Specimen holder

Abstract

The specimen holder includes a base body, a support body, and a cylindrical member. The gas flow path in the support body has a first portion and a second portion. The first portion extends parallel to the joint surface of the support body. The second portion branches and connects to the first portion, extends in a direction perpendicular to the joint surface, and opens at the joint surface. The cylindrical member has: a cylindrical main body portion disposed along the second portion; and a cylindrical extension and protrusion portion connected to the main body portion and extending and protruding toward the first portion.

Description

Technical Field

[0001] The present disclosure relates to a specimen holder for holding a specimen such as a semiconductor wafer, which is used in a manufacturing process of a semiconductor integrated circuit or a manufacturing process of a liquid crystal display device, etc. Background Art

[0002] An example of the prior art is described in Patent Document 1.

[0003] Prior Art Documents

[0004] Patent Documents

[0005] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2014-209615 Summary of the Invention

[0006] The specimen holder of the present disclosure includes: a plate-shaped base body having a specimen holding surface; and a support body having a joint surface joined to the back surface opposite to the specimen holding surface of the base body, and provided with a flow path extending at least up to the joint surface. It is configured such that the flow path of the support body has a first part and a second part, the first part extends parallel to the joint surface, the second part is branched and connected to the first part, extends in a direction perpendicular to the joint surface, and opens at the joint surface. The specimen holder includes a cylindrical member having: a cylindrical main body portion disposed along the second part; and a cylindrical extension protrusion portion connected to the main body portion and extending and protruding toward the first part. Brief Description of the Drawings

[0007] The object, features, and advantages of the present disclosure can be made more apparent from the following detailed description and the drawings.

[0008] Figure 1 is a plan view of the specimen holder of the first embodiment.

[0009] Figure 2 is Figure 1 a cross-sectional view of the specimen holder taken along the cutting line X-X shown.

[0010] Figure 3A is an enlarged cross-sectional view of the periphery of the second part of the second embodiment.

[0011] Figure 3B is Figure 3A an enlarged cross-sectional view taken along the cutting line Y-Y of

[0012] Figure 4 is an enlarged cross-sectional view of the periphery of the extension protrusion portion of the third embodiment.

[0013] Figure 5 is an enlarged cross-sectional view of the periphery of the extension protrusion portion of the fourth embodiment.

[0014] Figure 6 is an enlarged cross-sectional view around the extended protrusion of the fifth embodiment.

[0015] Figure 7 is an enlarged cross-sectional view around the extended protrusion of the sixth embodiment.

[0016] Figure 8 is an enlarged cross-sectional view around the extended protrusion of the seventh embodiment.

[0017] Figure 9 is an enlarged cross-sectional view around the extended protrusion of the eighth embodiment. Detailed Embodiments

[0018] The structure that forms the basis of the sample holder of the present disclosure, that is, the sample holder used in a semiconductor manufacturing apparatus or the like, is configured by joining a substrate containing an insulator that mounts / holds a sample such as a wafer and a support body containing a conductor such as metal that supports the substrate, using a bonding material.

[0019] Inside the integrally joined substrate and support body, a flow path is provided for supplying a plasma generation gas such as helium from the outside to the holding surface of the sample, that is, the upper surface of the substrate.

[0020] As a sample holder used in a semiconductor manufacturing apparatus or the like, an electrostatic chuck described in Patent Document 1 is known, for example. The electrostatic chuck described in Patent Document 1 includes a dielectric substrate having an internal electrode and a metal base plate, and has a through hole that penetrates the dielectric substrate and the base plate, and a ceramic porous body is disposed in the through hole of the base plate. In Patent Document 1, in order to prevent discharge during plasma treatment of the sample, a ceramic porous body is disposed in the through hole of the base plate to improve insulation.

[0021] In recent years, with the miniaturization of semiconductor integrated circuits, high-output plasma is used to process samples. In a conventional sample holder, when the output of the plasma is increased, the plasma irradiated onto the sample sometimes discharges into the flow path through the plasma generation gas filling the flow path in the support body (base plate).

