Method for structuring a decorative pattern or a technical pattern in an object made of at least partially transparent amorphous, semi-crystalline or crystalline material

Abstract

The invention relates to a method for structuring a decorative or technical pattern (22, 60) in the thickness of an object made of at least partially transparent amorphous, semi-crystalline or crystalline material, said object made of at least partially transparent material comprising a top face (18a) and a bottom face (18b) extending away from the top face (18a), said method comprising the steps of: providing a mask (24) delimiting at least one opening (25) to at least one of the top face (18a) or the bottom face (18b) of the object made of at least partially transparent material, the outline of the opening corresponding to the profile of the decorative or technical pattern (22, 60) to be structured, said mask (24) covering said at least one of the top face (18a) or the bottom face (18b) of the object made of at least partially transparent material at the locations where no structuring is desired, said method further comprising the step of structuring the decorative or technical pattern (22, 60) by means of a mono- or multi-charged ion beam (14) through said at least one opening (25) of the mask (24), the mechanical properties of the mask (24) being sufficient to prevent the ions of the ion beam (14) from etching said at least one of the top face (18a) or the bottom face (18b) of the object made of at least partially transparent material at the locations where it is covered by the mask (24).

Description

TECHNICAL FIELD

[0001] The present invention relates to a method of structuring a decorative or technical pattern in the thickness of an object made of at least partially transparent amorphous, semi-crystalline or crystalline material. The invention more particularly relates to a structuring method using a single-charge or multi-charge ion beam. BACKGROUND

[0002] It is known to engrave a decorative pattern in the thickness of an object made of amorphous or crystalline material by means of a laser beam. To this end, a strong laser is used, the beam of which is focused by means of a lens to create a series of points at the desired location within the transparent object. The lens is able to concentrate the coherent light from the laser on a very small surface, so that optical power values can be reached that exceed the damage threshold and are sufficient to create micro-cracks in the transparent object. These micro-cracks, which are typically 50 to 150 microns in size, correspond to the locations where the laser beam has been focused and where the material has been melted under the effect of the heat. These micro-cracks act as scattering centers for ambient light, making it possible for them to be exposed to the line of sight of an observer. It is thus possible to engrave a network of points in the thickness of an object made of transparent material that will form a two-dimensional pattern. To make a three-dimensional engraving, a plurality of two-dimensional networks of points can be superimposed so precisely that the resulting pattern gives the impression of having been engraved from a single piece.

[0003] The technique briefly described above has the advantage that it is possible to manufacture two-dimensional or three-dimensional patterns in objects made of transparent material, such as objects made of glass or objects made of polymethyl methacrylate (PMMA). These patterns can have a technical function or an aesthetic function. In the consumer goods sector, objects made of transparent material are particularly well known in which a digitalized file based on a photograph, for example a reproduction of an engraved human face. Such products have met with considerable success with consumers. However, one of the main drawbacks of this engraving technique is that it generally takes a long time to engrave a pattern in an object made of transparent material, which makes its use in the industrial sector problematic. SUMMARY SUMMARY

[0005] The object of the present invention is to remedy the problems mentioned above and others by providing a method of structuring a pattern in the thickness of an object made of at least partially transparent material that is particularly fast and easy to automate.

[0006] To this end, the invention relates to a method for structuring a decorative or technical pattern in the thickness of an object made of at least partially transparent amorphous, semi-crystalline or crystalline material, the object made of at least partially transparent material comprising a top face and a bottom face extending away from the top face, said method comprising the steps of: providing a mask delimiting at least one opening to at least one of the top face or the bottom face of the object made of at least partially transparent material, the outline of the opening corresponding to the profile of the decorative or technical pattern to be structured, said mask covering said at least one of the top face or the bottom face of the object made of at least partially transparent material at the locations where no structuring is desired, said method further comprising the step of structuring the decorative or technical pattern through said at least one opening of the mask by means of a single- or multi-charge ion beam, the mechanical properties of the mask being sufficient to prevent the ions of the ion beam from etching said at least one of the top face or the bottom face of the object made of at least partially transparent material at the locations where the surface is covered by the mask.

