A glue nozzle seat bearing device and glue coating and developing equipment

Abstract

The present invention provides a nozzle holder supporting device, comprising: a supporting body, on which the nozzle holder is arranged; the supporting body comprises a nozzle placement hole and a nozzle flushing hole, the nozzle of the nozzle holder is placed inside the nozzle placement hole, and the nozzle placement hole and the nozzle flushing hole are connected at the position where the nozzle is located; the diameter of the nozzle flushing hole is smaller than the radius of the nozzle placement hole, and is arranged tangentially to the nozzle placement hole, so that the flushing liquid forms a vortex in the nozzle placement hole to clean the nozzle. The nozzle placement hole and the nozzle flushing hole are arranged in a tangential manner, so that the flushing liquid forms a vortex after entering the nozzle placement hole from the nozzle flushing hole, flushing the nozzle in the nozzle placement hole, thereby removing the agglomeration at the nozzle, improving the stability of the photoresist discharge amount, and improving the stability of the process. The present invention also provides a glue coating and developing device.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a nozzle holder bearing device and a glue coating and developing device. Background Art

[0002] The glue developer is one of the indispensable equipment in the semiconductor production process. The glue developer mainly includes a glue coating unit, a developer unit and a hot plate. Among them, the glue coating unit is responsible for evenly coating the photoresist layer on the surface of the wafer, and has very high requirements for the discharge volume of the photoresist. The nozzle holder carrier and the nozzle holder, as direct contacts of the photoresist, have a direct impact on the discharge volume of the photoresist. When the nozzle is in the waiting stage of the photolithography process, the nozzle is placed in the carrier, and the solvent of the photoresist is volatile, which easily causes agglomeration and blockage at the nozzle, resulting in changes in the discharge volume.

[0003] The prior art relies on the volatilization of chemicals to moisturize the nozzle, which is not effective in preventing photoresist from agglomerating. Another prior art is to directly soak the nozzle in moisturizing liquid to achieve moisturizing, which inevitably dilutes part of the photoresist in the nozzle, thereby affecting the coating performance.

[0004] Therefore, it is necessary to develop a novel nozzle holder bearing device and glue coating and developing equipment to avoid the above-mentioned problems existing in the prior art. Summary of the invention

[0005] The object of the present invention is to provide a nozzle holder bearing device and a glue coating and developing device, which can avoid the situation where the photoresist agglomeration at the nozzle causes the photoresist discharge amount to be unstable, so as to improve the stability of the process.

[0006] To achieve the above-mentioned purpose, the nozzle seat supporting device provided by the present invention includes: a supporting body, on which the nozzle seat is arranged; the supporting body includes a nozzle placement hole and a nozzle flushing hole, the nozzle of the nozzle seat is placed inside the nozzle placement hole, and the nozzle placement hole and the nozzle flushing hole are connected at the position where the nozzle is located; a flushing pipe, which is connected to the nozzle flushing hole to provide flushing liquid; the diameter of the nozzle flushing hole is smaller than the radius of the nozzle placement hole, and is arranged tangent to the nozzle placement hole, so that the flushing liquid forms a vortex in the nozzle placement hole to clean the nozzle.

[0007] The beneficial effect of the nozzle holder supporting device provided by the present invention is that the nozzle placement hole and the nozzle flushing hole are arranged in a tangential manner, so that the flushing liquid forms a vortex after entering the nozzle placement hole from the nozzle flushing hole, flushing the nozzle in the nozzle placement hole, thereby removing the lumps at the nozzle, improving the stability of the photoresist discharge amount, and improving the stability of the process.

[0008] Optionally, the nozzle placement hole and the nozzle flushing hole are perpendicular to each other. The beneficial effect is that it is conducive to forming a vortex and improving the flushing effect.

[0009] Optionally, the nozzle placement hole is a stepped hole, and the diameter of the hole section decreases as the nozzle diameter decreases. The beneficial effect is that it is helpful to reduce the gap between the inner wall of the nozzle placement hole and the nozzle, and improve the flushing effect.

