize high-precision inspection of the sample S using the transmission-type small-angle scattering device.

[0050] As described above, the switching of the slit member 51 according to the inspection area of ​​the sample S can be automatically performed by driving the slit moving mechanism 60, so that the efficiency of the inspection work is improved significantly.

[0051] Furthermore, when replacing the sample S, the slit 53a disposed near the inspection area of ​​the sample S is retracted by the slit movement mechanism 60. During the sample S replacement operation, the sample stage 40 may be driven to move the sample holder 42. In this case, if the slit 53a remains disposed near the inspection area of ​​the sample S, there is a risk that it may interfere with the operating parts of the transmission small-angle scattering device (specifically, components such as the sample holder 42 and the sample stage 40 that moves it). Therefore, by retracting the slit 53a from the position near the inspection area of ​​the sample S, damage to the slit member 51 and the like can be avoided, and stable operation of the transmission small-angle scattering device can be ensured without stopping.

[0052] Next, the slit device 50 of this embodiment is equipped with a tilt correction unit 80 that aligns the direction of the central axis of the slit member 51 (specifically, the X-ray guide cylinder 52) with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20. Fig. 5A is a diagram showing an example of the configuration of the tilt correction unit 80 incorporated in the slit device 50 of this embodiment.

[0053] 5A, the tilt correction unit 80 is provided with a two-dimensional X-ray detector 30 and a laser tilt measurement device 81 arranged side by side on the rotating arm 11 of the goniometer 10. The two-dimensional X-ray detector 30 and the laser tilt measurement device 81 are mounted on a moving table 82 that moves laterally. The moving table 82 can be moved laterally by the driving force of a drive motor (not shown), so that either the laser tilt measurement device 81 or the two-dimensional X-ray detector 30 can be positioned opposite the surface of the slit piece 53 of the slit member 51 that is placed on the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0054] The laser tilt measuring device 81 includes a laser light source 83 and a laser detector 84, and has the function of measuring the tilt of the central axis of the slit member 51 relative to the optical axis of the X-ray by irradiating the surface of the slit piece 53 of the slit member 51 arranged on the optical axis of the X-ray with laser light from the laser light source 83 and detecting the laser light reflected from the surface with the laser detector 84.

[0055] The correlation between the inclination of the surface of the slit piece 53 and the inclination of the central axis of the slit member 51 relative to the optical axis of the X-ray is measured in advance, and based on this correlation, the inclination of the central axis of the slit member 51 relative to the optical axis of the X-ray can be calculated from the measurement results by the laser inclination measuring device 81.

[0056] As shown in Figures 3A and 3B, the slit device 50 has a built-in tilt correction mechanism 90, and based on the tilt of the central axis of the slit member 51 relative to the optical axis of the X-rays calculated from the measurement results by the laser tilt measurement device 81, the tilt correction mechanism 90 can be driven to align the direction of the central axis of the slit member 51 with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20.

[0057] The tilt correction mechanism 90 has a function of swinging the base 61 of the slit movement mechanism 60 to correct the tilt of the slit member 51 mounted on the support base 63. For example, the base 61 can be swung by independently raising and lowering the multiple support columns 91 that support the base 61. Other known swing mechanisms can also be applied to the tilt correction mechanism 90.

[0058] 5B is a diagram showing another configuration example of the tilt correction unit 80 incorporated in the slit device 50 of this embodiment. The tilt correction unit 80 shown in the figure is configured to cause the X-rays (direct beam) emitted from the X-ray irradiation unit 20 to enter the two-dimensional X-ray detector 30 through the hollow part of the slit member 51 arranged on the optical axis of the X-rays, and correct the tilt of the slit member 51 so that the intensity of the X-rays detected by the two-dimensional X-ray detector 30 is maximized.

[0059] That is, when the central axis of the slit member 51 is tilted relative to the optical axis of the X-rays emitted from the X-ray irradiation unit 20, the X-rays that can pass through the slit 53a are narrower than in normal cases when there is no tilt. As a result, the intensity of the X-rays detected by the two-dimensional X-ray detector 30 decreases. Therefore, by correcting the tilt of the slit member 51 so that the intensity of the X-rays (direct beam) incident on the two-dimensional X-ray detector 30 is maximized, the tilt of the slit member 51 toward the central axis can be aligned with the direction of the optical axis of the X-rays emitted from the X-ray irradiation unit 20. The tilt of the slit member 51 can be corrected by a tilt correction mechanism 90 shown in FIGS. 3A and 3B .

