Rotary drying device

Abstract

A rotary drying device is provided to improve the adsorption of a workpiece and reduce the residual water on the adsorption surface, thereby shortening the drying process and simplifying the device structure. The device comprises: a rotating rotary table (10); a rotary table pad (11) disposed on the rotary table (10) and having an adsorption surface (12) for holding the workpiece; and a vacuum suction mechanism for adsorbing the workpiece on the adsorption surface (12) by sucking a fluid from the adsorption surface (12). The adsorption surface (12) is formed with: a suction port (15) connected to the vacuum suction mechanism for allowing the fluid sucked by the vacuum suction mechanism to flow; and a suction groove (13) for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port (15). When the workpiece is adsorbed on the adsorption surface (12), the water attached to the part of the workpiece located near the adsorption surface (12) is sucked and removed via the suction groove (13) and the suction port (15). Thus, a drying process with less residual water can be efficiently performed in a short time.

Description

Technical Field

[0001] The present invention relates to a spin drying device for drying a workpiece by scattering and removing water and the like adhering to the workpiece using centrifugal force. Background Art

[0002] Conventionally, a rotary drying device is known in which a workpiece such as a semiconductor wafer is held by a rotary table and rotated. In such a rotary drying device, the workpiece carried on the holding surface of the rotary table is held by vacuum adsorption on the holding surface. Thereafter, the workpiece is rotated by the rotation of the rotary table. Furthermore, the cleaning water and the like attached to the surface of the workpiece are scattered and removed by centrifugal force, thereby drying the workpiece.

[0003] For example, Japanese Patent Publication No. 2015-207744 discloses a rotating device having a rotating table for holding a wafer. The rotating table of the rotating device disclosed in the same document has a disc-shaped rotating plate. The wafer is held on the upper surface side of the rotating plate.

[0004] The upper end of the rotating shaft is connected to the lower surface of the rotating plate. On the other hand, the lower end of the rotating shaft is connected to the motor. The rotating plate rotates while holding the wafer by the rotational force transmitted from the motor via the rotating shaft.

[0005] In addition, for example, Japanese Patent Publication No. 2010-123858 discloses a rotary cleaning device having a rotating table, the rotating table including a disk-shaped adsorption portion, the disk-shaped adsorption portion is composed of a porous material having numerous pores inside. The upper surface of the adsorption portion of the rotating table is configured as a holding surface for adsorbing and holding a workpiece.

[0006] The rotary cleaning device disclosed in the same document includes an air nozzle for spraying drying air toward a workpiece held on a rotary table, and an air supply mechanism for supplying drying air to the air nozzle.

[0007] When the workpiece held on the holding surface is separated from the holding surface, the air sent from the air supply mechanism passes through the adsorption portion and is ejected from the holding surface toward the workpiece. The workpiece is ejected upward from the holding surface by the upwardly ejected air and is separated from the rotating table.

[0008] However, in the above-mentioned conventional rotary drying device, there is still room for improvement in reducing the moisture remaining in the portion of the workpiece located near the adsorption surface to improve the drying efficiency.

[0009] Specifically, in the conventional turntable, there is a problem that residual water is easily generated on the adsorption surface holding the workpiece. If there is residual water on the adsorption surface, after the drying process of scattering water by the rotation of the workpiece is completed, when the workpiece is removed from the adsorption surface of the turntable, the water remaining on the adsorption surface scatters and the water adheres again to the workpiece dried in the drying process.

[0010] In addition, in the vacuum adsorption mechanism of the prior art, the workpiece is firmly held in a state close to vacuum so that the workpiece does not leave during the rotation of the turntable. Therefore, even if the vacuum adsorption mechanism stops and the vacuum is stopped, a vacuum portion remains on the adsorption surface, so that the wafer is adsorbed on the adsorption surface. Therefore, it is not easy to perform the process of removing the workpiece from the turntable after the drying process.

