A plasma enhanced chemical vapor deposition device

Abstract

The present invention relates to the field of coating technology, and specifically to a plasma enhanced chemical vapor deposition device, including a vacuum pumping mechanism, a reaction mechanism and a transfer mechanism, wherein the vacuum pumping mechanism is connected to the reaction mechanism, and the transfer mechanism delivers the product to be processed into or out of the reaction mechanism, wherein the reaction mechanism includes a reaction chamber, an electrode assembly and a bearing assembly, wherein the electrode assembly is arranged at the top of the reaction chamber and moves inside the reaction chamber, and the bearing assembly is arranged at the bottom of the reaction chamber and moves inside the reaction chamber, and the electrode assembly includes at least one gas outlet device, wherein the gas outlet device includes a diffusion tube and a diffusion ball head from top to bottom, and the diffusion tube and the diffusion ball head are both provided with a plurality of uniformly distributed diffusion holes. In this way, the coating gas can be dispersed in all directions from the diffusion tube and the diffusion ball head, ensuring that the coating gas can evenly adhere to the inner wall of the vaccine bottle, avoiding the problem of coating defects and incompleteness on the inner wall of the vaccine bottle, and being conducive to improving the production quality of the vaccine bottle.

Description

Technical Field

[0001] The invention relates to the technical field of film coating, and in particular to a plasma enhanced chemical vapor deposition device. Background Art

[0002] Plasma Enhanced Chemical Vapor Deposition (PECVD) uses energy such as microwaves or radio frequencies to ionize the gas containing the atoms that make up the thin film into a mixture of high-energy atoms, positive and negative ions, electrons, etc., to form plasma and deposit a thin film, thereby achieving high-speed film formation.

[0003] The inner wall of some bottle-shaped objects, including vaccine bottles, is usually coated. At present, the common method is to turn the vaccine bottle upside down, and the gas used for coating rises from the bottom to the top at the mouth of the vaccine bottle and adheres to the inner wall of the vaccine bottle to complete the coating. However, in the common method, since the gas used for coating rises from the bottom to the top, the electroplating film at the mouth of the vaccine bottle is prone to uneven electroplating, and even electroplating defects and incomplete problems, which greatly affects the production quality of the vaccine bottle.

[0004] Therefore, the industry is in urgent need of a solution that can solve the above problems. Summary of the invention

[0005] The object of the present invention is to provide a plasma enhanced chemical vapor deposition device to address the deficiencies of the prior art. The object of the present invention can be achieved through the following technical solution.

[0006] A plasma enhanced chemical vapor deposition device includes a vacuum pumping mechanism, a reaction mechanism and a transfer mechanism, wherein the vacuum pumping mechanism is connected to the reaction mechanism, and the transfer mechanism sends the product to be processed into or out of the reaction mechanism. The reaction mechanism includes a reaction chamber, an electrode assembly and a supporting assembly, wherein the electrode assembly is arranged at the top of the reaction chamber and moves inside the reaction chamber, and the supporting assembly is arranged at the bottom of the reaction chamber and moves inside the reaction chamber. The electrode assembly includes at least one gas outlet device, and the gas outlet device includes a hollow diffusion tube and a diffusion ball head from top to bottom, and the diffusion tube and the diffusion ball head are both provided with a plurality of evenly distributed diffusion holes. The electrode assembly is a conductive material, and a bias power supply is added to the electrode assembly.

[0007] Preferably, a sealing cover plate is provided on the diffusion tube, and when in operation, the sealing cover plate covers the product to be processed and makes the vacuum degree inside the product to be processed range from 1Pa to 100Pa, and the vacuum degree range of the reaction chamber is 0.1Pa to 10Pa.

[0008] Preferably, the electrode assembly also includes a first lifting mechanism, an upper electrode plate and an air inlet channel, the first lifting mechanism is fixed at the top of the reaction chamber, the upper electrode plate is fixed on the lifting shaft of the first lifting mechanism, the upper electrode plate is connected to the air inlet channel, the air outlet device is fixed at the bottom end of the upper electrode plate and is connected to the upper electrode plate, and the upper electrode plate is connected to the bias negative electrode.

