Immersion lithography device with collision test function and collision test method

Abstract

The present invention provides an immersion lithography device with a collision test function and a collision test method, the immersion lithography device with a collision test function comprises: an immersion unit; a test unit, comprising a test piece, a test circuit and an electrical tester, the electrical tester being electrically connected to the immersion unit and the test piece respectively through the test circuit, the electrical tester being used to test the resistance and / or capacitance between the immersion unit and the test piece to determine whether a collision occurs between the immersion unit and the test piece during operation; and a carrying unit, being used to carry the test piece, the carrying unit being arranged below the immersion unit. The technical solution of the present invention can accurately determine whether a collision occurs between the immersion unit and the test piece during operation, so that the effectiveness of the anti-collision function can be evaluated, thereby ensuring the safe operation of the lithography machine.

Description

Technical Field

[0001] The present invention relates to the field of semiconductors, and particularly to an immersion lithography apparatus with a collision test function and a collision test method. Background Art

[0002] In an immersion lithography machine, an immersion unit is disposed between a projection objective lens and a substrate. The immersion unit confines an immersion fluid field between the lower surface of the bottommost lens of the projection objective lens and the upper surface of the substrate. A fine motion stage (CHUCK) for driving the substrate to move and a motion stage are sequentially disposed below the substrate. Considering the stability of the immersion fluid field and the need for leveling with the fine motion stage and the motion stage, the immersion unit needs to perform movements in the Z, Rx, and Ry directions; moreover, the movement trajectory of the immersion unit overlaps with the fine motion stage below by about 1 mm, resulting in a collision risk between the immersion unit and the substrate on the fine motion stage.

[0003] Currently, the MMDC function of the immersion subsystem (i.e., the anti-collision function) detects the positions of the substrate and the immersion unit through position sensors, performs motion prediction and control, and thus prevents collisions; the motion stage also has relevant anti-collision functions. For example, the positions of the immersion unit and the substrate are detected through position sensors, and then the relative position between the two is calculated, and a safe relative position is set. If the detected relative position exceeds the safe relative position, the actuator is controlled to avoid collision; alternatively, a displacement sensor and an acceleration sensor are used to detect the relative velocity and relative acceleration between the substrate and the immersion unit, the safe relative position is calculated based on the above information, and an optoelectronic position sensor is used to directly detect the relative position between the immersion unit and the substrate. If the measured relative position exceeds the safe relative position, the actuator is controlled to avoid collision.

[0004] However, since the immersion fluid field has an impact force on both the substrate and the immersion unit, which are the two measured objects, common force measurement and acceleration measurement schemes are interfered by the immersion fluid field and cannot accurately locate. Moreover, the force measurement and acceleration measurement schemes are indirect measurements and are affected by the movement of the measured objects themselves, thereby interfering with the measurement of the relative position between the two measured objects; in addition, the space between the immersion unit and the substrate is narrow, and the gap between the two is only 0.1 mm to 1.6 mm, and it is not easy to install sensors between the immersion unit and the substrate. Therefore, affected by the above factors, it cannot be guaranteed that the anti-collision function is necessarily effective. Then, during the operation of the anti-collision function, it is necessary to test whether a collision occurs between the substrate and the immersion unit, that is, it is necessary to evaluate the effectiveness of the anti-collision function. For example, during the integrated test of the immersion lithography machine, it is necessary to evaluate the effectiveness of the anti-collision function; and at the customer site, after the immersion unit or the motion stage is maintained, the positions of the moving parts and the sensors are recalibrated, and it is also necessary to re-evaluate the effectiveness of the anti-collision function.

[0005] Therefore, how to accurately determine whether a collision occurs between the immersion unit and the substrate, ensure the effectiveness of the anti-collision function, and thus ensure the safe operation of the lithography machine is an urgent problem to be solved at present. Summary of the Invention

[0006] The object of the present invention is to provide an immersion lithography apparatus with a collision test function and a collision test method, which can accurately determine whether a collision occurs between the immersion unit and the test piece during operation, so as to evaluate the effectiveness of the anti-collision function and thus ensure the safe operation of the lithography machine.

[0007] To achieve the above object, the present invention provides an immersion lithography apparatus with a collision test function, including:

[0008] An immersion unit;

[0009] A test unit, including a test piece, a test circuit, and an electrical tester. The electrical tester is electrically connected to the immersion unit and the test piece through the test circuit respectively. The electrical tester is used to test the resistance and / or capacitance between the immersion unit and the test piece to determine whether a collision occurs between the immersion unit and the test piece during operation; and,

[0010] A carrying unit for carrying the test piece, and the carrying unit is arranged below the immersion unit.

