Loadport Module

Abstract

A substrate loading apparatus includes: a frame adapted to be connected to a substrate processing device, the frame having a transport opening through which substrates are transported to the processing device; and a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support being configured such that a sealed internal atmosphere of the container enters and exits the support at a predetermined access position of the container, and the cassette support having a predetermined continuous steady-state pressure differential plenum area, the predetermined continuous steady-state pressure differential plenum area being at least partially defined by a boundary of a fluid flow that generates a pressure differential, such that the predetermined continuous steady-state pressure differential plenum area defines a continuous steady-state fluid flow isolation barrier, the continuous steady-state fluid flow isolation barrier being disposed on the support between the predetermined access position of the container and another predetermined section of the support that isolates another predetermined area from the predetermined access position.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This nonprovisional application claims priority to and the benefit of U.S. Provisional Application No. 62 / 772,376, filed on November 28, 2018, the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0003] Aspects of the present disclosure relate generally to substrate processing equipment and, more particularly, to an improved loadport module for substrate processing equipment. Background Art

[0004] In a semiconductor manufacturing (also known as a "fab") environment, during some semiconductor manufacturing processes, loadports are exposed to corrosive gases (e.g., such as hydrogen bromide gas, hydrochloric acid gas, etc.), which can adversely affect exposed components of the loadport. These exposed components of the loadport are typically coated with an anti-corrosion coating to mitigate the risk of exposure to the corrosive gas.

[0005] Providing other corrosive gas mitigation has proven difficult and expensive due to, for example, the unpredictable nature of gas flows (such as from a loadport purge vent or other gas source) due to, for example, the varying geometries of front-opening pods (FOUPs) held by the loadports; the amount of outgassing from various components within the FOUPs, which can vary from FOUP to FOUP; the number of wafers or substrates held by a FOUP, which can vary from FOUP to FOUP; and the like. Providing coatings on loadport components that may or may not be subjected to corrosive gases increases the cost of the loadport. Furthermore, modifying the loadport to accommodate the coatings and / or redirecting the corrosive gases also increases the cost, complexity, and manufacturing lead time of the loadport. Summary of the Invention

[0006] none. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] The foregoing aspects and other features of the present disclosure are explained in the following description with reference to the accompanying drawings, in which:

[0008] Figure 1A is a schematic perspective view of a substrate processing apparatus according to aspects of the present disclosure;

[0009] Figure 1B is a schematic illustration of a substrate processing apparatus according to aspects of the present disclosure;

[0010] Figure 1C is a schematic illustration of a substrate processing apparatus according to aspects of the present disclosure;

[0011] Figure 2 According to various aspects of the present disclosure Figures 1A-1C a schematic illustration of a load port module of any one of the substrate processing apparatuses of FIG.

[0012] Figure 3 According to various aspects of the present disclosure Figure 2 A schematic diagram of a load port module;

[0013] Figures 4A-4D According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0014] Figure 5 According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0015] Figure 6A and Figure 6B is a schematic illustration of a substrate transport container;

[0016] Figure 7A and Figure 7B According to various aspects of the present disclosure Figures 1A-1C a schematic illustration of a portion of a substrate processing apparatus of any one of;

[0017] Figure 8A is a flow chart for coupling a container to a substrate processing apparatus according to aspects of the present disclosure;

[0018] Figure 8B is a flow chart for decoupling a container from a substrate processing apparatus according to aspects of the present disclosure;

[0019] Figure 9 According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0020] Figure 10A According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0021] Figure 10B According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0022] Figure 11 According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0023] Figure 12 According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0024] Figure 13 According to various aspects of the present disclosure Figure 2 a schematic illustration of a portion of a load port module;

[0025] Figure 14 is an exemplary flow chart according to aspects of the present disclosure; and

[0026] Figure 15 is an exemplary flow chart according to aspects of the present disclosure. DETAILED DESCRIPTION

[0027] refer to Figure 1A , illustrates a perspective view of a substrate processing apparatus 10 incorporating features of the present disclosure. Although the present disclosure will be described with reference to the aspects shown in the drawings, it should be understood that the present disclosure may be embodied in many alternative forms of aspects. In addition, any suitable size, shape or type of element or material may be used.

[0028] exist Figure 1A In the aspects illustrated in FIG, the apparatus 10 has been shown as having a general substrate batch processing tool configuration for exemplary purposes only. In alternative embodiments, the substrate processing apparatus may have any other suitable configuration, as the features of the present invention (as described in greater detail below) are equally applicable to any substrate processing tool configuration, including tools and / or linear tool stations for individual substrate processing, such as in FIG. Figure 1B and Figure 1CThe tool and / or linear tool station for individual substrate processing is described in U.S. Patent Application No. 11 / 442,511, filed on May 26, 2006, entitled “Linearly Distributed Semiconductor Workpiece Processing Tool,” the disclosure of which is incorporated herein by reference in its entirety. Apparatus 10 may be capable of transporting and processing any desired type of flat panel or substrate, such as 200 mm or 300 mm semiconductor wafers, semiconductor packaging substrates (e.g., high-density interconnects), semiconductor manufacturing process imaging panels (e.g., masks or reticles), and substrates for flat panel displays. Apparatus 10 may generally include a front section 12 and a rear section 14. Front section 12 (for convenience, the term front is used herein to identify an exemplary reference frame, and in alternative embodiments, the front of the apparatus may be located on any desired side of the apparatus) includes a system that provides an interface allowing substrates from the fab to be introduced into the interior of apparatus 10 (as described in greater detail below). The front section 12 also typically includes a housing 16 and automated components located within the housing to transport substrates between the rear section 14 and the front section interface leading to the exterior. The rear section 14 is connected to the housing 16 of the front section. The rear section 14 of the equipment may have a controlled atmosphere (e.g., vacuum, inert gas) and typically includes a processing system for processing substrates. For example, the rear section may typically include a central transport chamber with a substrate transport mechanism, as well as peripheral processing modules for performing desired manufacturing processes (e.g., etching, material deposition, cleaning, baking, inspection, etc.) on the substrates within the equipment. Within the facility, substrates may be transported to the processing equipment 10 in containers T (also called carriers). The containers T may be positioned at or near the front section interface. Automation may be used within the front section 12 to bring substrates from the containers through an interface (such as a BOLTS (Box Opener / Loader to Tool Standard) interface) into the front section 12. The substrate can then be transported via a load lock to a controlled atmosphere rear section for processing in one or more of the process modules. The processed substrate can then be returned to the front section 12 and then to the transport container T in a substantially reversed manner for removal.

[0029] The front section 12 (which may alternatively be referred to as an environmental front end module or EFEM) may have a shell or housing that defines a protected environment or mini-environment in which substrates may be entered, exited, and transported with minimal potential for contamination between a transport container T for transporting substrates within the FAB and a load lock 14L that provides access to a controlled atmosphere in the rear processing section 14. Load ports or load port modules 24 (one or more in number, as will be further described below) are located on one or more sides of the front section, providing an interface between the front section and the FAB. The load port module may be substantially similar to the load port module described in U.S. Patent No. 8,821,099, entitled "Load Port Module," issued on September 2, 2014, the disclosure of which is incorporated herein by reference in its entirety. The load port module 24 may have a closable port 30P that forms a closable interface (such as a BOLTS interface) between the interior and exterior of the EFEM. As Figure 1A As seen in the drawings, the load port module may have a support area for a substrate transport container T. A secondary holding area may also be provided below the support area that can temporarily cushion the transport container. The transport container support area allows the transport container T supported thereon to be automatically moved to a final or docking position. When the transport container is in the docking position, the port door of the load port module may engage the transport container to open the transport container and also open the access port 30P in the load port frame to provide access to the substrates within the transport container and access for transporting substrates between the container and the interior of the EFEM. The engagement between the port door and the transport container can be achieved by independently operable keys, as described in U.S. Patent No. 8,821,099. According to aspects of the present disclosure, the (multiple) load port modules 24 described herein include a pressure differential booster chamber space or area on or adjacent to the shuttle 52 of the load port 24. As will be described herein, the differential pressure boost chamber substantially contains and / or evacuates any corrosive gases (e.g., vented gases) that may escape from a substrate transport container T disposed on a shuttle and interfaced with the load port 24 through a container door seal and / or substantially escape upon initiation (and / or substantially completion) of purging / venting the substrate transport container T by the load port 24. The differential pressure boost chamber may also substantially contain and / or evacuate corrosive gases that may escape or be vented substantially upon opening the door of the substrate transport container T by the load port 24. The differential pressure boost chamber may substantially prevent corrosive gases from contacting, for example, any suitable components of the load port 24, including, but not limited to, a printed circuit board (PCB) 74 ( Figure 5 ), (multiple) linear bearings 283 ( Figure 3 ), motor (see for example motor 53 ( Figure 4D)), sensors (see sensors T12-T20 ( Figure 4B )、Sensor 68O( Figure 5 )、switch 68( Figure 5 )、Sensor 92( Figure 4C ))、(multiple) harnesses 72 ( Figure 4D ), (multiple) detection systems 110 ( Figure 2 ) and / or other suitable components of the loading port 24 near the container T disposed on the loading port 24.

[0030] Now refer to Figure 1B , shows a schematic plan view of a linear substrate processing system 2010, wherein a tool interface section 2012 is mounted to a transfer chamber module 3018 such that the interface section 2012 faces generally (e.g., inwardly) toward, but is offset from, the longitudinal axis X of the transfer chamber 3018. The transfer chamber module 3018 can be extended in any suitable direction by attaching additional transfer chamber modules 3018A, 3018I, 3018J to interfaces 2050, 2060, 2070, as described in U.S. Patent Application No. 11 / 442,511, previously incorporated herein by reference. Each transfer chamber module 3018, 3019A, 3018I, 3018J includes a substrate transport 2080 for transporting substrates throughout the processing system 2010 and into and out of, for example, a process module PM. As can be appreciated, each chamber module can be capable of maintaining an isolated, controlled, or sealed atmosphere (e.g., N2, clean air, vacuum).