[0007] According to a particular embodiment of the method according to the invention, the single- or multi-charge ion beam is generated by a single- or multi-charge ion source of the Electron Cyclotron Resonance (ECR) type.

[0008] According to another particular embodiment of the method according to the invention, the at least partially transparent object is made of sapphire, ruby or diamond, preferably synthetic.

[0009] According to another particular embodiment of the method according to the invention, the at least partially transparent object is made of semi-crystalline organic material.

[0010] According to yet another particular embodiment of the method according to the invention, the at least partially transparent object is made of mineral glass or amorphous organic material.

[0011] According to yet another particular embodiment of the method according to the invention, the mask is deposited on at least one of the top face and the bottom face of the object made of at least partially transparent material:

[0012] • by selective deposition (such as inkjet printing) of a masking material at the locations of the top face and / or bottom face to be covered by the mask on which the structuring is to be performed;

[0013] • or by depositing a layer of masking material on the whole of the top face and / or bottom face on which the mask is to be structured, followed by ablating the masking layer at the locations of the top face and / or bottom face to be structured.

[0014] According to yet another particular embodiment of the method according to the invention, the masking layer is ablated by means of a laser beam.

[0015] According to yet another particular embodiment of the method according to the invention, the masking layer is a UV radiation-sensitive resin, which is structured by means of a UV source.

[0016] The application also relates to an object made of at least partially transparent amorphous, semi-crystalline or crystalline material structured according to the method of the application. This object can be in particular a glass, a dial or bezel, a central or bottom cover of a watchcase, a winding-mechanism crown or push-button head of a watch movement, a wristlet link of a watch or a piece of jewelry, or even a bridge of a watch movement.

[0017] The application also relates to a portable object, in particular a watchcase, comprising at least one element chosen from a glass, a dial, a bridge and a bottom cover, said at least one element being made of at least partially transparent amorphous, semi-crystalline or crystalline material and structured according to the method of the application, the element comprising at least one top face and at least one bottom face interconnected by edges, the portable object also comprising a light source arranged to illuminate the element through its bottom face or through its edges.

[0018] Thanks to these features, the application provides a method for the selective structuring of a three-dimensional technical or decorative pattern in an object made of at least partially transparent material by means of a single-charge or multi-charge ion beam. According to the application, the term single-charge ion means an ion whose degree of ionization is equal to +1, and the term multi-charge ion means an ion whose degree of ionization is greater than +1. The ion beam can comprise ions all having the same degree of ionization, or can come from a mixture of ions having different degrees of ionization.

[0019] By means of bombardment of the surface of an object made of at least partially transparent material through a mask by means of an ion beam, it is possible to structure a three-dimensional technical or decorative pattern in the object from the surface to a certain depth. Indeed, upon hitting the object made of at least partially transparent material, the ions of the ion beam penetrate into the object and create cavities or interstitial-type defects from a very short distance from the surface of this object, generally of the order of 10 to 15 nanometers, to a depth generally of 200 to 500 nanometers.

[0020] In a first aspect, if one considers that the defects created by the ions in the object made of at least partially transparent material are substantially cubic, the length of one side of such a cube is generally of the order of 50 to 200 nanometers. Obviously, the size of the defects created and the depth reached by such defects depend in particular on the nature of the material of which the object is made, the degree of ionization of the ions and the speed at which the ions hit the surface of the object. It is also understood that the size of the defects created in the object decreases from the surface towards the interior of this object. Analysis, in particular by transmission electron microscopy, shows that the object made of at least partially transparent material structured by the method according to the application exhibits, from the surface towards the interior, a substantially defect-free very thin surface layer of the order of 10 to 15 nanometers, followed by an amorphous structure layer of 100 to 500 nanometers in thickness and in which the defects are formed. Beyond this amorphous structure layer, almost no further effect of the ion bombardment on the structure of the material of which the object is made is observed.

[0021] Among the known ion implantation techniques, one of these comprises bombarding the surface of the object to be treated by means of a single-charge or multi-charge ion source of the electron cyclotron resonance type. Such a system is also known as electron cyclotron resonance or ECR.

