A magnetic filtering arc coating device

Abstract

The present invention discloses a magnetic filtered arc coating device, comprising: a cathode arc source, comprising an arc target holder, a target block, a permanent magnet, and a permanent magnet adjustment mechanism, wherein the target block is mounted on the front end surface of the target holder, a columnar permanent magnet is placed in the center of the rear end surface of the target holder near the target block, and the permanent magnet adjustment mechanism is connected to the rear of the permanent magnet; a vacuum coating chamber, wherein the chamber is vacuum-set; a magnetic filtered curved pipe, one end of which is an inlet end connected to the front end of the cathode arc source and the other end is an outlet end connected to the inner cavity of the vacuum coating chamber; a first excitation coil mounted around the target block and located outside the cathode arc source; the first excitation coil is used to cooperate with the permanent magnet to change the magnetic field; and a plurality of coil modules are respectively arranged at the inlet end, the bend, and the outlet end of the magnetic filtered curved pipe. The present invention can reduce the generation of large particles in the cathode arc target plasma, and achieve a high deposition rate, good uniformity, and good quality of the film.

Description

Technical Field

[0001] The invention relates to a magnetic filtering arc coating device. Background Art

[0002] Vacuum cathode arc ion plating is a common surface modification method used to deposit ultra-hard coatings on tools, molds, and wear-resistant parts, as well as wear-resistant and corrosion-resistant decorative coatings on everyday products. Vacuum cathode arc ion plating primarily generates an arc discharge on the surface of a cathode arc target, evaporating and ionizing the target to generate cathode arc target plasma. This method has high ionization rates, high energy, and high concentration, resulting in high deposition rates, dense films, high hardness, and excellent adhesion.

[0003] Since the arc discharge of the traditional vacuum cathode arc is generated from the micro-arc spot area on the target surface, the high temperature of the arc spot causes the cathode arc target to melt into a small molten pool, and at the same time evaporates a large amount of cathode arc target metal vapor. The metal vapor is violently ejected from the center of the molten pool to the outside, carrying a large number of droplets to fly to the coating space, forming large particles on the film layer, increasing the roughness of the film surface, reducing the performance of the film layer, and limiting its application in high-performance fields; if the power density of the arc source is increased, the deposition rate can be increased, but denser and larger particles will appear on the film layer; if the arc source current is reduced, the number and size of large particles can be reduced, but it will also reduce the transmission efficiency of the cathode arc target ions, affecting the overall efficiency of the coating.

[0004] One of the current solutions to the above problems is to install an electromagnetically controlled curved tube on the channel where the cathode arc target plasma beam is emitted. This allows charged particles to fly along the axis of the curved tube under the action of the magnetic field into the coating area, while uncharged particles, including large particles, continue to fly in the initial direction until they collide with the tube wall at the bend of the curved tube, thereby effectively reducing the number of large particles in the film layer. However, the following problems still exist:

[0005] (1) Severely reduces the deposition rate of the film;

[0006] (2) In order to remove large particles and improve the uniformity of the film layer, it is generally necessary to add additional components inside the vacuum coating chamber, which takes up space for the coated products, increases the manufacturing cost and design difficulty of the vacuum coating chamber, and also reduces the product loading capacity;

[0007] (3) Adding a filter component at the outlet of the elbow effectively reduces the number of large particles, but also prevents part of the cathode arc target plasma from reaching the product surface, and also weakens the energy of the cathode arc target plasma reaching the product surface;

[0008] (4) The bonding force between the film layer and the substrate is weak. Summary of the Invention

[0009] The technical problem to be solved by the present invention is to provide a magnetic filtered arc coating device. The magnetic field of the coating device has been improved to more effectively reduce the generation of large particles in the cathode arc target plasma, thereby improving the efficiency of the plasma passing through the bend, and increasing the deposition rate of the film and improving the uniformity of the film layer.

[0010] To solve the above technical problems, the specific technical solutions adopted by the present invention are as follows.

