Micro-hemispherical gyro structure of a curved surface electrode and its preparation method

Abstract

The present invention relates to the technical field of microelectromechanical system manufacturing, and particularly relates to a micro-hemispherical gyro structure with a curved surface electrode and a preparation method thereof; the method includes coating the outer surface of a micro-hemispherical resonator, coating the inner and outer surfaces of the micro-hemispherical curved surface electrode and spraying photoresist; aligning a photomask plate with an optical lens structure with the inner surface of the micro-hemispherical curved surface electrode, performing photolithography and development to pattern the photoresist of the curved surface structure; using the photoresist as a mask to pattern the metal film on the micro-hemispherical curved surface electrode to form excitation detection electrodes, shielding electrodes, and anchor electrodes; coaxially aligning the micro-hemispherical resonator with the micro-hemispherical curved surface electrode, curing and conducting the resonator anchor points and the curved surface electrode anchor points, and fixing the reference surface of the outer edge of the curved surface electrode on a buffer plate to form a micro-hemispherical gyro structure with a curved surface electrode; the present invention can effectively reduce the process difficulty and cost of manufacturing the curved surface electrode and has better thermal adaptation performance.

Description

Technical Field

[0001] The present invention relates to the technical field of microelectromechanical system manufacturing, and particularly relates to a micro hemisphere gyro structure with a curved surface electrode and a preparation method thereof. Background Art

[0002] The gyroscope is one of the core devices of an inertial navigation system, and is used for measuring the angular velocity and angular change of a moving object. The micro hemisphere gyro has a three-dimensional thin shell structure form with full axial symmetry, and is prepared by a microfabrication process. Due to its comprehensive advantages in terms of volume, cost, and performance, it can be widely applied to the navigation and attitude measurement fields of equipment such as aviation, aerospace, ships, vehicles, and robots.

[0003] The core device of the micro hemisphere gyro consists of a micro hemisphere resonator and an electrode. The resonator needs to form a four-wave belly vibration under certain external force excitation conditions, so as to have the performance of sensing the angular rate. The electrostatic excitation and capacitance detection are realized based on the micro capacitance structure formed by the electrode chip and the coated resonator: on the one hand, the micro capacitance generates a periodically changing electric field under the influence of an alternating voltage, which can excite the resonant shell to vibrate. On the other hand, by reading the capacitance change of the micro capacitance unit, the amplitude and phase change of the resonator vibration can also be calculated in real time, so as to obtain the angle and angular velocity information of the movement of the measured object.

[0004] The traditional micro capacitance structure of the micro hemisphere gyro adopts a planar electrode structure form. Both the resonator and the electrode are made of quartz glass, and a micro capacitance unit is constructed by forming a gap of about 10 microns between the lip edge of the resonator and the planar electrode substrate. The planar electrode has the advantages of simple structure and easy processing and assembly, and is the main technical solution adopted by relevant domestic researchers at present. However, the effective capacitance area of this structure is only a very small area of the lip of the resonator, and the small capacitance is not conducive to the electrostatic excitation and capacitance signal pickup during the operation of the gyro, thus limiting the improvement of the gyro accuracy.

[0005] Foreign researchers have also proposed preparation methods for cylindrical electrodes and curved surface electrodes on a silicon substrate. The method is to bond a silicon wafer and a glass substrate, use the glass sheet as the substrate, deposit a pattern on the silicon wafer by deep silicon etching process and etch to make a cylindrical / curved surface electrode, prepare the electrode pattern by dry etching and electroplating process, coaxially assemble the cylindrical / curved surface electrode and the resonator, and construct a micro capacitance unit in the curved surface area of the resonator. This method can effectively increase the capacitance area, improve the electrostatic excitation efficiency of the gyro and the micro capacitance reading accuracy, so as to improve the mechanical sensitivity of the micro hemisphere gyro. However, due to the relatively high process difficulty of the cylindrical / curved surface electrode by the deep silicon etching process and the high manufacturing cost, it has certain limitations. Summary of the Invention

[0006] In view of this, the present invention provides a microhemispherical gyro structure with a curved surface electrode and a preparation method thereof. The microhemispherical resonator made of quartz glass material and the microhemispherical curved surface electrode are both formed by flame blowing method, and the microhemispherical curved surface electrode retains the outer edge structure; a photomask plate with an optical lens structure is used to prepare the curved surface electrode pattern; the resonator housing, the curved surface electrode and the buffer plate are assembled and fixed to form a microhemispherical gyro sensor. This solution can effectively reduce the process difficulty and cost of manufacturing the curved surface electrode, and has better thermal adaptation performance.

