Substrate processing equipment for processing a substrate

Abstract

The present disclosure relates to a substrate processing device having a first reactor and a second reactor, each reactor being configured with an elevator to transfer a boat with a substrate to the reactor. The device has a boat transfer device to transfer the boat with a substrate between a substrate loading station, a first elevator and / or a second elevator and a cooling station. The substrate loading station and the cooling station may be arranged on opposite sides of the first elevator and the second elevator.

Description

Technical Field

[0001] The present disclosure generally relates to a substrate handling apparatus for processing a plurality of substrates. More specifically, the present disclosure relates to a substrate handling apparatus comprising a first reactor and a second reactor for processing a plurality of substrates in a boat. The apparatus may have a first elevator and a second elevator to transfer a boat having substrates to and from the first reactor and the second reactor, respectively. The apparatus may have a substrate handling robot constructed and arranged to transfer substrates between the boat and a substrate cassette. Background Art

[0002] A cassette containing a plurality of substrates may be transferred in a substrate processing apparatus by a cassette handler that may transfer cassettes between cassette access ports, cassette stations, and / or storage devices. The storage device may include a cassette storage carousel for storing a plurality of cassettes. A substrate handling robot may be constructed and arranged to transfer substrates from cassettes at a cassette station to a substrate boat to fill the boat with a plurality of substrates.

[0003] To improve productivity, the substrate processing apparatus may be provided with a first reactor and a second reactor. The first elevator or the second elevator may move the filled boat into the first reactor or the second reactor respectively to process the substrate. After processing in the reactor, the boat may be lowered and cooled by the corresponding elevator. After cooling, the processed substrate may be transferred from the boat to the cassette by a substrate handling robot.

[0004] Since there is limited space in a cleanroom manufacturing facility where substrate processing equipment may be located, it may be beneficial to design the width of the substrate processing equipment to be as small as possible. The limited width of the substrate processing equipment may make it possible to stack more processing equipment side by side, next to each other in a row. Summary of the invention

[0005] This summary is provided to introduce a series of concepts in a simplified form. These concepts are described in more detail below in the detailed description of the example embodiments. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

[0006] Depending on the objectives, it may be necessary to provide a substrate processing apparatus having a limited width.

[0007] Therefore, a substrate processing device can be provided, which includes a first reactor and a second reactor for processing a plurality of substrates in a boat. The device may have a first elevator and a second elevator to transfer a boat with a substrate to and from the first reactor and the second reactor, respectively. The device may have a substrate handling robot, which is constructed and arranged to transfer substrates between the boat and the substrate cassette. The device may include a boat transfer device with a boat transfer device for transferring a boat with a substrate between the following items: a substrate loading station, where the substrate can be transferred to the boat with the substrate handling robot; the first elevator and / or the second elevator; and a cooling station, which is constructed and arranged to cool the boat with the processed substrate. The device may be constructed and arranged with the substrate loading station and the cooling station on opposite sides of the first elevator and the second elevator.

[0008] In case the substrate loading station and cooling station are located on opposite sides of the first and second elevators, the cooling station may not increase the width of the equipment. The limited width may make it possible to stack more processing equipment side by side, next to each other in a row in a clean room manufacturing facility.

[0009] For the purpose of summarizing the present invention and the advantages achieved over the prior art, certain objects and advantages of the present invention are described above. Of course, it should be understood that not all of these objects or advantages may be achieved according to any particular embodiment of the present invention. Thus, for example, those skilled in the art will recognize that the present invention may be implemented or carried out in a manner that achieves or optimizes one advantage or group of advantages as taught or suggested herein but does not necessarily achieve other objects or advantages as may be taught or suggested herein.

[0010] All of these embodiments are intended to fall within the scope of the invention disclosed herein. These and other embodiments will become apparent to those skilled in the art from the following detailed description of certain embodiments with reference to the accompanying drawings, the invention not being limited to any particular embodiment disclosed. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] While the specification concludes with claims that particularly point out and distinctly claim what are regarded as embodiments of the present invention, advantages of the embodiments of the present disclosure may be more readily ascertained from the description of certain examples of the embodiments of the present disclosure when read in conjunction with the accompanying drawings, in which:

[0012] Figure 1A A schematic top view showing an example of a furnace according to an embodiment is shown.

