Mask stretch welding device

Abstract

The present application discloses a mask stretch welding device. The mask stretch welding device according to one embodiment of the present invention may include a stage, a first fixing portion, and a second fixing portion. A frame may be arranged on the upper portion of the stage, the first fixing portion may fix a mask arranged on the frame, and the second fixing portion may be arranged below the mask and may include a plurality of electromagnets. The first fixing portion may include a lower clamping portion including a first electromagnet and an upper clamping portion including a second electromagnet.

Description

Technical Field

[0001] The present invention relates to a mask stretch welding device and a mask stretch welding method using the same. Background Art

[0002] Organic light-emitting display devices in display devices are self-luminous display devices that have the advantages of wide viewing angle and excellent contrast as well as fast response speed, and therefore have attracted much attention as next-generation display devices. Such organic light-emitting display devices may include an intermediate layer including at least a light-emitting layer between electrodes facing each other.

[0003] The intermediate layer can be formed by various methods, one of which is a deposition method. In order to manufacture an organic light-emitting display device using the deposition method, a mask for deposition (e.g., a fine metal mask (FMM)) having an opening with the same pattern as the pattern of the thin film to be formed on the substrate can be closely attached to the substrate, and a deposition material is deposited on the substrate through the mask for deposition to form a thin film with a desired pattern. Summary of the invention

[0004] Technical issues solved

[0005] An object of the present invention is to provide a mask pull bonding apparatus having improved reliability and a mask pull bonding method using the same.

[0006] Workaround

[0007] A mask stretch welding device according to an embodiment of the present invention may include a stage, a first fixing portion, and a second fixing portion. A frame may be arranged on the upper portion of the stage, the first fixing portion may fix a mask arranged on the frame, and the second fixing portion may be arranged below the mask and may include a plurality of electromagnets. The first fixing portion may include a lower clamping portion including a first electromagnet and an upper clamping portion including a second electromagnet.

[0008] The mask stretch welding device may further include a stretching portion, wherein the stretching portion is coupled to the first fixing portion and stretches the mask in a first direction.

[0009] The mask stretch welding device may further include a welding part, wherein the welding part welds the mask and the frame.

[0010] On a plane, the first electromagnet and the second electromagnet may overlap with the mask.

[0011] An upper surface of the lower clamping portion and a lower surface of the upper clamping portion may be opposite to each other in parallel.

[0012] The upper clamping portion may include a first protrusion protruding toward the lower clamping portion, a first groove recessed corresponding to the first protrusion may be defined in the lower clamping portion, and the first protrusion may be coupled to the first groove.

[0013] The first electromagnet may define therein a second groove bent corresponding to a shape of the first groove, and the second electromagnet may include a second protrusion protruding corresponding to a shape of the first protrusion.

[0014] A first groove may be defined in the lower clamping portion, and a second groove may be defined in the upper clamping portion, and the mask stretch welding device may further include a connecting portion, wherein the connecting portion is arranged between the lower clamping portion and the upper clamping portion and accommodated in the first groove and the second groove.

[0015] The coupling portion may include a third electromagnet disposed inside.

[0016] The plurality of electromagnets may each be arranged to be spaced apart in a first direction, and may extend in a second direction intersecting the first direction.

[0017] The plurality of electromagnets may each be arranged to be spaced apart in a first direction, and may be arranged to be spaced apart in a second direction intersecting the first direction.

[0018] In a plane, the plurality of electromagnets may each overlap with the mask.

[0019] The plurality of electromagnets may be sequentially operated in a direction away from a center of the mask.

[0020] According to one embodiment of the present invention, a mask stretching welding method may include the following steps: arranging a frame on a table; arranging a mask on the frame; operating a plurality of electromagnets arranged below the mask in sequence in a first direction away from the center; fixing both ends of the mask by a lower clamping portion including a first electromagnet and an upper clamping portion including a second electromagnet; and welding the mask and the frame.

[0021] The mask stretch welding method may further include the step of stretching the mask in the first direction before welding the mask and the frame.

[0022] An upper surface of the lower clamping portion and a lower surface of the upper clamping portion may be opposite to each other in parallel.

[0023] The upper clamping portion may include a first protrusion protruding toward the lower clamping portion, the lower clamping portion may include a first groove recessed corresponding to the first protrusion, and the first protrusion may be combined with the first groove.

[0024] The lower clamping portion may have a first slot defined therein and the upper clamping portion may have a second slot defined therein, and may further include a coupling portion disposed between the lower clamping portion and the upper clamping portion and received in the first slot and the second slot.

