Cleaning system and method of use thereof

Abstract

The present disclosure relates to a cleaning system and a method for using the same. The present disclosure provides a cleaning system comprising a first subchamber, a second subchamber adjacent to the first subchamber, and a third subchamber adjacent to the second subchamber. A first partition is located between the first subchamber and the second subchamber. A second partition is located between the second subchamber and the third subchamber. A vacuum system is connected to the third subchamber to generate a vacuum pressure in the third subchamber that is less than the pressure of the first subchamber to create a pressure difference to cause a pressurized flow of a first cleaning agent from the first subchamber through an internal passage of a component located in the second subchamber to the third subchamber. A filtration system is connected to the first subchamber and the third subchamber to remove and filter the first cleaning agent from the third subchamber and return the first cleaning agent to the first subchamber.

Description

Technical Field

[0001] Aspects of the present disclosure relate to cleaning passageways of industrial equipment and interior passageways of parts and components that may be manufactured using the industrial equipment. Background Art

[0002] Various types of industrial equipment may be used to manufacture and assemble parts across multiple industries. Such industrial equipment may include engineered components having one or more internal passages. Similarly, parts manufactured or otherwise manufactured by the industrial equipment may also include one or more internal passages. The internal passages of various components and the parts manufactured and assembled using industrial equipment may accumulate accumulations of contaminants in their internal passages. Considering the location of the accumulation, it may be challenging to remove the accumulation in these internal passages. In addition, the cleaning methods used to remove the accumulation will leave residues that may harm the future use of the industrial equipment and various components. Therefore, there is still a need for an improved method of cleaning internal passages. Summary of the invention

[0003] The present disclosure provides a cleaning system. In one aspect, the cleaning system includes a cleaning chamber, the cleaning chamber including: a first subchamber, the first subchamber is configured to hold a first cleaning agent; a second subchamber, the second subchamber is adjacent to the first subchamber; and a first partition, the first partition is located between the first subchamber and the second subchamber, and a first hole is formed in the first partition. The cleaning chamber also includes: a third subchamber, the third subchamber is adjacent to the second subchamber, and is configured to receive the first cleaning agent; and a second partition, the second partition is located between the second subchamber and the third subchamber, and a second hole is formed in the second partition, and the first hole and the second hole are configured to form a fluid path through the second subchamber. The cleaning system also includes: a vacuum system, the vacuum system is connected to the third subchamber, the vacuum system is configured to generate a pressure in the third subchamber, the pressure is less than the pressure of the first subchamber, so as to cause a pressurized flow of the first cleaning agent from the first subchamber to the third subchamber; and a filtration system, the filtration system is connected to the first subchamber and the third subchamber, and the filtration system is configured to remove and filter the first cleaning agent from the third subchamber, and return the first cleaning agent to the first subchamber.

[0004] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further comprises: a first coupling mechanism removably coupled to the first partition via a first through-hole of a plurality of first through-holes; and a second coupling mechanism removably coupled to the second partition via a second through-hole of a plurality of second through-holes.

[0005] In one aspect, in combination with any of the above or below example cleaning systems, the cleaning system further comprises: a component located in the second subchamber, the component having: a first end of the component, the first end being removably coupled to the first coupling mechanism; a second end of the component, the second end being removably coupled to the second coupling mechanism; an outer surface; and an inner surface defining at least one internal channel extending from the first end of the component to the second end of the component.

[0006] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further comprises: each of the first coupling mechanism and the second coupling mechanism comprises at least one of a press-fit mechanism, a clamp, an adhesive, a magnetic chuck, or a combination thereof.

[0007] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further includes: a temperature controller coupled to the first subchamber, the temperature controller configured to adjust a temperature of the first subchamber.

[0008] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further includes: a first container coupled to the first subchamber, the first container having a first cleaning agent therein and configured to deliver the first cleaning agent to the first subchamber.

[0009] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further includes: a second container coupled to the second subchamber, the second container having a second cleaning agent and configured to deliver the second cleaning agent into the second subchamber.

[0010] The present disclosure provides a cleaning system. In one aspect, the cleaning system includes a plurality of cleaning chambers. Each of the plurality of cleaning chambers includes: a first subchamber, the first subchamber being configured to hold a first cleaning agent; an agitator, the agitator being connected to the first subchamber, the agitator being configured to start and maintain the rotation speed of the first cleaning agent; a second subchamber, the second subchamber being adjacent to the first subchamber; a first partition, the first partition being located between the first subchamber and the second subchamber, the first partition being formed with a plurality of first holes; a third subchamber, the third subchamber being adjacent to the second subchamber and being configured to receive the first cleaning agent; and a second partition, the second partition being located between the second subchamber and the third subchamber, the second partition being formed with a plurality of second holes, each of the plurality of first holes and each of the plurality of second holes being configured to form a fluid path through the second subchamber. The cleaning system further includes: a vacuum system coupled to the third subchamber of each of the plurality of cleaning chambers, the vacuum system being configured to generate a pressure in the third subchamber, the pressure of the third subchamber being less than the pressure of the first subchamber, so as to cause a pressurized flow of the first cleaning agent from the first subchamber to the third subchamber; and a filtration system coupled to the first subchamber and the third subchamber of each of the plurality of cleaning chambers, the filtration system being configured to remove and filter the first cleaning agent from the third subchamber of each cleaning chamber, and return the filtered first cleaning agent to the first subchamber of each cleaning chamber.

[0011] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further comprises: a first coupling mechanism removably coupled to the first divider via a first hole among a plurality of first holes; and a second coupling mechanism removably coupled to the second divider via a second hole among a plurality of second holes.

[0012] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further comprises: a component located in a second subchamber of at least one of the plurality of cleaning chambers. The component has: a first end of the component, the first end of the component being removably coupled to a first coupling mechanism; a second end of the component, the second end of the component being removably coupled to a second coupling mechanism; an outer surface; and an inner surface defining at least one internal channel extending from the first end of the component to the second end of the component.

[0013] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further includes: a first container coupled to the first subchamber of each cleaning chamber, the first container including a first cleaning agent and configured to deliver the first cleaning agent to the first subchamber.

[0014] In one aspect, in combination with any of the example cleaning systems above or below, the cleaning system further includes: a second container coupled to the second subchamber of each cleaning chamber, the second container including a second cleaning agent and configured to deliver the second cleaning agent to the second subchamber.

[0015] In one aspect, in conjunction with any of the example cleaning systems above or below, the cleaning system further includes: at least one pressure sensor coupled to the first subchamber, the second subchamber, or the third subchamber.

[0016] The present disclosure provides a method for using a cleaning system. In one aspect, the method for using a cleaning system includes: performing a cleaning program. The cleaning program includes: creating and starting a first pressure cycle of the cleaning program, a first cleaning agent is in a first subchamber of a cleaning chamber, and the first subchamber has a first pressure; during the first pressure cycle, starting a vacuum system, the vacuum system is connected to a third subchamber of the cleaning chamber to establish a second pressure in the third subchamber, the second pressure is less than the first pressure, the third subchamber is separated from the first subchamber by a second subchamber, the second subchamber has a component located in the second subchamber, the component has an outer surface and an inner surface, the inner surface defines at least one internal channel, and the component is removably connected to the first subchamber via a first coupling mechanism and removably connected to the third subchamber via a second coupling mechanism; during the first pressure cycle, in response to the second pressure being less than the first pressure, a first pressurized flow of the first cleaning agent from the first subchamber through at least one internal channel of the component to the third subchamber is formed to remove multiple contaminants from at least one internal channel of the component; and during the first pressure cycle, the vacuum system is deactivated. When the vacuum system is deactivated, the first pressurized flow of the first cleaning agent does not exist in the second subchamber.

[0017] In one aspect, in combination with any of the above or below exemplary cleaning methods, the method of using the cleaning system further comprises: performing a first filtering cycle, the first filtering cycle being included in the cleaning program. The first filtering cycle comprises: delivering the first cleaning agent from the third subchamber to a filtering system, the filtering system being coupled to the third subchamber and the first subchamber. The filtering system removes a plurality of contaminants from the first cleaning agent to form a filtered first cleaning agent; and delivering the filtered first cleaning agent to the first subchamber via the filtering system.

[0018] In one aspect, in conjunction with any of the example cleaning methods above or below, the method of using a cleaning system further includes a cleaning procedure comprising: performing a plurality of filtration cycles during the pressure cycle prior to deactivating the vacuum system.

[0019] In one aspect, in combination with any of the example cleaning methods above or below, the method of using the cleaning system also includes: after the first filtration cycle, during a second pressure cycle, when the first subchamber is at the first pressure, creating a rotational speed of the filtered first cleaning agent; during the second pressure cycle, starting the vacuum system to establish a third pressure in the third subchamber while the component is removably connected to the first subchamber via the first coupling mechanism and removably connected to the third subchamber via the second coupling mechanism, the third pressure being less than the first pressure; and during the second pressure cycle, in response to the third pressure being less than the first pressure, forming a second flow of the first cleaning agent from the first subchamber through at least one internal channel of the component to the third subchamber to remove multiple contaminants from at least one internal channel of the component.

[0020] In one aspect, in conjunction with any of the example cleaning methods above or below, the method of using the cleaning system further includes placing a second cleaning agent in the second subchamber during the cleaning process to remove contaminants from the outer surface of the component.

[0021] In one aspect, in conjunction with any of the example cleaning methods above or below, the method of using a cleaning system further includes: the first pressure is about atmospheric pressure, and the second pressure is about 0.01 Pascal (Pa) to about 1 Pa.

[0022] In one aspect, in combination with any of the above or below exemplary cleaning methods, the method of using a cleaning system further comprises: a first cleaning agent selected from the group consisting of: a surfactant, a degreasing liquid, a degreasing gas, ambient air, nitrogen, CO2, and combinations thereof.

[0023] In one aspect, in conjunction with any of the exemplary cleaning methods above or below, the method of using a cleaning system further includes: a first cleaning agent comprising a plurality of particles having an average diameter of about 0.5 mm to about 3 mm.

[0024] In one aspect, in conjunction with any of the example cleaning methods above or below, the method of using a cleaning system further comprises: a plurality of particles selected from the group consisting of: polymer particles, ceramic particles, glass particles, and combinations thereof.

[0025] In one aspect, in conjunction with any of the example cleaning methods above or below, the method of using a cleaning system further includes: the first pressurized flow is a linear flow.

[0026] In one aspect, in combination with any of the example cleaning methods above or below, the method of using a cleaning system further comprises: during a first pressure cycle, agitating the first cleaning agent to establish a rotational velocity of the first cleaning agent, wherein the first pressurized flow formed by the first cleaning agent having the rotational velocity is a vortex. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order that the manner in which the above-described features are understood in detail, a more particular description may be had by reference to example aspects, which have been briefly summarized above, and some example aspects are illustrated in the accompanying drawings.