[0013] Figure 1B Show Figure 1A A magnification of a part.

[0014] Figure 1C Show Figure 1A A side view of a portion of an embodiment of the present invention.

[0015] Figure 2 A schematic top view of an example of a furnace according to another embodiment is shown. DETAILED DESCRIPTION

[0016] Although certain embodiments and examples are disclosed below, it will be understood by those skilled in the art that the invention extends beyond the embodiments and / or uses specifically disclosed herein and obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the invention disclosed herein should not be limited by the specific disclosed embodiments described below. The illustrations presented herein are not intended to be actual views of any particular material, structure, or device, but are merely idealized illustrations used to describe embodiments of the present disclosure.

[0017] As used herein, the term "substrate" or "wafer" may refer to any underlying material or materials that may be used or on which a device, circuit, or film may be formed. The term "semiconductor device structure" may refer to any portion of a processed or partially processed semiconductor structure that contains or defines at least a portion of an active or passive component of a semiconductor device to be formed on or in a semiconductor substrate.

[0018] Figures 1A to 1C An example of a substrate processing apparatus such as a furnace 1 according to an embodiment is shown. The furnace 1 may include a furnace having two side walls 5 (see Figure 1A )A housing 2 having a front wall 4 and a rear wall 6 connected thereto.

[0019] The furnace 1 may include a storage device (not shown), such as a cassette storage carousel for storing a plurality of wafer cassettes C, each of which contains a plurality of substrates. The cassette storage carousel may include a plurality of platform stages for supporting the cassettes. The platform stages may be connected to a central support mounted to rotate about a vertical axis. Each platform stage is configured to accommodate a plurality of cassettes C. A drive assembly may be operably connected to the central support so that the central support rotates about the vertical axis with the plurality of platform stages.

[0020] The furnace 1 may have a cassette handler 7 having a cassette handler arm 9 configured to transfer cassettes C between a cassette storage carousel, a cassette access port 11 adjacent to the front wall 4 of the housing 2 of the furnace 1, and / or a cassette station 15. The cassette handler 7 may include a lifting mechanism for reaching cassettes at different heights. Each platform level for storing cassettes may have a cutout therein that is sized and shaped to allow the cassette handler arm 9 to pass vertically therethrough and to allow the platform level to support the cassettes C thereon.

[0021] An inner wall 19 may be provided separating the cassette handler 7 from the substrate handling robot 35. The wall may have a closable substrate access opening 33 adjacent to the cassette station 15, which may be constructed and arranged to also open the cassette C. More information about the closable substrate access opening 33 for opening the cassette may be obtained from U.S. Pat. No. 6,481,945, which is incorporated herein by reference. The cassette station 15 may be provided with a cassette turntable 16 to rotate and / or press the cassette C against the closable substrate access opening 33.

[0022] The substrate processing apparatus may include a substrate handling robot 35 provided with a substrate handling arm 36 to transfer substrates. The substrate may be transferred from a cassette C located on the cassette station 15 to a substrate boat B at a substrate loading station 38 through a closable substrate access opening 33, and vice versa. The furnace may include a substrate handling chamber 37 in which the substrate handling robot 35 is accommodated.

[0023] The furnace 1 may be provided with a first reactor and a second reactor 45 for processing a plurality of substrates. The use of two reactors may increase the productivity of the furnace 1.

[0024] The housing 2 may have a first and a second side wall 5 extending over the full length of the furnace 1. The distance between the side walls 5 of the furnace, which may define the width of the device, may be between 1.3 and 2 meters, preferably between 1.5 and 1.8 meters, and most preferably between 1.6 and 1.7 meters, for example about 1.65 meters. The maintenance of the furnace 1 may be performed from the rear side 6 or the front side 4 of the furnace, so that it may not be necessary to provide a door in the side wall 5. Therefore, the side wall 5 may be configured without a main door for maintenance. Therefore, a plurality of furnaces 1 may be positioned side by side in a clean room of a semiconductor manufacturing plant. The side walls 5 of adjacent furnaces may therefore be positioned very close to, or even pressed against each other.