[0031] refer to Figure 1C , shows a schematic elevational view of an exemplary processing tool 410, such as may be taken along the longitudinal axis X of the linear transfer chamber 416. In one aspect, as Figure 1C As shown in FIG, the tool interface section 12 can be representatively connected to the transfer chamber 416. In this aspect, the interface section 12 can define one end of the tool transfer chamber 416. Figure 1C As seen in FIG, the transfer chamber 416 may have another workpiece entry / exit station 412, for example, at an end opposite the interface section 12. In other aspects, other entry / exit stations for inserting / removing workpieces from the transfer chamber may be provided, such as between the ends of the tool transfer chamber 416. In one aspect of the present disclosure, the interface section 12 and the entry / exit station 412 may allow for loading and unloading of workpieces from the tool. In other aspects, workpieces may be loaded into the tool from one end and removed from the other end. In one aspect, the transfer chamber 416 may have one or more transfer chamber modules 18B, 18i. Each chamber module may be capable of maintaining an isolated, controlled, or sealed atmosphere (e.g., N2, clean air, vacuum). As previously described, the transfer chamber modules 18B, 18i, the load lock modules 56A, 56B, and the forming Figure 1C The configuration / arrangement of the workpiece stations of the transfer chamber 416 shown in FIG. 4 is merely exemplary, and in other aspects, the transfer chamber may have more or fewer modules arranged in any desired modular arrangement. In one aspect, station 412 may be a load lock. In other aspects, a load lock module may be located between end entry / exit stations (similar to station 412), or adjacent transfer chamber modules (similar to module 18i) may be configured to operate as load locks. As also previously described, the transfer chamber modules 18B, 18i have one or more corresponding transport devices 26B, 26i located therein. The transport devices 26B, 26i of the corresponding transfer chamber modules 18B, 18i may cooperate to provide a linearly distributed workpiece transport system 420 within the transfer chamber. In other aspects, the transfer chamber modules 18B may be configured to allow any suitable transport vehicle (not shown) to travel between the transfer chamber modules 18B along at least a portion of the length of the linear transfer chamber 416. As can be appreciated, the transporter 900 may include any suitable transport device mounted thereto and substantially similar to those described herein. Figure 1C As shown in , in one aspect, the arms of the transport apparatus 26B can be arranged to provide what may be referred to as a quick exchange arrangement that allows the transport to quickly exchange wafers from a pick / place location, as will also be described in further detail below. The transport arms 26B can have suitable drive sections for providing three (3) degrees of freedom (e.g., independent rotation about shoulder and elbow joints and with Z-axis motion) to each arm from a simplified drive system compared to conventional drive systems. In other aspects, the drive sections can provide more or less than three degrees of freedom to the arms. As Figure 1CAs seen in FIG. 1 , in one aspect, modules 56A, 56, 30i can be interstitially located between transfer chamber modules 18B, 18i and can define suitable processing modules, load locks, buffer stations, metrology stations, or any other desired stations. For example, interstitial modules (such as load locks 56A, 56 and workpiece station 30i) can each have a stationary workpiece support / shelf 56S, 56S1, 56S2, 30S1, 30S2 that can cooperate with a transport arm to facilitate transport of workpieces along the linear axis X of the transfer chamber. For example, workpiece(s) can be loaded into transfer chamber 416 via interface section 12. The workpiece(s) can be positioned on the support(s) of load lock module 56A using the transport arm 15 of the interface section. In load lock module 56A, workpiece(s) can be moved between load lock module 56A and load lock module 56 by transport arm 26B in module 18B, and in a similar and continuous manner, between load lock 56 and workpiece station 30i by arm 26i (in module 18i), and between station 30i and station 412 by arm 26i in module 18i. This process can be reversed in whole or in part to move the workpiece(s) in the opposite direction. Thus, in one aspect, the workpieces can be moved in any direction along axis X and to any location along the transfer chamber, and can be loaded into and unloaded from any desired module (processing or otherwise) in communication with the transfer chamber. In other aspects, an interstitial transfer chamber module with a static workpiece support or shelf may not be provided between transfer chamber modules 18B, 18i. In this aspect of the present disclosure, the transport arms of adjacent transfer chamber modules can transfer the workpiece directly (or through the use of a buffer station) from the end effector or one transport arm to the end effector of another transport arm to move the workpiece through the transfer chamber. The processing station module can operate on the substrate through various deposition, etching or other types of processes to form circuits or other desired structures on the substrate. The processing station module is connected to the transfer chamber module to allow the substrate to be transferred from the transfer chamber to the processing station and vice versa. A method of manufacturing a substrate having a plurality of transfer chambers and a plurality of processing stations is described in U.S. patent application Ser. No. 11 / 442,511. Figure 1C Suitable examples of processing tools have similar general features to the processing equipment depicted in , which application was previously incorporated herein by reference.

[0032] refer to Figure 1A and Figure 2 ( Figure 2is a perspective view of a load port module 24 of a processing apparatus according to this exemplary aspect of the present disclosure). The load port module 24 has a frame 29 that may generally define (as previously described) a transport container holding or support area 28 and a closable port 30P through which substrates may be transported into and out of the microenvironment within the front section housing 16. The load port module 24 may be substantially similar to the load port module described in U.S. Patent No. 8,821,099, entitled “Load Port Module,” issued on September 2, 2014, the disclosure of which is incorporated herein by reference in its entirety. As will be further described below, the housing 16 of the EFEM and the load port module 24 are connected to form a chamber or space 25 that is substantially closed from the outside and, as previously described, provides a controlled or microenvironment within the front section 12 (also referred to as the EFEM). For example, the front section may include a controlled air flow system (not shown), such as vents, louvers, a laminar flow system, to prevent particulate contaminants from entering the microenvironment in the front section 12. As Figure 1A and Figure 2 As seen in FIG, the transport container holding area 28 of the load port module 24 can have a primary or first station 36 and a secondary station 34. In this aspect, each station 36, 34 of the holding area 28 can be capable of holding a transport container T, however, in alternative embodiments, the transport container holding area can have more or fewer holding stations, and each holding station can be capable of supporting any desired number of substrate transport containers. The transport container T ( Figure 1A ) is depicted as a front opening pod (FOUP) type container for illustrative purposes, however in alternative embodiments the holding stations of the load port holding area may be capable of supporting any desired type of shipping container, such as a SMIF container.

[0033] exist Figure 1A In the aspect shown in FIG, for illustrative purposes, the front section 12 has a load port module 24 located on the front face 12F of the front section 12. In this position, the load port module 24 can be positioned to facilitate placement and removal of transport containers T onto and from at least one holding station 34, 36 of the load port module holding area 28 using any suitable automated material handling system (AMHS) (not shown). Figure 1A-2 As seen in FIG, the load port module holding area 28 projects forward from the face 12F of the front section, and access for removing / placing transport containers T onto the holding area 28 with the AMHS can be from the top or the front. In alternative embodiments, the load port module can be located on other sides of the front section as desired. In still other alternative embodiments, the load port module can be located on two or more sides of the front section 12. As shown in FIG. Figure 2As seen in FIG, the loadport module 24 in this exemplary aspect may have an extension area 38 that protrudes outwardly from the floor of the loadport module 24.

[0034] Reference again Figure 1A-3 The transport container holding area 28 of the load port module 24 may have an upper support station 36 and a lower support station 34, each support station 36, 34 may be capable of holding or supporting a container such as Figure 1A . In this aspect, the lower station 34 is generally located below the upper station 36. The lower station 34 may include opposing members 34L ( Figure 3 Only one of them is shown in the figure), so that when the transport container is placed in the lower station 34, the transport container is supported by the slave member 34L. Figures 6A-6B 1 and 2 are front and bottom perspective views, respectively, of an exemplary substrate transport container T. Figures 6A-6B The container T in FIG is shown as having a FOUP type configuration. In alternative embodiments, the substrate container may have any other desired configuration, such as Figure 6A As best seen in FIG, a transport container T generally has an outer shell T2 and an outer shell cover or door T4 removably connected to the outer shell. The outer shell T4 has an upper surface T6 with a fixture T8 protruding therefrom. The fixture T8 may include a lateral flange or an outwardly protruding seating surface T10 offset a distance from the upper surface T6 of the outer shell. The seating surface T10 may be a portion of a shipping flange compliant with SEMI; E47.1-1001. The seating surface T10 may be used to engage a coupling portion (not shown) of a container transporter of an automated material handling system and thereby support a container from the transporter. Referring again to FIG. Figure 2-3 , in this aspect, the support member 34L of the lower station 34 on the load port module holding area 28 is shown as having an angled or generally L-shaped configuration. The member 34L has an inwardly projecting flange 34F as shown. In alternative embodiments, the support member 34L may have any other suitable shape. The support member 34L may be, for example, metal, plastic, or any other suitable material, and may be as shown. Figure 3 The support structure 296 is shown connected to the load port frame 29. The inwardly directed flange 34F is sized to receive the seating surface T10 on the transport container (see FIG. Figure 6A ) and the upper surface T6 of the container. The flanges 34F of the opposing member 34L are sufficiently separated to allow the support fixture T8 of the container T to be inserted between the flanges, with the outwardly projecting seating surfaces T10 overhanging (at least partially) the corresponding flanges 34F. Thus, when loaded into the lower station 34, the transport container T is supported by the seating surfaces T10 resting on the flanges 34F.

[0035] In this aspect, the operator can insert the container T (along the Figure 2 34F) to manually position the container on the lower station 34. In alternative embodiments, the support members of the lower support station may have any other desired orientation to allow the shipping container to be positioned from any other desired orientation. Removal of the shipping container T from the lower station 34 may be accomplished in a substantially reverse manner, wherein the user manually withdraws the container in the opposite direction from installation. The lower support station 34 provides the loadport module with another container storage location at which the user may place the shipping container T when the upper support station 36 is occupied by another shipping container or is in a state (such as testing) that prevents the shipping container T from being placed on the upper station. As previously discussed, in alternative embodiments, the loadport module may not have a lower support station in the shipping container holding area 28.

[0036] Now refer to it again Figure 2 The upper support station 36 of the transport container holding area 28 on the load port module 24 generally includes a base support or shelf 50 and a carriage or shuttle 52 movably mounted on the shelf 50. A shuttle drive system 54 operatively connects the shuttle 52 to the shelf 50 and is capable of moving the shuttle 52 on the shelf 50. The drive system 54 moves the shuttle (along the axis indicated by the first and second positions) between a first position and a second position. Figure 2 As will be further described below, the shuttle 52 is configured to allow a transport container T to be placed thereon. The first shuttle position can be configured so that a transport container T can be automatically positioned on (or removed from) the carriage by an automated material handling system (not shown). The second position to which the shuttle 52 can be moved, as will be further described below, is configured so that a transport container T on the shuttle can be docked with the door 30D (see FIG. Figure 1A ). When the shuttle is in this second position, the transport container T thereon is located in a position which will be referred to as the docking position for the sake of convenience. As will be further described below, the controller 400 is communicatively connected to the drive system and the sensors on the shuttle.

[0037] like Figure 1A As seen in FIG, the transport container T is placed on the shuttle 52 with the bottom surface of the container resting on the shuttle. Thus, the shuttle 52 is configured to conformably engage the bottom of the transport container T as will be further described below. Figure 6BFIG2 is a bottom view illustrating features of the bottom T3 of an exemplary substrate transport container T. In this aspect, the bottom T3 of the transport container has features generally conforming to the specifications of SEMI E47.1. In alternative embodiments, the bottom of the substrate transport container may have any other desired features. In this case, the bottom T3 typically includes a container sensing pad T12, one each of front-end-of-line (FEOL) and back-end-of-line (BEOL) information pads T14 and T16, a container capacity (i.e., the number of substrate holding positions) information pad T18, and a cassette or box information pad T20. The container bottom T3 may further include a slot T22 for engagement by the positioning / kinematic coupling pin 66 on the shuttle 52. A first recess T24 in the bottom surface is provided as a first retaining feature. The container bottom also has a second retaining feature T26 formed therein. The second retaining feature typically comprises a generally circular recess T30 formed into the bottom, having an outer aperture T32 with a substantially squared edge T34 (forming an engagement lip T36).

[0038] Figures 4A-4D Schematic perspective, top plan, front elevation, and side elevation views, respectively, of a portion of a reciprocating member 52 and a supporting shelf structure on which the reciprocating member is mounted (the supporting shelf structure 50 is shown only in FIG. Figures 4C-4D ). The shuttle 52 typically includes a chassis or frame 55 and a cover 56 positioned on the chassis. The shuttle 52 may also typically have a locating feature 58 for assisting in properly locating the container T on the shuttle, a coupling feature 60 for positively coupling a seated container T to the shuttle, and a detection system 62 for detecting the presence and accurate placement of the container T on the shuttle 52. Reference is now also made to Figure 5 , which shows a partial cross-sectional view of the shuttle 52, the chassis 55 can have any suitable shape and can be made of any suitable material capable of supporting the static and dynamic loads associated with the placement and removal of the transport container T on the shuttle and the movement of the container and the shuttle between the first position and the second position. The chassis 55 can have a shape that allows the shuttle 52 (along the Figure 2 A motion system (not shown) such as rollers or slides that freely moves relative to the support shelf 50 of the load port module frame (in the direction indicated by the arrow M in FIG). Figure 3 ) support structure 296 is formed Figure 5 The support shelf 50 is partially shown in FIG. Figure 2The shelf 50 may include tracks or rails (not shown) formed on or suspended from the frame structure 296 (e.g., the top panel 296H or the side panels 296E), upon which the motion system of the chassis 55 rides. The container positioning features 58, the coupling features 60, the detection system 62, and the cover 56 are mounted to the chassis 55.

