Conveying device, substrate processing device and method for manufacturing product

Abstract

A conveying device for conveying a substrate chuck is provided. The device includes a hand for supporting the substrate chuck; a main body for pivotally supporting the hand around a vertical axis and moving in horizontal and vertical directions; and a guide portion for guiding the pivotal movement of the hand. The hand includes a hand distal portion and a hand proximal portion supported by the main body, and the end surface of the hand proximal portion facing the main body is formed in the shape of an arc of a circle centered on the vertical axis of a reference position between the hand distal portions, and the guide portion includes a guide surface having a shape corresponding to the end surface of the hand proximal portion and capable of slidably contacting the end surface. A substrate processing device and a method for manufacturing an article are also provided.

Description

Technical Field

[0001] The present invention relates to a conveying device, a substrate processing device and a method for manufacturing a product. Background Art

[0002] For example, in a substrate processing apparatus such as an exposure apparatus that forms a pattern on a substrate, a conveying apparatus that conveys a substrate or an original is used. The conveying apparatus needs to perform precise position control on the substrate or the original as a target object.

[0003] Japanese Patent Publication No. 2000-21956 discloses a rotating table that supports and rotates a substrate. Japanese Patent No. 5721453 discloses floating a substrate (plate-like member) without contact by exhausting gas toward the substrate, and relatively displacing the substrate and a supporting portion using a guide portion including an inclined portion.

[0004] Here, a substrate chuck conveying apparatus will be considered. In the case where an alignment mechanism such as that disclosed in Japanese Patent Publication No. 2000-21956 is applied to the correction of the rotational deviation of the substrate chuck, a plurality of dedicated alignment stages will be required. In the case where the positioning of the rotational direction of the substrate chuck is performed not by a dedicated alignment stage but by a substrate stage for exposing the substrate, the substrate stage will need to be drivable with a large stroke in the rotational direction, and the size of the substrate stage will need to be enlarged.

[0005] In addition, if rotation adjustment of a substrate chuck heavier than the substrate is performed by exhausting gas in the manner of Japanese Patent No. 5721453, a large amount of gas will need to be supplied, resulting in an increase in the size and complexity of the apparatus. Summary of the invention

[0006] The present invention provides a transport device that can advantageously perform position correction of a substrate chuck in a rotational direction in a simple manner, for example.

[0007] The present invention provides, in its first aspect, a conveying device for conveying a substrate chuck, the conveying device comprising: a hand, which is configured to support the substrate chuck; a main body, which is configured to pivotally support the hand around a vertical axis and move in horizontal and vertical directions; and a guide portion, which is arranged in the main body and is configured to guide the pivotal movement of the hand, wherein the hand comprises: a plurality of hand distal ends, each of which comprises a placement surface on which the substrate chuck is to be placed; and a hand proximal end portion, which is supported by the main body and is configured to support a base portion of each of the plurality of hand distal ends, and wherein an end surface of the hand proximal end portion facing the main body is formed into an arc shape of a circle centered on a vertical axis of a reference position between the plurality of hand distal ends, and wherein the guide portion comprises a guide surface, which has a shape corresponding to the end surface of the hand proximal end portion and is capable of slidably contacting the end surface.

[0008] The present invention, in its second aspect, provides a conveying device for conveying a substrate chuck, the conveying device comprising: a hand, which is configured to support the substrate chuck; a main body, which is configured to pivotally support the hand around a vertical axis and move in horizontal and vertical directions; and a guide portion, which is arranged in the main body and configured to guide the pivotal movement of the hand, wherein the hand comprises: a plurality of hand distal portions, each of which comprises a placement surface on which the substrate chuck is to be placed; and a hand proximal portion, which is supported by the main body and configured to support a base portion of each of the plurality of hand distal portions, and wherein a raised portion is formed on the back side of the hand proximal portion, the raised portion being formed in the shape of an arc of a circle around the vertical axis of a reference position between the plurality of hand distal portions, and the guide portion comprises a recessed portion in the front surface of the main body, the recessed portion being formed in the shape of an arc of the circle and being configured to engage with the raised portion.