[0022] By providing a ceramic cylindrical member extending along the through hole of the support body, the insulation can be improved and discharge can be suppressed, but due to further high-outputization of the plasma, it has become difficult to suppress discharge in the support body.

[0023] Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. Figure 1 is a top view of the sample holder of the first embodiment. Figure 2 is Figure 1Cross-sectional view of the specimen holder in the cutting plane X-X shown. The specimen holder 100 includes a base body 10, a support body 20, and a cylindrical member 30.

[0024] The base body 10 is a ceramic body having a first surface 10a and a second surface 10b on the opposite side of the first surface 10a. The first surface 10a is a specimen holding surface for holding a specimen, and the second surface 10b is a back surface joined to the support body 20. The base body 10 is a plate-shaped member, and its outer shape is not limited. For example, it can also be a circular plate shape or a square plate shape.

[0025] The base body 10 is made of a ceramic material, for example. As the ceramic material, it can be, for example, alumina, aluminum nitride, silicon nitride, or yttrium oxide. The outer dimensions of the base body 10 can, for example, have a diameter (or side length) of 200 to 500 mm and a thickness of 2 to 15 mm.

[0026] As a method of using the base body 10 to hold a specimen, various methods can be used. The specimen holder 100 of this example can also be an electrostatic chuck that holds a specimen using electrostatic force. The specimen holder 100 has an adsorption electrode 40 inside the base body 10. The adsorption electrode 40 has two electrodes. One of the two electrodes is connected to the positive electrode of the power supply, and the other is connected to the negative electrode. Each of the two electrodes is substantially semi-circular plate-shaped, and the chords of the semi-circles are opposed to each other and located inside the base body 10. If these two electrodes are combined, the overall outer shape of the adsorption electrode 40 becomes a circular shape. The center of the circular outer shape formed by the entire adsorption electrode 40 can be set to be the same as the center of the outer shape of the ceramic body, which is also circular. The adsorption electrode 40 has a metal material, for example. As the metal material, it has a metal material such as platinum, tungsten, or molybdenum, for example.

[0027] The specimen holder 100 is used, for example, to generate plasma at a position above the first surface 10a of the base body 10, which is the specimen holding surface. For example, by applying high frequency between a plurality of electrodes provided outside, the gas located between the electrodes can be excited to generate plasma. The supply of the gas for plasma generation will be described later.

[0028] The support body 20 is made of metal and is a member for supporting the base body 10. As the metal material, aluminum can be used, for example. The outer shape of the support body 20 is not particularly limited, and it can also be a circular shape or a quadrilateral shape. The outer dimensions of the support body 20 can, for example, have a diameter (or side length) of 200 to 500 mm and a thickness of 10 to 100 mm. The support body 20 can have the same outer shape as the base body 10 or a different outer shape, and can have the same outer dimensions or different outer dimensions.

[0029] The support body 20 and the base body 10 are joined via a joining layer 50. Specifically, the first surface 20a of the support body 20 is a joining surface facing the second surface 10b of the base body 10, and the first surface 20a of the support body 20 and the second surface 10b of the base body 10 are joined by the joining layer 50. As the joining layer 50, for example, an adhesive of a resin material can be used. As the resin material, for example, a silicone resin or the like can be used.

[0030] In the support body 20, there is provided a gas flow path 21 that extends at least up to the first surface 20a serving as the joining surface. The gas flow path 21 has: a first portion 21a that extends in parallel with the joining surface 20a of the support body 20; and a second portion 21b that is branched and connected to the first portion 21a and extends in a direction perpendicular to the joining surface 20a and opens to the joining surface 20a. The first portion 21a is, for example, provided in an annular shape concentric with the center of the joining surface 20a. The second portion 21b is, for example, branched and connected to the first portion 21a and is provided in a longitudinal hole shape extending from the first portion 21a to the joining surface 20a. The gas flow path 21 further has: a third portion 21c that opens to the second surface 20b of the support body 20 and extends in a direction perpendicular to the joining surface 20a; and a fourth portion 21d that extends in parallel with the joining surface 20a of the support body 20 and connects the third portion 21c and the first portion 21a. The third portion 21c is, for example, provided in a longitudinal hole shape at the center of the joining surface 20a. The fourth portion 21d is provided in a linear shape that extends parallel to the joining surface 20a and outward from the center of the joining surface 20a.

