Stage device, photolithography device, and method for manufacturing article

Abstract

The present invention relates to a stage device, a photolithography device, and a method for manufacturing an article. A technology is provided that is advantageous in reducing the possibility of interference between a first stage and a second stage. A stage device comprises: a first stage capable of movement; a second stage capable of movement on the first stage; and a control unit that controls the inclination of the second stage relative to the first stage to a target inclination. In the stage device, the control unit controls the inclination by setting the target inclination according to the movement range of the first stage.

Description

Technical Field

[0001] The present invention relates to a mounting table device, a photolithography device, and a method for manufacturing an article. Background Art

[0002] In photolithography equipment used to manufacture semiconductor devices, etc., a substrate is sometimes tilted when forming a pattern on it. For example, Patent Document 1 proposes the FLEX (Focus Latitude Enhancement Exposure) method, which images the pattern of a master plate (mask) at different positions along the optical axis, as a technique for increasing the depth of focus in an exposure apparatus. When performing exposure using this FLEX method in a scanning exposure apparatus, the substrate is scanned while tilted relative to the image plane of the projection optical system.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 2020-071274 Summary of the Invention

[0006] Problems to be solved by the invention

[0007] In photolithography equipment, for example, a substrate stage is sometimes used that includes a coarse movement stage (first stage) and a fine movement stage (second stage) capable of moving on the coarse movement stage while holding a substrate. In such a substrate stage, the tilt (posture) of the substrate can be controlled by controlling the tilt of the fine movement stage relative to the coarse movement stage.

[0008] However, when the second stage is tilted relative to the first stage, the gap between the first and second stages may decrease depending on the amount of tilt. Therefore, depending on the control deviation of this tilt, there is a possibility that the first and second stages may interfere (contact). For example, in the acceleration / deceleration range where the first stage is accelerated or decelerated, the control deviation of the tilt is greater than in the constant speed range where the first stage is moved at a constant speed, and the possibility of such interference increases.

[0009] Therefore, an object of the present invention is to provide a technique that is effective in reducing the possibility of interference between a first mounting stage and a second mounting stage.

[0010] Means of solving problems

[0011] In order to achieve the above-mentioned purpose, a loading platform device as one aspect of the present invention is characterized in that it comprises: a first loading platform that is capable of moving; a second loading platform that is capable of moving on the first loading platform; and a control unit that controls the inclination amount of the second loading platform relative to the first loading platform to a target inclination amount, and the control unit sets the target inclination amount according to the moving range of the first loading platform to control the inclination amount.

[0012] Further objects and other aspects of the present invention will become apparent from the following description of preferred embodiments with reference to the accompanying drawings.

[0013] Effects of the Invention

[0014] According to the present invention, for example, it is possible to provide a technique that is advantageous in reducing the possibility of interference between the first mounting stage and the second mounting stage. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram showing the structure of an exposure device.

[0016] Figure 2 It is a diagram showing a configuration example of a substrate mounting table.

[0017] Figure 3 It is a diagram for explaining the structure of the coarse movement stage and the fine movement stage.

[0018] Figure 4 It is a diagram for explaining the tilt amount of the fine movement stage relative to the coarse movement stage.

[0019] Figure 5 Graphs showing the moving speed of the coarse movement stage, the target tilt amount of the fine movement stage, and the size of the gap in a conventional control example.

[0020] Figure 6 It is a diagram showing the moving speed of the coarse movement stage, the target tilt amount of the fine movement stage, and the size of the gap in the control example of the first embodiment.

[0021] Figure 7 This is a control block diagram of the mounting stage device according to the first embodiment.

[0022] Explanation of symbols

[0023] 60: Exposure device; 62: Original plate stage; 64: Substrate stage; 65: Control unit; STG1: Coarse movement stage (first stage); STG2: Fine movement stage (second stage). DETAILED DESCRIPTION

[0024] The following describes the embodiments in detail with reference to the accompanying drawings. The inventions described in the claims are not limited to the following embodiments. While the embodiments describe a number of features, not all of these features are essential to the invention, and any combination of these features is possible. In the accompanying drawings, identical or similar structures are denoted by the same reference numerals, and duplicate descriptions are omitted.

