A reaction device for rapidly producing carbon nanotube fibers

Abstract

The present invention provides a reaction device for rapidly producing carbon nanotube fibers, specifically relating to the technical field of carbon nanotube fiber production devices, and comprising a liquid material conveying system, a gas pressurizing system, a high-speed centrifugal atomizer, and a CVD reactor; the high-speed centrifugal atomizer comprises a high-speed motor and a high-speed centrifugal atomizing disk, the high-speed centrifugal atomizing disk is arranged at the front end of the main shaft of the high-speed motor, the high-speed centrifugal atomizing disk is located inside the CVD reactor, and a plurality of liquid outlet holes are equidistantly arranged in the circumferential direction of the high-speed centrifugal atomizing disk; the liquid material conveying system is used for conveying liquid material into the high-speed centrifugal atomizing disk; the gas pressurizing system conveys high-pressure carrier gas to directly above the high-speed centrifugal atomizing disk, and the high-pressure carrier gas carries the atomized liquid material into the reaction chamber of the CVD reactor. The present invention can solve the problems that in the process of preparing carbon nanotube fibers by the CVD method, the specific surface area of the columnar liquid material is small and the reaction of the liquid material is insufficient.

Description

Technical Field

[0001] The present invention belongs to the technical field of carbon nanotube fiber production devices, and particularly relates to a reaction device for rapidly producing carbon nanotube fibers. Technical Background

[0002] Carbon nanotube fibers have characteristics such as high specific modulus, high specific strength, high electrical conductivity, and low density, and have important application prospects in the fields of aerospace, national defense, electrode materials, etc. The operation of preparing carbon nanotube fibers by the CVD method is simple and the cost is low, which is the first choice for industrial production of carbon nanotube fibers. At present, the liquid material transportation in the preparation of carbon nanotube fibers by the CVD method mainly uses ordinary pipelines for transportation. The transported liquid material is in a liquid column shape, with a relatively small specific surface area, which is not conducive to the evaporation of the liquid material and the subsequent sufficient reaction, resulting in incomplete reaction of a part of the liquid material to form impurities, seriously affecting the quality of carbon nanotube fibers. Summary of the Invention

[0003] The purpose of the present invention is to propose a reaction device for rapidly producing carbon nanotube fibers, which is provided with a high-speed motor and a high-speed centrifugal atomization disk to solve the problems of small specific surface area of the columnar liquid material and incomplete reaction of the liquid material during the preparation of carbon nanotube fibers by the CVD method.

[0004] The technical solution is as follows:

[0005] A reaction device for rapidly producing carbon nanotube fibers includes a liquid material transportation system, a gas pressurization system, a high-speed centrifugal atomizer, and a CVD reactor; the high-speed centrifugal atomizer includes a high-speed motor and a high-speed centrifugal atomization disk. The high-speed centrifugal atomization disk is provided on the main shaft at the front end of the high-speed motor. The high-speed centrifugal atomization disk is located inside the CVD reactor, and a number of liquid outlet holes are equidistantly arranged in the circumferential direction of the high-speed centrifugal atomization disk; the liquid material transportation system is used to transport the liquid material into the high-speed centrifugal atomization disk; the gas pressurization system transports high-pressure carrier gas to directly above the high-speed centrifugal atomization disk, and the high-pressure carrier gas carries the atomized liquid material into the reaction chamber of the CVD reactor. The high-speed centrifugal atomizer atomizes the liquid material into uniform and fine droplets through the action of high-speed centrifugation. The gas pressurization system transports high-pressure carrier gas to directly above the high-speed centrifugal atomization disk, carries the atomized liquid material into the CVD reactor, and the CVD reactor converts the atomized liquid material into carbon nanotube bundles under certain production conditions.

[0006] Preferably, the liquid delivery system includes a liquid pump, a liquid tank, and a liquid delivery pipeline. The liquid pump is provided on the liquid delivery pipeline. One end of the liquid delivery pipeline is connected to the liquid tank, and the other end communicates with a liquid guide pipe. The liquid guide pipe is vertically distributed. The lower end of the liquid guide pipe communicates with the high-speed centrifugal atomization disc. The main shaft of the high-speed motor passes through the liquid guide pipe and is connected to the high-speed centrifugal atomization disc. Such a setting can not only ensure that the liquid in the liquid delivery pipeline is delivered into the high-speed centrifugal atomization disc through the liquid guide pipe, but also does not affect the main shaft of the motor to drive the high-speed centrifugal atomization disc to rotate.