[0025] Advantageously, the front side 4 of the plurality of furnaces may form a wall which may interface with a cassette conveyor in a very clean environment of a so-called "clean room" with very stringent requirements on particles. The back side 6 of an adjacent furnace may interface with a maintenance access (which has less stringent requirements on particles than the front side 4). The maintenance access may be used for maintenance from the back side of the furnace 1.

[0026] Figure 1B Show Figure 1A a top view of a detail of a portion of Figure 1C Show Figure 1B Side view of a part of. Figure 1B and 1CIt is shown that the first reactor and the second reactor 45 may be provided with a first elevator and a second elevator 46, respectively. The reactor 45 and the elevator 46 may be disposed in a processing module 49. The elevator may be constructed and arranged to transfer a boat having a plurality of substrates between a lower region 53 of the processing module 49 and the reactor 45. Each elevator 46 may include a boat support arm 48 having a bearing surface configured to serve as a boat support and movable in a vertical direction.

[0027] A gate valve 63 may be provided between the substrate handler 35 and the lower region of the processing module 49 to form a microenvironment in the lower region. The substrate loading station 38 may be constructed and arranged with a boat support 54 to support a boat B with a substrate in the processing module. A cooling station 47 constructed and arranged with a boat support 54 to support a boat with a substrate to cool the boat with a processed substrate may also be provided in the processing module 49. The boat support 54 may be constructed and arranged to be stationary in a horizontal plane.

[0028] A boat transfer device 50 may be provided to transfer boats with substrates between the first and second elevators 46, the substrate loading station 38, and the cooling station 47. The boat transfer device 50 may be constructed and arranged to transfer the boat B between a plurality of boat positions within the lower region while keeping the boat B vertical. The transfer may be substantially horizontal.

[0029] The boat transfer device 50 may include two boat transfer robots, one for each reactor 45. Each boat transfer robot may be provided with two boat transfer arms 51. The boat transfer arm 51 may be rotatable to horizontally transfer the boat between the substrate loading station 38, the elevator 46 and / or the cooling station 47. The substrate loading station 38, the elevator 46 or the cooling station 47 may be moved vertically for a short distance of, for example, several centimeters to pick up the boat or put the boat from the boat transfer arm 51 to the holder. The boat support 54 of the substrate loading station 38 and the cooling station 47 may be provided with a movable top surface 52 to pick up the boat or put down the boat B. The boat transfer arm 51 may be provided with a holder to hold the boat. The boat B may be held vertically by the holder. Below the boat B, a reactor door 55 may be provided, which fits in the reactor opening 56 when the boat B is moved into the reactor 45. A plurality of boats, for example 2, 3 or 4 boats B, can be used simultaneously in the furnace 1 .

[0030] Alternatively, the boat transfer arm 51 may be vertically moved a short distance, for example, several centimeters, to pick up a boat or place the boat at the substrate loading station 38 , the elevator 46 , or the cooling station 47 .

[0031] Alternatively, the boat transfer device 50 may include three or four holders for the boat. By using more than two holders per reactor, it is possible to keep the boat on the holders of the substrate loading station 38 and the cooling station 47, so that a boat support may not be required.

[0032] Alternatively, the boat transfer arm 51 may be constructed and arranged to horizontally shift the boat between the substrate loading station 38, the elevator 46, and the cooling station 47. The holder of the boat transfer arm 51 may have a U-shape to hold the boat. More information about the boat transfer arm constructed and arranged to shift the boat may be obtained from U.S. Patent No. 7,198,447, which is incorporated herein by reference.