[0011] A magnetic filtering arc coating device, comprising:

[0012] A cathode arc source comprises an arc target base, a target block, a permanent magnet and an adjustment mechanism thereof. The target block is mounted on the front end face of the target base, a cylindrical permanent magnet is placed in the center of the rear end face of the target base near the target block, and a permanent magnet adjustment mechanism is connected to the rear of the permanent magnet.

[0013] Vacuum coating chamber, which is a vacuum chamber;

[0014] A magnetic filtering elbow, one end of which is an inlet end connected to the front end of the cathode arc source, and the other end is an outlet end connected to the inner cavity of the vacuum coating chamber;

[0015] It is characterized by further comprising:

[0016] A first excitation coil is installed around the target block and outside the cathode arc source; the first excitation coil is used to cooperate with the permanent magnet to change the magnetic field to control the movement of the arc spot on the target surface;

[0017] A plurality of coil modules are respectively arranged at the inlet end, the bend and the outlet end of the magnetic filtering elbow.

[0018] On the basis of the above technical solution, the present invention can be improved as follows:

[0019] The magnetic filtered arc coating device of the present invention also includes an anode cylinder, the front end of which is equipped with the cathode arc source, the rear end of which is connected to the magnetic filtering bend pipe, and a vacuum gauge and a gas distribution pipe connected to the inner cavity of the anode cylinder are provided on the anode cylinder. The gas input from the gas distribution pipe is a gas with a positive potential applied.

[0020] The portion of the gas distribution pipe located inside the anode cylinder of the present invention is arranged in a circle along the inner wall of the anode cylinder and is provided with a plurality of gas outlet holes.

[0021] The magnetic filtering arc coating device of the present invention further comprises a cooling pipe, which is wound around the outer wall of the magnetic filtering curved pipe.

[0022] The magnetic filtration arc coating device of the present invention further comprises a second excitation coil, which is installed between the outlet end of the magnetic filtration elbow and the side plate of the vacuum coating chamber.

[0023] The inlet and outlet ends of the magnetic filtration elbow of the present invention are both provided with a coil module, and at least two coil modules are provided at the bend of the magnetic filtration elbow, and each coil module is individually connected to a control power supply.

[0024] The coil module of the present invention is an annular coil module, and each coil module is sleeved on the magnetic filtration elbow and fixed by bolts.

[0025] The first excitation coil and the second excitation coil of the present invention are connected to a waveform-adjustable bipolar pulse power supply with a frequency of 1 to 50 Hz and a current of 1 to 5A.

[0026] The coil modules located at the inlet and outlet ends of the magnetic filtration elbow of the present invention are connected to a bipolar pulse power supply with adjustable waveform, and its current is 5 to 20A. The coil module located at the bend of the magnetic filtration elbow is connected to a bipolar pulse power supply with adjustable waveform, and its current is 5 to 50A.

[0027] The magnetic field strength of the permanent magnet of the cathode arc source of the present invention is 250-500 mT.

[0028] Compared with the prior art, the technology of the present invention has the following advantages:

[0029] (1) In the magnetic filtered arc coating device described in the present invention, the magnetic field of the first excitation coil and the permanent magnet module are combined to jointly control the rapid movement and movement range of the arc spot on the target surface of the cathode arc source target, which is beneficial to reduce the generation of large particles, and the adjustment is more flexible, and the target surface is ablated smoothly;

[0030] (2) In the magnetic filtered arc coating device described in the present invention, the vacuum degree in front of the target of the cathode arc source can be accurately measured by a vacuum gauge on the anode cylinder, and the appropriate amount of gas (gas pressure) required for arc operation is supplied through the gas distribution pipe, and the gas is provided with a corresponding positive potential, thereby making the arc operate stably, reducing the emission of large particles and refining the emitted large particles, and preparing a highly uniform film layer;

[0031] (3) In the magnetic filtration arc coating device described in the present invention, a plurality of independent coil modules are provided at the inlet, bend and outlet of the magnetic filtration bend pipe, which are respectively connected to a bipolar pulse power supply with adjustable waveform electrical parameters, and can output asymmetric waveform voltage and current, so as to more accurately control the magnetic field distribution, which is conducive to the charged plating particles in the bend pipe to gather and flow along the central axis of the bend pipe, thereby improving the deposition rate of the film;

