Polishing machine with cleaning device and use method thereof

Abstract

The present application discloses a polishing machine with a cleaning device, the polishing machine includes an upper polishing disc and a lower polishing disc that correspond to each other and can rotate, the cleaning device includes a cleaning column that is arranged on the polishing machine and is a hollow structure, a nozzle assembly is arranged along the circumference of the cleaning column, the nozzle assembly is connected to the cleaning column, and the spray direction of the nozzle assembly is toward the polishing disc to be cleaned. The present application discloses a polishing machine with a cleaning device, which can clean each upper polishing disc at the same time, solving the problems of time-consuming, labor-intensive, and incomplete cleaning when manually brushing the upper polishing disc. The present application also discloses a method for using a polishing machine with a cleaning device, the cleaning process of which is controlled by a cleaning program, the cleaning device automatically starts cleaning after the cleaning program is started, and automatically stops cleaning after the cleaning is completed, and the equipment does not need to be supervised by personnel during the cleaning period, saving time and labor.

Description

Technical Field

[0001] The present application relates to the technical field of polishing machine devices, and in particular to a polishing machine with a cleaning device and a method for using the same. Background Art

[0002] Polishing machines are often used for mechanical polishing and waxing. The working principle is: the motor drives the upper and lower polishing discs installed in the polishing machine to rotate at high speed. Due to the combined effect of the polishing disc and the polishing agent and the friction with the surface to be polished, the paint surface pollution, oxide layer, and shallow marks can be removed. The speed of the polishing disc is generally 1500-3000r / min, most of which are stepless speed change, and can be adjusted at any time according to needs during construction.

[0003] In the actual process of polishing workpieces, on the one hand, the polishing disc is prone to produce debris during the polishing process, causing pollution to the surrounding environment. Some debris will even adhere to the polishing disc, resulting in poor polishing effect and difficult to clean. On the other hand, polishing agents are generally used during polishing, and polishing agents are easy to adhere to the polishing disc. If they are not cleaned in time, they will contaminate the workpiece that needs to be polished next time.

[0004] The existing solution for cleaning the polishing disc is manual brushing: use a brush to brush the polishing disc, use a knife to remove crystals between the gaps of the polishing disc to ensure that there is no crystal and no dirt; then use a water gun to rinse the polishing disc, touch and visually check the disc surface to ensure that there are no debris, crystals, hard objects, and rust. This method has a low degree of automation control, is time-consuming and labor-intensive, and there are dead corners in brushing and incomplete cleaning, which leads to poor polishing quality. Summary of the invention

[0005] The present application provides a polishing machine with a cleaning device and a method for using the same, so as to solve the problems of time-consuming, labor-intensive and incomplete cleaning when manually brushing an upper polishing disc.

[0006] The technical solutions adopted in this application are as follows:

[0007] A polishing machine with a cleaning device, the polishing machine includes an upper polishing disc and a lower polishing disc corresponding to each other and both rotatable, and includes a cleaning column with a hollow structure arranged on the polishing machine, a nozzle assembly is arranged along the circumference of the cleaning column, the nozzle assembly is connected to the cleaning column, and the spray direction of the nozzle assembly is toward the polishing disc to be cleaned.

[0008] Furthermore, the cleaning column is arranged on the lower polishing plate, and the spraying direction of the nozzle assembly is toward the upper polishing plate.

[0009] Furthermore, the nozzles in each of the nozzle assemblies are distributed along the axial direction of the cleaning column.

[0010] Further, along the direction close to the lower polishing plate, the nozzles in the nozzle assembly are sequentially a first nozzle, a second nozzle, a third nozzle and a fourth nozzle;

[0011] A first circular area, a second circular area, a third circular area and a fourth circular area are sequentially extended outward from the center of the upper polishing plate, and adjacent areas are partially overlapped.

[0012] The spraying direction of the first nozzle is toward the third annular area of ​​the upper polishing plate;

[0013] The spraying direction of the second nozzle is toward the second annular area of ​​the upper polishing plate;

[0014] The spraying direction of the third nozzle is toward the first circular area of ​​the upper polishing plate;

[0015] The spraying direction of the fourth nozzle is toward the fourth annular area of ​​the upper polishing plate.