[0033] The substrate loading station 38 and the cooling station 47 may be constructed and arranged on opposite sides of the first and second elevators 46 to keep the width of the furnace 1 limited. For example, the substrate loading station 38 may be constructed and arranged in front of the first and second elevators 46, and the cooling station 47 may be constructed and arranged behind the first and second elevators 46 to keep the width of the furnace 1 limited.

[0034] Cooling station 47 can be used to cool the boat with the hot substrate just processed. Cooling station 47 can be provided with gas extractor 60, and the gas extractor is constructed and arranged to extract hot gas to cool the substrate. Cooling station 47 can be provided with gas inlet 58 to provide gas to cooling station 47. The equipment may include two cooling stations 47. Gas inlet 58 and gas extractor 60 can be fluidly connected to pump to generate airflow on substrate at cooling station. Heat exchanger can be set to cool airflow and accelerate the cooling of substrate in cooling accommodation area. Gas inlet 58 and gas extractor 60 can be constructed and arranged to generate horizontal airflow to cool substrate. Or, gas inlet 58 and gas extractor 60 can be constructed and arranged to generate downward airflow through microenvironment to reduce particle contamination.

[0035] The substrate processing apparatus in top view may be configured in a generally U-shape (see Figure 1A ). The boat transfer device 50 and the reactor 45 can be constructed and arranged in the bottom portion of the U-shape. The maintenance area 43 can be constructed and arranged between the legs of the U-shape. The distance between the two legs of the U-shape can be between 60 and 120 cm, more preferably between 80 and 100 cm and most preferably about 90 cm to allow enough space for maintenance workers. A rear door can be provided between the legs of the U-shape to close the maintenance area 43 when not in use. The general U-shape can also include a V-shape.

[0036] The apparatus may be constructed and arranged to allow maintenance of the reactor 45 from a maintenance area 43, with maintenance workers maintaining both the first reactor and the second reactor. For example, maintenance is performed on the heating wires, heating sensors, and / or the process gas interfaces (outlets and / or inlets) of the reactor 45 by maintenance workers. The two reactors 45 may be constructed and arranged adjacent to the same maintenance area 43 to allow maintenance of the two reactors 45 from the same maintenance area 43. A maintenance door 41 may be provided to allow maintenance. A maintenance door may be provided behind the cooling station to allow maintenance from the back of the tool.

[0037] Therefore, a maintenance worker may not need to enter the housing 2 of the furnace 1 to perform maintenance work on the reactor 45. Therefore, the risk of injury to the maintenance worker and / or contamination of the lower area and / or the reactor 45 can be minimized. Performing maintenance outside the housing can also increase the speed and / or accuracy of maintenance. Since the same maintenance area 43 is used for two reactors 45, the total occupied area of ​​the furnace 1 including the maintenance area 43 can be reduced.

[0038] The process module 49 may be provided with a maintenance door 41 that can be opened in the direction of the maintenance area 43. Two process modules 49 may be provided with separate maintenance doors 41 to allow maintenance workers to maintain each reactor 45 from the same maintenance area 43. The maintenance door 41 of the process module 49 may also allow maintenance of the lower area of ​​the furnace from the same maintenance area 43 to maintain the boat transfer device 50, the cooling station 47, the gas inlet 58, the gas extractor 60, the gate valve 63, the elevator 46, the substrate loading station 38 and / or the boat B.

[0039] Alternatively, two maintenance doors may be provided per process module 29: a top maintenance door for accessing the reactor 45, and a bottom maintenance door for accessing the lower region 53 of the furnace 1.

[0040] The gate valve 63 may be disposed between the substrate handling chamber 37 and the process module 49. The gate valve 63 may be closed toward the substrate handling robot 35 during maintenance so that one of the two process modules may continue to operate while the substrate handling robot 35 is maintained via the other process module.

[0041] Maintenance on one of the reactors 45 may not interfere with the other of the reactors 45 because both are constructed as separate units. The gate valve 63 may be closed during maintenance of one reactor so that the other reactor and the substrate handling robot 35 may continue to operate.