[0025] In this specification and the accompanying drawings, directions are expressed in an XYZ coordinate system, in which the direction perpendicular to the optical axis of the exposure light used to expose the substrate is defined as the XY plane. Directions parallel to the X, Y, and Z axes in the XYZ coordinate system are designated as the X-axis direction, the Y-axis direction, and the Z-axis direction, respectively. Rotation about the X, Y, and Z axes are designated as θX, θY, and θZ, respectively. Control or drive related to the X, Y, and Z axes refers to control or drive related to the X, Y, and Z-axis directions, respectively. Furthermore, control or drive related to the θX, θY, and θZ axes refers to control or drive related to the rotational direction about the X, Y, and Z axes, respectively. Position refers to information that can be determined based on the coordinates of the X, Y, and Z axes, and tilt (posture) refers to information that can be determined using the values ​​of the θX, θY, and θZ axes. Positioning means controlling position and / or tilt (posture). In the following description, when the "X-axis direction" is described, it can be defined as including the +X direction and the -X direction. The same applies to the "Y-axis direction" and the "X-axis direction".

[0026] The following embodiments describe an example in which the stage apparatus of the present invention is applied to an exposure apparatus that transfers a pattern from a mask serving as a master onto a substrate (exposing the substrate), but the present invention is not limited to this application. For example, the stage apparatus of the present invention can also be applied to lithography apparatuses such as forming apparatuses (imprint apparatuses, planarization apparatuses) that use a mold serving as a master to shape a composition on a substrate, and drawing apparatuses that use charged particle beams to form patterns on a substrate.

[0027] <First embodiment>

[0028] A first embodiment of the present invention will be described. Figure 1: This is a schematic diagram showing the structure of the exposure device 60 in this embodiment. The exposure device 60 is, for example, a scanning exposure device used in the manufacturing process of semiconductor devices, which exposes the substrate W by a step-and-scan method and transfers the pattern of the original plate R onto the substrate W. The exposure device 60 in this embodiment includes, for example, an illumination system 61, an original plate mounting table 62 that holds the original plate R, a projection optical system 63, a substrate mounting table 64 that holds the substrate W, and a control unit 65. In addition, hereinafter, the direction parallel to the optical axis of the light (exposure light) emitted from the projection optical system 63 and irradiated to the substrate W is referred to as the Z-axis direction, and the directions orthogonal to each other in a plane perpendicular to the optical axis are referred to as the X-axis direction and the Y-axis direction. In addition, the scanning direction of the substrate W during the scanning exposure of the substrate W is referred to as the Y-axis direction (+Y direction or -Y direction).

[0029] The lighting system 61 adjusts the light irradiated from a light source not shown in the figure to illuminate the original plate R. A pattern (for example, a circuit pattern) to be transferred to the substrate W is formed on the original plate R. The original plate R is made of, for example, quartz glass, and is also called a mask or an intermediate mask (reticle). The original plate mounting table 62 is a driving mechanism for driving the original plate R in each of a plurality of axial directions (for example, the six axial directions of the X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis), and is configured to be able to move while holding the original plate R. The projection optical system 63 projects the image of the pattern on the original plate R illuminated by the light from the lighting system 61 onto the substrate W at a predetermined projection magnification. The substrate W is a substrate coated with a resist (photosensitive agent), for example, a substrate made of single crystal silicon. The substrate mounting table 64 has a chuck for holding the substrate W. It is a driving mechanism for driving the substrate W in each of multiple axial directions (for example, the six axial directions of X-axis, Y-axis, Z-axis, θX-axis, θY-axis, and θZ-axis). It can be configured to hold the substrate W and move.

[0030] The control unit 65 is composed of, for example, a computer having a CPU, memory, etc., and is connected to the components of the exposure device 60 via a circuit and can control the components according to a program. The control unit 65 may be configured integrally with the other components of the exposure device 60 (in a common housing) or separately from the other components of the exposure device 60 (in a separate housing).