[0039] like Figures 4A-4B As best seen in FIG. 5 , in this aspect, the container locating feature 58 on the shuttle 52 may include a protruding engagement member 64. In this aspect, the engagement member 64 may have a generally truncated pyramidal shape that generally conforms to the locating recess T24 in the bottom T3 of the container (see FIG. Figure 6B ) in shape. The engaging member 64 may be anchored to the chassis 55 and protrude through a suitable opening in the cover 56 and sufficiently above the upper surface 56U of the cover to engage the locating recess T24 in the container when the container T is placed on the reciprocating member 52. The engaging member 64 may have a cam surface 64C for cooperating with the edge of the container locating feature to help automatically position the container T properly on the reciprocating member. In an alternative embodiment, the reciprocating member may not have an engaging member (such as member 64). In this aspect, the reciprocating member 52 may have a locating post (also known as a kinematic coupling pin) 66. The post 66 can be used as a locating feature to help correctly position the container T on the reciprocating member 52, and can also be used to provide a device for forcibly coupling (i.e., kinematically coupling) the container T to the reciprocating member 52. As can be seen from Figure 4B and 6B As will be appreciated, the post 66 is positioned on the shuttle 52 to cooperate with the slot T22 in the container bottom T3. Figure 5 As shown in FIG, a post 66, which may be formed of any suitable material (such as metal or plastic), may be anchored directly to the chassis 54 of the reciprocating member. The post 66 may protrude through a suitable hole in the cover 56 to engage with the slot T22 (see FIG. Figure 6B ) engages the bottom of the container. In this aspect, the column 66 can define a support plane for the transport container T on the shuttle. Figure 4D and 5 As seen in FIG, the end or tip 66T of the post 66 may have a generally conical or rounded shape. This provides the desired three points of contact between the shuttle 52 and the bottom of the container to accurately and repeatably define the support plane for the container on the shuttle. As can be appreciated, the post 66 supports the weight of the container T and therefore has a substantially rounded shape. Figure 5 The conical top 66T of the post 66 also acts as a cam surface against the inclined side of the slot T22 in the bottom of the container, thereby mechanically guiding the container along the support plane until the desired position of the container on the shuttle is established (achieved by the geometry of the slot T22 and the top 66T of the post 66).

[0040] The detection system 62 of the shuttle 52 typically includes several switches 68 distributed over the area of ​​the shuttle. The switches 68 can be located on the shuttle 52 to cooperate with the container sensing pad T12, FEOL and BEOL information pads T14, T16, and container capacity and cartridge information pads T18, T20 on the bottom of the container. Figure 4B The positions of the pads T12-T20 on the bottom of the container T overlying the cover 56 and the switch 68 of the shuttle 52 are shown. In this respect, the switches 68 are generally of the same type and similar to each other, and will be described below with reference to a representative switch. In alternative embodiments, different types of switches may be used in different positions on the shuttle, corresponding to different types of information that can be relayed to a given switch via the different information pads T16-T20 of the container T. The architecture of the representative switch 68 is shown in FIG. Figure 5 68 is best seen in FIG. In this aspect, the switch 68 can be a photoelectric switch that generally includes a base or sensor portion 68O and an actuation portion 68I. As will be further described below, the actuation portion 68I is spring loaded and is actuated by contact with a corresponding pad on the bottom of the container. The sensor portion 68O detects actuation of the actuation portion, thereby sending a signal to the control system. Figure 5 As seen in , the sensor portion 68O may be mounted on a PCB 74 positioned on the chassis 55 of the shuttle. The PCB 74 may have traces 68E formed therein for both power and signal transmission. The traces 68E may terminate to suitable surface contacts (not shown) to which the contact terminals of the electronic component may be connected as desired (using any suitable means for mounting the electronic component to the PCB, including flushwave soldering). The contact terminals (both power and signal) of the sensor portion 68O may be connected to the traces 68E in the PCB 74 in a similar manner. Mounting an electronic component (such as the sensor portion 68O of the switch 68) to a PCB (such as the PCB 74) having integral traces serves to eliminate separate conductors that would otherwise be used to connect the component to a power source and control system, and the expensive and time-consuming mounting of these separate conductors on the chassis. The traces 68E in the PCB may extend to terminal connectors (not shown), for example, a flexible harness 72 (see also Figure 4D ) can be mated to the terminal connector. As can be appreciated, the wiring harness can link the traces 68E in the PCB 74 and thus link the electronic components (such as the sensor portion of the detector switch 68) to the control system 400 (see Figure 2) and a power source (not shown). Sensor portion 68O may include, for example, a suitable light source (such as an LED) and a light detector (such as a photocell). In the inactive state of the switch, the light source may, for example, illuminate the photocell, which causes sensor portion 68O to send a signal (via trace 68E) to control system 400, which interprets the signal as the inactive state of switch 68. When the light source is blocked (such as by a portion of actuating portion 68I of the switch), the signal from the photocell changes, which in turn is interpreted by the control system as the switch is now in the actuated state. In an alternative embodiment, sensor portion 68O may be configured so that the light source is blocked when switch 68 is in the inactive state and the light detector is illuminated when in the active state.

[0041] like Figure 5 As seen in FIG, the actuating portion 68I of the switch 68 is integrated into the cover 56 of the reciprocating member 52. In this aspect, the spring that biases the actuating portion 68I is formed by a portion of the cover 56. The cover 56 of the reciprocating member 52 can be made, for example, from plastic or sheet metal or any other suitable material. In this aspect, the cover 56 can be a one-piece member (i.e., having a one-piece construction). In the case where the cover 56 is plastic, it can be formed, for example, by injection molding or any other suitable process. Figures 4A-4D As seen in FIG. 5 , in this aspect, the cover 56 may have a generally hexahedral shape having an upper surface 56U and a peripheral wall 56W projecting from the upper surface. In alternative embodiments, the shuttle cover may have any other suitable shape. Figure 2 As best seen in FIG, when cover 56 is mounted on chassis 55, the cover serves to substantially enclose the chassis but to provide a slight gap between the bottom edge of cover perimeter wall 56W and shelf 50 to facilitate free relative movement of the shuttles while minimizing the ingress of dust or other particles into the shuttle system. Figure 4A As shown in FIG, the top surface 56U of the cover has a through hole 56H formed therein. Figure 5 As best seen in FIG, hole 56H allows post 66 to extend through cover 56. Figure 5 As also shown in FIG, in this aspect, the holes 56H are also used to locate the cover 56 on the shuttle chassis 55 (the gap between the hole edge and the corresponding post 66 is small enough so that the post 66 provides accurate positioning of the cover 56 relative to the chassis 55). Figure 5 As shown in FIG, in this aspect, the rim of hole 56H rests on collar 66C of post 66, thereby supporting cover 56 from the post. In alternative embodiments, the cover may have any other desired mounting system for attaching the cover and chassis. Figures 4A-4BAs seen in , the upper surface 56U of the cover has a number of resilient flexible protrusions or fingers 70 formed therein. The protrusions 70 may be formed by any suitable means, such as cutting the top surface 56U of the cover 56. The number of protrusions 70 may correspond to the number of switches 68 of the detection system 62. In this aspect, there are eight protrusions 70 formed into the upper surface of the cover. In alternative embodiments, the cover may have any other desired number of flexible protrusions formed therein. In other alternative embodiments, the flexible protrusions may be formed in any other desired surface of the cover. Figures 4A-4B In the aspect shown in , the protrusions 70 are substantially similar to each other, and therefore, the protrusions 70 can have similar elastically flexible characteristics. In alternative embodiments, the shapes (i.e., length, cross-section) of the different protrusions can be varied to provide different protrusions with different flexible characteristics. In this aspect, the distal ends 70E of the protrusions 70 are located on the cover so that when the cover is mounted to the chassis, each distal end 70E is substantially positioned at the corresponding switch 68 (see FIG. Figure 5 ) on the sensor portion 68O of the switch. In alternative embodiments, the protrusion can be positioned so that any other desired portion of the protrusion (i.e., the middle section of the protrusion) is positioned on the sensor portion of the corresponding switch. The orientation of the protrusion on the upper surface 56U of the cover can be additionally selected as desired to provide the protrusion with unconstrained cantilever flexibility. Figures 4A-4B The orientation of the protrusion 70 shown in FIG. 7 is merely exemplary, and the protrusion may have any other desired orientation.

[0042] like Figure 5As best seen in FIG. 5 , in this aspect, the actuating portion 68I of the switch 68 is mounted or located on a corresponding distal end 70E of the protrusion 70. The actuating portion 68I can be of integral construction with the protrusion 70 (e.g., formed during the molding process of the upper surface of the lid), or can be attached to the protrusion 70 using a suitable bonding means (e.g., adhesive). The actuating portion 68I protrudes sufficiently from the upper surface 56U of the lid to contact the corresponding pads T12-T20 of a container placed on the post 66, and this contact causes sufficient deflection of the protrusion 70 to move the interrupter flag portion 68F of the actuating portion, thereby (e.g., blocking the light source and) causing activation of the switch 68. When the container T is removed from the shuttle 52, the flexible protrusion 70 springs back to the undeflected position, thereby restoring the switch to the inactivated state. As can be appreciated, if the container T is not properly placed on the shuttle, there may be some misalignment between the pads T12-T20 of the container and at least some of the actuating portions 68I of the switches 68, causing at least some of the switches to be inactivated. The combination of signals from some activated switches and other inactivated switches may be interpreted by the control system 400 as indicating improper placement of the container T on the shuttle. The control system programming may then prevent movement of the shuttle 52 and command corrective action to correct the placement or remove the container from the shuttle.

[0043] As previously described, the shuttle 52 may include a coupling feature 60 for forcibly coupling the transport container T to the shuttle. Also as previously described, the post 66 serves as a kinematic coupling device between the shuttle and the container during the shuttle's motion. In this aspect, the shuttle coupling feature 60 may also include a container gripping system 61 that is substantially similar to the container gripping system described in U.S. Patent No. 8,821,099, which was previously incorporated herein by reference in its entirety.

[0044] Now refer to it again Figure 2 and Figures 4A-4D , can be moved by the drive system 54 between a first or loading position and a docking position of the reciprocating member 52 (along the Figure 2 The direction indicated by the arrow M in the figure) is the reciprocating member. Figures 4C-4D As best seen in FIG, in this aspect, the shuttle drive system 54 generally includes an electric motor 53 that drives a lead screw 57. In alternative embodiments, the shuttle may have any suitable type of drive system, such as a pneumatic or hydraulic drive system. In this aspect, the electric motor 53 may be any suitable type of motor, such as an AC or DC motor, a stepper motor, or a servo motor. The motor 53 may be fixedly mounted to the shelf structure 50. The lead screw 57 is connected to the output shaft of the motor. The motor may be capable of rotating the lead screw both clockwise and counterclockwise. The lead screw 57 is also drivingly engaged to a plurality of linear bearings 283 ( Figure 3) rides on a chassis 55 of the reciprocating member 52. The engagement between the lead screw and the chassis may be provided by any suitable means, such as, for example, a threaded sleeve secured to the chassis and threadably engaged by the lead screw. Rotation of the lead screw 57 by the motor 53 causes axial movement of the sleeve on the lead screw and, therefore, axial movement of the chassis and reciprocating member 52 relative to the shelf 50 to which the motor 53 is secured. Figure 4C As seen in FIG, the motor 53 is communicatively connected to the controller 400 via suitable circuitry 91. The controller 400 may provide both command signals and power (from a suitable power source) to the motor 53 via the circuitry 91. The motor 54 may include a motor encoder 58E (see FIG. Figure 4D ). The controller 400 may be capable of processing the motor encoder data to identify the position of the shuttle on the load port. In an alternative embodiment, a linear encoder may be installed between the shuttle and the support shelf to identify the position of the shuttle during movement. Figure 4C As seen in FIG, in this aspect, circuit 91 may also include a pinch protection circuit 90 capable of detecting obstructions to the movement of the reciprocating member. The pinch protection circuit may include a current sensor 92 of any suitable type and having a desired sensitivity capable of measuring changes in the current flowing to the motor 53. As desired, current sensor 92 is configured to monitor the current supplied to the motor 53 via circuit 91. The measurement signal from sensor 92 is transmitted to controller 400 via circuit 90. As desired, pinch protection circuit 90 may be a closed-loop or open-loop system. As will be appreciated, when the reciprocating member is advanced by the drive motor 53 and encounters an obstruction, the current supplied to the motor (via circuit 91) generally increases in proportion to the level of resistance to the reciprocating member's movement provided by the obstruction. "Excessive" current is detected by sensor 92, and the information is relayed to controller 400 via circuit 90. Sensor 92 may be capable of transmitting raw or unprocessed sensor data to controller 400. The controller can be programmed (such as with a suitable algorithm) to process the data from the sensors to identify from noise when excessive current (of sufficient level and duration to indicate an obstruction) is being supplied to the motor 53. The controller 400 has an automatic reversal routine 402 (see Figure 1A), wherein, upon detecting an excess current (and therefore an obstruction to the movement of the reciprocating member), the controller sends a command signal to the motor 53, thereby stopping the previously commanded operation and reversing the motor direction. Consequently, the rotation of the lead screw 57 that effects the movement of the reciprocating member 52 is also reversed, thereby causing the reciprocating member's movement to reverse and move away from the obstruction. The reciprocating member may be reversed by a predetermined distance established by information from the encoder 53E. In an alternative embodiment, the current sensor 92 may be programmable to select a desired setpoint for detecting excess current. In this case, the current sensor may send an appropriate signal to the controller upon detecting an excess current having a level and duration exceeding the programmed setpoint. Upon receiving the signal from the current sensor, the controller accesses an automatic reversal program 402 in the controller's memory. This provides a superior obstruction detection and recovery system at a lower cost than conventional systems employing deflectable (i.e., compressible) rods.