[0022] The ECR ion source creates a plasma by means of electron cyclotron resonance. A microwave is injected into the volume of low-pressure gas to be ionized at a frequency corresponding to the electron cyclotron resonance delimited by the magnetic field applied to the region located within the volume of gas to be ionized. The microwave heats the free electrons present in the volume of gas to be ionized. These free electrons, under the effect of thermal agitation, collide with atoms or molecules and induce their ionization. The ions produced correspond to the type of gas used. This gas can be pure or composite. It can also consist of a vapor obtained from a solid or liquid material. The ECR ion source is capable of producing single-charge ions, i.e. ions whose degree of ionization is equal to 1, or even multi-charge ions, i.e. ions whose degree of ionization is greater than 1. BRIEF DESCRIPTION OF DRAWINGS

[0023] Other characteristics and advantages of the application will appear more clearly on reading the following detailed description of an example of embodiment of the method according to the application, given by way of illustration and not limitation with reference to the appended drawings in which:

[0024] - Figure 1 is a schematic view of a single-charge or multi-charge ion source of the ECR electron cyclotron resonance type according to the prior art;

[0025] - Figure 2A and 2B are perspective views illustrating the steps of a method for structuring a decorative pattern in the surface of an object made of at least partially transparent material by means of a multi-charge ion beam according to the application;

[0026] - Figure 3is a cross-sectional view through the thickness of an object made of sapphire bombarded by means of a nitrogen ion beam;

[0027] - Figure 4 is a perspective view of a watch case in which the decorative pattern embodying the teachings of the method according to the application in its various elements;

[0028] - Figure 5A and 5B illustrate two different embodiments of the method according to the application for illuminating a decorative pattern in the top surface of a watch glass;

[0029] - Figure 6 illustrate a mask embodied in the form of a metal sheet in which openings have been cut whose contours correspond to the pattern to be structured;

[0030] - Figure 7A is a bottom view of the watch case shown in Figure 4 ;

[0031] - Figure 7B is a top view of the dial in which the decorative pattern has been structured as well as the hour scale constituting the technical pattern, and

[0032] - Figure 7C is a representation of a bridge of a timepiece movement in which the decorative pattern has been structured using the method according to the application. DETAILED DESCRIPTION

[0033] DETAILED DESCRIPTION OF AN EMBODIMENT OF THE INVENTION

[0034] The present invention stems from the inventive general idea of using a single-charge or multi-charge ion beam to selectively bombard the surface of an object made of at least partially transparent material via a mask to create a three-dimensional technical or decorative pattern in this object. The term single-charge or multi-charge ion beam refers to a beam comprising ions accelerated under the action of an electric field and exhibiting all the same degree of ionization or even exhibiting different degrees of ionization. The ions impact the surface of the object and penetrate therein to a certain depth to create cavities or interstitial defects whose properties, in particular optical properties, are different from those of the material not affected by the ion bombardment. It is understood that the depth of penetration of the ions into the object and the size of the defects created depend on a number of factors, among which can be mentioned the properties of the material making up the at least partially transparent object, the mass of the ions, the degree of ionization of the ions or even the speed at which the ions impact the surface of the object. It is also understood that the characteristics of these defects, i.e. their size and the depth they reach under the surface of the object, determine their physical properties, in particular optical properties. Even in some cases, the three-dimensional technical or decorative pattern structured in the object made of at least partially transparent material according to the method of the invention is not perceptible under normal use conditions and its presence can only be revealed by exploiting the hydrophilic properties of the pattern when the user sprays a small amount of vapor on the surface of the object in which the pattern has been structured. In other cases, the defects forming the desired technical or decorative pattern act as light scattering centers to make the pattern perceptible even under normal brightness conditions and more clearly highlighted when the object in which this pattern has been structured is illuminated by means of a light source.