[0028] Figure 1 An example of a flow chart of a method of using a cleaning system according to aspects of the present disclosure is depicted.

[0029] Figure 2 Another example of a flow chart of a method of using a cleaning system according to aspects of the present disclosure is depicted.

[0030] Figure 3 A cleaning system according to aspects of the present disclosure is depicted.

[0031] Figure 4 An example vacuum system according to aspects of the present disclosure is depicted.

[0032] Figure 5 A cleaning system according to aspects of the present disclosure is depicted.

[0033] Figure 6 A portion of a cleaning system according to aspects of the present disclosure is depicted. DETAILED DESCRIPTION

[0034] The present disclosure relates to a cleaning system and method using a pressure difference to form one or more pressurized flows. An internal passage may be included in a component used in various types of industrial equipment, or included in parts and assemblies (collectively referred to herein as "components") manufactured using industrial equipment or manufactured using other methods and equipment. As discussed herein, "industrial equipment" may be various types of machinery for manufacturing, assembling, cleaning, inspecting, and otherwise manufacturing components (e.g., aerospace components). Components may include mechanical components, electrical components, or electromechanical components. Components such as pipes, hoses, conduits, joints, and other connectors and channels may each include one or more internal passages. The internal passages of a component may accumulate a buildup of contaminants, which may pose a challenge to cleaning. The contaminants discussed herein may be solid, liquid, or colloid, and may include various processing agents (e.g., degreasers or other solvents) used on industrial equipment, as well as dirt, dust, animal life (e.g., insects), plant life, metal shavings produced by machining, or other foreign matter debris (FOD) or undesirable elements that may negatively affect component function via blockage or contaminants.

[0035] Current methods of cleaning internal passages may not be adequate because internal passages may have small, thin, or narrow cross-sections; varying cross-sectional sizes and geometries; twists, kinks, twists, or other unique geometries; and / or corners. Due to the combination of contaminant buildup and the geometry of the internal passages, current cleaning methods are cumbersome and time consuming. Additionally, currently employed cleaning methods can leave behind contaminants that were not removed and may also leave behind cleaning agents used as part of the cleaning process.

[0036] Therefore, the systems and methods discussed herein can be used to clean components having one or more internal passages of different cross-sectional shapes and geometries without leaving residues. The systems and methods discussed herein use an enhanced force generated by forming and controlling a pressurized flow in response to a pressure difference between two environments. The pressurized flow can be directed through one or more internal passages in multiple repetitions. As discussed herein, a "pressurized flow" is a flow of one or more materials that is generated based on at least one pressure difference between a first environment (e.g., a subchamber) and a second environment (e.g., a different subchamber) along a path. One or more materials may include a cleaning agent. The pressurized flow can be used to transport fluids and solids, or a mixture of multiple types of cleaning agents along a path that may include one or more internal passages of a component. As used herein, a "fluid" may include a material in a liquid phase or a gas phase (including bubbles). The cleaning agent may be a single-phase medium or a multi-phase medium of various configurations. The single-phase medium may be one of the following: a liquid (e.g., a water (H2O) cleaning agent), a gas, a solvent, or a solid (e.g., a particulate matter that can be used alone to remove contaminants from an internal passage). The multiphase medium may include 1) water and solvent vapor, 2) solvent liquid and solvent vapor, 3) water, solvent and multiple particles or any combination thereof. In some examples, multiple bubbles may be introduced into a single-phase cleaning agent or a multiphase cleaning agent. In other examples, a colloid or dispersion mixture (multiphase medium) may be used as a cleaning agent.

[0037] The pressurized flow can be configured in various ways, including linear flow or eddy current. "Linear" flow can be a flow of a cleaning agent substantially along the central axis of the inner passage of a component. In contrast, as used herein, "eddy current" is a pressurized flow of a cleaning agent with a rotational speed. As used herein, the "rotational speed" of a medium such as a cleaning agent is used to indicate that the cleaning agent has a circumferential speed so that the pressure difference creates a spiral flow through one or more fluid paths. Therefore, the eddy current can include a pressurized flow of a cleaning agent through an inner passage along a spiral flow path. The eddy current advances along the central axis of the inner passage of a component while rotating at an angle relative to the central axis. In this example, the cleaning agent forming the eddy current has a rotational speed that is maintained or increased as the cleaning agent is transported along the inner passage. In some examples, the cleaning agent can rotate at an angle of 30 ° (degrees), 60 ° or 90 ° relative to the central axis of the inner passage. For example, the cleaning method discussed herein can be used to clean a tubular structure with multiple bends, because compared with current cleaning methods, the pressurized flow can be directed to pass through complex components relatively easily. In addition, the pressurized flow of cleaning agent does not leave residues that could cause fire hazards, equipment contamination, and / or other performance issues once the parts are put back into service after cleaning. The systems and methods discussed herein can be used to control the formation and direction of the pressurized flow via the pressure differential between the first environment and the second environment to remove contaminants without leaving undesirable residues. Therefore, the systems and methods discussed herein result in higher cleaning rates and improved cleaning efficiencies compared to current cleaning methods.

[0038] The cleaning system discussed herein has at least one cleaning chamber divided into a plurality of subchambers, and the combination of the plurality of subchambers can be referred to as a "subchamber stacking", as discussed in detail below. In one example, a plurality of coupling mechanisms are used to couple a component to a cleaning chamber. As discussed herein, a "coupling mechanism" is a device configured to fix two or more elements of a system to each other. The cleaning chamber is configured in such a way that two or more subchambers are each configured to be individually pressure controlled. In some examples, two or more subchambers are each configured to be individually temperature controlled. The first subchamber of the cleaning chamber may include a variety of cleaning agents disposed in the first subchamber. Depending on the example, the cleaning agent may include liquid, gas and / or solid. In some examples, as discussed in the multiphase medium example above, two or more types of cleaning agents may be placed in the first subchamber and may be used simultaneously. The first subchamber and the third subchamber are separated by the second subchamber, and the combination of the three subchambers may be referred to as a "subchamber stacking". The component is fluidly coupled to the first subchamber via a first coupling mechanism, and is fluidly coupled to the third subchamber via a second coupling mechanism. As used herein, "fluidly coupled" is used to refer to the configuration of a system in such a manner that two or more subchambers are connected by pathways that allow gases and / or fluids to travel within, between, and / or through the subchambers.

[0039] In one example, the component includes at least one internal passage. The internal passage is fluidly connected between the first subchamber and the third subchamber. The component can be removably connected to each of the first coupling mechanism and the second coupling mechanism. As used herein, "removably connected" is used to refer to the connection of two or more elements (such as coupling mechanism and component), which can be disconnected from the connection without damaging any element. The connection of each of the first coupling mechanism and the second coupling mechanism to the cleaning system creates a path along the internal passage, which is used to make the cleaning agent travel to the third subchamber from the first subchamber through the internal passage. Before or after the coupling mechanism is removably connected to the first subchamber and the third subchamber respectively, the component can be removably connected to one or both of the first coupling mechanism and the second coupling mechanism. Components can be located in the second subchamber in different ways. For example, the second subchamber can have a panel on one side or more sides, and the panel is configured to open and close, so as to allow components to be located therein. In another example, the first partition separating the first subchamber from the second subchamber can be configured to open, close or otherwise move, so as to allow components to be located in the second subchamber. In yet another example, a second partition separating the third subchamber from the second subchamber can be configured to open, close, or otherwise move to allow the component to be positioned in the second subchamber.

[0040] In this example, the pressure of the first subchamber is greater than the pressure of the third subchamber. This pressure difference between the first subchamber and the third subchamber causes the pressurized flow of the cleaning agent to form, and travels from the first subchamber to the third subchamber through the internal passage of the component. As discussed herein, "pressure cycle" includes starting and deactivating at least one vacuum system in the cleaning system, thereby creating at least one pressurized flow of the cleaning agent from the first subchamber to the third subchamber. As the cleaning agent is filtered and / or new cleaning agent is introduced into the cleaning system, multiple pressurized flows can be formed during a single pressure cycle. When the pressure cycle terminates, the pressurized flow stops. As the cleaning agent is passed from the first subchamber through the internal passage to the third subchamber, the first pressure cycle uses one or more pressurized flows to remove multiple first contaminants from the internal passage of the component. Once the cleaning agent travels to the third subchamber, it can be filtered and transported back to the first subchamber from the third subchamber through the filtering system. The delivery of the cleaning agent that has passed through the components in the second subchamber and returned to the first subchamber through the filtering system can be referred to as "filtration cycle" in this article. The filtered cleaning agent can be used for the second cleaning cycle of components or other components that are placed in the system later. In some examples, additional new cleaning agent can be added to the first subchamber during the second cleaning cycle or other subsequent cleaning cycles. One or more filtration cycles can occur during the pressure cycle. In some examples, no filtration cycle occurs during the pressure cycle, and a waste container is used to remove the used cleaning agent, as described below.

[0041] During one or more pressure cycles, maintain a pressure differential across the subchamber so that the pressurized flow of the cleaning agent continues. The system discussed herein may include programmable logic, which may be configured as one or more cleaning programs. In one example, each cleaning program includes one or more pressure cycles. Programmable logic may be performed using a graphical user interface (GUI). In another example, each cleaning program includes one or more pressure cycles and one or more filter cycles that occur during one or more pressure cycles. In yet another example, each cleaning program includes one or more pressure cycles and one or more filter cycles that are performed during or after one or more pressure cycles. That is, the vacuum system may or may not be activated during the filter cycle, because the filter system may have its own mechanism, by which the cleaning agent from the third subchamber is removed, thereby ensuring that the cleaning agent does not fall back in the inner passage.

[0042] Methods for cleaning internal passages

[0043] Figure 11 is a flow chart of a method 100 for using a cleaning system according to an example of the present disclosure. At operation 102 of method 100, a component is removably positioned and coupled to a cleaning system. The cleaning system discussed below in methods 100 and 200 may be a cleaning system 300 ( Figure 3 ) or cleaning system 500( Figure 5 ). Operation 102 can occur in various ways. In one example of operation 102, before the coupling mechanism is removably coupled to the cleaning system, the component is removably coupled to one or more coupling mechanisms. In another example of operation 102, the coupling mechanism is removably coupled to the cleaning system, and then the component is removably coupled to each of the coupling mechanisms. In yet another example of operation 102, one coupling mechanism can be coupled to the component before the component is coupled to the cleaning system, and a second coupling mechanism can be coupled to the system so that the component is already connected to the cleaning system while being coupled to the second coupling mechanism. The cleaning system can have multiple entry points through which the component can be located in the cleaning system.

