A wafer soaking device for wet processing

Abstract

The present invention discloses a wafer soaking device for wet processing, comprising a baffle, an electric push rod and a box body. The present invention sets a blocking sealing mechanism at the rear end of the box body, applies pressure to the baffle through an extrusion plate and a micro spring, so that the baffle applies pressure to a sealing sheet and the sealing sheet is more stably attached to the rear end surface of the box body. The baffle moves upward after use. When soaking liquid still flows down, the soaking liquid is guided to the inner side of a through hole opened on the top surface of the bottom plate through a limiting plate and an extension plate, and enters a collection box through the through hole for collection, thereby achieving the beneficial effects of improving the overall sealing to prevent the leakage of the soaking liquid, and collecting the outflowing soaking liquid to prevent the soaking liquid from being wasted and polluting the environment.

Description

Technical Field

[0001] The present invention relates to the field related to immersion devices, in particular to a wafer immersion device for wet processing. Background Art

[0002] At present, the semiconductor industry often requires wet processing of wafers using chemical liquids to immerse the wafers. The existing wafer immersion method generally involves placing a whole box of wafers into a chemical liquid tank at the same time, and then taking out the whole box after a predetermined time for the next process.

[0003] When the wafer is soaked in the soaking device, the soaking process is prone to generate certain vibrations, or when the wafer is soaked in rotation, the soaking liquid is prone to splash onto the switch baffle. When the baffle is opened again, the soaking liquid is prone to flow out, causing waste and polluting the environment. Summary of the invention

[0004] Therefore, in order to solve the above-mentioned shortcomings, the present invention provides a wafer soaking device for wet processing.

[0005] The present invention is implemented in this way: a wafer soaking device for wet processing is constructed, the device includes a baffle, an electric push rod, a box body and a blocking sealing mechanism, the baffle is installed on the output shaft at the bottom of the second cylinder, the electric push rod is locked at the front end of the top of the base, the blocking sealing mechanism is arranged at the rear end of the box body, the blocking sealing mechanism includes a bottom plate, an extension plate, a limit plate, a collection mechanism, a sealing sheet, a fixing plate, a sponge sheet, an L-shaped plate, an extrusion plate, a rubber sheet and a micro spring, the bottom plate is fastened to the middle and lower part of the rear end surface of the box body, and extension plates are arranged at the left and right ends of the bottom plate, the A limiting plate is provided on the top of the rear end of the extension plate and the bottom plate, the collecting mechanism is provided at the bottom of the bottom plate, the sealing sheet is adhered to the front end face of the baffle, and the sealing sheet is fitted to the rear end face of the box body, the fixing plate is embedded in the middle and upper part of the rear end face of the box body, and a sponge sheet is adhered to the rear end face of the fixing plate, two L-shaped plates are symmetrically installed in the middle part of the rear end face of the box body, and the left and right opposite faces of the two L-shaped plates are respectively used to fit the left and right end faces of the baffle, the extrusion plate is connected to the inner rear end face of the L-shaped plate through a micro spring, and a rubber sheet is fastened to the front end face of the extrusion plate, and the rubber sheet is used to fit tightly to the rear end face of the baffle.

[0006] Preferably, the top output shaft of the electric push rod is fastened to the top surface of the sliding frame, the sliding frame is slidably mounted on the supporting frame locked at the front end of the top end of the base, and the first cylinder and the connecting rod are respectively installed in the middle of the top surface of the sliding frame and the rear end of the bottom surface, the output shaft at the bottom of the first cylinder passes through the top surface of the sliding frame and is fixedly connected to the top surface of the rotating rod, the connecting rod passes through the top surface of the box body and is hinged in the middle of the top surface of the film box, the rotating rod passes through the top surface of the box body and is hinged to the front end of the top surface of the film box, the left side of the top surface of the box body and the middle of the rear end surface are respectively provided with a liquid inlet and a window, and an immersion tank is provided at the bottom inner side of the box body, the second cylinder is locked and installed on the top of the rear end of the box body by an L-shaped rigid part, the front end of the inner side of the immersion tank is embedded with a heating plate, and the rear end of the top of the immersion tank is provided with an air inlet pipe, and the air inlet pipe is installed in the lower middle part of the rear end surface of the inner side of the box body.