[0007] In a first aspect of the present invention, there is provided a microhemispherical gyro structure with a curved surface electrode, including a microhemispherical resonator, a microhemispherical curved surface electrode and a buffer plate. A resonator anchor point is provided at the center of the microhemispherical resonator, and a curved surface electrode anchor point is provided at the center of the microhemispherical curved surface electrode; a curved surface electrode outer edge reference plane is provided at the spherical edge of the microhemispherical curved surface electrode; the photomask plate with an optical lens structure is aligned with the inner surface of the curved surface electrode, and excitation detection electrodes, shielding electrodes and anchor point electrodes are formed on the microhemispherical curved surface electrode; the microhemispherical resonator is coaxially aligned with the microhemispherical curved surface electrode, and conduction is solidified between the resonator anchor point and the curved surface electrode anchor point; the curved surface electrode outer edge reference plane is fixed on the buffer plate.

[0008] Further, the microhemispherical curved surface electrode has a structural size adapted to the microhemispherical resonator. The inner diameter of the microhemispherical curved surface electrode is larger than the outer diameter of the microhemispherical resonator, and the diameter of the curved surface electrode anchor point is smaller than the diameter of the resonator anchor point; and a fitting gap is formed between the inner spherical surface of the curved surface electrode and the outer spherical surface of the resonator.

[0009] Further, a metal film is plated on the outer surface of the microhemispherical resonator; metal films are plated on both the inner and outer surfaces of the microhemispherical curved surface electrode.

[0010] Preferably, the metal film material plated on the microhemispherical resonator and the microhemispherical curved surface electrode can be chromium gold.

[0011] Further, the excitation detection electrodes are evenly distributed in a circle, and there is a gap between two adjacent excitation detection electrodes; an annular gap is provided inside the circle formed by the excitation detection electrodes; an annular shielding electrode is provided inside the annular gap; the anchor point electrode is located on the plane of the curved surface electrode anchor point and is finally connected to the outer surface metal film of the microhemispherical resonator by connecting the resonator anchor point.

[0012] In a second aspect of the present invention, there is also provided a preparation method of a microhemispherical gyro structure with a curved surface electrode, the method including:

[0013] Coat the outer surface of the microhemispherical resonator, coat the inner and outer surfaces of the microhemispherical curved surface electrode and spray photoresist;

[0014] Align a photomask with an optical lens structure with the inner surface of the micro - hemispherical curved electrode, perform photolithography and development to pattern the photoresist of the curved structure;

[0015] Use the photoresist as a mask to pattern the metal film on the micro - hemispherical curved electrode to form an excitation detection electrode, a shielding electrode, and an anchor electrode;

[0016] Coaxially align the micro - hemispherical resonator with the micro - hemispherical curved electrode, cure and conduct the anchor points of the resonator and the curved electrode, and fix the reference plane of the outer edge of the curved electrode on the buffer plate to form a micro - hemispherical gyro structure with a curved electrode.

[0017] Furthermore, before coating, it also includes preparing a graphite forming mold according to the sizes of the micro - hemispherical resonator and the micro - hemispherical curved electrode, blowing a quartz substrate with a flame to soften and form the quartz substrate on the graphite forming mold, and respectively fabricating the three - dimensional curved structures of the micro - hemispherical resonator and the micro - hemispherical curved electrode.

[0018] Furthermore, the step of performing photolithography and development to pattern the photoresist of the curved structure includes using parallel light to pass through a photomask with an optical lens structure, diverging the parallel light to the side wall of the micro - hemispherical curved electrode to form a uniform photoresist pattern.