[0009] Preferably, the upper electrode plate is provided with several diffusion layers, the width of the diffusion layers increases gradually from top to bottom, a diffusion plate is provided between two adjacent diffusion layers, several diffusion openings are provided on the diffusion plate, and the diffusion openings of the diffusion plate become thinner gradually from top to bottom, and several air outlet devices are provided on the diffusion plate at the bottom.

[0010] Preferably, the supporting assembly includes a second lifting mechanism, a lower electrode plate and a positioning member, the second lifting mechanism is fixed to the bottom end of the reaction chamber, the lower electrode plate is fixed on the lifting shaft of the second lifting mechanism, the positioning member is arranged on the lower electrode plate, and the lower electrode plate is connected to the bias positive electrode.

[0011] Preferably, the transfer mechanism includes a transfer chamber, a sheet feeding member, a transfer drive device and a guide rod, the transfer drive device is fixed on the cavity wall of the transfer chamber, the guide rod is fixedly arranged inside the transfer chamber, the sheet feeding member is transmission-connected to the mobile drive device, and the sheet feeding member is slidingly connected to the guide rod.

[0012] Preferably, a positioning monitoring device is fixedly provided on the side wall of the transfer chamber.

[0013] Preferably, the vacuum pumping mechanism comprises a dry pump and a Roots pump in sequence, and an angle valve and a butterfly valve are provided between the Roots pump and the reaction chamber.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] The present invention has developed a plasma enhanced chemical vapor deposition equipment, in which the gas outlet device is extended into an upright vaccine bottle, so that the coating gas is dispersed in all directions from the diffusion tube and the diffusion ball head, ensuring that the coating gas can adhere to the inner wall of the vaccine bottle evenly, avoiding electroplating defects and incompleteness on the inner wall of the vaccine bottle, and is beneficial to improving the production quality of the vaccine bottle. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0017] Figure 1 Schematic diagram of the structure of the device in the embodiment of the present invention.

[0018] Figure 2 It is a schematic diagram of the device structure in which part of the structure is hidden in an embodiment of the present invention.

[0019] Figure 3 It is a side sectional view of the device in an embodiment of the present invention.

[0020] Figure 4 for Figure 3 A partial enlarged view of part A.

[0021] Figure 5 4 is a side sectional view of the upper electrode plate in an embodiment of the present invention.

[0022] Figure 6 Schematic diagram of the device in the embodiment of the present invention. DETAILED DESCRIPTION

[0023] The technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the protection scope of the present invention.

[0024] A plasma enhanced chemical vapor deposition apparatus, such as Figures 1 to 6 As shown, it includes a vacuum mechanism 1, a reaction mechanism 2 and a transfer mechanism 3. The vacuum mechanism 1 is connected to the reaction mechanism 2. The vacuum mechanism 1 vacuums the interior of the reaction mechanism 2 to provide reaction conditions that meet the requirements for coating the inside of the vaccine bottle. The transfer mechanism 3 delivers the product to be processed into or out of the reaction mechanism 2. According to different situations, a transfer mechanism 3 can be set to deliver the vaccine bottle to be coated into the reaction mechanism 2, and the transfer mechanism 3 will take out the processed vaccine bottle after the coating is completed. Alternatively, two transfer mechanisms 3 can be set and located on both sides of the reaction mechanism 2, one of which delivers the vaccine bottle to be coated into the reaction mechanism 2, and the other transfer mechanism 3 takes out the vaccine bottle after the coating is completed. As shown Figure 3As shown, the reaction mechanism 2 includes a reaction chamber 21, an electrode assembly 22 and a supporting assembly 23. The reaction chamber 21 is used to accommodate the vaccine bottles to be processed so as to coat the inside of the vaccine bottles. The vacuuming mechanism 1 vacuums the reaction chamber 21 to ensure that the vacuum degree of the reaction chamber 21 is within the working requirement range. The electrode assembly 22 is disposed at the top of the reaction chamber 21 and moves inside the reaction chamber 21. The position height of the gas outlet of the electroplating gas can be adjusted so that the emitted electroplating gas can be evenly dispersed in the vaccine bottle. The supporting assembly 23 is disposed at the bottom of the reaction chamber 21 and moves inside the reaction chamber 21. The supporting assembly 23 can lift the vaccine bottles that have been processed by coating to a certain height, so as to facilitate the transfer mechanism 3 to take out the vaccine bottles. The electrode assembly 22 includes at least one gas outlet device 221, and one gas outlet device 221 corresponds to one vaccine bottle. Figure 6 As shown, multiple gas outlet devices 221 can be provided according to production requirements to simultaneously coat multiple vaccine bottles, which is beneficial to improving production efficiency. Figure 4 As shown, the gas outlet device 221 includes a hollow diffusion tube 2211 and a diffusion ball head 2212 from top to bottom, and the diffusion tube 2211 and the diffusion ball head 2212 are both provided with a number of evenly distributed diffusion holes 2213. The coating gas is emitted in all directions through the diffusion tube 2211 and the diffusion holes 2213 on the diffusion ball head 2212. The diffusion tube 2211 is mainly used for the vaccine bottle mouth area, and the coating gas emitted can evenly coat the vaccine bottle mouth area, while the diffusion ball head 2212 is more divergent and is used to coat the inner wall of the vaccine bottle body. The electrode assembly 22 is a conductive material, including the diffusion tube 2211 and the diffusion ball head 2212, which are all conductive materials, and can fully ionize the coating gas.