[0010] Optionally, the carrier also includes a waste discharge circular groove and a waste discharge flushing hole, wherein the waste discharge circular groove is arranged downstream of the liquid flow of the nozzle placement hole to receive the waste liquid flowing out of the nozzle placement hole, and the waste discharge flushing hole is connected to the bottom of the waste discharge circular groove, and its diameter is smaller than the radius of the waste discharge circular groove, and is arranged tangentially to the waste discharge circular groove, so that the flushing liquid forms a vortex in the waste discharge circular groove, and overflows from the waste discharge circular groove after flushing the waste discharge circular groove. Its beneficial effect is that the flushing liquid is injected into the waste discharge circular groove through the waste discharge flushing hole to prevent the photoresist flushed from the nozzle from re-agglomerating in the waste discharge circular groove, and the flushing liquid accumulated in the waste discharge circular groove evaporates to the nozzle position, which is beneficial to moisturizing the nozzle and preventing the photoresist from agglomerating.

[0011] Optionally, the waste discharge circular groove and the waste discharge flushing hole are perpendicular to each other. The beneficial effect is that it is conducive to forming a vortex and improving the flushing effect.

[0012] Optionally, the carrier further includes a waste discharge groove and a waste discharge pipe connected to the waste discharge groove, wherein the waste discharge groove is arranged at a downstream position where the liquid in the waste discharge circular groove overflows after being filled, and the height of the bottom surface of the waste discharge groove near the waste discharge pipe is lower than that of other positions of the bottom surface. The beneficial effect is that the height difference of the bottom surface of the waste discharge groove is conducive to discharging the waste liquid from the waste discharge pipe.

[0013] Optionally, the opening of the circular waste discharge groove is an oblique opening, and the lower part of the oblique opening faces the waste discharge groove. The beneficial effect is that it is conducive to the flow of waste liquid into the waste discharge groove.

[0014] Optionally, a clamping assembly is further included, and the clamping assembly is arranged on the surface of the carrier to clamp the nozzle seat. The beneficial effect is that the nozzle seat is stably fixed to the carrier.

[0015] Optionally, the carrier includes an upper carrier part and a lower carrier part connected to each other, and a sealing ring is arranged between the upper carrier part and the lower carrier part. The beneficial effect is that it is helpful to reduce the processing difficulty of the carrier and prevent the flushing liquid from overflowing from the inside of the carrier.

[0016] The glue coating and developing equipment provided by the present invention comprises the above-mentioned glue nozzle seat bearing device.

[0017] The beneficial effect of the coating and developing device of the present invention is that the nozzle can be flushed to remove the agglomerates at the nozzle, thereby improving the stability of the photoresist discharge amount and improving the stability of the process. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of an embodiment of a nozzle holder bearing device of the present invention;

[0019] Figure 2 for Figure 1 A schematic structural diagram of the carrier shown;

[0020] Figure 3 for Figure 2 A cross-sectional view showing the positional relationship between the photoresist nozzle hole and the nozzle flushing hole;

[0021] Figure 4 for Figure 2 A cross-sectional view showing the positional relationship between the photoresist solvent nozzle hole and the nozzle flushing hole;

[0022] Figure 5 Schematic diagram of the vortex flow in the nozzle placement hole and the waste discharge circular groove;

[0023] Figure 6 for Figure 2 A schematic cross-sectional structure diagram of a nozzle placement hole shown;

[0024] Figure 7 for Figure 2 The structural schematic diagram of the lower part of the carrier shown;

[0025] Figure 8 for Figure 7 A schematic diagram of the flow path of the flushing liquid of the lower part of the carrier is shown;

[0026] Fig. 9 for Figure 7 A schematic cross-sectional structure diagram of the lower component of the carrier shown;

[0027] Fig.10 for Figure 1 The structural schematic diagram of the nozzle holder is shown. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the present invention belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0029] In order to solve the problems existing in the prior art, an embodiment of the present invention provides a nozzle seat bearing device.

[0030] Figure 1 It is a structural schematic diagram of an embodiment of a nozzle holder bearing device of the present invention.