[0031] In the base body 10, there is provided a through hole 11 that penetrates from the first surface 10a to the second surface 10b. The through hole 11 of the base body 10 communicates with the second portion 21b of the support body 20. The plasma generating gas flows in from the outside into the third portion 21c, passes through the fourth portion 21d, and reaches the first portion 21a. The plasma generating gas flows along the circumferential direction in the first portion 21a, rises along the second portion 21b, and reaches the first surface 20a. Further, it flows into the through hole 11 in the base body 10 that communicates with the second portion 21b, rises in the through hole 11, and is supplied from the opening of the first surface 10a of the base body 10 onto the first surface 10a of the base body 10. As the plasma generating gas, for example, helium or the like can be used.

[0032] The gas flow path 21 is provided within the metallic support 20. During plasma processing, the plasma generation gas within the through-hole 11 of the conductive substrate 10 is conducted. If the plasma reaches the second portion 21b, it will discharge to the inner wall of the second portion 21b. In order to suppress such discharge, a cylindrical member 30 containing an insulating material is provided. The cylindrical member 30 of the present embodiment has: a cylindrical main body portion 31 disposed along the second portion 21b; and a cylindrical extension projecting portion 32 connected to the main body portion 31 and extending and projecting toward the first portion 21a. The cylindrical member 30 of the present embodiment is cylindrical, and the main body portion 31 and the extension projecting portion 32 are integrated. The cylindrical member 30 covers the inner peripheral surface of the second portion 21b, and the front end 32a further projects into the first portion 21a. Through this extension projecting portion 32, the cylindrical member 30 also covers a part of the inner peripheral surface of the first portion 21a. Thereby, in the case where the plasma is further increased in output, within the support 20, it is possible to suppress not only the discharge in the second portion 21b but also the discharge in the first portion 21a.

[0033] A space is provided between the front end 32a of the extension projecting portion 32 and the bottom surface of the first portion 21a. In the flow of the plasma generation gas within the gas flow path 21 in the present embodiment, the gas flowing within the first portion 21a along the circumferential direction flows into the cylindrical member 30 from the front end 32a side of the extension projecting portion 32, rises within the cylindrical member 30, and flows into the through-hole 11 within the substrate 10.

[0034] As the insulating material constituting the cylindrical member 30, for example, a ceramic material can be used. As the ceramic material, for example, alumina or aluminum nitride can be cited.

[0035] Next, a second embodiment will be described. Figure 3A It is an enlarged cross-sectional view of the periphery of the second portion of the second embodiment. Figure 3B It is Figure 3A An enlarged cross-sectional view taken along the cutting line Y - Y shown. Except for the different structure of the cylindrical member 30A, this embodiment is the same as the first embodiment, so the same reference numerals are given to the same structures and the description is omitted. The front end 32a of the extension projecting portion 32A of the cylindrical member 30A of the present embodiment reaches the bottom surface 22 of the first portion 21a. Thus, since the front end 32a is blocked, the extension projecting portion 32A has a through-hole or a cutout that connects its internal space and the first portion 21a of the gas flow path 21.

[0036] In the present embodiment, a cutout 32b is provided in the extension projecting portion 32A where the peripheral wall is cut off. The cutout 32b is provided at two locations sandwiching the central axis of the extension projecting portion 32A in order to allow the plasma generation gas to flow in the annular first portion 21a. For example, facing Figure 3BThe gas flowing in the first part 21a from the right side of the paper surface enters the internal space of the extended protrusion 32A through the incision 32b on the right side. A part of it rises in the internal space of the extended protrusion 32A, and a part flows out from the incision 32b on the left side to the first part 21a. The gas flowing out to the first part 21a flows in the first part 21a until it reaches the next extended protrusion 32A.