[0025] A plasma enhanced chemical vapor deposition device is provided in this embodiment. The transfer mechanism 3 delivers the vaccine bottle to be coated into the reaction chamber 21. The vacuum mechanism 1 evacuates the reaction chamber 21 to control the vacuum degree of the reaction chamber 21. The electrode assembly 22 moves downward so that the gas outlet device 221 enters the vaccine bottle, and then the electroplating gas is introduced, wherein the electroplating gas is preferably silicon dioxide gas. The electrode is operated by feeding in an RF power supply, and the silicon dioxide gas introduced is ionized into a gas ion state under the action of the electrode, and then emitted from the diffusion tube 2211 and the diffusion ball head 2212 and attached to the inner wall of the vaccine bottle. In this way, the coating gas can be dispersed in all directions from the diffusion tube 2211 and the diffusion ball head 2212, ensuring that the coating gas can evenly adhere to the inner wall of the vaccine bottle, avoiding electroplating defects and incompleteness on the inner wall of the vaccine bottle, which is beneficial to improving the production quality of the vaccine bottle.

[0026] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 4As shown, the diffusion tube 2211 is provided with a sealing cover plate 222. When working, the sealing cover plate 222 covers the product to be processed and makes the vacuum degree inside and outside the product to be processed differ by one order of magnitude, that is, the vacuum degree inside the vaccine bottle differs by 10 times from that outside the vaccine bottle (inside the reaction chamber 21), wherein the vacuum degree is controlled by the vacuum pumping mechanism 1. In order to achieve a better coating effect, the vacuum degree of the coating inside the vaccine bottle is preferably about 1Pa-100Pa, and relatively, the vacuum degree outside the vaccine bottle is about 0.1Pa-10Pa. In this way, it can be ensured that the inside of the vaccine bottle can be discharged and coated smoothly and stably during the process, while the outside of the vaccine bottle will not be coated, thereby ensuring the coating quality of the vaccine bottle.

[0027] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 3 and Figure 4 As shown, the electrode assembly 22 also includes a first lifting mechanism 223, an upper electrode plate 225 and an air inlet channel 224. The first lifting mechanism 223 includes but is not limited to motor drive, cylinder drive, etc. The air inlet channel 224 is connected to an external coating gas source to transmit the coating gas to the inner wall of the vaccine bottle for coating. The first lifting mechanism 223 is fixed to the top of the reaction chamber 21, and the upper electrode plate 225 is fixed on the lifting shaft of the first lifting mechanism 223. The upper electrode plate 225 is connected to the air inlet channel 224 so as to ionize the coating gas and can play a role in diffusing the gas. The gas outlet device 221 is fixed to the bottom end of the upper electrode plate 225 and is connected to the upper electrode plate 225. The gas outlet device 221 is connected to the upper electrode plate 225 so as to disperse the ionized coating gas in the vaccine bottle so as to adhere to the inside of the vaccine bottle to achieve coating.