[0032] (4) In the magnetic filtration arc coating device described in the present invention, a cooling pipe is wound around the outer wall of the magnetic filtration bend, which can quickly cool the magnetic filtration bend and prevent large particles from adhering to the inner wall of the magnetic filtration bend and then evaporating. In addition, the coil module is also provided with an adjustable water cooling facility to prevent the coil from heating up, thereby improving the stability of the magnetic field, thereby improving the stability of the plasma beam in the control bend, and is conducive to improving the coating quality;

[0033] (5) In the magnetic filtration arc coating device described in the present invention, a second excitation coil is installed at the outlet end of the magnetic filtration bend pipe, which is beneficial to the orientation and homogenization of the emitted plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments:

[0035] Figure 1 This is a schematic structural diagram of the magnetic filtering arc coating device of this embodiment;

[0036] Figure 2 Schematic diagram of the cathode arc source structure of this embodiment;

[0037] Figure 3 This is a Gauss meter measurement diagram of the vertical magnetic field distribution on the target surface when the first excitation coil is turned off in this embodiment;

[0038] Figure 4 This is a Gauss meter measurement diagram of the vertical magnetic field distribution on the target surface when the first excitation coil is turned on in this embodiment;

[0039] Figure 5 FIG. 1 is a diagram showing the force applied to the arc spot motion of this embodiment;

[0040] Figure 6a This is a real picture of the target surface of the graphite target in this embodiment after ablation for 1 hour;

[0041] Figure 6b This is a real picture of the target surface of the graphite target in this embodiment after ablation for 9 hours;

[0042] Figure 7 Schematic diagram of the ring frame structure of this embodiment;

[0043] Figure 8 Schematic diagram of the cross-sectional structure of the coil module of this embodiment.

[0044] Markings in the accompanying drawings: 1-cathode arc source, 101-target block, 102-target base, 103-permanent magnet, 104-permanent magnet adjustment mechanism, 2-first excitation coil, 4-anode cylinder, 5-vacuum gauge, 6-gas distribution pipe, 7-vacuum coating chamber, 8-rotating frame, 9-magnetic filter elbow, 10-cooling pipe, 11-second excitation coil, 12-coil module, 12a-ring frame, 12b-conductor, 12c-water inlet, 12d-water outlet. DETAILED DESCRIPTION

[0045] Example 1

[0046] See also Figure 1 and Figure 2 , a magnetic filtering arc coating device of this embodiment, the device includes:

[0047] The cathode arc source 1 includes a target holder 102, a target block 101, a permanent magnet 103, and a permanent magnet adjustment mechanism 104. The target block 101 is mounted on the front end of the target holder 102. A cylindrical permanent magnet 103 is placed in the center of the rear end of the target holder 102 near the target block 101. The permanent magnet adjustment mechanism 104 is connected to the rear of the permanent magnet.

[0048] A vacuum coating chamber 7, wherein the chamber is vacuum-set and is equipped with a workpiece rotating rack 8;

[0049] The magnetic filter elbow 9 has one end as an inlet end connected to the front end of the cathode arc source 1 and the other end as an outlet end connected to the inner cavity of the vacuum coating chamber 7;

[0050] The magnetic filter arc coating device also includes:

[0051] The first excitation coil 2 is installed around the target block 101 and is located outside the cathode arc source 1. The first excitation coil 2 is used to cooperate with the permanent magnet 103 to change the corresponding magnetic field to control the movement of the arc spot on the target surface. The first excitation coil 2 is connected to a waveform-adjustable bipolar pulse power supply;

[0052] A plurality of coil modules 12 are respectively arranged at the inlet end, the bend and the outlet end of the magnetic filtering elbow 9 .

[0053] The magnetic fields of the first excitation coil 2 and the permanent magnet module 103 are combined to jointly control the movement and range of the arc spot on the target surface, accelerate the arc spot movement, and make the adjustment more flexible. The magnetic field strength and direction generated by the first excitation coil 2 can modulate the magnetic field strength and direction of the permanent magnet module 103, thereby controlling the arc spot to rotate and radially extend on the entire target surface.