[0035] There are many ion implantation techniques. Within the scope of the present application, single-charge or multi-charge ion sources of the ECR (Electron Cyclotron Resonance) type are of particular interest. Very schematically and as shown in the attached Figure 1 diagram of the ECR ion source according to the prior art, the ECR ion source, globally designated by the general reference numeral 1, comprises an implantation section 2 (in which a volume of gas 4 to be ionized and microwaves 6 are introduced), a magnetic confinement section 8 (in which a plasma 10 is created) and an extraction section 12 for extracting and accelerating the ions of the plasma 10 by means of an anode 12a and a cathode 12b (between which a high voltage is applied). At its output, the ECR ion source 1 produces an ion beam 14 which, depending on the requirements, can comprise ions all exhibiting the same degree of ionization or even produced from a mixture of ions exhibiting different degrees of ionization. In a first aspect, the ion acceleration voltage is between 1 kV and 1000 kV and the implantation dose is between 1.10 15 ions.cm -2 and 10 18 ions.cm -2 .

[0036] One example of an object made of crystalline transparent material and in which a decorative pattern has been manufactured according to the method of the invention is shown in Figure 2A and2B The entire piece, identified by the general reference numeral 16, is made of sapphire crystal and intended to enclose the case from the top. This crystal 16 comprises a top surface 18a and a bottom surface 18b extending away from the top surface 18a and connected to its outer edge along an edge 20 on the top surface 18a. Figure 2A and 2B In the example shown, a structured decorative pattern 22, in this case the Greek letter Ω, has been chosen for the top surface 18a of the glass 16. Obviously, this example is given by way of illustration only and not as a limitation, and it is to be understood that it is possible to have a structured pattern on the bottom surface 18b of the glass 16, or even to have structured decorative patterns on both the top surface 18a and the bottom surface 18b of the glass 16 respectively.

[0037] By way of example only, the sapphire glass 16 processed according to the method of the present invention is planar. Its top surface 18a and bottom surface 18b extend parallel to each other, separated by a thickness e = 2 mm. An opening 25, whose outline corresponds to the desired decorative pattern 22, is defined by masking the top surface 18a of the glass 16 with a mask 24, and the glass 16 is bombarded by an ion beam 14 composed of nitrogen ions with an ionization degree of +1 to +3. Referring to the above... Figure 1 The described type of ECR ​​ion source 1 generates an ion beam 14. The ion acceleration voltage used is 37.5 kV and the ion implantation dose is 0.5 × 10⁻⁶. 16 ions.cm -2 It was observed that, under the experimental conditions detailed above, the decorative pattern 22 was difficult to detect under normal ambient light conditions, and its presence was only revealed when the user blew steam toward the top surface 18a of the glass 16. In the applicant's opinion, this phenomenon is explained as the area of ​​the glass 16 in which the structured decorative pattern 22 is located exhibiting hydrophilic behavior. Therefore, when steam falls onto the top surface 18a of the glass 16, a thinner water layer with lower surface tension is formed in the hydrophilic area of ​​the structured decorative pattern 22 compared to the rest of the top surface 18a. The water layer at the location of the structured decorative pattern 22 thus has lower optical diffusion and therefore becomes perceptible to the user.

[0038] Referring to the same glass 16 described above, a second example of an embodiment of the method according to the invention is provided. The structured decorative pattern 22 in the top surface 18a of the glass 16 remains unchanged; only the ion bombardment parameters are altered. In this case, the glass 16 is bombarded by an ion beam 14 composed of nitrogen ions with ionization degrees of +1 to +3. Referring to the above... Figure 1 The described type of ECR ​​ion source 1 generates an ion beam 14. The ion acceleration voltage used is 37.5 kV and the ion implantation dose is 1.10. 17 ions.cm -2It is observed that, under the experimental conditions detailed above, the decorative pattern 22 structured in the glass 16 is visible to the naked eye during the day and is more clearly highlighted when the glass 16 in which the decorative pattern 22 has been structured is illuminated by means of a light source. It is understood that the defects forming the decorative pattern 22 act as light scattering centres, so that the decorative pattern 22 is perceptible even under normal luminosity conditions.