[0031] In the exposure device 60, the original plate R and substrate W are held by an original plate stage 62 and a substrate stage 64, respectively, and are positioned at optically conjugate positions (the object plane and image plane of the projection optical system 63) with a projection optical system 63 interposed therebetween. A control unit 65 synchronizes the original plate stage 62 and the substrate stage 64, scanning them relative to each other in a scanning direction (in this embodiment, the Y-axis direction) at a speed ratio corresponding to the projection magnification of the projection optical system 63. This allows the pattern of the original plate R to be transferred onto the substrate.

[0032] Next, the stage device of this embodiment will be described. The stage device of this embodiment may include, for example, a substrate stage 64 and a control unit 65 . Figure 2 1 is a diagram showing a configuration example of the substrate stage 64 in the stage device of this embodiment, and is a diagram when the substrate stage 64 is viewed from above (+Z direction). Figure 2 In the figure, to facilitate understanding of the structure between the X coarse movement stage STG1 and the fine movement stage STG2, the fine movement stage STG2 is shown as a transmission diagram with a dotted line. The substrate stage 64 may include, for example, the Y coarse movement stage 11, the X coarse movement stage STG1 (first stage), and the fine movement stage STG2 (second stage). Hereinafter, a stage device including the substrate stage 64 and the control unit 65 will be described. However, the substrate stage 64 may be replaced with the original plate stage 62. In other words, the stage device may also include the original plate stage 62 and the control unit 65. The original plate stage 62 may have the same structure as the substrate stage 64 described below.

[0033] The Y coarse motion stage 11 is configured to be movable in the Y-axis direction on the fixed plate 12 using a mirror-finished guide surface of the Y coarse motion stage 11, a yaw guide 13, and a static pressure guide (not shown). The Y coarse motion stage 11 is driven by linear motors 23 and 24. Linear motor 23 can be composed of a mover 23a and a stator 23b, and linear motor 24 can be composed of a mover 24a and a stator 24b. The movers 23a and 24a of linear motors 23 and 24 may include, for example, permanent magnets and are connected to the Y coarse motion stage 11 via connecting plates 25a and 25b. Furthermore, the stators 23b and 24b of linear motors 23 and 24 may include, for example, coils. Thus, the control unit 65 can control the drive of the Y coarse motion stage 11 in the Y-axis direction using the linear motors 23 and 24.

[0034] X coarse motion stage STG1 (first stage) is configured so that a static pressure guide (not shown) sandwiches the Y coarse motion stage 11 in the Y-axis direction on the surface plate 12, allowing it to move in the X-axis direction along the Y coarse motion stage 11. Drive of X coarse motion stage STG1 in the Y-axis direction is performed by a linear motor 27. Linear motor 27 is composed of a stator provided on the Y coarse motion stage 11 and a mover provided on the X coarse motion stage STG1. Thus, the control unit 65 can control the drive of X coarse motion stage STG1 in the X-axis direction using linear motor 27. Furthermore, X coarse motion stage STG1 can move in the Y-axis direction on the surface plate 12 by driving the Y coarse motion stage 11 in the Y-axis direction using linear motors 23 and 24. In other words, the control unit 65 can control the positioning of X coarse motion stage STG1 in both the X-axis and Y-axis directions using linear motors 23, 24, and 27. In addition, hereinafter, the X coarse movement stage STG1 may be simply referred to as "coarse movement stage STG1".

[0035] Fine movement stage STG2 (second stage) is spaced apart in the Z-axis direction from coarse movement stage STG1 and is configured to be movable on coarse movement stage STG1. In this embodiment, a protrusion 15 is provided on the lower surface of fine movement stage STG2, and protrusion 15 of fine movement stage STG2 is arranged (inserted) into a recess 14 provided on the upper surface of coarse movement stage STG1.

[0036] Between coarse movement stage STG1 and fine movement stage STG2 are fine movement X linear motors 31a, 31b, fine movement Y linear motors 32a, 32b, and fine movement Z linear motors 33a-33d, which generate driving forces in the X, Y, and Z directions, respectively. These linear motors 31-33 independently drive fine movement stage STG2 in each of multiple axial directions (e.g., the six directions of X, Y, Z, θX, θY, and θZ) relative to coarse movement stage STG1. This allows control unit 65 to use linear motors 31-33 to control the position and posture (tilt) of fine movement stage STG2 relative to coarse movement stage STG1. Furthermore, electromagnetic actuators 41, 42 are provided between coarse movement stage STG1 (recess 14) and fine movement stage STG2 (convex portion 15), generating an attractive force based on the action of electromagnets. The electromagnetic actuators 41 a and 41 b generate an attractive force in the X-axis direction, and the electromagnetic actuators 42 a and 42 b generate an attractive force in the Y-axis direction.