[0009] The present invention, in its third aspect, provides a substrate processing device for processing a substrate, the substrate processing device comprising: a conveying device according to the first aspect; a table configured to support a substrate chuck conveyed by the conveying device; and a detector configured to detect a mark formed on the substrate chuck supported by the table, wherein the conveying device adjusts the position of the substrate chuck in a rotation direction around a central axis based on a detection result obtained by the detector.

[0010] In its fourth aspect, the present invention provides a method for manufacturing a product, the method comprising: forming a pattern on a substrate by using the substrate processing equipment according to the third aspect; and processing the substrate on which the pattern has been formed, wherein the product is made of the substrate that has been processed.

[0011] Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 is a view showing the arrangement of an exposure apparatus;

[0013] Figure 2 is a view showing the arrangement of a conveying device;

[0014] Figure 3 is a view showing the arrangement of the hands;

[0015] Figure 4 is a view showing the arrangement of the main body;

[0016] Figure 5 is a flow chart of a method for adjusting a rotational offset of a substrate chuck;

[0017] Figure 6 are views showing variations of the hand and the body; and

[0018] Figure 7 : is a view showing an example in which a straight line portion formed on a part of the periphery of a substrate chuck is used as a mark. DETAILED DESCRIPTION

[0019] Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that the following embodiments do not limit the present invention according to the scope of the appended claims. Although multiple features are described in the embodiments, not all features are essential to the present invention, and multiple features can be combined arbitrarily. The same reference numerals represent the same or similar parts and their repeated description will be omitted.

[0020] The present embodiment will describe an example of using a conveying device for conveying an object in a substrate processing device for processing a substrate. The object conveyed by the conveying device can be, for example, a substrate chuck for clamping a substrate. The substrate processing device can be, for example, a photolithography device (imprinting device, exposure device, charged particle beam tracer, etc.), a deposition device (CVD device, etc.), a processing device (laser processing device, etc.), and an inspection device (overlap inspection device, etc.). The imprinting device forms a pattern on the substrate by curing the imprinting material while contacting the mold (original) with the imprinting material provided on the substrate. The exposure device exposes the photoresist provided on the substrate via the original (graticule) used as the original mask to form a latent image corresponding to the original pattern on the photoresist. The charged particle beam tracer uses a charged particle beam to draw a pattern on the photoresist provided on the substrate and forms a latent image on the photoresist. The substrate to be processed by this substrate processing device can be, for example, a silicon wafer, but can also be a glass substrate, a copper substrate, a resin substrate, a SiC substrate, a sapphire substrate, etc. An example in which the substrate processing device is formed as an exposure device will be described to provide a more specific example below.

[0021] Figure 1 Schematic diagram showing the arrangement of the exposure device 100 according to the embodiment. In this specification, the direction is represented in the XYZ coordinate system, wherein the XY plane is set to a horizontal plane. Typically, the substrate 3 is placed on the substrate stage 5 so that its surface will be parallel to the horizontal plane (XY plane). Therefore, in the following description, the directions perpendicular to each other in the plane along the surface of the substrate 3 are set to the X-axis and the Y-axis, and the direction perpendicular to the X-axis and the Y-axis is set to the Z-axis. In addition, in the following description, in the XYZ coordinate system, the directions parallel to the X-axis, the Y-axis, and the Z-axis will be set to the X-direction, the Y-direction, and the Z-direction, respectively. The rotation direction around the X-axis, the rotation direction around the Y-axis, and the rotation direction around the Z-axis will be referred to as the θx direction, the θy direction, and the θz direction, respectively.