[0039] In the two examples detailed above, it is seen that it is possible, using the same ions and accelerating them with the same voltage, to vary the physical properties, in particular the optical properties, of the resulting decorative pattern 22 by varying only the injected ion dose. It is indeed true that, at an ion implantation dose of 0.5*10 16 ions.cm -2 the decorative pattern 22 is barely perceptible to the naked eye under normal lighting conditions and its presence is revealed by spraying steam to take advantage of its hydrophilic properties. In the second case, the ion implantation dose is 1*10 17 ions.cm -2 and it is possible to create defects in the glass 16 which act as light scattering centres, so that the decorative pattern 22 is perceptible even during the day. These differences in the physical behaviour of the pattern structured in the object made of at least partially transparent material are explained by the fact that the size and the concentration per unit volume of the defects present in the object under the effect of ion bombardment are different.

[0040] Figure 3 is a cross-sectional view in the thickness of a sapphire sample 26 bombarded by means of a beam of nitrogen ions. On examining this figure, it is observed that the sapphire sample 26 exhibits the following series of layers from the surface inwards:

[0041] • firstly a very thin surface layer 28, generally of the order of 7 to 15 nanometres, which is surprisingly little or not at all affected by the ion bombardment and which retains its crystalline structure. An attempt is made to explain this phenomenon, namely that when the nitrogen ions strike the surface of the sapphire sample 26, the nitrogen ions penetrate the sapphire sample 26 from the path of least energy and pass through the unit cells of the crystalline silicon structure.

[0042] • then a first amorphous layer 30, generally of the order of 50 to 60 nanometres in thickness. This first amorphous layer 30 is characterised by cavities 32, the size of which decreases as the nitrogen ions penetrate more deeply into the thickness of the sapphire sample 26. This phenomenon is explained by the fact that the deeper the nitrogen ions penetrate into the thickness of the sapphire sample 26, the lower their speed and the less damage they cause to the crystalline structure of the sapphire sample 26.

[0043] • then a second amorphous layer 34, free of cavities, of the order of 20 to 30 nanometres in thickness. The crystalline structure of the sapphire is thus highly disturbed by the ion bombardment to a depth of the order of 80 to 100 nanometres below the surface of the sapphire sample 26.

[0044] • Finally, a final layer 36 of thickness of the order of 50 to 60 nm, the crystallinity of which is disturbed but does not make the sapphire amorphous throughout its volume.

[0045] • Outside this final layer 36, sapphire is found in the volume 38.

[0046] In Figure 4 , only the watch case 40 is shown by way of example, some of the components of which have been treated according to the method of the application. They consist of the bezel 42, the middle 44, the crown 46, the corrector 47 and the bracelet link 48. These various elements are embodied according to the method of the application by means of an object made of at least partially transparent material, in which the structure is crystalline, semi-crystalline or even amorphous and in which the decorative pattern 22 is engraved by means of a single-charge or multi-charge ion beam.

[0047] The glass 16 with the above-mentioned decorative pattern 22 extends over the dial 50 and is closed from the top by the watch case 40 (see Figure 5A and 5B ). This is an alternative embodiment in which the defects created by ion bombardment form the decorative pattern 22 that scatters light. In order to further enhance this decorative pattern 22, it is envisaged to illuminate the glass 16 by means of a light source 52. This light source 52 can be arranged facing the edge 20 of the glass 16. The light produced by the light source 52 thus penetrates into the thickness of the glass 16 and extracts from the glass 16 towards the observer 54 a portion of the light scattered by the defects forming the decorative pattern 22, so that the decorative pattern 22 shines and is very visible. The light source 52 can also be arranged between the dial 50 and the glass 16. The light produced by the light source 52 penetrates directly into the glass 16 or is first reflected onto the dial 50, then partly scattered by the defects forming the decorative pattern 22 towards the outside of the watch case 40, so that this decorative pattern 22 is perfectly visible.

[0048] Figure 6 is a diagrammatic representation of a mask embodied in the form of a metal sheet 56 in which openings 25 have been cut, the contours of which correspond to the decorative pattern 22 to be structured.

[0049] Figure 7A is Figure 4 a bottom view of the watch case 40 shown in. This watch case 40 is closed by a back cover 58 made of at least partially transparent crystalline, semi-crystalline or amorphous material, in which the decorative pattern 22 is structured according to the method of the application.