[0025] The plurality of electromagnets may each be arranged to be spaced apart in the first direction, and may extend in a second direction intersecting the first direction.

[0026] The plurality of electromagnets may each be arranged to be spaced apart in the first direction, and may be arranged to be spaced apart in a second direction intersecting the first direction.

[0027] Beneficial Effects

[0028] According to the present invention, the first fixing part that fixes the two ends of the mask may include a lower clamping part including a first electromagnet and an upper clamping part including a second electromagnet. The lower clamping part and the upper clamping part may maintain a state of being parallel to each other and may fix the two ends of the mask. The mask stretching welding device may prevent the mask from slipping due to a large force applied to a part of the mask, and may prevent the two ends of the mask from being twisted when fixing the two ends of the mask. The mask assembly formed by the mask stretching welding device may improve the accuracy and uniformity of the deposition process. Therefore, a mask stretching welding device with improved reliability may be provided.

[0029] In addition, the mask stretch welding device may include a second fixing portion arranged below the mask. The second fixing portion may include a plurality of electromagnets. The plurality of electromagnets may be operated sequentially from the center of the mask toward the ends of the mask. The mask may be maintained in a taut state by the second fixing portion, and the mask stretch welding device may connect the mask in a taut state to the frame. The second fixing portion may prevent the problem of mask distortion. The mask assembly formed by the mask stretch welding device may improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device with improved reliability may be provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 is a perspective view of a mask stretch welding device according to an embodiment of the present invention.

[0031] Figure 2 4 is a cross-sectional view of a mask stretch welding device according to an embodiment of the present invention.

[0032] Figure 3 is a cross-sectional view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0033] Figure 4is a cross-sectional view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0034] Figure 5 is a cross-sectional view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0035] Figure 6 is a plan view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0036] Figure 7 is a plan view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0037] Figure 8 is a perspective view of a mask assembly according to an embodiment of the present invention.

[0038] Fig. 9 FIG. 1 is a cross-sectional view schematically showing a deposition apparatus according to an embodiment of the present invention.

[0039] Fig.10 It is shown that the use Fig. 9 A cross-sectional view of a portion of an organic light emitting display device in which a deposition apparatus deposits a light emitting layer on a substrate.

[0040] Fig.11 is a cross-sectional view of a mask stretch welding device, which shows the steps of operating a second fixing part according to an embodiment of the present invention.

[0041] Fig.12 2 is a cross-sectional view showing a mask stretch welding device, which illustrates a step in which a first fixing part operates according to an embodiment of the present invention.

[0042] Fig.13 is a cross-sectional view of a mask stretch welding apparatus illustrating the steps of welding a mask and a frame according to an embodiment of the present invention. DETAILED DESCRIPTION

[0043] In this specification, when a certain component (or region, layer, part, etc.) is mentioned as being "on", "connected to" or "coupled to" other components, it means that it can be directly arranged / connected / coupled to other components, or a third component may be arranged between them.

[0044] The same reference numerals indicate the same constituent elements. In addition, in order to effectively explain the technical content, the thickness, ratio and size of the constituent elements in the drawings are exaggerated.

[0045] “And / or” includes all combinations of more than one that can be defined by the associated components.

[0046] Although the wordings of first, second, etc. can be used to illustrate a variety of constituent elements, the constituent elements are not limited by these wordings. The wording is used only for the purpose of distinguishing one constituent element from other constituent elements. For example, without departing from the scope of the present invention, the first constituent element may be referred to as the second constituent element, and similarly, the second constituent element may also be referred to as the first constituent element. Unless otherwise clearly defined in the context, singular expressions include plural expressions.

[0047] In addition, the terms "below", "lower side", "above", "upper side" and the like are used to explain the relationship between the structures shown in the drawings. These terms are relative concepts and are explained based on the directions shown in the drawings.

[0048] Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meaning as those commonly understood by those skilled in the art to which the present invention belongs. In addition, terms such as those defined in commonly used dictionaries should be interpreted as meanings consistent with the meanings in the context of the relevant technology, and are clearly defined in this document without being interpreted as idealized or overly formal meanings.

[0049] The words "include" or "have" etc. should be understood to indicate the existence of the features, numbers, steps, operations, constituent elements, parts or their combinations recorded in the specification, rather than excluding in advance the possibility of the existence or addition of one or more other features, numbers, steps, operations, constituent elements, parts or their combinations.

[0050] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

[0051] Figure 1 is a perspective view of a mask stretch welding device according to an embodiment of the present invention.

[0052] Reference Figure 1 The mask stretch welding device MWD may include a station STG, a first fixing part FX1, a second fixing part FX2 (refer to Figure 2 ), stretching part TN and welding part LZ.