[0011] In the vacuum adsorption mechanism of the prior art, in order to remove the adsorbed workpiece after the drying process, an air supply mechanism for supplying air to the adsorption surface of the rotating table is required, as disclosed in Japanese Patent Publication No. 2010-123858. That is, the air supply device has an adsorption circuit for sucking air for adsorbing the workpiece and a lifting circuit for supplying air for removing the workpiece. Therefore, the structure of the air supply device is complicated.

[0012] Furthermore, as disclosed in Japanese Patent Application Laid-Open No. 2010-123858, the method of ejecting air toward the suction surface that sucks and holds the workpiece also has a problem in that moisture remaining in the air pipe or the like is ejected again after the drying process and adheres to the workpiece surface.

[0013] In addition, a method of spraying air to the adsorption surface of the workpiece to disperse the moisture before the workpiece is adsorbed and held by the rotating table can also be considered. However, in this method, an air supply device for spraying air is required. In addition, after the air spraying process, the workpiece is adsorbed by the holding surface and rotated. Therefore, the drying process takes a long time. Summary of the invention

[0014] The present invention is made in view of the above situation. One object of the present invention is to provide the following rotary drying device. In the rotary drying device, by improving the adsorption of the workpiece and reducing the residual water on the adsorption surface, it is possible to shorten the drying process and simplify the device structure.

[0015] A rotary drying device in one embodiment of the present invention includes: a rotating turntable; a turntable pad, which is arranged on the turntable and has an adsorption surface for holding a workpiece; and a vacuum suction mechanism, which adsorbs the workpiece to the adsorption surface by sucking fluid from the adsorption surface, and on the adsorption surface are formed: a suction port, which is connected to the vacuum suction mechanism and allows the fluid sucked by the vacuum suction mechanism to flow; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port.

[0016] According to a rotary drying device (the present rotary drying device) of one embodiment of the present invention, a suction surface for holding a workpiece of a rotary table pad arranged on a rotating rotary table is provided with: a suction port connected to a vacuum suction mechanism for allowing the fluid sucked by the vacuum suction mechanism to flow; and a suction groove for allowing the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port.

[0017] According to this structure, when the workpiece is adsorbed to the adsorption surface by the vacuum suction mechanism, the moisture attached to the portion of the workpiece located near the adsorption surface can be removed by suction through the suction groove and the suction port. Therefore, when the workpiece is rotated to disperse and remove the moisture and the like by centrifugal force, the moisture remaining in the workpiece near the adsorption surface holding the workpiece can be reduced. Therefore, the drying process can be performed efficiently in a short time.

[0018] Specifically, according to the present rotary drying device, before the workpiece is adsorbed on the rotary table pad, it is not necessary to perform an air injection process or the like for blowing away moisture from a portion of the workpiece located near the adsorption surface. Therefore, an air supply device for this process is not required. In addition, since the air injection process or the like is not required, the time required for the drying process can be shortened.

[0019] In addition, the moisture remaining in the workpiece is reduced, so after the workpiece is rotated for drying and separated from the rotating table pad, it is not necessary to spray drying air to the workpiece again. Therefore, an air supply device for such air spraying is not required, and the time required for the drying process can be shortened.

[0020] In addition, according to the present rotary drying device, it is preferred that a linear suction recess is formed on the adsorption surface, the suction recess is open in the direction of the workpiece, and both ends extend from the vicinity of the rotation center of the rotary table pad in the direction of the rotation radius, the suction port is formed in the suction recess, and the suction groove extends in a direction intersecting the suction recess and is connected to the suction recess. Thus, the workpiece can be properly adsorbed and held on the adsorption surface of the rotary table pad. In addition, the moisture attached to the part of the workpiece held by the adsorption surface that is located near the adsorption surface can be efficiently removed by suction.

[0021] Furthermore, according to the present rotary drying device, it is preferred that one end of the suction groove opens outward from the circumferential edge of the rotary table pad, and both ends of the suction recess do not open outward from the circumferential edge of the rotary table pad. According to this structure, air can be sucked from one end of the suction groove that opens at the circumferential edge of the rotary table pad. In addition, by utilizing this air flow, moisture attached to the workpiece can be efficiently sprayed and flowed toward the suction recess at the other end where the suction groove is opened. Furthermore, the moisture sprayed and flowed together with the air through the suction groove can be sucked and removed through the suction port formed in the suction recess.