[0007] Preferably, the gas pressurization system includes a gas storage tank, a gas booster pump, a gas delivery pipeline, and a gas buffer disc. The gas booster pump is provided on the gas delivery pipeline. One end of the gas delivery pipeline is connected to the gas storage tank, and the other end is connected to the gas buffer disc. The gas buffer disc is provided with a plurality of air outlet holes. The gas buffer disc is arranged in the upper part of the CVD reactor.

[0008] Preferably, the gas booster pump can increase the carrier gas pressure to 5 - 6 MPa. The gas buffer disc is circumferentially and uniformly provided with a plurality of air outlet holes, and each air outlet hole is radially distributed along the buffer disc. The high-pressure gas of 5 - 6 MPa can blow the fine droplets atomized by the high-speed centrifugal atomization disc into the reaction chamber without accumulating on the inner wall of the buffer chamber.

[0009] Preferably, the CVD reactor includes a buffer chamber, a reaction chamber, and a resistance furnace. The lower end of the buffer chamber communicates with the upper end of the reaction chamber. The resistance furnace is located outside the reaction chamber. The resistance furnace is used to provide heat source for the reaction chamber. The small droplets enter the middle and lower part of the buffer chamber with the high-pressure carrier gas. The specific surface area of the atomized small droplets is very large, and they quickly vaporize at a relatively high temperature in the middle and lower part of the buffer chamber. Subsequently, the vaporized material forms carbon nanotube bundles in the reaction chamber in the high-temperature zone. The carbon nanotube bundles are carried out of the reaction chamber by the carrier gas and spun into carbon nanotube fibers by a twisting method.

[0010] Preferably, the gas buffer disc is arranged in the buffer chamber, fixed on the liquid guide pipe, and is directly above the high-speed centrifugal atomization disc.

[0011] Preferably, the high-speed centrifugal atomization disc is located in the upper-middle part of the buffer chamber. The high-speed centrifugal atomization disc is cylindrical. The side surface of the high-speed centrifugal atomization disc is circumferentially provided with several groups of liquid outlet holes at equal intervals, and each group of liquid outlet holes is composed of several liquid outlet holes distributed along the axial direction of the high-speed centrifugal atomization disc.

[0012] Preferably, the buffer chamber is frustum-shaped, with its upper end larger than its lower end. The resistance furnace is cylindrical, and the inner diameter of the lower end of the buffer chamber is the same as that of the reaction chamber. This arrangement can prevent the small droplets atomized by the high-speed centrifugal atomization disk from hitting the inner wall of the buffer chamber and also prevent the accumulation of materials at the contact part between the buffer chamber and the reaction chamber.

[0013] Preferably, the top cover of the high-speed centrifugal atomization disk is provided with an opening, which is connected to the lower end of the liquid guide pipe. The opening is provided for receiving the liquid material to be atomized.

[0014] Preferably, the maximum rotation speed of the high-speed motor is not less than 25000 rpm, and the operating rotation speed of the high-speed motor is set to 6000 - 25000 rpm.

[0015] (1) Through the atomization of the high-speed centrifugal atomization disk, the liquid material is dispersed into fine droplets, increasing the specific surface area of the liquid material. It quickly vaporizes at a relatively high temperature in the middle and lower parts of the buffer chamber. Subsequently, the vaporized material forms carbon nanotube bundles in the reaction chamber in the high-temperature area, solving the problem that incomplete reaction of the liquid material produces impurities and reduces the quality of carbon nanotube fibers.

[0016] (2) The use of high-pressure carrier gas can spray the liquid material atomized by the high-speed centrifugal atomization disk to the middle and lower parts of the buffer chamber, preventing the liquid material from accumulating on the inner wall of the buffer chamber.

[0017] (3) The rapid and uniform vaporization of the liquid material and the use of high-pressure carrier gas greatly improve the production efficiency of carbon nanotube fibers. Description of the Drawings

[0018] The drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation to the present invention. In the drawings:

[0019] Figure 1 It is a schematic diagram of a reaction device for quickly producing carbon nanotube fibers;

[0020] Figure 2 It is a partial detailed structure schematic diagram of a high-speed centrifugal atomizer;

[0021] Figure 3 It is a longitudinal sectional view of a CVD reactor.