[0053] The stage STG may support the frame FR. The stage STG may have a square ring shape.

[0054] The frame FR may be arranged on the stage STG. The frame FR may support the mask MK. An opening FOP may be defined in the frame FR. The opening FOP may provide a path for the deposition material to pass through. The frame FR may have a square ring shape. The frame FR may be composed of invar. However, this is exemplary, and the frame FR may include a variety of metals. For example, the frame FR may be composed of stainless steel. The frame FR may include a material that is less deformed when the mask MK is welded. For example, the frame FR may include a metal with high rigidity. The frame FR may include a first frame FR1 and a second frame FR2.

[0055] The first frame FR1 may extend in the first direction DR1. The second frame FR2 may extend in the second direction DR2. The length of the first frame FR1 may be less than the length of the second frame FR2. However, this is exemplary, and the length of the first frame FR1 and the length of the second frame FR2 may be the same.

[0056] The vertical direction of the frame FR may correspond to a thickness direction ( DR3 , hereinafter, a third direction) of the frame FR.

[0057] In addition, the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 are relative concepts, which can be converted into other directions. In the following, the first direction to the third direction are referred to as directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3, respectively, and they refer to the same figure marks. In addition, in this specification, the surface defined by the first direction DR1 and the second direction DR2 is defined as a plane, and "viewing on a plane" can be defined as viewing on the third direction DR3.

[0058] The third direction DR3 may be a direction intersecting the first direction DR1 and the second direction DR2. The first direction DR1, the second direction DR2, and the third direction DR3 may be orthogonal to each other.

[0059] The support portion ST may be arranged between the frame FR and the mask MK. The support portion ST may extend in the second direction DR2. The support portions ST may be spaced apart at the same intervals along the first direction DR1. However, this is exemplary, and the support portions ST may be arranged in various ways. For example, the support portions ST may extend in the first direction DR1 and be spaced apart in the second direction DR2. The support portion ST may be omitted in one embodiment of the present invention.

[0060] The mask MK may be arranged on the support portion ST. The mask MK may be manufactured using a thin plate. As a material of the mask MK, stainless steel, invar, nickel (Ni), cobalt (Co), a nickel alloy, a nickel-cobalt alloy, etc. may be used. However, this is exemplary, and a variety of materials may be used for the mask MK in the present invention.

[0061] The mask MK may be defined in parallel with a plane defined by the first direction DR1 and the second direction DR2. For example, the mask MK may have a rectangular shape parallel to each of the first direction DR1 and the second direction DR2. However, this is exemplarily shown, and the mask MK may have various shapes.

[0062] The mask MK may define a pattern area PA. The pattern area PA may define a plurality of holes. The plurality of holes may provide a path for the deposition material to pass through. Align to the substrate SUB (refer to Fig. 9 ) can expose the substrate SUB (refer to Fig. 9 ) is a deposition object. The pattern area PA may have a planar shape substantially the same as a deposition pattern to be formed. However, this is exemplary, and the pattern area PA may have a variety of shapes. For example, the pattern area PA may include a mask pattern that maintains a fully open state, or may include a stripe-shaped pattern. The above-mentioned plurality of holes may be arranged along the first direction DR1 and the second direction DR2.

[0063] The first fixing portion FX1 may be disposed at both ends of the mask MK. The first fixing portion FX1 may fix the mask MK. Figure 1 Four first fixing parts FX1 are exemplarily shown in FIG. 1 , but the present invention is not limited thereto.

[0064] The stretching portion TN may be coupled with the first fixing portion FX1. The stretching portion TN may stretch the mask MK in the first direction DR1.

[0065] The welding part LZ may be disposed on the mask MK. The welding part LZ may weld the mask MK and the frame FR.

[0066] Figure 2 is a cross-sectional view of a mask stretch welding device according to an embodiment of the present invention.

[0067] Reference Figure 2 , the mask MK may include a deposition area MK1 and a non-deposition area MK2. The deposition area MK1 may include an area where the deposition material moves. On a plane, the deposition area MK1 may overlap with the opening FOP. The non-deposition area MK2 may include an area adjacent to the deposition area MK1. On a plane, the non-deposition area MK2 may overlap with the stage STG and the frame FR.

[0068] The first fixing portion FX1 may include a lower clamping portion CL1 and an upper clamping portion CL2. The mask MK may be disposed between the lower clamping portion CL1 and the upper clamping portion CL2. On a plane, the lower clamping portion CL1 and the upper clamping portion CL2 may overlap with the non-deposition area MK2.