[0022] The exposure device 100 includes a mask stage 2 that holds a mask (original) 1, an illumination optical system 6 that illuminates the mask 1 held by the mask stage 2, and a projection optical system 7 that projects an image of a pattern of the mask 1 onto a substrate 3. The exposure device 100 also includes a substrate chuck 4 that clamps and holds the substrate 3 and a substrate stage 5 that can move while holding the substrate chuck 4. The exposure device 100 also includes a controller 13 that controls the overall operation of the exposure device 100. The controller 13 can be implemented by a computer including a CPU and a memory. It should be noted that the controller 13 can be arranged in a chamber (not shown) containing various components of the above-mentioned exposure device or arranged outside the chamber.

[0023] In the present embodiment, the exposure device 100 may be a scanning exposure device (scanner) that can transfer the pattern of the mask 1 to the substrate 3 while scanning the mask 1 and the substrate 3 in synchronization with each other in a scanning direction (e.g., Y direction). Alternatively, the exposure device 100 may be an exposure device (stepper) that can project the pattern of the mask 1 to the substrate 3 by fixing the mask 1.

[0024] The illumination optical system 6 illuminates the mask 1 with light (exposure light) having a uniform illumination distribution. As the exposure light, for example, g-rays (wavelength of about 436 nm) or i-rays (wavelength of about 365 nm) of a mercury lamp, KrF excimer lasers (wavelength of about 248 nm), ArF excimer lasers (wavelength of about 143 nm), or extreme ultraviolet light (EUV light) can be used.

[0025] The mask stage 2 is formed to be two-dimensionally movable in a plane (ie, an XY plane perpendicular to the optical axis of the projection optical system 7) and rotatable in the θz direction. The mask stage 2 may be driven by a driving device (not shown) such as a linear motor.

[0026] A reflection mirror 8 is arranged on the mask stage 2. A laser interferometer 10 is arranged at a position facing the reflection mirror 8. The laser interferometer 10 measures the rotation angle and position of the mask stage 2 in two-dimensional directions (XY directions) in real time, and transmits the measurement results to the controller 13. The controller 13 controls the driving device of the mask stage 2 based on the measurement results from the laser interferometer 10, and positions the mask 1 held by the mask stage 2.

[0027] The projection optical system 7 includes a plurality of optical elements and projects the pattern of the mask 1 onto the substrate 3 at a predetermined projection magnification. The substrate 3 is coated with a photosensitizer (resist), and when the image of the pattern of the mask 1 is projected onto the photosensitizer, a latent image pattern will be formed on the photosensitizer.

[0028] The substrate stage 5 may include a Z stage that can hold the substrate 3 via the substrate chuck 4 and move in the Z direction, an XY stage that can hold the Z stage and move in the X direction and the Y direction, and a base that supports the XY stage. Each of the above stages forming the substrate stage 5 is driven by a driving device such as a linear motor or the like. The substrate chuck 4 is arranged to be separable from the substrate stage 5.

[0029] A reflection mirror 9 is arranged in the substrate stage 5. Laser interferometers 11 and 12 are arranged at positions facing the reflection mirror 9. The laser interferometer 11 measures the position of the substrate stage 5 in the X direction, the Y direction, and the θz direction in real time, and transmits the measurement results to the controller 13. In a similar manner, the laser interferometer 12 measures the position of the substrate stage 5 in the Z direction, the θx direction, and the θy direction in real time, and transmits the measurement results to the controller 13. The controller 13 controls the driving device of the substrate stage 5 based on the measurement results of the laser interferometers 11 and the laser interferometer 12, and positions the substrate 3 held by the substrate stage 5.

[0030] The conveying device 14 conveys the substrate chuck 4 onto the substrate stage 5. The detector 16 is arranged on the upper side of the substrate stage 5 and the substrate chuck 4. The detector 16 measures each mark 18 ( Figure 2 ) to detect the position of the substrate chuck 4 in the rotation direction (θz direction). The detector 16 may include an illumination system for illuminating the marks 18, an imaging optical system for forming an image of each mark 18 by light from the marks 18, a sensor for capturing the image formed by the imaging optical system, etc. The detector 16 may be attached to a hand proximal portion of a chamber (not shown) of the exposure device 100, etc. Alternatively, the detector 16 may be attached to the conveying device 14.