[0054] See also Figure 3The Gaussmeter measurement of the vertical magnetic field distribution on the target surface when the first excitation coil 2 is turned off shows only the S pole direction, not the N pole direction. This indicates that the magnetic lines of force on the target surface are decomposed into horizontal and vertical components (B), with all vertical components pointing downward. The arc spot generated by the arc initiation from the target surface, under the influence of the horizontal component (B) of the permanent magnet's magnetic field, undergoes rapid circular motion along the target surface according to the arc spot's receding motion law. This circular motion (i.e., the circular current) is simultaneously affected by the downward vertical component (B), exerting a force from the center toward the outer edge of the target, driving the arc spot toward the target's outer edge. The stronger the magnetic field on the target surface, the greater the force and the faster the arc spot's motion. Consequently, the shorter the arc spot's residence time at a given location on the target surface, resulting in fewer and finer large particles being evaporated. However, the stronger the downward vertical component (B), the faster the arc spot's outward scanning motion, making it more likely to escape the target surface and extinguish the arc.

[0055] The magnetic field generated by the first excitation coil 2 is superimposed with the magnetic field of the permanent magnet to form a composite magnetic field. This magnetic field exhibits an N-polarity within a certain range near the outer edge of the target, decomposing the magnetic lines of force into an upward vertical component B. This exerts a force on the circular arc spot, which is directed from the outer edge of the target toward the center of the target surface. This restricts the outward movement of the rapidly circular arc spot and prevents the arc spot from escaping from the target surface and extinguishing the arc. The specific design is as follows: an excitation coil with suitable ampere-turns is connected to a pulsed DC power supply. The output waveform is a rectangular square wave, which can also be a triangular wave or a sine wave, with a frequency of f = 50 Hz and a duty cycle of P = 50%. This generates a variable magnetic field, which is superimposed with the magnetic field of the permanent magnet. This allows for flexible modulation of the shape and strength of the composite magnetic lines of force, thereby flexibly controlling the direction and magnitude of the driving force on the arc spot.

[0056] During the period when the excitation coil is not energized, the arc spot movement is mainly driven by the magnetic field of the permanent magnet; during the period when the excitation coil is energized, the composite magnetic field generated by the excitation coil and the permanent magnet controls the movement of the arc spot. By adjusting the peak value of the excitation voltage, the magnetic field size and polarity of the excitation coil can be controlled, so that the composite vertical magnetic field B at a selected radial position between the center of the target surface and the edge of the target (usually selected at the midpoint between the two) is almost zero vertically, and from this position toward the center of the target, B is vertically downward, and from this position toward the outer edge of the target, B is vertically upward.

[0057] See also Figure 4The following is a Gaussmeter measurement of the vertical magnetic field distribution on the target surface when the first excitation coil 2 is turned on. S10 indicates S polarity and a magnetic field strength of 10 Gs; N13 indicates N polarity and a magnetic field strength of 13 Gs. As can be seen from the figure, within the region from the arc spot's center to the point where the target's B vertical axis reaches zero, the downward B vertical component of the composite magnetic field, formed by the permanent magnet and the excitation coil, exerts a force on the moving arc spot toward the target's outer edge, pushing it outward. After the arc spot passes the B vertical zero point, it is acted upon by the upward B vertical component from that point to the target's outer edge, generating a force pushing it back toward the target's center, causing it to decelerate. After its velocity drops to zero, the arc spot continues to move toward the target's center under the action of the upward B vertical component of the composite magnetic field. The arc spot performs a circular motion (B lateral drive) while also reciprocating within the aforementioned range (B vertical drive with position-dependent direction changes), preventing it from spilling outward and extinguishing the arc.