[0007] Preferably, the collecting mechanism comprises a collecting box, a protrusion, a groove, a card block, a card slot, a transparent plate and a through hole, the collecting box is fitted to the bottom end surface of the base plate, the protrusion is fastened to the middle of the front end surface of the collecting box, and the protrusion slides left and right along the inner side of the groove opened in the middle and lower part of the rear end surface of the box body, the card block is arranged in the middle of the upper and lower end surfaces of the protrusion, and the protrusion movably extends into the inner side of the card slot, the card slot is opened at the upper and lower ends of the inner side of the groove, the transparent plate is embedded in the middle and lower part of the rear end surface of the collecting box, the through hole passes through the middle of the upper and lower ends of the base plate, and the through hole falls into the inner range of the collecting box.

[0008] Preferably, the extension plates extend upwardly in an inclined manner, and the left and right opposite surfaces of the two extension plates form an angle of 120° with the top surface of the bottom plate.

[0009] Preferably, the top of the front end surface of the rubber sheet is in the shape of an inclined surface which gradually decreases from bottom to top, and the front end surface of the rubber sheet is smooth and free of burrs.

[0010] Preferably, three micro springs are arranged at equal intervals on the rear end surface of the extrusion plate, and the three micro springs are respectively located at the upper and lower ends and the middle part of the rear end surface of the extrusion plate.

[0011] Preferably, the sealing sheet is square in shape, and the side surface of the sealing sheet is flush with the side surface of the baffle.

[0012] Preferably, the top surface of the bottom plate is in an arc shape that tapers from outside to inside, and a smooth film layer is provided on the top surface of the bottom plate.

[0013] Preferably, the sealing sheet is made of silicone.

[0014] Preferably, the micro spring is made of stainless steel.

[0015] The present invention has the following advantages: The present invention provides a wafer soaking device for wet processing through improvement, which has the following improvements compared with the same type of equipment:

[0016] Advantage 1: The present invention discloses a wafer soaking device for wet processing. The present invention sets a blocking sealing mechanism at the rear end of the box body, and applies pressure to the baffle plate through an extrusion plate and a micro spring, so that the baffle plate applies pressure to the sealing sheet, so that the sealing sheet is more stably attached to the rear end surface of the box body. At the same time, the baffle plate moves upward after use. At the same time, when soaking liquid still flows down, the soaking liquid is guided to the inner side of the through hole opened on the top surface of the bottom plate through the limiting plate and the extension plate, and enters the collection box through the through hole for collection, thereby achieving the beneficial effects of improving the overall sealing to prevent the leakage of the soaking liquid, and collecting the outflowing soaking liquid to prevent the waste of the soaking liquid and pollution of the environment.

[0017] Advantage 2: The invention discloses a wafer immersion device for wet processing. The extension plates extend upward in an inclined manner, and the left and right opposite surfaces of the two extension plates form an angle of 120° with the top surface of the bottom plate, so that the two extension plates can collect the immersion liquid at a larger angle. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the structure of the present invention;

[0019] Figure 2 It is a schematic diagram of the right side cross-sectional structure of the box body of the present invention;

[0020] Figure 3 It is a schematic structural diagram of the blocking sealing mechanism of the present invention;

[0021] Figure 4 It is a schematic diagram of the micro spring connection structure of the present invention;

[0022] Figure 5 The present invention Figure 3 A schematic diagram of the structure enlargement in the middle;

[0023] Figure 6 It is a diagram of the cooperation between the electric push rod and the sliding frame of the present invention.

[0024] Among them: baffle 1, electric push rod 2, sliding frame 3, supporting frame 4, first cylinder 5, connecting rod 6, rotating rod 7, liquid inlet 8, window 10, second cylinder 11, base 12, film box 13, soaking tank 14, heating plate 15, air inlet pipe 16, box body 17, L-shaped rigid part 18, blocking sealing mechanism 9, bottom plate 91, extension plate 92, limit plate 93, collecting mechanism 94, sealing sheet 95, fixing plate 96, sponge sheet 97, L-shaped plate 98, extrusion plate 99, rubber sheet 910, micro spring 911, collecting box 941, protrusion 942, groove 943, block 944, slot 945, transparent plate 946, through hole 947. DETAILED DESCRIPTION

[0025] The following will be combined with the attached Figure 1-6 The present invention is described in detail, and the technical solutions in the embodiments of the present invention are clearly and completely described. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] The present invention provides a wafer soaking device for wet processing by improvement. Figures 1 to 5 , which includes a baffle 1, an electric push rod 2, a box 17 and a blocking sealing mechanism 9. The baffle 1 is installed on the output shaft at the bottom of the second cylinder 11, the electric push rod 2 is locked to the front end of the top of the base 12, and the blocking sealing mechanism 9 is arranged at the rear end of the box 17.