[0011] Optionally, the carrying unit includes a moving stage and a micro-moving stage arranged on the moving stage, and the test piece is located on the micro-moving stage.

[0012] Optionally, the test piece has a relative conductive surface and a support surface, and the support surface is in contact with the micro-moving stage; a first output terminal is arranged on the test piece, and the first output terminal is electrically connected to the test circuit.

[0013] Optionally, the first output terminal is arranged on the conductive surface, and the first output terminal is electrically connected to the test circuit through a lead wire.

[0014] Optionally, the first output terminal is arranged on the support surface, an input terminal and a second output terminal are arranged on the micro-moving stage, the first output terminal is electrically connected to the input terminal, the input terminal is electrically connected to the second output terminal, and the second output terminal is electrically connected to the test circuit through a lead wire.

[0015] Optionally, the conductive surface has at least two mutually insulated conductive regions, the resistances of different conductive regions are different, and different conductive regions are aggregated to the first output terminal in a parallel manner.

[0016] Optionally, if no collision occurs between the immersion unit and the test piece, the resistance measured by the electrical tester is infinite.

[0017] Optionally, if a collision occurs between the immersion unit and the test piece, the electrical tester obtains the conductive area where the collision occurs on the conductive surface based on the measured resistance.

[0018] Optionally, an immersion flow field is maintained between the immersion unit and the test piece, and the immersion unit, the immersion flow field, and the test piece form a parallel plate capacitor, so that the electrical tester measures the capacitance between the immersion unit and the test piece.

[0019] Optionally, the closer the distance between the immersion unit and the test piece, the greater the capacitance between the immersion unit and the test piece; if a collision occurs between the immersion unit and the test piece, the capacitance between the immersion unit and the test piece is infinite.

[0020] Optionally, the immersion lithography apparatus with a collision test function further includes a lithography machine workstation, which is signal - connected to the electrical tester to receive the resistance and / or capacitance measured by the electrical tester.

[0021] The present invention also provides a collision test method, including:

[0022] Operating the immersion unit and the carrier unit below it, and during the operation, using an electrical tester to measure the resistance and / or capacitance between the immersion unit and the test piece on the carrier unit; and,

[0023] Judging whether a collision occurs between the immersion unit and the test piece based on the resistance and / or capacitance between the immersion unit and the test piece.

[0024] Optionally, the test piece has opposite conductive surfaces and a support surface, and the support surface is in contact with the carrier unit.

[0025] Optionally, the conductive surface has at least two mutually insulated conductive areas, and the resistances of different conductive areas are different.

[0026] Optionally, if the resistance between the immersion unit and the test piece is infinite, no collision occurs between the immersion unit and the test piece.

[0027] Optionally, if a collision occurs between the immersion unit and the test piece, the electrical tester obtains the conductive area where the collision occurs on the conductive surface based on the measured resistance.

[0028] Optionally, an immersion flow field is maintained between the immersion unit and the test piece, and the immersion unit, the immersion flow field, and the test piece form a parallel plate capacitor, so that the electrical tester tests the capacitance between the immersion unit and the test piece.

[0029] Optionally, the closer the distance between the immersion unit and the test piece, the greater the capacitance between the immersion unit and the test piece; if the capacitance between the immersion unit and the test piece is infinite, a collision occurs between the immersion unit and the test piece.

[0030] Optionally, the collision test method further includes transmitting the resistance and / or capacitance measured by the electrical tester to the lithography workstation.

[0031] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0032] 1. For the immersion lithography apparatus with a collision test function of the present invention, since the electrical tester can be used to test the resistance and / or capacitance between the immersion unit and the test piece, it is possible to accurately determine whether a collision occurs between the immersion unit and the test piece during operation and the location of the collision, and further evaluate the effectiveness of the anti-collision function, thereby ensuring the safe operation of the lithography machine.