[0042] Reactor 45 may have process gas interfaces (outlet and / or inlet) that may be connected to a gas exhaust pipe or process gas delivery system. The process gas interfaces may be located adjacent to maintenance area 43 to make them easily accessible during maintenance.

[0043] The process gas delivery system may be disposed (in part) in a gas cabinet 67 constructed and arranged to provide process gases to the first and / or second reactors 45. The gas cabinet may be disposed near the top of the legs of the U-shape. Placing the gas cabinet near the top of the U-shape allows for easy access for maintenance. In addition, if the gas cabinet needs to be adjusted or enlarged, such a location provides flexibility because there is space on the back side of the equipment where critical components such as substrate handling robots or cassette handlers are not present.

[0044] The gas exhaust pipe may be constructed and arranged to remove process gas from at least one of the first reactor and the second reactor, and may also be disposed near the top of the legs of the U. Providing the gas exhaust pipe in the legs of the U allows for easy access for maintenance. The gas exhaust pipe may be provided with a pump and a scrubber that may require periodic maintenance. In addition, if the gas exhaust pipe needs to be adjusted or extended, such a location provides flexibility because there is space on the back side of the apparatus where critical components such as a substrate handling robot and / or a cassette handler are not present.

[0045] The substrate handling chamber 37 housing the substrate handling robot 35 may be a mini-environment enclosure. The substrate handling chamber 37 may be provided with a gas inlet 39 and a gas extractor 41, which may be fluidly connected to a pump to provide a gas flow through the substrate handling chamber 37. The gas inlet 39 and the gas extractor 41 may be constructed and arranged to form a horizontal gas flow in the substrate handling chamber 37.

[0046] Alternatively, the gas inlet 39 may be arranged below the gas extractor 41 to create a (partial) downward flow in the substrate handling chamber 37. Downward flow may be preferred because particle contamination may be minimized with downward flow.

[0047] The substrate handling robot 35 may be constructed and arranged to transfer the substrate in a first direction toward one of the process modules 49 and in a second direction toward another of the process modules 49. The first direction and the second direction may have an angle of 90 to 180, preferably 110 to 130, and most preferably about 120 degrees to each other.

[0048] The substrate handling robot 35 may be constructed and arranged to transfer the substrate to the cassette station 15 ( Figure 1A The first, second and third directions may have an angle of 90 to 180, preferably 110 to 130 and most preferably about 120 degrees to each other.

[0049] Figure 2A schematic top view of an example of a furnace according to another embodiment is shown, which may include a housing 2 having a front wall 4 and a rear wall 6 connected by two side walls 5. The furnace 1 may have a cassette handler 7 provided with a cassette handler arm 9 configured to transfer cassettes C between a cassette storage carousel, a cassette access port 11 adjacent to the front wall 4 of the housing 2 of the furnace 1, and / or a cassette station 15. The cassette handler 7 may include a lifting mechanism for reaching cassettes at different heights.

[0050] An inner wall 19 may be provided separating the cassette handler 7 from the substrate handling robot 35. The wall may have a closable substrate access opening 33 adjacent to the cassette station 15, which opening may be constructed and arranged to also open the cassette C. The cassette station 15 may be provided with a cassette turntable 16 to rotate and / or press the cassette C against the closable substrate access opening 33.

[0051] The substrate handling apparatus may include a substrate handling robot 35 provided with a substrate handling arm 36 to transfer substrates. The substrate may be transferred from a cassette C located on the cassette station 15 to a substrate boat B at a substrate loading station 38 through a closable substrate access opening 33, and vice versa. The substrate loading station 38 may be constructed and arranged with a boat support to support a boat with a substrate. The furnace may include a substrate handling chamber 37, in which the substrate handling robot 35 is accommodated.

[0052] The housing 2 may have a first and a second side wall 5 extending over the full length of the furnace 1. The distance between the side walls 5 of the furnace, which may define the width of the device, may be between 1.3 and 2 meters, preferably between 1.5 and 1.8 meters, and most preferably between 1.6 and 1.7 meters, for example about 1.65 meters. The maintenance of the furnace 1 may be performed from the rear side 6 or the front side 4 of the furnace, so that it may not be necessary to provide a door in the side wall 5. Therefore, the side wall 5 may be configured without a main door for maintenance. Therefore, a plurality of furnaces 1 may be positioned side by side in a clean room of a semiconductor manufacturing plant. The side walls 5 of adjacent furnaces may therefore be positioned very close to, or even pressed against each other.