[0031] In some embodiments of the present invention, referring to Figure 1 , comprising: a carrier body 1, a nozzle seat 2 is arranged on the carrier body 1; the carrier body 1 comprises a nozzle placement hole 3 and a nozzle flushing hole 4, the nozzle of the nozzle seat 2 is placed inside the nozzle placement hole 3, and the nozzle placement hole 3 and the nozzle flushing hole 4 are connected at the position of the nozzle; a flushing pipeline (not shown in the figure), the flushing pipeline (not shown in the figure) is connected to the nozzle flushing hole 4 to provide flushing liquid; the diameter of the nozzle flushing hole 4 is smaller than the radius of the nozzle placement hole 3, and is arranged tangent to the nozzle placement hole 3, so that the flushing liquid forms a vortex in the nozzle placement hole 3 to clean the nozzle.

[0032] Specifically, refer to Figure 1 The carrier 1 includes an upper carrier part 11 and a lower carrier part 12 which are connected to each other.

[0033] Figure 2 for Figure 1 The structural schematic diagram of the carrier is shown.

[0034] Specifically, refer to Figure 1 and Figure 2 The upper surface of the carrier upper component 11 is provided with a nozzle placement hole 3 which passes through in the vertical direction. The nozzle placement hole 3 includes a photoresist nozzle hole and a photoresist solvent nozzle hole. The photoresist nozzle hole includes a first photoresist nozzle hole 311 and a second photoresist nozzle hole 312. The photoresist solvent nozzle hole includes a first photoresist solvent nozzle hole 321 and a second photoresist solvent nozzle hole 322.

[0035] Specifically, refer to Figure 1 The nozzle seat 2 includes a first nozzle seat 21 and a second nozzle seat 22 .

[0036] Specifically, refer to Figure 1 and Figure 2 The nozzle seat 2 is arranged on the upper surface of the upper component 11 of the carrier, and its nozzles are respectively placed in the first photoresist nozzle hole 311 and the second photoresist nozzle hole 312.

[0037] Figure 3 for Figure 2 A cross-sectional view showing the positional relationship between the photoresist nozzle hole and the nozzle flushing hole; Figure 4 for Figure 2 A cross-sectional view showing the positional relationship between the photoresist solvent nozzle hole and the nozzle flushing hole.

[0038] Specifically, refer to Figure 3 and Figure 4 A nozzle flushing hole 4 which is interconnected with the nozzle placement hole 3 is opened on the side wall of the upper component 11 of the carrier.

[0039] Specifically, refer to Figure 3 and Figure 4 The diameter of the nozzle flushing hole 4 is smaller than the radius of the nozzle placement hole 3, so that the opening of the nozzle flushing hole 4 is set within the radius length between the inner wall of the nozzle placement hole 3 and the axis.

[0040] Specifically, refer to Figure 3 and Figure 4 In a plane perpendicular to the extension direction of the nozzle placement hole 3, the straight line formed by the projection of the inner wall of the nozzle flushing hole 4 in the plane is tangent to the circle formed by the projection of the inner wall of the nozzle placement hole 3 in the plane.

[0041] Figure 5 Schematic diagram of the vortex flow in the nozzle placement hole and the waste discharge circular groove.

[0042] Specifically, refer to Figure 3 , Figure 4 and Figure 5 The flushing liquid enters the nozzle placement hole 3 from the nozzle flushing hole 4, flows along the inner wall of the nozzle placement hole 3, forms a vortex for flushing the nozzle, and finally flows out from the bottom opening of the nozzle placement hole 3.

[0043] In some embodiments of the present invention, the nozzle placement hole 3 and the nozzle flushing hole 4 are perpendicular to each other.

[0044] Specifically, the projections of the axis of the nozzle placement hole 3 and the axis of the nozzle flushing hole 4 in a plane in which the axis of the nozzle placement hole 3 and the axis of the nozzle flushing hole 4 are parallel are perpendicular to each other.

[0045] Figure 6 for Figure 2 A schematic diagram of the cross-sectional structure of the nozzle placement hole is shown.