[0037] Figure 3 This is a diagram for explaining the structure (positional relationship) of the coarse movement stage STG1 and the fine movement stage STG2 in the substrate stage 64 of the present embodiment, schematically showing Figure 2A-A cross section. Coarse movement stage STG1 and fine movement stage STG2 are constructed so as to form a gap therebetween, and the size of this gap changes in accordance with the change in the inclination of fine movement stage STG2 relative to coarse movement stage STG1. Here, coarse movement stage STG1 and fine movement stage STG2 may also be constructed so as to form a gap between the member constituting coarse movement stage STG1 (first member) and the member constituting fine movement stage STG2 (second member). These members (first member, second member) may be structural members of the stages themselves, or may be parts of linear motors 31 to 33 (movers, stators).

[0038] For example, fine movement stage STG2 is positioned above coarse movement stage STG1 so that a gap is formed between the fine movement stage STG2 and the coarse movement stage STG1. This configuration allows fine movement stage STG2 to be tilted relative to coarse movement stage STG1. Furthermore, fine movement stage STG2 is positioned above coarse movement stage STG1 so that protrusion 15 provided on its lower surface is inserted into recess 14 of coarse movement stage STG1. This configuration prevents fine movement stage STG2 from deviating from coarse movement stage STG1 even when coarse movement stage STG1 is not intentionally suddenly accelerated or stopped.

[0039] Furthermore, in the case of this embodiment, a detection unit 16 (gap sensor) for detecting the size of the gap between the coarse movement stage STG1 and the fine movement stage STG2 can be provided. Figure 3 In the example shown, detection unit 16 is disposed between concave portion 14 of coarse movement stage STG1 and convex portion 15 of fine movement stage STG2. However, the mounting position of detection unit 16 is arbitrary as long as the size of the gap between coarse movement stage STG1 and fine movement stage STG2 can be detected. Detection unit 16 is, for example, a detection unit capable of detecting the distance to a detection object. A sensor that outputs the size of the gap between coarse movement stage STG1 and fine movement stage STG2 as a detection result can be used. Examples of detection unit 16 include eddy current displacement sensors, electrostatic capacitance sensors, optical sensors, and ultrasonic sensors.

[0040] In the exposure device 60, for example, when transferring the pattern of the original plate R onto the substrate, the substrate W is sometimes tilted relative to the image plane of the projection optical system 63. In other words, the normal line of the substrate W is sometimes tilted relative to the optical axis of the exposure light emitted from the projection optical system 63. For example, in the exposure device 60, as a method for expanding the depth of focus, the FLEX (Focus Latitude Enhancement Exposure) method is sometimes used to image the pattern of the original plate R at different positions in the optical axis direction. The FLEX method is a method of continuously changing the imaging position of the pattern of the original plate R near the focus of the projection optical system 63 by performing scanning exposure of the substrate W in a state in which the substrate W is tilted relative to the image plane of the projection optical system 63. In this way, multiple exposures of the substrate W can be performed, and improvement of contrast and expansion of the depth of focus can be achieved.

[0041] In the stage device (substrate stage 64) of this embodiment, the tilt (posture) of substrate W is controlled by controlling the tilt of fine movement stage STG2 (second stage) relative to coarse movement stage STG1 (first stage) to a target tilt. However, in the stage device of this embodiment, when fine movement stage STG2 is tilted relative to coarse movement stage STG1, a portion may occur where the gap between coarse movement stage STG1 and fine movement stage STG2 becomes smaller depending on the tilt. Therefore, depending on the control deviation of this tilt, there is a possibility that coarse movement stage STG1 and fine movement stage STG2 may interfere with (contact with) each other. For example, in the acceleration / deceleration range in which coarse movement stage STG1 is accelerated or decelerated, the control deviation (maximum control deviation) of the tilt is greater than in the constant speed range in which coarse movement stage STG1 is moved at a constant speed, increasing the possibility of such interference.