[0053] Advantageously, the front side 4 of the plurality of furnaces may form a wall which may interface with a cassette conveyor in a very clean environment of a so-called "clean room" with very stringent requirements on particles. The back side 6 of an adjacent furnace may interface with a maintenance access (which has less stringent requirements on particles than the front side 4). The maintenance access may be used for maintenance from the back side of the furnace 1.

[0054] The furnace 1 may be provided with a first reactor and a second reactor ( Figure 2 1b and 1c), and is provided with a first elevator and a second elevator 46, which are configured to be in the lower area ( Figure 21b and 1c) and a reactor to transfer a boat having a plurality of substrates. Each elevator 46 may include a boat support arm 48 having a bearing surface configured to serve as a boat support and movable in a vertical direction. The reactor and elevator 46 may be disposed in a processing module.

[0055] A cooling station 47 constructed and arranged with a boat support to support a boat having substrates to cool the boat having processed substrates may be provided in the process module 49 .

[0056] A boat transfer device 50 may be provided in the process module 49 to transfer boats with substrates between the first and second elevators 46, the substrate loading station 38, and the cooling station 47. The boat transfer device 50 may be constructed and arranged to transfer the boat B between a plurality of boat positions in the lower region while keeping the boat B vertical. The transfer may be substantially horizontal.

[0057] The boat transfer device 50 may include three boat transfer robots 61, 62, 63. Each boat transfer robot may be provided with a single boat transfer arm 51. The boat transfer arm 51 may be rotatable to horizontally transfer the boat between the substrate loading station 38, one of the elevators 46 and / or the cooling station 47. The substrate loading station 38, the elevator 46 or the cooling station 47 may be vertically moved a short distance of, for example, several centimeters to pick up the boat or put the boat down from the boat transfer arm 51 to a holder. The boat support of the substrate loading station 38 and the cooling station 47 may be provided with a movable top surface to pick up the boat or put down the boat. The boat transfer arm 51 may be provided with a holder to hold the boat. The boat B may be held vertically by the holder. For example, multiple boats of 2, 3 or 4 boats B may be used simultaneously in the furnace 1.

[0058] The substrate loading station 38 and the cooling station 47 may be constructed and arranged on opposite sides of the first and second elevators 46 to keep the width of the furnace 1 limited. The substrate loading station 38 may be constructed and arranged in front of the first and second elevators 46. The cooling station 47 may be constructed and arranged to be stationary behind the first and second elevators 46.

[0059] The cooling station 47 can be used to cool the boat with the hot substrate that has just been processed. The cooling station 47 can be provided with a gas extractor that is constructed and arranged to extract hot gas to cool the substrate. The cooling station 47 can be provided with a gas inlet to provide gas to the cooling station 47. The apparatus may include two cooling stations 47. The substrate processing apparatus in top view can be configured in a generally U-shape (see FIG. Figure 2 ).

[0060] The boat transfer device 50 and the reactor can be constructed and arranged in the bottom portion of the U-shape. The maintenance area 43 can be constructed and arranged between the legs of the U-shape. The distance between the legs of the two U-shapes can be between 60 and 120 cm, more preferably between 80 and 100 cm and most preferably about 90 cm to allow enough space for maintenance workers. A rear door 41 can be provided between the legs of the U-shape to close the maintenance area 43 when not in use. The general U-shape can also include a V-shape.

[0061] The apparatus may be constructed and arranged to allow a maintenance worker to maintain both the first reactor and the second reactor from a maintenance area 43. For example, maintenance is performed on the heating wires, heating sensors, and / or the process gas interfaces (outlets and / or inlets) of the reactors by a maintenance worker. The two reactors may be constructed and arranged adjacent to the same maintenance area 43 to allow maintenance of both reactors from the same maintenance area 43. A maintenance door 41 may be provided to allow maintenance. A maintenance door may be provided behind the cooling station to allow maintenance from the back of the tool.