[0033] 2. For the collision test method of the present invention, by using an electrical tester to test the resistance and / or capacitance between the immersion unit and the test piece on the carrier unit during operation, it is possible to accurately determine whether a collision occurs between the immersion unit and the test piece during operation and the location of the collision, and further evaluate the effectiveness of the anti-collision function, thereby ensuring the safe operation of the lithography machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 is a schematic diagram of an immersion lithography apparatus with a collision test function;

[0035] Figure 2a is a schematic diagram of the conductive surface of the test piece in Embodiment 1 of the present invention;

[0036] Figure 2b is Figure 2a a schematic diagram of the parallel connection of the resistances of the conductive surface of the test piece shown;

[0037] Figure 3a is a schematic diagram of the conductive surface of the test piece in Embodiment 2 of the present invention;

[0038] Figure 3b is a schematic diagram of the support surface of the test piece in Embodiment 2 of the present invention;

[0039] Figure 3cis corresponding to Figure 3b the structural schematic diagram of the micro-stage corresponding to the supporting surface structure of the test piece shown;

[0040] Figure 4a is the structural schematic diagram of the conductive surface of the test piece in the third embodiment of the present invention;

[0041] Figure 4b is the structural schematic diagram of the supporting surface of the test piece in the third embodiment of the present invention;

[0042] Figure 4c is Figure 4a the schematic diagram of the parallel connection of the resistances of the conductive surface of the test piece shown;

[0043] Figure 5 is the structural schematic diagram of the conductive surface of the test piece in the fourth embodiment of the present invention;

[0044] Figure 6 is the flowchart of the collision test method in an embodiment of the present invention.

[0045] Among them, the attached Figures 1 - 6 reference numerals are explained as follows:

[0046] 11 - immersion unit; 12 - test piece; 121 - conductive surface; 122 - supporting surface; 123 - first output terminal; 124 - lead wire; 131 - first test circuit; 132 - second test circuit; 133 - third test circuit; 14 - electrical tester; 15 - carrying unit; 151 - moving stage; 152 - micro-stage; 1521 - input terminal; 1522 - second output terminal; 16 - lithography machine workstation; 17 - driving unit; 18 - projection objective; 181 - lowermost lens; 19 - supporting unit; 20 - immersion flow field; 21 - foundation. Specific embodiments

[0047] To make the objectives, advantages and features of the present invention clearer, the following further elaborates on the immersion lithography apparatus with a collision test function and the collision test method proposed by the present invention in conjunction with the attached Figures 1 to 6 drawings. It should be noted that the drawings are all in a very simplified form and use non-precise scales, only for conveniently and clearly assisting in explaining the objectives of the embodiments of the present invention.

[0048] An embodiment of the present invention provides an immersion lithography apparatus with a collision test function. Refer to Figure 1, the immersion lithography apparatus with a collision test function includes an immersion unit 11, a test unit, and a carrier unit 15. The test unit includes a test piece 12, a test circuit, and an electrical tester 14. The electrical tester 14 is electrically connected to the immersion unit 11 and the test piece 12 respectively through the test circuit. The electrical tester 14 is used to test the resistance and / or capacitance between the immersion unit 11 and the test piece 12 to determine whether a collision occurs between the immersion unit 11 and the test piece 12 during operation. The carrier unit 15 is used to carry the test piece 12, and the carrier unit 15 is disposed below the immersion unit 11.

[0049] Refer to the following Figures 1 - 5 for a more detailed introduction to the immersion lithography apparatus with a collision test function provided in this embodiment.

[0050] The test unit includes a test piece 12, a test circuit, and an electrical tester 14. The electrical tester 14 is electrically connected to the immersion unit 11 and the test piece 12 respectively through the test circuit. For the convenience of description, the test circuit between the electrical tester 14 and the test piece 12 is defined as the first test circuit 131, and the test circuit between the electrical tester 14 and the immersion unit 11 is defined as the second test circuit 132.

[0051] The carrier unit 15 is used to carry the test piece 12, and the carrier unit 15 is disposed below the immersion unit 11. The carrier unit 15 includes a moving stage 151 and a micro-moving stage 152 disposed on the moving stage 151. The test piece 12 is located on the micro-moving stage 152. There is a groove (not shown) on the micro-moving stage 152 for placing the test piece 12, and an adsorption component can be disposed on the bottom surface of the groove to adsorb and fix the test piece 12, so that the micro-moving stage 152 and the moving stage 151 drive the test piece 12 to move together.

[0052] The immersion lithography apparatus with a collision test function further includes a driving unit 17, a projection objective 18, and a supporting unit 19.

[0053] The supporting unit 19 and the carrier unit 15 are placed on a foundation 21. The supporting unit 19 can be a supporting frame for serving as a carrier of the immersion unit 11, the driving unit 17, and the projection objective 18. The driving unit 17 is electrically connected to the immersion unit 11 for driving the immersion unit 11 to move in the Z, Rx, and Ry directions. The driving unit 17 can be a motor. The projection objective 18 is disposed above the immersion unit 11.