[0044] The component connected to the cleaning system at operation 102 can accumulate a buildup of contaminants in its internal passage. In some examples, the component can also accumulate contaminants on its outer surface, which may be the same or different from the contaminants in the internal passage. Multiple contaminants in the internal passage and / or outer surface may make the component unusable or there is a risk of attempting to use it for its intended purpose. In the example where the component is an aerospace component, the contaminant may make the aerospace component unsuitable for use because the multiple contaminants can spread to other components in the assembly. During the use or testing of the aerospace component, the multiple contaminants may also additionally or alternatively act as undesirable ignition points. In the example where the component is an industrial equipment component, the multiple contaminants can further contaminate the industrial equipment and the components manufactured by the industrial equipment or developed using the industrial equipment or otherwise. Exemplary industrial equipment may include coating, casting, injection molding, cleaning, food manufacturing and packaging equipment, and inspection equipment that can utilize various fluids, gases, solids, colloidal solutions or other processing materials that may cause contamination. In addition, the use of industrial equipment in a manufacturing workshop environment can cause the internal passages and / or outer surfaces of the components to be contaminated.

[0045] At operation 104, a cleaning program is performed to remove a variety of contaminants from the internal passages of the component. As discussed herein, the cleaning program performed at operation 104 may be stored on the cleaning system and / or on a remote server or other remote location accessible to the cleaning system via one or more remote technologies (e.g., cloud computing technologies). As described above, the cleaning program performed at operation 104 may include one or more pressure cycles and one or more filtration cycles. Operation 104 Figure 2Detailed discussion in .

[0046] At operation 106, the cleaning procedure optionally removes contaminants from the outer surface of the component. In one example, operation 104 is performed simultaneously with operation 106. In another example, operation 104 is performed in a manner that partially overlaps with operation 106. In yet another example, operation 104 is performed separately from operation 106 (e.g., performed before or after operation 106) so that the two operations do not overlap. Operation 106 may include: introducing one or more cleaning agents into the chamber. The cleaning agent used for operation 106 may include one or more of a liquid, a gas, a particle, or a combination thereof. The cleaning agent used for operation 106 may include a surfactant, water, ambient air, or a combination thereof. The cleaning agent used at operation 106 may be the same as the cleaning agent used at operation 104. In other examples, the cleaning agent used at operation 106 may be different from the cleaning agent used at operation 104. In yet other examples, the cleaning agent used at operation 106 may include one or more types of other cleaning agents other than the cleaning agent used at operation 104. The cleaning agent for operation 106 can be introduced in a single cycle and removed from the portion (referred to herein as a "subchamber") where the components are located in the cleaning system. In other examples, the cleaning agent for operation 106 can be introduced in multiple cleaning cycles, wherein the cleaning agent is removed and filtered after each cleaning cycle, and reintroduced into the portion where the components are located in the cleaning system. In some examples that can be combined with other examples herein, the cleaning agent for operation 106 can be introduced in multiple cleaning cycles, wherein the cleaning agent is removed after each cleaning cycle, and a new cleaning agent is introduced for one or more subsequent cleaning cycles. In yet other examples, the cleaning agent for operation 106 can be a combination of filtered cleaning agents and new cleaning agents.

[0047] At operation 108, after removing multiple contaminants from the internal passage at operation 104 (and optionally, from the outer surface of the component at operation 106), the component is removed from the system. After removing the component, various inspections and / or tests can be performed to ensure that the contaminants have been removed from the internal passage and the outer surface. After operation 108, the component can be reassembled to an aerospace component (or other component), or reassembled to an industrial device. In some examples, as discussed in detail below, during method 100, when two or more internal passages of a component are to be cleaned, one or more holes of the two or more internal passages can be blocked. In this example, the first internal passage can be cleaned using at least operation 104 of method 100, wherein the cleaning agent is passed through the first internal passage via a pressurized flow. During subsequent repetitions of method 100, different holes can be blocked and / or unblocked to guide the pressurized flow through one or more different internal passages.

[0048] Figure 2 An example of a flow chart of a method 200 for using a cleaning system according to aspects of the present disclosure is depicted. The method 200 is Figure 1 At operation 104 of method 200, a first pressure cycle is started. The pressure cycle is performed by Figure 2 214 indicates in. At operation 202, a first pressure is established in the first subchamber. In one example, the first pressure of the first subchamber is about atmospheric pressure (1atm). In other examples, the first pressure of the first subchamber can be from about 0.5 atmosphere to about 1.5 atmosphere. In other examples, the first pressure of the first subchamber can be from about 0.8 atmosphere to about 1.2 atmosphere. In one example, during the first pressure cycle of the cleaning program in method 200, the first rotation speed of the first cleaning agent is optionally created at operation 202 in the first subchamber of the cleaning system. In one example, the agitation of the first cleaning agent can cause multiple bubbles in the first cleaning agent. In other examples, at operation 202, when the first subchamber is at the first pressure, the first cleaning agent is located in the first subchamber, but is not agitated / rotated in the first subchamber.

[0049] The first cleaning agent may include one or more fluids, such as surfactants, degreasing liquids, degreasing gases, ambient air, nitrogen, CO2, or a combination thereof. As used herein, a "degreasing" material (liquid or gas) is a material capable of removing contaminants from an internal passage. As described above, the first cleaning agent may include one or more components in a single-phase configuration or a multiphase configuration. Depending on the example, the first cleaning agent is non-carcinogenic, may be biodegradable or have a low level of hydrocarbons, or does not contain hydrocarbons. The first cleaning agent may be selected so that it is discarded into a waste system utilized by other systems without further treatment, without pretreatment, and without harm to aquatic life. In some examples, the first cleaning agent may be selected in a manner such that the first cleaning agent does not appear in the Registration, Evaluation, Authorization, and Restriction of Chemicals (REACH) Authorization List. In other examples, the first cleaning agent may be selected and disposed of in a closed-loop system, in which pretreatment is performed before disposal to neutralize and / or reduce the impact of the solvent on the environment.

[0050] In some examples, the first cleaning agent can be a plurality of particles, or a multiphase medium including a plurality of particles. In one example, the plurality of particles can have an average diameter of about 0.5 mm to about 3.0 mm. In another example, the plurality of particles can have an average diameter of about 0.5 mm to about 1.0 mm. In yet another example, the plurality of particles can have an average diameter of about 0.8 mm to about 2.0 mm. As used herein, "about" can mean that the stated target measurement, minimum measurement, or maximum measurement is within + / - 5% of the measurement. The plurality of particles can include one or more of polymer particles, ceramic particles, glass particles, or polymer-coated glass particles or ceramic particles. The plurality of particles can include a weight percentage (wt.%) of the first cleaning agent of about 1% to about 50%. In another example, the plurality of particles can include a weight percentage of the first cleaning agent of about 2% to about 30%. In another example, the plurality of particles can include a weight percentage of the first cleaning agent of about 5% to about 20%. In yet another example, the plurality of particles can include a weight percentage of the first cleaning agent of about 10% to about 30%. The type, size and wt.% of the particles in the cleaning agent can be selected to protect (e.g., not damage) the coating and / or texture on the inner surface of the inner passage. In one example, further at operation 202, the rotational speed of the first cleaning agent can be established. In one example, the rotational speed can be from about 1 meter / second (m / s) to about 50m / s. In another example, the rotational speed can be from about 5m / s to about 40m / s. In yet another example, the rotational speed can be from about 10m / s to about 30m / s. The rotational speed can be established in either direction around the central axis of the cleaning system. In some examples, the rotational speed can be changed from a first direction to a second direction during the execution of the cleaning program.

[0051] At operation 204, during the first pressure cycle, the vacuum system of the cleaning system is started to establish a second pressure in the third subchamber. The vacuum system can be connected to the third subchamber of the cleaning system, which is separated from the first subchamber by the second subchamber, and the second subchamber has a component located in the second subchamber. The second pressure in the third subchamber is less than the first pressure in the first subchamber, which establishes a pressure difference between the first subchamber and the second subchamber. In various examples, the second pressure is about 0.01 Pascal (Pa) to about 1Pa. In another example, the second pressure is about 0.01Pa to about 0.8Pa. In another example, the second pressure is about 0.25Pa to about 1Pa. The pressure difference between the first subchamber and the third subchamber promotes the formation of a first pressurized flow of a first cleaning agent at operation 206. The first pressurized flow formed at operation 206 travels through at least one internal channel of the component, thereby removing multiple contaminants during the first pressure cycle. During operation 206, at least a portion of the first cleaning agent in the first subchamber is thus delivered to the third subchamber via the pressurized flow. That is, the pressure difference between the first subchamber and the third subchamber is combined with the fluid path formed by the components connected to the first subchamber and the third subchamber, so that the first cleaning agent is driven from the first subchamber along the internal channel of the component to the third subchamber, thereby removing contaminants from the component. As discussed herein, a "fluid path" is a channel configured to allow a medium (e.g., a liquid, a gas, a solid, or a combination thereof) to fluidly travel through it (e.g., without obstructing the medium traveling in the channel). In addition, the second pressure in the third subchamber prevents the first cleaning agent from falling back into the internal channel (which would contaminate the internal channel again).

[0052] In the example of agitating the first cleaning agent at operation 202, the agitation (e.g., the rotational speed of the first cleaning agent) is maintained at operation 204. Therefore, the pressurized flow created by the pressure difference between the first subchamber and the second subchamber can be referred to as a vortex, as described above, because the pressurized flow will have a rotational speed based on the agitation of the first cleaning agent. Each of the first subchamber, the second subchamber, and the third subchamber is configured to be sealed relative to the adjacent environment (as described below in Figure 3 ), to enable the formation of independent pressure, temperature, and chemical environments. As used herein, a "chemical environment" is an area, such as a subchamber, that includes ambient air and / or one or more types of cleaning agents that may have different chemical reactions and compositions.

[0053] In one example, after the pressurized flow is established at operation 206, the vacuum system may be deactivated at operation 212 to terminate the first pressure cycle, as indicated by arrow 216. In some examples, the first cleaning agent is removed from the third subchamber via a waste container after removing the various contaminants from the internal passage before the vacuum system is deactivated at operation 212. In this example, new, unused first cleaning agent may be transferred to the first subchamber at optional operation 218, and a subsequent pressure cycle may be performed (as indicated by arrow 214).