[0046] In some embodiments of the present invention, referring to Figure 6 The nozzle placement hole 3 is a stepped hole, and the diameter of the hole section decreases as the nozzle diameter decreases.

[0047] Specifically, refer to Figure 6 and Fig.10 The nozzle is a conical structure, and the diameter of the hole section of the nozzle placement hole 3 decreases as the nozzle diameter decreases.

[0048] Figure 7 for Figure 2 The structural schematic diagram of the lower part of the carrier shown; Figure 8 for Figure 7 Schematic diagram of the flushing liquid flow path of the lower part of the carrier is shown.

[0049] In some embodiments of the present invention, referring to Figure 2 , Figure 5 , Figure 7 and Figure 8 The carrier 1 also includes a waste discharge circular groove 5 and a waste discharge flushing hole 6. The waste discharge circular groove 5 is arranged downstream of the liquid flow of the nozzle placement hole 3 to receive the waste liquid flowing out of the nozzle placement hole 3. The waste discharge flushing hole 6 is connected to the bottom of the waste discharge circular groove 5, and its diameter is smaller than the radius of the waste discharge circular groove 5. It is arranged tangent to the waste discharge circular groove 5, so that the flushing liquid forms a vortex in the waste discharge circular groove 5, and overflows from the waste discharge circular groove 5 after flushing the waste discharge circular groove 5.

[0050] Specifically, refer to Figure 7 and Figure 8 The waste discharge circular groove 5 and the waste discharge flushing hole 6 are arranged on the lower part 12 of the carrier, and the waste discharge circular groove 5 is located below the nozzle placement hole 3.

[0051] Specifically, refer to Figure 7 and Figure 8 The opening of the waste discharge flushing hole 6 is arranged on the inner wall of the waste discharge circular groove 5 near the bottom.

[0052] Fig. 9 for Figure 7 The cross-sectional structure diagram of the lower part of the carrier is shown.

[0053] Specifically, refer to Fig. 9The diameter of the waste discharge flushing hole 6 is smaller than the radius of the waste discharge circular groove 5, so that the opening of the waste discharge flushing hole 6 is set within the radius length between the inner wall of the waste discharge circular groove 5 and the axis.

[0054] Specifically, refer to Fig. 9 In a plane perpendicular to the extension direction of the waste discharge circular groove 5, the straight line formed by the projection of the inner wall of the waste discharge flushing hole 6 in the plane is tangent to the circle formed by the projection of the inner wall of the waste discharge circular groove 5 in the plane.

[0055] In some embodiments of the present invention, the waste discharge circular groove 5 and the waste discharge flushing hole 6 are perpendicular to each other.

[0056] Specifically, the projections of the axis of the waste discharge circular groove 5 and the axis of the waste discharge flushing hole 6 in a plane in which the axis of the waste discharge circular groove 5 and the axis of the waste discharge flushing hole 6 are parallel are perpendicular to each other.

[0057] In some embodiments of the present invention, referring to Figure 1 , Figure 7 and Fig. 9 The carrier 1 also includes a waste discharge groove 7 and a waste discharge pipe 8 connected to the waste discharge groove 7. The waste discharge groove 7 is arranged at a downstream position where the liquid in the waste discharge circular groove 5 overflows after being filled. The height of the bottom surface of the waste discharge groove 7 near the waste discharge pipe 8 is lower than other positions of the bottom surface.

[0058] Specifically, refer to Figure 7 and Fig. 9 The bottom surface of the waste discharge groove 7 is V-shaped, and its lowest point is located at the waste discharge pipe 8.

[0059] In some other embodiments of the present invention, the bottom surface of the waste discharge trough 7 is an arc surface, and the lowest point thereof is located at the waste discharge pipe 8 .

[0060] In some embodiments of the present invention, referring to Figure 2 and Figure 7 The opening of the waste discharge circular groove 5 is an oblique opening, and the lower part of the oblique opening faces the waste discharge groove.