[0054] The inner ring shape of the immersion unit 11 is a conical structure matching the shape of the lowermost lens 181 of the projection objective 18. The immersion unit 11 maintains an immersion flow field 20 between the lowermost lens 181 of the projection objective 18 and the test piece 12. The pattern of the integrated circuit on the mask plate can be exposed and imaged on the test piece 12 coated with photoresist after passing through the illumination system (not shown), the projection objective 18, and the immersion flow field 20.

[0055] The size of the test piece 12 can be the same as or approximately the same as the size of the substrate (such as a silicon wafer or a germanium wafer) in normal production, so that the test piece 12 can be automatically loaded using the component structure of normal production.

[0056] The test piece 12 has opposite conductive surfaces 121 and support surfaces 122. The support surface 122 is in contact with the micro stage 152, that is, the conductive surface 121 is closer to the immersion unit 11 than the support surface 122. A first output terminal 123 is provided on the test piece 12, and the first output terminal 123 is electrically connected to the test circuit (i.e., the first test circuit 131).

[0057] The conductive surface 121 has at least two mutually insulated conductive regions. The resistances of different conductive regions are different, and different conductive regions are connected in parallel and aggregated to the first output terminal 123. As Figures 2a - 2b and Figures 3a - 3b shown, the conductive surface 121 has 8 mutually insulated conductive regions, and the resistances R 1 ~ resistance R 8 are connected in parallel and aggregated to the first output terminal 123; as Figures 4a - 4c shown, the conductive surface 121 has 12 mutually insulated conductive regions, and the resistances R 1 ~ resistance R 12 are connected in parallel and aggregated to the first output terminal 123. Moreover, the shape of each conductive region can be arbitrary.

[0058] Or, as Figure 5 shown, the conductive surface 121 is an entire conductive region, and there is only one resistance R on the conductive surface 121.

[0059] And, as Figure 2a shown, the first output terminal 123 is provided on the conductive surface 121, and the first output terminal 123 is electrically connected to the first test circuit 131 through a lead wire 124. At this time, before running the test, the test piece 12 can be placed on the micro stage 152 manually or by means of the automation of other component structures.

[0060] Or, asFigures 3a - 3c As shown, the first output terminal 123 is not disposed on the conductive surface 121, but on the support surface 122. At this time, an input terminal 1521 and a second output terminal 1522 are disposed on the surface of the micro stage 152 that contacts the support surface 122 of the test piece 12. After the test piece 12 is placed on the micro stage 152, the first output terminal 123 contacts the input terminal 1521 for electrical connection. The input terminal 1521 is electrically connected to the second output terminal 1522, and the second output terminal 1522 is electrically connected to the first test circuit 131 through a lead wire 124. Figures 4a - 4c and Figure 5 In the embodiment shown, the first output terminal 123 is also disposed on the support surface 122; Figure 1 In the embodiment shown, the first test circuit 131 is electrically connected to the micro stage 152. At this time, since the lead wire 124 is not provided on the test piece 12, the test piece 12 can be placed on the micro stage 152 by using the automatic wafer loading method of the lithography machine as in normal production, and it is also applicable to the automatic wafer loading of the client. Compared with the embodiment shown in Figure 2a it has a higher degree of automation.

[0061] Among them, the first output terminal 123, the input terminal 1521, and the second output terminal 1522 can be conductive pads.

[0062] The electrical tester 14 is used to test the resistance and / or capacitance between the immersion unit 11 and the test piece 12 to determine whether a collision occurs between the immersion unit 11 and the test piece 12 during operation.

[0063] Among them, since there is an overlap between the lower limit of the downward movement of the immersion unit 11 and the upper limit of the upward movement of the micro stage 152, the movement trajectories of the immersion unit 11 and the test piece 12 overlap, resulting in a risk of collision between the immersion unit 11 and the test piece 12 during movement. Then, an anti-collision function is set in the lithography machine to prevent a collision between the immersion unit 11 and the test piece 12 during movement. However, due to the impact force of the immersion flow field 20, the complexity of the movement trajectories of the immersion unit 11 and the micro stage 152, and the influence of the installation accuracy of each component, it is impossible to ensure the effectiveness of the anti-collision function, and it is necessary to evaluate the effectiveness of the anti-collision function. For example, after components such as the immersion unit 11 and the carrier unit 15 are integrated into the lithography machine, it is necessary to evaluate the effectiveness of the anti-collision function; and at the customer site, after the immersion unit 11 or the carrier unit 15 is maintained and the positions of each moving component and the sensors are recalibrated, it is also necessary to re-evaluate the effectiveness of the anti-collision function.