[0050] Figure 7B is a top view of the dial 50 in which the decorative pattern 22 has been structured according to the method of the application. By adopting the method according to the application, a technical pattern 60 has also been structured in the dial 50, in this case the four-hour scale at 12 o'clock, 3 o'clock, 6 o'clock and 9 o'clock.

[0051] Figure 7C is a representation of a bridge 62 of a watch movement, in which a decorative pattern 22 has been structured using the method according to the application.

[0052] It is clear that the application is not limited to the above-described embodiments and that the person skilled in the art can envisage various modifications and simple alternative embodiments without departing from the scope of the application as defined in the attached claims.

[0053] It should in particular be noted that the mask can exist in the form of a metal sheet in which the contours of the pattern to be structured have been cut, this metal sheet then being fixed to the surface of the object in which the pattern is to be structured. Similarly, the mask can also be made of ceramic. The mask can also be obtained by selective deposition (such as ink-jet printing) of a masking material in the locations of the top surface and / or the bottom surface of the object in which the pattern is to be structured that are to be covered by the mask. The mask can also be obtained by deposition of a layer of masking material on the whole of the top surface and / or the bottom surface of the object in which the pattern is to be structured. This layer of masking material is then ablated in the thickness of the object at the locations of the pattern to be structured, for example by means of a laser beam. The mask can also be obtained by means of a layer of photosensitive resin (for example sensitive to ultraviolet radiation) and structured by means of a light source (for example ultraviolet). In any case, the mask must exhibit mechanical properties such that the ion beam cannot successfully etch the surface of the object made of at least partially transparent material in which the pattern is to be structured, in the locations covered by the mask.

[0054] The term transparent material means a material that is transparent to light, i.e. that allows the clear recognition of an object through its thickness.

[0055] The term object made of at least partially transparent material means an object made of a block of material having at least one transparent zone (in which a technical pattern or a decorative pattern is to be structured according to the method of the application), the other zones of the object being optionally opaque.

[0056] The term glass means an amorphous solid exhibiting a glass transition phenomenon.

[0057] The at least partially transparent material of which the object structured with a technical pattern or a decorative pattern according to the method of the application can be chosen from crystalline, semi-crystalline or amorphous. Among the crystalline materials that are very well suited to the needs of the application, mention can be made of sapphire, ruby or diamond. The use of the natural forms of these precious stones can be envisaged, but it should be understood that the use of sapphire, ruby or diamond obtained synthetically is more realistic in the industrial production field. Among the amorphous materials, one example of a material that is very well suited to the needs of the application is mineral glass. Further examples of semi-crystalline or amorphous materials that are suitable for implementing the method of the application are polypropylene homopolymers, polypropylene copolymers and polyethylene terephthalate, which are semi-crystalline transparent thermoplastic materials, and crystalline polystyrene and polymethyl methacrylate, which are amorphous thermoplastic materials.