[0031] Reference Figure 2 The arrangement of the conveying device 14 is described in detail. The conveying device 14 may include a hand 15 for supporting the substrate chuck 4, a main body 159 for supporting the hand 15, and a linear motion mechanism 17 for moving the main body 159 (i.e., the hand 15) in the X direction (horizontal direction) and the Z direction (vertical direction). The hand 15 includes two hand distal parts 151, each of which includes a placement surface on which the substrate chuck 4 is to be placed. The two hand distal parts 151 are arranged so that the substrate chuck 4 can be placed horizontally. The base parts of the two hand distal parts 151 are supported by the hand proximal part 152. Moreover, the hand proximal part 152 is supported by the main body 159. The main body 159 pivotally supports the hand 15 around a vertical axis (around the Z axis, i.e., along the θz direction). The hand proximal part 152 and the main body 159 are connected to each other by bolts or the like in a manner that does not hinder the pivotal movement of the hand 15. Note that the number of hand distal portions included in the hand 15 is not necessarily limited to two hand distal portions 151 , and may include three or more hand distal portions. That is, it is sufficient for the hand 15 to include a plurality of distal portions 151 .

[0032] Figure 3 and Figure 4 The main components obtained by disassembling the hand 15 and the main body 159 are shown. Figure 3 The main components of the hand 15 are shown, and Figure 4The main components of the main body 159 are shown. The end surface 153 of the hand proximal portion 152 facing the main body 159 is formed to be located at a reference position 154 ( Figure 2 ) is centered on the vertical axis of the hand 15. Here, the reference position 154 corresponds to the center of the substrate chuck 4 to be placed on the hand. The straight line portion 157 may be formed on both ends of the arc-shaped end surface 153. A guide portion 171 for guiding the pivotal movement of the hand 15 is provided on the opposite body 159. Figure 4 In the example shown, the guide portion 171 has a guide surface having a shape corresponding to the end surface 153 of the hand proximal portion 152 and can slidably contact the end surface 153. The straight portion 172 can be formed on both ends of the guide surface. Therefore, the conveying device 14 can pivot the substrate chuck 4 around the vertical axis of the reference position 154. When the hand proximal portion 152 and the straight portion 157 are in an assembled state, as shown in FIG. Figure 2 As shown, it is ensured that there is a gap C between the straight portion 157 of the hand proximal portion 152 and the straight portion 172 of the main body 159. The hand 15 pivots within a range corresponding to the gap C.

[0033] Please note that although Figures 2 to 4 In the example shown, the guide portion 171 forms only a partial arc of a circle around the vertical axis of the reference position 154 , but the guide portion 171 may be formed as a guide along the entire circumference of the circle or nearly the entire circumference.

[0034] The conveying device 14 may include a limiting portion that limits the positional deviation of the hand 15 relative to the main body 159 in the horizontal direction when the hand 15 is to be pivoted about the vertical axis of the reference position 154. For example, the limiting portion may include a protrusion 158 formed on the main body 159 and an engaging portion 155 formed on the hand proximal portion 152 of the hand 15 and engaged with the protrusion 158. The protrusion 158 may be formed by a pin, a boss, or the like. The engaging portion 155 may be a hole or a groove. For example, the engaging portion 155 may be an arc-shaped long hole corresponding to the shape of the guide portion 171. More specifically, the shape of the hole or the groove may be another shape according to the allowable positional deviation amount. On the other hand, the engaging portion 155 may be formed on the main body 159 and the protrusion 158 may be formed on the hand proximal portion 152 of the hand 15. That is, it is sufficient that the protrusion 158 is formed on one of the hand 15 and the body 159 and the engaging portion 155 is formed on the other of the hand 15 and the body 159. By arranging such a restricting portion, it is possible to suppress the positional deviation of the hand 15 in the horizontal direction more than necessary while the hand 15 is pivoting.