[0064] It should be noted that during normal production, the test piece 12 can also be used to regularly monitor whether a collision will occur between the immersion unit 11 and the test piece 12, and further monitor whether the installation positions, movement trajectories, etc. of components such as the immersion unit 11 and the carrier unit 15 shift after long-term production, so as to prevent possible collisions.

[0065] Taking the confirmation of the effectiveness of the anti-collision function as an example, if the anti-collision function is effective, that is, no collision occurs between the immersion unit 11 and the test piece 12, then the circuit formed by the immersion unit 11, the second test line 132, the electrical tester 14, the first test line 131, and the test piece 12 is open, and the open position is air or the immersion flow field 20. Since the resistance of air and the immersion flow field 20 is extremely large, the electrical tester 14 measures an infinite resistance.

[0066] If the anti-collision function is ineffective, that is, a collision occurs between the immersion unit 11 and the test piece 12, then the circuit formed by the immersion unit 11, the second test line 132, the electrical tester 14, the first test line 131, and the test piece 12 is connected, and the electrical tester 14 can measure a specific resistance value (such as 10Ω - 50Ω, etc.). Moreover, since the resistances of different conductive regions on the conductive surface 121 of the test piece 12 are different, the electrical tester 14 can obtain the corresponding conductive region on the conductive surface 121 that collides with the immersion unit 11 according to the measured resistance, that is, can determine the collision area on the conductive surface 121. And the more the number of conductive regions on the conductive surface 121 is divided, the more accurate the positioning of the collision position on the conductive surface 121 will be.

[0067] Alternatively, since an immersion flow field 20 is maintained between the immersion unit 11 and the test piece 12, the immersion unit 11, the immersion flow field 20, and the test piece 12 form a parallel plate capacitor, and further the electrical tester 14 can measure the capacitance between the immersion unit 11 and the test piece 12. The capacitance value is related to the vertical distance between the immersion unit 11 and the test piece 12; the closer the distance between the immersion unit 11 and the test piece 12, the greater the capacitance measured by the electrical tester 14 between the immersion unit 11 and the test piece 12. If the anti-collision function is effective, that is, no collision occurs between the immersion unit 11 and the test piece 12, then the electrical tester 14 can measure a specific capacitance value; if the anti-collision function is ineffective, that is, a collision occurs between the immersion unit 11 and the test piece 12, then the capacitance measured by the electrical tester 14 between the immersion unit 11 and the test piece 12 is infinite.

[0068] Alternatively, the electrical tester 14 can also be used to test the resistance and capacitance between the immersion unit 11 and different test pieces 12 to determine whether the anti-collision function is effective, so as to further ensure the accuracy of the judgment result.

[0069] In addition, the immersion lithography apparatus with a collision test function further includes a lithography machine workstation 16, which is signal-connected to the electrical tester 14, for example, signal-connected through a third test line 133, to receive the resistance and / or capacitance measured by the electrical tester 14.

[0070] Moreover, if it is determined whether a collision occurs between the immersion unit 11 and the test piece 12 during operation by testing the resistance between the immersion unit 11 and the test piece 12, the lithography machine workstation 16 can also receive information such as the collision time and the conductive area where the collision occurs sent by the electrical tester 14, so as to analyze and obtain data such as the movement trajectory points of the carrier unit 15 and the immersion unit 11 at the time of collision. Furthermore, the anti-collision function can be debugged, the parameters can be optimized, or the installation position of relevant components can be adjusted according to these data; if it is determined whether a collision occurs between the immersion unit 11 and the test piece 12 during operation by testing the capacitance between the immersion unit 11 and the test piece 12, the lithography machine workstation 16 can also receive the distance change situation between the immersion unit 11 and the test piece 12 detected by the electrical tester 14, and thus can optimize the servo to debug the anti-collision function.