[0069] The second fixing part FX2 may be disposed under the mask MK. The second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, MG2-5.

[0070] On a plane, the second fixing portion FX2 may overlap with the mask MK.

[0071] On a plane, the welding portion LZ may be arranged on the stage STG.

[0072] Figure 3 is a cross-sectional view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0073] Reference Figure 3 , the lower clamping portion CL1 may include a first electromagnet MG1-1. The strength of the magnetic force of the first electromagnet MG1-1 may be determined according to the applied current.

[0074] The upper clamping portion CL2 may include a second electromagnet MG1-2. The strength of the magnetic force of the second electromagnet MG1-2 may be determined according to the applied current. The second electromagnet MG1-2 may have substantially the same configuration as the first electromagnet MG1-1.

[0075] The first fixing portion FX1 (refer to Figure 2 ) The mask MK can be fixed by controlling the strength of the magnetic force regardless of the thickness of the mask MK. For example, when the thickness of the mask MK is small, the strength of the magnetic force can be weakened, and when the thickness of the mask MK is large, the strength of the magnetic force can be strengthened.

[0076] On a plane, the first electromagnet MG1 - 1 and the second electromagnet MG1 - 2 may overlap the non-deposition area MK2 .

[0077] The upper surface CL1-1 of the lower clamping portion CL1 and the lower surface CL2-1 of the upper clamping portion CL2 may face each other in parallel. The upper surface CL1-1 of the lower clamping portion CL1 and the lower surface CL2-1 of the upper clamping portion CL2 may be coupled while maintaining parallelism.

[0078] According to the present invention, the lower clamping part CL1 and the upper clamping part CL2 can be connected while uniformly maintaining the force applied to the mask MK. The lower clamping part CL1 and the upper clamping part CL2 can prevent the mask MK from slipping due to a large force applied to a part of the mask MK. Figure 1 ) formed by the mask assembly 100 (refer to Figure 8 ) can improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device MWD with improved reliability can be provided (refer to Figure 1 ).

[0079] Figure 4 is a cross-sectional view showing a portion of a mask stretch welding device according to an embodiment of the present invention. Figure 3 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0080] Reference Figure 4 , the upper clamping portion CL2a may include a first protrusion CL2a-1 that protrudes toward the lower clamping portion CL1a.

[0081] The lower clamping portion CL1a may define therein a first groove CL1a - 1 corresponding to the first protrusion CL2a - 1 .

[0082] The mask MKa may have defined therein a mask groove MKa- 1 corresponding to the first protrusion CL2 a - 1 .

[0083] The first protrusion CL2a-1 may be coupled to the first groove CL1a-1. A mask groove MKa-1 may be disposed between the first protrusion CL2a-1 and the first groove CL1a-1.

[0084] The upper clamping portion CL2a may include a second electromagnet MG1-2a. The second electromagnet MG1-2a may include a second protrusion MG1-2a1 protruding corresponding to the first protrusion CL2a-1.

[0085] The lower clamping portion CL1a may include a first electromagnet MG1-1a. The first electromagnet MG1-1a may define therein a second slot MG1-1a1 bent corresponding to the shape of the first slot CL1a-1.

[0086] According to the present invention, the mask stretch welding device MWD (refer to Figure 1 ) can prevent the slip phenomenon and distortion of the mask MKa by coupling the first protrusion CL2a-1, the first groove CL1a-1 and the mask groove MKa-1 to each other. Mask stretch welding device MWD (refer to Figure 1 ) The mask MKa can be fixed by the first electromagnet MG1-1a and the second electromagnet MG1-2a. The mask is stretched and welded by the mask stretching device MWD (refer to Figure 1 ) formed by the mask assembly 100 (refer to Figure 8 ) can improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device MWD with improved reliability can be provided (refer to Figure 1 ).

[0087] Figure 5 is a cross-sectional view showing a portion of a mask stretch welding device according to an embodiment of the present invention. Figure 3 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0088] Reference Figure 5 The lower clamping portion CL1b may define a first slot CL1b-1 therein. The lower clamping portion CL1b may include a first electromagnet MG1-1b. The first electromagnet MG1-1b may define a third slot MG1-1b1 therein that is bent corresponding to the shape of the first slot CL1b-1.

[0089] The upper clamping portion CL2b may define a second slot CL2b-1 therein. The upper clamping portion CL2b may include a second electromagnet MG1-2b. The second electromagnet MG1-2b may define a fourth slot MG1-2b1 bent corresponding to the shape of the second slot CL2b-1 therein.