[0058] See also Figure 5 , the arc spot moves from the center of the target surface to the position where the vertical component of the composite magnetic field is zero, and the radial force on the arc spot points to the edge of the target; from the position where the vertical component of the composite magnetic field is zero to the edge of the target, the radial force on the arc spot points to the center of the target; see Figure 6a , for a Φ95mm graphite target ablation for 1 hour, see Figure 6b , the Φ95mm graphite target was ablated for 9 hours. By comparison, it can be seen that the target surface was ablated relatively evenly.

[0059] Therefore, the magnetic filtered arc coating device in this embodiment can reduce the generation of large particles in the cathode arc source target plasma beam, thereby improving the deposition rate of the film and the uniformity of the film layer.

[0060] The magnetic filtered arc coating device in this embodiment also includes an anode cylinder 4, a cathode arc source target 1 is installed at the front end of the anode cylinder 4, and the rear end of the anode cylinder 4 is connected to the magnetic filtering bend 9. The anode cylinder 4 is provided with a vacuum gauge 5 and a gas distribution pipe 6 connected to the inner cavity of the anode cylinder 4. The gas distribution pipe 6 is insulated from the cylinder wall and applies a positive potential; the part of the gas distribution pipe 6 located on the inner side of the anode cylinder 4 is arranged in a circle along the inner wall of the anode cylinder 4 and is distributed with a number of gas outlets.

[0061] The vacuum gauge 5 on the anode cylinder 4 can accurately measure the vacuum degree of the cathode arc target and supply the required gas volume (pressure) during arc operation through the gas distribution pipe 6. The gas is argon to avoid the introduction of reactive gas into the production compound and reduce the particle output efficiency. The gas distribution pipe 6 is made of conductive stainless steel. When the film is being coated, the gas distribution pipe 6 applies a positive potential. A positive electric field is formed between the anode cylinder 4 and the target block 101 of the cathode arc source 1, which is directed from the gas distribution pipe 6 to the cathode arc target surface. Argon ions (Ar +) is accelerated under the action of the electric field, forming a bombardment on the surface of the target material 101 of the cathode arc source target 1, increasing the sputtering effect of the cathode arc target, refining the large particles in the plasma evaporated from the arc spot, and improving the plasma emission efficiency. The acceleration of the argon ions by the electric field also correspondingly increases the excitation collision efficiency of the gas near the target surface, and produces a decomposition and refinement effect on the large particles in the space near the target surface.

[0062] In order to enhance the effect of the electric field, an annular metal belt can be installed on the gas distribution pipe 6 to make it form a certain angle with the target surface; when vacuuming or processing is carried out, there is a large difference between the vacuum near the target surface of the magnetic filtration bend 9 and the vacuum condition of the vacuum coating chamber 7; when the background vacuum of the furnace body reaches 0.0055Pa, the background vacuum near the target surface is only 0.008Pa; and when a certain amount of argon gas (250sccm) is injected into the furnace body, the furnace pressure is 0.19Pa, the pressure near the target surface is 0.38Pa, and the process of injecting argon gas into the furnace body is 0.19Pa. It is also difficult for the process gas to effectively reach the vicinity of the target surface and to replenish the gas consumption near the target surface in time; the existing magnetic filtration device generally achieves the purpose of reducing large particles by changing the target shape, magnetic field setting and the shape of the bend pipe, but rarely considers the effect of the gas distribution method and gas pressure conditions near the target surface on reducing large particles, but in fact these have a great influence on plasma discharge; therefore, the vacuum gauge 5 and the gas distribution pipe 6 with an additional positive potential are configured in this embodiment, which can accurately control the discharge condition of the target surface and improve the discharge efficiency and uniformity.

[0063] The magnetic filtration arc coating device in this embodiment also includes a cooling pipe 10, which is wound around the outer wall of the magnetic filtration bend 9. It can quickly cool the magnetic filtration bend 9 to prevent large particles of plasma from adhering to the inner wall of the magnetic filtration bend 9 and then evaporating, thereby improving the coating quality. At the same time, the water temperature can be adjusted to avoid condensed water droplets when breaking the vacuum.

[0064] The magnetic filtration arc coating device in this embodiment also includes a second excitation coil 11, which is installed between the outlet end of the magnetic filtration bend 9 and the side panel of the vacuum coating chamber 7. The second excitation coil 11 is connected to a waveform-adjustable bipolar pulse power supply, which is conducive to the orientation and homogenization of the emitted plasma.