[0042] Therefore, in the stage device of this embodiment, the target tilt amount of the fine movement stage STG2 relative to the coarse movement stage STG1 is made smaller during the acceleration and deceleration interval than during the constant speed interval. This reduces the possibility of interference (contact) between the coarse movement stage STG1 and the fine movement stage STG2. Here, the constant speed interval can be, for example, an interval in which the coarse movement stage STG1 is moved at a constant speed during scanning exposure of the substrate W. In addition, the acceleration and deceleration interval can include an acceleration interval in which the coarse movement stage STG1 is accelerated before the start of scanning exposure of the substrate W and / or a deceleration interval in which the coarse movement stage STG1 is decelerated after the end of scanning exposure of the substrate W. Furthermore, the "tilt amount" and the "target tilt amount" can be quantities represented by the absolute value of the tilt of the fine movement stage STG2 relative to the coarse movement stage STG1.

[0043] Figure 4This is a diagram for explaining the tilt amount of the fine movement stage STG2 relative to the coarse movement stage STG1, schematically showing Figure 2 A-A section. Figure 4 The "Gap" shown indicates the size of the gap between coarse movement stage STG1 and fine movement stage STG2, and the "Prescribed Value" indicates the lower limit (threshold) of the size of this gap. Hereinafter, the amount of inclination of fine movement stage STG2 relative to coarse movement stage STG1 may be referred to simply as the "inclination of fine movement stage STG2," and the size of the gap between coarse movement stage STG1 and fine movement stage STG2 may be referred to simply as the "gap size." Furthermore, the "gap size" may also be understood to refer to the amount of clearance between coarse movement stage STG1 and fine movement stage STG2.

[0044] For example, in the uniform speed range, Figure 4 As shown in (a), the tilt of fine movement stage STG2 relative to coarse movement stage STG1 is controlled to a first target tilt amount T1 (angle α). In this constant speed range, as described above, the control deviation (maximum control deviation) of the tilt amount is relatively small. Therefore, during the movement of coarse movement stage STG1, the gap represented by Gap is less likely to fall below the specified lower limit, and the stages are less likely to interfere with each other. Here, first target tilt amount T1 can be set, for example, to achieve the desired tilt of substrate W in scanning exposure using the FLEX method.

[0045] On the other hand, in the acceleration / deceleration range, the control deviation of the tilt amount is relatively large. Therefore, when the tilt amount of the fine motion stage STG2 is controlled by using the first target tilt amount T1 as it is, the size of the gap is smaller than the specified value of the lower limit, and the possibility of interference (contact) between the stages becomes high. In the stage device of this embodiment, if Figure 4 As shown in (b), in the acceleration / deceleration interval, the second target inclination amount T2 (angle β) that is smaller than the first target inclination amount T1 (angle α) is used to control the inclination amount of the fine motion stage STG2. As a result, the size of the gap (reference gap) when the inclination amount of the fine motion stage STG2 is the target inclination amount can be enlarged, and even when the maximum control deviation occurs, the size of the gap can be avoided from being less than the specified value of the lower limit. That is, the interference between the stages can be reduced. Here, the second target inclination amount can be set (determined) to avoid the size of the gap between the coarse motion stage STG1 and the fine motion stage STG2 being less than the specified value of the lower limit due to the control deviation of the inclination amount of the fine motion stage STG2 in the acceleration / deceleration interval.

[0046] Figures 5 and 6 The moving speed of the coarse movement stage STG1 (substrate stage 64), the target tilt amount of the fine movement stage STG2, and the size of the gap are shown. Figures 5 and 6 , as an example, a case where the coarse movement stage STG1 is moved in the order of a constant speed section → a deceleration section → a constant speed section is shown. Figure 5 A conventional control example is shown in which the tilt amount of the fine movement stage STG2 is controlled by the first target tilt amount T1 in both the constant speed section and the deceleration section. Figure 6 The control example of this embodiment is shown in which the tilt amount of the fine movement stage STG2 is controlled by the first target tilt amount T1 in the constant speed section and the tilt amount of the fine movement stage STG2 is controlled by the second target tilt amount T2 in the deceleration section. Figure 5 In the conventional control example shown in FIG. 1 , the size of the gap in the deceleration zone is smaller than the lower limit of the prescribed value. In contrast, in Figure 6 In the control example of the present embodiment shown, the gap size is prevented from being smaller than the lower limit predetermined value in the deceleration section.