[0027] like Figure 1 The second cylinder 11 is fixedly mounted on the top side of the box body 17 by an L-shaped rigid member 18, and is the side close to the rear end of the box body 17, so that the second cylinder 11 is suspended obliquely above the rear surface of the box body 17, and the second cylinder 11 can pull the baffle 1 located on the rear surface of the box body 17 up and down.

[0028] like Figure 3 The blocking sealing mechanism 9 includes a bottom plate 91 , an extension plate 92 , a limiting plate 93 , a collecting mechanism 94 , a sealing sheet 95 , a fixing plate 96 , a sponge sheet 97 , an L-shaped plate 98 , an extrusion plate 99 , a rubber sheet 910 and a micro spring 911 .

[0029] like Figure 3 The bottom plate 91 is fastened to the middle and lower part of the rear end surface of the box body 17, and the bottom plate 91 is provided with extension plates 92 at both ends. In this embodiment, the bottom plate 91 and the extension plates 92 at both ends are an integrated structure. A limit plate 93 is provided at the top of the rear end of the extension plate 92 and the bottom plate 91. In this embodiment, the extension plate 92, the bottom plate 91 and the limit plate 93 are an integrated structure. At this time, the limit plate 93 is located at the top of the rear end of the extension plate 92 and the bottom plate 91 at the same time. Figure 1 and Figure 3 .

[0030] like Figure 3, the collecting mechanism 94 is arranged at the bottom of the bottom plate 91, the sealing sheet 95 is pasted on the front end face of the baffle 1, and the sealing sheet 95 is attached to the rear end face of the box body 17, thereby improving the sealing performance of the baffle 1. The fixing plate 96 is embedded in the middle and upper part of the rear end face of the box body 17, and a sponge sheet 97 is pasted on the rear end face of the fixing plate 96, that is, the fixing plate 96 is attached to the rear end face of the box body 17 through the sponge sheet 97. Two L-shaped plates 98 are symmetrically installed and installed in the middle part of the rear end face of the box body 17, and the left and right opposite surfaces of the two L-shaped plates 98 are used to respectively fit the left and right end faces of the baffle 1. It should be noted that the baffle 1 will only fit when it drops to the corresponding position, and Figure 3 In the figure, the baffle 1 is in an ascending state and has not descended between the two L-shaped plates 98 . Therefore, the state in which the left and right opposite surfaces of the two L-shaped plates 98 are respectively attached to the left and right end surfaces of the baffle 1 is not shown.

[0031] Combined with reference Figure 1 , Figure 3 and Figure 4 The extrusion plate 99 is connected to the inner rear end surface of the L-shaped plate 98 through a micro spring 911, so as to apply elastic force to the baffle 1, and a rubber sheet 910 is fastened to the front end surface of the extrusion plate 99, and the rubber sheet 910 is used to be closely attached to the rear end surface of the baffle 1.

[0032] For further information, please refer to Figure 1 , Figure 2 and Figure 3 The top piston rod of the electric push rod 2 is fastened to the top surface of the sliding frame 3 (combined with reference Figure 6 , the top surface includes the top lower surface), the sliding frame 3 is slidably mounted on the support frame 4 locked at the front end of the top end of the base 12, and the middle of the top end surface and the rear end of the bottom end surface of the sliding frame 3 are respectively mounted with a first cylinder 5 and a connecting rod 6. The bottom output shaft of the first cylinder 5 passes through the top end surface of the sliding frame 3 and is fixedly connected to the top end surface of the rotating rod 7. The connecting rod 6 passes through the top end surface of the box 17 and is hinged to the middle of the top end surface of the film box 13. The rotating rod 7 passes through the top end surface of the box 17 and is hinged to the front end of the top end of the film box 13.