[0065] In this embodiment, an insulating gasket is provided between the second excitation coil 11 and the side plate of the vacuum coating chamber 7 .

[0066] In this embodiment, a coil module 12 is provided at both the inlet and outlet ends of the magnetic filtration bend 9. Three coil modules 12 are provided at the bend of the magnetic filtration bend 9. Each coil module 12 is individually connected to a bipolar pulse control power supply with adjustable output waveform and electrical parameters, and can output voltage and current with asymmetric waveforms. This allows the magnetic field of each coil module 12 to be individually controlled, allowing the plasma to be accurately redirected and reducing transmission losses.

[0067] See also Figure 7 and Figure 8 The coil module 12 in this embodiment is an annular coil module. Each coil module 12 is sleeved on the magnetic filter bend 9 and fixed by bolts. The coil module includes an annular frame 12a. A groove is provided on the circumference of the annular frame 12a, and a wire 12b is wound in the groove.

[0068] In this embodiment, each coil module 12 is connected to an independent cooling module, which can quickly absorb and remove the heat generated by the coil, thereby maintaining the stability of the coil magnetic field; the cooling module is a water cooling circuit arranged on the coil module and a water inlet 12c and a water outlet 12d connected to the water cooling circuit, and the water inlet 12c and the water outlet 12d are externally connected to a heat dissipation device.

[0069] Preferably, the bending angle of the magnetic filtration elbow in this embodiment is 90°.

[0070] The target material 101 of the cathode arc source target 1 is a Cr target with a diameter of 95 mm, a length and thickness of 27 mm, and an input current of 200-250 A.

[0071] The first excitation coil 2 is connected to a 50Hz frequency, waveform-adjustable bipolar pulse power supply with a current of 3A. The second excitation coil 11 is connected to a 50Hz frequency, waveform-adjustable bipolar pulse power supply with a current of 4A.

[0072] There is one coil module 12 at the inlet end of the magnetic filter bend 9, which inputs a triangular wave with a current of 15A; there are three coil modules 12 at the bend of the magnetic filter bend 9, which input triangular waves with currents of 16A, 30A, and 25A respectively; there is one coil module 12 at the outlet end of the magnetic filter bend 9, which inputs a triangular wave with a current of 10A;

[0073] The magnetic field strength of the permanent magnet module 3 is 400mT;

[0074] During the coating process, the vacuum pressure was measured by a vacuum gauge and the vacuum pressure was evacuated to 3.0×10 -3 Pa, argon gas is introduced from the gas distribution pipe 6, and the working gas pressure is controlled to be 0.5Pa; a positive bias voltage of 30V is added between the magnetic filtration bend 9 and the vacuum coating chamber 7; the output current of the arc target power supply is set to 150A, and a medium frequency pulse negative bias voltage of 80V is applied to the workpiece to deposit the Cr metal film layer.

[0075] Example 2

[0076] The difference between the second embodiment and the first embodiment is that:

[0077] The target material of cathode arc source 1 is graphite (C) target with a diameter of 95mm and a thickness of 20mm. The access current is 50-150A. The ablation effect of the target material is shown in Figure 5 , the target surface is ablated evenly.

[0078] The magnetic field strength of the permanent magnet 103 is 500 mT. The increase in magnetic field strength can speed up the movement of arc spots and reduce the number of large particles generated.

[0079] In order to prevent the arc spot from detaching from the target surface and extinguishing the arc, the first excitation coil 2 is connected at a frequency of 50Hz and a current of 6A; the gas distribution pipe 6 is insulated from the anode cylinder 4, and a 300V pulse positive bias is connected to the gas distribution pipe 6 to assist the arc target evaporation discharge; the magnetic filter bend 9 is added with a 30V positive bias, and the three coil modules 12 located at the bend of the filter bend 9 are connected in parallel to each other, thereby saving the amount of power supply and reducing equipment costs. The current of each coil module 12 is 14A.