[0047] Here, the fine-motion stage STG2 is moved in the same direction as the Figure 4 For example, when the direction of inclination is opposite, Figure 4 The larger the gap represented by Gap, the smaller the gap opposite to the gap represented by Gap becomes, and the possibility of interference between the stages becomes higher. In such a case, it is necessary to avoid the size of the gap opposite to the gap represented by Gap being less than the specified value of the lower limit. Therefore, it is necessary to control the inclination of the micro-motion stage STG2 in a manner to avoid the size of the gap represented by Gap being greater than the specified value of the upper limit. Therefore, with respect to the inclination of the stage STG2, the first target inclination amount T1 and the second target inclination amount T2 are set and controlled in a manner to avoid the size of the gap being less than the specified value of the lower limit and to avoid the size of the gap being greater than the specified value of the upper limit (avoiding the size of the gap being outside the allowable range). In addition, the allowable range can be defined as a range above the specified value of the lower limit and below the specified value of the upper limit.

[0048] Figure 7The control block diagram of the stage device of this embodiment is shown. The stage device of this embodiment may include, for example, a first control system 50a, a second control system 50b, a setting unit 55, and a detection unit 16. The first control system 50a is a control system for controlling the position of the coarse movement stage STG1, and may be composed of, for example, a subtractor 51a, a first compensation unit 52a, a drive mechanism 53a, and a first measuring unit 54a. The second control system 50a is a control system for controlling the tilt amount of the fine movement stage STG2, and may be composed of, for example, a subtractor 51b, a second compensation unit 52b, a drive mechanism 53b, and a second measuring unit 54b. The setting unit 55 sets a position command value (target position) for the coarse movement stage STG1 and supplies it to the first control system 50a (subtractor 51a), and sets a tilt command value (target tilt amount) for the fine movement stage STG2 and supplies it to the second control system 50b (subtractor 51b). Furthermore, the subtractors 51a and 51b, the first compensation unit 52a, the second compensation unit 52b, and the setting unit 55 may be included in the control unit 65. Furthermore, the second control system 50a of the present embodiment may be configured to control not only the tilt amount of the fine movement stage STG2 but also the position of the fine movement stage STG2.

[0049] First, the first control system 50a will be described. The first measuring unit 54a includes, for example, a laser interferometer, an encoder, etc., and measures the current position of the coarse movement stage STG1. In addition, the setting unit 55 sets the target position of the coarse movement stage STG based on the stage drive profile, recipe information, etc. that are set in advance for the scanning exposure of the substrate W, and supplies the information of the set target position to the subtractor 51a as a position command value. The subtractor 51a calculates the deviation between the current position of the coarse movement stage STG1 measured by the first measuring unit 54a and the position command value (target position) supplied from the setting unit 55, and supplies the calculated deviation to the first compensation unit 52a. The first compensation unit 52a includes, for example, a PID compensator, and generates a drive command value for driving the coarse movement stage STG1 in a manner to reduce the deviation based on the deviation calculated by the subtractor 51a, and supplies the drive command value to the drive mechanism 53a. The driving mechanism 53a includes, for example, the aforementioned linear motors 23, 24, and 27, and drives the coarse movement stage STG1 by supplying a current corresponding to a drive command value supplied from the first compensation unit 52a to each linear motor.