[0071] In summary, the immersion lithography apparatus with a collision test function provided by the present invention includes: an immersion unit; a test unit, including a test piece, a test line, and an electrical tester, where the electrical tester is electrically connected to the immersion unit and the test piece respectively through the test line, and the electrical tester is used to test the resistance and / or capacitance between the immersion unit and the test piece to determine whether a collision occurs between the immersion unit and the test piece during operation; and a carrier unit for carrying the test piece, and the carrier unit is disposed below the immersion unit. The immersion lithography apparatus with a collision test function of the present invention can accurately determine whether a collision occurs between the immersion unit and the test piece during operation, so that the effectiveness of the anti-collision function can be evaluated, and thus the safe operation of the lithography machine can be ensured.

[0072] An embodiment of the present invention provides a collision test method. Refer to Figure 6 , Figure 6 is a flowchart of the collision test method according to an embodiment of the present invention. It can be seen from Figure 6 that the collision test method includes:

[0073] Step S1, operate the immersion unit and the carrier unit below it, and during the operation, use an electrical tester to test the resistance and / or capacitance between the test piece on the immersion unit and the carrier unit;

[0074] Step S2, determine whether a collision occurs between the immersion unit and the test piece based on the resistance and / or capacitance between the immersion unit and the test piece.

[0075] The following refers to Figures 1 - 5 a more detailed introduction to the collision test method provided by this embodiment:

[0076] According to Step S1, operate the immersion unit 11 and the carrier unit 15 below it, and during the operation, use an electrical tester 14 to test the resistance and / or capacitance between the test piece 12 on the immersion unit 11 and the carrier unit 15.

[0077] The electrical tester 14 is electrically connected to the test piece 12 through a first test line 131, and the electrical tester 14 is electrically connected to the immersion unit 11 through a second test line 132.

[0078] The carrier unit 15 includes a moving stage 151 and a micro stage 152 disposed on the moving stage 151, and the test piece 12 is located on the micro stage 152. There is a groove (not shown) for placing the test piece 12 on the micro stage 152, and an adsorption component can be provided on the bottom surface of the groove to adsorb and fix the test piece 12, so that the micro stage 152 and the moving stage 151 drive the test piece 12 to move together.

[0079] A projection objective 18 is provided above the immersion unit 11. The inner circle shape of the immersion unit 11 is a conical structure matching the shape of the lowermost lens 181 of the projection objective 18. The immersion unit 11 maintains an immersion flow field 20 between the lowermost lens 181 of the projection objective 18 and the test piece 12. The pattern of the integrated circuit on the mask plate can be exposed and imaged on the test piece 12 coated with photoresist after passing through the illumination system (not shown), the projection objective 18, and the immersion flow field 20.

[0080] The size of the test piece 12 can be the same as or close to the size of the substrate (such as a silicon wafer, a germanium wafer) in normal production, so that the test piece 12 can be automatically loaded with the component structure of normal production.

[0081] The test piece 12 has opposite conductive surfaces 121 and supporting surfaces 122, and the supporting surface 122 is in contact with the micro-stage 152, that is, the conductive surface 121 is closer to the immersion unit 11 than the supporting surface 122. A first output terminal 123 is provided on the test piece 12, and the first output terminal 123 is electrically connected to the test circuit (i.e., the first test circuit 131).

[0082] Referring to Figures 2a - 2b , Figures 3a - 3c and Figures 4a - 4c , the conductive surface 121 has at least two mutually insulated conductive regions, and the resistances of different conductive regions are different. Different conductive regions are connected in parallel and summarized to the first output terminal 123. Alternatively, as Figure 5 shown, the conductive surface 121 is an entire conductive region, and there is only one resistance R on the conductive surface 121. Figures 2a - 2b , Figures 3a - 3c , Figures 4a - 4c and Figure 5 shown, for the division of the conductive regions on the conductive surface 121 and the setting position of the first output terminal 123, refer to the description of the immersion lithography apparatus with a collision test function above, and details are not repeated here.

[0083] According to step S2, it is judged whether a collision occurs between the immersion unit 11 and the test piece 12 according to the resistance and / or capacitance between the immersion unit 11 and the test piece 12.

[0084] When judging whether a collision occurs between the two according to the resistance between the immersion unit 11 and the test piece 12, since if no collision occurs between the immersion unit 11 and the test piece 12, the loop formed by the immersion unit 11, the second test circuit 132, the electrical tester 14, the first test circuit 131 and the test piece 12 is open, and the open position is air or the immersion flow field 20, and the resistance of air and the immersion flow field 20 is extremely large, so that the resistance measured by the electrical tester 14 is infinite. Therefore, if the electrical tester 14 measures that the resistance between the immersion unit 11 and the test piece 12 is infinite, no collision occurs between the immersion unit 11 and the test piece 12.