[0016] Furthermore, the angle between the first nozzle and the cleaning column is 10-80°; the angle between the second nozzle and the cleaning column is 10-80°; the angle between the third nozzle and the cleaning column is 10-80°; and the angle between the fourth nozzle and the cleaning column is 10-80°.

[0017] Furthermore, a valve is provided at one end of the cleaning column away from the lower polishing plate, and the valve and the polishing machine are electrically connected to a controller respectively, and the controller is used to control the opening and closing of the valve and the operation of the polishing machine.

[0018] Furthermore, a retaining ring is provided on the side surface of each upper polishing plate.

[0019] Furthermore, there is a gap between the connection portion between the cleaning column and the lower polishing plate, and the cleaning fluid fills the cleaning column and then flows to the lower polishing plate through the gap.

[0020] On the other hand, the present application also provides a method for using a polishing machine having a cleaning device, the method comprising:

[0021] Raise the upper polishing plate of the polishing machine to the top;

[0022] Start the cleaning program through the controller to clean;

[0023] After cleaning, the polisher and valve will shut down automatically.

[0024] Further, the cleaning program is a program pre-set in the controller; the cleaning program includes any one or a combination of any two of the first cleaning stage, the second cleaning stage, the third cleaning stage and the fourth cleaning stage, and a fifth cleaning stage;

[0025] The first cleaning stage: open the valve, rotate the upper polishing disc clockwise at a speed of 10-20 rpm, and the cleaning time is 1-5 minutes;

[0026] The second cleaning stage: open the valve, rotate the upper polishing disc clockwise at a speed of 30-40 rpm, and the cleaning time is 1-5 minutes;

[0027] The third cleaning stage: open the valve, rotate the upper polishing disc counterclockwise at a speed of 10-20 rpm, and the cleaning time is 1-5 minutes;

[0028] The fourth cleaning stage: open the valve, rotate the upper polishing disc counterclockwise at a speed of 30-40 rpm, and the cleaning time is 1-5 minutes;

[0029] The fifth cleaning stage: close the valve, rotate the upper polishing disc counterclockwise at a speed of 5-10 rpm, and the cleaning time is 0.2-1 min.

[0030] The beneficial effects of adopting the technical solution of this application are as follows:

[0031] The present application provides a polishing machine with a cleaning device, which can clean each upper polishing disc at the same time, thereby solving the problems of time-consuming, labor-intensive and incomplete cleaning when manually brushing the upper polishing disc.

[0032] A method for using a polishing machine with a cleaning device is also provided. The cleaning device is controlled by a cleaning program during the cleaning process. Cleaning automatically starts after the cleaning program is started and automatically stops after cleaning is completed. During the cleaning period, the equipment does not require human supervision, which saves time and effort. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the technical solution of the present application, the drawings required for use in the embodiments are briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0034] Figure 1 A schematic diagram of the structure of a polishing machine with a cleaning device adopted in this embodiment;

[0035] Figure 2 A schematic diagram of the structure of the cleaning column provided in this embodiment;

[0036] Figure 3A top view of the cleaning column provided for this embodiment;

[0037] Figure 4 A front view of the cleaning column provided for this embodiment;

[0038] Figure 5 A schematic diagram of a polishing machine of a specific cleaning device provided in this embodiment during cleaning;

[0039] Figure 6 A schematic diagram of the area division of the upper polishing plate provided in this embodiment;

[0040] Figure 7 A flow chart of a cleaning method for a polishing machine of a specific cleaning device provided in this embodiment.

[0041] Illustration Description:

[0042] Among them, 1-upper polishing plate, 11-first upper polishing plate, 12-second upper polishing plate, 13-third upper polishing plate, 14-fourth upper polishing plate;

[0043] 2-Lower polishing disc;

[0044] 3-cleaning column, 31-first nozzle assembly, 32-second nozzle assembly, 33-third nozzle assembly, 34-fourth nozzle assembly, 35-water inlet;

[0045] 331-first nozzle, 332-second nozzle, 333-third nozzle, 334-fourth nozzle;

[0046] 131 - first circular area, 132 - second circular area, 133 - third circular area, 134 - fourth circular area;