[0045] Now refer to it again Figure 2 , the load port module in the illustrated aspect may have a transport container advance detection system 110 ( Figure 2 (schematically depicted in ). Container advancement detection system 110 is a non-contact system that detects features of a container T mounted to and advanced by the shuttle 52 and stops the shuttle so that, when the container is in the docked position, the front face of the container is in a desired, repeatable position, regardless of tolerance variations between different containers. It is desirable to stop the loadport shuttle's advancing motion so that a minimum gap exists between the container and the loadport frame 29 without actual contact. Because container sizes vary (especially between manufactures), conventional systems typically adjust shuttle movement for a "worst-case scenario," allowing for excessive clearance in most situations. The container advancement detection system 110 of loadport module 24 overcomes the issues of conventional systems, allowing different containers to be stopped while the front face at L1 provides minimum clearance. In this aspect, detection system 110 has a "through-beam" sensor configuration, having an emitter or source that radiates energy and a detector for detecting the energy radiated from the emitter. For example, in this aspect, the detection system 110 may have a light source 112, such as an LED or laser diode at the end of an optical fiber connected to a suitable remote light source. The system 110 may also have a suitable light sensing portion 114, such as a photoelectric cell for sensing a light beam from the source 112. Figure 2 As seen in FIG, the light source 112 and sensor 114 are positioned on opposite sides of the shuttle 52 and at a desired height so that a container T mounted to and transported by the shuttle 52 will interrupt the light beam B emitted by the source 112 and illuminating at least the sensing portion of the sensor 114. Although not shown in FIG. Figure 21 , but the light source 112 and sensor 114 may be housed in a suitable cover to provide contact and particle protection and to prevent objects other than containers transported by the shuttle 52 from inadvertently interrupting the light beam. Figure 2 As seen in FIG. 1 , sensors 112, 114 are arranged along the direction of travel of the reciprocating member (as indicated by Figure 2 The controller 400 (indicated by arrow M in the figure) is positioned at a certain offset distance so that when the container T is brought to the docking position by the shuttle, the light beam B is separated from the position L1 of the front face of the container by a desired distance d. As can be appreciated, when the light beam B is at the distance d from the docking position L1, the front face of the container T advancing through the shuttle interrupts the light beam. The controller 400 is programmed with the distance d. The controller 400 also uses an algorithm ( Figure 1A The algorithm uses the shuttle movement information (such as that available from the motor encoder 53E (see also Figure 4D ) and distance d, which are provided to the controller by the shuttle movement information, determine when to stop the shuttle's forward movement so that the front face of the container T on the shuttle is at position L1. Therefore, when the front face of the advancing container T interrupts the light beam B, the sensor 114 sends an appropriate signal to the controller 400, notifying the controller of the detection of the container's front face. As described above, the controller 400 can then determine when to command the shuttle's forward movement to stop and send the command to the shuttle drive section 54 at the appropriate time. In this way, each container T transported by the shuttle is properly positioned in its docked position so that the container's front face is at position L1, regardless of any dimensional variations between containers.

[0046] like Figure 1A As shown in FIG, with the container T in the docked position, the door T4 of the container can be engaged by the door 30D of the loadport module access port 30P. Figure 6A Schematically illustrated is a door T4 in the front face of a container T. The door T4 may include a latch system T40, T42 that holds the door T4 in the container box when engaged. An example of a latch system for a container door is disclosed in U.S. Patent No. 5,772,386, issued on June 30, 1998 and incorporated herein by reference in its entirety. The door latch system T40, T42 may include a pivotable hub T44 to which a latch protrusion T46 may be hingedly linked. Rotation of the hub T44 causes actuation of the latch protrusion T46 to engage and disengage the container housing. The latch hub T44 is accessible through a latch key access hole T50 in the door T4. The container door T4 may also have a latch key. Figure 6A The locator pin hole T52 is shown in the figure. Figure 2The access port door 30D of the loadport module has a locator pin 120 and a latch key 122 configured to complement or mate with the locator pin hole T52 and latch key access hole T50 in the container's door T4. The locator pin 120 and latch key 122 in the port door 30D may be similar to those described in U.S. Patent No. 5,772,386 (previously incorporated herein by reference). The latch key 122 of the port door 30D conforms to the shape of the key access hole T50 in the container door and the key hole in the hub T44 of the latch system. When the port door 30D engages the container door T4, the latch key 122 on the access door 30D passes through the key access hole T50 and enters the key hole formed in the hub T44 of the container. Rotation of the latch key 122 causes rotation of the hub T44 and actuation of the latch system to engage or disengage the latch protrusion, thereby locking or unlocking the container door T4 from the container. The latch key 122 is rotatably mounted in the access door structure and operates in a manner substantially similar to that described in US Patent Application No. 8,821,099, the disclosure of which is incorporated herein by reference in its entirety.

[0047] Now refer to Figure 7A and Figure 7B , shows a schematic front view of a substrate processing apparatus or tool 1002 and a container(s) T connected thereto according to another exemplary embodiment. Figure 7A In the exemplary embodiment shown in FIG, the processing device 1002 is substantially similar to Figure 1A 、 Figure 1B and Figure 1C . The processing tool 1002 may generally have a processing section 1006 and an EFEM 1004 (for purposes of explanation only, reference will be made to the convention where wafers may be considered to be loaded into the tool from the front). In an exemplary embodiment, the processing section 1006 and the EFEM 1004 may share a common controlled environment or atmosphere (e.g., inert gas (N2), (Ar), or very clean dry air). The processing section 1006 is shown schematically and may include one or more processing sections or modules ( Figure 7A The arrangement shown in FIG is merely exemplary, and the EFEM and process section module(s) may be connected to one another in any desired arrangement in alternative embodiments. The process section(s) or module(s) 1006 may be isolated from the EFEM 1004, such as with a closable opening (e.g., a gate valve). Thus, the process section may also be provided with a process atmosphere that is different from the EFEM atmosphere. In alternative embodiments, the process section 1006 may include a load lock that allows the process modules to have dissimilar atmospheres or to maintain vacuum connection to the EFEM, as will be further described below.

[0048] Figure 7AThe EFEM 1004 in the exemplary embodiment shown in FIG. 1 may be similar to the EFEMs described above, except where otherwise noted. The EFEM 1004 may include appropriate environmental controls to maintain a desired controlled environment or atmosphere within the EFEM as substrates are transported to and from the processing section 1006. For example, the EFEM 1004 may include a controller 31000 (which may be substantially similar to the controller 400 described above); one or more fluid control valves 31010 and 31020; a pressure relief valve or check valve 31030; and sensors such as, for example, a pressure sensor 31040, a contamination sensor 31041, and a temperature sensor 31042. The controller may be configured to adjust or regulate properties of the controlled environment 31050 within the EFEM (and processing section 1006), such as temperature, pressure, and rate. For example, the controller 31000 may receive signals from the pressure sensor 31040, the temperature sensor 31042, and the environmental contamination sensor 31041. Depending on the environmental information in those signals, the controller can release or increase the pressure within the EFEM, increase or decrease the air flow 31050 within the EFEM by actuating the appropriate valves 31010, 31030. The controller 31000 can also be configured to increase or decrease the temperature of the gas within the EFEM (e.g., by adjusting the coolant flow through the radiator 31060) based on the temperature reading provided by the temperature sensor 31042. As can be appreciated, although the Figure 7A and Figure 7B Controller 31000 and associated valves and sensors are described, but controller 31000 can be used to control the environment(s) of other embodiments disclosed herein.

[0049] The EFEM 1004 may include a substrate transport device or robot 1004R capable of holding and transporting substrates (as will be appreciated, the robot may be of any desired type). Similar to the situation described above, the EFEM 1004 may include a loadport 24 (as described herein) for interfacing one or more containers T with the tool 1002 and allowing substrates to be loaded into and unloaded from the tool 1002. The loadport 24 of the EFEM 1004 and the corresponding complementary interface portion of the container T (as described herein) may be configured to enable loading and unloading of substrates between the container and the EFEM without degrading the controlled environment within the EFEM 1004 and the processing section 1006. The EFEM loadport 24 and the complementary interface portion of the container T (which may be collectively referred to as a container-to-EFEM interface) may be arranged so that the container T interfaced to the EFEM is integrated into the tool. For example, the container(s) T so integrated via the load port 24 may define chamber(s) that share the same controlled atmosphere as the EFEM and are therefore capable of maintaining substrates in the same controlled atmosphere as the EFEM such that the substrates may be transported directly from the container T to a processing section or processing module by the EFEM transport robot 1004R. Similar to the aspects of the present disclosure previously described, Figure 7A The container-to-EFEM interface in the exemplary embodiment shown in defines what may be referred to as a clean tunnel from within the container chamber through the interface into the EFEM and through the processing section (having substantially the same cleanliness as that through the EFEM and processing section). The clean tunnel can be closed (such as when removing container(s) from the load port) and can be opened freely without degrading the clean tunnel. Figure 7A In the aspects shown in , the container to EFEM interface may also be arranged to enable direct integration of the container T with the tool (substantially as described above) independent of the container environment preceding the interface in a manner substantially similar to that described in U.S. Patent No. 9,105,673, entitled “SideOpening Unified Pod,” issued August 11, 2015, the disclosure of which is incorporated herein by reference in its entirety. Figure 7AIn the aspect illustrated in FIG, container(s) T can be interfaced with and directly integrated into processing tools having different or dissimilar environments (e.g., clean air to inert gas environment, or clean air to vacuum), and then directly transported between tools having different or dissimilar environments and again interfaced and integrated with those tools, as will be further described below. Thus, substrate(s) at one tool having a controlled environment can be directly transferred from a processing section (similar to processing section 1006) through a clean tunnel using EFEM robot 1004R to container(s) T, which can then be directly transported and interfaced with the EFEM of another tool (similar to EFEM 1004), potentially having a dissimilar / different controlled environment, and directly transferred to the processing section using the EFEM robot through the clean tunnel now defined in the other tool, without degrading the controlled environment in the other processing tool. In effect, the combination of the container-to-EFEM interface and the container can be considered to define an external load lock or container load lock.

[0050] Still refer to Figure 7A ,exist Figure 7A In the illustrated aspects, for illustrative purposes, the loadport 24 is shown as interfacing with one container T; however, in alternative embodiments, the loadport can be arranged to interface with any desired number of containers. For example, in alternative aspects, the loadport can have a generally stacked configuration that enables interfacing with several containers in a stacked arrangement, similar to the configuration described in U.S. Patent No. 9,105,673, the disclosure of which has been previously incorporated herein by reference in its entirety. According to the present disclosure, the loadport 24 can have a vacuum source 1010V that can be communicatively connected to the container(s) T held on the loadport to pump down the containers, for example, to clean molecular contaminants from the container interior and substrates therein while the containers are on the loadport. Conversely, the containers can be arranged in any suitable manner to communicatively interface with the vacuum source 1010V at the loadport and withstand the air pressure in the container casement when the containers are evacuated to a vacuum, such as described in U.S. Patent No. 9,105,673.

[0051] The vessel T may have suitable passages and openings or ports 776 (which may be vacuum ports, purge gas ports, or these ports may be common to both the vacuum gas source and the purge gas source) such that when the vessel is connected or coupled to the loading port 24, the loading port's vacuum source 1010V is automatically coupled to the vessel housing and communicates with the vessel interior. As described herein, coupling of the vessel T to the vacuum source 1010V and / or actuation of the vacuum source 1010V when coupled to the vessel T may cause a corrosive gas outflow 910, 920, 930 (e.g., at the coupling and / or through the door seal of the vessel T) from the vessel T. Figure 9 ). Figure 7A The location of the port 776 shown in FIG is merely exemplary, and in alternative embodiments, the vacuum port may be positioned as desired. As can be appreciated, the container seal (see, e.g., FIG. Figure 9 The door seal 940 in the embodiment has the desired integrity to withstand the vacuum across the seal.