[0022] In addition, one end of the suction groove opens outward from the circumferential edge of the turntable pad. Therefore, by stopping the suction of the vacuum suction mechanism after the rotation-based drying process is completed, the pressure inside the suction groove and the suction recess is substantially equal to the pressure outside the turntable pad. As a result, the force of the turntable pad to adsorb the workpiece essentially disappears. Therefore, the workpiece can be easily separated from the turntable pad. As a result, the time required for the separation process after the drying process can be shortened. In addition, there is no need to set up a lifting circuit for supplying air to separate the workpiece from the turntable pad. As a result, the efficiency of the drying process can be improved, and the productivity of the rotary drying device can be improved.

[0023] Furthermore, according to the present rotary drying device, it is preferred that the suction port is formed to be located further outward in the direction of the rotation radius than the rotation center of the rotary table pad. Thus, the suction air generated by the vacuum suction mechanism can be used to make the moisture attached to the vicinity of the rotation center, which is difficult to remove due to the centrifugal force generated by the rotation, flow to the suction port for suction removal. Thus, the drying efficiency is improved, and the time required for the drying process can be shortened. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a front view showing a schematic structure of the rotary drying device according to the embodiment of the present invention.

[0025] Figure 2 It is a top view of a rotating table pad of a rotating drying device according to an embodiment of the present invention.

[0026] Figure 3 This is an enlarged front view showing the vicinity of a rotary table pad of the rotary drying device according to the embodiment of the present invention. DETAILED DESCRIPTION

[0027] Hereinafter, a spin drying device according to an embodiment of the present invention will be described in detail based on the drawings. Figure 1 It is a front view showing a schematic structure of the spin drying device 1 according to the embodiment of the present invention.

[0028] Reference Figure 1The spin drying device 1 is, for example, a device that rotates a workpiece W such as a semiconductor wafer, thereby utilizing centrifugal force to scatter and remove the pure water for cleaning attached to the workpiece W from the workpiece W, thereby drying the workpiece W. The workpiece W is a disk-shaped or square-shaped processing target material. The workpiece W may be, for example, a WLP (Wafer Level Package) that has been enlarged in recent years, a large mounting substrate that further enlarges the WLP, namely, a PLP (Panel Level Package), a packaging substrate, other laminated substrates, a semiconductor substrate, and a substrate for components such as a capacitor.

[0029] The spin drying device 1 includes: a rotating turntable 10 ; a turntable pad 11 provided on the upper surface of the turntable 10 ; a vacuum pump 30 as a vacuum suction mechanism for sucking the workpiece W; and a motor 28 as a driving source for rotating the turntable 10 .

[0030] The rotating table 10 is a member for supporting the workpiece W placed from above. The rotating table 10 has a substantially circular shape in a plan view. The rotating table 10 rotates in a substantially horizontal direction together with the workpiece W being sucked, with the center of the circle as an axis.

[0031] The shaft 19, which is the main axis of rotation of the turntable 10, is connected to the shaft 25 via a rotary joint 24 so that rotational power can be transmitted from the shaft 25. The shaft 25 is connected to the motor shaft 29 of the motor 28 via a coupling 26 so that rotational power can be transmitted from the shaft 29. That is, the turntable 10 rotates with the motor 28 as a driving source.

[0032] The turntable pad 11 provided on the upper surface of the turntable 10 is mainly formed of a resin material, for example, and has a substantially circular shape when viewed from above. Examples of the resin material include ABS resin (acrylonitrile-butadiene-styrene copolymer resin), polyvinyl chloride resin, PET (polyethylene terephthalate), and polytetrafluoroethylene.

[0033] The rotary table pad 11 is a member for sucking and holding the workpiece W, and rotates together with the workpiece W. Specifically, the upper surface of the rotary table pad 11 is a suction surface 12 for holding the workpiece W.

