An integrated intake and exhaust device
Through the design of an integrated intake and exhaust device, the intake and exhaust channels are integrated above the semiconductor wafer baking unit, solving the problem of large volume and difficult to disassemble and clean due to the split design, and achieving the compactness and easy maintenance of the device.
Patent Information
- Application Number
- CN201811598550.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2018-12-26
- Publication Date
- 2025-07-25
- Estimated Expiration
- 2038-12-26
AI Technical Summary
In the existing semiconductor wafer baking units, the split design of the intake and exhaust devices leads to large volume occupancy and difficulty in disassembly and cleaning.
An integrated intake and exhaust device is adopted, and an intake chamber and exhaust chamber are formed with the pallet through the partition and the pallet, and an intake passage and exhaust passage are set on the integrated block. A sealing ring is used to ensure no gas leakage, and the pressure ring and the pallet are fixed by a manual knob.
The integration of the intake and exhaust channels is achieved, the device volume is reduced, the disassembly and cleaning is facilitated, and the service life and working efficiency of the device are improved.
Smart Images

Figure CN109509718B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of air inlet and exhaust devices for wafer baking processes in semiconductor equipment, and is particularly applicable to an integrated air inlet and exhaust device. Background Art
[0002] In the wafer baking unit of the semiconductor industry, the coordination of air inlet and exhaust is crucial for the overall performance of the wafer baking unit. Uniform air inlet and exhaust within the unit not only directly affect the indicators of the wafer baking process, but also can timely and continuously carry out the heat generated within the unit to the outside of the unit, thereby extending the service life of the devices within the unit. The well-known air inlet device of the wafer baking unit is arranged at the upper part of the unit, while the exhaust device is arranged at the bottom of the unit, belonging to the split design of air inlet and exhaust. Its disadvantages are reflected in practice as large occupied volume, difficult to disassemble, and not easy to clean. Summary of the Invention
[0003] In order to solve the above technical problems, the object of the present invention is to provide an integrated air inlet and exhaust device, and the specific technical solutions are as follows:
[0004] An integrated air inlet and exhaust device includes an integrated block, an upper sealing ring, a pressing plate, a pressing ring, a lower sealing ring, a supporting plate, and a partition plate;
[0005] The partition plate is installed on the stepped surface of the supporting plate, the pressing plate is placed on the upper surface of the supporting plate, and is pressed by the pressing ring and fixed to the supporting plate;
[0006] The integrated block is fixed at the relative position on the central surface of the pressing plate. A gas flow space is formed between the partition plate and the pressing plate, which is called the exhaust cavity; a gas flow space is formed between the partition plate and the supporting plate, which is called the air inlet cavity;
[0007] The integrated block has an air inlet channel and an exhaust channel, and the air inlet channel of the integrated block is communicated with the air inlet cavity, and the exhaust channel of the integrated block is communicated with the exhaust cavity;
[0008] The air inlet channel and the exhaust channel do not communicate with each other;
[0009] The supporting plate is provided with an exhaust groove, and the partition plate is provided with an exhaust hole;
[0010] The surface of the integrated block in contact with the pressing plate is provided with a groove for installing the upper sealing ring to ensure a tight fit between the integrated block and the pressing plate without gas leakage;
[0011] The contact surface between the supporting plate and the pressing plate is provided with a concave groove for installing the lower sealing ring to ensure a tight fit between the supporting plate and the pressing plate without gas leakage;
[0012] The pressing ring and the supporting plate are fixed by a manual knob.
[0013] For the described integrated intake and exhaust device, a preferred solution is that the intake channel and the exhaust channel can be arranged on the side or above of the centralized block, and the structure can be diversified.
[0014] For the described integrated intake and exhaust device, a preferred solution is that the shapes of the pressing plate and the supporting plate can be selected according to the overall layout.
[0015] For the described integrated intake and exhaust device, a preferred solution is that the number of the exhaust grooves can be selected according to actual requirements, and the arrangement can be circular arrangement, linear arrangement or irregular arrangement. The number and arrangement of the exhaust holes correspond to those of the exhaust grooves one by one, and the exhaust holes communicate with the exhaust grooves.
[0016] For the described integrated intake and exhaust device, a preferred solution is that the pressing ring is of an integral structure or a split structure, and the shape is of any shape, which is selected according to the overall layout.