[0052] like Figure 7A As seen in the illustrated exemplary embodiment, the container T may also be configured to be communicatively connected to a gas feed, such as an exhaust or purge gas source. Figure 7A In the exemplary embodiment shown in , when a container T is placed on a container support of a loading port 24, the container can be communicatively connected to a gas source / feed 1010G. As can be appreciated, the container T can have a suitable inlet port 776 (plug and suitable gas passages connected to the interior of the container) to couple (e.g., automatically) to a nozzle of the gas feed 1010G, such as when the container is placed on the loading port support surface. As described herein, coupling of the container T to the gas source 1010G and / or actuation of the gas source 1010G when coupled to the container T can cause a corrosive gas outflow 910, 920, 930 (e.g., at the coupling and / or through the door seal of the container T) from the container T. Figure 9 ). Figure 7AThe arrangement of the gas source interface between the loading port and the container shown in FIG is merely exemplary, and in alternative embodiments, the gas source interface between the container and the loading port may have any other desired location and configuration. As previously described, the gas source 1010G may be capable of providing, for example, purge gas and / or exhaust gas to the container positioned on or at the loading port 24. For example, with the container T appropriately positioned (e.g., from an overhead transport) at the loading port 24 and a gas feed nozzle connected to the container to feed gas into the container shell, a purge gas (e.g., N 2 ) may be fed into the container if desired (depending on the internal atmosphere of the container when it is positioned at the loading port and the environment maintained in the EFEM). Thus, if the container, for example, contains a certain processing atmosphere (e.g., from an interface with a previous tool) and the EFEM 1004 can maintain an inert gas or very clean air atmosphere that may be dissimilar to the container atmosphere, then when the container is positioned at the loadport, a desired purge gas can be fed into the container (e.g., via gas feed 1010G) to purge the container atmosphere so that the container can be interfaced with the loadport opening and integrated into the tool 1002, as previously described. Furthermore, in the event that the container atmosphere is deemed incompatible with the EFEM environment or may present undesirable contaminants to the EFEM environment, when the container is positioned at the loadport (but, for example, before the container interior is vented to the EFEM environment), the container interior can be evacuated to a sufficient vacuum via vacuum source 1010V and filled with an inert gas (e.g., N2, very clean air) similar to the environment in the EFEM to purge potential contaminants from the container T and allow the container T to be integrated into the tool, as previously described. As can be appreciated, one or more of the ports 776 can be coupled to a vacuum source 1010V, and one or more other ports 776 can be coupled to a purge gas source 1010G to enable purging of the container T.

[0053] As described above, in addition to or in lieu of vacuum source 1010V, purge gas feedthrough 1010G can operate actuator 5000 in a manner substantially similar to that described above. Information regarding the container atmosphere can be recorded on an RFID (radio frequency identification) tag or other suitable data storage device that can be read (or otherwise accessed) by a suitable reader at or near the loadport 24 where the container is loaded. Thus, appropriate information regarding the container interior can be obtained by the tool controller, reviewed using the desired protocol, and, if necessary, evacuated and vented when the container is positioned at the loadport 24, as previously described. For example, when the container is docked to the loadport, or at any other suitable time, information regarding the container atmosphere can be recorded, for example, on a storage device onboard the container. If desired, such information can also be tracked by controllers throughout the FAB. As will be appreciated, container T can also be connected to an EFEM interface that may not have vacuum and gas feedthrough connections. In an alternative embodiment, the container may include an internal or onboard purge gas source (such as that described in U.S. Patent No. 9,105,673) to enable purging of the container when it is positioned at the load port. As will be appreciated, in other aspects, the load port interface to which the container interface is connected may be provided with a vacuum connection without a gas feed, such that gas is provided from, for example, a gas source onboard the container. Thus, as will be appreciated, the container can now be used as a substrate cleaning chamber for a tool that stores substrates at the tool so they are being cleaned. As will be appreciated, container evacuation / exhaust may also be performed prior to removing the container T from the load port 24, such as when relocating the container T to another tool.

[0054] As mentioned earlier, Figure 7A The arrangement of the load port and container-to-tool interface shown in FIG is merely exemplary, and in other aspects, the interface may have any other desired configuration. For example, the gas feed may be positioned as needed to exhaust gas from the EFEM environment into the container after the container interior has been evacuated.

[0055] refer to Figure 9-11 As described above, placing a container T on the loading port 24 (or removing a container T from the loading port 24) may cause corrosive gas outflows 910, 920 from the container T at, for example, the purge / exhaust port couplings 10000-10005, wherein the purge / exhaust port couplings 10000-10005 are generally coupled to ports 776 on the container T (e.g., predetermined access locations, it should also be noted that the container door 30D to container T interface 983 may also be considered a predetermined access location). The corrosive gas outflow 930 may also be at the door seal 940 ( Figure 9) at / from the door seal, such as if the door seal 940 is worn or the interior of the container T is over-pressurized. For example, there may be a slit or small opening 999 between the shuttle 52 and the shelf 50 that may allow fluid access to, for example, the printed circuit board (PCB) 74 ( Figure 5 ), (multiple) linear bearings 283 ( Figure 3 ), motor (see for example motor 53 ( Figure 4D )), sensors (see sensors T12-T20 ( Figure 4B )、Sensor 68O( Figure 5 )、switch 68( Figure 5 )、Sensor 92( Figure 4C ))、(multiple) harnesses 72 ( Figure 4D ), (multiple) detection systems 110 ( Figure 2 ) and / or other suitable components of the loading port 24. According to aspects of the present disclosure, and as described herein, at least one continuous steady-state pressure differential plenum 960-963 (also referred to as continuous steady-state fluid mass flow plenum region(s)) can substantially prevent the corrosive gas effluent from passing through the slit 999 and substantially prevent the corrosive gas from contacting, for example, suitable components of the loading port 24, including, but not limited to, the printed circuit board (PCB) 74 ( Figure 5 ), (multiple) linear bearings 283 ( Figure 3 ), motor (see for example motor 53 ( Figure 4D )), sensors (see sensors T12-T20 ( Figure 4B )、Sensor 68O( Figure 5 )、switch 68( Figure 5 )、Sensor 92( Figure 4C ))、(multiple) harnesses 72 ( Figure 4D ), (multiple) detection systems 110 ( Figure 2 ) and / or other suitable components of the loading port 24 in the vicinity of the container T disposed on the loading port 24. As also described above, the at least one continuous steady-state pressure differential booster chamber region 960-963 can alleviate the costs, modifications, manufacturing complexity, and manufacturing lead time associated with coatings applied to the loading port components. In one aspect, the controller 400 is configured to control the fluid mass flow of the continuous steady-state pressure differential booster chamber region 960-963 depending on the configuration of the container T held by the loading port 24. For example, the controller 400 can adjust the fluid mass flow in any suitable manner to expand or reduce the area covered by the continuous steady-state pressure differential booster chamber region 960-963 (e.g., changing the position of the fluid flow boundary) so that the covered area encompasses the purge ports 601-604 ( Figure 6B) configuration (e.g., where the purge port configuration may vary from container to container and / or from container manufacturer to container).

[0056] As described above, the load port module 24 includes a frame 29 adapted to connect the load port module 24 to a substrate processing apparatus (such as the substrate processing apparatus described above). A transport container holding area 28 is connected to the frame 29 for holding at least one substrate cassette container T adjacent to the access port / transport opening 30P of the load port module 24. The transport container holding area 28 is configured to allow access to and from the sealed interior atmosphere 977 of the at least one substrate cassette container T at a predetermined access location (e.g., such as port 776) of the at least one substrate cassette container T. The transport container holding area 28 has (a plurality of) predetermined continuous steady-state pressure differential plenum areas (see FIG. 1 ). Figure 9 、 Figure 10A and Figure 10B The different pressure boost chamber areas 960, 961, 962, 963, 966, 967, and Figure 9 、 Figure 10B and Figure 11 The predetermined continuous steady-state pressure differential plenum region 963 is disposed on the transport container holding area 28, external to the EFEM and external to the load port opening 30P (e.g., external to the BOLTS interface between the load port module 24 and the EFEM 12).

[0057] The predetermined continuous steady-state pressure differential plenum region(s) are at least partially defined by boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B of the fluid flow that generates the pressure differential, such that the predetermined continuous steady-state pressure differential plenum region(s) define a continuous steady-state fluid flow isolation barrier 968 (also referred to as a continuous steady-state fluid flow isolation barrier) disposed on the transport container holding area 28 between a predetermined access location (e.g., port 776) of the at least one substrate cassette container T and another predetermined section of the transport container holding area 28 that isolates another predetermined section from the predetermined access location (e.g., a section / portion of the load port module 24 that may be susceptible to corrosion). In one aspect, the continuous steady state fluid flow isolation barrier 968 that creates the continuous steady state pressure differential plenum region(s) provides a predetermined offset from other predetermined sections of the cartridge support (such as support 36) or loading port 24 that are isolated by the continuous steady state fluid flow isolation barrier 968, and the predetermined offset is set by the fluid flow that creates the pressure differential of the continuous steady state pressure differential plenum region(s). For example, also refer to Figure 10B, the continuous steady-state fluid flow isolation barrier 968 includes continuous steady-state differential pressure plenum regions 962, 967 having respective boundaries 967B, 962B. In this example, another predetermined section of the cartridge support or shuttle 52 may be an orifice 10099 for forcibly coupling the container T to the shuttle's coupling feature 60. A motor, printed circuit board, or the like to be protected from the effects of corrosive gases may be positioned below the orifice 10099 and may be accessible through the orifice. The fluid mass flow of the respective continuous steady-state differential pressure plenum regions 962, 967 may be controlled such that the barriers 967B, 962B are offset a distance 10098 from the orifice 10099 to substantially prevent corrosive gas outflow from entering the orifice 10099. In one aspect, the fluid edges of the fluid flow of the continuous steady-state fluid flow isolation barrier 968 (e.g., such as boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B) seal the other predetermined sections from the predetermined access locations. In one aspect, the fluid edges of the fluid flow of the continuous steady-state fluid flow isolation barrier seal the other predetermined sections to prevent exhaust gas (e.g., corrosive gas effluent 910, 920, 930) from escaping the sealed interior atmosphere of the at least one substrate cassette container T at the predetermined access locations.

[0058] refer to Figure 9-11According to aspects of the present disclosure, the loadport module 24 includes one or more plenum ports 10010-10016 configured to generate or otherwise form a fluid flow that at least partially defines the boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B of a predetermined continuous steady-state pressure differential plenum region. The one or more plenum ports 10010-10016 are separate and distinct from the vessel T vacuum purge ports 10000-10005 of the loadport module 24. While the one or more plenum ports 10010-10016 are illustrated as being substantially circular or substantially rectangular, in other aspects, the one or more plenum ports can be elongated slits that circumscribe or are otherwise positioned adjacent predetermined features of the loadport 24 (such as those described herein) to form fluid walls that implement the boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B described herein. The one or more plenum ports 10010-10016 are positioned proximate predetermined sections / regions of the exterior of the loadport module 24 adjacent to a loadport module 24 feature (e.g., such as those described above) that have predetermined characteristics that render the feature susceptible to corrosion (e.g., from a corrosive gas effluent) to substantially prevent the corrosive gas effluent from interfacing with or otherwise contacting the loadport module 24 feature. In other aspects, reference is also made to Figure 12 and Figure 13In one embodiment, one or more plenum ports 10017, 10018 (substantially similar to plenum ports 10010-10016) can be disposed between the shuttle 52 and the support 50 such that one or more continuous steady-state pressure differential plenum regions 970, 971 (substantially similar to the other continuous steady-state pressure differential plenum region(s) described herein) are at least partially disposed between the shuttle 52 and the support 50 such that boundaries 970B, 971B of the continuous steady-state pressure differential plenum region(s) 970, 971 substantially prevent corrosive gas effluents from reaching any suitable components (e.g., motors, printed circuit boards, etc., as described herein). In still other aspects, the plenum ports can be disposed at any suitable location on the loadport to form any suitable number of continuous steady-state pressure differential plenum regions, thereby substantially protecting the loadport components from corrosive gas effluents with corresponding continuous steady-state fluid flow isolation barriers. Depending on whether the one or more plenum ports 10010-10018 are positive pressure ports or negative pressure (e.g., vacuum) pressure ports, the one or more plenum ports 10010-10018 can be positioned above or below the load port feature to provide (multiple) continuous steady-state pressure differential plenum regions around the load port.