[0085] If a collision occurs between the immersion unit 11 and the test piece 12, the loop formed by the immersion unit 11, the second test line 132, the electrical tester 14, the first test line 131, and the test piece 12 is connected, enabling the electrical tester 14 to measure a specific resistance value (such as 10 Ω to 50 Ω, etc.). Therefore, if the electrical tester 14 can measure a specific resistance value, a collision has occurred between the immersion unit 11 and the test piece 12.

[0086] Moreover, since the resistances of different conductive regions on the conductive surface 121 of the test piece 12 are different, the electrical tester 14 can obtain the corresponding conductive region on the conductive surface 121 that collides with the immersion unit 11 based on the measured resistance, that is, it can determine the collision area on the conductive surface 121. And the more the number of conductive regions on the conductive surface 121 is divided, the more accurate the positioning of the collision position on the conductive surface 121 will be.

[0087] When determining whether a collision occurs between the immersion unit 11 and the test piece 12 based on the capacitance between them, since an immersion flow field 20 is maintained between the immersion unit 11 and the test piece 12, the immersion unit 11, the immersion flow field 20, and the test piece 12 form a parallel - plate capacitor, thereby enabling the electrical tester 14 to measure the capacitance between the immersion unit 11 and the test piece 12. The capacitance value is related to the vertical distance between the immersion unit 11 and the test piece 12; the closer the distance between the immersion unit 11 and the test piece 12, the greater the capacitance measured by the electrical tester 14 between the immersion unit 11 and the test piece 12. If the electrical tester 14 can measure a specific capacitance value, no collision has occurred between the immersion unit 11 and the test piece 12; if the capacitance measured by the electrical tester 14 between the immersion unit 11 and the test piece 12 is infinite, a collision has occurred between the immersion unit 11 and the test piece 12.

[0088] Alternatively, the electrical tester 14 can also be used to measure the resistance and capacitance between the immersion unit 11 and different test pieces 12 to determine whether the anti - collision function is effective, so as to further ensure the accuracy of the judgment result.

[0089] During the operation test of the anti-collision function set in the lithography machine, the above-mentioned collision test method can test whether a collision occurs between the immersion unit 11 and the test piece 12 to confirm the effectiveness of the anti-collision function; moreover, during the normal production process, it can regularly monitor whether a collision will occur between the immersion unit 11 and the test piece 12, and then monitor whether the installation positions, movement trajectories, etc. of components such as the immersion unit 11 and the carrier unit 15 shift after long-term production, so as to prevent possible collisions.

[0090] In addition, the collision test method further includes transmitting the resistance and / or capacitance measured by the electrical tester 14 to the lithography machine workstation 16, and the electrical tester 14 is signal-connected to the lithography machine workstation 16 through the third test line 133.

[0091] Moreover, if it is determined whether a collision occurs between the immersion unit 11 and the test piece 12 during operation based on the resistance between the immersion unit 11 and the test piece 12, the lithography machine workstation 16 can also receive information such as the collision time and the conductive area where the collision occurs sent by the electrical tester 14, so as to analyze and obtain data such as the movement trajectory points of the carrier unit 15 and the immersion unit 11 at the time of collision, and then be able to debug the anti-collision function, optimize parameters or adjust the installation positions of relevant components based on these data; if it is determined whether a collision occurs between the immersion unit 11 and the test piece 12 during operation based on the capacitance between the immersion unit 11 and the test piece 12, the lithography machine workstation 16 can also receive the distance change situation between the immersion unit 11 and the test piece 12 detected by the electrical tester 14, and then be able to optimize the servo debugging of the anti-collision function.

[0092] In summary, the collision test method provided by the present invention includes: operating the immersion unit and the carrier unit below it, and during the operation, using an electrical tester to measure the resistance and / or capacitance between the immersion unit and the test piece on the carrier unit; and determining whether a collision occurs between the immersion unit and the test piece based on the resistance and / or capacitance between the immersion unit and the test piece. The collision test method of the present invention can accurately determine whether a collision occurs between the immersion unit and the test piece during operation, enabling the evaluation of the effectiveness of the anti-collision function, and thus ensuring the safe operation of the lithography machine.

[0093] The above description is only a description of the preferred embodiments of the present invention, and does not limit the scope of the present invention in any way. Any changes and modifications made by those of ordinary skill in the art of the present invention based on the above disclosure fall within the protection scope of the claims.