[0034] The rotary joint 24 rotatably supports the shaft 25 and the shaft 19 as the main axis of rotation of the rotary table 10. The rotary joint 24 is a joint that forms a path for the fluid flowing out from the workpiece W side, that is, air and moisture attached to the workpiece W, to flow from the rotary table pad 11 to the vacuum pump 30 side.

[0035] An air pipe 31 serving as a path for fluid flow is connected to the fluid port of the rotary joint 24. The air pipe 31 is connected to the vacuum pump 30. The air pipe 31 may be provided with a gas-liquid separation device (not shown) for separating moisture sucked from the workpiece W from air.

[0036] The motor 28 is a driving source for rotating the turntable 10. As described above, the motor shaft 29 as the output shaft of the motor 28 is connected to the shaft 19 as the main rotation axis of the turntable 10 via the coupling 26, the shaft 25 and the operating shaft of the rotary joint 24.

[0037] Here, the rotation speed of the rotating table 10 driven by the motor 28 is, for example, 60 to 3000 rpm, preferably 1500 to 2500 rpm. With such high-speed rotation, an efficient drying process can be performed in a short time.

[0038] The rotary joint 24 and the motor 28 are fixed and supported on the support table 35. A drainage box 20 is provided above the support table 35 and below the rotary table 10. The drainage box 20 receives water from the workpiece W and allows the water to flow. The drainage box 20 is a substantially cup-shaped member that receives water scattered from the workpiece W.

[0039] A wall portion 22 is formed at the circumferential edge of the drainage box 20. The wall portion 22 receives water scattered from the rotating workpiece W by centrifugal force. The wall portion 22 has a substantially cylindrical shape. A substantially annular disc-shaped upper edge portion 23 extending toward the rotation center is formed near the upper end of the wall portion 22. A drainage port 21 for discharging water scattered from the workpiece W is formed at the bottom of the drainage box 20. A drainage pipe (not shown) is connected to the drainage port 21. The water collected in the drainage box 20 is discharged to a drainage container (not shown) or the like via the drainage pipe.

[0040] Furthermore, the spin drying device 1 may include an air supply device 32 for supplying drying air and an air nozzle 33. The air supply device 32 supplies drying air and the air nozzle 33 blows the air from the air supply device 32 toward the upper surface of the workpiece W. This can further improve the efficiency of the drying process.

[0041] Figure 2 1 is a top view of the rotating table pad 11 , and is a view showing the adsorption surface 12 as viewed from above.

[0042] like Figure 2 As shown in FIG. 1 , a substantially linear suction concave portion 14, a suction groove 13, and a suction port 15 are formed on the suction surface 12 of the rotating table pad 11. The suction concave portion 14 extends in the radial direction of the rotating table pad 11. The suction groove 13 extends in a direction (horizontal direction) intersecting the suction concave portion 14. The suction port 15 is formed in the suction concave portion 14. The suction port 15 is connected to a vacuum pump 30 (see FIG. 1 ) as a vacuum suction mechanism. Figure 1 ) are connected.

[0043] The suction recess 14 is a recess that opens toward the top of the adsorption surface 12, that is, in the direction of the workpiece W. Both ends of the suction recess 14 extend approximately linearly from the vicinity of the rotation center of the rotating table pad 11 toward the rotation radius direction. The two ends of the suction recess 14 do not open outward from the circumferential edge of the rotating table pad 11. The recess shape of the suction recess 14 is not particularly limited. The suction recess 14 can, for example, have a groove shape with a roughly V-shaped cross-section. When the workpiece W is adsorbed, the suction recess 14 becomes a flow channel for the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc.

[0044] The suction groove 13 is a recessed portion that opens toward the upper side of the adsorption surface 12, that is, toward the direction of the workpiece W. The suction groove 13 extends approximately linearly in a direction intersecting the suction recessed portion 14. One end of the suction groove 13 opens outward from the circumferential edge of the rotary table pad 11. The other end of the suction groove 13 opens at the suction recessed portion 14. That is, the suction groove 13 is formed so that a fluid can flow from the outside of the rotary table pad 11 to the inside of the suction recessed portion 14.