[0019] Furthermore, the step of forming a micro - hemispherical gyro structure with a curved electrode includes horizontally fixing the micro - hemispherical curved electrode on a micro - assembly platform, clamping or adsorbing the anchor point of the resonator based on image recognition technology, adjusting its attitude to be horizontal and making the micro - hemispherical resonator coaxial with the micro - hemispherical curved electrode, using conductive adhesive or solder to cure and conduct the anchor point of the resonator and the anchor point of the curved electrode; and fixing, bonding or welding the reference plane of the outer edge of the curved electrode on the buffer plate, where the wiring structure of the buffer plate matches the signal extraction positions of each electrode of the micro - hemispherical curved electrode to realize the extraction of electrode signals.

[0020] The advantages of the embodiments of the present invention are as follows:

[0021] Compared with the traditional planar - electrode micro - hemispherical gyro, the present invention has a significant capacitance - area advantage, which can greatly improve the electrostatic excitation efficiency and micro - capacitance reading accuracy of the gyro, thereby enhancing the mechanical sensitivity of the micro - hemispherical gyro; in the micro - hemispherical gyro structure of the present invention, since the anchor point of the resonator is not directly connected to the buffer plate, but the shell structure of the curved electrode is used as a transition, the influence of external stress - wave disturbances on the resonator is smaller, and the influence of external factors such as thermal stress and mechanical stress on the performance output of the gyro can be effectively reduced; compared with the existing silicon - based curved - electrode scheme, the present invention can effectively reduce the process difficulty and cost of fabricating the curved electrode and has better thermal adaptation performance. Description of the Drawings

[0022] Figure 1Structural diagram of a micro - hemisphere gyroscope with a curved surface electrode according to an embodiment of the present invention;

[0023] Figure 2 Three - dimensional view of a micro - hemisphere resonator in an embodiment of the present invention;

[0024] Figure 3 Cross - sectional view of a micro - hemisphere resonator in an embodiment of the present invention;

[0025] Figure 4 Three - dimensional view of a micro - hemisphere curved surface electrode in an embodiment of the present invention;

[0026] Figure 5 Cross - sectional view of a micro - hemisphere curved surface electrode in an embodiment of the present invention;

[0027] Figure 6 Schematic diagram of the graphic preparation process of a micro - hemisphere curved surface electrode in an embodiment of the present invention;

[0028] Figure 7 Schematic diagram of the graphic features of a micro - hemisphere curved surface electrode in an embodiment of the present invention;

[0029] Figure 8 Flowchart of the preparation method of a micro - hemisphere gyroscope structure with a curved surface electrode according to an embodiment of the present invention;

[0030] The names represented by the reference numerals in the figure are: 1, micro - hemisphere resonator; 2, resonator anchor point; 3, micro - hemisphere curved surface electrode; 4, curved surface electrode anchor point; 5, reference plane of the outer edge of the curved surface electrode; 6, photomask; 7, optical lens structure; 8, excitation and detection electrode; 81, first interval; 89, second interval; 9, shielding electrode; 10, anchor point electrode; 11, buffer plate. Detailed implementation manners

[0031] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0032] Figure 1 It is a structural diagram of a micro - hemisphere gyroscope with a curved surface electrode according to an embodiment of the present invention, as shown in Figure 1As shown, it includes a micro - hemispherical resonator 1, a micro - hemispherical curved surface electrode 3, and a buffer plate 11. A resonator anchor 2 is provided at the center of the micro - hemispherical resonator 1, and a curved surface electrode anchor 4 is provided at the center of the micro - hemispherical curved surface electrode 3. A curved surface electrode outer edge reference plane 5 is provided at the spherical edge of the micro - hemispherical curved surface electrode 3. Align the photolithographic plate containing the optical lens structure with the inner surface of the curved surface electrode, and form an excitation detection electrode, a shielding electrode, and an anchor electrode on the micro - hemispherical curved surface electrode 3. The micro - hemispherical resonator 1 is coaxially aligned with the micro - hemispherical curved surface electrode 3, and the resonator anchor 2 and the curved surface electrode anchor 4 are cured and electrically connected. Fix the curved surface electrode outer edge reference plane 5 on the buffer plate 11, and finally, the electrode signal can be led out.