Claims

1. An immersion lithography apparatus with a collision test function, characterized in that: include: Immersion unit; A test unit, comprising a test piece, a test circuit and an electrical tester, wherein the electrical tester is electrically connected to the immersion unit and the test piece through the test circuit, and the electrical tester is used to test the resistance and capacitance, or the resistance, between the immersion unit and the test piece to determine whether a collision occurs between the immersion unit and the test piece during operation; as well as, A carrying unit, used for carrying the test piece, wherein the carrying unit is arranged below the immersion unit; The test piece has a relative conductive surface and a supporting surface, the conductive surface is closer to the immersion unit than the supporting surface, the conductive surface has at least two mutually insulated conductive areas, different conductive areas have different resistances, and when a collision occurs between the immersion unit and the test piece, the electrical tester obtains the conductive area on the conductive surface where the collision occurs based on the tested resistance.

2. The immersion lithography apparatus with collision test function according to claim 1, characterized in that: The bearing unit comprises a moving platform and a micro-motion platform arranged on the moving platform, and the test piece is located on the micro-motion platform.

3. The immersion lithography apparatus with collision test function according to claim 2, characterized in that: The support surface is in contact with the micro-motion stage; the test piece is provided with a first output end, and the first output end is electrically connected to the test circuit.

4. The immersion lithography apparatus with collision test function according to claim 3, characterized in that: The first output end is arranged on the conductive surface, and the first output end is electrically connected to the test circuit through a lead wire.

5. The immersion lithography apparatus with collision test function according to claim 3, characterized in that: The first output end is arranged on the supporting surface, the micro-motion stage is provided with an input end and a second output end, the first output end is electrically connected to the input end, the input end is electrically connected to the second output end, and the second output end is electrically connected to the test circuit through a lead wire.

6. The immersion lithography apparatus with collision test function according to claim 3, characterized in that: The different conductive areas are connected in parallel to the first output end.

7. The immersion lithography apparatus with collision test function according to claim 6, characterized in that: If no collision occurs between the immersion unit and the test piece, the resistance tested by the electrical tester is infinite.

8. The immersion lithography apparatus with collision test function according to claim 3, characterized in that: An immersion flow field is maintained between the immersion unit and the test piece, and the immersion unit, the immersion flow field and the test piece form a parallel plate capacitor, so that the electrical tester tests the capacitance between the immersion unit and the test piece.

9. The immersion lithography apparatus with collision test function according to claim 8, characterized in that: The closer the distance between the immersion unit and the test piece is, the greater the capacitance between the immersion unit and the test piece is; if a collision occurs between the immersion unit and the test piece, the capacitance between the immersion unit and the test piece is infinite.

10. The immersion lithography apparatus with collision test function according to claim 1, characterized in that: It also includes a photolithography machine workstation, which is connected to the electrical tester signal to receive the resistance and capacitance, or resistance tested by the electrical tester.

11. A collision test method, characterized in that: include: Running the immersion unit and the load-bearing unit thereunder, and testing the resistance and capacitance, or the resistance, between the immersion unit and the test piece on the load-bearing unit using an electrical tester during the running process; as well as, determining whether a collision occurs between the immersion unit and the test piece according to the resistance and capacitance, or the resistance, between the immersion unit and the test piece; The test piece has a relative conductive surface and a supporting surface, the conductive surface is closer to the immersion unit than the supporting surface, the conductive surface has at least two mutually insulated conductive areas, different conductive areas have different resistances, and when a collision occurs between the immersion unit and the test piece, the electrical tester obtains the conductive area on the conductive surface where the collision occurs based on the tested resistance.

12. The collision test method according to claim 11, characterized in that: The supporting surface is in contact with the carrying unit.

13. The collision test method according to claim 12, characterized in that: The resistance between the immersion unit and the test piece is infinite, and no collision occurs between the immersion unit and the test piece.

14. The collision test method according to claim 12, characterized in that: An immersion flow field is maintained between the immersion unit and the test piece, and the immersion unit, the immersion flow field and the test piece form a parallel plate capacitor, so that the electrical tester tests the capacitance between the immersion unit and the test piece.

15. The collision test method according to claim 14, characterized in that: The closer the distance between the immersion unit and the test piece is, the greater the capacitance between the immersion unit and the test piece is; if the capacitance between the immersion unit and the test piece is infinite, a collision occurs between the immersion unit and the test piece.

16. The collision test method according to claim 11, characterized in that: The method also includes transmitting the resistance and capacitance, or resistance, tested by the electrical tester to a lithography machine workstation.

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