[0058] Label sheet

[0059] 1. ECR ion source

[0060] 2. Injection section

[0061] 4. Gas volume to be ionized

[0062] 6. Microwave

[0063] 8. Magnetic confinement section

[0064] 10. Plasma

[0065] 12. Extraction section

[0066] 12a. Anode

[0067] 12b. Cathode

[0068] 14. Ion beam

[0069] 16. Glass

[0070] 18a. Top surface

[0071] 18b. Bottom surface

[0072] 20. Edge

[0073] 22. Decorative pattern

[0074] e. Thickness

[0075] 24. Mask

[0076] 25. Opening

[0077] 26. Sapphire sample

[0078] 28. Surface layer

[0079] 30. First amorphous layer

[0080] 32. Cavity

[0081] 34. Second amorphous layer

[0082] 36. Final layer

[0083] 38. Volume

[0084] 40. Watchcase

[0085] 42. Bezel

[0086] 44. Middle

[0087] 46. Crown

[0088] 47. Corrector

[0089] 48. Wristlet Link

[0090] 50. Dial

[0091] 52. Light Source

[0092] 54. Observer

[0093] 56. Metal Sheet

[0094] 58. Back

[0095] 60. Technical Pattern

[0096] 62. Bridge

Claims

1. A method for structuring a decorative pattern or technical pattern (22, 60) in the thickness of an object made of at least partially transparent amorphous, semi-crystalline, or crystalline material, said object comprising a top surface (18a) and a bottom surface (18b) extending away from the top surface (18a), said method comprising the steps of: providing a mask (24) defining at least one opening (25) to at least one of the top surface (18a) or bottom surface (18b) of said object, the outline of the opening corresponding to the outline of the decorative pattern or technical pattern (22, 60) to be structurated, said mask (24) covering at least one top surface (18a) of said object at a location where structuration is not desired. The method further includes the step of: structuring decorative patterns or technical patterns (22, 60) through at least one opening (25) of a mask (24) by means of a single-charged or multi-charged ion beam (14), the mechanical properties of which are sufficient to prevent the ions of the ion beam (14) from etching at least one top surface (18a) or bottom surface (18b) of the object at the location where the top surface (18a) or bottom surface (18b) is covered by the mask (24), wherein the ions of the ion beam penetrate the object and create cavities or void-type defects from a very short distance from the surface of the object to a depth of 200 to 500 nanometers.

2. The method according to claim 1, characterized in that... The single-charged or multi-charged ion beam (14) is generated by a single-charged or multi-charged ion source of the ECR electron cyclotron resonance type.

3. The method according to claim 1, characterized in that... The object is made of natural or synthetic sapphire, ruby ​​or diamond.

4. The method according to claim 2, characterized in that... The object is made of natural or synthetic sapphire, ruby ​​or diamond.

5. The method according to claim 1, characterized in that... The object is made of a semi-crystalline organic material.

6. The method according to claim 2, characterized in that... The object is made of a semi-crystalline organic material.

7. The method according to claim 1, characterized in that... The object is made of mineral glass or amorphous organic material.

8. The method according to claim 2, characterized in that The object is made of mineral glass or amorphous organic material.

9. The method according to any one of claims 1 to 5, characterized in that... The mask (24) is a sheet of material in which the outline of a decorative pattern or technical pattern (22, 60) has been cut out, and then the sheet of material is fixed to the top surface (18a) and / or bottom surface (18b) of the object in which the decorative pattern or technical pattern (22, 60) is to be structured.

10. The method according to claim 9, characterized in that... The mask (24) is made of metal or ceramic.

11. The method according to any one of claims 1 to 5, characterized in that The mask (24) is obtained by selectively depositing masking material at locations on the top surface (18a) and / or the bottom surface (18b) where the top surface (18a) and / or the bottom surface (18b) are not hit by the ion beam (14).

12. The method according to claim 11, characterized in that... The mask is made by inkjet printing.

13. The method according to any one of claims 1 to 5, characterized in that... The mask (24) is obtained by depositing a masking material layer on the top surface (18a) and / or bottom surface (18b) on which the mask (24) is to be structured, and then ablating the masking material layer at the location of the top surface (18a) and / or bottom surface (18b) to be structured.

14. The method according to claim 13, characterized in that... The masking material layer is ablated using a laser beam.

15. The method according to claim 14, characterized in that... The masking material layer is an ultraviolet radiation sensitive resin structured with the aid of a UV source.

16. An object obtained by performing the method according to any one of claims 1 to 15.

17. The object according to claim 16, characterized in that... Its composition is as follows: • Glass (16), dial (50), or bezel (42) for watches; • The waist (44) or the case back (58) of the watch case (40); • The crown (46), the corrector (47), or the bridges (62) of the watch movement, or • Wristband connection for watches or jewelry (48).

18. The object of claim 17, wherein the clock is a wristwatch.

19. A portable object comprising at least one element selected from glass (16), dial (50), bezel (42), girdle (44), case back (58), crown (46), corrector (47), plate (62), and wristband connection (48), said at least one element being made of at least partially transparent amorphous, semi-crystalline, or crystalline material and structured according to the method of any one of claims 1 to 15, said element comprising at least one top surface and at least one bottom surface interconnected by edges, said portable object further comprising a light source (52) arranged to illuminate said element via its bottom surface or via its edges.

20. The portable object according to claim 19, wherein it is a watch case (40).

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