[0047] 7- Retaining ring. DETAILED DESCRIPTION

[0048] See also Figure 1 , is a schematic structural diagram of a polishing machine with a cleaning device adopted in this embodiment; Figure 2 A schematic diagram of the structure of the cleaning column provided in this embodiment; Figure 3 A top view of the cleaning column provided for this embodiment; Figure 4 A front view of the cleaning column provided for this embodiment; Figure 5 A schematic diagram of a polishing machine of a specific cleaning device provided in this embodiment during cleaning; Figure 6 A schematic diagram of the area division of the upper polishing plate provided in this embodiment; Figure 7 A flow chart of a cleaning method for a polishing machine of a specific cleaning device provided in this embodiment.

[0049] The working principle of the polishing machine is that the motor drives the upper and lower polishing discs installed in the polishing machine to rotate at high speed, such as LED lining polishing machines for polishing LED linings, plane polishing machines for single-sided grinding or polishing of silicon wafers, sapphires, glass, mechanical seals, and aluminum alloys, stainless steel appearance parts, etc. The polishing machine is generally composed of a plurality of symmetrically arranged upper polishing discs 1 and a lower polishing disc 2, and the plane where the upper polishing disc 1 is located corresponds to the lower polishing disc 2 up and down.

[0050] The present application provides a polishing machine with a cleaning device, the cleaning device includes a cleaning column 3 with a hollow structure arranged on the polishing machine, a nozzle assembly is arranged along the circumference of the cleaning column 3, the nozzle assembly is connected with the cleaning column 3, and the spray direction of the nozzle assembly is toward the polishing disc to be cleaned. When the spray direction of the nozzle assembly is toward the upper polishing disc 1, the upper polishing disc 1 can be cleaned; when the spray direction of the nozzle assembly is toward the lower polishing disc 2, the lower polishing disc 2 can be cleaned. It is also possible to simultaneously set two groups of upper and lower nozzle assemblies on the cleaning column 3, with the upper nozzle assembly facing the upper polishing disc 1 and the lower nozzle assembly facing the lower polishing disc 2. Alternatively, the nozzle in the nozzle assembly is rotatably connected to the cleaning column 3, and the nozzle can be rotated according to actual conditions to adjust the spray direction of the nozzle assembly.

[0051] The cleaning column 3 provided in this embodiment is arranged on the lower polishing plate 2 , and the spraying direction of the nozzle assembly is toward the upper polishing plate 1 .

[0052] See also Figure 2 and Figure 3 A plurality of nozzle assemblies are arranged along the circumference of the cleaning column 3, and the number of nozzle assemblies is the same as the number of upper polishing discs 1; each nozzle assembly corresponds to each upper polishing disc 1. For example, when there are four upper polishing discs 1 in the polishing machine, there are also four groups of nozzle assemblies, and the spraying directions of the four groups of nozzle assemblies are respectively directed toward the corresponding upper polishing discs 1, so that each upper polishing disc 1 can be cleaned.

[0053] In this embodiment, the nozzles in each nozzle assembly are distributed along the axial direction of the cleaning column 3; and the distances between the nozzles are equal. Figure 4 and Figure 5 , Figure 5 The dotted lines in the figure represent the water columns sprayed from each nozzle during cleaning. In order to enable the nozzle assembly to clean the upper polishing plate 1 completely without dead angles, the nozzles in the nozzle assembly are the first nozzle 331, the second nozzle 332, the third nozzle 333 and the fourth nozzle 334 in the direction close to the lower polishing plate 2. Figure 6 The spraying areas of the first nozzle 331, the second nozzle 332, the third nozzle 333 and the fourth nozzle 334 correspond to the first circular area 131, the second annular area 132, the third annular area 133 and the fourth annular area 134 of the upper polishing plate 1 respectively, and there is partial overlap between adjacent areas.

[0054] Furthermore, the spraying direction of the first nozzle 331 is toward the third annular region 133 of the upper polishing plate 1, and the angle between the first nozzle 331 and the cleaning column 3 is 10-80°.

[0055] The spraying direction of the second nozzle 332 is toward the second annular region 132 of the upper polishing plate 1, and the included angle between the second nozzle 332 and the cleaning column 3 is 10-80°.