[0028] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 5As shown, the upper electrode plate 225 is provided with several diffusion layers 2251, and the width of the diffusion layer 2251 increases from top to bottom, and the closer to the input end, the wider the diffusion layer 2251 is. In this way, the area of ​​the upper electrode plate 225 for diffusing the coating gas can be expanded, and more diffusion tubes 2211 and diffusion ball heads 2212 can be connected, so that more vaccine bottles can be coated at the same time, thereby improving production efficiency. Moreover, the width of the diffusion layer 2251 gradually increases, which is conducive to breaking up the coating gas and making the coating gas evenly distributed in all directions. A diffusion plate 2252 is provided between two adjacent diffusion layers 2251, and the diffusion plate 2252 separates the two adjacent diffusion layers 2251. The diffusion plate 2252 is provided with a plurality of diffusion openings (not shown in the figure), and the diffusion openings of the diffusion plate 2252 become thinner from top to bottom. On the one hand, it can ensure that the coating gas is subjected to sufficient divergent force, so that the coating gas can be smoothly sent out of the upper electrode plate 225. On the other hand, it can also ensure that the divergent force on the coating gas changes evenly, avoiding uneven coating due to uneven forces in different directions.

[0029] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 3 As shown, the bearing assembly 23 includes a second lifting mechanism 231, a lower electrode plate 232 and a positioning member 233. The lower electrode plate 232 and the upper electrode plate 225 form an electroplating loop for electroplating the inner wall of the vaccine bottle. The second lifting mechanism 231 is fixed to the bottom end of the reaction chamber 21, and the lower electrode plate 232 is fixed to the lifting shaft of the second lifting mechanism 231. After the coating is completed, the first lifting mechanism 223 drives the diffusion tube 2211 and the diffusion ball head 2212 to rise and leave the vaccine bottle, and the second lifting mechanism 231 lifts the vaccine bottle to a certain height, so that the transfer mechanism 3 can take out the vaccine bottle. The positioning member 233 is arranged on the lower electrode plate 232. The positioning member 233 can fix the position of the vaccine bottle to ensure that the position of the vaccine bottle does not change during the coating process, and ensure that the coating is carried out smoothly and stably.

[0030] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 2As shown, the transfer mechanism 3 includes a transfer chamber 31, a sheet feeding member 33, a transfer drive device (not shown) and a guide rod 32. The transfer drive device is fixed on the cavity wall of the transfer chamber 31. The guide rod 32 is fixedly arranged inside the transfer chamber 31. The sheet feeding member 33 is connected to the mobile driving device in a transmission manner. The sheet feeding member 33 is connected to the guide rod 32 in a sliding manner. The transfer drive device provides power to enable the sheet feeding member 33 to feed the vaccine bottle into the reaction chamber 21 along the guide rod 32, and then return to avoid interference with the coating. After the coating is completed, the sheet feeding member 33 enters the reaction chamber 21 again to take out the vaccine bottle after the coating is completed. In addition, a positioning monitoring device is fixedly arranged on the side wall of the transfer chamber 31 to monitor whether the position movement of the sheet feeding member 33 reaches the predetermined position. If it reaches the predetermined position, the driving of the sheet feeding member 33 is stopped to avoid damage to the sheet feeding member 33. A clearance space is arranged in the middle of the sheet feeding member 33 to avoid interference with the electroplating of the vaccine bottle.

[0031] A plasma enhanced chemical vapor deposition device is provided in this embodiment. Figure 1 and Figure 6 As shown, the vacuum pumping mechanism 1 includes a dry pump 12 and a Roots pump 11. An angle valve 13 and a butterfly valve 14 are provided between the Roots pump and the reaction chamber 21. The dry pump 12 and the Roots pump 11 can make the vacuum degree in the reaction mechanism 2 meet the process requirements and facilitate adjustment.

