clamp assembly
By guiding and controlling the humidifying gas on the lower base surface of the electrostatic chuck of the EUV lithography apparatus, the problem of uneven charge distribution on the electrostatic chuck was solved, ensuring the precise positioning and stable operation of the lithography apparatus.
CN114761879BActive Publication Date: 2025-10-24ASML NETHERLANDS BV
Patent Information
- Application Number
- CN202080084080.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2019-12-03
- Filing Date
- 2020-11-02
- Publication Date
- 2025-10-24
- Estimated Expiration
- 2040-11-02
AI Technical Summary
Technical Problem
In EUV lithography apparatuses, the non-uniform charge distribution of the electrostatic chuck causes deformation of lithography apparatus components, affecting the precise positioning of the patterning device and substrate.
Method used
By guiding humidifying gas onto the lower base surface of the fixture and exposing it to liquid, liquid condensation is formed. Gas pressure control is used to accelerate discharge and remove residual charge.
Benefits of technology
It effectively eliminates or reduces the uneven charge distribution on the electrostatic fixture, ensuring the precise positioning and stable operation of the components in the lithography device.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN114761879B_ABST
Abstract
A clamp assembly is disclosed, comprising a clamp (50) configurable to clamp a support member (110) to a lower base face (49) of the clamp by electrostatic adhesion; and an arrangement configurable to direct a gas to the lower base face (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. A method of discharging a lower base face of a clamp is also disclosed. The method comprises the steps of: humidifying a gas by exposing the gas to a liquid; and directing the humidified gas to the lower base face of the clamp.
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Citation Information
Patent Citations
An electrostatic clamp and a method for manufacturing the same
CN106796901A
Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus
CN108139684A