[0045] A plurality of suction grooves 13 are formed on the turntable pad 11. Specifically, a plurality of suction grooves 13 are formed approximately in parallel on both sides of a suction recess 14 extending approximately linearly and passing through the vicinity of the rotation center of the turntable pad 11. One end of the plurality of suction grooves 13 opens at the outer periphery of the turntable pad 11, and the other end is connected to the suction recess 14. When the workpiece W is adsorbed, the suction grooves 13 become flow channels for the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc. to flow.

[0046] The suction port 15 is formed on the bottom surface of the suction recess 14. Specifically, the suction port 15 is formed at two locations on the bottom surface of the suction recess 14 that are offset from the rotation center of the turntable pad 11 toward the outside in the rotation radius direction.

[0047] The suction port 15 is connected to the vacuum pump 30. When the workpiece W is sucked, the suction port 15 becomes a flow path through which the fluid sucked by the vacuum pump 30, that is, air and moisture attached to the workpiece W, etc., flows.

[0048] That is, the pure water for cleaning and the like adhering to the workpiece W is blown away by the adsorption air flowing through the suction groove 13 and the suction recess 14 , and is removed together with the adsorption air flowing from the suction groove 13 through the suction recess 14 and the suction port 15 .

[0049] Figure 3 It is an enlarged front view showing the vicinity of the rotary table pad 11 of the rotary drying device 1 . Figure 3 The schematic shape of the cross section of the turntable 10 is shown.

[0050] like Figure 3 As shown, a fitting recess 17 for fitting the turntable pad 11 is formed on the upper surface of the turntable 10. The fitting recess 17 has a substantially circular shape in a plan view that is concentric with the circular shape of the main body of the turntable 10. The bottom surface side of the turntable pad 11 is fitted into the fitting recess 17 of the turntable 10 and fixed by bolts, etc., which are not shown.

[0051] As described above, a plurality of suction grooves 13 are formed on the suction surface 12 of the rotating table pad 11. The cross-sectional shape of the suction groove 13 is roughly V-shaped. The depth of the suction groove 13 is shallower than the depth of the suction recess 14, specifically, for example, 0.01 to 1 mm, preferably 0.05 to 0.5 mm. Thus, by forming the suction groove 13 to have a suitable shape and depth, the suction surface 12 can utilize the suction of the fluid by the vacuum pump 30 to adsorb the workpiece W, and hold the workpiece W with a strength that can withstand rotation.

[0052] Specifically, even when air outside the turntable pad 11 flows in from the suction grooves 13, the suction surface 12 of the turntable pad 11 can maintain a sufficient vacuum degree. Therefore, in this case, the workpiece W is not substantially separated from the suction surface 12 by the centrifugal force.

[0053] Furthermore, by forming the suction groove 13 into an appropriate shape, the cross-sectional area of ​​the flow path can be made into an appropriate size. Thus, the speed of the air flowing through the suction groove 13 can be made into an appropriate speed. As a result, the moisture attached to the workpiece W can be blown away well by the air flowing through the suction groove 13.

[0054] As described above, a suction recess 14 is formed near the rotation center of the adsorption surface 12 of the turntable pad 11, and the suction recess 14 is a recess extending in a substantially straight line. A suction port 15 serving as a flow path for the fluid is formed in the suction recess 14. Specifically, the suction port 15 is formed to penetrate from the suction recess 14 to the lower surface of the turntable pad 11.

[0055] A suction path 16 is formed on the lower surface of the turntable pad 11, and the suction path 16 is a concave portion that serves as a flow path for the fluid. The suction path 16 is a substantially linear concave portion that passes near the rotation center of the turntable pad 11. The suction path 16 is connected to the suction port 15 near both ends. In addition, when the turntable pad 11 is engaged with the engagement concave portion 17 of the turntable 10, the suction path 16 forms a flow path for the fluid connected to the suction path 18, which is formed near the rotation center of the turntable 10.