[0035] Furthermore, in the present embodiment, an engagement protrusion 156 that engages with an engagement hole formed in the rear surface of the substrate chuck 4 is provided on the placement surface of each of the two hand distal end portions 151. Each engagement protrusion 156 may be formed by a pin, a boss, or the like. Therefore, the two hand distal end portions 151 and the substrate chuck 4 can be accurately positioned. When the hand 15 is rotated and adjusted, the substrate chuck 4 can be adjusted integrally with the hand 15. Figure 2 In the embodiment, the reference position 154 may be set at the midpoint of the straight line connecting the corresponding engagement protrusions 156 of the two hand distal end portions. As described above, the reference position 154 corresponds to the center of the substrate chuck 4.

[0036] The hand 15 can be linearly moved in the X direction and the Z direction by the linear motion mechanism 17. When the substrate chuck 4 placed on the hand 15 is moved in the X direction by the linear motion mechanism 17 and reaches the installation position above the substrate stage 5, the hand 15 or the linear motion mechanism 17 abuts against a stopper (not shown) arranged on the linear motion mechanism 17. Therefore, when the substrate chuck 4 is to be installed, positioning with respect to the X direction can be accurately performed. In addition, when the substrate chuck 4 is lowered in the Z direction by the linear motion mechanism 17, the hand 15 can install the substrate chuck 4 on the substrate stage 5. The substrate chuck 4 can be removed by inserting the hand 15 between the substrate stage 5 and the substrate chuck 4 by the X-direction movement of the linear motion mechanism 17 and raising the hand 15 by the Z-direction movement of the linear motion mechanism 17.

[0037] In order to allow grasping of the displacement amount driven in the rotation adjustment operation in the case where the rotation adjustment operation of the substrate chuck 4 is performed outside the detection range of the detector 16, a scale indicating the pivot amount of the hand 15 may be arranged on, for example, the hand proximal end portion 152 of the hand 15. A set screw with a micrometer, an encoder, or the like may also be provided instead of the scale.

[0038] Reference Figure 5 A method of adjusting the rotation position of the substrate chuck 4 according to the embodiment is described.

[0039] In step S501, the controller 13 controls the conveying device 14 so that the substrate chuck 4 will be placed on the hand 15 and then the substrate chuck 4 will be mounted on the substrate stage 5. In step S502, the controller 13 measures the position (rotational offset) of the substrate chuck 4 in the rotation direction (θz direction) based on the detection result obtained by the detector 16. Figure 2As shown, a plurality of marks 18 are formed on the substrate chuck 4. The controller 13 can obtain the position of the substrate chuck 4 in the rotation direction by detecting the position of each mark 18 using the detector 16 and calculating the difference between the detected position and the position of the mark 18 in the absence of rotational offset. Here, in the case where the mark 18 is not at a position that can be detected by the detector 16, the controller 13 will adjust the position of the substrate stage 5 in the X direction and the Y direction to allow the detector 16 to detect the mark 18.

[0040] Note that although Figure 2 An example is shown in which a plurality of marks 18 are formed on the substrate chuck 4, but a portion of the periphery of the substrate chuck 4 may be formed as a straight line portion 182 (orientation flat surface) and this portion may be used as a mark, such as Figure 7 In this case, the detector 16 detects the straight portion 182. The state in which the straight portion 182 is parallel to the Y direction is set as a state in which there is no rotational offset, and the rotational offset of the substrate chuck 4 can be calculated based on the known length of the straight portion 182 and the offset ΔA of the straight portion 182 in the X direction.