[0054] In another example, during the pressure cycle, the first filter cycle is performed at operation 208. In this example, at operation 208, the first cleaning agent from the third subchamber is removed and transported through the filter system. The filter system is connected to both the third subchamber and the first subchamber, and is configured to remove multiple pollutants from the internal passage of the component and form a filtered first cleaning agent (also referred to as "recycled" first cleaning agent). The filtered first cleaning agent can be used and refiltered in one or more filter cycles (as shown in arrow 210). Therefore, one or more filter cycles 210 can occur during a single pressure cycle 214. After each filter cycle, the filtered first cleaning agent (separate or in combination with a new first cleaning agent) is used to form a subsequent pressurized flow. After one or more filter cycles 210, the vacuum system can be deactivated at operation 212 to terminate the first pressure cycle (as shown in arrow 216). In other examples, the filtered first cleaning agent (obtained at operation 208) can be used to combine with the new first cleaning agent introduced into the first subchamber at operation 218.

[0055] Therefore, in method 200, one or more pressure cycles 214 can be performed, and in each pressure cycle 214, zero, one or more filtering cycles 210 can occur. In one example, each pressure cycle 214 forms and disperses a pressurized flow based on a pressure difference and a rotational speed of the first cleaning agent to convey the pressurized flow of the first cleaning agent through the internal passage of the component to remove multiple contaminants. In another example, when the rotational speed of the first cleaning agent is not established, each pressure cycle 214 forms a linear flow based on a pressure difference. The pressure of the first subchamber can be the same in and between the pressure cycles 214. In other examples, the pressure of the first subchamber can change in and between the pressure cycles 214, or change during a single pressure cycle 214 with two or more filtering cycles 210. The pressure of the third subchamber can be the same in and between the pressure cycles 214. In other examples, the pressure of the third subchamber can change in and between the pressure cycles 214, or change during a single pressure cycle 214 with two or more filtering cycles 210. Similarly, the rotational speed of the first cleaning agent optionally established at operation 202 may be varied during a single pressure cycle 214 that includes one or more filtration cycles 210. In other examples, the rotational speed of the first cleaning agent optionally established at operation 202 may be varied within and between two or more pressure cycles 214 that each include one or more filtration cycles 210.

[0056] In some examples, the component located in the second subchamber may include more than two holes. In this example, the additional hole can be blocked before starting the first pressure cycle. In other examples, the additional hole can be connected to an additional internal channel of the component. Methods 100 and 200 can be used to form a fluid path in one or more internal channels of the component by appropriately blocking and unblocking the holes to remove contaminants from the additional internal channels of the component. In other examples, depending on the geometry of the internal channels, two or more internal channels can remove multiple contaminants simultaneously.

[0057] SINGLE-SUB-CHAMBER-STACK cleaning system

[0058] Figure 3A cleaning system 300 according to various aspects of the present disclosure is depicted. The cleaning system 300 can be used for the above-described methods 100 and 200. A plurality of programmable logics that can be configured to perform one or more cleaning programs by the cleaning system can be stored on a non-transitory computer-readable medium, such as a data store 366. The data store 366 can be local to the cleaning system 300 or can be remotely accessed by a plurality of hardware 368 included in the cleaning system 300. In other examples, the cleaning system 300 can be manually operated using one or more buttons, switches, or other elements to activate and enable the plurality of hardware 368.

[0059] The cleaning system 300 includes a chamber 302, which is divided into a plurality of subchambers, including a first subchamber 310. The first subchamber 310 is separated from the second subchamber 308 via a first partition 314. The first partition 314 is configured to isolate adjacent subchambers. When adjacent subchambers are isolated, one or more different pressures, temperatures, or chemical environments can be established and maintained so that each of the first subchamber 310 and the second subchamber 308 has at least one of different pressures, temperatures, or chemical environments. The second subchamber 308 is separated from the adjacent third subchamber 306 by a second partition 312. The combination of the first subchamber 310, the second subchamber 308, and the third subchamber 306 can be referred to as a "subchamber stack".

[0060] The first separator 314 includes at least one first hole 342, which may also be described as a first through hole. The first hole 342 may be configured to receive a first coupling mechanism 322 to couple to the first end 324 of the component 316. The first coupling mechanism 322 may be located in the first hole 342 and coupled to the first hole 342 using one or more methods as discussed herein. In one example, Figure 3 The component 316 shown in the illustration 316 of has an outer surface 352, a first end 324 with a first end hole 354, a second end 320 with a second end hole 356, and an inner surface 360 ​​defining an internal passage 350. The internal passage 350 can have varying sizes and cross-sectional shapes (including polygonal, circular, elliptical, triangular, or a combination of multiple shapes). Depending on the example, the internal passage 350 can have various coatings, smoothness or porosity, or other features that are not damaged by the methods discussed herein.

[0061] The shape and material of component 316 can be different, such as metal, alloy, polymer, ceramic, composite material or a combination of two or more materials. In various examples, the cross-sectional geometry of the internal channel 350 of component 316 can be different. These geometries can include circular, elliptical, polygonal or other geometric shapes or combinations of geometric shapes. In some examples, the diameter of the internal channel 350 can taper from the first end 324 of component 316 to the second end 320, or vice versa. In other examples, the diameter and / or cross-sectional geometry can be changed along the length of component 316 in other ways. In some examples, the geometry of component 316 can include a straight tubular structure, a spiral structure with one or more turns, a curved structure with one or more bends (e.g., an "S-shaped" bend), or other geometric shapes or combinations of geometric shapes. In yet other examples, component 316 can have more than two holes. In this example, multiple internal channels can be defined by two or more holes. Some of the multiple internal channels can be connected to each other, while other internal channels may not be connected to additional internal channels. In some examples, component 316 is not part of cleaning system 300 , such as when various features of cleaning system 300 are tested or assembled, or when cleaning system 300 is shipped.

[0062] Each of the first partition 314 and the second partition 312 can be formed by various materials, such as metals, alloys, ceramics, polymers or a combination of multiple materials. The second partition 312 includes a second hole 344 that can also be described as a second through hole. The first hole 342 and the second hole 344 are configured to form a fluid path through the second subchamber 308, regardless of whether the component 316 is located in the fluid path. The second hole 344 can be configured to accommodate a second coupling mechanism 318, which is configured to be coupled to the second end 320 of the component 316. The second coupling mechanism 318 can be located in the second hole 344 and is coupled to the second hole 344 using one or more methods as discussed herein. Each of the first coupling mechanism 322 and the second coupling mechanism 318 can be configured as at least one of a combination of a press-fit mechanism, a clamp, an adhesive or a magnetic chuck or its ability to be coupled to the component 316. Thus, depending on the example, each of the first coupling mechanism 322 and the second coupling mechanism 318 can be removably coupled to the component 316 using the same mechanism or a different mechanism. In addition, each of the first coupling mechanism 322 and the second coupling mechanism 318 can be configured as a press-fit mechanism, a clamp, an adhesive, or a magnetic chuck, or a combination thereof to couple to each of the first divider 314 and the second divider 312, respectively.

[0063] Component 316 is removably connected to the second subchamber 308 via a first coupling mechanism 322 and a second coupling mechanism 318. This coupling can occur before or after one or both coupling mechanisms (318, 322) are connected to their respective partitions (312, 314). The first coupling mechanism 322 is configured to form a seal with the first partition 314. The seal formed between the first partition 314 and the first coupling mechanism 322 is formed in part by the cooperation of the first coupling mechanism 322 in the first hole 342. Similarly, the second coupling mechanism 318 is configured to form a seal with the second partition 312. The seal formed between the second partition 312 and the first coupling mechanism 318 is formed in part by the cooperation of the second coupling mechanism 318 in the second hole 344. Each seal is formed in a manner such that the first subchamber 310 is kept isolated from the second subchamber 308, and the second subchamber 308 is kept isolated from the third subchamber 306. Similar to the first partition 314, the second partition 312 is configured to isolate adjacent subchambers so that each of the third subchamber 306 and the second subchamber 308 can have one or more of a pressure, temperature, or chemical environment different from that of the adjacent chamber. A plurality of sensors 364 can be coupled to the cleaning system 300. The plurality of sensors 364 can include pressure (leak) sensors, temperature sensors, or other sensors selected to further ensure that the subchambers remain isolated to at least facilitate the pressure differential for creating the pressurized flow. Depending on the example, one or more cleaning programs can be configured to determine whether there is a leak before, during, and after one or more pressure cycles of the cleaning system 300.

[0064] The second subchamber 308 may include one or more access points on one or more sides through which the component 316 is positioned in and removed from the second subchamber 308. Depending on the example, the component 316 may be removed from the second subchamber 308 with or without removing one or both coupling mechanisms (318, 322) from the second subchamber. Although a single component 316 is shown as being positioned in the second subchamber 308, in other examples, multiple components may be positioned in the second subchamber 308 and may be cleaned simultaneously.

[0065] exist Figure 3, the first end 324 and the second end 320 are shown as being co-located along the axis 358. In other examples, the first end 324 and the second end 320 of the component may not be located along the shared axis. Therefore, the first coupling mechanism 322 and the second coupling mechanism 318 can be configured to be adjustable to accommodate the ends of the component 316 of different diameters and shapes that do not have a shared axis. In some examples that can be combined with other examples herein, the first coupling mechanism 322 and the second coupling mechanism 318 can be configured to be adjustable to accommodate various pipe diameters. In addition, each of the first coupling mechanism 322 and the second coupling mechanism 318 can be configured to allow quick clamping and loosening of each of the first end 324 and the second end 320.

[0066] Each of the first subchamber 310 and the third subchamber 306 is Figure 3 306. In some embodiments, the first subchamber 310, the second subchamber 308, and the third subchamber 306 may be shown as being substantially rectangular in shape and having substantially similar volumes. Additionally, the second subchamber 308 is shown as being rectangular in shape and having a larger size and volume. In other examples, the shape and volume of each of the first subchamber 310, the second subchamber 308, and the third subchamber 306 may be different. In still other examples, the second subchamber 308 may be configured in various ways so that it is not a completely enclosed subchamber. This may be a desired configuration where cleaning of the outer surface 352 of the component 316 is accomplished using various tools and / or cleaning agents or cleaning methods that are more easily accessible in the Figure 3 The embodiment is implemented in an open area or a partially open area where the second sub-chamber 308 shown in FIG.

[0067] A first cleaning agent (not shown here) may be provided in a first container 340. The first container 340 is coupled to the first subchamber 310 to introduce the first cleaning agent into the first subchamber 310. An agitator 330 is optionally coupled to the first subchamber 310. The agitator 330 may be a cyclone generator configured to optionally establish a rotational speed 362 of the first cleaning agent in the first subchamber 310. In other examples, the agitator 330 may be additionally or alternatively configured to introduce a plurality of bubbles into the first cleaning agent. The agitator 330 may be configured to extend from the bottom 310B of the first subchamber 310 or from the top 310A of the first subchamber 310. Depending on the example, the agitator 330 may include one or more propellers, tubes, or other elements configured to perform the function of an agitator, including as described herein and below Figure 5 The agitator 330 discussed in .