[0056] Reference Figures 1 to 3According to the above structure, when the workpiece W is adsorbed, a flow path of a fluid connected to the vacuum pump 30 from the outside of the rotary table pad 11 is formed. The flow path includes the suction groove 13, the suction recess 14, the suction port 15, the suction path 16, the suction path 18, the rotary joint 24 and the air pipe 31.

[0057] In the drying process, the workpiece W is rotated to disperse water and the like adsorbed on the workpiece W by centrifugal force and removed from the workpiece W. During the drying process, the vacuum pump 30 is operated so that the adsorption surface 12 of the rotary table pad 11 can adsorb and hold the workpiece W.

[0058] One end of the suction groove 13 opens at the outer periphery of the turntable pad 11. Therefore, even in the state where the workpiece W is held by suction, the flow of air sucked from the outer periphery of the turntable pad 11 through the suction groove 13, the suction recess 14 and the suction port 15 by the vacuum pump 30 continues.

[0059] By utilizing the above-mentioned air flow, moisture adhering to the workpiece W flows along with the air and is sucked near the adsorption surface 12 holding the workpiece W. That is, when the workpiece W is adsorbed by the adsorption surface 12, moisture adhering to the portion of the workpiece W located near the adsorption surface 12 can be sucked and removed through the suction groove 13, the suction recess 14, and the suction port 15. Thus, a drying process with little residual water can be efficiently performed in a short time.

[0060] For example, an experiment of a drying process using the rotary drying device 1 was carried out. In this experiment, a silicon wafer with a diameter of 300 mm and a thickness of about 800 μm was used as the workpiece W. In this experiment, pure water was first sprayed on the front and back surfaces of the workpiece W. Thereafter, the drying process was performed by holding the workpiece W on the adsorption surface 12 and rotating the turntable 10 at a rotation speed of 2500 rpm. As a result, a good drying result with substantially no problems was obtained with a drying time of 30 to 45 seconds. In addition, after the drying process, by stopping the vacuum pump 30, the workpiece W separation process of separating the workpiece W from the adsorption surface 12 can also be easily performed in a substantially problem-free manner.

[0061] In addition, for example, an experiment was conducted using an acrylic plate of 500 mm × 500 mm, which was assumed to be a PLP substrate, as the workpiece W. In this experiment, pure water was first sprayed on the front and back surfaces of the workpiece W. Thereafter, the drying process was performed by holding the workpiece W on the adsorption surface 12 and rotating the turntable 10 at a rotation speed of 500 to 2000 rpm. As a result, a good drying result can be obtained with a drying time of 90 to 120 seconds. In addition, after the drying process, the vacuum pump 30 can be stopped, so that the workpiece W can be easily removed.

[0062] Thus, according to the rotary drying device 1, the drying process can be efficiently performed in a short time. In addition, before the workpiece W is adsorbed on the rotary table pad 11, it is not necessary to perform the air injection process or the like required in the prior art to blow away moisture from the portion of the workpiece W located near the adsorption surface 12. Therefore, an air supply device for this process is not required. In addition, since the air injection process is not required, the time required for the drying process can be shortened.

[0063] Furthermore, even in the drying process based on rotation, the flow of suction air in the adsorption surface 12 continues, so the moisture remaining in the workpiece W is reduced. Therefore, after the workpiece W is rotated for drying and separated from the rotating table pad 11, it is not necessary to spray drying air to the workpiece W again. As a result, an air supply device for performing air spray drying after the workpiece W is separated is not required, and the time required for the drying process can be shortened.

[0064] In addition, one end of the suction groove 13 opens outward from the peripheral edge of the turntable pad 11. Therefore, by stopping the suction of the vacuum pump 30 after the rotation-based drying process is completed, the pressure in the suction groove 13 and the suction recess 14 is substantially equal to the pressure outside the turntable pad 11.