[0059] The one or more plenum ports 10010-10018 are configured to form one or more of the boundaries 960B, 961B, 962B, 963B, 966B, 967B, 970B, 971B, while the other boundaries 964, 965 may be formed by structures of the load port 24 (such as the surface 52S of the shuttle 52). Figure 10A )) and / or substrate cassette container T, wherein the continuous steady-state pressure differential boosting chamber region(s) are bounded on at least one side by a surface of the cassette support structure of the load port 24, which surface at least partially defines the continuous steady-state pressure differential boosting chamber region(s). In one aspect, the surface 52S can guide the flow of fluid that creates the pressure differential of the continuous steady-state pressure differential boosting chamber region(s). In one aspect, the surface 52S can include vanes 52V ( Figure 10A ) or other fluid flow control features that direct the fluid flow of the pressure differential of the continuous steady-state pressure differential plenum region(s). In one aspect, each plenum port 10010-10018 is configured to create a corresponding predetermined continuous steady-state pressure differential plenum region that circumscribes or otherwise surrounds the corresponding plenum port 10010-10018 and at least a portion of the associated predetermined access location (e.g., the corresponding vacuum / purge port 10000-10005 and the container / door interface 983).

[0060] If you can Figure 9 and Figure 10A As seen in (note, for clarity, not in Figure 10A 1B ). Booster ports 10010, 10013 are configured to create respective predetermined differential pressure plenums 966, 961 having respective boundaries 966B, 961B. Booster ports 10002, 10012 are configured to create respective predetermined differential pressure plenums 967, 962 having respective boundaries 967B, 962B. As can be appreciated, the bottom surface of the vessel T and the exterior surface of the shuttle 52 can also form boundaries 964, 965 of the respective differential pressure plenums 966, 961, 967, 962. These differential pressure plenums can substantially contain the corrosive gas outflow from the associated vacuum / purge port 776 of the vessel T, which is substantially coupled to the respective vacuum / purge ports 10000-10005 of the loadport module 24.

[0061] If you can Figure 9 、 Figure 10B and Figure 11 As seen in FIG. 1 , one or more of the plenum ports 10014-10018 are configured to create a respective pressure differential plenum 963 having a respective boundary 963B. As can be appreciated, at least a portion of the boundary 963B can be formed by the shuttle 52 and / or an exterior surface of the vessel T. The pressure differential plenum can be sized to substantially contain pressure from the vessel / door interface 983 and the load port door 30D to the load port frame 29 interface 276 (see FIG. Figure 2 ) to one or more of the following: 1. The differential plenum port 10014 can be disposed on the loadport module 24 shelf 50, and the differential plenum ports 10015, 10016 can be disposed on the side of the shuttle 52 facing the loadport opening 30P, such that the differential plenum 963 extends from the loadport door 30D to the loadport frame 29 interface 276 to the container / door interface 983; while in other aspects, the differential plenum ports 10015, 10016 on the shuttle 52 and the differential plenum port 10014 on the shelf 50 can provide separate and distinct differential plenums (e.g., when the shuttle 52 is disposed in the container T loading position), wherein these separate and distinct differential plenums merge when the shuttle is disposed in the container T docking position (e.g., wherein the container substrate aisle opening through which substrates enter and exit the container is paired with the loadport opening 30P). In this aspect, at least some of the differential plenum ports may be stationary relative to the shuttle 52 reference frame (e.g., they are mounted to the shuttle), while other differential plenum ports are stationary or fixed relative to the loadport module 24 frame 29 (e.g., where the shuttle and / or the portion to be protected from the corrosive gas moves relative to the frame 29).

[0062] In one aspect, the size of the respective differential pressure plenums 966, 961, 967, 962, 963, 970, 971 can be increased or decreased by adjusting the mass flow rate of fluid moving into (e.g., vacuum / suction pressure plenums) or out of (e.g., positive pressure plenums) the respective plenum ports 10010-10018. Figure 9 The respective pressure differential boost chambers 966, 961, 967, 962, 963 may be sized such that one or more of these respective pressure differential boost chambers may be merged with another of these pressure differential boost chambers. Figure 9 As illustrated in FIG, differential plenums 961, 966, 962, 967 may be combined to form a combined differential plenum 960 that extends across substantially the entire bottom of the vessel T. In still other aspects, differential plenum 963 may also be combined with differential plenum 960 such that the differential plenum also extends to cover the vessel door 30D / vessel T interface 983 (and / or load port door / frame interface 276- Figure 2 In other aspects, the differential plenums 966, 961, 967, 962, 963 can be sized such that any suitable number of differential plenums can be combined into a common differential plenum.

[0063] Still refer to Figure 9-11 As described above, the continuous steady-state fluid flow isolation barrier 968 formed by the predetermined continuous steady-state pressure differential plenum area(s) 960, 961, 962, 963, 966, 967 may be a positive pressure continuous steady-state fluid flow isolation barrier. For example, the pressure differential ΔP (see Figure 9 In another aspect, the pressure differential ΔP is a positive pressure relative to the pressure (e.g., partial pressure) of the escaping gas (e.g., corrosive gas effluent 910, 920, 930) from the sealed interior atmosphere of the at least one substrate cassette container T at a predetermined access location (e.g., port 776). Also refer to Figure 13, wherein the continuous steady-state fluid flow isolation barrier 968 formed by the predetermined continuous steady-state differential pressure plenum region(s) 960, 961, 962, 963, 966, 967 is a positive pressure continuous steady-state fluid flow isolation barrier, and clean dry air from any suitable clean dry air source 13000 is provided to one or more of the differential pressure plenum ports 10010-10018 in any suitable manner (e.g., such as through a suitable conduit 13010). Any suitable pressure sensor may be provided on the loadport module 24 to monitor the clean dry air emanating from the one or more of the differential pressure plenum ports 10010-10018. Clean dry air can be provided substantially continuously (e.g., when the container is docked with the shuttle 52, when the container T is coupled to the loading port opening 30P, when the container is decoupled from the loading port opening 30P, and when the container T is decoupled from the shuttle 52) so that the positive pressure continuous steady-state fluid flow isolation barrier substantially prevents corrosive gases from at least the container T from entering the area of ​​the loading port module 24 around which the continuous steady-state fluid flow isolation barrier(s) 968 are provided.

[0064] Still refer to Figure 9-11 As described above, the continuous steady-state fluid flow isolation barrier 968 formed by the predetermined continuous steady-state pressure differential plenum area(s) 960, 961, 962, 963, 966, 967 may be a negative pressure continuous steady-state fluid flow isolation barrier. For example, the pressure differential ΔP (see Figure 9 In one embodiment, the pressure differential ΔP is negative relative to the atmosphere (e.g., the external area surrounding the container T and the loadport module 24). In another aspect, the pressure differential ΔP is negative relative to the pressure (e.g., partial pressure) of the escaping gas (e.g., corrosive gas effluent 910, 920, 930) from the sealed internal atmosphere of the at least one substrate cassette container T at a predetermined access point (e.g., port 776). A negative pressure continuous steady-state fluid flow isolation barrier may be employed in conjunction with or in place of a positive pressure continuous steady-state fluid flow isolation barrier. Similarly, a positive pressure continuous steady-state fluid flow isolation barrier may be employed without a negative pressure continuous steady-state fluid flow isolation barrier.

[0065] In one aspect, reference is also made to Figure 12, wherein the continuous steady-state fluid flow isolation barrier 968 formed by the predetermined continuous steady-state differential pressure plenum region(s) 960, 961, 962, 963, 966, 967 is a negative pressure continuous steady-state fluid flow isolation barrier, vacuum / suction from any suitable remote (e.g., remote from the loadport shuttle 52 and shuttle support 50) vacuum / suction source 12000 (e.g., such as a pump, fan, vacuum, etc.) is provided to one or more of the differential pressure plenum ports 10010-10016 in any suitable manner (e.g., such as through a suitable conduit 12010). In another aspect, reference is also made to Figure 13 , wherein the continuous steady-state fluid flow isolation barrier 968 formed by (multiple) predetermined continuous steady-state pressure differential boost chamber regions 960, 961, 962, 963, 966, 967 is a negative pressure continuous steady-state fluid flow isolation barrier, and vacuum / suction from any suitable local (e.g., disposed on the reciprocating member 52 and / or the reciprocating member support 50) vacuum / suction source 12001 (e.g., such as a pump (e.g., an acoustic air pump, a piezoelectric pump, a diaphragm pump, etc.), a fan, etc.) is provided to one or more of the pressure differential boost chamber ports 10010-10018 in any suitable manner (e.g., such as through a suitable conduit 12010). While the partial vacuum / suction source 12001 is illustrated as coupled to the shuttle 52 so as to move with the shuttle 52, it should be understood that the vacuum / suction source 12001 may be coupled to the shuttle support 50 in a similar manner (such as, for example, to provide suction to the differential plenum port 10014) so ​​as to be stationary with the shuttle support 50. The drawn corrosive gases evacuated by the continuous steady-state differential plenum region(s) 960, 961, 962, 963, 966, 967 predetermined by the negative pressure may be exhausted away from the loadport module 24 at any suitable location. Where the vacuum / suction source 12001 is localised to the shuttle 52 and / or shuttle support 50, any suitable fluid directing path 13012 (e.g., a channel, hose, blade, passageway, etc.) may be formed in or through the shuttle 52 and / or shuttle support to output / exhaust any corrosive gas effluent 910, 920, 930 that may escape from the sealed environment of the container T.

[0066] refer to Figure 7A 、 Figure 8A 、 Figure 9 and Figure 10A , an exemplary docking process between the container T and the loading port 24 will be described. For example, the container T is transported to the loading port 24 ( Figure 8A , block 800 ) and optionally clamped to a load port ( Figure 8A, block 805), such as with the container gripping system 61 described above. Upon arrival of the container T, the predetermined continuous steady-state pressure differential plenum region(s) 960, 961, 962, 963, 966, 967 are active such that when the container T is coupled to the shuttle 52, a continuous steady-state fluid flow isolation barrier 968 is formed. In this aspect, the vacuum purge ports 10000-10005 of the loading port 24 can be automatically coupled to the port 776 of the container T. As described above, coupling of the container T to the gas source 1010G and / or vacuum source 1010V (and / or actuation of the gas source 1010G and / or vacuum source 1010V when coupled to the container T) may cause corrosive gas outflow 910, 920, 930 from the container T, such as at the coupling between ports 10000-10005 and port 776 and / or through the door seal 940 of the container T (see Figure 9 ). In the event that the differential pressure plenum space or region is active (or effective), the corrosive gas outflows 910, 920, 930 can be substantially contained / confined and / or evacuated. For example, as described above, the continuous steady-state fluid flow isolation barrier 968 can substantially contain (e.g., in the case of a vacuum barrier) or substantially prevent any corrosive gas outflows 910, 920, 930 from the sealed environment of the vessel T (occurring when ports 10000-10005 are coupled to port 776) from entering (in the case of a positive pressure barrier) into the region of the loading port that is protected from corrosive gases by the fluid isolation barrier 968 (such as the region described above).

[0067] The load port 24 shuttle 52 advances the container T to the container / load port interface 750, wherein the container / load port interface 750 is a BOLTS interface ( Figure 8A , block 810). Before or during advancement of the container T to the container / load port interface 750, the container T may be vented and / or purged, as described above. In one aspect, the load port door may also include a vacuum that may be activated during advancement of the container T to remove any particulate matter from the surface of the container T during interfacing of the container T with the load port 24.

