Method for preparing single-layer tungsten diselenide nanoband based on space confinement strategy
By using the atmospheric pressure chemical vapor deposition method of argon and hydrogen in a high-temperature tube furnace, the problems of complex preparation of single-layer tungsten diselenide nanoribbons and the introduction of impurities in the existing technology are solved, and the width is adjustable and high quality is achieved. Nanoribbon preparation and device performance improvement.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- XIANGTAN UNIV
- Filing Date
- 2019-03-26
- Publication Date
- 2019-05-28
AI Technical Summary
The existing method of preparing single-layer tungsten diselenide nanoribbons is complex, costly and easy to introduce impurities, which limits the industrial application and device performance of the material.
An atmospheric pressure chemical vapor deposition method based on a spatial confinement strategy is used to grow tungsten diselenide using argon and hydrogen in a high-temperature tube furnace to control the width and thickness of the nanoribbons, avoiding the use of salt and ensuring Product purity.
The high-quality preparation of single-layer tungsten diselenide nanoribbons with adjustable width is achieved, which avoids the introduction of impurities, reduces equipment requirements, and improves the reproducibility of batch preparation and device performance.