[0062] Therefore, a maintenance worker may not need to enter the housing 2 of the furnace 1 to perform maintenance work on the reactor. Therefore, the risk of injury to the maintenance worker and / or contamination of the lower area and / or the reactor can be minimized. Performing maintenance outside the housing can also increase the speed and / or accuracy of maintenance. By using the same maintenance area 43 for two reactors, the total footprint of the furnace 1 including the maintenance area 43 can be reduced.

[0063] The processing module 49 may be provided with a maintenance door 41 that can be opened in the direction of the maintenance area 43. The processing module 49 may be provided with a separate maintenance door 41 to allow a maintenance worker to maintain each reactor from the same maintenance area 43. The maintenance door 41 of the processing module 49 may also allow maintenance of the lower area of ​​the furnace from the same maintenance area 43 to maintain the boat transfer device 50, the cooling station 47, the gas inlet, the gas extractor, the elevator 46, the substrate loading station 38 and / or the boat B.

[0064] Alternatively, two maintenance doors may be provided per process module 49. For example, a top maintenance door for accessing the reactor and a bottom maintenance door for accessing the lower area of ​​the furnace 1.

[0065] Reactor 45 may have process gas interfaces (outlet and / or inlet) that may be connected to a gas exhaust pipe or process gas delivery system. The process gas interfaces may be located adjacent to maintenance area 43 to make them easily accessible during maintenance.

[0066] The process gas delivery system may be disposed (in part) in a gas cabinet 67 constructed and arranged to provide process gases to the first and / or second reactors 45. The gas cabinet may be disposed near the top of the legs of the U-shape. Placing the gas cabinet near the top of the U-shape allows for easy access for maintenance. In addition, if the gas cabinet needs to be adjusted or enlarged, such a location provides flexibility because there is space on the back side of the equipment where critical components such as substrate handling robots or cassette handlers are not present.

[0067] The gas exhaust pipe may be constructed and arranged to remove process gas from at least one of the first reactor and the second reactor, and may also be disposed near the top of the legs of the U. Providing the gas exhaust pipe in the legs of the U allows for easy access for maintenance. The gas exhaust pipe may be provided with a pump and a scrubber that may require periodic maintenance. In addition, if the gas exhaust pipe needs to be adjusted or extended, such a location provides flexibility because there is space on the back side of the apparatus where critical components such as a substrate handling robot and / or a cassette handler are not present.

[0068] Although the exemplary embodiments of the present invention have been described above with reference to the accompanying drawings, it should be understood that the present invention is not limited to these embodiments. In implementing the claimed invention, those skilled in the art can understand and implement changes to the disclosed embodiments based on a study of the drawings, the disclosure, and the appended claims.

[0069] References throughout this specification to "one embodiment" or "an embodiment" mean that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, the appearance of the phrase "in one embodiment" or "in an embodiment" in different places throughout this specification does not necessarily refer to the same embodiment. Furthermore, it should be noted that the specific features, structures, or characteristics of one or more embodiments may be combined in any suitable manner to form new, not explicitly described embodiments.

Claims

1. A substrate processing device, comprising: a first reactor and a second reactor for processing a plurality of substrates in a boat; a first elevator and a second elevator that transfer boats with substrates to and from the first reactor and the second reactor, respectively; A substrate handling robot constructed and arranged to transfer substrates between a boat and a substrate cassette at a substrate loading station, wherein the apparatus comprises a boat transfer device for transferring a boat with substrates between: the substrate loading station, the first elevator and the second elevator; as well as first and second cooling stations constructed and arranged to cool the boat with processed substrates, and the apparatus is constructed and arranged with the substrate loading station and the cooling station on opposite sides of the first elevator and the second elevator, Wherein, the boat transfer device includes first, second and third boat transfer robots, wherein the first boat transfer robot is configured to transfer the boat between a first elevator and a first cooling station, the second boat transfer robot is configured to transfer the boat between the second elevator and a second cooling station, and the third boat transfer robot is configured to transfer the boat between a substrate loading station and a first elevator and between a substrate loading station and a second elevator.