[0068] The load port 24 shuttle 52 presses the container T against the container / load port interface 276 ( Figure 2 ) to connect the container T to the loading port 24 ( Figure 8A , block 815). Container door T4 ( Figure 6A ) is clamped to the load port door 30D as described herein ( Figure 8A, block 820). The predetermined continuous steady state pressure differential plenum region(s) 960, 961, 962, 963, 966, 967 may remain in effect such that a continuous steady state fluid flow isolation barrier 968 exists in the region at least partially occupied by or otherwise underlying the vessel door T4 to port door 30D interface. Vessel door T4 begins to retract ( Figure 8A , block 835). As the container door T4 begins to retract, the seal between the container T and the container door T4 may relax and corrosive gases from the interior of the container T may escape from the container. The predetermined continuous steady-state differential pressure plenum region(s) 960, 961, 962, 963, 966, 967 (such as differential pressure plenum region 963) may substantially contain (e.g., in the case of a vacuum barrier) or substantially prevent ingress (in the case of a positive pressure barrier) of any corrosive gas effluent 910, 920, 930 from the sealed environment of the container T (that occurs when the container door T4 is retracted from the container T). The container door T4 is separated from the container T ( Figure 8A , box 845) and is lowered into the door storage area 770 ( Figure 7A )middle( Figure 8A , block 850). In alternative aspects, the container T may be registered / docked to the loadport 24 in any suitable manner.

[0069] refer to Figure 7A 、 Figure 8B 、 Figure 9 and Figure 10A , an exemplary undocking process between the container T and the load port 24 will be described. The container door T4 rises from the door storage area 770 ( Figure 8B , box 855) and proceeds toward container T ( Figure 8A , block 860). The container door T4 begins to seal with the container ( Figure 8B , block 865), and further advancement of the container door T4 seals the container door T4 with the container T ( Figure 8B , block 870). When the container door begins to seal and seal with the container T, gas from the interior of the container T can either pass through the door seal 940 ( Figure 9 ) and / or are displaced from the container through the interface between the port 776 of the container T and the ports 10000-10005 of the loading port 24. The predetermined continuous steady-state pressure differential plenum region(s) 960, 961, 962, 963, 966, 967 can substantially contain (e.g., in the case of a vacuum barrier) or substantially prevent ingress (in the case of a positive pressure barrier) of any corrosive gas effluent 910, 920, 930 from the container T (which occurs when the container door T4 is sealed with the container T).

[0070] Release the container door T4 from, for example, the load port door 30D ( Figure 8B , block 875 ), and releases the container T from the container to the load port opening interface 276 ( Figure 2 The container T is withdrawn from the interface 276 by the movement of the reciprocating member 52 ( Figure 8A , block 885). In some aspects, the container T is released from the shuttle 85 of the load port 24 ( Figure 8B , block 890). The container T leaves the load port 24 ( Figure 8B , block 985). Decoupling of the vessel T from the gas source 1010G and / or vacuum source 1010V may result in corrosive gas outflow 910, 920, 930 from the vessel T, such as at the couplings between ports 10000-10005 (see Figure 9 ). With the differential pressure plenum space or region active (or effective), the corrosive gas outflows 910, 920, 930 can be substantially contained / confined and / or evacuated. For example, as described above, the continuous steady-state fluid flow isolation barrier 968 can substantially contain (e.g., in the case of a vacuum barrier) or substantially prevent any corrosive gas outflows 910, 920, 930 from the sealed environment of the vessel T (which occur when ports 10000-10005 are decoupled from 776) from entering (in the case of a positive pressure barrier) the region of the loading port that is protected from the corrosive gas by the fluid isolation barrier 968 (such as the region described above). In alternative aspects, the vessel T can be de-registered / undocked from the loading port 24 in any suitable manner.

[0071] refer to Figure 7A 、 Figure 8B 、 Figure 9 、 Figure 10A and Figure 14 , an exemplary method 1400 will be described. The method 1400 includes: providing a substrate loading device frame 29 ( Figure 14 , block 1401). The frame 29 is adapted to connect the substrate loading device to the substrate processing apparatus 10, and the frame 29 has a transport opening 30P through which the substrate is transported between the substrate loading device and the processing apparatus 10. A cassette support 28 ( Figure 14, block 1402) and the cassette support is connected to the frame 29 for holding at least one substrate cassette container T proximate to the transport opening 30P, the cassette support 28 being configured such that a sealed internal atmosphere 977 of the at least one substrate cassette container T enters and exits the cassette support 28 at a predetermined access location 776 of the at least one substrate cassette container T. The method further includes defining a continuous steady-state fluid flow isolation barrier 968 with predetermined continuous steady-state pressure differential plenum regions 960-963, the continuous steady-state fluid flow isolation barrier 968 being disposed on the cassette support 28 between the predetermined access location 776 of the at least one substrate cassette container T and another predetermined section of the cassette support 28 that isolates the predetermined access location 776 from the other predetermined section. Figure 14 , block 1403), wherein the cartridge support 28 has predetermined continuous steady state pressure differential plenum areas 960-963 disposed on the cartridge support 28, and the predetermined continuous steady state pressure differential plenum areas 960-963 are at least partially defined by boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B of the fluid flow that creates the pressure differential.

[0072] refer to Figure 7A 、 Figure 8B 、 Figure 9 、 Figure 10A and Figure 15 , an exemplary method 1500 will be described. The method 1500 includes: providing a substrate loading device frame 29 ( Figure 15 , block 1501), the frame is adapted to connect the device to the substrate processing equipment 10, the frame 29 having a transport opening 30P through which the substrate is transported between the device and the processing equipment. A cassette support 28 ( Figure 15 , block 1502 ) and the cassette support is connected to the frame 29 for holding at least one substrate cassette container T proximate the transport opening 30P, the support 28 being configured such that a sealed interior atmosphere 977 of the container T enters and exits the support 28 at a predetermined access location 776 of the container T. The method further includes providing a continuous steady-state isolation barrier 968 defining a fluid flow with a continuous steady-state fluid mass flow plenum region, the continuous steady-state isolation barrier 968 being disposed on the support 28 between the predetermined access location 776 of the container T and another predetermined section of the cassette support 28 that isolates another predetermined section from the predetermined access location 776. Figure 15 , box 1503), wherein the box support 28 has a predetermined continuous steady fluid mass flow booster chamber area set on the support 28, and the predetermined continuous steady fluid mass flow booster chamber area is at least partially determined by the boundaries 960B, 961B, 962B, 963B, 964, 965, 966B, 967B of the fluid mass flow.

[0073] According to one or more aspects of the present disclosure, a substrate loading apparatus is provided. The substrate loading apparatus includes: a frame adapted to connect the substrate loading apparatus to a substrate processing device, the frame having a transport opening through which substrates are transported between the substrate loading apparatus and the processing device; a cassette support connected to the frame for holding at least one substrate cassette container proximate to the transport opening, the cassette support being configured to allow a sealed internal atmosphere of the at least one substrate cassette container to enter and exit the cassette support at a predetermined access location of the at least one substrate cassette container; and the cassette support having a predetermined continuous steady-state pressure differential plenum region disposed thereon, the predetermined continuous steady-state pressure differential plenum region being at least partially defined by a boundary of a fluid flow generating a pressure differential, such that the predetermined continuous steady-state pressure differential plenum region defines a continuous steady-state fluid flow isolation barrier, the continuous steady-state fluid flow isolation barrier being disposed on the container support between the predetermined access location of the at least one substrate cassette container and another predetermined section of the cassette support that isolates another predetermined section from the predetermined access location.

[0074] According to one or more aspects of the present disclosure, the fluid edge of the fluid flow of the continuous steady-state fluid flow isolation barrier seals the other predetermined section from the predetermined access location.

[0075] According to one or more aspects of the present disclosure, the fluid edges of the fluid flow of the continuous steady-state fluid flow isolation barrier seal the other predetermined sections to prevent exhaust gas from escaping from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

[0076] According to one or more aspects of the present disclosure, the pressure difference is a positive pressure relative to the atmosphere.

[0077] According to one or more aspects of the present disclosure, the pressure differential is a positive pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0078] According to one or more aspects of the present disclosure, the pressure difference is a negative pressure relative to the atmosphere.

[0079] According to one or more aspects of the present disclosure, the pressure differential is a negative pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access position.

[0080] According to one or more aspects of the present disclosure, the predetermined continuous steady state pressure differential plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state pressure differential plenum area.

[0081] According to one or more aspects of the present disclosure, the surface is a guiding surface for the fluid flow generating the pressure differential for the predetermined continuous steady-state pressure differential plenum area.

[0082] According to one or more aspects of the present disclosure, the continuous steady-state fluid flow isolation barrier of the continuous steady-state pressure differential plenum region is generated to provide a predetermined offset from the other predetermined section of the cartridge support that is isolated by the continuous steady-state fluid flow isolation barrier, and the predetermined offset is set by the fluid flow of the continuous steady-state pressure differential plenum region that generates the pressure differential.

[0083] According to one or more aspects of the present disclosure, the substrate loading apparatus includes a controller that controls the predetermined continuous steady-state pressure differential plenum area depending on a configuration of the at least one substrate cassette container.

[0084] According to one or more aspects of the present disclosure, a substrate loading apparatus includes: a frame adapted to connect the apparatus to a substrate processing device, the frame having a transport opening through which substrates are transported between the apparatus and the processing device; a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support being configured to allow a sealed internal atmosphere of the container to enter and exit the support at a predetermined access location of the container; and the cassette support having a predetermined continuous steady-state fluid mass flow plenum region disposed on the support, the predetermined continuous steady-state fluid mass flow plenum region being at least partially defined by a boundary of a fluid mass flow such that the continuous steady-state fluid mass flow plenum region defines a continuous steady-state isolation barrier for fluid flow, the continuous steady-state isolation barrier for fluid flow being disposed on the support between the predetermined access location of the container and another predetermined section of the cassette support that isolates another predetermined section from the predetermined access location.

[0085] According to one or more aspects of the present disclosure, the fluid edge of the fluid flow of the continuous steady-state isolation barrier of the fluid flow seals the other predetermined section from the predetermined access location.

[0086] According to one or more aspects of the present disclosure, the fluid edges of the fluid flow of the continuous steady-state isolation barrier of fluid flow seal the other predetermined sections to prevent exhaust gas from escaping from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

[0087] According to one or more aspects of the present disclosure, the pressure difference is a positive pressure relative to the atmosphere.

[0088] According to one or more aspects of the present disclosure, the fluid mass flow has a positive pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0089] According to one or more aspects of the present disclosure, the fluid mass flow has a negative pressure relative to the atmosphere.

[0090] According to one or more aspects of the present disclosure, the fluid mass flow has a negative pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0091] According to one or more aspects of the present disclosure, the predetermined continuous steady state fluid mass flow plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state fluid mass flow plenum area.

[0092] According to one or more aspects of the present disclosure, the surface is a guiding surface for the fluid mass flow of the predetermined continuous steady-state fluid mass flow plenum region.

[0093] According to one or more aspects of the present disclosure, a continuous steady-state isolation barrier for the fluid flow in the continuous steady-state fluid mass flow booster chamber region is generated to provide a predetermined offset from the other predetermined section of the box support that is isolated by the continuous steady-state isolation barrier for the fluid flow, and the predetermined offset is set by the fluid mass flow in the continuous steady-state fluid mass flow booster chamber region.

[0094] According to one or more aspects of the present disclosure, the substrate loading apparatus includes a controller that controls the predetermined continuous steady-state pressure differential plenum area depending on a configuration of the at least one substrate cassette container.

[0095] According to one or more aspects of the present disclosure, a method is provided, comprising: providing a frame for a substrate loading device, the frame being adapted to connect the substrate loading device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the substrate loading device and the processing apparatus; providing a cassette support connected to the frame for holding at least one substrate cassette container proximate to the transport opening, the cassette support being configured to allow a sealed internal atmosphere of the at least one substrate cassette container to enter and exit the cassette support at a predetermined access location of the at least one substrate cassette container; and defining a continuous steady-state fluid flow isolation barrier with a predetermined continuous steady-state pressure differential plenum region disposed on the carrier support between the predetermined access location of the at least one substrate cassette container and another predetermined section of the cassette support that isolates another predetermined section from the predetermined access location, wherein the cassette support has the predetermined continuous steady-state pressure differential plenum region disposed thereon, and the predetermined continuous steady-state pressure differential plenum region is at least partially defined by a boundary of a fluid flow that generates a pressure differential.