[0032] Specifically, when the coating process is performed, process gas is appropriately introduced into the interior of the vaccine bottle product to be processed through the diffusion tube 2211 and the diffusion head 2212 to achieve the required gas flow rate, and the butterfly valve 14 between the pump and the reaction chamber 21 is adjusted to make the vacuum degree inside the vaccine bottle product to be processed within a range of 1Pa-100Pa. At the same time, medium-frequency or high-frequency electromagnetic waves are fed in to discharge the coating gas to generate plasma, and by appropriately applying bias to the upper electrode plate 225 and the lower electrode plate 232, the required thin film is plated on the inside of the processed product.

[0033] The present invention is further described above with the aid of specific embodiments. However, it should be understood that the specific description here should not be construed as limiting the essence and scope of the present invention. Various modifications made to the above embodiments by ordinary technicians in the field after reading this specification are all within the scope of protection of the present invention.

Claims

1. A plasma enhanced chemical vapor deposition device, characterized in that: It includes a vacuum pumping mechanism, a reaction mechanism and a transfer mechanism, wherein the vacuum pumping mechanism is connected to the reaction mechanism, and the transfer mechanism sends the product to be processed into or out of the reaction mechanism. The reaction mechanism includes a reaction chamber, an electrode assembly and a bearing assembly, wherein the electrode assembly is arranged at the top of the reaction chamber and moves inside the reaction chamber, and the bearing assembly is arranged at the bottom of the reaction chamber and moves inside the reaction chamber. The electrode assembly includes at least one gas outlet device, and the gas outlet device includes a hollow diffusion tube and a diffusion ball head in sequence from top to bottom, and the diffusion tube and the diffusion ball head are both provided with a plurality of uniformly distributed diffusion holes. The electrode assembly is a conductive material, and a bias power supply is added to the electrode assembly; The electrode assembly further comprises a first lifting mechanism, an upper electrode plate and an air inlet channel, wherein the first lifting mechanism is fixed to the top of the reaction chamber, the upper electrode plate is fixed to the lifting shaft of the first lifting mechanism, the upper electrode plate is connected to the air inlet channel, the air outlet device is fixed to the bottom end of the upper electrode plate and is connected to the upper electrode plate, and the upper electrode plate is connected to the bias negative electrode; The supporting assembly includes a second lifting mechanism, a lower electrode plate and a positioning member, the second lifting mechanism is fixed to the bottom end of the reaction chamber, the lower electrode plate is fixed on the lifting shaft of the second lifting mechanism, the positioning member is arranged on the lower electrode plate, and the lower electrode plate is connected to the bias positive electrode.

2. The plasma enhanced chemical vapor deposition device according to claim 1, characterized in that: The diffusion tube is sleeved with a sealing cover plate, which covers the product to be processed and makes the vacuum degree inside the product to be processed range from 1Pa to 100Pa when working, and the vacuum degree of the reaction chamber ranges from 0.1Pa to 10Pa.

3. The plasma enhanced chemical vapor deposition device according to claim 1, characterized in that: The upper electrode plate is provided with a plurality of diffusion layers, the width of the diffusion layers increases from top to bottom, a diffusion plate is provided between two adjacent diffusion layers, a plurality of diffusion openings are provided on the diffusion plate, and the diffusion openings of the diffusion plate become thinner from top to bottom, and a plurality of gas outlet devices are provided on the diffusion plate at the bottom.

4. The plasma enhanced chemical vapor deposition device according to claim 1, characterized in that: The transfer mechanism includes a transfer chamber, a sheet feeding member, a transfer drive device and a guide rod. The transfer drive device is fixed on the cavity wall of the transfer chamber, the guide rod is fixedly arranged inside the transfer chamber, the sheet feeding member is transmission-connected to the transfer drive device, and the sheet feeding member is slidingly connected to the guide rod.

5. The plasma enhanced chemical vapor deposition device according to claim 4, characterized in that: A positioning monitoring device is fixedly provided on the side wall of the transfer chamber.

6. The plasma enhanced chemical vapor deposition equipment according to claim 1, characterized in that: The vacuum pumping mechanism comprises a dry pump and a Roots pump, and an angle valve and a butterfly valve are arranged between the Roots pump and the reaction chamber.

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