[0061] In some embodiments of the present invention, reference Figure 1 The nozzle seat bearing device further includes a clamping assembly 9 , and the clamping assembly 9 is disposed on the surface of the bearing body 1 to clamp the nozzle seat 2 .

[0062] Specifically, refer to Figure 1 The clamping assembly 9 includes a rotary cylinder 91, which is fixed to the carrier 1 and used to clamp the nozzle seat 2; a limiter 92 and a gasket 93 for adjusting the clamping position are installed on the rotary cylinder.

[0063] In some embodiments of the present invention, reference Figure 1 and Figure 2 The carrier 1 includes an upper carrier component 11 and a lower carrier component 12 which are connected to each other, and a sealing ring is arranged between the upper carrier component 11 and the lower carrier component 12.

[0064] Specifically, refer to Figure 2 A groove is provided on the lower part 12 of the carrier body at the position where it is connected to the upper part 11 of the carrier body, and the sealing ring is arranged in the groove.

[0065] Fig.10 for Figure 1 The structural schematic diagram of the nozzle holder is shown.

[0066] In some embodiments of the present invention, reference Fig.10 The relative position of the nozzle seat 2 and the carrier 1 is determined by a pin, and the nozzle seat 2 and the photoresist tube are sealed by a bullet.

[0067] An embodiment of the present invention provides a glue coating and developing device, wherein the glue coating and developing device comprises the glue nozzle seat bearing device.

[0068] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.

Claims

1. A nozzle holder bearing device, characterized in that: include: A carrier, on which the nozzle seat is arranged; The carrier comprises a nozzle placement hole and a nozzle flushing hole, the nozzle of the nozzle holder is placed inside the nozzle placement hole, and the nozzle placement hole and the nozzle flushing hole are communicated at the position where the nozzle is located; A flushing pipeline, the flushing pipeline is connected to the nozzle flushing hole to provide a flushing liquid; The diameter of the nozzle flushing hole is smaller than the radius of the nozzle placement hole, and the nozzle placement hole is tangent to the nozzle placement hole, so that the flushing liquid forms a vortex in the nozzle placement hole to clean the nozzle; The carrier also includes a waste discharge circular groove and a waste discharge flushing hole. The waste discharge circular groove is arranged downstream of the liquid flow of the nozzle placement hole to receive the waste liquid flowing out of the nozzle placement hole. The waste discharge flushing hole is connected to the bottom of the waste discharge circular groove, and its diameter is smaller than the radius of the waste discharge circular groove. The flushing liquid is arranged tangentially to the waste discharge circular groove, so that the flushing liquid forms a vortex in the waste discharge circular groove, and overflows from the waste discharge circular groove after flushing the waste discharge circular groove. It also includes a clamping assembly, which is arranged on the surface of the carrier to clamp the nozzle seat; The carrier comprises an upper carrier part and a lower carrier part which are connected to each other, a sealing ring is arranged between the upper carrier part and the lower carrier part; and a nozzle placement hole which penetrates vertically is opened on the upper surface of the upper carrier part.

2. The nozzle holder supporting device according to claim 1, characterized in that: The nozzle placement hole and the nozzle flushing hole are perpendicular to each other.

3. The nozzle holder supporting device according to claim 1, characterized in that: The nozzle placement hole is a stepped hole, and the diameter of the hole section decreases as the nozzle diameter decreases.

4. The nozzle holder supporting device according to claim 1, characterized in that: The waste discharge circular groove and the waste discharge flushing hole are perpendicular to each other.

5. The nozzle holder supporting device according to claim 1, characterized in that: The carrier also includes a waste discharge groove and a waste discharge pipe connected to the waste discharge groove. The waste discharge groove is arranged at a downstream position where the liquid in the waste discharge circular groove overflows after being filled. The height of the bottom surface of the waste discharge groove near the waste discharge pipe is lower than other positions of the bottom surface.

6. The nozzle holder supporting device according to claim 5, characterized in that: The opening of the waste discharge circular groove is an oblique opening, and the lower part of the oblique opening faces the waste discharge groove.

7. A coating and developing device, characterized in that: A nozzle holder supporting device according to any one of claims 1 to 6.

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