[0056] The spraying direction of the third nozzle 333 is toward the first circular area 131 of the upper polishing plate 1, and the included angle between the third nozzle 333 and the cleaning column 3 is 10-80 degrees.

[0057] In order to clean the side wall of the upper polishing disc 1, a retaining ring 7 is provided on the side of each upper polishing disc 1 in this embodiment. The spray direction of the fourth nozzle 334 is toward the fourth annular area 134 of the upper polishing disc 1. And the angle between the fourth nozzle 334 and the cleaning column 3 is 10-80°. Preferably, the retaining ring 7 is made of stainless steel. The diameter of each of the above nozzles is 0.5-10 mm. Preferably, the first circular area 131 is a circular area formed with the center of the polishing disk as the center and a diameter of 200 mm; the second circular area 132 is centered on the center of the polishing disk, the inner diameter of the second circular area 132 is 150 mm, and the outer diameter of the second circular area 132 is 350 mm; the third circular area 133 is centered on the center of the polishing disk, the inner diameter of the third circular area 133 is 300 mm, and the outer diameter of the third circular area 133 is 485 mm; the fourth circular area 134 is centered on the center of the polishing disk, the inner diameter of the fourth circular area 134 is 450 mm, and the outer diameter of the fourth circular area 134 is 485 mm.

[0058] The above embodiment can realize all-round cleaning of the upper polishing disc 1. In addition, this embodiment can also realize cleaning of the lower polishing disc 2. The cleaning column 3 is installed on the lower polishing disc 2. There is a gap between the connection part of the cleaning column 3 and the lower polishing disc 2. The cleaning fluid fills the cleaning column 3 and then flows to the lower polishing disc 2 through the gap. The side wall of the lower polishing disc 2 is provided with a water outlet to realize cleaning of the lower polishing disc 2.

[0059] Based on the above embodiments, water is introduced into the cleaning column 3, and the water is sprayed out through the nozzle of the cleaning column 3, so that the upper polishing disc 1 in the polishing machine can be cleaned in all aspects, and the nozzle of the cleaning column 3 is distributed along the circumference and axial direction of the cleaning column 3, and the nozzle is installed at an angle, which can ensure that there are no gaps in the area where the nozzle sprays water within a local range, and ensure that the entire upper polishing disc 1 can be completely covered and evenly rinsed when spraying water. At the same time, the water in the cleaning column 3 flows to the lower polishing disc 2 through the gap, thereby realizing the cleaning of the entire polishing disc.

[0060] In this embodiment, in order to realize automatic cleaning, a valve is provided at one end of the cleaning column 3 away from the lower polishing plate 2, and the valve is used to control the inflow and outflow of water. The valve and the polishing machine are electrically connected to the controller respectively, and the controller is used to control the opening and closing of the valve and the operation of the polishing machine. The controller is a PLC controller.

[0061] The present application also includes a method for using a polishing machine having a cleaning device, see Figure 7 ,include:

[0062] First, the upper polishing plate 1 of the polishing machine is raised to the top.

[0063] Then, the controller starts the cleaning program to clean the polishing disc through the cleaning device.

[0064] The cleaning program is a program pre-set in the controller. The cleaning program includes any one or a combination of any two of the first cleaning stage, the second cleaning stage, the third cleaning stage and the fourth cleaning stage, and the fifth cleaning stage.

[0065] First cleaning stage: open the valve, rotate the upper polishing disc 1 clockwise at a speed of 10-20 rpm, and the cleaning time is 1-5 minutes.

[0066] Second cleaning stage: open the valve, rotate the upper polishing disc 1 clockwise at a speed of 30-40 rpm, and the cleaning time is 1-5 minutes.

[0067] The third cleaning stage: open the valve, rotate the upper polishing disc 1 counterclockwise at a speed of 10-20 rpm, and the cleaning time is 1-5 minutes.

[0068] Fourth cleaning stage: open the valve, rotate the upper polishing disc 1 counterclockwise at a speed of 30-40 rpm, and the cleaning time is 1-5 minutes.

[0069] Fifth cleaning stage: close the valve, rotate the upper polishing disc 1 counterclockwise at a speed of 5-10 rpm, and the cleaning time is 0.2-1 min.