[0068] The first temperature controller 326 can be connected to the first container 340 and / or the first sub-chamber 310 and is configured to control the temperature of the first cleaning agent in the first container 340. In one example, the temperature of the first cleaning agent in the first container 340 can be about 15°C to about 100°C. In another example, the temperature of the first cleaning agent in the first container 340 can be about 35°C to about 80°C. In yet another example, the temperature of the first cleaning agent in the first container 340 can be about 15°C to about 40°C. In another example, the first temperature controller can alternatively or additionally be configured to control the temperature of the first sub-chamber 310. In this example, the temperature of the first cleaning agent in the first container 340 is substantially similar to the temperature of the first sub-chamber 310 (e.g., within 5%, 3%, or 1%, depending on the example). In another example, the temperature of the first cleaning agent in the first container 340 is different from the temperature of the first sub-chamber 310 (e.g., the difference is greater than 5%).

[0069] A second container 338 may be coupled to the second subchamber 308. The second container 338 contains a plurality of second cleaning agents, which are used to clean the outer surface 352 of the component 316, as discussed in the method 100 above. The second cleaning agent may be applied from the second container 338 as a liquid, a spray, a mist, or condensed steam from a boiling liquid pool. The second container 338 may be configured to deliver the second cleaning agent to the second subchamber 308. A second temperature controller 348 may be coupled to the second subchamber 308 and / or the second container 338. The second temperature controller 348 may be configured to control one or both of the temperature of the plurality of second cleaning agents in the second container 338 or the temperature of the second subchamber 308. In one example, the temperature of the second cleaning agent in the second container 338 may be about 15°C to about 100°C. In another example, the temperature of the second cleaning agent in the second container 338 may be about 15°C to about 40°C. In yet another example, the temperature of the second cleaning agent in the second container 338 may be about 45°C to about 80°C. Turning to the temperature of the second subchamber 308, in one example, it can be about 15°C to about 100°C. In another example, the temperature of the second subchamber can be about 15°C to about 40°C. In yet another example, the temperature of the second subchamber can be about 35°C to about 80°C. In one example, the temperature of the second cleaning agent in the second container 338 is substantially similar to the temperature of the second subchamber 308 (e.g., within 5%, 3%, or 1%, depending on the example). In another example, the temperature of the second cleaning agent in the second container 338 is different from the temperature of the second subchamber 308 (e.g., the difference is greater than 5%).

[0070] The vacuum system 304 is coupled to the third subchamber 306. The vacuum system 304 can be configured in various ways, such as Figure 4Detailed discussion in . The vacuum system 304 is configured to establish a vacuum pressure in the third subchamber 306. The pressure established in the third subchamber 306 can be less than the pressure in the first subchamber, so that the pressure difference promotes the formation of a pressurized flow of the first cleaning agent through the component 316 in the second subchamber. It should be understood that if the component 316 is not located in the second subchamber 308, the fluid path still exists in the second subchamber, and the pressurized flow can still be created in response to the pressure difference. In this example, the fluid path created by the pressure difference can extend along the central axis of the second subchamber 308. Therefore, the resulting pressurized flow can be used to clean or coat the second subchamber 308. In another example when there is no component 316 connected to the cleaning system 300, the agitation (e.g., rotational speed) of the first cleaning agent in the first subchamber 310 caused by the agitator 330 can be used to form a vortex to clean or coat the second subchamber 308.

[0071] Waste container 346 is coupled to third subchamber 306 and is configured to remove first cleaning agent from third subchamber 306. After completing pressure cycle, first cleaning agent can be removed from third subchamber 306. In another example, first cleaning agent can be removed from third subchamber 306 during one or more pressure cycles. Filter system 334 is coupled to first subchamber 310 and third subchamber 306. Filter system 334 includes one or more first conduits 336A and at least one filter 332 coupled to third subchamber 306. Waste container 346 can be configured to permanently remove unfiltered first cleaning agent. For example, first cleaning agent in third subchamber 306 (which may contain contaminants removed from the internal passage of component 316) is removed from system 300 so that once vacuum system 304 is deactivated, it will not fall back into component 316 and contaminate component 316. When using filter system 334, one or more first conduits 336A remove used first cleaning agent from third subchamber 306. At least one filter 332 is connected to one or more first conduits 336A and one or more second conduits 336B, and the second conduit 336B is further connected to the first subchamber 310. In some examples, multiple filters with different materials, sizes and / or pore sizes can be used as at least one filter 332. These materials can include various ceramics and composite materials. In one example, the used first cleaning agent is transmitted from the third subchamber 306 through at least one filter 332 to remove the pollutants removed by the first cleaning agent from the internal channel of the component 316. Then, the filtered first cleaning agent is transported back to the first subchamber 310 via one or more second conduits 336B. The filtered first cleaning agent can also be referred to as a "recycled" first cleaning agent. In one example, the filtered first cleaning agent is used alone to form a pressurized flow. In another example, the filtered first cleaning agent can be used in combination with a new, unused cleaning agent from the first container 340 to form one or more pressurized flows through the internal channel 350 during one or more pressure cycles.

[0072] Thus, the cleaning system 300 can be used to clean one or more internal passages 350 of the component 316. When the vacuum system 304 is activated, the cleaning system 300 can form multiple pressurized flows through the internal passage 350 of the component 316 during pressure cycles. During each pressurized flow, the first cleaning agent is directed through the internal passage 350. Each pressure cycle can include one or more filtration cycles during which the first cleaning agent is transported from the third subchamber 306 through the filtration system 334 and back into the first subchamber 310. The cleaning system 300 thus removes contaminants and the first cleaning agent from the internal passage 350, thereby enabling the component 316 to be assembled back into an industrial device or an aerospace component or other component.

[0073] Vacuum system

[0074] Figure 4 An example vacuum system 400 is depicted in accordance with various aspects of the present disclosure. The example vacuum system 400 may be similar to Figure 3 4 and 5. The vacuum system 400 includes a vacuum pump 402 coupled to the buffer chamber 404 and can be configured to establish pressure in the third subchamber 306. In this example, the vacuum system 400 includes a vacuum pump 402 coupled to the buffer chamber 404. The vacuum pump 402 is configured to establish pressure in at least one subchamber of the cleaning chamber 302. The pressure established by the vacuum pump 402 can be about 0.01 Pascal (Pa) to about 1 Pa. The buffer chamber 404 can be configured to adjust the pressure established by the vacuum pump 402 via a valve 406 coupled to both the buffer chamber 404 and the cleaning chamber 302. In some examples, the valve 406 can be directly coupled or indirectly coupled to the third subchamber 306 of the cleaning chamber 302.

[0075] Multi-chamber stacking cleaning system

[0076] Figure 5 A cleaning system 500 is depicted in accordance with aspects of the present disclosure. A plurality of programmable logics that may be configured to execute one or more cleaning programs as discussed herein by the cleaning system 500 may be stored on a non-transitory computer readable medium, such as a data store 542. The data store 542 may be local to the cleaning system 500 or may be remotely accessed by a plurality of hardware 544 included in the cleaning system 500. In other examples, the cleaning system 500 may be manually operated using one or more buttons, switches, or other elements to activate and enable the plurality of hardware 544.

[0077] The cleaning system 500 includes a cleaning chamber 518, which is divided into a plurality of subchambers forming a subchamber stack. Each subchamber stack of the cleaning system 500 is configured to hold a plurality of components. The cleaning system 500 can be configured to perform one or more cleaning procedures to remove contaminants from the internal channels from one or more components. The cleaning system 500 can also be configured to remove contaminants from the outer surface of one or more components. In the cleaning system 500, each cleaning chamber in the plurality of cleaning chambers 518 includes a first subchamber 506, a second subchamber 504, and a third subchamber 502. These subchambers (506, 504, 502) can also be divided separately to form a plurality of subchamber stacks, each subchamber stack being configured to clean at least one component in one or more of a simultaneous, overlapping, and / or sequential manner.

[0078] In one example, the second subchamber 504 is divided into a plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F. Components can be located in one or more of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F so as to clean the components in one or more of a simultaneous, overlapping, and / or sequential manner, for example, using the methods 100 and 200 discussed above. In some examples, the cleaning system 500 can subdivide the first subchamber 506 into a plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F. In this example, each of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F is separated from the adjacent second subchambers 504A, 504B, 504C, 504D, 504E, and 506F by a first partition 522. Each of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F can be separated from the adjacent first subchambers via a plurality of first partitions 524. Similarly, each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F is separated from the adjacent second subchambers via a plurality of second partitions 526. Each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F is separated from the corresponding third subchamber 502 via a second partition 520.

[0079] The configuration of each of the plurality of second sub-chambers 504A, 504B, 504C, 504D, 504E, and 504F (particularly the configuration when components are located in these second sub-chambers) is as follows: Figure 6 Detailed discussion in . In another example that can be combined with any other example herein, a plurality of third dividers 528 can be used to divide the third subchamber 502 into a plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F. As described above, each combination of subchambers configured to perform a cleaning procedure on a component can be referred to herein as a "subchamber stack." Thus, the first subchamber stack of the cleaning system 500 will include 506A, 504A, and 502A, the second subchamber stack will include 506B, 504B, and 502B, and so on, because each subchamber stack includes a first subchamber (506X, where "X" is A, B, C, D, E, or F), a second subchamber (504X), and a third subchamber (502X).

[0080] The vacuum system 536 is coupled to the third subchamber 502 of the cleaning chamber 518. The vacuum system 536 may be similar to Figure 4In the example where the third subchamber 502 is divided into a plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F using a plurality of third partitions 528, the vacuum system 536 may be coupled to each of the plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F. In the example where the first subchamber 506 is divided into a plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F, each first subchamber may have a corresponding agitator (516A, 516B, 516C, 516D, 516E, and 516F) optionally coupled thereto. Each corresponding agitator (516A, 516B, 516C, 516D, 516E and 516F) can be configured to generate the rotation speed of the first cleaning agent. In other examples, each corresponding agitator (516A, 516B, 516C, 516D, 516E and 516F) can be configured to additionally or alternatively stir the first cleaning agent, to induce a plurality of bubbles in the first cleaning agent, depending on whether linear flow or eddy current is required. The first container 514 can be configured to keep the supply of the first cleaning agent. The first container 514 can be coupled to one or more of a plurality of first subchambers 506A, 506B, 506C, 506D, 506E and 506F. The first cleaning agent can be introduced into each of a plurality of first subchambers 506A, 506B, 506C, 506D, 506E and 506F from the first container 514. The first temperature controller 512 may be coupled to the first container 514. The temperature of the first cleaning agent in the first container 514 may be about 15° C. to about 40° C. The first temperature controller 512 may additionally or alternatively be coupled to one or more of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F to modulate the respective temperatures.