[0080] A medium-frequency pulse (30kHz) negative bias (80V) is applied between the coating chamber wall and the workpiece turntable. Since the large particles exiting the magnetic filtration bend have a low velocity and carry a certain amount of charge during transmission, the pulse bias causes the plasma to expand and contract, preventing the large particles with low velocity from reaching the substrate. At the same time, under the action of the pulse bias, the sputtering bombardment of the substrate by the Ar plasma can effectively suppress the formation of large particles on the substrate; therefore, not only can the large particles reaching the substrate be further reduced, but the bonding strength between the film layer and the substrate can also be improved.

[0081] The above embodiments of the present invention are not intended to limit the scope of protection of the present invention, and the implementation methods of the present invention are not limited thereto. All other modifications, replacements or changes made to the above structures of the present invention based on the above contents of the present invention, in accordance with common technical knowledge and customary means in this field, without departing from the above basic technical ideas of the present invention, should fall within the scope of protection of the present invention.

Claims

1. A magnetic filtering arc coating device, comprising: A cathode arc source, which comprises an arc target seat, a target block, a permanent magnet and a permanent magnet adjustment mechanism, wherein the target block is mounted on the front end face of the target seat, a cylindrical permanent magnet is placed in the center of the rear end face of the target seat near the target block, and the permanent magnet adjustment mechanism is connected to the back of the permanent magnet; a vacuum coating chamber, wherein the interior of the chamber is vacuum; a magnetic filtration bend, one end of which is an inlet end connected to the front end of the cathode arc source, and the other end is an outlet end connected to the inner cavity of the vacuum coating chamber; it is characterized in that it also includes: a first excitation coil, which is mounted around the target block and is located outside the cathode arc source; the first excitation coil is used to cooperate with the permanent magnet to change the magnetic field so as to control the movement of the arc spot on the target surface; a plurality of coil modules, which are respectively arranged at the inlet end, the bend and the outlet end of the magnetic filtration bend; the magnetic The filtered arc coating device also includes an anode cylinder, the front end of which is equipped with the cathode arc source, the rear end of which is connected to the magnetic filtering elbow, and a vacuum gauge and a gas distribution pipe connected to the inner cavity of the anode cylinder are provided on the anode cylinder, the gas input from the gas distribution pipe is a gas with a positive potential applied; the part of the gas distribution pipe located on the inner side of the anode cylinder is arranged in a circle along the inner wall of the anode cylinder and is distributed with a number of gas outlets; an annular metal belt is installed on the gas distribution pipe so that it forms a certain angle with the target surface; the magnetic filtered arc coating device also includes a cooling pipe, which is wound around the outer wall of the magnetic filtering elbow; the magnetic filtered arc coating device also includes a second excitation coil, which is installed between the outlet end of the magnetic filtering elbow and the side plate of the vacuum coating chamber.

2. The magnetic filtered arc coating device according to claim 1, characterized in that: The inlet and outlet ends of the magnetic filtration bend are each provided with a coil module, and at least two coil modules are provided at the bend of the magnetic filtration bend. Each coil module is individually connected to a control power supply.

3. The magnetic filtered arc coating device according to claim 2, characterized in that: The coil modules are annular coil modules, and each coil module is sleeved on the magnetic filtration elbow and fixed by bolts.

4. The magnetic filtered arc coating device according to claim 3, characterized in that: The first excitation coil and the second excitation coil are connected to a waveform-adjustable bipolar pulse power supply with a frequency of 1 to 50 Hz and a current of 1 to 5A.

5. The magnetic filtered arc coating device according to claim 4, characterized in that: The coil modules located at the inlet and outlet ends of the magnetic filtration elbow are connected to a bipolar pulse power supply with adjustable waveform, and its current is 5 to 20A. The coil module located at the bend of the magnetic filtration elbow is connected to a bipolar pulse power supply with adjustable waveform, and its current is 5 to 50A.

6. The magnetic filtered arc coating device according to claim 5, characterized in that: The magnetic field strength of the permanent magnet of the cathode arc source is 250-500 mT.

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