[0096] According to one or more aspects of the present disclosure, it further includes: sealing the other predetermined section from the predetermined access location using a fluid edge of the fluid flow of the continuous steady-state fluid flow isolation barrier.

[0097] According to one or more aspects of the present disclosure, it further includes: sealing the other predetermined sections with fluid edges of the fluid flow of the continuous steady-state fluid flow isolation barrier to prevent exhaust gas from escaping from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0098] According to one or more aspects of the present disclosure, the pressure difference is a positive pressure relative to the atmosphere.

[0099] According to one or more aspects of the present disclosure, the pressure differential is a positive pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0100] According to one or more aspects of the present disclosure, the pressure difference is a negative pressure relative to the atmosphere.

[0101] According to one or more aspects of the present disclosure, the pressure differential is a negative pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access position.

[0102] According to one or more aspects of the present disclosure, the predetermined continuous steady state pressure differential plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state pressure differential plenum area.

[0103] According to one or more aspects of the present disclosure, the surface is a guiding surface for the fluid flow generating the pressure differential for the predetermined continuous steady-state pressure differential plenum area.

[0104] According to one or more aspects of the present disclosure, the continuous steady-state fluid flow isolation barrier of the continuous steady-state pressure differential plenum region is generated to provide a predetermined offset from the other predetermined section of the cartridge support that is isolated by the continuous steady-state fluid flow isolation barrier, and the predetermined offset is set by the fluid flow of the continuous steady-state pressure differential plenum region that generates the pressure differential.

[0105] According to one or more aspects of the present disclosure, it further includes controlling the predetermined continuous steady-state pressure differential plenum area with a controller depending on the configuration of the at least one substrate cassette container.

[0106] According to one or more aspects of the present disclosure, a method is provided. The method includes providing a frame for a substrate loading apparatus, the frame being adapted to connect the apparatus to a substrate processing device, the frame having a transport opening through which substrates are transported between the apparatus and the processing device; providing a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support being configured to allow a sealed internal atmosphere of the container to enter and exit the support at a predetermined access location of the container; and defining a continuous steady-state isolation barrier for fluid flow with a continuous steady-state fluid mass flow plenum region, the continuous steady-state isolation barrier for fluid flow being disposed on the support between the predetermined access location of the container and another predetermined section of the cassette support that isolates another predetermined section from the predetermined access location, wherein the cassette support has the predetermined continuous steady-state fluid mass flow plenum region disposed on the support, and the predetermined continuous steady-state fluid mass flow plenum region is at least partially defined by a boundary of the fluid mass flow.

[0107] According to one or more aspects of the present disclosure, it further comprises: sealing the other predetermined section from the predetermined access location using a fluid edge of the fluid flow of the continuous stable isolation barrier of the fluid flow.

[0108] According to one or more aspects of the present disclosure, it further includes: sealing the other predetermined sections with fluid edges of the fluid flow of the continuous stable isolation barrier of the fluid flow to prevent exhaust gas from escaping from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0109] According to one or more aspects of the present disclosure, the pressure difference is a positive pressure relative to the atmosphere.

[0110] According to one or more aspects of the present disclosure, the fluid mass flow has a positive pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0111] According to one or more aspects of the present disclosure, the fluid mass flow has a negative pressure relative to the atmosphere.

[0112] According to one or more aspects of the present disclosure, the fluid mass flow has a negative pressure relative to a pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

[0113] According to one or more aspects of the present disclosure, the predetermined continuous steady state fluid mass flow plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state fluid mass flow plenum area.

[0114] According to one or more aspects of the present disclosure, the surface is a guiding surface for the fluid mass flow of the predetermined continuous steady-state fluid mass flow plenum region.

[0115] According to one or more aspects of the present disclosure, a continuous steady-state isolation barrier for the fluid flow in the continuous steady-state fluid mass flow booster chamber region is generated to provide a predetermined offset from the other predetermined section of the box support that is isolated by the continuous steady-state isolation barrier for the fluid flow, and the predetermined offset is set by the fluid mass flow in the continuous steady-state fluid mass flow booster chamber region.

[0116] According to one or more aspects of the present disclosure, it further includes controlling the predetermined continuous steady-state pressure differential plenum area with a controller depending on the configuration of the at least one substrate cassette container.

[0117] It should be understood that the foregoing description merely illustrates various aspects of the present disclosure. Without departing from the various aspects of the present disclosure, those skilled in the art may devise various alternatives and modifications. Therefore, the various aspects of the present disclosure are intended to encompass all such alternatives, modifications, and variations that fall within the scope of any appended claims. Furthermore, the fact that different features are recited in mutually different dependent or independent claims does not indicate that a combination of these features cannot be used to advantage, and such a combination remains within the scope of the various aspects of the present disclosure.

Claims

1. A substrate loading device, comprising: a frame adapted to connect the substrate loading device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the substrate loading device and the processing apparatus; a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the cassette support being configured to allow the sealed interior atmosphere of the at least one substrate cassette container to enter and exit the cassette support at a predetermined entry and exit position of the at least one substrate cassette container; and The cassette support has a predetermined continuous steady-state pressure differential plenum area disposed thereon, the predetermined continuous steady-state pressure differential plenum area being at least partially defined by a boundary of a fluid flow that generates a pressure differential, such that the predetermined continuous steady-state pressure differential plenum area defines a continuous steady-state fluid flow isolation barrier disposed on the cassette support between the predetermined access location of the at least one substrate cassette container and another predetermined section of the cassette support that isolates another predetermined section from the predetermined access location.

2. The substrate loading device according to claim 1, wherein: The fluid edge of the fluid flow of the continuous steady-state fluid flow isolation barrier seals the other predetermined section from the predetermined access location.

3. The substrate loading device according to claim 1, wherein: The fluid edge of the fluid flow of the continuous steady-state fluid flow isolation barrier seals the other predetermined section to prevent exhaust gas from escaping from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

4. The substrate loading device according to claim 1, wherein: The pressure difference is a positive pressure relative to the atmosphere.

5. The substrate loading device according to claim 1, wherein: The pressure differential is a positive pressure relative to the pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

6. The substrate loading device according to claim 1, wherein: The pressure difference is a negative pressure relative to the atmosphere.

7. The substrate loading device according to claim 1, wherein: The pressure differential is a negative pressure relative to the pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

8. The substrate loading device according to claim 1, wherein: The predetermined continuous steady state pressure differential plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state pressure differential plenum area.

9. The substrate loading device according to claim 8, wherein: The surface is a guiding surface for the fluid flow generating the pressure differential for the predetermined continuous steady state pressure differential plenum area.

10. The substrate loading device according to claim 1, wherein The continuous steady state fluid flow isolation barrier of the continuous steady state pressure differential plenum region is provided to provide a predetermined offset from the other predetermined section of the cartridge support isolated by the continuous steady state fluid flow isolation barrier, and the predetermined offset is set by the fluid flow of the continuous steady state pressure differential plenum region that creates the pressure differential.

11. The substrate loading device according to claim 1, wherein: The substrate loading apparatus includes a controller that controls the predetermined continuous steady state pressure differential plenum area depending on a configuration of the at least one substrate cassette container.

12. A substrate loading device comprising: a frame adapted to connect the apparatus to a substrate processing device, the frame having a transport opening through which substrates are transported between the apparatus and the processing device; a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the cassette support being configured to allow entry and exit of a sealed interior atmosphere of the container from the cassette support at a predetermined entry and exit location of the container; and The box support has a predetermined continuous steady-state fluid mass flow booster chamber area arranged on the box support, and the predetermined continuous steady-state fluid mass flow booster chamber area is at least partially determined by the boundary of the fluid mass flow, so that the continuous steady-state fluid mass flow booster chamber area defines a continuous steady-state isolation barrier for the fluid flow, and the continuous steady-state isolation barrier for the fluid flow is arranged on the box support between the predetermined access position of the container and another predetermined section of the box support that isolates other predetermined sections from the predetermined access position.

13. The substrate loading device according to claim 12, wherein: The fluid edge of the fluid flow of the continuous steady-state isolation barrier of fluid flow seals the other predetermined section from the predetermined access location.

14. The substrate loading device according to claim 12, wherein: The fluid edges of the fluid flow of the continuous steady-state isolation barrier of fluid flow seal the other predetermined sections to prevent exhaust gas from escaping from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

15. The substrate loading device according to claim 12, wherein: The fluid mass flow is at a positive pressure relative to the atmosphere.

16. The substrate loading device according to claim 12, wherein: The fluid mass flow has a positive pressure relative to a pressure of escaping gas from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

17. The substrate loading device according to claim 12, wherein: The fluid mass flow has a negative pressure relative to the atmosphere.

18. The substrate loading device according to claim 12, wherein: The fluid mass flow has a negative pressure relative to a pressure of escaping gas from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

19. The substrate loading device according to claim 12, wherein: The predetermined continuous steady state fluid mass flow plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state fluid mass flow plenum area.

20. The substrate loading device according to claim 19, wherein The surface is a guiding surface for the fluid mass flow of the predetermined continuous steady-state fluid mass flow plenum region.

21. The substrate loading device according to claim 12, wherein: A continuous steady-state isolation barrier for the fluid flow in the continuous steady-state fluid mass flow booster chamber region is generated to provide a predetermined offset from the other predetermined section of the box support that is isolated by the continuous steady-state isolation barrier for the fluid flow, and the predetermined offset is set by the fluid mass flow in the continuous steady-state fluid mass flow booster chamber region.

22. The substrate loading device according to claim 12, wherein: The substrate loading apparatus includes a controller that controls the predetermined continuous steady state pressure differential plenum area depending on a configuration of the at least one substrate cassette container.

23. A method comprising: providing a frame for the substrate loading device, the frame being adapted to connect the substrate loading device to a substrate processing apparatus, the frame having a transport opening through which substrates are transported between the substrate loading device and the processing apparatus; providing a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the cassette support being configured to allow the sealed interior atmosphere of the at least one substrate cassette container to enter and exit the cassette support at a predetermined entry and exit position of the at least one substrate cassette container; as well as A continuous steady-state fluid flow isolation barrier is defined by a predetermined continuous steady-state pressure differential plenum area, the continuous steady-state fluid flow isolation barrier being disposed on the cassette support between the predetermined access location of the at least one substrate cassette container and another predetermined section of the cassette support isolating another predetermined section from the predetermined access location, wherein the cassette support has the predetermined continuous steady-state pressure differential plenum area disposed thereon, and the predetermined continuous steady-state pressure differential plenum area is at least partially defined by a boundary of a fluid flow generating a pressure differential.

24. The method of claim 23, further comprising: The other predetermined section is sealed from the predetermined access location by a fluid edge of the fluid flow of the continuous steady-state fluid flow isolation barrier.

25. The method of claim 23, further comprising: The other predetermined sections are sealed with fluid edges of the fluid flow of the continuous steady-state fluid flow isolation barrier to prevent exhaust gas from escaping from the sealed interior atmosphere of the at least one substrate cassette container at the predetermined access location.

26. The method according to claim 23, wherein The pressure difference is a positive pressure relative to the atmosphere.

27. The method according to claim 23, wherein The pressure differential is a positive pressure relative to the pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

28. The method according to claim 23, wherein The pressure difference is a negative pressure relative to the atmosphere.

29. The method according to claim 23, wherein The pressure differential is a negative pressure relative to the pressure of escaping gas from the sealed internal atmosphere of the at least one substrate cassette container at the predetermined access location.

30. The method of claim 23, wherein: The predetermined continuous steady state pressure differential plenum area is bounded on at least one side by a surface of the cartridge support that at least partially defines the predetermined continuous steady state pressure differential plenum area.

31. The method according to claim 30, wherein The surface is a guiding surface for the fluid flow generating the pressure differential for the predetermined continuous steady state pressure differential plenum area.

32. The method of claim 23, wherein: The continuous steady state fluid flow isolation barrier of the continuous steady state pressure differential plenum region is provided to provide a predetermined offset from the other predetermined section of the cartridge support isolated by the continuous steady state fluid flow isolation barrier, and the predetermined offset is set by the fluid flow of the continuous steady state pressure differential plenum region that creates the pressure differential.

33. The method of claim 23, further comprising: The predetermined continuous steady state pressure differential plenum area is controlled by a controller depending on the configuration of the at least one substrate cassette container.

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