[0081] In some examples (not shown), each of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F has a separate temperature controller coupled thereto so as to independently control the temperature of the first cleaning agent and / or each of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F. Each temperature of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F may be about 15° C. to about 40° C. In addition, at least one temperature of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F may be different from the temperature of the other first subchambers in the plurality of first subchambers. In one example, the temperature of the first cleaning agent in the first container 514 is substantially similar (e.g., within 5%, 3%, or 1%, depending on the example) to the temperature of one or more of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F. In another example, the temperature of the first cleaning agent in the first container 514 is different (e.g., the difference is greater than 5%) from the temperature of one or more of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F.

[0082] The vacuum system 536 is configured to establish a pressure difference from the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F to the third subchamber 502 or the plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F, so as to form the above Figure 3 One or more pressurized flows of the first cleaning agent discussed (one or more of the one or more pressurized flows may be vortex flows). A plurality of leak, temperature, and / or other sensors 508 may be configured to the system 500 in various configurations to further ensure that the subchambers remain fluidly isolated so as to at least facilitate the pressure differential used to create the pressurized flows.

[0083] The second container 510 is coupled to each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F. The second container 510 is configured to introduce a second cleaning agent into one or more of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F to clean the outer surface of a component (not shown) located in the second subchamber. The second cleaning agent can be applied from the second container 510 as a liquid, a spray, a mist, or condensed vapor from a boiling liquid pool. In some examples, the second temperature controller 530 is coupled to one or both of the second container 510 and one or more of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F to adjust the temperature of the second cleaning agent in the second container 510 or the temperature of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F.

[0084] In some examples (not shown here), each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F has a separate temperature controller coupled to the second subchamber to independently control the temperature of the second cleaning agent and / or the temperature of each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F. In one example, the temperature of the second cleaning agent in the second container 510 is substantially similar to the temperature of one or more of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F (e.g., within 5%, 3%, or 1%, depending on the example). In another example, the temperature of the second cleaning agent in the second container 510 is different from the temperature of one or more of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F (e.g., the difference is greater than 5%).

[0085] Figure 5504A, 504B, 504C, 504D, 504E, and 504F. In some examples, multiple filters with different materials, sizes, and / or pore sizes can be used as at least one filter 532. The used first cleaning agent passes through at least one filter 532 to remove contaminants from the first cleaning agent. The contaminants in the first cleaning agent are generated by passing the first cleaning agent through an internal passage of a component (not shown) located in one or more of the second subchambers 504A, 504B, 504C, 504D, 504E, and 504F. The filtered first cleaning agent is transported back to one or more of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F via the one or more second conduits 518B. The filtered first cleaning agent may also be referred to as "recycled" first cleaning agent and may be used alone or in combination with new, unused cleaning agent from the first container 514 during one or more pressure cycles. As described above, when the vacuum system 304 is activated, multiple pressurized flows may be formed during pressure cycles.

[0086] In the example where the third subchamber 502 is divided into a plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F, a separate filtration system 534 and / or a separate first conduit 518A may be coupled to each of the plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F. Similarly, a separate second conduit 518B may be coupled to one or more of the plurality of first subchambers 506A, 506B, 506C, 506D, 506E, and 506F. In one example, the filtration system 534 may be configured to return the filtered cleaning agent from the third subchamber of a particular subchamber stack to the first subchamber of the same stack, for example, from 506A to 502A. In another example, filtration system 534 may be configured to return filtered cleaning agent from the third subchamber of a particular stack of subchambers to the first subchamber of another different stack, such as from 506A to 502B, 502C, 502D, 502E, or 502F. Figure 3The waste container 346 in the waste container 540 can be coupled to one or more of the plurality of third subchambers 502A, 502B, 502C, 502D, 502E, and 502F, and the first cleaning agent can be permanently removed from the system.

[0087] In one example, one or more cleaning programs associated with the cleaning system 500 can be executed simultaneously in each subchamber stack. In other examples, one or more cleaning programs associated with the cleaning system 500 can be executed independently and without overlap in each subchamber stack. Such independent execution may occur continuously in various sequences or combinations of sequences. In yet other examples, one or more cleaning programs associated with the cleaning system 500 can be executed in an overlapping manner in which the execution of a first cleaning program in a first subchamber stack overlaps a portion of the execution of a second cleaning program in a second subchamber stack.

[0088] Figure 6 A portion 600 of the cleaning system 500 is depicted in accordance with aspects of the present disclosure. Figure 6 The portion 600 of the cleaning system 500 in FIG. 5 shows the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F in more detail. Figure 6 In the example of the system 500, each of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F has a component (606A, 606B, 606C, 606D, 606E, 606F) located therein. In other examples of the system 500, fewer than all of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F have components located therein. In some examples, none of the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F has a component located therein and a cleaning procedure can be performed to clean the plurality of second subchambers 504A, 504B, 504C, 504D, 504E, and 504F.

[0089] like Figure 6As shown, each component 606A, 606B, 606C, 606D, 606E, 606F has an outer surface; a first end 610A, 610B, 610C, 610D, 610E, 610F and a second end 608A, 608C, 608D, 608E, 608F. In addition, each component 606A, 606B, 606C, 606D, 606E, 606F has at least one internal passage (not shown here, but similar to the internal passage) extending therethrough from each first end 610A, 610B, 610C, 610D, 610E, 610F to each corresponding second end 608A, 608B, 608C, 608D, 608E, 608F. Figure 3 Each internal passage of each component 606A, 606B, 606C, 606D, 606E, 606F thus forms a path for pressurized flow, which may be linear flow or vortex flow, as described above.

[0090] Each of the first ends 610A, 610B, 610C, 610D, 610E, 610F is removably coupled to a corresponding first coupling mechanism 614A, 614B, 614C, 614D, 614E, 614F. Similarly, each of the second ends 608A, 608B, 608C, 608D, 608E, 608F is coupled to a corresponding second coupling mechanism 612A, 612B, 612C, 612D, 612E, 612F. The first partition 522 has a plurality of first through holes 616. Each of the first coupling mechanisms 614A, 614B, 614C, 614D, 614E, 614F is at least partially disposed in a through hole of the plurality of through holes 616. The second partition 520 has a plurality of second through holes 618, and each second coupling mechanism 612A, 612B, 612C, 612D, 612E, 612F is at least partially placed in each second through hole 618, respectively. A first seal is formed between each first coupling mechanism 614A, 614B, 614C, 614D, 614E, 614F and a plurality of first through holes 616. Similarly, a second seal is formed between each second coupling mechanism 612A, 612B, 612C, 612D, 612E, 612F and a plurality of second through holes 618. Therefore, due to the formed seal, each first subchamber 506, the second subchamber 504 and the third subchamber 502 maintain at least one of a separate and / or different pressure, temperature and chemical environment. As described above, the chemical environment of each subchamber can be different and can include: ambient air and / or one or more types of cleaning agents, which can have different chemical reactions and components. For example, each subchamber may contain a different type (composition or phase) of cleaning agent, filtered cleaning agent, or new cleaning agent.

[0091] Thus, the systems and methods discussed herein effectively and efficiently remove contaminants from the internal passages and / or external surfaces of various types of components without leaving behind harmful residues. The cleaning methods discussed herein can be performed in a timely manner, faster than current cleaning methods, while achieving cleanliness levels equal to or greater than those methods. The cleaning methods and systems discussed herein additionally clean the components discussed herein without negatively affecting the dimensional integrity or surface finish and / or coating of the components. The components can then be returned to industrial equipment or components, such as aerospace components, and the industrial equipment or components can be operated or otherwise used without being negatively affected by contaminants in the internal passages or residues left by cleaning agents in the internal passages.

[0092] In the present disclosure, reference is made to various aspects. However, it should be understood that the present disclosure is not limited to the specifically described aspects. On the contrary, no matter whether it is related to different aspects, any combination of the above-mentioned features and elements is expected to implement and practice the teaching provided herein. Additionally, when describing the elements of various aspects in the form of "at least one of A and B", it will be understood that all aspects including element A exclusively, element B exclusively, and elements A and B are expected. In addition, although some aspects can achieve advantages that are superior to other possible solutions and / or superior to the prior art, whether a specific advantage is achieved by a given aspect is not a limitation of the present disclosure. Therefore, the aspects, features, aspects, and advantages disclosed herein are only illustrative and are not considered as elements or limitations of the appended claims, unless clearly stated in the claims. Similarly, reference to "the present invention" should not be interpreted as a summary of any inventive subject matter disclosed herein, and should not be considered as elements or limitations of the appended claims, unless clearly stated in the claims.

[0093] As will be appreciated by those skilled in the art, aspects described herein may be implemented as systems, methods or computer program products. Therefore, aspects may take the form of complete hardware aspects, complete software aspects (including firmware, resident software, microcode, etc.) or aspects combining software aspects and hardware aspects, which are all collectively referred to herein as "circuit", "module" or "system". In addition, aspects described herein may take the form of a computer program product implemented in one or more computer-readable storage media, with a computer-readable program code implemented on the computer-readable storage medium.

[0094] Program code embodied on a computer-readable storage medium may be transmitted using any appropriate medium, including but not limited to wireless, wireline, optical fiber cable, RF, etc., or any suitable combination of the foregoing.

[0095] The computer program code for performing the operation of many aspects of the present disclosure can be written in any combination of one or more programming languages, including object-oriented programming languages, such as Java, Smalltalk, C++, etc. and conventional procedural programming languages, such as "C" programming language or similar programming languages. The program code can be executed completely on the user's computer, partly on the user's computer, as an independent software package, partly on the user's computer and partly on a remote computer, or completely on a remote computer or server. In the latter case, the remote computer can be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or can be connected to an external computer (e.g., using an Internet service provider through the Internet).

[0096] This article describes various aspects of the present disclosure with reference to the flowchart and / or block diagram of the method, device (system) and computer program product according to various aspects of the present disclosure. It should be understood that the combination of each frame of the flowchart and / or block diagram and the frame in the flowchart and / or block diagram can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer or other programmable data processing device to produce a machine, so that the instructions executed by the processor of the computer or other programmable data processing device are used to create a mode for implementing the function / action specified in the frame of the flowchart and / or block diagram.

[0097] These computer program instructions may also be stored in a computer-readable medium, which may direct a computer, other programmable data processing apparatus, or other device to operate in a specific manner so that the instructions stored in the computer-readable medium produce an article of manufacture, and the implementation of the article of manufacture includes instructions for implementing the functions / actions specified in the boxes of the flowchart and / or block diagram.

[0098] The computer program instructions may also be loaded onto a computer, other programmable data processing apparatus, or other device to cause a series of operational steps to be performed on the computer, other programmable apparatus, or other device to produce a computer-implemented process, so that the instructions executed on the computer, other programmable data processing apparatus, or other device provide a process for implementing the functions / actions specified in the blocks of the flowchart and / or block diagram.