[0033] In the embodiment of the present invention, the micro - hemispherical resonator 1 and the micro - hemispherical curved surface electrode 3 are made of the same material and processed in the same way, which can ensure the consistency of the micro - hemispherical resonator 1 and the micro - hemispherical curved surface electrode 3, and at the same time, can effectively reduce the process difficulty and cost of manufacturing the micro - hemispherical resonator 1 and the micro - hemispherical curved surface electrode 3.

[0034] In the embodiment of the present invention, please refer to Figure 2 and Figure 3 , the micro - hemispherical resonator 1 is an umbrella - shaped three - dimensional curved surface structure, with a raised resonator anchor 2 provided on its inner surface. The resonator anchor 2 is in a horn shape and can be used for alignment and electrical connection with the micro - hemispherical curved surface electrode 3 structure.

[0035] In the embodiment of the present invention, please refer to Figure 4 and Figure 5 , the micro - hemispherical curved surface electrode 3 is an umbrella - shaped three - dimensional curved surface structure that matches the micro - hemispherical resonator 1. Similarly, a curved surface electrode anchor 4 corresponding to the resonator anchor 2 is provided on its inner surface. Different from the above - mentioned micro - hemispherical resonator 1, the micro - hemispherical curved surface electrode 3 further includes a partial extension structure, namely, the curved surface electrode outer edge reference plane 5, and this curved surface electrode outer edge reference plane 5 structure can facilitate the fixed packaging of the micro - hemispherical resonator 1 and the micro - hemispherical curved surface electrode 3.

[0036] In the embodiment of the present invention, the micro - hemispherical curved surface electrode 3 has a structural size adapted to the micro - hemispherical resonator 1. Among them, the inner diameter of the micro - hemispherical curved surface electrode 3 is slightly larger than the outer diameter of the micro - hemispherical resonator 1, and the radius of the curved surface electrode anchor 4 of the micro - hemispherical curved surface electrode 3 is smaller than the radius of the resonator anchor 2 of the micro - hemispherical resonator 1. The micro - hemispherical curved surface electrode 3 has the structural feature of the curved surface electrode outer edge reference plane 5 for structural fixation and signal extraction.

[0037] It is understandable that both the micro - hemispherical resonator 1 and the micro - hemispherical curved - surface electrode 3 are shell structures with a certain thickness. Therefore, there are differences in the diameters of the inner and outer sides of the shell of the micro - hemispherical resonator 1 and the shell of the micro - hemispherical curved - surface electrode 3.

[0038] In the embodiment of the present invention, the first diameter difference between the inner diameter of the micro - hemispherical curved - surface electrode 3 and the outer diameter of the micro - hemispherical resonator 1 is r1, and r1 determines the capacitance gap size of the curved - surface capacitance structure; the second diameter difference between the radius of the curved - surface electrode anchor 4 of the micro - hemispherical curved - surface electrode 3 and the radius of the resonator anchor 2 of the micro - hemispherical resonator 1 is r2, and r2 is the adjustable space when the resonator and the electrode are coaxially assembled. For example, the first diameter difference r1 = 50um, and the second diameter difference r2 = 100um.

[0039] It is understandable that the first diameter difference determines the capacitance gap size of the curved - surface capacitance structure. To ensure the gyro sensitivity, the capacitance gap should not be too large, usually within 50um; the second diameter difference is used to provide the adjustable space for the coaxial assembly of the resonator and the electrode, and the present invention does not make specific limitations on its size.