[0033] like Figure 2 The left side of the top surface and the middle of the rear end surface of the box body 17 are respectively provided with a liquid inlet 8 and a window 10, and the bottom end of the inner side of the box body 17 is provided with a soaking tank 14. The second cylinder 11 is installed at the top of the rear end of the box body 17, a heating plate 15 is embedded in the front end of the inner side of the soaking tank 14, and an air inlet pipe 16 is provided at the rear end of the top of the soaking tank 14, and the air inlet pipe 16 is installed at the middle and lower part of the inner rear end surface of the box body 17.

[0034] Furthermore, the collecting mechanism 94 includes a collecting box 941, a protrusion 942, a groove 943, a block 944, a groove 945, a transparent plate 946 and a through hole 947. The collecting box 941 is attached to the bottom end surface of the bottom plate 91, the protrusion 942 is fastened to the middle part of the front end surface of the collecting box 941, and the protrusion 942 slides left and right along the inner side of the groove 943 opened in the middle and lower part of the rear end surface of the box body 17.

[0035] The clamping block 944 is disposed in the middle of the upper and lower end surfaces of the protrusion 942. Figure 5 Due to the angle problem, only the block 944 is shown to be located in the middle of the lower end surface of the protrusion 942, but it should be known that another part of the block 944 will be located in the middle of the upper end surface of the protrusion 942. In addition, in this embodiment, the block 944 and the protrusion 942 are an integrated structure.

[0036] The block 944 movably extends into the inner side of the slot 945, and the slot 945 is provided at the upper and lower ends of the inner side of the groove 943. Also due to the angle, the figure only shows the block 944 movably extending into the inner side of the slot 945 at the lower end.

[0037] The transparent plate 946 is embedded in the lower middle part of the rear end surface of the collecting box 941, and the through hole 947 passes through the middle of the upper and lower ends of the bottom plate 91, and the through hole 947 falls into the inner range of the collecting box 941, so as to facilitate the collection of the soaking liquid flowing out of the through hole 947.

[0038] Furthermore, the extension plates 92 extend upwardly in an inclined manner, and the left and right opposite surfaces of the two extension plates 92 form an angle of 120° with the top surface of the bottom plate 91, so that the extension plates 92 can collect a larger area of ​​immersion liquid.

[0039] Furthermore, the top of the front end surface of the rubber sheet 910 is in the shape of a slope that tapers from bottom to top, and the front end surface of the rubber sheet 910 is smooth and has no burrs, so that the baffle 1 applies a thrust to the rubber sheet 910 during the vertical downward movement, so that the rubber sheet 910 moves backward.

[0040] Furthermore, three micro springs 911 are evenly spaced on the rear end surface of the extrusion plate 99, and the three micro springs 911 are respectively located at the upper and lower ends and the middle of the rear end surface of the extrusion plate 99, so as to facilitate the rapid and stable resetting of the extrusion plate 99.

[0041] Furthermore, the sealing sheet 95 is square in shape, and the side surface of the sealing sheet 95 is flush with the side surface of the baffle 1 , thereby improving the overall sealing performance of the baffle 1 .

[0042] Furthermore, the top surface of the bottom plate 91 is in an arc shape that tapers from the outside to the inside, and a smooth film layer is provided on the top surface of the bottom plate 91 to facilitate the soaking liquid to flow into the inside of the through hole 947 .

[0043] Furthermore, the sealing sheet 95 is made of silicone material, which is relatively soft and has good sealing performance.

[0044] Furthermore, the micro spring 911 is made of stainless steel, which is not easy to rust or corrode and has a long service life.