[0099] The flowcharts and block diagrams in the accompanying drawings illustrate the possible architectures, functions and operations of the systems, methods and computer program products according to various aspects of the present disclosure. In this regard, each frame in the flowchart or block diagram may represent a module, segment or code portion, which includes one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative embodiments, the functions marked in the frame may not occur in the order marked in the figure. For example, depending on the functions involved, the two frames shown in succession can actually be executed substantially simultaneously, or these frames can sometimes be executed in reverse order or out of order. It will also be noted that each frame of the block diagram and / or flowchart, and the combination of frames in the block diagram and / or flowchart, can be implemented by a combination of a dedicated hardware-based system or dedicated hardware and computer instructions that performs a specified function or action.

[0100] Furthermore, the present disclosure includes implementations according to the following clauses:

[0101] 1. A cleaning system (300), the cleaning system (300) comprising:

[0102] A cleaning chamber (302), the cleaning chamber (302) comprising:

[0103] a first sub-chamber (310), the first sub-chamber (310) being configured to hold a first cleaning agent;

[0104] a second subchamber (308), the second subchamber (308) being adjacent to the first subchamber (310);

[0105] a first partition (314), the first partition (314) being located between the first subchamber (310) and the second subchamber (308), the first partition (314) having a first hole (342) formed therein;

[0106] a third subchamber (306) adjacent to the second subchamber (308) and configured to receive the first cleaning agent; and

[0107] a second partition (312), the second partition (312) being located between the second subchamber (308) and the third subchamber (306), the second partition (312) having a second hole (344) formed therein, the first hole (342) and the second hole (314) being configured to form a fluid path through the second subchamber (308); and

[0108] a vacuum system (304) coupled to the third subchamber (306), the vacuum system (304) being configured to generate a pressure in the third subchamber (306) that is less than a pressure in the first subchamber (310) to induce a pressurized flow of the first cleaning agent from the first subchamber (310) to the third subchamber (306); and

[0109] A filtration system (334) is coupled to the first subchamber (310) and the third subchamber (306), the filtration system (334) being configured to remove and filter the first cleaning agent from the third subchamber (306) and return the first cleaning agent to the first subchamber (310).

[0110] 2. The cleaning system (300) according to clause 1, further comprising:

[0111] a first coupling mechanism (322) removably coupled to the first divider (314) via the first aperture (342); and

[0112] A second coupling mechanism (318) is removably coupled to the second divider (312) via the second aperture (344).

[0113] 3. The cleaning system (300) according to clause 2, further comprising:

[0114] A component (316), the component (316) being located in the second subchamber (308), the component (316) having:

[0115] a first end (324) of the component (316), the first end (324) being removably coupled to the first coupling mechanism (322);

[0116] a second end (320) of the component (316), the second end (320) being removably coupled to the second coupling mechanism (318);

[0117] an outer surface (352); and

[0118] An inner surface (360) defines at least one internal passage (350) extending from the first end (324) of the component (316) to the second end (320) of the component (316).

[0119] 4. The cleaning system (300) according to clause 2, wherein each of the first coupling mechanism (322) and the second coupling mechanism (318) comprises a press-fit mechanism, a clamp, an adhesive, a magnetic chuck, or a combination thereof.

[0120] 5. The cleaning system (300) according to any one of clauses 1 to 4, further comprising: a temperature controller (326), the temperature controller (326) being connected to the first subchamber (310), the temperature controller (326) being configured to adjust the temperature of the first subchamber (310).

[0121] 6. The cleaning system (300) according to any one of clauses 1 to 5, further comprising: a first container (340), the first container (340) being connected to the first sub-chamber (310), the first container (340) having the first cleaning agent therein and being configured to transport the first cleaning agent into the first sub-chamber (310).

[0122] 7. The cleaning system (300) according to any one of clauses 1 to 6, further comprising: a second container (338), the second container (338) being connected to the second subchamber (308), the second container (338) having a second cleaning agent and being configured to deliver the second cleaning agent to the second subchamber (308).

[0123] 8. A cleaning system (500), the cleaning system (500) comprising:

[0124] A plurality of cleaning chambers (518), each of the plurality of cleaning chambers (518) comprising:

[0125] a first subchamber (506), the first subchamber (506) being configured to hold a first cleaning agent;

[0126] an agitator (516) coupled to the first subchamber (506), the agitator (516) being configured to initiate and maintain a rotational speed of the first cleaning agent;

[0127] a second subchamber (504), the second subchamber (504) being adjacent to the first subchamber (506);

[0128] a first partition (522), the first partition (522) being located between the first sub-chamber (506) and the second sub-chamber (504), and a plurality of first holes being formed in the first partition (522);

[0129] a third sub-chamber (502), the third sub-chamber (502) being adjacent to the second sub-chamber (504) and configured to receive the first cleaning agent; and

[0130] a second partition (520), the second partition (520) being located between the second subchamber (504) and the third subchamber (502), the second partition being formed with a plurality of second holes (618), each first hole in the plurality of first holes and each second hole in the plurality of second holes being configured to form a fluid path through the second subchamber;

[0131] a vacuum system (536) coupled to the third subchamber (502) of each of the plurality of cleaning chambers (518), the vacuum system (536) being configured to generate a pressure in the third subchamber (502), the pressure of the third subchamber (502) being less than the pressure of the first subchamber (506) to induce a pressurized flow of the first cleaning agent from the first subchamber (506) to the third subchamber (502); and

[0132] A filtration system (534) is coupled to the first subchamber (506) and the third subchamber (502) of each of the plurality of cleaning chambers (518), the filtration system (534) being configured to remove and filter the first cleaning agent from the third subchamber (502) of each cleaning chamber and return the filtered first cleaning agent to the first subchamber (506) of each cleaning chamber.

[0133] 9. The cleaning system (500) according to clause 8, further comprising:

[0134] a first coupling mechanism (614A-614F) removably coupled to the first partition (522) via a first through-hole of the plurality of first through-holes (616); and

[0135] A second coupling mechanism (612A-612F) removably coupled to the second partition (520) via a second through-hole of the plurality of second through-holes (618).

[0136] 10. The cleaning system (500) according to clause 9, further comprising:

[0137] A component (606A-606F), wherein the component (606A-606F) is located in the second sub-chamber (504) of at least one cleaning chamber among the plurality of cleaning chambers (518), and the component (606A-606F) has:

[0138] a first end (610A-610F) of the component (606A-606F), the first end (610A-610F) being removably coupled to the first coupling mechanism (614A-614F);

[0139] a second end (608A-608F) of the component (606A-606F), the second end (608A-608F) being removably coupled to the second coupling mechanism (612A-612F);

[0140] an outer surface (352); and

[0141] An inner surface (360) defines at least one internal passage (350) extending from the first end (610A-610F) to the second end (608A-608F) of the component (606A-606F).

[0142] 11. The cleaning system (500) according to any one of clauses 8 to 10, further comprising: a first container (514), the first container (514) being connected to the first subchamber (506) of each cleaning chamber, the first container (514) comprising the first cleaning agent and being configured to deliver the first cleaning agent to the first subchamber (506).

[0143] 12. The cleaning system (500) according to any one of clauses 8 to 11, further comprising: a second container (510), the second container (510) being connected to the second sub-chamber (504) of each cleaning chamber, the second container (510) comprising the second cleaning agent and being configured to deliver the second cleaning agent to the second sub-chamber (504).

[0144] 13. The cleaning system (500) according to any one of clauses 8 to 12, further comprising: at least one pressure sensor (508), wherein the at least one pressure sensor (508) is connected to the first subchamber (506), the second subchamber (504) or the third subchamber (503).

[0145] 14. A method of using a cleaning system, the method comprising the steps of:

[0146] (104) Executing a cleaning procedure, wherein the cleaning procedure includes:

[0147] (202) starting a first pressure cycle of the cleaning procedure, a first cleaning agent is in a first subchamber of the cleaning chamber, and the first subchamber has a first pressure;

[0148] During a first pressure cycle (214), a vacuum system is activated (204), the vacuum system being coupled to a third subchamber of the cleaning chamber to establish a second pressure in the third subchamber, the second pressure being less than the first pressure, the third subchamber being separated from the first subchamber by a second subchamber,

[0149] wherein the second subchamber has a component located therein, the component having an outer surface and an inner surface, the inner surface defining at least one internal passage, and

[0150] wherein the component is removably coupled to the first subchamber via a first coupling mechanism and removably coupled to the third subchamber via a second coupling mechanism;

[0151] During the first pressure cycle (214), in response to the second pressure being less than the first pressure, (206) forming a first pressurized flow of the first cleaning agent from the first subchamber through the at least one internal passage of the component to the third subchamber to remove a plurality of contaminants from the at least one internal passage of the component; and

[0152] During the first pressure cycle (214), the vacuum system is (212) deactivated, wherein the first pressurized flow of the first cleaning agent is absent in the second subchamber when the vacuum system is deactivated.

[0153] 15. The method according to clause 14, further comprising the following steps:

[0154] A first filtration cycle (210) is performed, the first filtration cycle being included in the cleaning program and comprising:

[0155] (208) delivering the first cleaning agent from the third subchamber to a filtration system coupled to the third subchamber and the first subchamber, wherein the filtration system removes the plurality of contaminants from the first cleaning agent to form a filtered first cleaning agent; and

[0156] (208) The filtered first cleaning agent is delivered to the first subchamber via the filtration system.

[0157] 16. The method according to clause 14 or 15, wherein the cleaning procedure comprises performing a plurality of filtration cycles (210) during a pressure cycle (214) before deactivating the vacuum system.

[0158] 17. The method according to clause 14 or 15, further comprising the following steps: after the first filtering cycle,

[0159] During a second pressure cycle (214), (202) creating a rotational speed of the filtered first cleaning agent when the first subchamber is at the first pressure;

[0160] During the second pressure cycle (214), (204) activating the vacuum system to establish a third pressure in the third subchamber while the component is removably coupled to the first subchamber via the first coupling mechanism and to the third subchamber via the second coupling mechanism, the third pressure being less than the first pressure; and

[0161] During the second pressure cycle (214), in response to the third pressure being less than the first pressure, (206) a second flow of the first cleaning agent is formed from the first subchamber through the at least one internal passage of the component to the third subchamber to remove the plurality of contaminants from the at least one internal passage of the component.

[0162] 18. The method according to any one of clauses 14 to 17, further comprising the following steps:

[0163] During execution of the cleaning procedure, (106) a second cleaning agent is placed in the second subchamber to remove contaminants from the outer surface of the component.

[0164] 19. The method according to any one of clauses 14 to 18, wherein the first pressure is about atmospheric pressure and the second pressure is about 0.01 Pa to about 1 Pa.