[0050] Next, the second control system 50b will be described. The second measuring unit 54b includes, for example, a laser interferometer, an encoder, etc., and measures the current inclination (inclination amount) of the fine movement stage STG2 relative to the coarse movement stage STG1. In addition, the setting unit 55 sets the target inclination amount of the fine movement stage STG2 according to the moving range (movement state) of the coarse movement stage STG1, and supplies the information of the set target inclination amount to the subtractor 51b as the inclination instruction value. The subtractor 51b calculates the deviation between the inclination amount of the fine movement stage STG2 measured by the second measuring unit 54b and the inclination instruction value (target inclination amount) supplied from the setting unit 55, and supplies the calculated deviation to the second compensation unit 52b. The second compensation unit 52b includes, for example, a PID compensator, and generates a drive instruction value for driving the fine movement stage STG2 in a manner to reduce the deviation based on the deviation calculated by the subtractor 51b, and supplies it to the drive mechanism 53b. The driving mechanism 53b includes, for example, the aforementioned linear motors 31 to 33, and drives the fine movement stage STG2 by supplying a current corresponding to a drive command value supplied from the second compensation unit 52b to each linear motor.

[0051] Here, setting unit 55 can set the target tilt amount of fine movement stage STG2 based on the movement range of coarse movement stage STG1. Specifically, setting unit 55 supplies a first target tilt amount T1 to subtractor 51b during a constant speed range, in which coarse movement stage STG1 is moved at a constant speed. Setting unit 55 supplies a second target tilt amount T2 to subtractor 51b during an acceleration / deceleration range, in which coarse movement stage STG1 is accelerated or decelerated. Second target tilt amount T2 is set to a value (amount) smaller than first target tilt amount T1.

[0052] Setting unit 55 may also move coarse movement stage STG1 in advance and set (determine) first target tilt amount T1 and / or second target tilt amount T2 based on the size of the gap between coarse movement stage STG1 and fine movement stage STG2 detected by detection unit 16 at that time. For example, setting unit 55 may move coarse movement stage STG1 in advance and store the sizes of the gap detected successively by detection unit 16 during the movement. Thus, setting unit 55 can set first target tilt amount T1 and / or second target tilt amount T2 based on the maximum value, moving average value, or other value of the gap size during the movement to prevent the gap size from falling outside the allowable range.

[0053] Furthermore, setting unit 55 may appropriately update second target tilt amount T2 based on the size of the gap detected by detection unit 16. For example, when controlling the tilt of fine movement stage STG2 using second target tilt amount T2, which has been previously set for scanning exposure of substrate W, the size of the gap detected by detection unit 16 may temporarily be outside the allowable range. In this case, setting unit 55 may newly set (determine) second target tilt amount T2 based on the size of the gap detected by detection unit 16 so as to prevent the gap from falling outside the allowable range, and store the new value in the memory of control unit 65 (i.e., update second target tilt amount T2). This prevents the gap from falling outside the allowable range during the movement of coarse movement stage STG1 in the subsequent acceleration / deceleration interval, and reduces the possibility of interference between coarse movement stage STG1 and fine movement stage STG2. Furthermore, setting unit 55 may set second target tilt amount T2 separately for each of the acceleration and deceleration intervals.

[0054] As described above, the stage device of this embodiment sets the target tilt amount of fine movement stage STG2 relative to coarse movement stage STG1 smaller during the acceleration / deceleration range than during the constant speed range. This prevents the gap between coarse movement stage STG1 and fine movement stage STG2 from falling outside the permissible range, thereby reducing the possibility of interference between the stages.

[0055] <Second embodiment>

[0056] The second embodiment of the present invention is described. When the target tilt amount of the fine motion stage STG2 is changed rapidly (instantaneously) between the first target tilt amount T1 and the second target tilt amount T2, the control deviation of the tilt amount increases due to the rapid change of the target tilt amount, and the size of the gap may be outside the allowable range. Therefore, it is preferable to Figure 6 The target tilt amount of fine movement stage STG2 is gradually changed during the period δ shown. For example, in a previous experiment, the control unit 65 (setting unit 55) changes the target tilt amount of fine movement stage STG2 between the first target tilt amount T1 and the second target tilt amount T2, and causes the detection unit 16 to detect the size of the gap at this time. Thus, the control unit 65 can determine the speed of change of the target tilt amount based on the detection result of the detection unit 16 so that the size of the gap can be maintained within the allowable range. Furthermore, this embodiment basically inherits the first embodiment, and unless otherwise specified, the same structure and processing as the first embodiment can be applied.