[0045] The present invention provides a wafer soaking device for wet processing through improvement, and its working principle is as follows;

[0046] First, the device is placed at a designated location and connected to an external controller, and then a certain amount of soaking liquid is injected into the soaking tank 14 in the housing 17 through the liquid inlet 8;

[0047] Second, the wafers can be placed inside the wafer box 13 after passing through the inside of the window 10 by setting a corresponding working robot arm, and when a certain amount of wafers are inside the wafer box 13, the wafer placement stops;

[0048] Third, the baffle 1 can be driven to move vertically downward by controlling the second cylinder 11, and the baffle 1 drives the sealing sheet 95 to move downward in the process of moving vertically downward. At the same time, the baffle 1 applies pressure to the rubber sheet 910, and the rubber sheet 910 drives the extrusion plate 99 to move backward under the pressure, and the micro spring 911 is compressed. When the baffle 1 completely covers the window, the second cylinder 11 stops working;

[0049] Fourth, under the joint action of the connecting rod 6 and the rotating rod 7, the electric push rod 2 is controlled to drive the sliding frame 3 and the film box 13 to move downward, and then the first cylinder 5 is controlled to drive the rotating rod 7 to move. When the rotating rod 7 moves upward, the film box is tilted and opened downward, and the wafers in the film box fall into the soaking tank. When the entire pai sliding frame moves downward, the entire film box enters the soaking tank 14 for soaking, which effectively prevents the crystals from adhering to the film box. The angle of the film box can be adjusted by adjusting the rotating rod 7, and the soaking liquid is heated by the heating plate 15.

[0050] Fifth, during the use of the soaking device, the extrusion plate 99 and the micro spring 911 apply pressure to the baffle 1, so that the baffle 1 applies pressure to the sealing sheet 95, making the sealing sheet 95 more stably fit on the rear end surface of the box body 17, thereby improving the sealing performance of the baffle 1 and the window 10 and preventing the soaking liquid from leaking outward. At the same time, the baffle 1 moves upward after use, and the sponge sheet 97 contacts the front end surface of the baffle to absorb the soaking liquid. At the same time, when there is still soaking liquid flowing down, the soaking liquid is guided to the inner side of the through hole 947 opened on the top surface of the bottom plate 91 through the limiting plate 93 and the extension plate 92, and enters the collection box 941 through the through hole 947 for collection.

[0051] The present invention provides a wafer soaking device for wet processing by improvement, wherein the baffle 1 is pressed by the extrusion plate 99 and the micro spring 911, so that the baffle 1 is pressed by the sealing sheet 95, so that the sealing sheet 95 is more stably attached to the rear end surface of the box body 17, thereby improving the sealing performance of the baffle 1 and the window 10 to prevent the soaking liquid from leaking outward, and the baffle 1 moves upward after use, and the sponge sheet 97 contacts the front end surface of the baffle to absorb the soaking liquid, and when there is still soaking liquid flowing down, the limit plate 93 is used to stop the soaking liquid from leaking outward. The extension plate 92 guides the soaking liquid to the inner side of the through hole 947 opened on the top surface of the bottom plate 91, and enters the collection box 941 through the through hole 947 for collection, thereby achieving the beneficial effects of improving the overall sealing to prevent the leakage of the soaking liquid, and collecting the outflowing soaking liquid to prevent the waste of the soaking liquid and pollution of the environment. The extension plate 92 is extended upward in an inclined manner, and the left and right opposite surfaces of the two extension plates 92 form an angle of 120° with the top surface of the bottom plate 91, so that the two extension plates 92 can collect the soaking liquid at a larger angle.