[0022] In the figure: 1, gas storage tank; 2, gas booster pump; 3, gas transmission pipeline; 4, high-speed motor; 5, liquid infusion pipeline; 6, liquid material pump; 7, liquid material tank; 8, buffer chamber; 9, resistance furnace; 10, reaction chamber; 101, liquid guide pipe; 11, main shaft; 12, gas buffer disk; 13, air outlet hole; 14, high-speed centrifugal atomization disk; 15, liquid outlet hole; 16, heating rod. Detailed implementation mode

[0023] As Figures 1 - 3 shown, a reaction device for rapidly producing carbon nanotube fibers includes a liquid delivery system, a gas pressurization system, a high-speed centrifugal atomizer, and a CVD reactor; the high-speed centrifugal atomizer includes a high-speed motor 4 and a high-speed centrifugal atomizing disk 14, and the high-speed centrifugal atomizing disk 14 is provided at the front end of the main shaft 11 of the high-speed motor 4. The liquid delivery system includes a liquid pump 6, a liquid storage tank 7, and an infusion pipeline 5. The liquid pump 6 is provided on the infusion pipeline 5. One end of the infusion pipeline 5 is connected to the liquid storage tank 7, and the other end is communicated with a liquid guide pipe 101. The liquid guide pipe 101 is vertically distributed, and the lower end of the liquid guide pipe 101 is communicated with the high-speed centrifugal atomizing disk 14. The main shaft 11 of the high-speed motor 4 passes through the liquid guide pipe 101 and is connected to the high-speed centrifugal atomizing disk 14. The gas pressurization system includes a gas storage tank 1, a gas booster pump 2, a gas transmission pipeline 3, and a gas buffer disk 12. The gas booster pump 2 is provided on the gas transmission pipeline 3. One end of the gas transmission pipeline 3 is communicated with the gas storage tank 1, and the other end is communicated with the gas buffer disk 12. The CVD reactor includes a buffer chamber 8, a reaction chamber 10, and a resistance furnace 9. The lower end of the buffer chamber 8 is communicated with the upper end of the reaction chamber 10. The resistance furnace 9 is located outside the reaction chamber 10, and a plurality of heating rods 16 are provided in the resistance furnace 9 for heating the reaction chamber 10.

[0024] Among them, the gas buffer disk 12 is arranged inside the buffer chamber 8 and is detachably fixed to the liquid guide pipe 101. The gas buffer disk 12 is directly above the high-speed centrifugal atomizing disk 14. The high-speed centrifugal atomizing disk 14 is located in the upper middle part of the buffer chamber 8. The high-speed centrifugal atomizing disk 14 is cylindrical, and a plurality of groups of liquid outlet holes 15 are equidistantly circumferentially arranged on the side surface of the high-speed centrifugal atomizing disk 14. Each group of liquid outlet holes 15 is composed of a plurality of liquid outlet holes 15 axially distributed along the high-speed centrifugal atomizing disk 14. The top cover of the high-speed centrifugal atomizing disk 14 is provided with an opening, and the opening is connected to the lower end of the liquid guide pipe 101. An opening is provided for receiving the liquid to be atomized.

[0025] Specifically, the buffer chamber 8 is frustum-shaped, the upper end of the buffer chamber 8 is larger than the lower end, the resistance furnace 9 is cylindrical, and the inner diameter of the lower end of the buffer chamber 8 is the same as the inner diameter of the reaction chamber 10. Such a setting can not only prevent the small droplets atomized by the high-speed centrifugal atomizing disk from being thrown onto the inner wall of the buffer chamber 8, but also prevent the accumulation of materials at the contact part between the buffer chamber 8 and the reaction chamber 10.

[0026] In this embodiment, the maximum rotational speed of the high-speed motor 4 is not less than 25,000 rpm, and the operating rotational speed of the high-speed motor 4 is set to 6,000 - 25,000 rpm. The gas booster pump 2 can increase the carrier gas pressure to 5 - 6 MPa. A plurality of air outlet holes 13 are circumferentially and uniformly arranged on the gas buffer disc 12, and each air outlet hole 13 is radially distributed along the buffer disc 12. The high-pressure gas of 5 - 6 MPa can blow the fine droplets atomized by the high-speed centrifugal atomization disc 14 into the reaction chamber 10 without accumulating on the inner wall of the buffer chamber 8.

[0027] Principle

[0028] The feed liquid pump 6 is used to transport the reaction liquid in the feed liquid tank 7 to the high-speed centrifugal atomization disc 14 through the liquid delivery pipeline 5. Driven by the high-speed motor 4, the high-speed centrifugal atomization disc 14 rotates at a high speed, and the feed liquid is atomized by the high-speed centrifugal atomization disc 14 and dispersed into fine droplets, increasing the specific surface area of the feed liquid.