[0057] <Embodiment of the Method for Manufacturing Article>

[0058] The manufacturing method of the article involved in the embodiment of the present invention is suitable for manufacturing micro devices such as semiconductor devices, components with fine structures and other articles. The manufacturing method of the article of this embodiment includes a forming step of forming a pattern on a substrate using the above-mentioned photolithography device (exposure device) in a photosensitive agent applied to the substrate, and a processing step of processing the substrate after the pattern is formed in the forming step. In addition, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, flattening, etching, resist stripping, cutting, bonding, packaging, etc.). Compared with previous methods, the manufacturing method of the article of this embodiment is advantageous in at least one of the performance, quality, productivity and production cost of the article.

[0059] <Other embodiments>

[0060] The present invention can also be implemented by supplying a program that implements one or more functions of the above-described embodiments to a system or device via a network or storage medium, and having one or more processors in a computer of the system or device read and execute the program. Alternatively, it can be implemented by a circuit (e.g., an ASIC) that implements one or more functions.

[0061] Other embodiments

[0062] The embodiments of the present invention can also be implemented by the following method, that is, providing software (program) that performs the functions of the above-mentioned embodiments to a system or device through a network or various storage media, and the computer or central processing unit (CPU) or microprocessing unit (MPU) of the system or device reads and executes the program.

[0063] The present invention is not limited to the above-described embodiment, and various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, the appended claims are intended to disclose the scope of the invention.

Claims

1. A mounting table device, characterized in that: have: The first loading platform is movable; a second mounting platform capable of moving on the first mounting platform; and a control unit that controls the tilt amount of the second mounting platform relative to the first mounting platform to a target tilt amount, The control unit sets the target tilt amount according to the movement state of the first mounting table and controls the tilt amount.

2. The mounting table device according to claim 1, wherein: The control unit controls the tilt amount according to a first target tilt amount, which is the target tilt amount in the uniform speed interval in which the first loading platform is moved at a uniform speed, and controls the tilt amount according to a second target tilt amount, which is smaller than the first target tilt amount, in an acceleration / deceleration interval in which the first loading platform is accelerated or decelerated.

3. The mounting table device according to claim 2, wherein: The first mounting table and the second mounting table are configured so that a size of a gap between the first mounting table and the second mounting table changes in accordance with a change in the tilt amount.

4. The mounting table device according to claim 3, wherein: The second target tilt amount is set so as to prevent the size of the gap from falling outside an allowable range due to a control deviation of the tilt amount.

5. The mounting table device according to claim 3, wherein: The control unit sets the second target tilt amount so that the size of the gap does not fall outside an allowable range when the first mounting table moves in the acceleration / deceleration section.

6. The mounting table device according to claim 5, wherein: The mounting table device further includes a detection unit that detects the size of the gap. The control unit sets the second target tilt amount based on a detection result of the detection unit obtained when the first mounting table is moved in advance.

7. The mounting table device according to claim 3, wherein: The control unit sets the second target tilt amount individually for each of an acceleration section for accelerating the first stage and a deceleration section for decelerating the first stage.

8. The mounting table device according to claim 3, wherein: The constant speed section is a section for performing scanning exposure on the substrate held by the second mounting table. The acceleration / deceleration section includes an acceleration section for accelerating the first stage before starting the scanning exposure and / or a deceleration section for decelerating the first stage after completing the scanning exposure.

9. The mounting table device according to claim 8, wherein: In the uniform speed section, the scanning exposure is performed with the normal line of the substrate tilted relative to the optical axis of the exposure light. The first target tilt amount is set so that a tilt of the substrate required for the scanning exposure can be obtained.

10. A photolithography apparatus for forming a pattern on a substrate, wherein: The photolithography apparatus includes the stage device according to claim 1, The substrate is held by the second stage of the stage device.

11. A photolithography apparatus for forming a pattern on a substrate using an original plate, wherein: The photolithography apparatus includes the stage device according to claim 1, The original plate is held by the second stage of the stage device.

12. A method for manufacturing an article, characterized in that: include: a forming step of forming a pattern on a substrate using the photolithography apparatus according to claim 10 or 11; as well as a processing step of processing the substrate after the pattern is formed in the forming step, In the method for manufacturing an article, an article is manufactured using the substrate processed in the processing step.

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