[0017] When the device works, air enters the intake cavity through the intake channel of the integrated block, enters the exhaust cavity through the exhaust grooves of the supporting plate and the exhaust holes of the partition plate, and then passes through the exhaust channel of the integrated block, and the air is discharged outside the device.
[0018] Advantages of the present invention: In the technical solution of the present invention, the intake channel and the exhaust channel of the device can be arranged as a whole, located above the wafer baking unit, and do not affect other components of the wafer baking unit, belonging to an independently existing device. The intake cavity formed between the supporting plate and the partition plate communicates with the intake channel of the integrated block, and the exhaust cavity formed between the partition plate and the pressing plate communicates with the exhaust channel of the integrated block. Then, through the exhaust grooves and exhaust holes that communicate with each other between the supporting plate and the partition plate, the gas enters the intake cavity through the intake channel of the integrated block, the gas is evenly blown to the baking surface, and then passes through the exhaust grooves and exhaust holes, enters the exhaust cavity, and flows to the exhaust channel of the integrated block, so as to discharge the gas outside the unit. According to the actual situation, by restricting the thickness of each component, the overall height can be reduced, and a very thin state can be achieved. Through the ingenious cooperation of each component, the device is easy to disassemble and easy to clean. Description of the Drawings
[0019] Figure 1 It is a schematic structural diagram of an integrated intake and exhaust device;
[0020] Figure 2 It is Figure 1 a schematic diagram of the connection and cooperation components.
[0021] In the figure, 1 is an integrated circuit block, 2 is an upper sealing ring, 3 is a pressure plate, 4 is a pressure ring, 5 is a lower sealing ring, 6 is a support plate, 7 is a partition plate, 8 is an air inlet channel, 9 is an exhaust channel, 10 is an exhaust cavity, 11 is an air inlet cavity, 12 is an air inlet channel opening, 13 is an exhaust groove, 14 is an exhaust channel opening, 15 is an exhaust hole, 16 is a groove, 17 is a concave groove, 18 is a manual knob, and 19 is a mating component. Detailed implementation method
[0022] As Figure 1-2 shown, an integrated air inlet and exhaust device, characterized in that it includes an integrated circuit block 1, an upper sealing ring 2, a pressure plate 3, a pressure ring 4, a lower sealing ring 5, a support plate 6, and a partition plate 7;
[0023] The partition plate 7 is installed on the stepped surface of the support plate 6, the pressure plate 3 is placed on the upper surface of the support plate 6, and the pressure plate 3 is pressed tightly by the pressure ring 4 and fixed to the support plate 6;
[0024] The integrated circuit block 1 is fixed at the relative position on the central surface of the pressure plate 3. Among them, a gas flow space is formed between the partition plate 7 and the pressure plate 3, which is called an exhaust cavity 10; a gas flow space is formed between the partition plate 7 and the support plate 6, which is called an air inlet cavity 11;
[0025] The integrated circuit block 1 has an air inlet channel 8 and an exhaust channel 9, and the air inlet channel 8 of the integrated circuit block 1 communicates with the air inlet cavity 11, and the exhaust channel 9 of the integrated circuit block 1 communicates with the exhaust cavity 10;
[0026] The air inlet channel 8 and the exhaust channel 9 do not communicate with each other;
[0027] The support plate 6 is provided with an exhaust groove 13, and the partition plate 7 is provided with an exhaust hole 15;
[0028] The surface of the integrated circuit block 1 in contact with the pressure plate 3 is provided with a groove 16 for installing the upper sealing ring 2 to ensure the tight fit between the integrated circuit block 1 and the pressure plate 3 without gas leakage;
[0029] The contact surface between the support plate 6 and the pressure plate 3 is provided with a concave groove 17 for installing the lower sealing ring 5 to ensure the tight fit between the support plate 6 and the pressure plate 3 without gas leakage;
[0030] The pressure ring 4 and the support plate 6 are fixed by a manual knob 18.
[0031] The air inlet channel opening 12 and the exhaust channel opening 14 can be arranged on the side or the upper surface of the centralized block 1, and the structures of the air inlet channel 8 and the exhaust channel 9 can be diversified.
[0032] The shapes of the pressure plate 3 and the support plate 6 can be selected according to the overall layout.