[0029] The gas booster pump 2 is used to boost the gas in the gas storage tank 1 to 5 - 6 MPa through the gas delivery pipeline 3, and then spray it into the top of the buffer chamber 8 through the pipeline. The high-pressure carrier gas quickly brings the atomized fine droplets into the middle and lower parts of the buffer chamber. The specific surface area of the atomized small droplets is very large, and they quickly vaporize at a relatively high temperature in the middle and lower parts of the buffer chamber. Subsequently, the vaporized material forms carbon nanotube bundles in the reaction chamber 10 in the high-temperature zone. The carbon nanotube bundles are carried out of the reaction chamber 10 by the carrier gas and spun into carbon nanotube fibers by a twisting method.

[0030] It should be noted that, for the convenience of observing the relationship between the reaction chamber 10, the buffer chamber 8, and the resistance furnace 9, Figure 3 in the figure, structures such as the high-speed centrifugal atomization disc 14 and the gas buffer disc 12 inside are not drawn.

[0031] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, makes equivalent substitutions or changes, and should be covered by the protection scope of the present invention.

Claims

1. A reaction device for rapidly producing carbon nanotube fibers, characterized in that, It includes a liquid feed delivery system, a gas boosting system, a high-speed centrifugal atomizer, and a CVD reactor; The high-speed centrifugal atomizer includes a high-speed motor and a high-speed centrifugal atomization disk. The high-speed centrifugal atomization disk is provided on the main shaft at the front end of the high-speed motor. The high-speed centrifugal atomization disk is located inside the CVD reactor, and a number of liquid outlet holes are equidistantly arranged circumferentially on the high-speed centrifugal atomization disk; The liquid feed delivery system is used to deliver the liquid feed into the high-speed centrifugal atomization disk; The gas boosting system delivers high-pressure carrier gas directly above the high-speed centrifugal atomization disk, and the atomized liquid feed carried by the high-pressure carrier gas enters the reaction chamber of the CVD reactor; The liquid feed delivery system includes a liquid feed pump, a liquid feed tank, and a liquid delivery pipeline. The liquid feed pump is provided on the liquid delivery pipeline. One end of the liquid delivery pipeline is connected to the liquid feed tank, and the other end is communicated with a liquid guide pipe. The liquid guide pipe is vertically distributed, and the lower end of the liquid guide pipe is communicated with the high-speed centrifugal atomization disk. The main shaft of the high-speed motor passes through the liquid guide pipe to connect the high-speed centrifugal atomization disk; The gas boosting system includes a gas storage tank, a gas booster pump, a gas delivery pipeline, and a gas buffer disk. The gas booster pump is provided on the gas delivery pipeline. One end of the gas delivery pipeline is connected to the gas storage tank, and the other end is connected to the gas buffer disk. The gas buffer disk is provided with a plurality of gas outlet holes, and the gas buffer disk is arranged in the upper part inside the CVD reactor; The gas booster pump can increase the pressure of the carrier gas to 5 - 6 MPa. A plurality of the gas outlet holes are evenly arranged circumferentially on the gas buffer disk, and each gas outlet hole is distributed radially along the buffer disk; The maximum rotation speed of the high-speed motor is not less than 25000 rpm, and the operating rotation speed of the high-speed motor is set to 6000 - 25000 rpm; The gas buffer disk is fixed on the liquid guide pipe, and the gas buffer disk is directly above the high-speed centrifugal atomization disk.

2. The reaction device for rapidly producing carbon nanotube fibers according to claim 1, characterized in that, The CVD reactor includes a buffer chamber, a reaction chamber, and a resistance furnace. The lower end of the buffer chamber is communicated with the upper end of the reaction chamber, and the resistance furnace is located outside the reaction chamber.

3. The reaction device for rapidly producing carbon nanotube fibers according to claim 2, characterized in that, The high-speed centrifugal atomization disk is located in the upper middle part of the buffer chamber. The high-speed centrifugal atomization disk is cylindrical. A number of groups of the liquid outlet holes are equidistantly arranged circumferentially on the side surface of the high-speed centrifugal atomization disk, and each group of the liquid outlet holes is composed of a number of the liquid outlet holes distributed axially along the high-speed centrifugal atomization disk.

4. The reaction device for rapidly producing carbon nanotube fibers according to claim 2, characterized in that, The buffer chamber is frustum-shaped, the upper end of the buffer chamber is larger than the lower end, the resistance furnace is cylindrical, and the inner diameter of the lower end of the buffer chamber is the same as the inner diameter of the reaction chamber.

5. The reaction device for rapidly producing carbon nanotube fibers according to claim 1, characterized in that, The top cover of the high-speed centrifugal atomization disk is provided with an opening, and the opening is connected to the lower end of the liquid guide pipe.

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