[0041] Alternatively, an arrangement may be considered in which a rear side observation optical system (not shown) for observing the back side (adsorption surface side) of the substrate is arranged inside the substrate chuck 4. In this case, the detector 16 will detect each alignment mark on the adsorption surface of the substrate placed on the substrate chuck 4 via the rear side observation optical system in the substrate chuck 4. Since the rotational offset of the substrate chuck 4 causes a relative positional offset between the rear side observation optical system and each alignment mark on the adsorption surface of the substrate, the field of view becomes narrower during the detection of the alignment mark. The rotational offset of the chuck can be calculated based on the offset amount of this field of view.

[0042] In step S503, the controller 13 controls the conveying device 14 to lift the substrate chuck 4 from the mounting surface of the substrate stage 5 by using the hand 15. This is done to prevent friction between the substrate chuck 4 and the substrate stage 5 when the substrate chuck 4 rotates in the next step S504.

[0043] In step S504, position adjustment of the substrate chuck 4 in the rotation direction around the central axis is performed. More specifically, in step S504, the controller 13 rotates the hand 15 in the θz direction based on the measurement result of step S502. At this time, the substrate chuck 4 may be temporarily removed from the hand 15, and the substrate chuck 4 may be placed on the hand 15 again after the position adjustment of the hand 15 has been completed. In addition, the rotation drive operation may be performed manually by a human hand, rather than under the automatic control of the controller 13.

[0044] After the adjustment of the rotational position of the substrate chuck 4 has been completed, the controller 13 will control the conveying device 14 to place the substrate chuck 4 on the substrate stage 5 in step S505. If the operation is to be performed manually, a process for confirming whether the rotational deviation of the substrate chuck 4 is within the allowable range can be performed by using the detector 16 after the substrate chuck 4 has been mounted on the substrate stage 5.

[0045] The hand 15 is arranged to be detachable from the main body 159. For example, when the rotation-adjustable chuck α is replaced with a chuck β different from the chuck α, the assembly formed by the chuck α and the rotation-adjustable rotating hand A may be replaced by an assembly formed by the chuck β and the rotating hand B. This will allow the process of steps S502 to S505 to be omitted when the chuck α is mounted on the substrate stage 5 again.

[0046] (Variant)

[0047] Reference Figure 6 Modifications of the guide portion 171 are described.

[0048] exist Figure 6 In the embodiment, the reference position 154 between the two distal end portions 151 of the hand is formed (see Figure 2 ) is centered on the vertical axis of the hand 15, is formed on the back of the hand proximal end portion 152 of the hand 15. With respect to the convex portion, a concave portion molded in the above-mentioned arc shape of a circle and engaged with the convex portion 191 is formed on the front surface of the body 159 as a guide portion 171. This arrangement will allow the hand 15 to accurately pivot.

[0049] The other arrangements of this variation are similar to those of the above-described embodiment. This variation may also include a limiting portion that limits the positional deviation of the hand 15 relative to the body 159 in the horizontal direction during the pivotal movement of the hand 15. Figure 3 and Figure 4 Similar engagement portions 155 and protrusions 158 are also shown in Figure 6 is shown in the example.

[0050] In addition, if Figure 3 The engaging protrusions 156 shown can be provided on the corresponding placement surfaces of the two hand distal end portions 151. However, since the placement surfaces of the two hand distal end portions 151 are located at the corresponding lower surfaces of the two hand distal end portions, Figure 6 The engaging protrusion 156 is not shown.

[0051] <Example of Method for Manufacturing Product>

[0052] A method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing, for example, the following articles: micro devices such as semiconductor devices or elements with microstructures. The method for manufacturing an article according to an embodiment may include the step of forming a pattern of an original on a substrate by using the above-mentioned substrate processing equipment, and the step of processing the substrate on which a pattern has been formed in the previous step. In addition, the article manufacturing method may include other known steps (oxidation, deposition, vapor deposition, doping, planarization, etching, resist removal, slicing, bonding, packaging, etc.). The method for manufacturing an article according to an embodiment is superior to conventional methods in at least one of the performance, quality, productivity and production cost of the article.