[0037] In the present embodiment, since the extended protrusion 32A reaches the bottom surface 22 of the first part 21a, the part covering the inner peripheral surface of the first part 21a is larger than that in the first embodiment, and the discharge in the first part 21a can be further suppressed.

[0038] In addition, the shape and size of the incision 32b are not particularly limited. For example, it can be a part of a circle such as a semicircle (including an ellipse, etc.), or a polygon including a rectangular shape. In addition, the member provided on the extended protrusion 32 can be a through-hole, and the shape and size are not particularly limited. For example, it can be a circular (including an elliptical, etc.) shape, or a polygon including a rectangular shape.

[0039] Next, a description will be given of the third embodiment. Figure 4 It is an enlarged cross-sectional view around the extended protrusion of the third embodiment. This embodiment is the same as the second embodiment except for the structure of the cylindrical member 30B. Therefore, the same reference numerals are given to the same structures and the description is omitted. The cylindrical member 30B of this embodiment also has a bottom surface portion 33 that blocks the front end 32a side of the extended protrusion 32A. The bottom surface portion 33 only needs to be made of an insulating material, and it can be the same material as the main body portion 31 and the extended protrusion 32, or a different material.

[0040] The bottom surface portion 33 blocks the front end 32a side of the extended protrusion 32A and covers the bottom surface of the first part 21a. The extended protrusion 32A has the same structure as that in the second embodiment. Therefore, a through-hole or an incision is provided in the extended protrusion 32A. Even if the bottom surface portion 33 blocks the front end 32a side of the extended protrusion 32A, the plasma generation gas can flow in the first part 21a and the extended protrusion 32 in the same manner as in the second embodiment. Since the bottom surface portion 33 also covers the bottom surface 22 of the first part 21a, the part covering the inner peripheral surface of the first part 21a is larger than that in the second embodiment, and the discharge in the first part 21a can be further suppressed.

[0041] Next, a description will be given of the fourth embodiment. Figure 5It is an enlarged cross-sectional view around the extended protrusion of the fourth embodiment. This embodiment is the same as the third embodiment except for the structure of the first part 21a. Therefore, the same reference numerals are given to the same structures and the description is omitted. The first part 21a of this embodiment has a recess 23 for accommodating the bottom face portion 33 on the side opposite to the connection position with the second part 21b. The inner surface 33a of the bottom face portion 33 is located closer to the joint face 20a side than the bottom face 22 of the first part 21a.

[0042] Since the bottom face portion 33 is accommodated in the recess 23, the extended protrusion 32A that extends and protrudes toward the first part 21a is fixed. Since the inner surface 33a of the bottom face portion 33 is higher than the bottom face 22 of the first part 21a, the inner surface of the recess 23 is covered by the bottom face portion 33, preventing exposure from the cutout 32b. Thereby, it is possible to suppress discharge in the first part 21a, particularly discharge on the inner surface of the recess 23.

[0043] Next, the fifth embodiment will be described. Figure 6 It is an enlarged cross-sectional view around the extended protrusion of the fifth embodiment. In this embodiment, it is the same as the fourth embodiment except for the structure of the first part 21a. Therefore, the same reference numerals are given to the same structures and the description is omitted. The first part 21a of this embodiment has a recess 23A in the same manner as the fourth embodiment, and the corner portion of the recess 23A has a curved surface shape.

[0044] When the corner portion of the recess has an angular (right-angled) shape, the electric field concentrates on the angular portion and discharge is likely to occur. In this embodiment, since the corner portion of the recess 23A has a curved surface shape, the concentration of the electric field is suppressed, and it is possible to suppress discharge on the inner surface of the recess 23A.

[0045] Next, the sixth embodiment will be described. Figure 7 It is an enlarged cross-sectional view around the extended protrusion of the sixth embodiment. In this embodiment, it is the same as the fifth embodiment except for the structure of the cylindrical member 30C. Therefore, the same reference numerals are given to the same structures and the description is omitted. The first part 21a of this embodiment is the same as the fifth embodiment, the corner portion of the recess 23A has a curved surface shape, and the corner portion of the bottom face portion 33A has a curved surface shape.