[0090] The coupling portion CNb may be disposed between the lower clamping portion CL1b and the upper clamping portion CL2b. The third electromagnet MG1-3b may be disposed inside the coupling portion CNb.

[0091] The mask MKb may surround the coupling portion CNb and be coupled thereto. The mask MKb may be fixed by the magnetic force of the third electromagnet MG1-3b. The coupling portion CNb may be received in the first groove CL1b-1 and the second groove CL2b-1.

[0092] According to the present invention, the mask MKb can be coupled to the lower clamping part CL1b and the upper clamping part CL2b in a state of being fixed to the coupling part CNb. Figure 1 ) can prevent the two ends of the mask MKb from twisting. Figure 1 ) formed by the mask assembly 100 (refer to Figure 8 ) can improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device MWD with improved reliability can be provided (refer to Figure 1 ).

[0093] Figure 6 is a plan view showing a portion of a mask stretch welding apparatus according to an embodiment of the present invention.

[0094] Reference Figure 6 A second fixing portion FX2 may be disposed below the mask MK. A width WT1 of the mask MK in the first direction DR1 may be greater than a width WT2 of the mask MK in the second direction DR2.

[0095] The second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5. Figure 6 Five electromagnets are shown as an example in FIG. 1 , but are not limited thereto.

[0096] The plurality of electromagnets MG2 - 1 , MG2 - 2 , MG2 - 3 , MG2 - 4 , MG2 - 5 may each be arranged to be spaced apart in the first direction DR1 and extend in the second direction DR2 .

[0097] On a plane, the plurality of electromagnets MG2 - 1 , MG2 - 2 , MG2 - 3 , MG2 - 4 , and MG2 - 5 may each overlap with the deposition region MK1 .

[0098] The plurality of electromagnets MG2 - 1 , MG2 - 2 , MG2 - 3 , MG2 - 4 , and MG2 - 5 can each be independently controlled.

[0099] Figure 7 1 is a plan view showing a portion of a mask stretch welding device according to an embodiment of the present invention. Figure 6 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0100] Reference Figure 7 , the second fixing part FX2a may be arranged under the mask MK. The second fixing part FX2a may include a plurality of electromagnets MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b. Although Figure 7 Ten electromagnets are shown as an example, but are not limited to this.

[0101] The plurality of electromagnets MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b may each be spaced apart in the first direction DR1, and spaced apart in the second direction DR2.

[0102] On a plane, the plurality of electromagnets MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b may each overlap the non-pattern area NPA.

[0103] In the mask MK according to an embodiment of the present invention, the thickness of the pattern area PA may be different from the thickness of the non-pattern area NPA. The thickness of the pattern area PA may be smaller than the thickness of the non-pattern area NPA.

[0104] When the pattern area PA having a small thickness is fixed by a strong magnetic force applied to the non-pattern area NPA having a large thickness, a wrinkle phenomenon may occur due to the magnetic force. The plurality of electromagnets MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b overlapping the non-pattern area NPA can each prevent a wrinkle phenomenon due to the magnetic force that may occur in the pattern area PA.

[0105] Each of the plurality of electromagnets MG2-1a, MG2-1b, MG2-2a, MG2-2b, MG2-3a, MG2-3b, MG2-4a, MG2-4b, MG2-5a, MG2-5b can be independently controlled.

[0106] Figure 8 is a perspective view of a mask assembly according to an embodiment of the present invention.

[0107] Reference Figure 8 The mask assembly 100 can be used with a mask stretch welding device MWD (refer to Figure 1 The mask assembly 100 may include a mask set MK-1 and a frame set FS.

[0108] The mask set MK-1 may include more than one mask MK (hereinafter referred to as a plurality of masks). Figure 8 Six masks MK are shown as an example in FIG. 1 , but the present invention is not limited thereto.

[0109] The plurality of masks MK may each extend in the first direction DR1 and may be arranged along the second direction DR2. When the plurality of masks MK are provided, the width in the second direction DR2 may be reduced compared to the case where a single mask is provided. Therefore, the phenomenon that the plurality of masks MK droop due to gravity may be reduced.

[0110] The frame set FS may include a frame FR and a support portion ST.

[0111] The length of the frame FR in each of the first direction DR1 and the second direction DR2 may be determined according to the size and number of the masks MK.

[0112] The support portion ST may be disposed under the mask MK to prevent the mask MK from sagging due to gravity.

[0113] After the welding process of the mask set MK-1 and the frame set FS is completed, a portion of the non-deposition area MK2 may be cut. The mask assembly 100A (refer to Fig. 9 ) can be used in organic deposition processes.