[0070] Preferably, the cleaning procedure in this embodiment is carried out in sequence according to the first cleaning stage, the second cleaning stage, the third cleaning stage, the fourth cleaning stage and the fifth cleaning stage, and the preferred rotation speed of the first cleaning stage in this embodiment is 15 rpm, and the preferred cleaning time is 1 min; the preferred rotation speed of the second cleaning stage in this embodiment is 35 rpm, and the preferred cleaning time is 1 min; the preferred rotation speed of the third cleaning stage in this embodiment is 15 rpm, and the preferred cleaning time is 1 min; the preferred rotation speed of the fourth cleaning stage in this embodiment is 35 rpm, and the preferred cleaning time is 1 min; the preferred rotation speed of the fifth cleaning stage in this embodiment is 5 rpm, and the preferred cleaning time is 0.2 min.

[0071] Finally, the cleaning is finished and the polishing machine automatically shuts down.

[0072] In this embodiment, see Figure 1 and Figure 5 The polishing machine has four upper polishing discs 1, namely the first upper polishing disc 11, the second upper polishing disc 12, the third upper polishing disc 13 and the fourth upper polishing disc 14, and a lower polishing disc 2. When the four upper polishing discs are arranged in pairs in a rectangular shape, the cleaning column 3 is set on the lower polishing disc 2 and opposite to the center of the rectangle, and the four groups of nozzle assemblies are distributed along the circumference of the central column, and the angle between adjacent nozzle assemblies is equal to the angle between the diagonals of the rectangle.

[0073] The four nozzle assemblies are respectively a first nozzle assembly 31, a second nozzle assembly 32, a third nozzle assembly 33 and a fourth nozzle assembly 34. The spray direction of the first nozzle assembly 31 corresponds to the first upper polishing disc 11, the spray direction of the second nozzle assembly 32 corresponds to the second upper polishing disc 12, the spray direction of the third nozzle assembly 33 corresponds to the third upper polishing disc 13, and the spray direction of the fourth nozzle assembly 34 corresponds to the fourth upper polishing disc 14.

[0074] Each group of nozzle assemblies has four nozzles. For example, the third nozzle assembly 33 includes four nozzles, namely, the first nozzle 331, the second nozzle 332, the third nozzle 333 and the fourth nozzle 334. The spray direction of the first nozzle 331 is toward the third annular area 133 of the third upper polishing disk 13; the spray direction of the second nozzle 332 is toward the second annular area 132 of the third upper polishing disk 13; the spray direction of the third nozzle 333 is toward the first circular area 131 of the third upper polishing disk 13; and the spray direction of the fourth nozzle 334 is toward the fourth annular area 134 of the third upper polishing disk 13.

[0075] First, raise the upper polishing disc 1 of the polishing machine to the top. Then the controller starts the cleaning program to clean the polishing disc through the cleaning device: the water valve is opened, and cleaning water is introduced from the water inlet 35 of the cleaning column 3, with a water pressure of 0.6KGf / cm 2 When the cleaning water fills the cavity of the cleaning column 3, the four nozzles of the first nozzle assembly 31 are aligned with the corresponding first upper polishing disc 11 for cleaning, and the four nozzles of the second nozzle assembly 32 are aligned with the second upper polishing disc 12 for cleaning, and the four nozzles of the third nozzle assembly 33 are aligned with the third upper polishing disc 13 for cleaning, and the four nozzles of the fourth nozzle assembly 34 are aligned with the fourth upper polishing disc 14 for cleaning.

[0076] During the cleaning process, the controller makes the four upper polishing discs rotate at a process speed of 5rmp-50rpm to ensure that the water column can clean the entire circular surface of the upper polishing disc, effectively solving the problem of cleaning dead corners; different rotation speeds will bring different flushing effects, so that the debris, crystals, hard objects, and rust on the lower surface of the upper polishing disc can be fully washed away; the entire cleaning process is controlled by the PLC program. After starting the cleaning mode, the cleaning water flow and the upper polishing disc will run according to the set process, and will automatically start cleaning and stop automatically after cleaning is completed. During the cleaning period, workers can perform other operations and the equipment does not need to be supervised by personnel.