[0060] The tilt correction unit 80 shown in FIG. 5B can be configured using the X-ray irradiation unit 20 and the two-dimensional X-ray detector 30 provided in the transmission type small-angle scattering device, and therefore does not require the addition of new components, which is economically advantageous.

[0061] It should be noted that the present invention is not limited to the above-described embodiment, and various modifications and applications are possible as needed. For example, the number of slit members 51 mounted on the slit moving mechanism 60 is not limited to four, and may be one, two, three, five or more.

[0062] 6, a slit member 51 can also be configured. The slit member 51 shown in the figure has an intermediate slit piece 54 provided in the hollow portion of an X-ray guide cylinder 52. The intermediate slit piece 54 has an intermediate slit 54a formed therein for gradually narrowing the cross-sectional area of ​​the X-rays passing through it.

[0063] The X-rays emitted from the X-ray irradiation unit 20 and passing through the hollow portion of the slit member 51 first have their cross-sectional area narrowed by the intermediate slit 54a of the intermediate slit piece 54, and then their cross-sectional area is further adjusted by the slit 53a of the slit piece 53 provided at the tip opening of the X-ray guide cylinder 52 before being irradiated onto the sample S. This reduces the background caused by scattered light generated around the X-rays, making it possible to improve measurement accuracy and throughput.

[0064] 5A , the laser tilt measuring device 81 may be disposed so as to wait in the vicinity of the sample holder 42, and when measuring the tilt, the laser tilt measuring device 81 may be moved to a position directly above the slit member 51 and positioned opposite the surface of the slit piece 53 of the slit member 51.

Claims

1. A slit device incorporated into a transmission type small-angle scattering device that is configured to include a sample holder that holds a sample, an X-ray irradiation unit that irradiates X-rays, and a two-dimensional X-ray detector, wherein the sample placed on the sample holder is irradiated from below with X-rays emitted from the X-ray irradiation unit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample, the slit device comprising: a slit member that includes a slit piece formed with a slit that allows a portion of the X-rays to pass, and an X-ray guide tube that is open at both ends, with the slit piece attached to one opening and that allows X-rays to be incident on a hollow space from the other opening and guided to the slit; and a slit movement mechanism that supports the slit member and moves the slit member to position the slit in the vicinity of the inspection area of ​​the sample held in the sample holder, and also moves the slit member to retract it from the position in the vicinity of the inspection area.

2. The slit device according to claim 1, characterized in that the slit member has an intermediate slit piece provided in the hollow portion of the X-ray guide tube, and the intermediate slit piece has an intermediate slit formed therein that allows a portion of the X-rays to pass through.

3. A slit device as described in claim 1, characterized in that it is provided with a plurality of slit members having different slit dimensions and shapes, and the slit movement mechanism moves one of the plurality of slit members to position the slit attached to that slit member at a position near the inspection area of ​​the sample held in the sample holding section.

4. A slit device according to claim 1, further comprising an inclination correction unit for adjusting the direction of the central axis of said slit member to the direction of the optical axis of the X-rays emitted from said X-ray irradiation unit.

5. The slit device described in claim 4, characterized in that the tilt correction unit includes a tilt measuring device that calculates the tilt of the direction of the central axis of the slit member relative to the direction of the optical axis of the X-ray emitted from the X-ray irradiation unit based on the reflection angle of the laser light reflected from the surface of the slit piece when laser light is irradiated onto the surface of the slit piece.

6. The slit device described in claim 4, characterized in that the tilt correction unit is configured to measure the intensity of X-rays emitted from the X-ray irradiation unit, pass through the hollow portion of the slit member, and enter the two-dimensional X-ray detector, and correct the tilt of the slit member so that the intensity of the X-rays is maximized.

7. A transmission type small-angle scattering device comprising a sample holder for holding a sample, an X-ray irradiation unit for irradiating X-rays, a two-dimensional X-ray detector, and the slit device according to any one of claims 1 to 6, characterized in that the sample placed on the sample holder is irradiated from below with X-rays that have been emitted from the X-ray irradiation unit and passed through the slit, and the two-dimensional X-ray detector detects scattered X-rays generated around the X-rays that have passed through the sample at a position above the sample.

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