[0114] Fig. 9FIG. 1 is a cross-sectional view schematically showing a deposition apparatus according to an embodiment of the present invention.

[0115] Reference Fig. 9 , the deposition apparatus 1000 may include a chamber CHB, a deposition source S, a stage STG- 1 , a moving plate PP, and a mask assembly 100A.

[0116] The deposition source S, the stage STG- 1 , the moving plate PP, and the mask assembly 100A may be disposed within the chamber CHB.

[0117] The chamber CHB may form a closed space. The chamber CHB may be provided with at least one door GT. The chamber CHB may be opened and closed through the door GT. The mask assembly 100A and the substrate SUB may enter and exit through the door GT provided in the chamber CHB.

[0118] The deposition source S may be arranged at the lower side in the chamber CHB. The deposition source S may include a deposition substance. The deposition substance is a substance that can be sublimated or vaporized, and may include one or more of an inorganic substance, a metal, and an organic substance. In this embodiment, the case where the deposition source S includes an organic substance for manufacturing an organic light-emitting device (not shown) is exemplarily described.

[0119] The stage STG-1 may be disposed above the deposition source S. The mask assembly 100A may be mounted on the stage STG-1. The mask assembly 100A may be opposite to the deposition source S. On a plane, the stage STG-1 may overlap with the frame FR to support the mask assembly 100A. The stage STG-1 may be disposed outside a moving path of a deposition material supplied from the deposition source S to the substrate SUB.

[0120] The moving plate PP may be disposed on the substrate SUB. The moving plate PP may align the substrate SUB onto the mask assembly 100A. Exemplarily, the moving plate PP may move the substrate SUB by generating an electrostatic force or a magnetic force. The moving plate PP may move up and down or left and right.

[0121] The moving plate PP may function to fix the substrate SUB to the mask assembly 100A. The substrate SUB is fixed to the mask assembly 100A through the moving plate PP, and thus the accuracy of the deposition process may be improved.

[0122] Fig.10 It is shown that the use Fig. 9 A cross-sectional view of a portion of an organic light emitting display device in which a deposition apparatus deposits a light emitting layer on a substrate.

[0123] Reference Fig.10 , a circuit device layer ML, a display device layer IML and a thin film encapsulation layer TFE may be sequentially arranged on the base layer BS.

[0124] The base layer BS may include a synthetic resin film. The synthetic resin layer may be formed on a working substrate used when manufacturing the display panel DP. Subsequently, a conductive layer, an insulating layer, and the like may be formed on the synthetic resin layer. When the working substrate is removed, the synthetic resin layer may correspond to the base layer BS. The synthetic resin layer may include a thermosetting resin. In particular, the synthetic resin layer may be a polyimide-based resin layer, and the material thereof is not particularly limited. In addition, the base layer BS may include a glass substrate, a metal substrate, an organic / inorganic composite material substrate, and the like.

[0125] In the present embodiment, the circuit device layer ML may include a buffer film BFL as an inorganic film, a first intermediate inorganic film 10 and a second intermediate inorganic film 20, and may include an intermediate organic film 30 as an organic film. The materials of the inorganic film and the organic film are not particularly limited, and in an embodiment of the present invention, the buffer film BFL may be selectively arranged / omitted.

[0126] A semiconductor pattern OSP1 of the transistor T1 may be disposed on the buffer film BFL. The semiconductor pattern OSP1 may be selected from amorphous silicon, polysilicon, or a metal oxide semiconductor.

[0127] The semiconductor pattern OSP1 may be disposed on a first intermediate inorganic film 10. The first intermediate inorganic film 10 may be disposed on a control electrode GE1 of the transistor T1.

[0128] A second intermediate inorganic film 20 covering the control electrode GE1 may be disposed on the first intermediate inorganic film 10. An input electrode DE1 and an output electrode SE1 of the transistor T1 may be disposed on the second intermediate inorganic film 20.

[0129] The input electrode DE1 and the output electrode SE1 may be connected to the semiconductor pattern OSP1 through first and second through holes CH1 and CH2 penetrating the first and second intermediate inorganic films 10 and 20, respectively. In other embodiments of the present invention, the transistor T1 may be implemented as a bottom gate structure.

[0130] An intermediate organic film 30 covering the input electrode DE1 and the output electrode SE1 may be disposed on the second intermediate inorganic film 20. The intermediate organic film 30 may provide a flat surface.