[0052] The above description of the disclosed embodiments enables one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A wafer soaking device for wet processing, comprising a baffle (1), an electric push rod (2) and a box (17), wherein the baffle (1) is mounted on the bottom output shaft of a second cylinder (11), and the electric push rod (2) is locked to the front end of the top of a base (12); Features: It also comprises a blocking sealing mechanism (9), the blocking sealing mechanism (9) being arranged at the rear end of the box body (17), the blocking sealing mechanism (9) comprising a bottom plate (91), an extension plate (92), a limit plate (93), a collecting mechanism (94) and a sealing sheet (95), the bottom plate (91) being fastened to the middle and lower part of the rear end surface of the box body (17), and the extension plates (92) being arranged at the left and right ends of the bottom plate (91), the limit plates (93) being arranged at the top of the rear end of the extension plate (92) and the bottom plate (91), the collecting mechanism (94) being arranged at the bottom of the bottom plate (91), the sealing sheet (95) being adhered to the front end surface of the baffle plate (1), and the sealing sheet (95) being attached to the rear end surface of the box body (17); The blocking sealing mechanism (9) further comprises a fixing plate (96), a sponge sheet (97), an L-shaped plate (98), an extrusion plate (99), a rubber sheet (910) and a micro spring (911); the fixing plate (96) is embedded in the middle upper part of the rear end surface of the box body (17), and the sponge sheet (97) is pasted to the rear end surface of the fixing plate (96); two L-shaped plates (98) are symmetrically installed, the L-shaped plates (98) are installed in the middle part of the rear end surface of the box body (17), and the left and right opposite surfaces of the two L-shaped plates (98) are respectively used to fit the left and right end surfaces of the baffle (1); the extrusion plate (99) is connected to the inner rear end surface of the L-shaped plate (98) through the micro spring (911), and the front end surface of the extrusion plate (99) is fastened with the rubber sheet (910), and the rubber sheet (910) is used to fit closely to the rear end surface of the baffle (1); The box body (17) is provided with a liquid inlet (8) and a window (10) at the left side of the top surface and the middle of the rear end surface, respectively, and a soaking tank (14) is provided at the bottom end of the inner side of the box body (17). The second cylinder (11) is fixedly mounted on the top of the rear end of the box body (17) by an L-shaped rigid member (18). A heating plate (15) is embedded at the front end of the inner side of the soaking tank (14). An air inlet pipe (16) is provided at the rear end of the top of the soaking tank (14). The air inlet pipe (16) is mounted at the lower middle part of the rear end surface of the inner side of the box body (17). The sealing sheet (95) has a square shape, and the side surface of the sealing sheet (95) is flush with the side surface of the baffle (1).

2. The device for soaking wafers for wet processing according to claim 1, characterized in that: The top output shaft of the electric push rod (2) is fastened to the top surface of the sliding frame (3), and the sliding frame (3) is slidably mounted on a support frame (4) locked at the front end of the top surface of the base (12), and a first cylinder (5) and a connecting rod (6) are respectively mounted at the middle of the top surface and the rear end of the bottom surface of the sliding frame (3), the bottom output shaft of the first cylinder (5) passes through the top surface of the sliding frame (3) and is fixedly connected to the top surface of the rotating rod (7), the connecting rod (6) passes through the top surface of the box (17) and is hinged to the middle of the top surface of the film box (13), and the rotating rod (7) passes through the top surface of the box (17) and is hinged to the front end of the top surface of the film box (13).

3. The device for soaking wafers for wet processing according to claim 2, characterized in that: The collecting mechanism (94) comprises a collecting box (941), a protrusion (942), a groove (943), a block (944), a groove (945), a transparent plate (946) and a through hole (947); the collecting box (941) is attached to the bottom end surface of the bottom plate (91); the protrusion (942) is fastened to the middle part of the front end surface of the collecting box (941); and the protrusion (942) slides left and right along the inner side of the groove (943) provided at the middle and lower part of the rear end surface of the box body (17). The card block (944) is arranged in the middle of the upper and lower end surfaces of the protrusion (942), and the card block (944) is movably extended into the inner side of the card slot (945), and the card slot (945) is opened at the upper and lower ends of the inner side of the groove (943), and the transparent plate (946) is embedded in the middle and lower part of the rear end surface of the collection box (941), and the through hole (947) passes through the middle of the upper and lower ends of the bottom plate (91), and the through hole (947) falls into the inner range of the collection box (941).

4. The device for soaking wafers for wet processing according to claim 2, characterized in that: The extension plates (92) extend upwardly in an inclined manner, and the left and right opposite surfaces of the two extension plates (92) form an angle of 120° with the top surface of the bottom plate (91).

5. The wafer soaking device for wet processing according to claim 2, characterized in that: The top of the front end surface of the rubber sheet (910) is in the shape of an inclined surface that gradually tapers from bottom to top, and the front end surface of the rubber sheet (910) is smooth and free of burrs.

6. The wafer soaking device for wet processing according to claim 2, characterized in that: Three micro springs (911) are arranged at equal intervals on the rear end surface of the extrusion plate (99), and the three micro springs (911) are respectively located at the upper and lower ends and the middle part of the rear end surface of the extrusion plate (99).

7. The wafer soaking device for wet processing according to claim 2, characterized in that: The top end surface of the bottom plate (91) is in an arc shape that tapers from the outside to the inside, and a smooth film layer is provided on the top end surface of the bottom plate (91).

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