2. The substrate processing apparatus of claim 1 , wherein at least one of the first elevator and the second elevator, the substrate loading station, and the first and second cooling stations comprise a boat support constructed and arranged to support the boat with the substrate.

3. The substrate processing apparatus of claim 2, wherein the boat support is constructed and arranged to be stationary in a horizontal plane. 4 . The substrate processing apparatus according to claim 2 , wherein the boat support is a part of the first elevator or the second elevator, and is constructed and arranged to be movable in a vertical direction. 5 . The substrate processing apparatus according to claim 1 , wherein the substrate loading station is constructed and arranged in front of the first elevator and the second elevator, and the cooling station is behind the first elevator and the second elevator.

6. The substrate processing apparatus of claim 5, wherein a maintenance door is provided behind the cooling station to allow maintenance from the back of the tool. 7 . The substrate processing apparatus according to claim 1 , wherein the cooling station is provided with a gas extractor constructed and arranged to extract hot gas to cool the substrate.

8. The substrate processing apparatus according to claim 1, wherein the apparatus comprises two substrate loading stations, and the substrate handling robot is constructed and arranged to transfer substrates between a boat at a first substrate loading station or a second substrate loading station and the substrate cassette.

9. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus in a top view is configured in a generally U-shape, and a gas cabinet constructed and arranged to provide processing gas to at least one of the first reactor and the second reactor is disposed in the top of a leg of the U-shape.

10. The substrate processing apparatus according to claim 9, wherein a maintenance area is arranged between the legs of the U-shape.

11. The substrate processing apparatus of claim 1, wherein the apparatus comprises a housing having a front wall and a rear wall connected to a first side wall and a second side wall extending over the full length of the tool, wherein no door is provided in the side walls.

12. The substrate processing apparatus of claim 1, wherein the width of the tool is between 1.3 meters and 2 meters.

13. The substrate processing apparatus of claim 1, wherein the width of the tool is between 1.5 meters and 1.8 meters.

14. The substrate processing apparatus of claim 1, wherein the width of the tool is between 1.6 meters and 1.7 meters. 15 . The substrate processing apparatus according to claim 1 , wherein the boat transfer device comprises a movable boat supporting arm provided with a boat support configured to support a substrate boat and constructed and arranged to be movable in a horizontal direction. 16 . The substrate processing apparatus of claim 15 , wherein the boat transfer mechanism comprises a plurality of movable boat supporting arms provided with a supporting surface configured to support the substrate boat.

17. The substrate processing apparatus of claim 15, wherein the boat support arm is mounted to be rotatable about a pivot point to allow the boat support to be movable in the horizontal direction.

18. The substrate processing apparatus according to claim 1, wherein a gate valve is provided between the substrate handler and at least one of the first elevator and the second elevator to form a micro environment.

19. The substrate processing apparatus of claim 18, wherein the mini-environment can be provided with a gas inlet and a gas extractor, the gas inlet and the gas extractor being fluidly connectable to a pump to provide a gas flow through the mini-environment.

20. The substrate processing apparatus of claim 1, wherein the apparatus is constructed and arranged to handle between two and four boats simultaneously.

21. A substrate processing device according to claim 1, wherein the device includes a cassette handler provided with a cassette handler arm, the cassette handler arm is configured to transfer cassettes between cassette stations, cassette access ports and / or cassette storage devices and can move up and down with a lifting mechanism, and the cassette storage device includes a plurality of platform levels for supporting cassettes, each platform level includes at least one cutout, the cutout is sized and shaped to allow the cassette handler arm to pass vertically and allow the platform level to support the cassette thereon, and the device includes a wall separating the cassette handler from the substrate handling robot, the wall having a closable substrate access opening adjacent to the cassette station.

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