[0040] In the embodiment of the present invention, please refer to Figure 6 , a photolithography plate 6 containing an optical lens structure 7 is fixed and aligned below the micro - hemispherical curved - surface electrode 3. Among them, the photolithography plate 6 is close to the light - source side, and the optical lens structure 7 is close to the side of the micro - hemispherical curved - surface electrode 3; the parallel light from the outside enters the optical lens structure 7 through the photolithography plate 6, and diverges the parallel light to the side wall of the micro - hemispherical curved - surface electrode 3, which is used to increase the exposure amount on the side of the curved - surface electrode and make the light transmission in the entire photolithography area more uniform; and a uniform photoresist pattern is formed. Using this uniform photoresist pattern, uniform excitation detection electrodes, shielding electrodes, and anchor electrodes can be formed.

[0041] In the embodiment of the present invention, please refer to Figure 7 , excitation detection electrodes 8, shielding electrodes 9, and anchor electrodes 10 are formed on the micro - hemispherical curved - surface electrode 3; among them, the excitation detection electrodes 8 are evenly distributed in a circle, and there is a certain first interval 81 between two adjacent excitation detection electrodes 8 to achieve insulation between two adjacent excitation detection electrodes 8; a circular second interval 89 is arranged inside the circle formed by the excitation detection electrodes 8; a circular shielding electrode 9 is arranged inside the circular second interval; and the anchor electrode 10 is located on the curved - surface electrode anchor 4 and is connected to the outer - surface metal film of the micro - hemispherical resonator 1; among them, the excitation detection electrodes 8 are used to apply an electric - field force to the resonator or read capacitance signals; the shielding electrodes 9 are used to reduce the electric - field interference between the adjacent excitation detection electrodes 8; and the anchor electrode 10 is used to provide an electric potential for the micro - hemispherical resonator.

[0042] Figure 8It is a flowchart of a preparation method for a micro - hemispherical gyro structure of a curved - surface electrode according to an embodiment of the present invention. As Figure 8 shown, the preparation method includes:

[0043] S1. Coat the outer surface of the micro - hemispherical resonator, coat the inner and outer surfaces of the micro - hemispherical curved - surface electrode, and spray photoresist;

[0044] In the embodiment of the present invention, the micro - hemispherical resonator structure is released by grinding and polishing, and a chromium - gold film layer is deposited on the outer surface of the micro - hemispherical resonator structure to obtain the micro - hemispherical resonator 1 required by the present invention. The micro - hemispherical curved - surface electrode structure is released by laser scribing, part of the outer edge structure is retained, and chromium - gold films are deposited on the inner and outer surfaces of the micro - hemispherical curved - surface electrode 3 and photoresist is sprayed to obtain the micro - hemispherical curved - surface electrode required by the present invention.

[0045] It should be noted that in this step, the obtained micro - hemispherical curved - surface electrode is only a shell structure that has not yet formed a curved - surface electrode. In subsequent steps, this shell structure needs to be processed until a complete micro - hemispherical curved - surface electrode 3 with a curved - surface electrode is obtained.

[0046] In the embodiment of the present invention, the micro - hemispherical curved - surface electrode 3 has a structural size adapted to the micro - hemispherical resonator 1. Among them, the inner diameter of the micro - hemispherical curved - surface electrode 3 is slightly larger than the outer diameter of the micro - hemispherical resonator 1, and the radius of the curved - surface electrode anchor point 4 of the micro - hemispherical curved - surface electrode 3 is smaller than the radius of the resonator anchor point 2 of the micro - hemispherical resonator 1; the micro - hemispherical curved - surface electrode 3 has the structural feature of the curved - surface electrode outer - edge reference plane 5 for structural fixation and signal extraction.

[0047] In the embodiment of the present invention, before coating and spraying photoresist on the micro - hemispherical resonator and the micro - hemispherical curved - surface electrode, it also includes preparing a graphite forming mold according to the sizes of the micro - hemispherical resonator and the micro - hemispherical curved - surface electrode, and making the quartz substrate soften and form on the graphite forming mold by flame blowing to respectively produce the three - dimensional curved - surface structures of the micro - hemispherical resonator and the micro - hemispherical curved - surface electrode.