[0046] In this embodiment, for example, the corner portion of the bottom face portion 33A has a curved surface shape along the corner portion of the recess 23A. The bottom face portion 33A is accommodated in the recess 23A so that the outer surface of the bottom face portion 33A abuts against the inner surface of the recess 23A. Therefore, the inner surface of the recess 23A is covered, and discharge can be suppressed.

[0047] Next, the seventh embodiment will be described. Figure 8It is an enlarged cross-sectional view of the periphery of the extended protrusion of the seventh embodiment. In this embodiment, except for the different structure of the cylindrical member 30D, it is the same as the third embodiment. Therefore, the same reference numerals are given to the same structures and the description is omitted. The cylindrical member 30C of this embodiment is composed of a main body portion 31 and an extended protrusion portion 32 separately.

[0048] As long as the main body portion 31 and the extended protrusion portion 32 are made of insulating materials, the main body portion 31 and the extended protrusion portion 32 may be made of the same material or different materials. In addition, the main body portion 31 and the extended protrusion portion 32 may also be fixed with an adhesive or the like.

[0049] The end faces 31a and 32c of the main body portion 31 and the extended protrusion portion 32 facing each other intersect with a virtual plane orthogonal to the axial direction. As Figure 8 shown, in this embodiment, for example, the end face 31a of the main body portion 31 and the end face 32c of the extended protrusion portion 32 are both inclined faces with respect to the axial direction of the cylindrical member 30D. Specifically, the end face 31a of the main body portion 31 is an inclined face facing the radially outer side, and the end face 32c of the extended protrusion portion 32 is an inclined face facing the radially inner side.

[0050] The creepage distance from the internal space of the cylindrical member 30D through which the plasma generation gas flows to the inner circumferential surfaces of the first portion 21a and the second portion 21b is increased, and discharge can be suppressed.

[0051] Next, the eighth embodiment will be described. Figure 9 It is an enlarged cross-sectional view of the periphery of the extended protrusion of the eighth embodiment. In this embodiment, except for the different structure of the cylindrical member 30E, it is the same as the seventh embodiment. Therefore, the same reference numerals are given to the same structures and the description is omitted. The end faces of the main body portion 31 and the extended protrusion portion 32 of the cylindrical member 30E of this embodiment each have a portion parallel to the axial direction.

[0052] As Figure 9 shown, in this embodiment, for example, the end face 31a of the main body portion 31 and the end face 32c of the extended protrusion portion 32 are both stepped faces. Specifically, the end face 31a of the main body portion 31 is a stepped face that is higher on the radially inner side, and the end face 32c of the extended protrusion portion 32 is a stepped face that is higher on the radially outer side. The face between the face on the radially outer side and the face on the radially inner side becomes a portion parallel to the axial direction.

[0053] The creepage distance from the internal space of the cylindrical member 30E through which the plasma generation gas flows to the inner circumferential surfaces of the first portion 21a and the second portion 21b is further increased compared to the seventh embodiment, and discharge can be suppressed.

[0054] The shape of the gas flow path 21 within the support 20 is not limited to the shapes of the above-described embodiments. For example, the first portion 21a is not limited to a circular ring shape and can be a rectangular shape, a comb shape, a meandering shape, etc. The position of the second portion 21b is not limited to being equally spaced and can also be randomly arranged. The third portion 21c and the fourth portion 21d can also be appropriately changed. For example, the shape of the cylindrical member 30 is not limited to a cylindrical shape and can also be a polygonal cylindrical shape, etc. The main body portion 31 and the extending protrusion portion 32 of the cylindrical member 30 can be the same shape or different shapes.

[0055] The present disclosure can achieve the following embodiments.