[0053] While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.

Claims

1. A conveying device for conveying a substrate chuck, the conveying device include: a hand configured to support the substrate chuck; a body configured to pivotally support the hand about a vertical axis and to move in horizontal and vertical directions; as well as a guide portion disposed in the body and configured to guide the pivotal movement of the hand, wherein the guide portion includes a guide surface parallel to the vertical direction, wherein the hand comprises: a plurality of hand distal portions, each hand distal portion comprising a placement surface on which the substrate chuck is to be placed; and a proximal hand portion supported by the body and configured to support a base portion of each of the plurality of distal hand portions, wherein the hand proximal end portion includes an end surface facing the guide surface, wherein the end surface is formed in an arc shape of a circle centered on a vertical axis of a reference position between the plurality of hand distal end portions, wherein the vertical axis corresponds to a central axis of a substrate chuck supported by the hand and the arc shape allows the substrate chuck supported by the hand to rotate about the vertical axis, and wherein the guide surface has a shape corresponding to the end surface of the hand proximal portion and is configured to slidably contact the end surface.

2. The conveying device according to claim 1, further comprising: include: A restricting portion is configured to restrict a positional deviation of the hand relative to the main body in the horizontal direction when the hand is to be pivoted about the vertical axis of the reference position of the hand.

3. The delivery device according to claim 2, wherein the restriction portion comprises a protrusion formed on one of the hand and the body, and An engaging portion is formed on the other of the hand and the body and is configured to engage with the protrusion.

4. The conveying device according to claim 1, wherein an engaging protrusion is formed on a placement surface of each of the plurality of hand distal end portions, the engaging protrusion being configured to engage with an engaging hole formed in a rear surface of the substrate chuck. 5 . The delivery apparatus according to claim 4 , wherein the reference position is provided at a midpoint of a straight line connecting the respective engaging protrusions of the plurality of hand distal end portions. The delivery device according to claim 1 , wherein a scale configured to indicate an amount of pivoting of the hand is disposed on the hand. 7 . The transport apparatus according to claim 1 , wherein the plurality of hand distal portions are two hand distal portions, each hand distal portion including a placement surface on which the substrate chuck is to be placed.

8. A conveying device for conveying a substrate chuck, the conveying device include: a hand configured to support the substrate chuck; a body configured to pivotally support the hand about a vertical axis and to move in horizontal and vertical directions; as well as a guide portion disposed in the body and configured to guide the pivotal movement of the hand, wherein the hand comprises: a plurality of hand distal portions, each hand distal portion comprising a placement surface on which the substrate chuck is to be placed; and a proximal hand portion supported by the body and configured to support a base portion of each of the plurality of distal hand portions, wherein a convex portion is formed on the back surface of the hand proximal portion, the convex portion being formed in an arc shape of a circle surrounding a vertical axis of a reference position between the plurality of hand distal portions, wherein the vertical axis corresponds to a central axis of a substrate chuck supported by the hand and the arc shape allows the substrate chuck supported by the hand to rotate about the vertical axis, and wherein the guide portion includes a concave portion in a front surface of the body, the concave portion being formed in an arc shape of the circle and configured to engage with the convex portion.

9. A substrate processing device for processing a substrate, the substrate processing device include: The conveying device according to claim 1; a stage configured to support a substrate chuck transported by the transport device; as well as a detector configured to detect a mark formed on the substrate chuck supported by the stage, wherein the transport device adjusts the position of the substrate chuck in the rotational direction about the central axis based on the detection result obtained by the detector. 10 . The substrate processing apparatus according to claim 9 , wherein the substrate processing apparatus is an apparatus configured to perform a process for forming a pattern on the substrate.

11. A method for manufacturing an article, the method include: forming a pattern on a substrate by using the substrate processing apparatus according to claim 10; as well as processing a substrate on which a pattern has been formed, The article is made of a substrate that has been subjected to the treatment.

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