[0131] A display device layer IML may be arranged on the intermediate organic film 30. The display device layer IML may include a pixel defining film PDL and an organic light emitting diode OLED. The pixel defining film PDL may include an organic substance. A first electrode AE ​​may be arranged on the intermediate organic film 30. The first electrode AE ​​may be connected to the output electrode SE1 through a third through hole CH3 penetrating the intermediate organic film 30. An opening OP may be defined in the pixel defining film PDL. The opening OP may expose at least a portion of the first electrode AE. In one embodiment of the present invention, the pixel defining film PDL may be omitted.

[0132] In one embodiment of the present invention, the light emitting region PXA may overlap with the transistor T1 .

[0133] The hole control layer HCL may be commonly disposed in the light emitting region PXA and the non-light emitting region NPXA. A light emitting layer EML may be disposed on the hole control layer HCL. The light emitting layer EML may be deposited using a deposition apparatus 1000 (see Fig. 9 ) is formed by depositing an organic substance. The light emitting layer EML may be arranged in a region corresponding to the opening OP. The light emitting layer EML may include an organic substance and / or an inorganic substance. The light emitting layer EML may generate a predetermined colored light.

[0134] An electron control layer ECL may be disposed on the light emitting layer EML, and a second electrode CE may be disposed on the electron control layer ECL.

[0135] A thin film encapsulation layer TFE may be arranged on the second electrode CE. The thin film encapsulation layer TFE may cover the second electrode CE. A cover layer covering the second electrode CE may be arranged between the thin film encapsulation layer TFE and the second electrode CE. In this case, the thin film encapsulation layer TFE may directly cover the cover layer.

[0136] Fig.11 is a cross-sectional view of a mask stretch welding device, which shows the steps of operating the second fixing part according to one embodiment of the present invention. Figures 1 to 7 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0137] Reference Fig.11 The second fixing part FX2 may include a plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5.

[0138] The plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5 may be operated sequentially in a first direction DR1 from the center of the mask MK toward both ends of the mask MK. For example, the plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, and MG2-5 may be operated in a direction away from the center of the mask MK.

[0139] For example, the central part of the mask MK can be fixed by operating the third electromagnet MG2-3. At this time, the wrinkles of the mask MK can be unfolded by the magnetic force of the third electromagnet MG2-3. After the third electromagnet MG2-3 is operated, the second electromagnet MG2-2 and the fourth electromagnet MG2-4 can be operated. The second electromagnet MG2-2, the third electromagnet MG2-3 and the fourth electromagnet MG2-4 can fix the mask MK. At this time, the wrinkles of the mask MK can be unfolded by the magnetic force of the second electromagnet MG2-2, the third electromagnet MG2-3 and the fourth electromagnet MG2-4. Subsequently, the first electromagnet MG2-1 and the fifth electromagnet MG2-5 can be operated. The first electromagnet MG2-1, the second electromagnet MG2-2, the third electromagnet MG2-3, the fourth electromagnet MG2-4 and the fifth electromagnet MG2-5 can fix the mask MK. At this time, the wrinkles of the mask MK may be unfolded by the magnetic forces of the first electromagnet MG2 - 1 , the second electromagnet MG2 - 2 , the third electromagnet MG2 - 3 , the fourth electromagnet MG2 - 4 , and the fifth electromagnet MG2 - 5 .

[0140] The mask MK may be fixed by a plurality of electromagnets MG2 - 1 , MG2 - 2 , MG2 - 3 , MG2 - 4 , and MG2 - 5 .

[0141] The plurality of electromagnets MG2 - 1 , MG2 - 2 , MG2 - 3 , MG2 - 4 , and MG2 - 5 may operate symmetrically in the first direction DR1 with respect to the third electromagnet MG2 - 3 .

[0142] The second fixing portion FX2 can fix the mask MK by controlling the strength of the magnetic force regardless of the thickness of the mask MK. For example, when the thickness of the mask MK is small, the strength of the magnetic force can be weakened, and when the thickness of the mask MK is large, the strength of the magnetic force can be strengthened.

[0143] When the strength of the magnetic force appropriate for the thickness of the mask MK is defined as a reference value, if the strength of the magnetic force of the second fixing portion FX2 is less than the reference value, wrinkles may occur on the mask MK due to gravity, and the mask MK may not be fixed. In addition, if the strength of the magnetic force of the second fixing portion FX2 is greater than the reference value, wrinkles may occur on the mask MK due to the magnetic force. Therefore, by using the mask stretch welding device MWD (refer to Figure 1 ) formed by the mask assembly 100 (refer to Figure 8) may reduce the accuracy and uniformity of the deposition process. According to the present invention, the plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, MG2-5 can be operated sequentially from the center of the mask MK toward the end of the mask MK. The plurality of electromagnets MG2-1, MG2-2, MG2-3, MG2-4, MG2-5 can each fix the mask MK. The mask MK can be maintained in a taut state by the second fixing part FX2, and the mask stretch welding device MWD (refer to Figure 1 ) can connect the mask MK in a taut state to the frame FR. The second fixing portion FX2 can prevent the mask MK from wrinkling. Figure 1 ) formed by the mask assembly 100 (refer to Figure 8 ) can improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device MWD with improved reliability can be provided (refer to Figure 1 ).