[0048] S2. Align a photomask with an optical lens structure with the inner surface of the micro - hemispherical curved - surface electrode, perform photolithography and development to pattern the photoresist of the curved - surface structure;

[0049] In the embodiment of the present invention, on the lithography machine, the micro - hemispherical curved - surface electrode 3 is aligned with the photomask 6 with an optical lens structure 7 through the contour of the curved - surface electrode anchor point 4, and parallel light is diverged to the side wall of the micro - hemispherical curved - surface electrode 3 to increase the exposure amount of the side surface of the curved - surface electrode and make the light transmission in the entire photolithography area more uniform; perform photolithography and development to pattern the photoresist of the inner - curved - surface structure.

[0050] S3. Use the photoresist as a mask to pattern the metal film on the microhemispherical curved surface electrode, forming the excitation detection electrode, shielding electrode, and anchor electrode;

[0051] In the embodiment of the present invention, the exposed metal film layer on the microhemispherical curved surface electrode is removed by the gold / chromium etching solution to pattern the metal film on the inner surface of the microhemispherical curved surface electrode, forming features such as the excitation detection electrode 8, shielding electrode 9, and anchor electrode 10. After removing the remaining photoresist, the preparation of the curved surface electrode pattern can be completed.

[0052] S4. Coaxially align the microhemispherical resonator with the microhemispherical curved surface electrode, cure and conduct the resonator anchor with the curved surface electrode anchor, and fix the reference plane on the outer edge of the curved surface electrode on the buffer plate to form a microhemispherical gyro structure with a curved surface electrode.

[0053] In the embodiment of the present invention, the microhemispherical curved surface electrode 3 is horizontally fixed on the microassembly platform. Based on image recognition technology, the resonator anchor 2 is clamped / adsorbed, and its posture is adjusted to be horizontal and the microhemispherical resonator 1 is coaxially aligned with the microhemispherical curved surface electrode 3. The resonator anchor 2 and the curved surface electrode anchor 4 are cured and conducted using conductive adhesive / solder. The reference plane 5 on the outer edge of the curved surface electrode is fixedly bonded / welded to the buffer plate 11. The wiring structure of the buffer plate 11 matches the signal extraction positions of each electrode of the curved surface electrode to realize the extraction of electrode signals, thereby completing the preparation of the microhemispherical gyro structure described in the present invention.

[0054] The advantages of the embodiment of the present invention are as follows: Compared with the traditional planar electrode scheme, this scheme has a significant capacitance area advantage, which can greatly improve the electrostatic excitation efficiency of the gyro and the microcapacitance reading accuracy, thereby enhancing the mechanical sensitivity of the microhemispherical gyro. The structure described in the present invention can also extend the buffer distance of the energy exchange between the resonator anchor and the housing base, thereby reducing the influence of external factors such as thermal stress and mechanical stress on the gyro output; Compared with the existing silicon-based curved surface electrode scheme, the manufacturing of traditional curved surface electrodes relies on technologies such as silicon-glass bonding and deep silicon etching. The silicon-based thin film deposition and patterning processes require a large amount of equipment and process technology support, and also cost a large amount of time and manufacturing costs. This scheme can effectively reduce the process difficulty and cost of manufacturing the curved surface electrode and has better thermal adaptation performance.

[0055] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "coaxial", "bottom", "one end", "top", "middle", "the other end", "up", "one side", "top", "inner", "outer", "front", "center", "both ends", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.