[0056] The sample holder of the present disclosure includes: a plate-shaped base body having a sample holding surface; and a support having a joint surface joined to the back surface opposite to the sample holding surface of the base body, and provided with a flow path extending at least up to the joint surface. It is configured such that the flow path of the support has a first portion and a second portion, the first portion extends parallel to the joint surface, the second portion branches and connects to the first portion, extends in a direction perpendicular to the joint surface, and opens at the joint surface. The sample holder includes a cylindrical member having: a cylindrical main body portion disposed along the second portion; and a cylindrical extending protrusion portion connected to the main body portion and extending and protruding toward the first portion.

[0057] According to the sample holder of the present disclosure, since the cylindrical member has an extending protrusion portion, it is possible to suppress discharge within the support.

[0058] As described above in detail, the embodiments of the present disclosure have been described, but the present disclosure is not limited to the above-described embodiments, and various changes, improvements, etc. can be made without departing from the gist of the present disclosure. Of course, it is also possible to appropriately combine all or part of the components constituting the above-described embodiments within a non-contradictory range.

[0059] -Symbol Explanation-

[0060] 10 Base body

[0061] 10a First surface

[0062] 10b Second surface

[0063] 11 Through hole

[0064] 20 Support

[0065] 20a First surface

[0066] 20b Second surface

[0067] 21 Gas flow path

[0068] 21a First part

[0069] 21b Second part

[0070] 21c Third part

[0071] 21d Fourth part

[0072] 22 Bottom surface

[0073] 23 Concave part

[0074] 23A Concave part

[0075] 30 Cylindrical member

[0076] 30A Cylindrical member

[0077] 30B Cylindrical member

[0078] 30C Cylindrical member

[0079] 30D Cylindrical member

[0080] 30E Cylindrical member

[0081] 31 Main body part

[0082] 31a End face

[0083] 32 Extension protrusion

[0084] 32A Extension protrusion

[0085] 32a Front end

[0086] 32c End face

[0087] 33 Bottom face part

[0088] 33A Bottom face part

[0089] 33a Inner surface

[0090] 40 Adsorption electrode

[0091] 50 Bonding layer

[0092] 100 Specimen holder.

Claims

1. A specimen holder, comprising: A plate-shaped base body having a specimen holding surface; A support body having a joint surface joined to the back surface on the opposite side of the specimen holding surface of the base body, and provided with a flow path extending at least to the joint surface. The flow path of the support body has a first part and a second part. The first part extends parallel to the joint surface of the support body, the second part is branched and connected to the first part, extends in a direction perpendicular to the joint surface, and opens at the joint surface; and a cylindrical member having a cylindrical main body portion disposed along the second portion; and a cylindrical extension projecting portion connected to the main body portion and projecting toward the first portion, the extension projecting portion having a through hole or a cutout that communicates an internal space with the first portion, the cylindrical member further having a bottom surface portion that closes the front end side of the extension projecting portion, the first portion having, on a side opposite to a connection position with the second portion, a recess that houses the bottom surface portion, and an inner surface of the bottom surface portion being located closer to the joint surface side than a bottom surface of the first portion.

2. The specimen holder according to claim 1, wherein, A corner portion of the recess is curved.

3. The specimen holder according to claim 1 or 2, wherein, A corner portion of the bottom surface portion is curved.

4. A specimen holder, comprising: A plate-shaped base body having a specimen holding surface; A support body having a joint surface joined to the back surface on the opposite side of the specimen holding surface of the base body, and provided with a flow path extending at least to the joint surface. The flow path of the support body has a first part and a second part. The first part extends parallel to the joint surface of the support body, the second part is branched and connected to the first part, extends in a direction perpendicular to the joint surface, and opens at the joint surface; and a cylindrical member having a cylindrical main body portion disposed along the second portion; and a cylindrical extension projecting portion connected to the main body portion and projecting toward the first portion, the main body portion and the extension projecting portion being formed separately, opposing end faces of the main body portion and the extension projecting portion each intersecting a virtual plane that is orthogonal to the axial direction.

5. The specimen holder according to claim 4, wherein, The end faces each have a portion parallel to the axial direction.

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