[0144] Fig.12 is a cross-sectional view of a mask stretch welding device, which shows the steps of operating the first fixing part according to one embodiment of the present invention. Fig.11 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0145] Reference Fig.12 , the mask MK fixed by the second fixing part FX2 may be additionally fixed by the first fixing part FX1. The lower clamping part CL1 and the upper clamping part CL2 may fix the mask MK.

[0146] The strength of the force for fixing the mask MK can be adjusted by controlling the magnetic force of the first electromagnet MG1-1 and the second electromagnet MG1-2. Figure 3 ) and the lower surface CL2-1 of the upper clamping portion CL2 (refer to Figure 3 ) is fixed at the same time. Therefore, the slippage of the mask MK can be prevented.

[0147] According to the present invention, the lower clamping part CL1 and the upper clamping part CL2 may be coupled to each other in parallel, and the mask MK may be fixed by the first electromagnet MG1-1 and the second electromagnet MG1-2. The slip phenomenon and distortion of the mask MK may be prevented. The mask assembly 100 (refer to Figure 8 ) can improve the accuracy and uniformity of the deposition process. Therefore, a mask stretch welding device MWD with improved reliability can be provided.

[0148] Fig.13is a cross-sectional view of a mask stretch welding apparatus, which illustrates the steps of welding a mask and a frame according to an embodiment of the present invention. Fig.11 and Fig.12 The constituent elements described are given the same reference numerals, and description thereof is omitted.

[0149] The tension part TN may stretch the mask MK fixed by the first and second fixing parts FX1 and FX2 in the first direction DR1.

[0150] The welding part LZ may weld the stretched and fixed mask MK. The welding part LZ may irradiate the laser LZ-1 on the surface of the frame FR contacting the mask MK. The mask MK and the frame FR may be welded and connected to each other by the laser LZ-1. However, this is shown exemplarily, and in one embodiment of the present invention, the welding part LZ may include a variety of welding devices.

[0151] Although the preferred embodiments of the present invention have been described above, it will be understood by those skilled in the art or those of ordinary skill in the art that various modifications and changes can be made to the present invention without departing from the scope of the concept and technical field of the present invention as described in the attached claims. Therefore, the technical scope of the present invention is not limited to the contents described in the detailed description of the specification, but should be defined by the claims.

[0152] Description of Reference Numerals

[0153] MWD: Mask Stretching Welding Device STG: Set

[0154] FX1: First fixing part FX2: Second fixing part

[0155] TN: tensile part LZ: welding part

[0156] FR: Frame MK: Mask

[0157] CL1: Lower clamping part CL2: Upper clamping part

[0158] MG1-1: First electromagnet MG1-2: Second electromagnet

Claims

1. Mask stretch welding device, comprising: A table, wherein a frame is arranged on an upper portion of the table; a first fixing portion, the first fixing portion fixing the mask arranged on the frame; as well as a second fixing portion, which is arranged below the mask and includes a plurality of electromagnets, The first fixing portion includes a lower clamping portion including a first electromagnet and an upper clamping portion including a second electromagnet, and in: The lower clamping portion defines a first slot therein, The upper clamping portion defines a second slot therein, and The mask stretch welding device also includes: A coupling portion is disposed between the lower clamping portion and the upper clamping portion and is accommodated in the first groove and the second groove, and includes a third electromagnet inside the coupling portion.

2. The mask stretch welding device according to claim 1, wherein: The plurality of electromagnets are each arranged to be spaced apart in a first direction and extend in a second direction intersecting the first direction.

3. The mask stretch welding device according to claim 1, wherein: The plurality of electromagnets are each arranged at intervals in a first direction and are arranged at intervals in a second direction intersecting the first direction.

4. The mask stretch welding device according to claim 1, wherein: On a plane, each of the plurality of electromagnets overlaps with the mask.

5. The mask stretch welding device according to claim 1, wherein: The plurality of electromagnets are sequentially operated in a direction away from a center of the mask so that the plurality of electromagnets sequentially fix the mask in a direction away from the center of the mask.

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