[0056] In the present invention, unless otherwise clearly specified and defined, terms such as "installation", "setting", "connection", "fixation", "rotation" shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two components or the interaction relationship between two components. Unless otherwise clearly defined, for those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0057] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A preparation method of a micro-hemispherical gyro structure with a curved surface electrode, characterized in that, The method includes: Using flame blowing to process a quartz substrate to fabricate three-dimensional curved surface structures of a micro hemisphere resonator and a micro hemisphere curved surface electrode respectively; a resonator anchor point is arranged at the center of the micro hemisphere resonator, and a curved surface electrode anchor point is arranged at the center of the micro hemisphere curved surface electrode; a curved surface electrode outer edge reference plane is arranged at the spherical edge of the micro hemisphere curved surface electrode. Coating the outer surface of the micro hemisphere resonator, and coating the inner and outer surfaces of the micro hemisphere curved surface electrode and spraying photoresist. Aligning a photomask plate with an optical lens structure with the inner surface of the micro hemisphere curved surface electrode, performing photolithography development to pattern the photoresist of the curved surface structure. Using the photoresist as a mask to pattern the metal film on the micro hemisphere curved surface electrode to form an excitation detection electrode, a shielding electrode, and an anchor point electrode. Aligning the micro hemisphere resonator and the micro hemisphere curved surface electrode coaxially, curing and conducting the resonator anchor point and the curved surface electrode anchor point, and fixing the curved surface electrode outer edge reference plane on a buffer plate to form a micro hemisphere gyro structure with a curved surface electrode.

2. The preparation method of a micro-hemispherical gyro structure with a curved surface electrode according to claim 1, characterized in that, The step of using flame blowing to process a quartz substrate to fabricate three-dimensional curved surface structures of a micro hemisphere resonator and a micro hemisphere curved surface electrode respectively includes preparing a graphite forming mold according to the sizes of the micro hemisphere resonator and the micro hemisphere curved surface electrode, and through flame blowing the quartz substrate to soften and form the quartz substrate on the graphite forming mold to fabricate the three-dimensional curved surface structures of the micro hemisphere resonator and the micro hemisphere curved surface electrode respectively, so as to form a matching assembly gap size.

3. The preparation method of a micro-hemispherical gyro structure with a curved surface electrode according to claim 1, characterized in that, The step of performing photolithography development to pattern the photoresist of the curved surface structure includes using parallel light to pass through a photomask plate with an optical lens structure to diverge the parallel light to the side wall of the micro hemisphere curved surface electrode to form a uniform photoresist pattern.

4. The preparation method of a micro-hemispherical gyro structure with a curved surface electrode according to claim 1, characterized in that, The step of forming a micro hemisphere gyro structure with a curved surface electrode includes horizontally fixing the micro hemisphere curved surface electrode on a micro-assembly platform, based on image recognition technology, clamping or adsorbing the resonator anchor point, adjusting its attitude to be horizontal and making the micro hemisphere resonator and the micro hemisphere curved surface electrode coaxially aligned, using conductive adhesive or solder to cure and conduct the resonator anchor point and the curved surface electrode anchor point; and fixing and bonding or welding the curved surface electrode outer edge reference plane on the buffer plate, wherein the wiring structure of the buffer plate matches the signal extraction positions of each part of the micro hemisphere curved surface electrode to realize electrode signal extraction.

5. A microhemispherical gyro structure with a curved surface electrode, which is prepared by using the preparation method of the microhemispherical gyro structure with a curved surface electrode as described in any one of claims 1-4, and is characterized in that, The micro hemisphere curved surface electrode has a structural size adapted to the micro hemisphere resonator, the inner diameter of the micro hemisphere curved surface electrode is larger than the outer diameter of the micro hemisphere resonator, the diameter of the curved surface electrode anchor point is smaller than the diameter of the resonator anchor point; and a fitting gap is formed between the inner spherical surface of the curved surface electrode and the outer spherical surface of the resonator.

6. The micro-hemispherical gyro structure of a curved surface electrode according to claim 5, characterized in that, A metal film is coated on the outer surface of the micro hemisphere resonator; metal films are coated on both the inner and outer surfaces of the micro hemisphere curved surface electrode.

7. The micro-hemispherical gyro structure of a curved surface electrode according to claim 6, characterized in that, The excitation detection electrodes are evenly distributed in a circumference, and there is an interval between two adjacent excitation detection electrodes; an annular interval is arranged inside the circumference formed by the excitation detection electrodes; an annular shielding electrode is arranged inside the annular interval; the anchor point electrode is located on the plane of the curved surface electrode anchor point and is finally connected to the outer surface metal film of the micro hemisphere resonator through connecting the resonator anchor point.

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