[0065] As a result, the force of the turntable pad 11 to suck the workpiece W is substantially eliminated. Therefore, the workpiece W can be easily separated from the turntable pad 11. As a result, the time required for the separation process after the drying process can be shortened.

[0066] In addition, there is no need to provide a lifting circuit for supplying air to separate the workpiece W from the rotary table pad 11. That is, only one circuit for suction by the vacuum pump 30 is provided as a vacuum circuit. Thus, according to this embodiment, a rotary drying device 1 with high efficiency in the drying process, simplified structure, and excellent productivity is obtained.

[0067] Furthermore, according to the spin drying device 1, the suction port 15 is formed to be located further outside in the direction of the rotation radius than the rotation center of the rotating table pad 11. Thus, the suction air generated by the vacuum pump 30 can be used to make the moisture attached to the vicinity of the rotation center, which is difficult to be removed by the centrifugal force generated by the rotation, flow to the suction port 15, and be removed by suction. Thus, the drying efficiency is improved, and the time required for the drying process can be shortened.

[0068] In addition, the aspects of the present invention are not limited to the above-described embodiments. The aspects of the present invention can be implemented with various modifications other than the above-described embodiments without departing from the gist of the present invention.

[0069] In addition, the rotary drying device of the present invention can be the following first rotary drying device. The first rotary drying device is characterized in that it includes: a rotating turntable; a turntable pad, which is arranged on the turntable and has an adsorption surface for holding the workpiece; and a vacuum suction mechanism, which sucks fluid from the adsorption surface to adsorb the workpiece to the adsorption surface, and the adsorption surface is formed with: a suction port connected to the vacuum suction mechanism, through which the fluid sucked by the vacuum suction mechanism flows; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port, and when the workpiece is adsorbed to the adsorption surface, the moisture attached to the part of the workpiece near the adsorption surface is removed by suction through the suction groove and the suction port.

[0070] Description of Reference Numerals

[0071] 1 Rotary drying device

[0072] 10 Rotating table

[0073] 11 Rotating table pad

[0074] 12 Adsorption surface

[0075] 13. Attraction Trough

[0076] 14 Attract recesses

[0077] 15 Suction port

[0078] 16 Attraction Path

[0079] 17 Fitting recess

[0080] 18 Attraction Path

[0081] 19 Axis

[0082] 20 Drain Box

[0083] 21 Drain

[0084] 22 Wall

[0085] 23 Upper edge

[0086] 24 Rotary joint

[0087] 25 Axis

[0088] 26 Coupling

[0089] 28 Motor

[0090] 29 Motor shaft

[0091] 30 Vacuum pump

[0092] 31 Air piping

[0093] 32 Air supply device

[0094] 33 Air Nozzle

[0095] 35 Supporting platform

Claims

1. A rotary drying device, characterized in that: include: a rotating turntable; A rotating table pad, disposed on the rotating table, having an adsorption surface for holding a workpiece; as well as The vacuum suction mechanism sucks the fluid from the suction surface to adsorb the workpiece onto the suction surface. The adsorption surface is formed with: a suction port connected to the vacuum suction mechanism, through which the fluid sucked by the vacuum suction mechanism flows; and a suction groove for the fluid to flow, which opens in the direction of the workpiece and is connected to the suction port. One end of the suction groove opens outward from a peripheral edge of the rotating table pad.

2. The rotary drying device according to claim 1, characterized in that: A linear suction concave portion is formed on the adsorption surface, the suction concave portion is open toward the workpiece, and both ends of the suction concave portion extend from the vicinity of the rotation center of the rotary table pad toward the rotation radius direction. The suction port is formed in the suction recess, The suction groove extends in a direction intersecting the suction recess and is connected to the suction recess.

3. The rotary drying device according to claim 2, characterized in that: Both ends of the suction recess are not opened outward from the peripheral edge of the rotary table pad.

4. The rotary drying device according to any one of claims 1 to 3, characterized in that: The suction port is formed on the outer side in the rotation radius direction relative to the rotation center of the rotating table pad.

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