[0165] 20. The method according to any of clauses 14 to 19, wherein the first cleaning agent is selected from the group consisting of: surfactants, degreasing liquids, degreasing gases, ambient air, nitrogen, CO2 and combinations thereof.

[0166] 21. The method of any one of clauses 14 to 20, wherein the first cleaning agent comprises a plurality of particles having an average diameter of about 0.5 mm to 3 mm.

[0167] 22. The method of clause 21, wherein the plurality of particles are selected from the group consisting of polymer particles, ceramic particles, glass particles, and combinations thereof.

[0168] 23. The method of any one of clauses 14 to 22, wherein the first pressurized flow is a linear flow.

[0169] 24. The method according to any one of clauses 14 to 23, further comprising the following steps: (202) agitating the first cleaning agent during the first pressure cycle to establish a rotational speed of the first cleaning agent, wherein the first pressurized flow formed by the first cleaning agent having the rotational speed is a vortex.

[0170] While the foregoing is directed to aspects of the present disclosure, other and further aspects of the disclosure may be devised without departing from the basic scope thereof, and the scope of the same is determined by the claims that follow.

Claims

1. A cleaning system (300), the cleaning system (300) comprising: A cleaning chamber (302), the cleaning chamber (302) comprising: a first subchamber (310) configured to hold a first cleaning agent, the first cleaning agent comprising a plurality of particles, the plurality of particles having an average diameter of 0.5 mm to 3 mm, the plurality of particles being selected from the group consisting of polymer particles, ceramic particles, glass particles, polymer-coated glass particles, polymer-coated ceramic particles, and combinations thereof; an agitator (516) coupled to the first subchamber (310), the agitator (516) comprising one or more propellers, tubes, or other elements configured to initiate and maintain a rotational speed of the first cleaning agent, a second subchamber (308), the second subchamber (308) being adjacent to the first subchamber (310); a first partition (314), the first partition (314) being located between the first subchamber (310) and the second subchamber (308), and a first hole (342) being formed in the first partition (314); a third subchamber (306) adjacent to the second subchamber (308) and configured to receive the first cleaning agent; and a second partition (312), the second partition (312) being located between the second subchamber (308) and the third subchamber (306), the second partition (312) having a second hole (344) formed therein, the first hole (342) and the second hole (344) being configured to form a fluid path through the second subchamber (308); a vacuum system (304) coupled to the third subchamber (306), the vacuum system (304) being configured to generate a pressure in the third subchamber (306) that is less than a pressure in the first subchamber (310) to induce a pressurized flow of the first cleaning agent from the first subchamber (310) to the third subchamber (306); and A filtration system (334) is coupled to the cleaning chamber and is configured to filter the first cleaning agent.

2. The cleaning system (300) according to claim 1, further comprising: a first coupling mechanism (322) removably coupled to the first divider (314) via the first aperture (342); and A second coupling mechanism (318) is removably coupled to the second divider (312) via the second aperture (344).

3. The cleaning system (300) according to claim 2, further comprising: A component (316), the component (316) being located in the second subchamber (308), the component (316) having: a first end (324) removably coupled to the first coupling mechanism (322); a second end (320) removably coupled to the second coupling mechanism (318); outer surface (352); as well as An inner surface (360) defines at least one internal passage (350) extending from the first end (324) to the second end (320).

4. The cleaning system (300) according to any one of claims 1 to 3, further comprising: A first container (340) is coupled to the first sub-chamber (310), wherein the first container (340) contains the first cleaning agent and is configured to deliver the first cleaning agent to the first sub-chamber (310).

5. The cleaning system (300) according to any one of claims 1 to 3, further comprising: A second container (338) is coupled to the second subchamber (308), the second container (338) having a second cleaning agent and configured to deliver the second cleaning agent into the second subchamber (308).

6. A cleaning system (500), the cleaning system (500) comprising: A plurality of cleaning chambers (518), each of the plurality of cleaning chambers (518) comprising: a first subchamber (506) configured to hold a first cleaning agent, the first cleaning agent comprising a plurality of particles, the plurality of particles having an average diameter of 0.5 mm to 3 mm, the plurality of particles being selected from the group consisting of polymer particles, ceramic particles, glass particles, polymer-coated glass particles, polymer-coated ceramic particles, and combinations thereof; an agitator (516) coupled to the first subchamber (506), the agitator (516) comprising one or more propellers, tubes, or other elements configured to initiate and maintain a rotational speed of the first cleaning agent; a second subchamber (504), the second subchamber (504) being adjacent to the first subchamber (506); a first partition (522), the first partition (522) being located between the first sub-chamber (506) and the second sub-chamber (504), and a plurality of first holes being formed in the first partition (522); a third sub-chamber (502), the third sub-chamber (502) being adjacent to the second sub-chamber (504) and configured to receive the first cleaning agent; and a second partition (520), the second partition (520) being located between the second subchamber (504) and the third subchamber (502), the second partition having a plurality of second holes (618) formed therein, each first hole in the plurality of first holes and each second hole in the plurality of second holes being configured to form a fluid path through the second subchamber; a vacuum system (536), the vacuum system (536) being coupled to the third subchamber (502) of each cleaning chamber in the plurality of cleaning chambers (518), the vacuum system (536) being configured to generate a pressure in the third subchamber (502) of a cleaning chamber in the plurality of cleaning chambers, the pressure of the third subchamber (502) being less than the pressure of the first subchamber (506) of the cleaning chamber in the plurality of cleaning chambers, so as to induce a pressurized flow of the first cleaning agent from the first subchamber (506) of the cleaning chamber in the plurality of cleaning chambers to the third subchamber (502) of the cleaning chamber in the plurality of cleaning chambers; and A filtration system (534) is coupled to the plurality of cleaning chambers (518), the filtration system (534) being configured to filter the first cleaning agent.

7. The cleaning system (500) according to claim 6, further comprising: a first coupling mechanism (614A-614F) removably coupled to the first partition (522) of the cleaning chamber of the plurality of cleaning chambers via a first hole of the plurality of first holes; as well as A second coupling mechanism (612A-612F) removably coupled to the second partition (520) of the cleaning chamber of the plurality of cleaning chambers via a second hole of the plurality of second holes.

8. The cleaning system (500) according to claim 7, further comprising: A component (606A-606F), wherein the component (606A-606F) is located in the second sub-chamber (504) of the cleaning chamber in the plurality of cleaning chambers (518), and the component (606A-606F) has: a first end (610A-610F) removably coupled to the first coupling mechanism (614A-614F); a second end (608A-608F), the second end (608A-608F) being removably coupled to the second coupling mechanism (612A-612F); outer surface (352); as well as An inner surface (360) defines at least one internal passage (350) extending from the first end (610A-610F) to the second end (608A-608F).

9. The cleaning system (500) according to any one of claims 6 to 8, further comprising: A first container (514) is coupled to the first subchamber (506) of the cleaning chamber among the plurality of cleaning chambers, the first container (514) comprising the first cleaning agent and configured to deliver the first cleaning agent to the first subchamber (506) of the cleaning chamber among the plurality of cleaning chambers.

10. The cleaning system (500) according to any one of claims 6 to 8, further comprising: A second container (510) is connected to the second sub-chamber (504) of the cleaning chamber among the plurality of cleaning chambers, the second container (510) comprising a second cleaning agent and configured to deliver the second cleaning agent to the second sub-chamber (504) of the cleaning chamber among the plurality of cleaning chambers.

11. A method of using a cleaning system, the method comprising the steps of: (104) Executing a cleaning procedure, wherein the cleaning procedure includes: (202) starting a first pressure cycle of the cleaning procedure, a first cleaning agent in a first subchamber of the cleaning chamber, wherein the first cleaning agent comprises a plurality of particles, the plurality of particles having an average diameter of 0.5 mm to 3 mm, the plurality of particles being selected from the group consisting of polymer particles, ceramic particles, glass particles, polymer-coated glass particles, polymer-coated ceramic particles, and combinations thereof, and wherein, The first subchamber has a first pressure; During a first pressure cycle (214), a vacuum system is activated (204), the vacuum system being coupled to a third subchamber of the cleaning chamber to establish a second pressure in the third subchamber, the second pressure being less than the first pressure, the third subchamber being separated from the first subchamber by a second subchamber, wherein the second subchamber has a component located therein, the component having an outer surface and an inner surface, the inner surface defining at least one internal passage, and wherein the component is removably coupled to the first subchamber via a first coupling mechanism and removably coupled to the third subchamber via a second coupling mechanism; During the first pressure cycle (214), the first cleaning agent is agitated using an agitator to establish a rotational speed of the first cleaning agent, the agitator being coupled to the first subchamber, the agitator comprising one or more propellers, tubes, or other elements configured to initiate and maintain the rotational speed of the first cleaning agent, wherein a first pressurized flow formed by the first cleaning agent having the rotational speed is a vortex, During the first pressure cycle (214), in response to the second pressure being less than the first pressure, (206) forming the first pressurized flow of the first cleaning agent from the first subchamber through the at least one internal passage of the component to the third subchamber to remove a plurality of contaminants from the at least one internal passage of the component; and During the first pressure cycle (214), the vacuum system is (212) deactivated, wherein the first pressurized flow of the first cleaning agent is absent in the second subchamber when the vacuum system is deactivated.

12. The method according to claim 11, further comprising the steps of: A first filtration cycle (210) is performed, the first filtration cycle being included in the cleaning program and comprising: (208) delivering the first cleaning agent from the third subchamber to a filtration system coupled to the third subchamber and the first subchamber, wherein the filtration system removes the plurality of contaminants from the first cleaning agent to form a filtered first cleaning agent; and (208) The filtered first cleaning agent is delivered to the first sub-chamber via the filtration system.

13. The method according to claim 12, further comprising the steps of: After the first filtration cycle, During a second pressure cycle (214), (202) creating a rotational speed of the filtered first cleaning agent when the first subchamber is at the first pressure; During the second pressure cycle (214), (204) activating the vacuum system to establish a third pressure in the third subchamber while the component is removably coupled to the first subchamber via the first coupling mechanism and to the third subchamber via the second coupling mechanism, the third pressure being less than the first pressure; as well as During the second pressure cycle (214), in response to the third pressure being less than the first pressure, (206) a second flow of the first cleaning agent is formed from the first subchamber through the at least one internal passage of the component to the third subchamber to remove the plurality of contaminants from the at least one internal passage of the component.

14. The method according to any one of claims 11 to 13, further comprising the following steps: During execution of the cleaning procedure, (106) a second cleaning agent is placed in the second subchamber to remove contaminants from the outer surface of the component.

15. The method according to any one of claims 11 to 13, wherein: The agitator is a tube that forms the vortex.

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