[0077] Similar parts between the embodiments provided in this application can be referenced to each other. The specific implementation methods provided above are only a few examples under the general concept of this application and do not constitute a limitation on the protection scope of this application. For those skilled in the art, any other implementation methods expanded based on the scheme of this application without creative work belong to the protection scope of this application.

Claims

1. A polishing machine with a cleaning device, the polishing machine comprising an upper polishing disc and a lower polishing disc corresponding to each other and both rotatable, characterized in that: The cleaning device comprises a cleaning column which is arranged on the polishing machine and has a hollow structure, a nozzle assembly is arranged along the circumference of the cleaning column, the nozzle assembly is connected with the cleaning column, and the spray direction of the nozzle assembly is toward the polishing disc to be cleaned; the cleaning column is arranged on the lower polishing disc, and the spray direction of the nozzle assembly is toward the upper polishing disc; the nozzles in each nozzle assembly are distributed along the axial direction of the cleaning column; Along the direction close to the lower polishing plate, the nozzles in the nozzle assembly are the first nozzle, the second nozzle, the third nozzle and the fourth nozzle in sequence; A first circular area, a second circular area, a third circular area and a fourth circular area are sequentially arranged on the upper polishing plate extending outward from the center thereof, and adjacent areas partially overlap; The spraying direction of the first nozzle is toward the third annular area of ​​the upper polishing plate; The spraying direction of the second nozzle is toward the second annular area of ​​the upper polishing plate; The spraying direction of the third nozzle is toward the first circular area of ​​the upper polishing plate; The spraying direction of the fourth nozzle is toward the fourth annular area of ​​the upper polishing plate; A plurality of nozzle assemblies are arranged along the circumference of the cleaning column, and the number of the nozzle assemblies is the same as the number of the upper polishing discs; each nozzle assembly corresponds to each upper polishing disc one by one.

2. The polishing machine with a cleaning device according to claim 1, characterized in that: The angle between the first nozzle and the cleaning column is 10°-80°; the angle between the second nozzle and the cleaning column is 10°-80°; the angle between the third nozzle and the cleaning column is 10°-80°; the angle between the fourth nozzle and the cleaning column is 10°-80°.

3. The polishing machine with a cleaning device according to claim 1 or 2, characterized in that: A valve is provided at one end of the cleaning column away from the lower polishing plate. The valve and the polishing machine are electrically connected to a controller respectively. The controller is used to control the opening and closing of the valve and the operation of the polishing machine.

4. The polishing machine with a cleaning device according to claim 3, characterized in that: A retaining ring is sleeved on the side surface of each upper polishing disc.

5. The polishing machine with a cleaning device according to claim 3, characterized in that: There is a gap between the connection part of the cleaning column and the lower polishing plate, and the fluid used for cleaning fills the cleaning column and then flows to the lower polishing plate through the gap.

6. A method for using a polishing machine with a cleaning device, applied to the polishing machine with a cleaning device according to any one of claims 1 to 5, characterized in that: The method comprises: Raise the upper polishing plate of the polishing machine to the top; The controller starts the cleaning program to clean the polishing disc through the cleaning device; After cleaning, the polisher and valve will shut down automatically; The cleaning program is a program pre-set in the controller; the cleaning program includes any one or a combination of any two of the first cleaning stage, the second cleaning stage, the third cleaning stage and the fourth cleaning stage, and the fifth cleaning stage; The first cleaning stage: open the valve, rotate the upper polishing disc clockwise at a speed of 10rpm-20rpm, and the cleaning time is 1min-5min; The second cleaning stage: open the valve, the upper polishing disc rotates clockwise at a speed of 30rpm-40rpm, and the cleaning time is 1min-5min; The third cleaning stage: open the valve, rotate the upper polishing disc counterclockwise at a speed of 10rpm-20rpm, and the cleaning time is 1min-5min; The fourth cleaning stage: open the valve, rotate the upper polishing disc counterclockwise at a speed of 30 rpm-40 rpm, and the cleaning time is 1 min-5 min; The fifth cleaning stage: close the valve, rotate the upper polishing disc counterclockwise at a speed of 5rpm-10rpm, and the cleaning time is 0.2min-1min.

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