[0033] The number of the exhaust grooves 13 can be selected according to actual requirements, and the arrangement can be circular arrangement, linear arrangement or irregular arrangement. The number and arrangement of the exhaust holes 15 correspond to those of the exhaust grooves 13 one by one, and the exhaust holes 15 communicate with the exhaust grooves 13.
[0034] The pressing ring 4 is of an integral structure or a split structure, and its shape can be any shape, which is selected according to the overall layout.
[0035] When the device works, air enters the intake cavity 11 through the intake channel 8 of the integrated block, and enters the exhaust cavity 10 through the exhaust grooves 13 of the support plate 6 and the exhaust holes 15 of the partition plate 7, and then is discharged outside the device through the exhaust channel 9 of the integrated block 1.
[0036] As Figure 2 shown: When the device is in the working state, the lower part of the device is used in cooperation with the mating part 19, and a closed area is formed between the intake cavity 11 formed between the support plate 6 and the partition plate 7 and the mating part 19.
[0037] Gas enters from the intake channel opening 12 of the integrated block 1, passes through the intake channel 9, enters the intake cavity 11, forms a uniform air flow in the intake cavity 11, and then the air flow passes through the exhaust grooves 13 of the support plate 6 and the exhaust holes 15 of the partition plate 7, enters the exhaust cavity 10, and then is discharged outside the device through the exhaust channel 9 of the integrated block 1, and works in a cycle to ensure continuous air flow in the device during operation.
Claims
1. An integrated intake and exhaust device, characterized in that: It includes an integrated circuit block, an upper sealing ring, a pressing plate, a pressing ring, a lower sealing ring, a supporting plate, and a partition plate; The partition plate is installed on the stepped surface of the supporting plate. The pressing plate is placed on the upper surface of the supporting plate, and the pressing plate is pressed tightly by the pressing ring and fixed to the supporting plate; The integrated circuit block is fixed at the relative position on the central surface of the pressing plate. A gas flow space is formed between the partition plate and the pressing plate, which is called the exhaust cavity; a gas flow space is formed between the partition plate and the supporting plate, which is called the intake cavity; The integrated circuit block has an intake channel and an exhaust channel, and the intake channel of the integrated circuit block communicates with the intake cavity, and the exhaust channel of the integrated circuit block communicates with the exhaust cavity; The intake channel and the exhaust channel do not communicate with each other; The supporting plate is provided with exhaust grooves, and the partition plate is provided with exhaust holes; The surface of the integrated circuit block in contact with the pressing plate is provided with a groove for installing the upper sealing ring to ensure a tight fit between the integrated circuit block and the pressing plate without gas leakage; The contact surface between the supporting plate and the pressing plate is provided with a concave groove for installing the lower sealing ring to ensure a tight fit between the supporting plate and the pressing plate without gas leakage; The pressing ring and the supporting plate are fixed by a manual knob; The lower part of the device is used in cooperation with a mating component. The intake cavity formed between the supporting plate and the partition plate and the mating component form a closed area; Gas enters from the intake channel opening of the integrated circuit block, passes through the intake channel, enters the intake cavity, forms a uniform air flow in the intake cavity, and then the air flow passes through the exhaust grooves of the supporting plate and the exhaust holes of the partition plate, enters the exhaust cavity, and then passes through the exhaust channel of the integrated circuit block and is discharged outside the device. It works in this cycle to ensure continuous air flow in the device during operation.
2. The integrated intake and exhaust device according to claim 1, characterized in that: The intake channel opening and the exhaust channel opening are arranged on the side or the top of the centralized block, and the structures of the intake channel and the exhaust channel are diversified.
3. The integrated intake and exhaust device according to claim 1, wherein: The shapes of the pressing plate and the supporting plate are selected according to the overall layout.
4. The integrated intake and exhaust device according to claim 1, characterized in that: The number of the exhaust grooves is selected according to actual requirements, arranged in a circumferential pattern, a linear pattern or an irregular pattern. The number and arrangement of the exhaust holes correspond to those of the exhaust grooves one by one, and the exhaust holes communicate with the exhaust grooves.
5. The integrated intake and exhaust device according to claim 1, characterized in that: The pressing ring is of an integral structure or a split structure, and its shape is of any shape and is selected according to the overall layout.
Citation Information
Patent Citations
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CN106224206A
Integrated air intake and exhaust device
CN209071288U